USD790490S1 - Reaction tube - Google Patents
Reaction tube Download PDFInfo
- Publication number
- USD790490S1 USD790490S1 US29/556,684 US201629556684F USD790490S US D790490 S1 USD790490 S1 US D790490S1 US 201629556684 F US201629556684 F US 201629556684F US D790490 S USD790490 S US D790490S
- Authority
- US
- United States
- Prior art keywords
- reaction tube
- view
- along line
- cross sectional
- design
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
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Description
The dashed-dot-dashed lines represent the boundary lines of the claimed design.
The broken lines shown in the drawings represent portions of the reaction tube that form no part of the claimed design.
Claims (1)
- The ornamental design for a reaction tube, as shown and described.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015/019681 | 2015-09-04 | ||
| JPD2015-19681F JP1548462S (en) | 2015-09-04 | 2015-09-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USD790490S1 true USD790490S1 (en) | 2017-06-27 |
Family
ID=55761951
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/556,684 Active USD790490S1 (en) | 2015-09-04 | 2016-03-02 | Reaction tube |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD790490S1 (en) |
| JP (1) | JP1548462S (en) |
| TW (1) | TWD177637S (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD825502S1 (en) * | 2016-10-14 | 2018-08-14 | Hitachi Kokusai Electric Inc. | Heater for substrate processing apparatus |
| USD843958S1 (en) * | 2017-08-10 | 2019-03-26 | Kokusai Electric Corporation | Reaction tube |
| US11542601B2 (en) * | 2016-02-09 | 2023-01-03 | Hitachi Kokusai Electric Inc. | Substrate processing apparatus and method of manufacturing semiconductor device |
| USD1053156S1 (en) * | 2022-03-15 | 2024-12-03 | Kokusai Electric Corporation | Furnace for substrate processing apparatus |
| USD1070797S1 (en) * | 2022-03-15 | 2025-04-15 | Kokusai Electric Corporation | Furnace for substrate processing apparatus |
Citations (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4950870A (en) * | 1987-11-21 | 1990-08-21 | Tel Sagami Limited | Heat-treating apparatus |
| USD405062S (en) * | 1997-08-20 | 1999-02-02 | Tokyo Electron Ltd. | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD405431S (en) * | 1997-08-20 | 1999-02-09 | Tokyo Electron Ltd. | Tube for use in a semiconductor wafer heat processing apparatus |
| USD405429S (en) * | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD406113S (en) * | 1997-01-31 | 1999-02-23 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| US5948300A (en) * | 1997-09-12 | 1999-09-07 | Kokusai Bti Corporation | Process tube with in-situ gas preheating |
| USD417438S (en) * | 1997-01-31 | 1999-12-07 | Tokyo Electron Limited | Quartz outer tube |
| USD423463S (en) * | 1997-01-31 | 2000-04-25 | Tokyo Electron Limited | Quartz process tube |
| USD424024S (en) * | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube |
| US6251189B1 (en) * | 1999-02-18 | 2001-06-26 | Kokusai Electric Co., Ltd. | Substrate processing apparatus and substrate processing method |
| US20030221779A1 (en) * | 2002-03-28 | 2003-12-04 | Kazuyuki Okuda | Substrate processing apparatus |
| US20080083372A1 (en) * | 2006-08-04 | 2008-04-10 | Hisashi Inoue | Heat processing apparatus for semiconductor process |
| USD586768S1 (en) * | 2006-10-12 | 2009-02-17 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| US20090194521A1 (en) * | 2008-01-31 | 2009-08-06 | Tokyo Electron Limited | Thermal processing furnace |
| USD600659S1 (en) * | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| US20090250005A1 (en) * | 2008-04-03 | 2009-10-08 | Tokyo Electron Limited | Reaction tube and heat processing apparatus for a semiconductor process |
| USD610559S1 (en) * | 2008-05-30 | 2010-02-23 | Hitachi Kokusai Electric, Inc. | Reaction tube |
| USD611013S1 (en) * | 2008-03-28 | 2010-03-02 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD618638S1 (en) * | 2008-05-09 | 2010-06-29 | Hitachi Kokusai Electric, Inc. | Reaction tube |
| USD619630S1 (en) * | 2007-05-08 | 2010-07-13 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD711843S1 (en) * | 2013-06-28 | 2014-08-26 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD719114S1 (en) * | 2013-06-28 | 2014-12-09 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD720707S1 (en) * | 2013-06-28 | 2015-01-06 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD725053S1 (en) * | 2011-11-18 | 2015-03-24 | Tokyo Electron Limited | Outer tube for process tube for manufacturing semiconductor wafers |
