TWI413864B - 含倍半矽氧烷之化合物及其製造方法 - Google Patents
含倍半矽氧烷之化合物及其製造方法 Download PDFInfo
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- TWI413864B TWI413864B TW094124856A TW94124856A TWI413864B TW I413864 B TWI413864 B TW I413864B TW 094124856 A TW094124856 A TW 094124856A TW 94124856 A TW94124856 A TW 94124856A TW I413864 B TWI413864 B TW I413864B
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- Prior art keywords
- meth
- acrylate
- compound
- compound containing
- sesquiterpene
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 90
- 238000000034 method Methods 0.000 title claims description 21
- -1 acrylic ester Chemical class 0.000 claims abstract description 68
- 229920001577 copolymer Polymers 0.000 claims abstract description 26
- 125000001424 substituent group Chemical group 0.000 claims abstract description 24
- 230000005855 radiation Effects 0.000 claims abstract description 18
- 125000000524 functional group Chemical group 0.000 claims abstract description 17
- 239000003513 alkali Substances 0.000 claims abstract description 14
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims abstract description 11
- 238000004519 manufacturing process Methods 0.000 claims abstract description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 104
- 229930004725 sesquiterpene Natural products 0.000 claims description 68
- 150000004354 sesquiterpene derivatives Chemical class 0.000 claims description 67
- DIOQZVSQGTUSAI-UHFFFAOYSA-N n-butylhexane Natural products CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims description 28
- 239000011342 resin composition Substances 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 15
- 150000002148 esters Chemical class 0.000 claims description 9
- 238000009833 condensation Methods 0.000 claims description 8
- 239000004094 surface-active agent Substances 0.000 claims description 7
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 claims description 6
- 239000003431 cross linking reagent Substances 0.000 claims description 4
- 239000003999 initiator Substances 0.000 claims description 4
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 claims description 3
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 claims description 3
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 claims description 2
- CYUZOYPRAQASLN-UHFFFAOYSA-N 3-prop-2-enoyloxypropanoic acid Chemical compound OC(=O)CCOC(=O)C=C CYUZOYPRAQASLN-UHFFFAOYSA-N 0.000 claims description 2
- JZHKIUBMQMDQRG-UHFFFAOYSA-N C(=C)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C(=C)C(C(OC)(OC)OC)CCCCCCCC JZHKIUBMQMDQRG-UHFFFAOYSA-N 0.000 claims description 2
- LTHKQHXMKMFONU-UHFFFAOYSA-N C(C=1C(C(=O)O)=CC=CC1)(=O)OCCOC.CC(=C)C Chemical compound C(C=1C(C(=O)O)=CC=CC1)(=O)OCCOC.CC(=C)C LTHKQHXMKMFONU-UHFFFAOYSA-N 0.000 claims description 2
- 239000005977 Ethylene Substances 0.000 claims description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 claims 2
- CWZQYRJRRHYJOI-UHFFFAOYSA-N 1,1,1-trimethoxydecane Chemical compound CCCCCCCCCC(OC)(OC)OC CWZQYRJRRHYJOI-UHFFFAOYSA-N 0.000 claims 1
- JPEWDCTZJFUITH-UHFFFAOYSA-N 1-methoxydecane Chemical compound CCCCCCCCCCOC JPEWDCTZJFUITH-UHFFFAOYSA-N 0.000 claims 1
- FFHMJVUOPRCBNS-UHFFFAOYSA-N CC(=COCCOC(C=1C(C(=O)O)=CC=CC1)=O)C Chemical compound CC(=COCCOC(C=1C(C(=O)O)=CC=CC1)=O)C FFHMJVUOPRCBNS-UHFFFAOYSA-N 0.000 claims 1
- PNKUSGQVOMIXLU-UHFFFAOYSA-N Formamidine Chemical compound NC=N PNKUSGQVOMIXLU-UHFFFAOYSA-N 0.000 claims 1
- MAWOHFOSAIXURX-UHFFFAOYSA-N cyclopentylcyclopentane Chemical group C1CCCC1C1CCCC1 MAWOHFOSAIXURX-UHFFFAOYSA-N 0.000 claims 1
- 230000002209 hydrophobic effect Effects 0.000 claims 1
- 150000002923 oximes Chemical class 0.000 claims 1
- 239000011347 resin Substances 0.000 abstract description 24
- 229920005989 resin Polymers 0.000 abstract description 24
- 239000000178 monomer Substances 0.000 abstract description 14
- 238000007334 copolymerization reaction Methods 0.000 abstract description 9
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract description 7
- 229920002554 vinyl polymer Polymers 0.000 abstract description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 125000005369 trialkoxysilyl group Chemical group 0.000 abstract 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 27
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 20
- YXFVVABEGXRONW-UHFFFAOYSA-N toluene Substances CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 19
- 238000001816 cooling Methods 0.000 description 15
- 239000000243 solution Substances 0.000 description 14
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 12
- 238000010438 heat treatment Methods 0.000 description 11
