[go: up one dir, main page]

WO2009077146A3 - Galvanisches bad, verfahren zur galvanischen abscheidung und verwendung einer bipolaren membran zur separation in einem galvanischen bad - Google Patents

Galvanisches bad, verfahren zur galvanischen abscheidung und verwendung einer bipolaren membran zur separation in einem galvanischen bad Download PDF

Info

Publication number
WO2009077146A3
WO2009077146A3 PCT/EP2008/010635 EP2008010635W WO2009077146A3 WO 2009077146 A3 WO2009077146 A3 WO 2009077146A3 EP 2008010635 W EP2008010635 W EP 2008010635W WO 2009077146 A3 WO2009077146 A3 WO 2009077146A3
Authority
WO
WIPO (PCT)
Prior art keywords
galvanic
zinc
bath
galvanic bath
separating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2008/010635
Other languages
English (en)
French (fr)
Other versions
WO2009077146A2 (de
Inventor
Hartmut Trenkner
Alexander Jimenez
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coventya GmbH
Original Assignee
Coventya GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coventya GmbH filed Critical Coventya GmbH
Priority to BRPI0820988-0A priority Critical patent/BRPI0820988B1/pt
Priority to PL08861431T priority patent/PL2235236T3/pl
Priority to EP08861431A priority patent/EP2235236B1/de
Priority to ES08861431T priority patent/ES2396801T3/es
Publication of WO2009077146A2 publication Critical patent/WO2009077146A2/de
Publication of WO2009077146A3 publication Critical patent/WO2009077146A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/22—Electroplating: Baths therefor from solutions of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002—Cell separation, e.g. membranes, diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Cosmetics (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)

Abstract

Die Erfindung betrifft ein alkalisches, galvanisches Bad zum Aufbringen von Zink oder Zinklegierungen auf Substraten, bei dem der Anodenraum und der Kathodenraum durch eine bipolare Membran voneinander getrennt sind. Das Galvanikbad wird mit Zink bzw. Zinklegierungsbädern betrieben, die weitere Zusätze enthalten können. Weiterhin betrifft die Erfindung ein Verfahren zur galvanischen Abscheidung von Zink oder Zinklegierungen auf Substraten, bei dem das Substrat in das erfindungsgemäße galvanische Bad eingebracht wird. Darüber hinaus betrifft die Erfindung die Verwendung von bipolaren Membranen zur Separation von Anodenraum und Kathodenraum in galvanischen Bädern und zur Vermeidung der anodischen Zersetzung organischer Komponenten des Elektrolyten in galvanischen Bädern.
PCT/EP2008/010635 2007-12-14 2008-12-15 Galvanisches bad, verfahren zur galvanischen abscheidung und verwendung einer bipolaren membran zur separation in einem galvanischen bad Ceased WO2009077146A2 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
BRPI0820988-0A BRPI0820988B1 (pt) 2007-12-14 2008-12-15 banho galvânico, processo para a separação galvânica e emprego de um diafragma bipolar para a separação em um banho galvânico e emprego de um diafragma bipolar para evitar a decomposição anódica
PL08861431T PL2235236T3 (pl) 2007-12-14 2008-12-15 Kąpiel galwaniczna, sposób galwanicznego osadzania i zastosowanie bipolarnej membrany do separacji w kąpieli galwanicznej
EP08861431A EP2235236B1 (de) 2007-12-14 2008-12-15 Galvanisches bad, verfahren zur galvanischen abscheidung und verwendung einer bipolaren membran zur separation in einem galvanischen bad
ES08861431T ES2396801T3 (es) 2007-12-14 2008-12-15 Baño galvánico, procedimiento para la deposición galvánica y uso de una membrana bipolar para la separación en un baño galvánico

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007060200.8 2007-12-14
DE102007060200A DE102007060200A1 (de) 2007-12-14 2007-12-14 Galvanisches Bad, Verfahren zur galvanischen Abscheidung und Verwendung einer bipolaren Membran zur Separation in einem galvanischen Bad

Publications (2)