| USD725055S1 (en) * | 2013-06-28 | 2015-03-24 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD739832S1 (en) * | 2013-06-28 | 2015-09-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD770993S1 (en) * | 2015-09-04 | 2016-11-08 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD772824S1 (en) * | 2015-02-25 | 2016-11-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
-
2015
- 2015-09-04 JP JPD2015-19681F patent/JP1548462S/ja active Active
-
2016
- 2016-02-26 TW TW105300948F patent/TWD177637S/en unknown
- 2016-03-02 US US29/556,684 patent/USD790490S1/en active Active
Patent Citations (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4950870A (en) * | 1987-11-21 | 1990-08-21 | Tel Sagami Limited | Heat-treating apparatus |
| USD405429S (en) * | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD406113S (en) * | 1997-01-31 | 1999-02-23 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD417438S (en) * | 1997-01-31 | 1999-12-07 | Tokyo Electron Limited | Quartz outer tube |
| USD423463S (en) * | 1997-01-31 | 2000-04-25 | Tokyo Electron Limited | Quartz process tube |
| USD424024S (en) * | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube |
| USD405062S (en) * | 1997-08-20 | 1999-02-02 | Tokyo Electron Ltd. | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD405431S (en) * | 1997-08-20 | 1999-02-09 | Tokyo Electron Ltd. | Tube for use in a semiconductor wafer heat processing apparatus |
| US5948300A (en) * | 1997-09-12 | 1999-09-07 | Kokusai Bti Corporation | Process tube with in-situ gas preheating |
| US6251189B1 (en) * | 1999-02-18 | 2001-06-26 | Kokusai Electric Co., Ltd. | Substrate processing apparatus and substrate processing method |
| US20030221779A1 (en) * | 2002-03-28 | 2003-12-04 | Kazuyuki Okuda | Substrate processing apparatus |
| US20080083372A1 (en) * | 2006-08-04 | 2008-04-10 | Hisashi Inoue | Heat processing apparatus for semiconductor process |
| USD600659S1 (en) * | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD586768S1 (en) * | 2006-10-12 | 2009-02-17 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD619630S1 (en) * | 2007-05-08 | 2010-07-13 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| US20090194521A1 (en) * | 2008-01-31 | 2009-08-06 | Tokyo Electron Limited | Thermal processing furnace |
| USD611013S1 (en) * | 2008-03-28 | 2010-03-02 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| US20090250005A1 (en) * | 2008-04-03 | 2009-10-08 | Tokyo Electron Limited | Reaction tube and heat processing apparatus for a semiconductor process |
| USD618638S1 (en) * | 2008-05-09 | 2010-06-29 | Hitachi Kokusai Electric, Inc. | Reaction tube |
| USD610559S1 (en) * | 2008-05-30 | 2010-02-23 | Hitachi Kokusai Electric, Inc. | Reaction tube |
| USD725053S1 (en) * | 2011-11-18 | 2015-03-24 | Tokyo Electron Limited | Outer tube for process tube for manufacturing semiconductor wafers |
| USD711843S1 (en) * | 2013-06-28 | 2014-08-26 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD719114S1 (en) * | 2013-06-28 | 2014-12-09 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD720707S1 (en) * | 2013-06-28 | 2015-01-06 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD725055S1 (en) * | 2013-06-28 | 2015-03-24 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD739832S1 (en) * | 2013-06-28 | 2015-09-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD772824S1 (en) * | 2015-02-25 | 2016-11-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD770993S1 (en) * | 2015-09-04 | 2016-11-08 | Hitachi Kokusai Electric Inc. | Reaction tube |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11542601B2 (en) * | 2016-02-09 | 2023-01-03 | Hitachi Kokusai Electric Inc. | Substrate processing apparatus and method of manufacturing semiconductor device |
| US11952664B2 (en) | 2016-02-09 | 2024-04-09 | Kokusai Electric Corporation | Substrate processing apparatus and method of manufacturing semiconductor device |
| USD825502S1 (en) * | 2016-10-14 | 2018-08-14 | Hitachi Kokusai Electric Inc. | Heater for substrate processing apparatus |
| USD843958S1 (en) * | 2017-08-10 | 2019-03-26 | Kokusai Electric Corporation | Reaction tube |
| USD1053156S1 (en) * | 2022-03-15 | 2024-12-03 | Kokusai Electric Corporation | Furnace for substrate processing apparatus |
| USD1070797S1 (en) * | 2022-03-15 | 2025-04-15 | Kokusai Electric Corporation | Furnace for substrate processing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP1548462S (en) | 2016-04-25 |
| TWD177637S (en) | 2016-08-11 |
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