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WO2013015648A3 - Method of manufacturing mold for nano imprint - Google Patents

Method of manufacturing mold for nano imprint Download PDF

Info

Publication number
WO2013015648A3
WO2013015648A3 PCT/KR2012/006007 KR2012006007W WO2013015648A3 WO 2013015648 A3 WO2013015648 A3 WO 2013015648A3 KR 2012006007 W KR2012006007 W KR 2012006007W WO 2013015648 A3 WO2013015648 A3 WO 2013015648A3
Authority
WO
WIPO (PCT)
Prior art keywords
mold
grid pattern
nano imprint
manufacturing mold
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2012/006007
Other languages
French (fr)
Other versions
WO2013015648A2 (en
Inventor
Kyoung Jong Yoo
Young Jae Lee
Jin Su Kim
Jun Lee
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Innotek Co Ltd
Original Assignee
LG Innotek Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LG Innotek Co Ltd filed Critical LG Innotek Co Ltd
Priority to CN201280047054.2A priority Critical patent/CN103842861B/en
Publication of WO2013015648A2 publication Critical patent/WO2013015648A2/en
Publication of WO2013015648A3 publication Critical patent/WO2013015648A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23P—METAL-WORKING NOT OTHERWISE PROVIDED FOR; COMBINED OPERATIONS; UNIVERSAL MACHINE TOOLS
    • B23P15/00—Making specific metal objects by operations not covered by a single other subclass or a group in this subclass
    • B23P15/24—Making specific metal objects by operations not covered by a single other subclass or a group in this subclass dies
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00009—Production of simple or compound lenses
    • B29D11/00317—Production of lenses with markings or patterns
    • B29D11/00346—Production of lenses with markings or patterns having nanosize structures or features, e.g. fillers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00009—Production of simple or compound lenses
    • B29D11/0048—Moulds for lenses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00634—Production of filters
    • B29D11/00644—Production of filters polarizing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B81C99/0075—Manufacture of substrate-free structures
    • B81C99/009—Manufacturing the stamps or the moulds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/006—Nanostructures, e.g. using aluminium anodic oxidation templates [AAO]
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/10—Moulds; Masks; Masterforms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/20—Separation of the formed objects from the electrodes with no destruction of said electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/022—Electroplating of selected surface areas using masking means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
    • B29C33/424—Moulding surfaces provided with means for marking or patterning

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Ophthalmology & Optometry (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Micromachines (AREA)

Abstract

Provided is a method of manufacturing a mold for nano imprint comprising: forming a plurality of grid patterns on a substrate; forming a metal grid pattern on the grid patterns; forming a plated layer on the metal grid pattern; and separating a mold consisting of the metal grid pattern and the plated layer from the grid pattern, which can reduce a production cost, improve the efficiency of a process, and provide the mold for nano having improved durability and reliability.
PCT/KR2012/006007 2011-07-28 2012-07-27 Method of manufacturing mold for nano imprint Ceased WO2013015648A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201280047054.2A CN103842861B (en) 2011-07-28 2012-07-27 Method of manufacturing mold for nano imprint

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020110075191A KR101775163B1 (en) 2011-07-28 2011-07-28 Manufacturing method of mold for nano imprint and mold for nano imprint by using the same
KR10-2011-0075191 2011-07-28

Publications (2)

Publication Number Publication Date
WO2013015648A2 WO2013015648A2 (en) 2013-01-31
WO2013015648A3 true WO2013015648A3 (en) 2013-04-25

Family

ID=47601675

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/006007 Ceased WO2013015648A2 (en) 2011-07-28 2012-07-27 Method of manufacturing mold for nano imprint

Country Status (4)

