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WO2002001297A3 - Method for photochemically structuring surfaces and articles structured by said method - Google Patents

Method for photochemically structuring surfaces and articles structured by said method Download PDF

Info

Publication number
WO2002001297A3
WO2002001297A3 PCT/DE2001/002315 DE0102315W WO0201297A3 WO 2002001297 A3 WO2002001297 A3 WO 2002001297A3 DE 0102315 W DE0102315 W DE 0102315W WO 0201297 A3 WO0201297 A3 WO 0201297A3
Authority
WO
WIPO (PCT)
Prior art keywords
photochemically
methods
compounds
zones
produce
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE2001/002315
Other languages
German (de)
French (fr)
Other versions
WO2002001297A2 (en
Inventor
Daniel Schondelmaier
Wolfgang Eberhardt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Forschungszentrum Juelich GmbH
Original Assignee
Forschungszentrum Juelich GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Forschungszentrum Juelich GmbH filed Critical Forschungszentrum Juelich GmbH
Publication of WO2002001297A2 publication Critical patent/WO2002001297A2/en
Publication of WO2002001297A3 publication Critical patent/WO2002001297A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)

Abstract

The invention relates to methods for treating surfaces and to articles produced by said methods. The invention further relates to the use of compounds as photochemically cleavable reagents. Various techniques are known to texture surfaces or to produce nanometer structures on surfaces. The invention provides a method for producing defined surface structures and profiles with little technical complication. To this end, photochemically cleavable compounds are used to produce surfaces with defined hydrophobic and hydrophilic zones or a surface profile with defined elevations and indentations. The surface profile or the surface structure is produced depending on the matrix used which is UV impermeable and lets through UV light only in defined zones.
PCT/DE2001/002315 2000-06-29 2001-06-21 Method for photochemically structuring surfaces and articles structured by said method Ceased WO2002001297A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10030797.3 2000-06-29
DE2000130797 DE10030797A1 (en) 2000-06-29 2000-06-29 Process for the treatment of surfaces as well as objects manufactured with these processes and use of ...

Publications (2)

Publication Number Publication Date
WO2002001297A2 WO2002001297A2 (en) 2002-01-03
WO2002001297A3 true WO2002001297A3 (en) 2002-10-03

Family

ID=7646660

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2001/002315 Ceased WO2002001297A2 (en) 2000-06-29 2001-06-21 Method for photochemically structuring surfaces and articles structured by said method

Country Status (2)

Country Link
DE (1) DE10030797A1 (en)
WO (1) WO2002001297A2 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0577187A1 (en) * 1992-06-29 1994-01-05 Koninklijke Philips Electronics N.V. Method of providing a metal pattern on glass in an electroless process
JPH09263950A (en) * 1996-03-28 1997-10-07 Canon Inc Glass substrate chemical plating method
WO2001001199A1 (en) * 1999-06-25 2001-01-04 The United States Of America, Represented By The Secretary Of The Navy Methods and materials for selective modification of photopatterned polymer films

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0577187A1 (en) * 1992-06-29 1994-01-05 Koninklijke Philips Electronics N.V. Method of providing a metal pattern on glass in an electroless process
JPH09263950A (en) * 1996-03-28 1997-10-07 Canon Inc Glass substrate chemical plating method
WO2001001199A1 (en) * 1999-06-25 2001-01-04 The United States Of America, Represented By The Secretary Of The Navy Methods and materials for selective modification of photopatterned polymer films

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
HUANG J ET AL: "Photopatterning of self-assembled alkanethiolate monolayers on gold. A simple monolayer photoresist utilizing aqueous chemistry", LANGMUIR;LANGMUIR MAR 1994, vol. 10, no. 3, March 1994 (1994-03-01), pages 626 - 628, XP008003152 *
PATENT ABSTRACTS OF JAPAN vol. 1998, no. 02 30 January 1998 (1998-01-30) *
SUGIMURA H ET AL: "MICROPATTERNING OF ALKYL-AND FLUOROALKYLSILANE SELF-ASSEMBLED MONOLAYERS USING VACUUM ULTRAVIOLET LIGHT", LANGMUIR, ACS, WASHINGTON, DC, US, vol. 16, no. 3, 8 February 2000 (2000-02-08), pages 885 - 888, XP000929923, ISSN: 0743-7463 *
SUGIMURA HIROYUKI ET AL: "Fabrication of coplanar microstructures composed of multiple organosilane self-assembled monolayers", IEICE TRANS ELECTRON;IEICE TRANSACTIONS ON ELECTRONICS JUL 2000 IEICE OF JAPAN, TOKYO, JAPAN, vol. E83-C, no. 7, July 2000 (2000-07-01), pages 1099 - 1103, XP008003023 *

Also Published As

Publication number Publication date
DE10030797A1 (en) 2002-01-24
WO2002001297A2 (en) 2002-01-03

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