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TW200728917A - Alkali development-type photosensitive resin composition, substrate with projections for liquid crystal division alignment control formed using the same, and liquid crystal display device - Google Patents

Alkali development-type photosensitive resin composition, substrate with projections for liquid crystal division alignment control formed using the same, and liquid crystal display device

Info

Publication number
TW200728917A
TW200728917A TW095139570A TW95139570A TW200728917A TW 200728917 A TW200728917 A TW 200728917A TW 095139570 A TW095139570 A TW 095139570A TW 95139570 A TW95139570 A TW 95139570A TW 200728917 A TW200728917 A TW 200728917A
Authority
TW
Taiwan
Prior art keywords
liquid crystal
resin composition
alignment control
projections
substrate
Prior art date
Application number
TW095139570A
Other languages
Chinese (zh)
Inventor
Midori Ohara
Yasuyuki Demachi
Masayuki Kawashima
Takashi Tokuhashi
Masaaki Shimizu
Original Assignee
Toppan Printing Co Ltd
Adeka Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd, Adeka Corp filed Critical Toppan Printing Co Ltd
Publication of TW200728917A publication Critical patent/TW200728917A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/064—Polymers containing more than one epoxy group per molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Emergency Medicine (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Liquid Crystal (AREA)

Abstract

This invention provides an alkali developable resin composition characterized in comprising a photopolymerizable unsaturated compound produced by reacting an epoxy adduct with a polybasic acid anhydride (D), the epoxy adduct having a structure comprising an unsaturated monobasic acid (B) and a phenol compound (C) each added to a polyfunctional epoxy resin (A), the alkali developable resin composition having a dielectric dissipation factor being not more than 0.008 at a frequency in a frequency range of 10 to 50 Hz. The alkali developable resin composition possesses excellent electric characteristics while maintaining properties such as sensitivity, resolution, transparency, adhesion, and alkali resistance, and can provide alignment control projections having a good sectional form.
TW095139570A 2005-10-27 2006-10-26 Alkali development-type photosensitive resin composition, substrate with projections for liquid crystal division alignment control formed using the same, and liquid crystal display device TW200728917A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005312362 2005-10-27

Publications (1)

Publication Number Publication Date
TW200728917A true TW200728917A (en) 2007-08-01

Family

ID=37967775

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095139570A TW200728917A (en) 2005-10-27 2006-10-26 Alkali development-type photosensitive resin composition, substrate with projections for liquid crystal division alignment control formed using the same, and liquid crystal display device

Country Status (5)

Country Link
JP (1) JP5034939B2 (en)
KR (1) KR20080061329A (en)
CN (1) CN101044432B (en)
TW (1) TW200728917A (en)
WO (1) WO2007049665A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2145880B1 (en) * 2007-05-09 2011-09-28 Adeka Corporation Novel epoxy compound, alkali-developable resin composition, and alkali-developable photosensitive resin composition
JP5367956B2 (en) * 2007-05-30 2013-12-11 東洋インキＳｃホールディングス株式会社 Photosensitive coloring composition and color filter
JP2009036848A (en) * 2007-07-31 2009-02-19 Sanyo Chem Ind Ltd Photosensitive resin composition
JP5014054B2 (en) * 2007-10-12 2012-08-29 凸版印刷株式会社 Substrate for liquid crystal display device and liquid crystal display device provided with the substrate
JP2009198548A (en) * 2008-02-19 2009-09-03 Toppan Printing Co Ltd Color filter, and liquid crystal display device using the same
JP2009229826A (en) * 2008-03-24 2009-10-08 Toppan Printing Co Ltd Color filter and liquid crystal display device with the same
JP5501679B2 (en) 2009-07-02 2014-05-28 株式会社Ａｄｅｋａ Curable resin composition and cured product thereof
TW201113303A (en) * 2009-10-07 2011-04-16 Sumitomo Chemical Co Colored photosensitive resin compositions
KR101280777B1 (en) 2011-01-27 2013-07-05 주식회사 엘지화학 Fluorene-based resin polymer and photo-sensitive resin composition comprising the same
CN103214436A (en) * 2013-03-29 2013-07-24 青岛俪徕精细化工有限公司 Long carbon chain glycol diglycidyl ether and preparation method thereof
JP6677057B2 (en) * 2015-04-15 2020-04-08 三菱ケミカル株式会社 Multifunctional epoxy resin and intermediate, epoxy resin composition, cured product
JP7563029B2 (en) * 2020-08-03 2024-10-08 三菱ケミカル株式会社 Photosensitive colored resin composition, cured product, partition wall and image display device

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3156559B2 (en) * 1994-09-14 2001-04-16 株式会社日本触媒 Method for producing photosensitive resin and liquid photosensitive resin composition
JPH09328527A (en) * 1996-06-12 1997-12-22 Nippon Kayaku Co Ltd Resin composition and cured item thereof
CN1193056C (en) * 2000-01-18 2005-03-16 太阳油墨制造株式会社 Polynuclear epoxy compound, active energy ray curable resin obtained therefrom, and photocurable/thermocurable resin composition obtained therefrom
JPWO2002077058A1 (en) * 2001-03-23 2004-07-15 太陽インキ製造株式会社 Active energy ray-curable resin, photo-curable / thermo-curable resin composition containing the same, and cured product thereof
JP2003107702A (en) * 2001-09-27 2003-04-09 Sumitomo Chem Co Ltd Resin composition
JP3996802B2 (en) * 2002-05-15 2007-10-24 太陽インキ製造株式会社 Low radiation photocurable / thermosetting resin composition and cured film thereof
JP4087650B2 (en) * 2002-07-12 2008-05-21 太陽インキ製造株式会社 Photocurable / thermosetting resin composition and cured product thereof
JP2005244150A (en) * 2004-01-28 2005-09-08 Ajinomoto Co Inc Resin composition, adhesive film using it, and multi-layer printed wiring board
JP2005221817A (en) * 2004-02-06 2005-08-18 Toppan Printing Co Ltd Substrate having alignment control protrusion and liquid crystal display device using the same

Also Published As

Publication number Publication date
CN101044432B (en) 2011-12-14
CN101044432A (en) 2007-09-26
KR20080061329A (en) 2008-07-02
JP5034939B2 (en) 2012-09-26
JPWO2007049665A1 (en) 2009-04-30
WO2007049665A1 (en) 2007-05-03

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