WO2009020035A1 - 感放射線性組成物及び化合物 - Google Patents
感放射線性組成物及び化合物 Download PDFInfo
- Publication number
- WO2009020035A1 WO2009020035A1 PCT/JP2008/063738 JP2008063738W WO2009020035A1 WO 2009020035 A1 WO2009020035 A1 WO 2009020035A1 JP 2008063738 W JP2008063738 W JP 2008063738W WO 2009020035 A1 WO2009020035 A1 WO 2009020035A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- radiation
- sensitive composition
- compound
- sensitive
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
- C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
- C07C39/17—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings containing other rings in addition to the six-membered aromatic rings, e.g. cyclohexylphenol
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/96—Esters of carbonic or haloformic acids
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Electron Beam Exposure (AREA)
- Materials For Photolithography (AREA)
- Steroid Compounds (AREA)
Abstract
本発明は、次の感放射線性組成物を提供する。 (a)下記一般式(1)で表される化合物と、 (b)放射線が照射されることにより酸を発生する感放射線性酸発生剤とを含有する感放射線性組成物。 (Rは水素等、R1はメチレン基等、Yはアルキル基等、qは0または1である。)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009526413A JP5353699B2 (ja) | 2007-08-09 | 2008-07-31 | 感放射線性組成物 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007-208320 | 2007-08-09 | ||
| JP2007208320 | 2007-08-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2009020035A1 true WO2009020035A1 (ja) | 2009-02-12 |
Family
ID=40341269
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2008/063738 Ceased WO2009020035A1 (ja) | 2007-08-09 | 2008-07-31 | 感放射線性組成物及び化合物 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5353699B2 (ja) |
| TW (1) | TW200914994A (ja) |
| WO (1) | WO2009020035A1 (ja) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013018761A (ja) * | 2011-07-14 | 2013-01-31 | Jsr Corp | 包接化合物およびその製造方法 |
| JP2018010279A (ja) * | 2016-06-30 | 2018-01-18 | 住友化学株式会社 | 化合物、レジスト組成物及びレジストパターンの製造方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005075398A1 (ja) * | 2004-02-04 | 2005-08-18 | Jsr Corporation | カリックスアレーン系化合物、その製造方法、その中間体及びその組成物 |
| JP2007008875A (ja) * | 2005-06-30 | 2007-01-18 | Jsr Corp | カリックスアレーン系誘導体及びそれを含有する組成物 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4895537B2 (ja) * | 2005-06-30 | 2012-03-14 | Jsr株式会社 | カリックスアレーン系ポリマー及びその製造方法 |
| JP5596258B2 (ja) * | 2007-05-09 | 2014-09-24 | 学校法人神奈川大学 | カリックスアレーンダイマー化合物およびその製造方法 |
-
2008
- 2008-07-31 WO PCT/JP2008/063738 patent/WO2009020035A1/ja not_active Ceased
- 2008-07-31 JP JP2009526413A patent/JP5353699B2/ja active Active
- 2008-08-05 TW TW97129705A patent/TW200914994A/zh unknown
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005075398A1 (ja) * | 2004-02-04 | 2005-08-18 | Jsr Corporation | カリックスアレーン系化合物、その製造方法、その中間体及びその組成物 |
| JP2007008875A (ja) * | 2005-06-30 | 2007-01-18 | Jsr Corp | カリックスアレーン系誘導体及びそれを含有する組成物 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013018761A (ja) * | 2011-07-14 | 2013-01-31 | Jsr Corp | 包接化合物およびその製造方法 |
| JP2018010279A (ja) * | 2016-06-30 | 2018-01-18 | 住友化学株式会社 | 化合物、レジスト組成物及びレジストパターンの製造方法 |
| JP6996116B2 (ja) | 2016-06-30 | 2022-01-17 | 住友化学株式会社 | 化合物、レジスト組成物及びレジストパターンの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200914994A (en) | 2009-04-01 |
| JPWO2009020035A1 (ja) | 2010-11-04 |
| JP5353699B2 (ja) | 2013-11-27 |
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|---|---|---|---|
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