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USD711843S1 - Reaction tube - Google Patents

Reaction tube Download PDF

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Publication number
USD711843S1
USD711843S1 US29/477,766 US201329477766F USD711843S US D711843 S1 USD711843 S1 US D711843S1 US 201329477766 F US201329477766 F US 201329477766F US D711843 S USD711843 S US D711843S
Authority
US
United States
Prior art keywords
reaction tube
view
elevational view
reaction
ornamental design
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/477,766
Inventor
Keishin Yamazaki
Masahiro Miyake
Kosuke Takagi
Yasuaki Komae
Shinya Morita
Naonori Akae
Masato Terasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Hitachi Kokusai Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Kokusai Electric Inc filed Critical Hitachi Kokusai Electric Inc
Assigned to HITACHI KOKUSAI ELECTRIC INC. reassignment HITACHI KOKUSAI ELECTRIC INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: AKAE, NAONORI, KOMAE, YASUAKI, MIYAKE, MASAHIRO, MORITA, SHINYA, TAKAGI, KOSUKE, TERASAKI, MASATO, YAMAZAKI, KEISHIN
Application granted granted Critical
Publication of USD711843S1 publication Critical patent/USD711843S1/en
Assigned to Kokusai Electric Corporation reassignment Kokusai Electric Corporation ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: HITACHI KOKUSAI ELECTRIC INC.
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Description

FIG. 1 is a front, top, right side perspective view of a reaction tube showing our new design;
FIG. 2 is a rear, bottom and left side perspective view thereof;
FIG. 3 is a front elevational view thereof;
FIG. 4 is a rear elevational view thereof;
FIG. 5 is a left side elevational view thereof;
FIG. 6 is a right side elevational view thereof;
FIG. 7 is a top plan view thereof;
FIG. 8 is a bottom plan view thereof; and,
FIG. 9 is a cross-sectional view taken along line 9-9 in FIG. 3.
The broken lines shown in the drawings represent portions of the reaction tube that form no part of the claimed design.

Claims (1)

    CLAIM
  1. We claim the ornamental design for a reaction tube, as shown and described.
US29/477,766 2013-06-28 2013-12-26 Reaction tube Active USD711843S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013-014831 2013-06-28
JP2013014831 2013-06-28

Publications (1)

Publication Number Publication Date
USD711843S1 true USD711843S1 (en) 2014-08-26

Family

ID=51359017

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/477,766 Active USD711843S1 (en) 2013-06-28 2013-12-26 Reaction tube

Country Status (2)

Country Link
US (1) USD711843S1 (en)
TW (1) TWD167986S (en)

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD770993S1 (en) * 2015-09-04 2016-11-08 Hitachi Kokusai Electric Inc. Reaction tube
USD772824S1 (en) * 2015-02-25 2016-11-29 Hitachi Kokusai Electric Inc. Reaction tube
USD778458S1 (en) * 2015-02-23 2017-02-07 Hitachi Kokusai Electric Inc. Reaction tube
USD790490S1 (en) * 2015-09-04 2017-06-27 Hitachi Kokusai Electric Inc. Reaction tube
USD791090S1 (en) * 2015-09-04 2017-07-04 Hitachi Kokusai Electric Inc. Reaction tube
USD842823S1 (en) * 2017-08-10 2019-03-12 Kokusai Electric Corporation Reaction tube
USD842824S1 (en) * 2017-08-09 2019-03-12 Kokusai Electric Corporation Reaction tube
USD843958S1 (en) * 2017-08-10 2019-03-26 Kokusai Electric Corporation Reaction tube
USD853979S1 (en) * 2017-12-27 2019-07-16 Kokusai Electric Corporation Reaction tube
USD901406S1 (en) * 2019-03-20 2020-11-10 Kokusai Electric Corporation Inner tube of reactor for semiconductor fabrication
USD926963S1 (en) * 2012-05-15 2021-08-03 Airius Ip Holdings, Llc Air moving device
US11092330B2 (en) 2013-12-19 2021-08-17 Airius Ip Holdings, Llc Columnar air moving devices, systems and methods
US11105341B2 (en) 2016-06-24 2021-08-31 Airius Ip Holdings, Llc Air moving device
USD931823S1 (en) * 2020-01-29 2021-09-28 Kokusai Electric Corporation Reaction tube
US11221153B2 (en) 2013-12-19 2022-01-11 Airius Ip Holdings, Llc Columnar air moving devices, systems and methods
US11236766B2 (en) 2014-06-06 2022-02-01 Airius Ip Holdings Llc Columnar air moving devices, systems and methods
US11365743B2 (en) 2004-03-15 2022-06-21 Airius Ip Holdings, Llc Temperature destratification systems
US11598539B2 (en) 2019-04-17 2023-03-07 Airius Ip Holdings, Llc Air moving device with bypass intake
USD987054S1 (en) 2019-03-19 2023-05-23 Airius Ip Holdings, Llc Air moving device
USD1019581S1 (en) * 2022-05-30 2024-03-26 Kokusai Electric Corporation Inner tube of reaction tube for semiconductor manufacturing equipment
USD1019582S1 (en) * 2022-05-30 2024-03-26 Kokusai Electric Corporation Inner tube of reaction tube for semiconductor manufacturing equipment
USD1019583S1 (en) * 2022-05-30 2024-03-26 Kokusai Electric Corporation Inner tube of reaction tube for semiconductor manufacturing equipment
USD1053156S1 (en) * 2022-03-15 2024-12-03 Kokusai Electric Corporation Furnace for substrate processing apparatus
USD1070797S1 (en) * 2022-03-15 2025-04-15 Kokusai Electric Corporation Furnace for substrate processing apparatus

