USD406113S - Processing tube for use in a semiconductor wafer heat processing apparatus - Google Patents
Processing tube for use in a semiconductor wafer heat processing apparatus Download PDFInfo
- Publication number
- USD406113S USD406113S US29/074,293 US7429397F USD406113S US D406113 S USD406113 S US D406113S US 7429397 F US7429397 F US 7429397F US D406113 S USD406113 S US D406113S
- Authority
- US
- United States
- Prior art keywords
- semiconductor wafer
- wafer heat
- processing apparatus
- tube
- heat processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 title claims description 3
Images
Description
FIG. 1 a perspective view of a processing tube for use in a semiconductor wafer heat processing apparatus;
FIG. 2 a front elevational view thereof;
FIG. 3 a top plan view thereof;
FIG. 4 a bottom plan view thereof;
FIG. 5 a cross sectional view thereof taken along line V--V in FIG. 2;
FIG. 6 a rear elevational view thereof;
FIG. 7 a left side view thereof;
FIG. 8 a right side view thereof;
FIG. 9 a cross sectional view thereof taken along line IX--IX in FIG. 3; and,
FIG. 10 a cross sectional view thereof taken along line X--X in FIG. 3.
Claims (1)
- I claim the ornamental design for processing tube for use in a semiconductor wafer heat processing apparatus, as shown and described.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP264497 | 1997-01-31 | ||
| JP9-2644 | 1997-01-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USD406113S true USD406113S (en) | 1999-02-23 |
Family
ID=71617114
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/074,293 Expired - Lifetime USD406113S (en) | 1997-01-31 | 1997-07-24 | Processing tube for use in a semiconductor wafer heat processing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | USD406113S (en) |
Cited By (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD586768S1 (en) * | 2006-10-12 | 2009-02-17 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD590359S1 (en) * | 2006-02-20 | 2009-04-14 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers or the like |
| USD594488S1 (en) * | 2007-04-20 | 2009-06-16 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD600659S1 (en) * | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD610559S1 (en) * | 2008-05-30 | 2010-02-23 | Hitachi Kokusai Electric, Inc. | Reaction tube |
| USD619630S1 (en) * | 2007-05-08 | 2010-07-13 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD711843S1 (en) * | 2013-06-28 | 2014-08-26 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD719114S1 (en) * | 2013-06-28 | 2014-12-09 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD720309S1 (en) * | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| USD720308S1 (en) * | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| USD720707S1 (en) * | 2013-06-28 | 2015-01-06 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD724551S1 (en) * | 2011-11-18 | 2015-03-17 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| USD725053S1 (en) * | 2011-11-18 | 2015-03-24 | Tokyo Electron Limited | Outer tube for process tube for manufacturing semiconductor wafers |
| USD725055S1 (en) * | 2013-06-28 | 2015-03-24 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD739832S1 (en) * | 2013-06-28 | 2015-09-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD742339S1 (en) * | 2014-03-12 | 2015-11-03 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD748594S1 (en) * | 2014-03-12 | 2016-02-02 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD770993S1 (en) * | 2015-09-04 | 2016-11-08 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD772824S1 (en) * | 2015-02-25 | 2016-11-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD790490S1 (en) * | 2015-09-04 | 2017-06-27 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD791090S1 (en) * | 2015-09-04 | 2017-07-04 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD842824S1 (en) * | 2017-08-09 | 2019-03-12 | Kokusai Electric Corporation | Reaction tube |
| USD842823S1 (en) * | 2017-08-10 | 2019-03-12 | Kokusai Electric Corporation | Reaction tube |
| USD853979S1 (en) * | 2017-12-27 | 2019-07-16 | Kokusai Electric Corporation | Reaction tube |
| USD901406S1 (en) * | 2019-03-20 | 2020-11-10 | Kokusai Electric Corporation | Inner tube of reactor for semiconductor fabrication |
| USD931823S1 (en) * | 2020-01-29 | 2021-09-28 | Kokusai Electric Corporation | Reaction tube |
| USD1053156S1 (en) * | 2022-03-15 | 2024-12-03 | Kokusai Electric Corporation | Furnace for substrate processing apparatus |
| USD1070797S1 (en) * | 2022-03-15 | 2025-04-15 | Kokusai Electric Corporation | Furnace for substrate processing apparatus |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4587689A (en) * | 1983-01-12 | 1986-05-13 | Minoru Nakamura | Meat packing apparatus |
| US5046909A (en) * | 1989-06-29 | 1991-09-10 | Applied Materials, Inc. | Method and apparatus for handling semiconductor wafers |
| US5314574A (en) * | 1992-06-26 | 1994-05-24 | Tokyo Electron Kabushiki Kaisha | Surface treatment method and apparatus |
