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TW200728917A - Alkali development-type photosensitive resin composition, substrate with projections for liquid crystal division alignment control formed using the same, and liquid crystal display device - Google Patents

Alkali development-type photosensitive resin composition, substrate with projections for liquid crystal division alignment control formed using the same, and liquid crystal display device

Info

Publication number
TW200728917A
TW200728917A TW095139570A TW95139570A TW200728917A TW 200728917 A TW200728917 A TW 200728917A TW 095139570 A TW095139570 A TW 095139570A TW 95139570 A TW95139570 A TW 95139570A TW 200728917 A TW200728917 A TW 200728917A
Authority
TW
Taiwan
Prior art keywords
liquid crystal
resin composition
alignment control
projections
substrate
Prior art date
Application number
TW095139570A
Other languages
English (en)
Chinese (zh)
Inventor
Midori Ohara
Yasuyuki Demachi
Masayuki Kawashima
Takashi Tokuhashi
Masaaki Shimizu
Original Assignee
Toppan Printing Co Ltd
Adeka Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd, Adeka Corp filed Critical Toppan Printing Co Ltd
Publication of TW200728917A publication Critical patent/TW200728917A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/064—Polymers containing more than one epoxy group per molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Emergency Medicine (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Liquid Crystal (AREA)
TW095139570A 2005-10-27 2006-10-26 Alkali development-type photosensitive resin composition, substrate with projections for liquid crystal division alignment control formed using the same, and liquid crystal display device TW200728917A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005312362 2005-10-27

Publications (1)

Publication Number Publication Date
TW200728917A true TW200728917A (en) 2007-08-01

Family

ID=37967775

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095139570A TW200728917A (en) 2005-10-27 2006-10-26 Alkali development-type photosensitive resin composition, substrate with projections for liquid crystal division alignment control formed using the same, and liquid crystal display device

Country Status (5)

Country Link
JP (1) JP5034939B2 (fr)
KR (1) KR20080061329A (fr)
CN (1) CN101044432B (fr)
TW (1) TW200728917A (fr)
WO (1) WO2007049665A1 (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2145880B1 (fr) * 2007-05-09 2011-09-28 Adeka Corporation Nouveau composé époxy, composition de résine pouvant être développée par un composé alcalin, et composition de résine photosensible pouvant être développée par un composé alcalin
JP5367956B2 (ja) * 2007-05-30 2013-12-11 東洋インキＳｃホールディングス株式会社 感光性着色組成物およびカラーフィルタ
JP2009036848A (ja) * 2007-07-31 2009-02-19 Sanyo Chem Ind Ltd 感光性樹脂組成物
JP5014054B2 (ja) * 2007-10-12 2012-08-29 凸版印刷株式会社 液晶表示装置用基板及び該基板を備えた液晶表示装置
JP2009198548A (ja) * 2008-02-19 2009-09-03 Toppan Printing Co Ltd カラーフィルタ及びそれを用いた液晶表示装置
JP2009229826A (ja) * 2008-03-24 2009-10-08 Toppan Printing Co Ltd カラーフィルタとそれを備えた液晶表示装置
JP5501679B2 (ja) 2009-07-02 2014-05-28 株式会社Ａｄｅｋａ 硬化性樹脂組成物及びその硬化物
TW201113303A (en) * 2009-10-07 2011-04-16 Sumitomo Chemical Co Colored photosensitive resin compositions
KR101280777B1 (ko) 2011-01-27 2013-07-05 주식회사 엘지화학 플루오렌계 수지 중합체 및 이를 포함하는 감광성 수지 조성물
CN103214436A (zh) * 2013-03-29 2013-07-24 青岛俪徕精细化工有限公司 长碳链二元醇二缩水甘油醚及其制备方法
JP6677057B2 (ja) * 2015-04-15 2020-04-08 三菱ケミカル株式会社 多官能エポキシ樹脂及び中間体、エポキシ樹脂組成物、硬化物
JP7563029B2 (ja) * 2020-08-03 2024-10-08 三菱ケミカル株式会社 感光性着色樹脂組成物、硬化物、隔壁及び画像表示装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3156559B2 (ja) * 1994-09-14 2001-04-16 株式会社日本触媒 感光性樹脂の製造方法および液状感光性樹脂組成物
JPH09328527A (ja) * 1996-06-12 1997-12-22 Nippon Kayaku Co Ltd 樹脂組成物及びその硬化物
CN1193056C (zh) * 2000-01-18 2005-03-16 太阳油墨制造株式会社 多核环氧化合物,由其所得的活性能线固化性树脂及使用其所得的光固化性·热固化性树脂组合物
JPWO2002077058A1 (ja) * 2001-03-23 2004-07-15 太陽インキ製造株式会社 活性エネルギー線硬化性樹脂、これを含有する光硬化性・熱硬化性樹脂組成物及びその硬化物
JP2003107702A (ja) * 2001-09-27 2003-04-09 Sumitomo Chem Co Ltd 樹脂組成物
JP3996802B2 (ja) * 2002-05-15 2007-10-24 太陽インキ製造株式会社 低放射線性の光硬化性・熱硬化性樹脂組成物及びその硬化被膜
JP4087650B2 (ja) * 2002-07-12 2008-05-21 太陽インキ製造株式会社 光硬化性・熱硬化性樹脂組成物及びその硬化物
JP2005244150A (ja) * 2004-01-28 2005-09-08 Ajinomoto Co Inc 樹脂組成物、それを用いた接着フィルム及び多層プリント配線板
JP2005221817A (ja) * 2004-02-06 2005-08-18 Toppan Printing Co Ltd 配向制御用突起を有する基板及びそれを用いた液晶表示装置

Also Published As

Publication number Publication date
CN101044432B (zh) 2011-12-14
CN101044432A (zh) 2007-09-26
KR20080061329A (ko) 2008-07-02
JP5034939B2 (ja) 2012-09-26
JPWO2007049665A1 (ja) 2009-04-30
WO2007049665A1 (fr) 2007-05-03

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