Citations (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD404368S (en) * 1997-08-20 1999-01-19 Tokyo Electron Limited Outer tube for use in a semiconductor wafer heat processing apparatus
USD405062S (en) * 1997-08-20 1999-02-02 Tokyo Electron Ltd. Processing tube for use in a semiconductor wafer heat processing apparatus
USD405430S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Inner tube for use in a semiconductor wafer heat processing apparatus
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD406113S (en) * 1997-01-31 1999-02-23 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD407696S (en) * 1997-08-20 1999-04-06 Tokyo Electron Limited Inner tube for use in a semiconductor wafer heat processing apparatus
USD417438S (en) * 1997-01-31 1999-12-07 Tokyo Electron Limited Quartz outer tube
USD423463S (en) * 1997-01-31 2000-04-25 Tokyo Electron Limited Quartz process tube
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
USD520467S1 (en) * 2003-11-04 2006-05-09 Tokyo Electron Limited Process tube for semiconductor device manufacturing apparatus
US20080090195A1 (en) * 2006-10-13 2008-04-17 Tokyo Electron Limited Heat treatment apparatus
USD586768S1 (en) * 2006-10-12 2009-02-17 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD594488S1 (en) * 2007-04-20 2009-06-16 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
US20090194521A1 (en) * 2008-01-31 2009-08-06 Tokyo Electron Limited Thermal processing furnace
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
US20090250005A1 (en) * 2008-04-03 2009-10-08 Tokyo Electron Limited Reaction tube and heat processing apparatus for a semiconductor process
USD610559S1 (en) 2008-05-30 2010-02-23 Hitachi Kokusai Electric, Inc. Reaction tube
USD611013S1 (en) * 2008-03-28 2010-03-02 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD618638S1 (en) * 2008-05-09 2010-06-29 Hitachi Kokusai Electric, Inc. Reaction tube
USD655258S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Side wall for reactor for manufacturing semiconductor
USD655262S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Side wall for reactor for manufacturing semiconductor
USD655255S1 (en) * 2010-06-18 2012-03-06 Hitachi Kokusai Electric Inc. Boat of wafer processing apparatus
USD655682S1 (en) * 2010-06-18 2012-03-13 Hitachi Kokusai Electric Inc. Boat of wafer processing apparatus
USD661265S1 (en) * 2010-05-19 2012-06-05 Nippon Mektron, Ltd. Flexible printed circuit board

Patent Citations (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD405430S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Inner tube for use in a semiconductor wafer heat processing apparatus
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD406113S (en) * 1997-01-31 1999-02-23 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD417438S (en) * 1997-01-31 1999-12-07 Tokyo Electron Limited Quartz outer tube
USD423463S (en) * 1997-01-31 2000-04-25 Tokyo Electron Limited Quartz process tube
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
USD404368S (en) * 1997-08-20 1999-01-19 Tokyo Electron Limited Outer tube for use in a semiconductor wafer heat processing apparatus
USD405062S (en) * 1997-08-20 1999-02-02 Tokyo Electron Ltd. Processing tube for use in a semiconductor wafer heat processing apparatus
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
USD407696S (en) * 1997-08-20 1999-04-06 Tokyo Electron Limited Inner tube for use in a semiconductor wafer heat processing apparatus
USD520467S1 (en) * 2003-11-04 2006-05-09 Tokyo Electron Limited Process tube for semiconductor device manufacturing apparatus
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD586768S1 (en) * 2006-10-12 2009-02-17 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
US20080090195A1 (en) * 2006-10-13 2008-04-17 Tokyo Electron Limited Heat treatment apparatus
USD594488S1 (en) * 2007-04-20 2009-06-16 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
US20090194521A1 (en) * 2008-01-31 2009-08-06 Tokyo Electron Limited Thermal processing furnace
USD611013S1 (en) * 2008-03-28 2010-03-02 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
US20090250005A1 (en) * 2008-04-03 2009-10-08 Tokyo Electron Limited Reaction tube and heat processing apparatus for a semiconductor process
USD618638S1 (en) * 2008-05-09 2010-06-29 Hitachi Kokusai Electric, Inc. Reaction tube
USD610559S1 (en) 2008-05-30 2010-02-23 Hitachi Kokusai Electric, Inc. Reaction tube
USD661265S1 (en) * 2010-05-19 2012-06-05 Nippon Mektron, Ltd. Flexible printed circuit board
USD655255S1 (en) * 2010-06-18 2012-03-06 Hitachi Kokusai Electric Inc. Boat of wafer processing apparatus
USD655682S1 (en) * 2010-06-18 2012-03-13 Hitachi Kokusai Electric Inc. Boat of wafer processing apparatus
USD655258S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Side wall for reactor for manufacturing semiconductor
USD655262S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Side wall for reactor for manufacturing semiconductor