- 238000000576 coating method Methods 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 9
- 238000002834 transmittance Methods 0.000 description 9
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 8
- 238000011161 development Methods 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 238000006116 polymerization reaction Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 230000002285 radioactive effect Effects 0.000 description 6
- 230000035945 sensitivity Effects 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- ANBBCZAIOXDZPV-UHFFFAOYSA-N 1,1,1-trimethoxy-2-methyldecane Chemical compound CC(C(OC)(OC)OC)CCCCCCCC ANBBCZAIOXDZPV-UHFFFAOYSA-N 0.000 description 5
- DKIDEFUBRARXTE-UHFFFAOYSA-N 3-mercaptopropanoic acid Chemical compound OC(=O)CCS DKIDEFUBRARXTE-UHFFFAOYSA-N 0.000 description 5
- 239000003463 adsorbent Substances 0.000 description 5
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 5
- 239000012153 distilled water Substances 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 238000001914 filtration Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 150000003254 radicals Chemical class 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- QBSZKOXEASPZRG-UHFFFAOYSA-N C(=CC)OCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound C(=CC)OCCCC(C(OC)(OC)OC)CCCCCCCC QBSZKOXEASPZRG-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 229920006243 acrylic copolymer Polymers 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 230000035515 penetration Effects 0.000 description 3
- 239000003505 polymerization initiator Substances 0.000 description 3
- 238000010926 purge Methods 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- OAWZPHCPLADLAD-UHFFFAOYSA-N 4-(trimethoxymethyl)dodecyl prop-2-enoate Chemical compound C(C=C)(=O)OCCCC(C(OC)(OC)OC)CCCCCCCC OAWZPHCPLADLAD-UHFFFAOYSA-N 0.000 description 2
- ASILGOSHTWOLCO-UHFFFAOYSA-N C(=CC)C(C(C(OC)(OC)OC)CCCOC)CCCCCCC Chemical compound C(=CC)C(C(C(OC)(OC)OC)CCCOC)CCCCCCC ASILGOSHTWOLCO-UHFFFAOYSA-N 0.000 description 2
- UEYOSKCHSHOSHP-UHFFFAOYSA-N C(C(=C)C)(=O)O.COCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound C(C(=C)C)(=O)O.COCCCC(C(OC)(OC)OC)CCCCCCCC UEYOSKCHSHOSHP-UHFFFAOYSA-N 0.000 description 2
- QHJSCTNRFWNYID-UHFFFAOYSA-N CCC=COCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound CCC=COCCCC(C(OC)(OC)OC)CCCCCCCC QHJSCTNRFWNYID-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- QMNOIORHZMRPLS-UHFFFAOYSA-N butan-1-ol;ethane-1,2-diol;propane-1,2-diol Chemical compound OCCO.CCCCO.CC(O)CO QMNOIORHZMRPLS-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 2
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- 229940052303 ethers for general anesthesia Drugs 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 125000004494 ethyl ester group Chemical group 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine group Chemical group NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- 229910052747 lanthanoid Inorganic materials 0.000 description 2
- 150000002602 lanthanoids Chemical class 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N n-hexanoic acid Natural products CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- FPGGTKZVZWFYPV-UHFFFAOYSA-M tetrabutylammonium fluoride Chemical compound [F-].CCCC[N+](CCCC)(CCCC)CCCC FPGGTKZVZWFYPV-UHFFFAOYSA-M 0.000 description 2
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 2
- QEQBMZQFDDDTPN-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy benzenecarboperoxoate Chemical compound CC(C)(C)OOOC(=O)C1=CC=CC=C1 QEQBMZQFDDDTPN-UHFFFAOYSA-N 0.000 description 1
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- OXYKVVLTXXXVRT-UHFFFAOYSA-N (4-chlorobenzoyl) 4-chlorobenzenecarboperoxoate Chemical compound C1=CC(Cl)=CC=C1C(=O)OOC(=O)C1=CC=C(Cl)C=C1 OXYKVVLTXXXVRT-UHFFFAOYSA-N 0.000 description 1
- FFJCNSLCJOQHKM-CLFAGFIQSA-N (z)-1-[(z)-octadec-9-enoxy]octadec-9-ene Chemical compound CCCCCCCC\C=C/CCCCCCCCOCCCCCCCC\C=C/CCCCCCCC FFJCNSLCJOQHKM-CLFAGFIQSA-N 0.000 description 1
- MMQMGOPVYNVRFP-BTJKTKAUSA-N (z)-but-2-enedioic acid;2-tert-butylperoxy-2-methylpropane Chemical compound OC(=O)\C=C/C(O)=O.CC(C)(C)OOC(C)(C)C MMQMGOPVYNVRFP-BTJKTKAUSA-N 0.000 description 1
- AGGJWJFEEKIYOF-UHFFFAOYSA-N 1,1,1-triethoxydecane Chemical compound CCCCCCCCCC(OCC)(OCC)OCC AGGJWJFEEKIYOF-UHFFFAOYSA-N 0.000 description 1
- VYKNVAHOUNIVTQ-UHFFFAOYSA-N 1,2,2,3,3-pentamethylpiperidine Chemical compound CN1CCCC(C)(C)C1(C)C VYKNVAHOUNIVTQ-UHFFFAOYSA-N 0.000 description 1
- YAXWOADCWUUUNX-UHFFFAOYSA-N 1,2,2,3-tetramethylpiperidine Chemical compound CC1CCCN(C)C1(C)C YAXWOADCWUUUNX-UHFFFAOYSA-N 0.000 description 1
