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WO2009020035A1 - Radiation-sensitive composition and compound - Google Patents

Radiation-sensitive composition and compound Download PDF

Info

Publication number
WO2009020035A1
WO2009020035A1 PCT/JP2008/063738 JP2008063738W WO2009020035A1 WO 2009020035 A1 WO2009020035 A1 WO 2009020035A1 JP 2008063738 W JP2008063738 W JP 2008063738W WO 2009020035 A1 WO2009020035 A1 WO 2009020035A1
Authority
WO
WIPO (PCT)
Prior art keywords
radiation
sensitive composition
compound
sensitive
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/063738
Other languages
French (fr)
Japanese (ja)
Inventor
Daisuke Shimizu
Ken Maruyama
Toshiyuki Kai
Tsutomu Shimokawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JSR Corp filed Critical JSR Corp
Priority to JP2009526413A priority Critical patent/JP5353699B2/en
Publication of WO2009020035A1 publication Critical patent/WO2009020035A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
    • C07C39/17—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings containing other rings in addition to the six-membered aromatic rings, e.g. cyclohexylphenol
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/96—Esters of carbonic or haloformic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Electron Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
  • Steroid Compounds (AREA)

Abstract

Disclosed is a radiation-sensitive composition containing (a) a compound represented by the general formula (1) below, and (b) a radiation-sensitive acid generator which generates an acid when irradiated with radiation. (1) (In the formula, R represents hydrogen or the like; R1 represents a methylene group or the like; Y represents an alkyl group or the like; and q represents 0 or 1.)
PCT/JP2008/063738 2007-08-09 2008-07-31 Radiation-sensitive composition and compound Ceased WO2009020035A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009526413A JP5353699B2 (en) 2007-08-09 2008-07-31 Radiation sensitive composition

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-208320 2007-08-09
JP2007208320 2007-08-09

Publications (1)

Publication Number Publication Date
WO2009020035A1 true WO2009020035A1 (en) 2009-02-12

Family

ID=40341269

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/063738 Ceased WO2009020035A1 (en) 2007-08-09 2008-07-31 Radiation-sensitive composition and compound

Country Status (3)

Country Link
JP (1) JP5353699B2 (en)
TW (1) TW200914994A (en)
WO (1) WO2009020035A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013018761A (en) * 2011-07-14 2013-01-31 Jsr Corp Clathrate compound and method for preparing the same
JP2018010279A (en) * 2016-06-30 2018-01-18 住友化学株式会社 Compound, resist composition and method for producing resist pattern

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005075398A1 (en) * 2004-02-04 2005-08-18 Jsr Corporation Calixarene compound, process for producing the same, intermediate therefor, and composition thereof
JP2007008875A (en) * 2005-06-30 2007-01-18 Jsr Corp Calixarene derivatives and compositions containing the same

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4895537B2 (en) * 2005-06-30 2012-03-14 Ｊｓｒ株式会社 Calixarene polymer and process for producing the same
JP5596258B2 (en) * 2007-05-09 2014-09-24 学校法人神奈川大学 Calixarene dimer compound and method for producing the same

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005075398A1 (en) * 2004-02-04 2005-08-18 Jsr Corporation Calixarene compound, process for producing the same, intermediate therefor, and composition thereof
JP2007008875A (en) * 2005-06-30 2007-01-18 Jsr Corp Calixarene derivatives and compositions containing the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013018761A (en) * 2011-07-14 2013-01-31 Jsr Corp Clathrate compound and method for preparing the same
JP2018010279A (en) * 2016-06-30 2018-01-18 住友化学株式会社 Compound, resist composition and method for producing resist pattern
JP6996116B2 (en) 2016-06-30 2022-01-17 住友化学株式会社 Method for Producing Compound, Resist Composition and Resist Pattern

Also Published As

Publication number Publication date
TW200914994A (en) 2009-04-01
JPWO2009020035A1 (en) 2010-11-04
JP5353699B2 (en) 2013-11-27

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