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TWD232373S - Target for a physical vapor deposition chamber - Google Patents

Target for a physical vapor deposition chamber Download PDF

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Publication number
TWD232373S
TWD232373S TW110303954F TW110303954F TWD232373S TW D232373 S TWD232373 S TW D232373S TW 110303954 F TW110303954 F TW 110303954F TW 110303954 F TW110303954 F TW 110303954F TW D232373 S TWD232373 S TW D232373S
Authority
TW
Taiwan
Prior art keywords
vapor deposition
physical vapor
deposition chamber
target
design
Prior art date
Application number
TW110303954F
Other languages
Chinese (zh)
Inventor
尚恩 拉凡
瑪丹庫瑪 席莫卡麥拉瑞帕
桑達拉潘迪恩拉馬林佳維傑亞拉席米 雷迪
亞文內許 那雅客
竇偉
曹勇
基倫古莫妮拉珊卓拉 沙芬戴亞
李明東
Original Assignee
美商應用材料股份有限公司 (美國)
美商應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商應用材料股份有限公司 (美國), 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司 (美國)
Publication of TWD232373S publication Critical patent/TWD232373S/en

Links

Abstract

【物品用途】;本設計所請求係用於物理氣相沉積腔室的靶材。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。[Use of Article];This design is for a target material used in a physical vapor deposition chamber. ;[Design Description];The dotted line part of the diagram is not the part claimed in this case.

Description

用於物理氣相沉積腔室的靶材 Target materials for physical vapor deposition chambers

本設計所請求係用於物理氣相沉積腔室的靶材。 This design requires a target material for a physical vapor deposition chamber.

圖式所揭露之虛線部分，為本案不主張設計之部分。 The dotted line part in the diagram is the part that this case does not advocate design.

TW110303954F 2021-02-06 2021-07-29 Target for a physical vapor deposition chamber TWD232373S (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/769,610 2021-02-06
US29/769,610 USD1072774S1 (en) 2021-02-06 2021-02-06 Target profile for a physical vapor deposition chamber target

Publications (1)

Publication Number Publication Date
TWD232373S true TWD232373S (en) 2024-07-21

Family

ID=85717867

Family Applications (2)

Application Number Title Priority Date Filing Date
TW111303214F TWD236584S (en) 2021-02-06 2021-07-29 Target for a physical vapor deposition chamber
TW110303954F TWD232373S (en) 2021-02-06 2021-07-29 Target for a physical vapor deposition chamber

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW111303214F TWD236584S (en) 2021-02-06 2021-07-29 Target for a physical vapor deposition chamber

Country Status (3)

Country Link
US (1) USD1072774S1 (en)
JP (2) JP1740484S (en)
TW (2) TWD236584S (en)

Citations (1)

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TWD202101S (en) 2018-03-09 2020-01-11 美商應用材料股份有限公司 Target profile for a physical vapor deposition chamber target

Also Published As

Publication number Publication date
TWD236584S (en) 2025-03-01
USD1072774S1 (en) 2025-04-29
JP1740421S (en) 2023-03-30
JP1740484S (en) 2023-03-30

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