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WO2002001297A3 - Procedes pour le traitement de surfaces, objets produits selon ces procedes et utilisation de composes en tant que reactifs clivables photochimiquement - Google Patents

Procedes pour le traitement de surfaces, objets produits selon ces procedes et utilisation de composes en tant que reactifs clivables photochimiquement Download PDF

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Publication number
WO2002001297A3
WO2002001297A3 PCT/DE2001/002315 DE0102315W WO0201297A3 WO 2002001297 A3 WO2002001297 A3 WO 2002001297A3 DE 0102315 W DE0102315 W DE 0102315W WO 0201297 A3 WO0201297 A3 WO 0201297A3
Authority
WO
WIPO (PCT)
Prior art keywords
photochemically
methods
compounds
zones
produce
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE2001/002315
Other languages
German (de)
English (en)
Other versions
WO2002001297A2 (fr
Inventor
Daniel Schondelmaier
Wolfgang Eberhardt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Forschungszentrum Juelich GmbH
Original Assignee
Forschungszentrum Juelich GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Forschungszentrum Juelich GmbH filed Critical Forschungszentrum Juelich GmbH
Publication of WO2002001297A2 publication Critical patent/WO2002001297A2/fr
Publication of WO2002001297A3 publication Critical patent/WO2002001297A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0042Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0755Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)

Abstract

L'invention concerne des procédés pour le traitement de surfaces, ainsi que des objets produits selon ces procédés. L'invention concerne également l'utilisation de composés en tant que réactifs clivables photochimiquement. Différentes techniques sont utilisées pour la texturation de surfaces ou pour la génération de structures de l'ordre du nanomètre sur des surfaces. Il est possible, grâce au procédé selon l'invention, de générer des structures de surface et des profils définis sans dépense technique importante. L'utilisation de composés clivables photochimiquement permet de générer de manière définie des surfaces à zones hydrophobes et hydrophiles ou un profil de surface présentant des creux et des bosses. Le profil ou la structure de surface est générée en fonction du masque utilisé qui est opaque aux ultraviolets et ne laisse passer la lumière ultraviolette qu'au niveau d'évidements définis.
PCT/DE2001/002315 2000-06-29 2001-06-21 Procedes pour le traitement de surfaces, objets produits selon ces procedes et utilisation de composes en tant que reactifs clivables photochimiquement Ceased WO2002001297A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10030797.3 2000-06-29
DE2000130797 DE10030797A1 (de) 2000-06-29 2000-06-29 Verfahren zur Behandlung von Oberflächen sowie mit diesen Verfahren hergestellte Gegenstände und Verwendung von...

Publications (2)

Publication Number Publication Date
WO2002001297A2 WO2002001297A2 (fr) 2002-01-03
WO2002001297A3 true WO2002001297A3 (fr) 2002-10-03

Family

ID=7646660

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2001/002315 Ceased WO2002001297A2 (fr) 2000-06-29 2001-06-21 Procedes pour le traitement de surfaces, objets produits selon ces procedes et utilisation de composes en tant que reactifs clivables photochimiquement

Country Status (2)

Country Link
DE (1) DE10030797A1 (fr)
WO (1) WO2002001297A2 (fr)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0577187A1 (fr) * 1992-06-29 1994-01-05 Koninklijke Philips Electronics N.V. Méthode pour former un motif metallique sur verre par un procédé sans courant
JPH09263950A (ja) * 1996-03-28 1997-10-07 Canon Inc ガラス基板の化学メッキ方法
WO2001001199A1 (fr) * 1999-06-25 2001-01-04 The United States Of America, Represented By The Secretary Of The Navy Procedes et materiaux de modification selective de films polymeres a photomotifs

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0577187A1 (fr) * 1992-06-29 1994-01-05 Koninklijke Philips Electronics N.V. Méthode pour former un motif metallique sur verre par un procédé sans courant
JPH09263950A (ja) * 1996-03-28 1997-10-07 Canon Inc ガラス基板の化学メッキ方法
WO2001001199A1 (fr) * 1999-06-25 2001-01-04 The United States Of America, Represented By The Secretary Of The Navy Procedes et materiaux de modification selective de films polymeres a photomotifs

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
HUANG J ET AL: "Photopatterning of self-assembled alkanethiolate monolayers on gold. A simple monolayer photoresist utilizing aqueous chemistry", LANGMUIR;LANGMUIR MAR 1994, vol. 10, no. 3, March 1994 (1994-03-01), pages 626 - 628, XP008003152 *
PATENT ABSTRACTS OF JAPAN vol. 1998, no. 02 30 January 1998 (1998-01-30) *
SUGIMURA H ET AL: "MICROPATTERNING OF ALKYL-AND FLUOROALKYLSILANE SELF-ASSEMBLED MONOLAYERS USING VACUUM ULTRAVIOLET LIGHT", LANGMUIR, ACS, WASHINGTON, DC, US, vol. 16, no. 3, 8 February 2000 (2000-02-08), pages 885 - 888, XP000929923, ISSN: 0743-7463 *
SUGIMURA HIROYUKI ET AL: "Fabrication of coplanar microstructures composed of multiple organosilane self-assembled monolayers", IEICE TRANS ELECTRON;IEICE TRANSACTIONS ON ELECTRONICS JUL 2000 IEICE OF JAPAN, TOKYO, JAPAN, vol. E83-C, no. 7, July 2000 (2000-07-01), pages 1099 - 1103, XP008003023 *

Also Published As

Publication number Publication date
DE10030797A1 (de) 2002-01-24
WO2002001297A2 (fr) 2002-01-03

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