- CYIGRWUIQAVBFG-UHFFFAOYSA-N 1,2-bis(2-ethenoxyethoxy)ethane Chemical compound C=COCCOCCOCCOC=C CYIGRWUIQAVBFG-UHFFFAOYSA-N 0.000 description 1
- 229940058015 1,3-butylene glycol Drugs 0.000 description 1
- SMLNDVNTPWRZJH-UHFFFAOYSA-N 1-chloro-4-(trimethoxymethyl)dodecane Chemical compound ClCCCC(C(OC)(OC)OC)CCCCCCCC SMLNDVNTPWRZJH-UHFFFAOYSA-N 0.000 description 1
- LGJCFVYMIJLQJO-UHFFFAOYSA-N 1-dodecylperoxydodecane Chemical compound CCCCCCCCCCCCOOCCCCCCCCCCCC LGJCFVYMIJLQJO-UHFFFAOYSA-N 0.000 description 1
- NDMUXVDJWHPCLL-UHFFFAOYSA-N 1-ethoxyhexan-2-yl acetate Chemical compound CCCCC(OC(C)=O)COCC NDMUXVDJWHPCLL-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- YZQCRYHZKMFKDE-UHFFFAOYSA-N 1-octadecylperoxyoctadecane Chemical compound CCCCCCCCCCCCCCCCCCOOCCCCCCCCCCCCCCCCCC YZQCRYHZKMFKDE-UHFFFAOYSA-N 0.000 description 1
- ZKEUVTROUPQVTM-UHFFFAOYSA-N 1-pentylperoxypentane Chemical compound CCCCCOOCCCCC ZKEUVTROUPQVTM-UHFFFAOYSA-N 0.000 description 1
- ZBJWWTLPQMOWEH-UHFFFAOYSA-N 1-sulfanyloxyoctane Chemical compound SOCCCCCCCC ZBJWWTLPQMOWEH-UHFFFAOYSA-N 0.000 description 1
- STFXXRRQKFUYEU-UHFFFAOYSA-N 16-methylheptadecyl prop-2-enoate Chemical compound CC(C)CCCCCCCCCCCCCCCOC(=O)C=C STFXXRRQKFUYEU-UHFFFAOYSA-N 0.000 description 1
- RKMGAJGJIURJSJ-UHFFFAOYSA-N 2,2,6,6-Tetramethylpiperidine Substances CC1(C)CCCC(C)(C)N1 RKMGAJGJIURJSJ-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- VBZBISQOWJYWCC-UHFFFAOYSA-N 2-(2-carboxypropan-2-yldiazenyl)-2-methylpropanoic acid Chemical compound OC(=O)C(C)(C)N=NC(C)(C)C(O)=O VBZBISQOWJYWCC-UHFFFAOYSA-N 0.000 description 1
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 description 1
- CMCLUJRFBZBVSW-UHFFFAOYSA-N 2-(2-hydroxyethoxy)-1-methoxyethanol;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(O)COCCO CMCLUJRFBZBVSW-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- FVNIIPIYHHEXQA-UHFFFAOYSA-N 2-(4-methoxynaphthalen-1-yl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C12=CC=CC=C2C(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 FVNIIPIYHHEXQA-UHFFFAOYSA-N 0.000 description 1
- OBETXYAYXDNJHR-UHFFFAOYSA-N 2-Ethylhexanoic acid Chemical compound CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 1
- WMYINDVYGQKYMI-UHFFFAOYSA-N 2-[2,2-bis(hydroxymethyl)butoxymethyl]-2-ethylpropane-1,3-diol Chemical compound CCC(CO)(CO)COCC(CC)(CO)CO WMYINDVYGQKYMI-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- VUIWJRYTWUGOOF-UHFFFAOYSA-N 2-ethenoxyethanol Chemical compound OCCOC=C VUIWJRYTWUGOOF-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- BRQMAAFGEXNUOL-UHFFFAOYSA-N 2-ethylhexyl (2-methylpropan-2-yl)oxy carbonate Chemical compound CCCCC(CC)COC(=O)OOC(C)(C)C BRQMAAFGEXNUOL-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- QKTWWGYCVXCKOJ-UHFFFAOYSA-N 2-methoxy-1-(2-methoxyphenyl)-2-phenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1OC QKTWWGYCVXCKOJ-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- LYPGJGCIPQYQBW-UHFFFAOYSA-N 2-methyl-2-[[2-methyl-1-oxo-1-(prop-2-enylamino)propan-2-yl]diazenyl]-n-prop-2-enylpropanamide Chemical compound C=CCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCC=C LYPGJGCIPQYQBW-UHFFFAOYSA-N 0.000 description 1
- YEXMEDXSVBEXGZ-UHFFFAOYSA-N 2-tert-butylperoxy-2-methylpropane;2-methylpropanoic acid Chemical compound CC(C)C(O)=O.CC(C)(C)OOC(C)(C)C YEXMEDXSVBEXGZ-UHFFFAOYSA-N 0.000 description 1
- BIISIZOQPWZPPS-UHFFFAOYSA-N 2-tert-butylperoxypropan-2-ylbenzene Chemical compound CC(C)(C)OOC(C)(C)C1=CC=CC=C1 BIISIZOQPWZPPS-UHFFFAOYSA-N 0.000 description 1
- XYFRHHAYSXIKGH-UHFFFAOYSA-N 3-(5-methoxy-2-methoxycarbonyl-1h-indol-3-yl)prop-2-enoic acid Chemical compound C1=C(OC)C=C2C(C=CC(O)=O)=C(C(=O)OC)NC2=C1 XYFRHHAYSXIKGH-UHFFFAOYSA-N 0.000 description 1
- MKTOIPPVFPJEQO-UHFFFAOYSA-N 4-(3-carboxypropanoylperoxy)-4-oxobutanoic acid Chemical compound OC(=O)CCC(=O)OOC(=O)CCC(O)=O MKTOIPPVFPJEQO-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- WWCSXUVLWORVJR-UHFFFAOYSA-N C(=CC)C(C(C(OCC)(OCC)OCC)CCCOC)CCCCCCC Chemical compound C(=CC)C(C(C(OCC)(OCC)OCC)CCCOC)CCCCCCC WWCSXUVLWORVJR-UHFFFAOYSA-N 0.000 description 1
- HEVFZVGUDKFYFW-UHFFFAOYSA-N C(=CC)OCCOC(C1C(C(=O)O)CCCC1)=O Chemical compound C(=CC)OCCOC(C1C(C(=O)O)CCCC1)=O HEVFZVGUDKFYFW-UHFFFAOYSA-N 0.000 description 1
- CKSPJBJPJCZQIF-UHFFFAOYSA-N C(C)OC(CCCCCCCCC)(OCC)OCC.NCCC Chemical compound C(C)OC(CCCCCCCCC)(OCC)OCC.NCCC CKSPJBJPJCZQIF-UHFFFAOYSA-N 0.000 description 1
- AROAGDLGKITZPH-UHFFFAOYSA-N C(C1=CC=CC=C1)C(C(C1=CC=C(C=C1)N1CCOCC1)CC(=O)C1=CC=CC=C1)(CC)N(C)C Chemical class C(C1=CC=CC=C1)C(C(C1=CC=C(C=C1)N1CCOCC1)CC(=O)C1=CC=CC=C1)(CC)N(C)C AROAGDLGKITZPH-UHFFFAOYSA-N 0.000 description 1
