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GB0426036D0 - Protection of surfaces exposed to charged particles - Google Patents

Protection of surfaces exposed to charged particles

Info

Publication number
GB0426036D0
GB0426036D0 GBGB0426036.0A GB0426036A GB0426036D0 GB 0426036 D0 GB0426036 D0 GB 0426036D0 GB 0426036 A GB0426036 A GB 0426036A GB 0426036 D0 GB0426036 D0 GB 0426036D0
Authority
GB
United Kingdom
Prior art keywords
protection
charged particles
surfaces exposed
exposed
charged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
GBGB0426036.0A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOC Group Ltd
Original Assignee
BOC Group Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOC Group Ltd filed Critical BOC Group Ltd
Priority to GBGB0426036.0A priority Critical patent/GB0426036D0/en
Publication of GB0426036D0 publication Critical patent/GB0426036D0/en
Priority to JP2007542076A priority patent/JP2008522399A/ja
Priority to CNA2005800399152A priority patent/CN101061435A/zh
Priority to KR1020077011862A priority patent/KR20070084558A/ko
Priority to PCT/GB2005/003918 priority patent/WO2006056730A2/fr
Priority to EP05791381A priority patent/EP1815294A2/fr
Priority to TW094137704A priority patent/TW200632571A/zh
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • X-Ray Techniques (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
GBGB0426036.0A 2004-11-26 2004-11-26 Protection of surfaces exposed to charged particles Ceased GB0426036D0 (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
GBGB0426036.0A GB0426036D0 (en) 2004-11-26 2004-11-26 Protection of surfaces exposed to charged particles
JP2007542076A JP2008522399A (ja) 2004-11-26 2005-10-11 荷電粒子に露出される表面の保護
CNA2005800399152A CN101061435A (zh) 2004-11-26 2005-10-11 与带电粒子接触的表面保护
KR1020077011862A KR20070084558A (ko) 2004-11-26 2005-10-11 하전된 입자에 노출된 표면의 보호
PCT/GB2005/003918 WO2006056730A2 (fr) 2004-11-26 2005-10-11 Protection de surfaces exposees a des particules chargees
EP05791381A EP1815294A2 (fr) 2004-11-26 2005-10-11 Protection de surfaces exposees a des particules chargees
TW094137704A TW200632571A (en) 2004-11-26 2005-10-27 Protection of surfaces exposed to charged particles

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB0426036.0A GB0426036D0 (en) 2004-11-26 2004-11-26 Protection of surfaces exposed to charged particles

Publications (1)

Publication Number Publication Date
GB0426036D0 true GB0426036D0 (en) 2004-12-29

Family

ID=33561420

Family Applications (1)

Application Number Title Priority Date Filing Date
GBGB0426036.0A Ceased GB0426036D0 (en) 2004-11-26 2004-11-26 Protection of surfaces exposed to charged particles

Country Status (7)

Country Link
EP (1) EP1815294A2 (fr)
JP (1) JP2008522399A (fr)
KR (1) KR20070084558A (fr)
CN (1) CN101061435A (fr)
GB (1) GB0426036D0 (fr)
TW (1) TW200632571A (fr)
WO (1) WO2006056730A2 (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7279690B2 (en) * 2005-03-31 2007-10-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
GB0605725D0 (en) * 2006-03-23 2006-05-03 Boc Group Plc Spectral filter repair
GB0614028D0 (en) * 2006-07-14 2006-08-23 Boc Group Plc Method of controlling contamination of a surface
CN101681114B (zh) 2007-06-12 2013-05-08 皇家飞利浦电子股份有限公司 光学设备和原位处理euv光学部件以增强降低的反射率的方法
US7671348B2 (en) * 2007-06-26 2010-03-02 Advanced Micro Devices, Inc. Hydrocarbon getter for lithographic exposure tools
WO2010004482A1 (fr) 2008-07-07 2010-01-14 Philips Intellectual Property & Standards Gmbh Elément réfléchissant les rayonnements uv extrêmes et comprenant un matériau résistant à la pulvérisation
US20220066071A1 (en) * 2020-08-27 2022-03-03 Kla Corporation Protection of optical materials of optical components from radiation degradation
CN114280893B (zh) * 2021-11-25 2023-08-01 中国科学院微电子研究所 光刻机的污染控制系统、方法和光刻机

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6533952B2 (en) * 1999-06-08 2003-03-18 Euv Llc Mitigation of radiation induced surface contamination
TW548524B (en) * 2000-09-04 2003-08-21 Asm Lithography Bv Lithographic projection apparatus, device manufacturing method and device manufactured thereby

Also Published As

Publication number Publication date
EP1815294A2 (fr) 2007-08-08
CN101061435A (zh) 2007-10-24
TW200632571A (en) 2006-09-16
KR20070084558A (ko) 2007-08-24
WO2006056730A3 (fr) 2007-03-22
JP2008522399A (ja) 2008-06-26
WO2006056730A2 (fr) 2006-06-01

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Legal Events

Date Code Title Description
AT Applications terminated before publication under section 16(1)