WO2002059050A8 - A method and a device for measurement in a process for manufacturing a planar glass coating - Google Patents
A method and a device for measurement in a process for manufacturing a planar glass coatingInfo
- Publication number
- WO2002059050A8 WO2002059050A8 PCT/FI2002/000012 FI0200012W WO02059050A8 WO 2002059050 A8 WO2002059050 A8 WO 2002059050A8 FI 0200012 W FI0200012 W FI 0200012W WO 02059050 A8 WO02059050 A8 WO 02059050A8
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- aerosol particles
- substrate
- measurement
- planar glass
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/132—Integrated optical circuits characterised by the manufacturing method by deposition of thin films
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
- C03B19/1423—Reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/34—Liquid, e.g. mist or aerosol
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/46—Comprising performance enhancing means, e.g. electrostatic charge or built-in heater
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Glass (AREA)
- Coating Apparatus (AREA)
Abstract
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI20010036 | 2001-01-09 | ||
| FI20010036A FI112648B (en) | 2001-01-09 | 2001-01-09 | Measurement method and measuring device in the manufacturing process of a flat glass surface coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2002059050A1 WO2002059050A1 (en) | 2002-08-01 |
| WO2002059050A8 true WO2002059050A8 (en) | 2003-10-30 |
Family
ID=8559921
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/FI2002/000012 Ceased WO2002059050A1 (en) | 2001-01-09 | 2002-01-08 | A method and a device for measurement in a process for manufacturing a planar glass coating |
Country Status (2)
| Country | Link |
|---|---|
| FI (1) | FI112648B (en) |
| WO (1) | WO2002059050A1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009030234A1 (en) * | 2009-06-23 | 2010-12-30 | J-Plasma Gmbh | Process for the production of glass, in particular Glaspreform and Smoker for its production |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5844361A (en) * | 1981-09-11 | 1983-03-15 | Toshiba Corp | Measuring device for electrostatic change on pulverulent body |
| EP0157003B1 (en) * | 1984-02-10 | 1988-11-23 | Präzisions-Werkzeuge AG | Method of measuring the quantity of particle coating on a metallic body to be coated with said particle coating, device for carrying out the method, and its application |
| US5296255A (en) * | 1992-02-14 | 1994-03-22 | The Regents Of The University Of Michigan | In-situ monitoring, and growth of thin films by means of selected area CVD |
-
2001
- 2001-01-09 FI FI20010036A patent/FI112648B/en not_active IP Right Cessation
-
2002
- 2002-01-08 WO PCT/FI2002/000012 patent/WO2002059050A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| FI20010036A0 (en) | 2001-01-09 |
| FI20010036L (en) | 2002-07-10 |
| FI112648B (en) | 2003-12-31 |
| WO2002059050A1 (en) | 2002-08-01 |
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Legal Events
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| 121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
| DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
| CFP | Corrected version of a pamphlet front page | ||
| CR1 | Correction of entry in section i |
Free format text: IN PCT GAZETTE 31/2002 DUE TO A TECHNICAL PROBLEM AT THE TIME OF INTERNATIONAL PUBLICATION, SOME INFORMATION WAS MISSING (81). THE MISSING INFORMATION NOW APPEARS IN THE CORRECTED VERSION. Free format text: IN PCT GAZETTE 31/2002 DUE TO A TECHNICAL PROBLEM AT THE TIME OF INTERNATIONAL PUBLICATION, SOME INFORMATION WAS MISSING (81). THE MISSING INFORMATION NOW APPEARS IN THE CORRECTED VERSION. |
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| 122 | Ep: pct application non-entry in european phase | ||
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