Cited By (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12085084B2 (en) 2004-03-15 2024-09-10 Airius Ip Holdings, Llc Temperature destratification systems
US11703062B2 (en) 2004-03-15 2023-07-18 Airius Ip Holdings, Llc Temperature destratification systems
US11365743B2 (en) 2004-03-15 2022-06-21 Airius Ip Holdings, Llc Temperature destratification systems
USD926963S1 (en) * 2012-05-15 2021-08-03 Airius Ip Holdings, Llc Air moving device
US11221153B2 (en) 2013-12-19 2022-01-11 Airius Ip Holdings, Llc Columnar air moving devices, systems and methods
US11092330B2 (en) 2013-12-19 2021-08-17 Airius Ip Holdings, Llc Columnar air moving devices, systems and methods
US11713773B2 (en) 2014-06-06 2023-08-01 Airius Ip Holdings, Llc Columnar air moving devices, systems and methods
US11236766B2 (en) 2014-06-06 2022-02-01 Airius Ip Holdings Llc Columnar air moving devices, systems and methods
USD778458S1 (en) * 2015-02-23 2017-02-07 Hitachi Kokusai Electric Inc. Reaction tube
USD772824S1 (en) * 2015-02-25 2016-11-29 Hitachi Kokusai Electric Inc. Reaction tube
USD791090S1 (en) * 2015-09-04 2017-07-04 Hitachi Kokusai Electric Inc. Reaction tube
USD770993S1 (en) * 2015-09-04 2016-11-08 Hitachi Kokusai Electric Inc. Reaction tube
USD790490S1 (en) * 2015-09-04 2017-06-27 Hitachi Kokusai Electric Inc. Reaction tube
US11421710B2 (en) 2016-06-24 2022-08-23 Airius Ip Holdings, Llc Air moving device
US11105341B2 (en) 2016-06-24 2021-08-31 Airius Ip Holdings, Llc Air moving device
USD842824S1 (en) * 2017-08-09 2019-03-12 Kokusai Electric Corporation Reaction tube
USD842823S1 (en) * 2017-08-10 2019-03-12 Kokusai Electric Corporation Reaction tube
USD843958S1 (en) * 2017-08-10 2019-03-26 Kokusai Electric Corporation Reaction tube
USD853979S1 (en) * 2017-12-27 2019-07-16 Kokusai Electric Corporation Reaction tube
USD987054S1 (en) 2019-03-19 2023-05-23 Airius Ip Holdings, Llc Air moving device
USD901406S1 (en) * 2019-03-20 2020-11-10 Kokusai Electric Corporation Inner tube of reactor for semiconductor fabrication
US11598539B2 (en) 2019-04-17 2023-03-07 Airius Ip Holdings, Llc Air moving device with bypass intake
US11781761B1 (en) 2019-04-17 2023-10-10 Airius Ip Holdings, Llc Air moving device with bypass intake
US12259156B2 (en) 2019-04-17 2025-03-25 Airius Ip Holdings, Llc Air moving device with bypass intake
USD931823S1 (en) * 2020-01-29 2021-09-28 Kokusai Electric Corporation Reaction tube
USD1053156S1 (en) * 2022-03-15 2024-12-03 Kokusai Electric Corporation Furnace for substrate processing apparatus
USD1070797S1 (en) * 2022-03-15 2025-04-15 Kokusai Electric Corporation Furnace for substrate processing apparatus
USD1019581S1 (en) * 2022-05-30 2024-03-26 Kokusai Electric Corporation Inner tube of reaction tube for semiconductor manufacturing equipment
USD1019582S1 (en) * 2022-05-30 2024-03-26 Kokusai Electric Corporation Inner tube of reaction tube for semiconductor manufacturing equipment
USD1019583S1 (en) * 2022-05-30 2024-03-26 Kokusai Electric Corporation Inner tube of reaction tube for semiconductor manufacturing equipment

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Publication number Publication date
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