Publication Number Publication Date
WO2009077146A2 WO2009077146A2 (de) 2009-06-25
WO2009077146A3 true WO2009077146A3 (de) 2010-01-14

Family

ID=40394014

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2008/010635 Ceased WO2009077146A2 (de) 2007-12-14 2008-12-15 Galvanisches bad, verfahren zur galvanischen abscheidung und verwendung einer bipolaren membran zur separation in einem galvanischen bad

Country Status (6)

Country Link
EP (1) EP2235236B1 (de)
BR (1) BRPI0820988B1 (de)
DE (1) DE102007060200A1 (de)
ES (1) ES2396801T3 (de)
PL (1) PL2235236T3 (de)
WO (1) WO2009077146A2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2489763A1 (de) * 2011-02-15 2012-08-22 Atotech Deutschland GmbH Zink-Eisen-Legierungsschichtmaterial
JP5805055B2 (ja) * 2012-11-24 2015-11-04 丸仲工業株式会社 水平搬送式電解メッキ装置
JP5995906B2 (ja) 2014-05-19 2016-09-21 株式会社豊田中央研究所 隔膜の製造方法、及び金属被膜の製造方法
JP5830203B1 (ja) * 2015-07-22 2015-12-09 ディップソール株式会社 亜鉛合金めっき方法
BR112015028629A2 (pt) * 2015-07-22 2017-07-25 Dipsol Chem método de eletrogalvanização de liga de zinco
CN106987879A (zh) * 2016-11-23 2017-07-28 瑞尔太阳能投资有限公司 电沉积装置及其电沉积方法
EP3696299A1 (de) 2019-02-15 2020-08-19 Coventya GmbH Verfahren zur herstellung eines korrosionsbeständigen aluminium-silicium-legierungs-gusses, korrosionsbeständiger aluminium-silicium-legierungs-guss und dessen verwendung
CN111663167A (zh) * 2020-06-16 2020-09-15 合肥工业大学 一种基于bpe技术的金属线制备方法
CN113025829B (zh) * 2021-04-26 2022-12-06 福建师范大学 一种应用双极膜电渗析处理铜矿石冶炼废渣的方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4122543A1 (de) * 1991-03-18 1992-10-08 Hans Josef May Verfahren zur elektrochemischen beschichtung von metallbaendern
WO2001096631A1 (en) * 2000-06-15 2001-12-20 Taskem Inc. Zinc-nickel electroplating
US20020160222A1 (en) * 2001-02-28 2002-10-31 Man Hau-Chung Cobalt-tungsten-phosphorus alloy diffusion barrier coatings, methods for their preparation, and their use in plated articles
US20030089622A1 (en) * 1999-12-22 2003-05-15 Henuset Yves Michel Electrochemical cell and process for reducing the amount of organic contaminants in metal plating baths
GB2383337A (en) * 2001-12-21 2003-06-25 Accentus Plc Electroplating plant and method
US20050189231A1 (en) * 2004-02-26 2005-09-01 Capper Lee D. Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys
US20050274620A1 (en) * 2004-06-15 2005-12-15 Kovarsky Nicolay Y Copper replenishment system for interconnect applications
US20060173084A1 (en) * 2004-06-25 2006-08-03 Yongchang Zheng Bipolar membrane and method of making same

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE29615084U1 (de) * 1996-08-29 1996-10-24 Ko, Chien-Hsin, Taipeh/T`ai-pei Vorrichtung zum kontinuierlichen Galvanisieren von Platten
DE19834353C2 (de) 1998-07-30 2000-08-17 Hillebrand Walter Gmbh & Co Kg Alkalisches Zink-Nickelbad
DE10225203A1 (de) 2002-06-06 2003-12-18 Goema Ag Verfahren und Vorrichtung zur Spülwasserrückführung und Reinigung eines Prozessbades

