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WO2009017024A1 - 有機エレクトロルミネッセンス装置の製造方法 - Google Patents

有機エレクトロルミネッセンス装置の製造方法 Download PDF

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Publication number
WO2009017024A1
WO2009017024A1 PCT/JP2008/063284 JP2008063284W WO2009017024A1 WO 2009017024 A1 WO2009017024 A1 WO 2009017024A1 JP 2008063284 W JP2008063284 W JP 2008063284W WO 2009017024 A1 WO2009017024 A1 WO 2009017024A1
Authority
WO
WIPO (PCT)
Prior art keywords
organic
film
layer
sealing
inorganic material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/063284
Other languages
English (en)
French (fr)
Inventor
Makoto Sasaki
Shinichi Morishima
Norihito Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to DE112008002067T priority Critical patent/DE112008002067T5/de
Priority to GB1001529.5A priority patent/GB2464636B/en
Priority to CN200880101448A priority patent/CN101772989A/zh
Priority to US12/670,524 priority patent/US8278126B2/en
Publication of WO2009017024A1 publication Critical patent/WO2009017024A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C23C14/0652—Silicon nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/02—Details
    • H05B33/04—Sealing arrangements, e.g. against humidity
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/844—Encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/87—Passivation; Containers; Encapsulations
    • H10K59/873—Encapsulations
    • H10K59/8731—Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

　本発明は、有機ＥＬ素子を封止する無機物層を含む被膜を形成するときに、有機ＥＬ素子に与えるダメージを抑えながら、水蒸気や酸素に対するバリア性の高い被膜を形成することができる有機ＥＬ装置の製造方法を提供することを課題とする。基板（１０）上に、少なくとも一方が透明または半透明の一対の電極間に発光層を含む有機ＥＬ層（２２）を挟んで構成した有機ＥＬ素子（２０）と、有機ＥＬ素子（２０）に接する少なくとも１層の無機物膜を含み、有機ＥＬ素子（２０）を封止する封止層（３０）と、を形成する際に、封止層（３０）中の有機ＥＬ素子（２０）に接する第１の封止膜（３１）をイオンビームスパッタ法で形成し、封止層（３０）中の他の無機物膜をイオンビームスパッタ法以外の他の成膜方法で形成する。
PCT/JP2008/063284 2007-07-31 2008-07-24 有機エレクトロルミネッセンス装置の製造方法 Ceased WO2009017024A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE112008002067T DE112008002067T5 (de) 2007-07-31 2008-07-24 Verfahren zum Herstellen eines organischen Elektrolumineszenzbauelements
GB1001529.5A GB2464636B (en) 2007-07-31 2008-07-24 Method for manufacturing organic electroluminescence device
CN200880101448A CN101772989A (zh) 2007-07-31 2008-07-24 有机电致发光装置的制造方法
US12/670,524 US8278126B2 (en) 2007-07-31 2008-07-24 Method for manufacturing organic electroluminescence device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007200099A JP2009037811A (ja) 2007-07-31 2007-07-31 有機ｅｌ装置の製造方法
JP2007-200099 2007-07-31

Publications (1)

Publication Number Publication Date
WO2009017024A1 true WO2009017024A1 (ja) 2009-02-05

Family

ID=40304254

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/063284 Ceased WO2009017024A1 (ja) 2007-07-31 2008-07-24 有機エレクトロルミネッセンス装置の製造方法

Country Status (8)

Country Link
US (1) US8278126B2 (ja)
JP (1) JP2009037811A (ja)
KR (1) KR20100055394A (ja)
CN (1) CN101772989A (ja)
DE (1) DE112008002067T5 (ja)
GB (1) GB2464636B (ja)
TW (1) TW200915914A (ja)
WO (1) WO2009017024A1 (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102534511A (zh) * 2012-02-28 2012-07-04 东北大学 一种气相沉积薄膜的装置及其使用方法
WO2012143109A1 (en) 2011-04-21 2012-10-26 Heraeus Precious Metals Gmbh & Co. Kg Fluorinated amines as sam in oleds
WO2013010661A1 (en) 2011-07-19 2013-01-24 Heraeus Precious Metals Gmbh & Co. Kg. Sam layers with an htl function
DE102013005763A1 (de) 2013-04-05 2014-10-09 Heraeus Precious Metals Gmbh & Co. Kg Transparente Schichten mit hoher Leitfähigkeit und hoher Effizienz in OLEDs und Verfahren zu ihrer Herstellung
EP3024049A1 (en) 2014-11-18 2016-05-25 Heraeus Deutschland GmbH & Co. KG Fluorinated aromatic small molecules as functional additives for dispersion of conductive polymers
EP3067948A1 (en) 2015-03-09 2016-09-14 Heraeus Deutschland GmbH & Co. KG Conductive polymer in organic solvent with fluorinated compound

