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TW200632571A - Protection of surfaces exposed to charged particles - Google Patents

Protection of surfaces exposed to charged particles

Info

Publication number
TW200632571A
TW200632571A TW094137704A TW94137704A TW200632571A TW 200632571 A TW200632571 A TW 200632571A TW 094137704 A TW094137704 A TW 094137704A TW 94137704 A TW94137704 A TW 94137704A TW 200632571 A TW200632571 A TW 200632571A
Authority
TW
Taiwan
Prior art keywords
mirror surface
deposits
charged particles
euv radiation
coating
Prior art date
Application number
TW094137704A
Other languages
English (en)
Chinese (zh)
Inventor
Robert Bruce Grant
Original Assignee
Boc Group Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Boc Group Plc filed Critical Boc Group Plc
Publication of TW200632571A publication Critical patent/TW200632571A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • X-Ray Techniques (AREA)
TW094137704A 2004-11-26 2005-10-27 Protection of surfaces exposed to charged particles TW200632571A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB0426036.0A GB0426036D0 (en) 2004-11-26 2004-11-26 Protection of surfaces exposed to charged particles

Publications (1)

Publication Number Publication Date
TW200632571A true TW200632571A (en) 2006-09-16

Family

ID=33561420

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094137704A TW200632571A (en) 2004-11-26 2005-10-27 Protection of surfaces exposed to charged particles

Country Status (7)

Country Link
EP (1) EP1815294A2 (fr)
JP (1) JP2008522399A (fr)
KR (1) KR20070084558A (fr)
CN (1) CN101061435A (fr)
GB (1) GB0426036D0 (fr)
TW (1) TW200632571A (fr)
WO (1) WO2006056730A2 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI486715B (zh) * 2007-06-26 2015-06-01 Advanced Micro Devices Inc 用於微影曝光工具之碳氫化合物收集器

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7279690B2 (en) * 2005-03-31 2007-10-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
GB0605725D0 (en) * 2006-03-23 2006-05-03 Boc Group Plc Spectral filter repair
GB0614028D0 (en) * 2006-07-14 2006-08-23 Boc Group Plc Method of controlling contamination of a surface
US9110390B2 (en) 2007-06-12 2015-08-18 Koninklijke Philps N.V. Optical device and method of in situ treating an EUV optical component to enhance a reduced reflectivity
EP2297746A1 (fr) 2008-07-07 2011-03-23 Philips Intellectual Property & Standards GmbH Elément réfléchissant les rayonnements uv extrêmes et comprenant un matériau résistant à la pulvérisation
US20220066071A1 (en) * 2020-08-27 2022-03-03 Kla Corporation Protection of optical materials of optical components from radiation degradation
CN114280893B (zh) * 2021-11-25 2023-08-01 中国科学院微电子研究所 光刻机的污染控制系统、方法和光刻机

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6533952B2 (en) * 1999-06-08 2003-03-18 Euv Llc Mitigation of radiation induced surface contamination
TW548524B (en) * 2000-09-04 2003-08-21 Asm Lithography Bv Lithographic projection apparatus, device manufacturing method and device manufactured thereby

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI486715B (zh) * 2007-06-26 2015-06-01 Advanced Micro Devices Inc 用於微影曝光工具之碳氫化合物收集器

Also Published As

Publication number Publication date
GB0426036D0 (en) 2004-12-29
EP1815294A2 (fr) 2007-08-08
WO2006056730A2 (fr) 2006-06-01
JP2008522399A (ja) 2008-06-26
CN101061435A (zh) 2007-10-24
KR20070084558A (ko) 2007-08-24
WO2006056730A3 (fr) 2007-03-22

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