- SCWWMWXGDYSENK-UHFFFAOYSA-N C(C1C(C(=O)O)CCCC1)(=O)OCCOC.CC(=C)C Chemical compound C(C1C(C(=O)O)CCCC1)(=O)OCCOC.CC(=C)C SCWWMWXGDYSENK-UHFFFAOYSA-N 0.000 description 1
- MTDLVDBRMBSPBJ-UHFFFAOYSA-N C(C1CO1)OCCCC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C(C1CO1)OCCCC(C(OCC)(OCC)OCC)CCCCCCCC MTDLVDBRMBSPBJ-UHFFFAOYSA-N 0.000 description 1
- AMPUKTPQSINOIW-UHFFFAOYSA-N C(CCCCCCCCC)C(C(C)O)(OC1=CC=CC=C1)O Chemical compound C(CCCCCCCCC)C(C(C)O)(OC1=CC=CC=C1)O AMPUKTPQSINOIW-UHFFFAOYSA-N 0.000 description 1
- INQMJZSSQBOYNY-UHFFFAOYSA-N C1(=CC=CC=C1)C(C(C)(C)C)CCCCCCC Chemical compound C1(=CC=CC=C1)C(C(C)(C)C)CCCCCCC INQMJZSSQBOYNY-UHFFFAOYSA-N 0.000 description 1
- JSGRIFNBTXDZQU-UHFFFAOYSA-N C1(=CC=CC=C1)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C1(=CC=CC=C1)C(C(OC)(OC)OC)CCCCCCCC JSGRIFNBTXDZQU-UHFFFAOYSA-N 0.000 description 1
- VGBFWOQQARKDRN-UHFFFAOYSA-N CCCCCCCC(CCCS)C(C)(C)C Chemical compound CCCCCCCC(CCCS)C(C)(C)C VGBFWOQQARKDRN-UHFFFAOYSA-N 0.000 description 1
- RPRPDTXKGSIXMD-UHFFFAOYSA-N Caproic acid n-butyl ester Natural products CCCCCC(=O)OCCCC RPRPDTXKGSIXMD-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N Caprylic acid Natural products CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- OCWLYWIFNDCWRZ-UHFFFAOYSA-N Me ester-2-Methylbutanoic acid Natural products CCC(C)C(=O)OC OCWLYWIFNDCWRZ-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- XYVQFUJDGOBPQI-UHFFFAOYSA-N Methyl-2-hydoxyisobutyric acid Chemical compound COC(=O)C(C)(C)O XYVQFUJDGOBPQI-UHFFFAOYSA-N 0.000 description 1
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 1
- XEEHRQPQNJOFIQ-UHFFFAOYSA-N N(C1=CC=CC=C1)CCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound N(C1=CC=CC=C1)CCCC(C(OC)(OC)OC)CCCCCCCC XEEHRQPQNJOFIQ-UHFFFAOYSA-N 0.000 description 1
- HDJGANPLOWXKTM-UHFFFAOYSA-N NC(=O)NCCCC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound NC(=O)NCCCC(C(OCC)(OCC)OCC)CCCCCCCC HDJGANPLOWXKTM-UHFFFAOYSA-N 0.000 description 1
- OBLLLECULNVMRA-UHFFFAOYSA-N NCCC(C(OC)(OC)OC)(CCCCCCCC)CCCN Chemical compound NCCC(C(OC)(OC)OC)(CCCCCCCC)CCCN OBLLLECULNVMRA-UHFFFAOYSA-N 0.000 description 1
- XJDCHDFUMGSEHD-UHFFFAOYSA-N NCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound NCCCC(C(OC)(OC)OC)CCCCCCCC XJDCHDFUMGSEHD-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- IDLJKTNBZKSHIY-UHFFFAOYSA-N [4-(diethylamino)phenyl]-phenylmethanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=CC=C1 IDLJKTNBZKSHIY-UHFFFAOYSA-N 0.000 description 1
- MBYNTKPBDYZMAQ-UHFFFAOYSA-N [benzhydrylperoxy(phenyl)methyl]benzene Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)OOC(C=1C=CC=CC=1)C1=CC=CC=C1 MBYNTKPBDYZMAQ-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000004450 alkenylene group Chemical group 0.000 description 1
- 125000004849 alkoxymethyl group Chemical group 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 150000008378 aryl ethers Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- GONOPSZTUGRENK-UHFFFAOYSA-N benzyl(trichloro)silane Chemical compound Cl[Si](Cl)(Cl)CC1=CC=CC=C1 GONOPSZTUGRENK-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- HXTBYXIZCDULQI-UHFFFAOYSA-N bis[4-(methylamino)phenyl]methanone Chemical compound C1=CC(NC)=CC=C1C(=O)C1=CC=C(NC)C=C1 HXTBYXIZCDULQI-UHFFFAOYSA-N 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 235000019437 butane-1,3-diol Nutrition 0.000 description 1
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 1
- 125000006226 butoxyethyl group Chemical group 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- SHZIWNPUGXLXDT-UHFFFAOYSA-N caproic acid ethyl ester Natural products CCCCCC(=O)OCC SHZIWNPUGXLXDT-UHFFFAOYSA-N 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000012986 chain transfer agent Substances 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical group CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
- SRXOCFMDUSFFAK-UHFFFAOYSA-N dimethyl peroxide Chemical class COOC SRXOCFMDUSFFAK-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- CKSRFHWWBKRUKA-UHFFFAOYSA-N ethyl 2-ethoxyacetate Chemical compound CCOCC(=O)OCC CKSRFHWWBKRUKA-UHFFFAOYSA-N 0.000 description 1
- GFUIDHWFLMPAGY-UHFFFAOYSA-N ethyl 2-hydroxy-2-methylpropanoate Chemical compound CCOC(=O)C(C)(C)O GFUIDHWFLMPAGY-UHFFFAOYSA-N 0.000 description 1
- ZANNOFHADGWOLI-UHFFFAOYSA-N ethyl 2-hydroxyacetate Chemical compound CCOC(=O)CO ZANNOFHADGWOLI-UHFFFAOYSA-N 0.000 description 1
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 1
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 125000003976 glyceryl group Chemical group [H]C([*])([H])C(O[H])([H])C(O[H])([H])[H] 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 1