| US5320218A (en) * | 1992-04-07 | 1994-06-14 | Shinko Electric Co., Ltd. | Closed container to be used in a clean room |
| US5407449A (en) * | 1992-03-10 | 1995-04-18 | Asm International N.V. | Device for treating micro-circuit wafers |
| US5516732A (en) * | 1992-12-04 | 1996-05-14 | Sony Corporation | Wafer processing machine vacuum front end method and apparatus |
| US5518360A (en) * | 1990-11-16 | 1996-05-21 | Kabushiki-Kaisha Watanabe Shoko | Wafer carrying device and wafer carrying method |
| US5536128A (en) * | 1988-10-21 | 1996-07-16 | Hitachi, Ltd. | Method and apparatus for carrying a variety of products |
| US5658115A (en) * | 1991-09-05 | 1997-08-19 | Hitachi, Ltd. | Transfer apparatus |
| US5752796A (en) * | 1996-01-24 | 1998-05-19 | Muka; Richard S. | Vacuum integrated SMIF system |
-
1997
- 1997-07-24 US US29/074,293 patent/USD406113S/en not_active Expired - Lifetime
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4587689A (en) * | 1983-01-12 | 1986-05-13 | Minoru Nakamura | Meat packing apparatus |
| US5536128A (en) * | 1988-10-21 | 1996-07-16 | Hitachi, Ltd. | Method and apparatus for carrying a variety of products |
| US5046909A (en) * | 1989-06-29 | 1991-09-10 | Applied Materials, Inc. | Method and apparatus for handling semiconductor wafers |
| US5518360A (en) * | 1990-11-16 | 1996-05-21 | Kabushiki-Kaisha Watanabe Shoko | Wafer carrying device and wafer carrying method |
| US5658115A (en) * | 1991-09-05 | 1997-08-19 | Hitachi, Ltd. | Transfer apparatus |
| US5407449A (en) * | 1992-03-10 | 1995-04-18 | Asm International N.V. | Device for treating micro-circuit wafers |
| US5320218A (en) * | 1992-04-07 | 1994-06-14 | Shinko Electric Co., Ltd. | Closed container to be used in a clean room |
| US5314574A (en) * | 1992-06-26 | 1994-05-24 | Tokyo Electron Kabushiki Kaisha | Surface treatment method and apparatus |
| US5516732A (en) * | 1992-12-04 | 1996-05-14 | Sony Corporation | Wafer processing machine vacuum front end method and apparatus |
| US5752796A (en) * | 1996-01-24 | 1998-05-19 | Muka; Richard S. | Vacuum integrated SMIF system |
Cited By (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD590359S1 (en) * | 2006-02-20 | 2009-04-14 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers or the like |
| USD600659S1 (en) * | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD586768S1 (en) * | 2006-10-12 | 2009-02-17 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD594488S1 (en) * | 2007-04-20 | 2009-06-16 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD619630S1 (en) * | 2007-05-08 | 2010-07-13 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD610559S1 (en) * | 2008-05-30 | 2010-02-23 | Hitachi Kokusai Electric, Inc. | Reaction tube |
| USD724551S1 (en) * | 2011-11-18 | 2015-03-17 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| USD725053S1 (en) * | 2011-11-18 | 2015-03-24 | Tokyo Electron Limited | Outer tube for process tube for manufacturing semiconductor wafers |
| USD720309S1 (en) * | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| USD720308S1 (en) * | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| USD739832S1 (en) * | 2013-06-28 | 2015-09-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD719114S1 (en) * | 2013-06-28 | 2014-12-09 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD725055S1 (en) * | 2013-06-28 | 2015-03-24 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD711843S1 (en) * | 2013-06-28 | 2014-08-26 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD720707S1 (en) * | 2013-06-28 | 2015-01-06 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD742339S1 (en) * | 2014-03-12 | 2015-11-03 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD748594S1 (en) * | 2014-03-12 | 2016-02-02 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD772824S1 (en) * | 2015-02-25 | 2016-11-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD790490S1 (en) * | 2015-09-04 | 2017-06-27 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD770993S1 (en) * | 2015-09-04 | 2016-11-08 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD791090S1 (en) * | 2015-09-04 | 2017-07-04 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD842824S1 (en) * | 2017-08-09 | 2019-03-12 | Kokusai Electric Corporation | Reaction tube |
| USD842823S1 (en) * | 2017-08-10 | 2019-03-12 | Kokusai Electric Corporation | Reaction tube |
| USD853979S1 (en) * | 2017-12-27 | 2019-07-16 | Kokusai Electric Corporation | Reaction tube |
| USD901406S1 (en) * | 2019-03-20 | 2020-11-10 | Kokusai Electric Corporation | Inner tube of reactor for semiconductor fabrication |
| USD931823S1 (en) * | 2020-01-29 | 2021-09-28 | Kokusai Electric Corporation | Reaction tube |
| USD1053156S1 (en) * | 2022-03-15 | 2024-12-03 | Kokusai Electric Corporation | Furnace for substrate processing apparatus |
| USD1070797S1 (en) * | 2022-03-15 | 2025-04-15 | Kokusai Electric Corporation | Furnace for substrate processing apparatus |
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