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4122543A1 (de) * 1991-03-18 1992-10-08 Hans Josef May Verfahren zur elektrochemischen beschichtung von metallbaendern
US20030089622A1 (en) * 1999-12-22 2003-05-15 Henuset Yves Michel Electrochemical cell and process for reducing the amount of organic contaminants in metal plating baths
WO2001096631A1 (en) * 2000-06-15 2001-12-20 Taskem Inc. Zinc-nickel electroplating
US20020160222A1 (en) * 2001-02-28 2002-10-31 Man Hau-Chung Cobalt-tungsten-phosphorus alloy diffusion barrier coatings, methods for their preparation, and their use in plated articles
GB2383337A (en) * 2001-12-21 2003-06-25 Accentus Plc Electroplating plant and method
US20050189231A1 (en) * 2004-02-26 2005-09-01 Capper Lee D. Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys
US20050274620A1 (en) * 2004-06-15 2005-12-15 Kovarsky Nicolay Y Copper replenishment system for interconnect applications
US20060173084A1 (en) * 2004-06-25 2006-08-03 Yongchang Zheng Bipolar membrane and method of making same

Also Published As

Publication number Publication date
EP2235236A2 (de) 2010-10-06
DE102007060200A1 (de) 2009-06-18
EP2235236B1 (de) 2012-10-03
ES2396801T3 (es) 2013-02-27
BRPI0820988A2 (pt) 2015-08-04
BRPI0820988B1 (pt) 2018-12-04
PL2235236T3 (pl) 2013-03-29
WO2009077146A2 (de) 2009-06-25

Similar Documents

Publication Publication Date Title
WO2009077146A3 (de) Galvanisches bad, verfahren zur galvanischen abscheidung und verwendung einer bipolaren membran zur separation in einem galvanischen bad
WO2009142848A3 (en) Electrochemical cell, and particularly a cell with electrodeposited fuel
WO2009095208A8 (en) High performance cathodes for water electrolysers
WO2013037902A3 (en) Gas-diffusion electrode
WO2009132861A3 (en) Aqueous, acid bath and method for the electrolytic deposition of copper
MY174332A (en) Protecting anodes from passivation in alloy plating systems
WO2008016526A3 (en) Apparatus for electrolysis of molten oxides
WO2012080078A3 (en) Dire-contact membrane anode for use in electrolysis cells
ATE555235T1 (de) Pd- und pd-ni-elektrolytbäder
WO2011133906A3 (en) Electrochemical synthesis of aryl-alkyl surfactant precursor
AR074457A1 (es) Electrodo apto para la evolucion catodica de hidrogeno
WO2008127112A3 (en) Electrodeposition
TW200702498A (en) Method for electrodeposition of bronzes
WO2007132081A3 (fr) Procede de fabrication d'anodes pour la production d'aluminium par electrolyse ignee, lesdites anodes et leur utilisation
WO2010036758A3 (en) Alloy coating apparatus and metalliding method
WO2007021327A3 (en) Pretreatment of magnesium substrates for electroplating
WO2009044266A3 (en) System and method of plating metal alloys by using galvanic technology
WO2012175803A3 (en) Permanent cathode and a method for treating the surface of a permanent cathode
ES2375057T8 (es) Célula de extracción electrol�?tica de metales con purificador de electrolito.
EP2110457A3 (de) Platinum-modifizierte Kathodenbogenbeschichtung
WO2008156372A3 (en) Method for recovering elemental silicon from cutting remains
WO2007092398A3 (en) Method for electrolytic production of titanium and other metal powders
WO2008154722A8 (en) Method for improving nickel cathode morphology
TW200643227A (en) The insoluble anode electroplating system and the processing method of the same
WO2008142632A3 (en) Electrolytic cell and electrolyzing equipment

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08861431

Country of ref document: EP

Kind code of ref document: A2

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 2008861431

Country of ref document: EP

REG Reference to national code

Ref country code: BR

Ref legal event code: B01E

Ref document number: PI0820988

Country of ref document: BR

Free format text: ESCLARECA A OMISSAO DE ALEXANDER JIMENEZ DO QUADRO DE INVENTORES, UMA VEZ QUE O MESMO CONSTA NA PUBLICACAO WO2009/077146 DE 25/06/2009.

ENP Entry into the national phase

Ref document number: PI0820988

Country of ref document: BR

Kind code of ref document: A2

Effective date: 20100614