- ZNAOFAIBVOMLPV-UHFFFAOYSA-N hexadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCOC(=O)C(C)=C ZNAOFAIBVOMLPV-UHFFFAOYSA-N 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- QZEJHHGVNNHHSU-UHFFFAOYSA-N hexyl benzenecarboperoxoate Chemical compound CCCCCCOOC(=O)C1=CC=CC=C1 QZEJHHGVNNHHSU-UHFFFAOYSA-N 0.000 description 1
- HZLWREPNSFWCSR-UHFFFAOYSA-N hexylperoxy propan-2-yl carbonate Chemical compound CCCCCCOOOC(=O)OC(C)C HZLWREPNSFWCSR-UHFFFAOYSA-N 0.000 description 1
- 239000008240 homogeneous mixture Substances 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- WSFJFIDCQBAQQZ-UHFFFAOYSA-N hydroxy(sulfido)phosphanium Chemical compound S[PH2]=O WSFJFIDCQBAQQZ-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 150000003903 lactic acid esters Chemical class 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- 150000004702 methyl esters Chemical class 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- SLGUOQSUHOEVJI-UHFFFAOYSA-N n-(6-cyanohexyl)-2-[[1-(6-cyanohexylamino)-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound N#CCCCCCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCCCCCC#N SLGUOQSUHOEVJI-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- NWAHZAIDMVNENC-UHFFFAOYSA-N octahydro-1h-4,7-methanoinden-5-yl methacrylate Chemical compound C12CCCC2C2CC(OC(=O)C(=C)C)C1C2 NWAHZAIDMVNENC-UHFFFAOYSA-N 0.000 description 1
- 229920002114 octoxynol-9 Polymers 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- AHIHJODVQGBOND-UHFFFAOYSA-N propan-2-yl hydrogen carbonate Chemical compound CC(C)OC(O)=O AHIHJODVQGBOND-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- JZFHXRUVMKEOFG-UHFFFAOYSA-N tert-butyl dodecaneperoxoate Chemical compound CCCCCCCCCCCC(=O)OOC(C)(C)C JZFHXRUVMKEOFG-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 229960000834 vinyl ether Drugs 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
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Description
本發明係關於具有丙烯酸系共聚鏈之含倍半矽氧烷化合物,尤其是,關於一種含倍半矽氧烷化合物,能賦予光聚合性、鹼可溶性、耐熱性、耐候性等各種所需機能,並且兼具透明性、耐熱性等矽系樹脂特徵而可適用於熱放射線性樹脂;並關於該化合物之製造方法,係於進行乙烯基單體之自由基共聚後接著進行三烷氧基矽烷共縮合。
近年來,於液晶、LED等顯示元件領域中,具有高透明性(亦即,高可見光穿透率。以下同。)並且兼有良好耐熱性、放射線感度、顯影解析度及耐藥品性等特性之熱放射線性樹脂的需求性在升高中。尤其是高透明性這一點,苯酚樹脂、漆用酚醛樹脂、丙烯酸系共聚樹脂、脂環烷基系樹脂等習知之感光性樹脂很難滿足該要求。也就是說,習知樹脂無法充分滿足高透明性(包括於塗膜成膜時之透明性及加熱後透明性之耐熱透明性兩者)。為解決該問題,使用矽系樹脂以期待能有良好透明性、耐熱性之之例子已揭示者有數例。
含有倍半矽氧烷構造之熱放射線性樹脂已揭示者有含有梯狀(ladder)倍半矽氧烷構造之共聚物之光阻劑樹脂(例如,參見專利文獻1)。該共聚物係先將具側鏈之三烷氧基矽烷共縮合後,再合成含有乙烯基系側鏈之梯狀構造的倍半矽氧烷,然後,將含有能因酸而分解產生有機酸基之側鏈的丙烯酸系單體與含有上述乙烯基系側鏈之倍半矽氧烷共聚所得到,該聚合物之目的係做為正型光阻使用。但是,該共聚物由於係先以共縮合合成倍半矽氧烷後再將丙烯酸系單體進行自由基共聚,故完全消耗掉化合物中之乙烯性雙鍵,以致無法發揮光聚合性,沒有負型光阻之機能。又,梯狀倍半矽氧烷構造雖然矽含量高且熱安定性或氧電漿耐受性良好,對做為正型光阻是有利的,但是在高透明性、耐熱性方面仍不足。
另外,已知有使用(甲基)丙烯醯氧基官能性梯狀倍半矽氧烷之鹼可溶性感光性樹脂(例如,參見專利文獻2)。該倍半矽氧烷不僅含有烷基、芳基、環己基等側鏈,並且含有(甲基)丙烯醯氧基,係由含(甲基)丙烯醯氧基之三烷氧基矽烷與含側鏈基之三烷氧基矽烷共縮合而成。但是,該倍半矽氧烷本身並不具有鹼可溶性。而且,完全沒有揭示關於含有含自由基共聚鏈之倍半矽氧烷的化合物。
又,已知有使用側鏈含有羧基之倍半矽氧烷之光阻組成物(例如,參見專利文獻3)。但是,該倍半矽氧烷並不具有光聚合性。而且,完全沒有揭示關於含有含自由基共聚鏈之倍半矽氧烷的化合物。如上,具有高透明性並滿足光阻之基本物性,適用於熱放射線性樹脂之倍半矽氧烷化合物到目前為止仍為未知的。
[專利文獻1]WO99/09457號公報,第37~39頁等。
[專利文獻2]日本特開平10-161315號公報,第(4)頁等。
[專利文獻3]日本特開平11-60734號公報,申請專利範圍等。
有鑑於上述現狀,本發明之目的為提供一種含有倍半矽氧烷之化合物,該化合物能賦予光聚合性、鹼可溶性、耐熱性、耐候性等各種所需機能,並且適用於兼具透明性、耐熱性等矽系樹脂之特徵之熱放射線性樹脂;並提供一種含有倍半矽氧烷之化合物的製造方法,係於乙烯基單體之自由基共聚之後接著進行三烷氧基矽烷之共縮合,以使化合物具有高設計自由度。
本發明者為了解決上述課題努力地研究,結果洞悉藉由於乙烯基單體之自由基共聚後接著進行三烷氧基矽烷共縮合,可以確保含倍半矽氧烷化合物之高設計自由度,並依據該見解發現了能自由賦予倍半矽氧烷各種機能之製造方法,並進而完成了本發明。也就是說,本發明為一種含倍半矽氧烷之化合物,係使得分子中具有三烷氧基甲矽烷基之(甲基)丙烯酸酯(A)與可具有取代基之(甲基)丙烯酸酯(B)共聚成共聚物(I),再使該共聚物(I)與分子中具有乙烯性碳-碳雙鍵的三烷氧基矽烷化合物(C’)共縮合而製得。
本發明尚為含有上述鹼可溶性化合物之熱放射線性樹脂組成物。
本發明尚為具有上述組成物之硬化層的電子零件或光學零件用基材。
本發明尚為含倍半矽氧烷之化合物的製造方法,包括(1)將分子中具有三烷氧基甲矽烷基之(甲基)丙烯酸酯(A)與可具有取代基之(甲基)丙烯酸酯(B)共聚之製程,及(2)使所得到之共聚物與分子中可含有乙烯性碳-碳雙鍵之三烷氧基矽烷化合物(C)共縮合之製程。
本發明由於有以上構成,而具有以下效果。
(1)本發明之含倍半矽氧烷的化合物能賦予光聚合性、鹼可溶性、耐熱性、耐候性等各種所需的機能。
(2)本發明之含倍半矽氧烷的化合物透明性、耐熱性良好。
(3)本發明之含倍半矽氧烷之化合物可提供透明性、耐熱性良好之熱放射線性樹脂。
(4)本發明之熱放射線性樹脂具有良好耐熱性、高透明性、放射線感度、顯像解析度及耐藥品性等特性。
以下,詳細說明本發明。
本發明中,分子中具有三烷氧基甲矽烷基之(甲基)丙烯酸酯(A)例如有,3-甲基丙烯醯氧丙基三甲氧基矽烷、3-甲基丙烯醯氧丙基三乙氧基矽烷、3-丙烯醯氧丙基三甲氧基矽烷、3-丙烯醯氧丙基三乙氧基矽烷等。
可具有取代基之(甲基)丙烯酸酯(B)含有不具有取代基之(甲基)丙烯酸酯以及具有取代基之(甲基)丙烯酸酯,上述取代基不特別限定,可具有能對應於對含倍半矽氧烷之化合物所欲賦予機能之取代基。例如,可以選擇能對含倍半矽氧烷之化合物賦予鹼可溶性之官能基、能對含倍半矽氧烷之化合物賦予耐熱性及耐候性至少之一性質的官能基等。
具有該種取代基之(甲基)丙烯酸酯例如有,以能對含倍半矽氧烷之化合物賦予鹼可溶性之官能基做為取代基之(甲基)丙烯酸酯(b-1),例如,鄰苯二甲酸2-(甲基)丙烯醯氧基乙酯、六氫鄰苯二甲酸2-(甲基)丙烯醯氧基乙酯、丙烯酸β-羧基乙酯、單丙烯酸ω-羧基聚己內酯、氧化乙烯變性琥珀酸丙烯酸酯等。該等可以使用1種或併用2種以上。
以能對含倍半矽氧烷之化合物賦予耐熱性及耐候性中至少一種特性之官能基做為取代基之(甲基)丙烯酸酯(b-2),例如,(甲基)丙烯酸二環戊酯、(甲基)丙烯酸二環戊烯氧基乙酯、(甲基)丙烯酸異冰片酯、9-甲基丙烯醯氧甲芴、(甲基)丙烯酸四氫糠酯等。該等可使用1種或併用2種以上。
