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MX2010003358A - Sistema y metodo de enchapado de aleaciones metalicas usando tecnologia galvanica. - Google Patents

Sistema y metodo de enchapado de aleaciones metalicas usando tecnologia galvanica.

Info

Publication number
MX2010003358A
MX2010003358A MX2010003358A MX2010003358A MX2010003358A MX 2010003358 A MX2010003358 A MX 2010003358A MX 2010003358 A MX2010003358 A MX 2010003358A MX 2010003358 A MX2010003358 A MX 2010003358A MX 2010003358 A MX2010003358 A MX 2010003358A
Authority
MX
Mexico
Prior art keywords
cathode
metal alloys
anode
plating metal
potential difference
Prior art date
Application number
MX2010003358A
Other languages
English (en)
Inventor
Lorenzo Battisti
Original Assignee
Create New Technology S R L
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Create New Technology S R L filed Critical Create New Technology S R L
Publication of MX2010003358A publication Critical patent/MX2010003358A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)

Abstract

La presente invención se refiere a un sistema y un método de enchapado de aleaciones metálicas, así como también a las estructuras obtenidas así. El sistema de enchapado de aleaciones metálicas comprende una celda electrolítica que contiene una solución electrolítica (3) en la cual un ánodo (4, 4a, 4b), un cátodo (5), y una pluralidad de componentes de metal a ser enchapados sobre el cátodo, se sumerge, el ánodo (4, 4a, 4b) y el cátodo (5) se conectan eléctricamente a los medios (6) adaptados para aplicar una diferencia de potencial entre el ánodo (4, 4a, 4b) y el cátodo (5) . La invención se caracteriza porque los medios (6) adaptados para aplicar una diferencia de potencial entre el cátodo (5) y el ánodo (4, 4a, 4b) imponen un valor de diferencia de potencial que cambia con el tiempo de acuerdo con una ley predefinida.
MX2010003358A 2007-10-05 2008-10-03 Sistema y metodo de enchapado de aleaciones metalicas usando tecnologia galvanica. MX2010003358A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT000704A ITTO20070704A1 (it) 2007-10-05 2007-10-05 Sistema e metodo di placcatura di leghe metalliche mediante tecnologia galvanica
PCT/IB2008/002612 WO2009044266A2 (en) 2007-10-05 2008-10-03 System and method of plating metal alloys by using galvanic technology

Publications (1)

Publication Number Publication Date
MX2010003358A true MX2010003358A (es) 2010-06-23

Family

ID=40314127

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2010003358A MX2010003358A (es) 2007-10-05 2008-10-03 Sistema y metodo de enchapado de aleaciones metalicas usando tecnologia galvanica.

Country Status (12)

Country Link
US (2) US8668817B2 (es)
EP (1) EP2212451A2 (es)
JP (1) JP5487108B2 (es)
KR (1) KR20100089069A (es)
CN (1) CN101889107B (es)
AU (1) AU2008306569B2 (es)
CA (1) CA2701685A1 (es)
IL (1) IL204627A (es)
IT (1) ITTO20070704A1 (es)
MX (1) MX2010003358A (es)
RU (1) RU2473718C2 (es)
WO (1) WO2009044266A2 (es)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8961767B2 (en) * 2010-03-26 2015-02-24 Colorado State University Research Foundation Self-assembly of coatings utilizing surface charge
US9689084B2 (en) * 2014-05-22 2017-06-27 Globalfounries Inc. Electrodeposition systems and methods that minimize anode and/or plating solution degradation
EP3571334A1 (en) * 2017-01-18 2019-11-27 Arconic Inc. Systems and methods for electrodepositing multi-component alloys, and products made from the same
US12155103B2 (en) * 2019-03-20 2024-11-26 The Regents Of The University Of Colorado, A Body Corporate Electrochemical storage devices comprising chelated metals
CN110286608B (zh) * 2019-06-06 2021-09-21 上海蓝箭实业发展有限公司 原煤仓动态补偿处理系统及方法
CN113430626A (zh) * 2021-07-21 2021-09-24 梧州三和新材料科技有限公司 一种合金电镀装置

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Also Published As

Publication number Publication date
KR20100089069A (ko) 2010-08-11
CN101889107B (zh) 2015-09-23
IL204627A0 (en) 2010-11-30
RU2010117196A (ru) 2011-11-10
US20100221571A1 (en) 2010-09-02
WO2009044266A3 (en) 2010-01-21
EP2212451A2 (en) 2010-08-04
ITTO20070704A1 (it) 2009-04-06
AU2008306569B2 (en) 2013-06-13
CN101889107A (zh) 2010-11-17
AU2008306569A2 (en) 2010-06-10
AU2008306569A1 (en) 2009-04-09
IL204627A (en) 2014-05-28
CA2701685A1 (en) 2009-04-09
RU2473718C2 (ru) 2013-01-27
US20140061035A1 (en) 2014-03-06
JP2010540780A (ja) 2010-12-24
WO2009044266A2 (en) 2009-04-09
US8668817B2 (en) 2014-03-11
JP5487108B2 (ja) 2014-05-07

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