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* Cited by examiner, † Cited by third party
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JP2009037813A (ja) * 2007-07-31 2009-02-19 Sumitomo Chemical Co Ltd 有機ｅｌ装置の製造方法
JP5185598B2 (ja) * 2007-11-06 2013-04-17 株式会社ジャパンディスプレイイースト 有機ｅｌ表示装置およびその製造方法
WO2011001492A1 (ja) * 2009-06-29 2011-01-06 富士電機ホールディングス株式会社 有機ｅｌ素子用封止膜、有機ｅｌ素子および有機ｅｌディスプレイ
KR101107180B1 (ko) * 2009-11-10 2012-01-25 삼성모바일디스플레이주식회사 유기 발광 표시 장치 및 그 제조 방법
US20120028011A1 (en) * 2010-07-27 2012-02-02 Chong Pyung An Self-passivating mechanically stable hermetic thin film
KR101929980B1 (ko) * 2012-03-23 2018-12-18 삼성디스플레이 주식회사 유기 발광 표시 장치
EP2685515A1 (en) * 2012-07-12 2014-01-15 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Method and system for dividing a barrier foil
JP6182909B2 (ja) * 2013-03-05 2017-08-23 株式会社リコー 有機ｅｌ発光装置の製造方法
JP6570638B2 (ja) * 2015-08-12 2019-09-04 富士フイルム株式会社 積層フィルム
KR102568779B1 (ko) * 2016-05-30 2023-08-22 삼성디스플레이 주식회사 디스플레이 장치
WO2018190010A1 (ja) * 2017-04-11 2018-10-18 コニカミノルタ株式会社 有機エレクトロルミネッセンス素子
CN107104199A (zh) * 2017-04-19 2017-08-29 武汉华星光电技术有限公司 显示面板及其制造方法
JP2018198180A (ja) * 2017-05-24 2018-12-13 コニカミノルタ株式会社 有機エレクトロルミネッセンス素子
CN110079778B (zh) * 2019-05-06 2021-07-06 成都精密光学工程研究中心 低缺陷光学薄膜制备方法及其制品
CN110444568A (zh) * 2019-07-31 2019-11-12 武汉华星光电半导体显示技术有限公司 有机发光二极管显示面板及其制作方法、显示装置

Citations (10)

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Publication number Priority date Publication date Assignee Title
JPH08111286A (ja) * 1994-10-07 1996-04-30 Tdk Corp 有機エレクトロルミネセンス素子の製法
JPH10261487A (ja) * 1997-03-18 1998-09-29 Sanyo Electric Co Ltd 有機エレクトロルミネッセンス素子及びその製造方法
JP2002033186A (ja) * 2000-07-17 2002-01-31 Stanley Electric Co Ltd 有機発光素子
JP2002134270A (ja) * 2000-10-27 2002-05-10 Matsushita Electric Works Ltd 有機電界発光素子
JP2004247079A (ja) * 2003-02-12 2004-09-02 Dainippon Printing Co Ltd 有機ｅｌ素子のバリア層の形成方法および有機ｅｌ素子の製造方法
JP2004356095A (ja) * 2003-05-28 2004-12-16 Samsung Sdi Co Ltd 平板表示装置及びその製造方法
JP2005126791A (ja) * 2003-10-24 2005-05-19 Seiko Epson Corp 成膜方法および成膜装置
WO2007037358A1 (ja) * 2005-09-29 2007-04-05 Matsushita Electric Industrial Co., Ltd. 有機ｅｌディスプレイおよびその製造方法
JP2007157606A (ja) * 2005-12-08 2007-06-21 Seiko Epson Corp 発光装置、発光装置の製造方法、及び電子機器
JP2007273274A (ja) * 2006-03-31 2007-10-18 Canon Inc 有機ｅｌ素子及びその製造方法