其他可具有取代基之(甲基)丙烯酸酯(B)例如有以能對含倍半矽氧烷之化合物賦予密合性之官能基做為取代基之(甲基)丙烯酸酯(b-3),例如,(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基2-乙基己基氧丙酯、(甲基)丙烯酸2-羥基丁酯、丙烯酸己內酯、(甲基)丙烯酸甲氧基二乙二醇酯、(甲基)丙烯酸甲氧基三乙二醇酯、(甲基)丙烯酸壬基苯氧基聚丙二醇酯、羥基乙基乙烯基醚等;以能對含倍半矽氧烷之化合物賦予互溶性及疏水性中至少之一性質之官能基做為取代基之(甲基)丙烯酸酯(b-4),例如,(甲基)丙烯酸環己酯、(甲基)丙烯酸芐酯、(甲基)丙烯酸丁氧基乙酯、甲基丙烯酸鯨蠟酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸甘油酯、(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸、六氟丙酯、3-乙基-3-(甲基)丙烯醯氧甲基氧雜環丁烷、3-甲基-3-(甲基)丙烯醯氧甲基氧雜環丁烷、(甲基)丙烯酸異丁酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸月桂氧基聚乙二醇酯、(甲基)丙烯酸月桂酯、(甲基)丙烯酸甲氧基聚乙烯、(甲基)丙烯酸甲酯、(甲基)丙烯酸五甲基哌啶酯、(甲基)丙烯酸苯氧基乙酯、(甲基)丙烯酸硬脂酯、(甲基)丙烯酸異硬脂酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸四甲基哌啶酯、(甲基)丙烯酸辣木子油酯、三乙二醇二乙烯醚、八癸基乙烯醚等;以能對含倍半矽氧烷之化合物賦予難燃性之官能基做為取代基之(甲基)丙烯酸酯(b-5),例如,(甲基)丙烯酸三溴苯酯、丙烯酸EO變性三溴苯酯等。該等可使用1種或併用2種以上,又,可以併用上述酯(b-3)~(b-5)。也可以併用上述酯(b-1)~(b-5)。
(甲基)丙烯酸酯(A)與(甲基)丙烯酸酯(B)之共聚可依常法進行,可使用溶液聚合、懸浮聚合、乳化聚合等周知的方法,從操作容易性方面考量,較佳為溶液聚合法。以溶液聚合法製造本發明之共聚物時,首先,於上述(甲基)丙烯酸酯(A)與(甲基)丙烯酸酯(B)之單體混合物中溶解聚合起始劑,並依需要溶解鏈移轉劑。然後,將所得到之均勻混合液於既定聚合溫度維持一定時間使聚合完成,可得到共聚物。
此時可使用之聚合起始劑較佳為10小時半衰期溫度為60~120℃之範圍內者。該種聚合起始劑例如有,2,2’-偶氮二異丁腈、2,2’-偶氮二(2,4-二甲基戊腈)、2,2’-偶氮二(2-甲基丁腈)、2,2’-偶氮二(2-甲基丙酸酯)、2,2’-偶氮二(N-氰基己基-2-甲基丙醯胺)、2,2’-偶氮二[N-(2-丙烯基)-2-甲基丙醯胺]等偶氮類;己酸1,1,3,3-四甲基丁基過氧化2-乙酯、己酸1-環己基-1-甲基乙基過氧化2-乙酯、己酸第三己基過氧化2-乙酯、己酸第三戊基-過氧化2-乙酯、己酸第三丁基-過氧化2-乙酯、第三丁基-過氧化異丁酸酯、第三丁基過氧化馬來酸、己酸第三戊基過氧化3,5,5-三甲酯、己酸第三丁基過氧化3,5,5-三甲酯、第三丁基過氧化月桂酸酯、第三己基過氧化苯甲酸酯、第三丁基過氧化乙酸酯、第三丁基過氧化間甲苯醯基苯甲酸酯、第三丁基過氧化苯甲酸酯等過氧化酯類;第三己基過氧化異丙基單碳酸酯、第三丁基過氧化異丙基單碳酸酯、第三丁基過氧化2-乙基己基單碳酸酯等過氧化單碳酸酯類;雙-3,5,5-三甲基己醯基過氧化物、辛醯基過氧化物、月桂醯基過氧化物、硬脂醯基過氧化物、琥珀酸過氧化物、間甲苯醯基過氧化物、苯甲醯基過氧化物、對氯苯甲醯基過氧化物等二醯基過氧化物類;二枯基過氧化物、第三丁基枯基過氧化物等二烷基過氧化物類等。該等可使用1種或併用2種以上。
共聚物(I)中(甲基)丙烯酸酯(A)成分之配合量較佳為5~95質量%。如果(甲基)丙烯酸酯(A)成分之配合量落於上述範圍,則對於含倍半矽氧烷之化合物之耐熱性、透明性、機械強度方面有好處。更佳為5~50質量%。
共聚物(I)中(甲基)丙烯酸酯(B)成分之配合量較佳為含羧酸單體為5~95質量%,更佳為50~70質量%,其他單體較佳為0~50質量%。
共聚物(I)之重量平均分子量較佳為1000~50000。如果重量平均分子量超過50000,則與三烷氧基矽烷化合物(C)共縮合時可能發生凝膠化,反之,如果低於1000,則含倍半矽氧烷之化合物之顯影速度可能會過快,造成鹼溶解度控制困難或者無法得到充分的耐熱性。更佳為4000~40000,又更佳為7000~30000。
本發明中,分子中可含有乙烯性碳-碳雙鍵之三烷氧基矽烷化合物(C)包括分子中含有乙烯性碳-碳雙鍵之三烷氧基矽烷化合物(C’)及分子中不含有乙烯性碳-碳雙鍵之三烷氧基矽烷化合物。分子中含有乙烯性碳-碳雙鍵之三烷氧基矽烷化合物(C’)例如有,3-甲基丙烯醯氧丙基三甲氧基矽烷、3-甲基丙烯醯氧丙基三乙氧基矽烷、3-丙烯醯氧丙基三甲氧基矽烷等(甲基)丙烯醯氧三烷氧基矽烷、乙烯基三甲氧基矽烷、對苯乙烯基三甲氧基矽烷等。該等可使用1種或併用2種以上。
分子中不含有乙烯性碳-碳雙鍵之三烷氧基矽烷化合物例如有,苯基三甲基矽烷、甲基三甲氧基矽烷、2-(3,4環氧)環己基乙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、N-2(胺乙基)3-胺丙基三甲氧基矽烷、3-胺丙基三甲氧基矽烷、3-胺丙基三乙氧基矽烷、3-三乙氧基甲矽烷基-N-(1,3-二甲基-丁叉)丙胺、N-苯基-3-胺丙基三甲氧基矽烷、3-脲基丙基三乙氧基矽烷、3-氯丙基三甲氧基矽烷、3-巰基丙基三甲基矽烷、3-異氰酸酯丙基三乙氧基矽烷等烷基、芳基系官能基所構成單體,可選用至少1種以上。
共聚物(I)與三烷氧基矽烷化合物(C)之共縮合可依常法進行,藉由於酸性觸媒存在下使烷氧基甲矽烷基水解,並藉由矽醇基之脫水縮合反應形成矽氧烷鍵。此時配合之水量較佳為對烷氧基甲矽烷基之莫耳數,為1.0~3.0。如果配合莫耳數落於該範圍內,則所得到含倍半矽氧烷之化合物為主要含有籠狀構造之梯狀、無規狀等構造之混合物。
上述酸性觸媒可使用例如,鹽酸、硫酸、硝酸、乙酸、磷酸、硼酸、三氟乙酸、三氟甲磺酸、對甲苯磺酸等。也可以使用四丁基氟化銨、氟化鉀、氟化鈉等氟系化合物等。其配合量較佳為0.01~0.1重量%。
共縮合反應之反應溫度為40~80℃,反應時間較佳為3~12小時。
本發明之含倍半矽氧烷之化合物的製造方法如上所述,係先進行丙烯酸系單體之共聚,再將烷氧基甲矽烷基水解與脫水縮合以進行共縮合,故(i)容易對目的化合物導入碳-碳雙鍵、(ii)藉由使用具有各種取代基之共聚單體,可以輕易地對目的化合物賦予所需的特性,因此,本方法對目的化合物之設計自由度極大。例如(甲基)丙烯酸酯(B)使用取代基為能對含倍半矽氧烷之化合物賦予鹼可溶性之官能基的(甲基)丙烯酸酯(b-1)、取代基為能對含倍半矽氧烷之化合物賦予耐熱性及耐候性中至少之一性質之官能基的(甲基)丙烯酸酯(b-2),可對目的化合物賦予鹼可溶性與耐熱性及耐候性其中至少之一的性質,並且,藉由使分子中具有乙烯性碳-碳雙鍵之三烷氧基矽烷化合物(C’)共縮合,可以對目的化合物賦予光聚合性。該種鹼可溶性之含倍半矽氧烷之化合物適於做為負型熱放射線性樹脂組成物。再者,如果三烷氧基矽烷化合物(C)使用由上述烷基、芳基系官能基所構成之單體,則適於做為正型熱放射線性樹脂組成物。
上述熱放射線性樹脂組成物中,可以配合光聚合起始劑(E)、交聯劑(F)及界面活性劑(G)。上述光聚合起始劑(E)例如有,硫咕噸酮、2,4-二乙基硫咕噸酮等硫咕噸酮類;4,4’-二甲胺基二苯甲酮、4,4’-二乙胺基二苯甲酮等二苯甲酮類;2,2-二乙氧基苯乙酮、2,2’-二甲氧基-2-苯基苯乙酮、2-甲基[4-(甲基硫)苯基]-2-嗎啉基-1-丙酮、2-芐基-2-二甲胺基-1-(4-嗎啉基苯基)-丁烷-1-酮等苯乙酮類;2-(4-甲氧基-1-萘基)-4,6-雙(三氯甲基)-s-三嗪等鹵化物;2,4,6-三甲基苯甲醯基二苯基膦氧化物等醯基膦氧化物類;及3,3’,4,4’-四(第三丁基過氧化羰基)二苯甲酮等過氧化物等。
上述光聚合起始劑(E)之配合量較佳為熱放射線性樹脂組成物全體之0.5~10重量%,更佳為1~5重量%。
上述交聯劑(F)例如有,二(甲基)丙烯酸1,6-己二醇酯、二(甲基)丙烯酸1,4-丁二醇酯、二(甲基)丙烯酸乙二醇酯、二(甲基)丙烯酸二乙二醇酯、二(甲基)丙烯酸四乙二醇酯、二(甲基)丙烯酸三丙二醇酯、二(甲基)丙烯酸新戊二醇酯、二(甲基)丙烯酸聚(丁二醇酯)、二(甲基)丙烯酸1,3-丁二醇酯、二(甲基)丙烯酸三乙二醇酯、二(甲基)丙烯酸三異丙二醇酯、二(甲基)丙烯酸聚乙二醇酯、二(甲基)丙烯酸聚丙二醇酯、雙酚A二(甲基)丙烯酸酯、三(甲基)丙烯酸三羥甲基丙烷、單羥基三(甲基)丙烯酸季戊四醇酯、三羥甲基丙烷三乙氧基三(甲基)丙烯酸酯、四(甲基)丙烯酸季戊四醇酯、二-三羥甲基丙烷四(甲基)丙烯酸酯、單羥基五(甲基)丙烯酸二季戊四醇酯、六(甲基)丙烯酸二季戊四醇酯、三聚異氰酸氧化乙烯(以下,稱EO)變性三(甲基)丙烯酸酯、三羥甲基丙烷EO變性三(甲基)丙烯酸酯、三羥甲基丙烷氧化丙烯變性三(甲基)丙烯酸酯、各種胺基甲烷酯多元(甲基)丙烯酸酯以及各種酯多元(甲基)丙烯酸酯等。該等多官能(甲基)丙烯酸酯單體或低聚物可以使用東亞合成(股)、日本化藥(股)之市售品。
上述交聯劑(F)之配合量較佳為熱放射線性樹脂組成物全體之20重量%以下,又更佳為10重量%以下。
上述界面活性劑(G)例如有,聚氧化乙烯月桂醚、聚氧化乙烯硬脂醚、聚氧化乙烯油醚等聚氧化乙烯烷醚類;聚氧化乙烯辛基苯醚、聚氧化乙烯壬基苯醚等聚氧化乙烯芳基醚類;聚氧化乙烯二月桂酸酯、聚氧化乙烯二硬脂酸酯等聚氧化乙烯二烷基酯非離子系界面活性劑;耶夫托普EF301、耶夫托普303、耶夫托普352(新秋田化成(股)製);美加法克F171、美加法克F172、美加法克F173(大日本墨水化學工業(股)製);夫洛拉得FC-430、夫洛拉得FC-431(住友3M公司(股)製);阿薩烯加得AG710、薩非隆S-382、薩非隆SC-101、薩非隆SC-102、薩非隆SC-103、薩非隆SC-104、薩非隆SC-105、薩非隆SC-106(旭硝子(股)製)等名稱市售之氟系界面活性劑;有機矽氧烷聚合物KP341(信越化學工業(股)製);(甲基)丙烯酸系共聚物波利夫羅第57號、95號(共榮社油脂化學工業(股)製)等。該等可使用1種或併用2種以上。
上述界面活性劑(G)係用以提高含有溶劑之本發明熱放射線性樹脂組成物的塗佈性。
上述界面活性劑(G)之配合量較佳為熱放射線性樹脂組成物全體之2重量%以下,更佳為1重量%以下。
於上述熱放射線性樹脂組成物中,在不損害本發明目的之範圍內,亦可配合其他成分。上述其他成分例如有,溶劑、抗靜電劑、保存安定劑、消泡劑、顏料、染料等。
上述溶劑例如有,甲醇、乙醇等醇類;四氫呋喃等醚類;乙二醇單甲醚、乙二醇單乙醚、乙二醇單丁醚、乙二醇二甲醚、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單丁醚等二醇醚類;甲基2-乙氧基乙醇乙酸酯、乙基2-乙氧基乙醇乙酸酯、丁基2-乙氧基乙醇乙酸酯、丙二醇甲基醚乙酸酯、3-甲氧基丁基-1-乙酸酯等烷撐二烷單烷醚乙酸酯類;甲苯、二甲苯等芳香族烴類;甲乙酮、甲基異丁酮、甲基戊酮、環己酮、4-羥基-4-甲基-2-戊酮等酮類;2-羥基丙酸乙酯、2-羥基-2-甲基丙酸甲酯、2-羥基-2-甲基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸乙酯、2-羥基-2-甲基丁酸甲酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙酸乙酯、乙酸丁酯、乳酸甲酯、乳酸乙酯等酯類。該等溶劑可單獨使用1種,亦可混合2種以上使用。