Country Link
KR (1) KR101775163B1 (en)
CN (1) CN103842861B (en)
TW (1) TW201319636A (en)
WO (1) WO2013015648A2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9919553B2 (en) 2014-09-02 2018-03-20 E Ink California, Llc Embossing tool and methods of preparation
TWI620651B (en) * 2015-08-31 2018-04-11 伊英克加利福尼亞有限責任公司 Embossing tool and method for preparation thereof
CN107170675A (en) * 2017-05-23 2017-09-15 深圳市华星光电技术有限公司 The preparation method of nanometer wire grid construction
CN110884246A (en) * 2018-08-16 2020-03-17 汉能移动能源控股集团有限公司 UV transfer printing mold and preparation method thereof, front plate and solar curtain wall
KR102267128B1 (en) * 2019-07-19 2021-06-23 주식회사 제이마이크로 Manufacturing method of encoder
CN111716084B (en) * 2020-07-01 2021-07-27 南京工程学院 A method for manufacturing a copper/steel composite injection mold with a honeycomb-implanted nail interface structure
JP7731248B2 (en) * 2021-09-17 2025-08-29 富士フイルム株式会社 Electroforming master, method of manufacturing electroforming master, and method of manufacturing electroformed product
KR102703701B1 (en) * 2021-11-02 2024-09-05 한국과학기술원 Nickel stamp and Method of manufacturing the same
TWI876935B (en) * 2024-03-19 2025-03-11 安可光電股份有限公司 Method for manufacturing a wire-grid polarizer

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050019557A (en) * 2003-08-19 2005-03-03 엘지전자 주식회사 nano imprinting method and the polymerizable composite
KR20050121399A (en) * 2004-06-22 2005-12-27 엘지전자 주식회사 Method for fabrication polarizer using for nanoimprint
JP2010049745A (en) * 2008-08-21 2010-03-04 Fuji Electric Device Technology Co Ltd Mold for nano-imprint, and magnetic recording medium fabricated by using the same
KR20100112926A (en) * 2009-04-10 2010-10-20 엘지이노텍 주식회사 A wire grid polarizer, liquid crystal display including the same and method of manufacturing the wire grid polarizer

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6404555B1 (en) * 1998-07-09 2002-06-11 Seiko Epson Corporation Micro lens array, method of fabricating the same and display
KR100488049B1 (en) * 2003-01-16 2005-05-06 엘지전자 주식회사 nano imprint fabrication method
CN1800984A (en) * 2005-12-27 2006-07-12 国家纳米技术产业化基地 Negative nano-imprinting method
JP5213335B2 (en) * 2006-02-01 2013-06-19 キヤノン株式会社 Imprint mold and method for producing structure using the mold
JP2007320071A (en) * 2006-05-30 2007-12-13 Asahi Glass Co Ltd Template and method for producing treated substrate having transferred fine pattern
KR20080062854A (en) * 2006-12-29 2008-07-03 엘지전자 주식회사 Multi-layer stamp and its manufacturing method, nano imprint system equipped with multi-layer stamp and nano-imprinting on display panel using multi-layer stamp
CN101205054B (en) * 2007-12-11 2011-03-30 山东大学 A kind of manufacturing method of miniature metal nickel mold
CN101923282B (en) * 2009-06-09 2012-01-25 清华大学 Nano-imprint resist and nano-imprint method adopting same
NL2005263A (en) * 2009-09-29 2011-03-30 Asml Netherlands Bv Imprint lithography.

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050019557A (en) * 2003-08-19 2005-03-03 엘지전자 주식회사 nano imprinting method and the polymerizable composite
KR20050121399A (en) * 2004-06-22 2005-12-27 엘지전자 주식회사 Method for fabrication polarizer using for nanoimprint
JP2010049745A (en) * 2008-08-21 2010-03-04 Fuji Electric Device Technology Co Ltd Mold for nano-imprint, and magnetic recording medium fabricated by using the same
KR20100112926A (en) * 2009-04-10 2010-10-20 엘지이노텍 주식회사 A wire grid polarizer, liquid crystal display including the same and method of manufacturing the wire grid polarizer

Also Published As

Publication number Publication date
CN103842861B (en) 2017-03-22
CN103842861A (en) 2014-06-04
KR101775163B1 (en) 2017-09-05
KR20130013502A (en) 2013-02-06
TW201319636A (en) 2013-05-16
WO2013015648A2 (en) 2013-01-31

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