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JP3847496B2 (ja) * 1999-09-16 2006-11-22 パナソニック コミュニケーションズ株式会社 電子デバイス及びその製造方法
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JP2004119317A (ja) * 2002-09-27 2004-04-15 Toshiba Corp 有機エレクトロルミネッセンス表示装置
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JP2005322464A (ja) * 2004-05-07 2005-11-17 Canon Inc 有機ｅｌ素子
JP2008108652A (ja) * 2006-10-27 2008-05-08 Canon Inc 有機デバイスの製造方法および有機デバイス
JP4776556B2 (ja) * 2007-01-26 2011-09-21 株式会社アルバック 有機ｅｌ素子、有機ｅｌ素子の製造方法

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08111286A (ja) * 1994-10-07 1996-04-30 Tdk Corp 有機エレクトロルミネセンス素子の製法
JPH10261487A (ja) * 1997-03-18 1998-09-29 Sanyo Electric Co Ltd 有機エレクトロルミネッセンス素子及びその製造方法
JP2002033186A (ja) * 2000-07-17 2002-01-31 Stanley Electric Co Ltd 有機発光素子
JP2002134270A (ja) * 2000-10-27 2002-05-10 Matsushita Electric Works Ltd 有機電界発光素子
JP2004247079A (ja) * 2003-02-12 2004-09-02 Dainippon Printing Co Ltd 有機ｅｌ素子のバリア層の形成方法および有機ｅｌ素子の製造方法
JP2004356095A (ja) * 2003-05-28 2004-12-16 Samsung Sdi Co Ltd 平板表示装置及びその製造方法
JP2005126791A (ja) * 2003-10-24 2005-05-19 Seiko Epson Corp 成膜方法および成膜装置
WO2007037358A1 (ja) * 2005-09-29 2007-04-05 Matsushita Electric Industrial Co., Ltd. 有機ｅｌディスプレイおよびその製造方法
JP2007157606A (ja) * 2005-12-08 2007-06-21 Seiko Epson Corp 発光装置、発光装置の製造方法、及び電子機器
JP2007273274A (ja) * 2006-03-31 2007-10-18 Canon Inc 有機ｅｌ素子及びその製造方法

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012143109A1 (en) 2011-04-21 2012-10-26 Heraeus Precious Metals Gmbh & Co. Kg Fluorinated amines as sam in oleds
WO2013010661A1 (en) 2011-07-19 2013-01-24 Heraeus Precious Metals Gmbh & Co. Kg. Sam layers with an htl function
CN102534511A (zh) * 2012-02-28 2012-07-04 东北大学 一种气相沉积薄膜的装置及其使用方法
CN102534511B (zh) * 2012-02-28 2013-10-16 东北大学 一种气相沉积薄膜的装置及其使用方法
DE102013005763A1 (de) 2013-04-05 2014-10-09 Heraeus Precious Metals Gmbh & Co. Kg Transparente Schichten mit hoher Leitfähigkeit und hoher Effizienz in OLEDs und Verfahren zu ihrer Herstellung
EP3024049A1 (en) 2014-11-18 2016-05-25 Heraeus Deutschland GmbH & Co. KG Fluorinated aromatic small molecules as functional additives for dispersion of conductive polymers
EP3886194A2 (en) 2014-11-18 2021-09-29 Heraeus Deutschland GmbH & Co KG Fluorinated aromatic small molecules as functional additives for dispersion of conductive polymers
EP3067948A1 (en) 2015-03-09 2016-09-14 Heraeus Deutschland GmbH & Co. KG Conductive polymer in organic solvent with fluorinated compound

Also Published As

Publication number Publication date
US20100227422A1 (en) 2010-09-09
CN101772989A (zh) 2010-07-07
JP2009037811A (ja) 2009-02-19
GB2464636B (en) 2011-12-28
DE112008002067T5 (de) 2010-09-02
US8278126B2 (en) 2012-10-02
KR20100055394A (ko) 2010-05-26
GB2464636A (en) 2010-04-28
TW200915914A (en) 2009-04-01
GB201001529D0 (en) 2010-03-17

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