將上述熱放射線性樹脂組成物塗佈於基體表面,並以加熱除去溶劑,可形成塗膜。對基體表面塗佈感光性樹脂組成物時可使用旋塗法、輥塗法、浸泡法等習知周知的方法。接著,將該塗膜以加熱板、烤箱進行加熱(預烘烤)。
上述基體不特別限定,例如有各種電子零件或光學零件等之基板,具體而言,例如有形成於THT與透明電極間之透明絕緣膜,以及使用該等之液晶顯示元件、PDP等顯示元件、光學零件或光學元件中之基板等。
之後,將經預烘之塗膜上透過既定圖案之光罩照射紫外線等後,以顯影液顯影,除去不需要的部分後,可形成既定形狀之被膜。顯影液例如有,碳酸鈉、氫氧化鈉、氫氧化鉀等無機鹼類,及四甲基氫氧化銨、四乙基氫氧化銨等有機鹼類等之水溶液。又,亦可於上述鹼水溶液中適當添加甲醇、乙醇、界面活性劑等。顯影方法可使用浸泡法、噴淋法、噴霧法任一種,顯影時間通常為30~240秒,於顯影後以水流沖洗,並乾燥,可形成圖案。
之後,將該圖案以加熱板、烘箱加熱(後烘烤)使未反應成分進一步交聯化,並同時完全除去溶劑,可得到既定的被膜圖案。後烘烤條件依各成分種類、配合比例而有不同,通常為180~220℃、如為加熱板則為5~30分鐘,如為烤箱則為30~90分鐘。
總括而言,可得到具有上述熱放射線性樹脂組成物之硬化層的電子零件或光學零件用基材。
以下舉實施例進一步詳細說明本發明,但本發明不限定於該等。
鹼可溶性含倍半矽氧烷之化合物D-1之合成於附有攪拌機、冷卻管、氮氣導入管及溫度計之燒瓶內加入六氫鄰苯二甲酸2-丙烯醯氧基乙酯6.1g、3-甲基丙烯醯氧丙基三甲氧基矽烷4.7g、甲基丙烯酸芐酯20.0g、2,2’-偶氮二異丁腈1.3g、β-疏基丙酸1.3g、甲苯137g,進行30分鐘氮氣清洗後,將燒瓶置於油浴後,於內溫80℃進行5小時之聚合反應。之後,冷卻至室溫,得到共聚物溶液。接著,於附有攪拌機、冷卻管、滴液漏斗及溫度計之燒瓶內加入所得到之聚合物溶液100g、3-丙烯醯氧丙基三甲氧基矽烷12.9g、甲基三甲氧基矽烷7.1g、異丙醇30g,於內溫70℃花30分鐘滴入由蒸餾水5g、36%鹽酸0.3g及其丙醇5g混合成之水溶液,進行反應3小時。冷卻至室溫後,加入吸附劑秋瓦得500(商品名,以下同)3g,攪拌15分鐘以中和。過濾後濃縮之,得到鹼可溶性含倍半矽氧烷之化合物D-146.4g。所得到樹脂之重量平均分子量(以下稱Mw)為17200。
鹼可溶性含倍半矽氧烷之化合物D-2之合成於附有攪拌機、冷卻管、氮氣導入管及溫度計之燒瓶內加入六氫鄰苯二甲酸2-丙烯醯氧基乙酯6.1g、3-甲基丙烯醯氧丙基三甲氧基矽烷4.7g、丙烯酸異冰片酯20.0g、2,2’-偶氮二異丁腈1.3g、β-巰基丙酸1.3g、甲苯137g,進行30分鐘氮氣清洗後,將燒瓶置於油浴後,於內溫80℃進行5小時之聚合反應。之後,冷卻至室溫,得到共聚物溶液。接著,於附有攪拌機、冷卻管、滴液漏斗及溫度計之燒瓶內加入所得到之聚合物溶液100g、3-丙烯醯氧丙基三甲氧基矽烷6.5g、甲基三甲氧基矽烷13.5g、異丙醇30g,於內溫70℃花30分鐘滴入由蒸餾水5g、36%鹽酸0.3g及異丙醇5g混合成之水溶液,進行反應3小時。冷卻至室溫後,加入吸附劑秋瓦得500 3g,攪拌15分鐘以中和。過濾後濃縮之,得到鹼可溶性含倍半矽氧烷之化合物D-2 38.0g。所得到樹脂之Mw為15500。
鹼可溶性含倍半矽氧烷之化合物D-3之合成於附有攪拌機、冷卻管、氮氣導入管及溫度計之燒瓶內加入六氫鄰苯二甲酸2-丙烯醯氧基乙酯6.1g、3-甲基丙烯醯氧丙基三甲氧基矽烷4.5g、甲基丙烯酸環己酯20.0g、β-巰基丙酸1.3g、2,2’-偶氮二異丁腈1.3g、甲苯137g,進行30分鐘氮氣清洗後,將燒瓶置於油浴後,於內溫80℃進行5小時之聚合反應。之後,冷卻至室溫,得到共聚物溶液。接著,於附有攪拌機、冷卻管、滴液漏斗及溫度計之燒瓶內加入所得到之聚合物溶液100g、甲基三甲氧基矽烷1.0g、3-丙烯醯氧丙基三甲氧基矽烷19.0g、異丙醇30g,於內溫70℃花30分鐘滴入由蒸餾水5g、36%鹽酸0.3g及異丙醇5g混合成之水溶液,進行反應3小時。冷卻至室溫後,加入吸附劑秋瓦得500 3g,攪拌15分鐘以中和。過濾後濃縮之,得到鹼可溶性含倍半矽氧烷之化合物D-3 44.0g。所得到樹脂之Mw為16800。
鹼可溶性含倍半矽氧烷之化合物D-4之合成於附有攪拌機、冷卻管、氮氣導入管及溫度計之燒瓶內加入六氫鄰苯二甲酸2-丙烯醯氧基乙酯4.0g、3-甲基丙烯醯氧丙基三甲氧基矽烷4.5g、甲基丙烯酸二環戊酯23.0g、β-巰基丙酸1.3g、2,2’-偶氮二異丁腈1.3g、甲苯137g,進行30分鐘氮氣清洗後,將燒瓶置於油浴,於內溫80℃進行5小時之聚合反應。之後,冷卻至室溫,得到共聚物溶液。接著,於附有攪拌機、冷卻管、滴液漏斗及溫度計之燒瓶內加入所得到之聚合物溶液100g、甲基三甲氧基矽烷7.1g、3-丙烯醯氧丙基三甲氧基矽烷12.9g、異丙醇30g,於內溫70℃花30分鐘滴入由蒸餾水5g、36%鹽酸0.3g及異丙醇5g混合成之水溶液,進行反應3小時。冷卻至室溫後,加入吸附劑秋瓦得500 3g,攪拌15分鐘以中和。過濾後濃縮之,得到鹼可溶性含倍半矽氧烷之化合物D-4 38.0g。所得到樹脂之Mw為15300。
鹼可溶性含倍半矽氧烷之化合物D-5之合成於附有攪拌機、冷卻管、氮氣導入管及溫度計之燒瓶內加入六氫鄰苯二甲酸2-丙烯醯氧基乙酯9.0g、3-甲基丙烯醯氧丙基三甲氧基矽烷4.7g、甲基丙烯酸第三丁基環己酯18g、β-巰基丙酸1.3g、2,2’-偶氮二異丁腈1.3g、甲苯137g,進行30分鐘氮氣清洗後,將燒瓶置於油浴,於內溫80℃進行5小時之聚合反應。之後,冷卻至室溫,得到共聚物溶液。接著,於附有攪拌機、冷卻管、滴液漏斗及溫度計之燒瓶內加入所得到之聚合物溶液100g、苯基三甲氧基矽烷7.1g、3-丙烯醯氧丙基三甲氧基矽烷12.9g、異丙醇30g,於內溫70℃花30分鐘滴入由蒸餾水5g、36%鹽酸0.3g及異丙醇5g混合成之水溶液,進行反應3小時。冷卻至室溫後,加入吸附劑秋瓦得500 3g,攪拌15分鐘以中和。過濾後濃縮之,得到鹼可溶性含倍半矽氧烷之化合物D-5 38.0g。所得到樹脂之Mw為16600。
將實施例1得到之鹼可溶性含倍半矽氧烷之化合物D-1 100重量份、依魯加秋亞9077重量份、DPHA(六丙烯酸二季戊四醇酯,日本化藥公司製)4重量份,及美加法克172 0.01重量份溶解於丙二醇單甲醚乙酸酯,使固體成分濃度為30重量%。將該溶液以孔徑0.2μm的毫米孔過濾器過濾,得到熱放射線性樹脂組成物。
除將鹼可溶性含倍半矽氧烷之化合物(D-1)改為實施例2得到之鹼可溶性含倍半矽氧烷之化合物(D-2)以外,與實施例6以同樣方式操作,以得到熱放射線性樹脂組成物。
除將鹼可溶性含倍半矽氧烷之化合物(D-1)改為實施例3得到之鹼可溶性含倍半矽氧烷之化合物(D-3)以外,與實施例6以同樣方式操作,以得到熱放射線性樹脂組成物。
除將鹼可溶性含倍半矽氧烷之化合物(D-1)改為實施例4得到之鹼可溶性含倍半矽氧烷之化合物(D-4)以外,與實施例6以同樣方式操作,以得到熱放射線性樹脂組成物。
除將鹼可溶性含倍半矽氧烷之化合物(D-1)改為實施例5得到之鹼可溶性含倍半矽氧烷之化合物(D-5)以外,與實施例6以同樣方式操作,以得到熱放射線性樹脂組成物。
除將鹼可溶性含倍半矽氧烷之化合物(D-1)改為漆用酚醛環氧基丙烯酸酯C-0011(日本化藥(股)製)以外,與實施例6以同樣方式操作,以得到熱放射線性樹脂組成物。
除將鹼可溶性含倍半矽氧烷之化合物(D-1)改為雙酚A型環氧基丙烯酸酯TCR-1122(日本化藥(股)製)以外,與實施例6以同樣方式操作,以得到熱放射線性樹脂組成物。
對實施例6~10及比較例1~2所得到熱放射線性樹脂組成物以如下項目評價,結果如表1所示。
1.薄膜之圖案化特性將實施例6~10及比較例1~2所得到熱放射線性樹脂組成物使用旋塗機塗佈於玻璃基板上後,於90℃之加熱板上進行120秒的預烘烤,得到膜厚約0.5μm之塗膜。接著,於具有塗膜之玻璃基板上設置具有既定圖案之光罩,使用250W之高壓水銀燈,於波長405nm照射光強度為9.5mW/cm2
之紫外線,使能量為1000mJ/cm2
。接著,使用2.38%四甲基氫氧化銨水溶液,於23℃進行60秒之顯影處理,除去塗膜之未曝光部,得到具有由殘留薄膜構成圖案之基板。評價依據如下基準。玻璃基板使用「康寧7059(康寧公司製)」。
(圖案形狀評價)◎:加熱前後沒有觀察到變化。○:加熱前後有觀察到些微變化。△:有相當的變化。
2.光線穿透率對上述預烘烤得到之塗膜,使用日立製分光光度計U-2000測定分光穿透率。評價依據如下基準。
○:最低穿透率為95%以上。×:最低穿透率為95%以下。
3.耐熱性將上述1所得到具有圖案之基板於230℃加熱60分鐘,觀察圖案狀態(形狀、表面狀態),並觀察圖案之熱變形。比較加熱前與加熱後線形圖案之截面形狀。
○:加熱前後沒有觀察到變化。×:加熱前後有觀察到變化。
4.耐熱變色性將上述1所得到具有圖案之基板於230℃加熱60分鐘,使用分光光度計(日立製分光光度計U-2000)於400~700nm之波長測定玻璃基板之穿透率。穿透率之變化依下式求出。
穿透率之變化=[(加熱前穿透率-加熱後穿透率]×100(%)○:穿透率之變化低於5%。×:穿透率之變化超過5%。
5.鉛筆硬度將上述預烘烤所得到之塗膜於230℃加熱60分鐘,對所得到之硬化膜依據JIS-K-5400之試驗法測定鉛筆硬度。以使用鉛筆硬度試驗機施加9.8N負荷時硬化膜不會損傷之最高硬度定為鉛筆硬度。
6.感度感度係依據灰度(Kodak Photographic StepTablet No.2)以於1000mJ/cm2
硬化之等級表示。數字愈大表示感度較高。
7.顯影性以掃描式電子顯微鏡觀察形成於矽晶圓上線寬0.5μm之L/S方形截面,評價基準如下。
○:圖案間沒有顯影殘留物。△:圖案間有部分顯影殘留物。×:圖案間有很多顯影殘留物。
由實施例6~10可以得知,使用本發明之鹼可溶性含倍半矽氧烷之化合物的熱放射線性樹脂組成物在光線穿透性、耐熱性、圖案化特性、耐熱變色性方面特別良好,並且顯影性、感度方面能較習知技術比較例1及比較例2發揮更好的性能。
本發明之含倍半矽氧烷之化合物不僅透明性、耐熱性良好,並且兼具良好的感度、解析度,適於做為於TFT與透明電極之間所形成的透明絕緣膜等熱放射線性樹脂組成物,也適用於液晶顯示元件及電漿顯示器面板(PDP)等之顯示元件,對於提升顯示元件之性能極為有利。並且,本發明之製造方法藉由於乙烯基單體之自由基共聚後接著進行三烷氧基矽烷之共縮合,可以輕易地對含倍半矽氧烷之化合物賦予鹼可溶性、耐候性、密合性、互溶性、難燃性、光聚合性等各種性質,能合成具有所需機能之含倍半矽氧烷之化合物,是極為有利的。
Claims (14)
- 一種用於TFT與透明電極間之透明絕緣膜之含倍半矽氧烷之化合物,係使得分子中具有三烷氧基甲矽烷基之(甲基)丙烯酸酯(A)與可具有取代基之(甲基)丙烯酸酯(B)共聚成共聚物(I),再使該共聚物(I)與分子中具有乙烯性碳-碳雙鍵的三烷氧基矽烷化合物(C’)共縮合而製得。
- 如申請專利範圍第1項之含倍半矽氧烷之化合物,其中(甲基)丙烯酸酯(B),係選自由具有可對含倍半矽氧烷之化合物賦予鹼可溶性之官能基做為取代基之(甲基)丙烯酸酯(b-1)、以及具有可對含倍半矽氧烷之化合物賦予耐熱性及耐候性中至少一種特性之官能基做為取代基之(甲基)丙烯酸酯(b-2)所構成群中至少1種。
- 如申請專利範圍第2項之含倍半矽氧烷之化合物,其中,該(甲基)丙烯酸酯(b-1)含有羧基。
- 如申請專利範圍第3項之含倍半矽氧烷之化合物,其中該(甲基)丙烯酸酯(b-1),係鄰苯二甲酸2-(甲基)丙烯醯氧基乙酯、六氫鄰苯二甲酸2-(甲基)丙烯醯氧基乙酯、丙烯酸β-羧基乙酯、單丙烯酸ω-羧基聚己內酯、或氧化乙烯變性琥珀酸丙烯酸酯。
- 一種含倍半矽氧烷之化合物,係使得分子中具有三烷氧基甲矽烷基之(甲基)丙烯酸酯(A)與可具有取代基之(甲基)丙烯酸酯(B)共聚成共聚物(I),再使該共聚物(I)與分子中具有乙烯性碳-碳雙鍵的三烷氧基矽烷化合物(C’)共縮合而製得; 該(甲基)丙烯酸酯(B),係選自由具有可對含倍半矽氧烷之化合物賦予鹼可溶性之官能基做為取代基之(甲基)丙烯酸酯(b-1)、以及具有可對含倍半矽氧烷之化合物賦予耐熱性及耐候性中至少一種特性之官能基做為取代基之(甲基)丙烯酸酯(b-2)所構成群中至少1種;該(甲基)丙烯酸酯(b-2),係(甲基)丙烯酸二環戊酯、(甲基)丙烯酸二環戊烯氧乙酯、(甲基)丙烯酸異冰片酯、9-甲基丙烯醯氧甲芴、或(甲基)丙烯酸四氫糠酯。
- 如申請專利範圍第1項之含倍半矽氧烷之化合物,其中(甲基)丙烯酸酯(B),係選自由具有可對含倍半矽氧烷之化合物賦予密合性之官能基做為取代基之(甲基)丙烯酸酯(b-3)、具有可對含倍半矽氧烷之化合物賦予互溶性及疏水性中至少一性質之官能基做為取代基之(甲基)丙烯酸酯(b-4)、及具有可對含倍半矽氧烷之化合物賦予難燃性之官能基做為取代基之(甲基)丙烯酸酯(b-5)所構成群中至少1種。
- 如申請專利範圍第1項之含倍半矽氧烷之化合物,其中三烷氧基矽烷化合物(C’),係(甲基)丙烯醯氧三烷氧基矽烷、乙烯基三甲氧基矽烷、或對苯乙烯三甲氧基矽烷。
- 如申請專利範圍第1項之含倍半矽氧烷之化合物,其為籠狀構造。
- 如申請專利範圍第1項之含倍半矽氧烷之化合物,其中,共聚物(I)中(甲基)丙烯酸酯(A)成分之配合量為5~95質量%。
- 如申請專利範圍第1項之含倍半矽氧烷之化合物,其中,共聚物(I)之重量平均分子量為1000~50000。
- 一種熱放射線性樹脂組成物,其特徵在於,呈鹼可溶性且含有申請專利範圍第2項之含倍半矽氧烷之化合物。
- 如申請專利範圍第11項之熱放射線性樹脂組成物,其含有光聚合起始劑(E)、交聯劑(F)及界面活性劑(G)。
- 一種電子零件或光學零件基材,其特徵在於,具有申請專利範圍第11項之熱放射線性樹脂組成物的硬化層。
- 一種用於TFT與透明電極間之透明絕緣膜之含倍半矽氧烷之化合物之製造方法,其特徵為:包括下述製程:(1)使得分子中具有三烷氧基甲矽烷基之(甲基)丙烯酸酯(A)與可具有取代基之(甲基)丙烯酸酯(B)進行共聚合,及(2)使得所得到之共聚物與分子中可具有乙烯性碳-碳雙鍵之三烷氧基矽烷化合物(C)進行共縮合。
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| JP2004226978A JP4517229B2 (ja) | 2004-08-03 | 2004-08-03 | シルセスキオキサン含有化合物及びその製造方法 |
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| JP4618512B2 (ja) * | 2005-03-08 | 2011-01-26 | Dic株式会社 | 紫外線硬化性樹脂組成物、紫外線硬化性塗料及び塗装物。 |
| WO2006095686A1 (ja) * | 2005-03-08 | 2006-09-14 | Dainippon Ink And Chemicals, Inc. | 紫外線硬化性樹脂組成物及び紫外線硬化性塗料及び塗装物 |
| DE102006032077A1 (de) * | 2006-07-11 | 2008-01-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Hybride Polymermaterialien durch Copolymerisation |
| JP4885742B2 (ja) * | 2007-01-05 | 2012-02-29 | 昭和電工株式会社 | 感光性樹脂組成物 |
| JP4896755B2 (ja) * | 2007-02-01 | 2012-03-14 | 東京応化工業株式会社 | 液晶表示素子用平坦化絶縁膜形成用組成物および液晶表示素子用平坦化絶縁膜の製造方法 |
| JP5135820B2 (ja) * | 2007-02-20 | 2013-02-06 | Jsr株式会社 | アルカリ可溶性重合体、着色層形成用感放射線性組成物、カラーフィルタおよび液晶表示素子 |
| US8557498B2 (en) | 2007-04-04 | 2013-10-15 | Asahi Kasei E-Materials Corporation | Photosensitive resin composition |
| JP4899100B2 (ja) * | 2007-05-29 | 2012-03-21 | ナガセケムテックス株式会社 | 感光性組成物 |
| JP4938571B2 (ja) * | 2007-07-11 | 2012-05-23 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物 |
| KR100936998B1 (ko) * | 2007-10-19 | 2010-01-15 | 에스화인켐 주식회사 | 감광성 폴리실세스퀴옥산 수지 조성물 및 이를 이용한박막의 패턴 형성 방법 |
| KR100930671B1 (ko) * | 2007-12-20 | 2009-12-09 | 제일모직주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터 |
| US8138274B2 (en) * | 2009-12-08 | 2012-03-20 | Le Centre National De La Recherche Scien | Process for preparation of fluorosilicon polymer |
| JP5515714B2 (ja) * | 2009-12-16 | 2014-06-11 | Jsr株式会社 | 着色組成物、カラーフィルタおよびカラー液晶表示素子 |
| JP6032461B2 (ja) * | 2011-03-30 | 2016-11-30 | Dic株式会社 | フォトレジスト材料、及びフォトレジスト膜の形成方法 |
| JP5983151B2 (ja) * | 2011-07-29 | 2016-08-31 | Dic株式会社 | ドライエッチングレジスト材料、レジスト膜及びパターン形成物 |
| TW201418333A (zh) * | 2012-10-15 | 2014-05-16 | Dainippon Ink & Chemicals | 耐熱材料及耐熱構件 |
| TWI598416B (zh) | 2012-12-26 | 2017-09-11 | 財團法人工業技術研究院 | 塗佈組合物、所形成之膜層、及該塗佈組合物的製備方法 |
| US11506979B2 (en) * | 2016-12-14 | 2022-11-22 | Rohm And Haas Electronic Materials Llc | Method using silicon-containing underlayers |
| US11708470B2 (en) | 2016-12-21 | 2023-07-25 | Ppg Industries Ohio, Inc. | Plastic substrate adhesion promoter with random copolymer |
| TWI606101B (zh) | 2016-12-28 | 2017-11-21 | 財團法人工業技術研究院 | 塗佈組合物及其製備方法 |
| JP7152749B2 (ja) * | 2018-07-23 | 2022-10-13 | 小西化学工業株式会社 | ポリシルセスキオキサン及びその製造方法 |
| JP2020084105A (ja) * | 2018-11-29 | 2020-06-04 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH | アクリル重合化ポリシロキサン、これを含んでなる組成物、およびこれを用いた硬化膜 |
| KR102377031B1 (ko) * | 2019-04-17 | 2022-03-22 | 단국대학교 산학협력단 | 폴리 아크릴산 그래프트 다면체 올리고머 실세스퀴옥산을 이용한 pH 민감성 약물전달체 |
| JP2021026029A (ja) | 2019-07-31 | 2021-02-22 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH | ネガ型感光性組成物 |
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| KR20060049045A (ko) | 2006-05-18 |
| JP4517229B2 (ja) | 2010-08-04 |
| KR101196146B1 (ko) | 2012-10-30 |
| TW200617603A (en) | 2006-06-01 |
| JP2006045316A (ja) | 2006-02-16 |
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