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TW200617603A - Silsesquioxane-containing compound and method for preparing the same - Google Patents

Silsesquioxane-containing compound and method for preparing the same

Info

Publication number
TW200617603A
TW200617603A TW094124856A TW94124856A TW200617603A TW 200617603 A TW200617603 A TW 200617603A TW 094124856 A TW094124856 A TW 094124856A TW 94124856 A TW94124856 A TW 94124856A TW 200617603 A TW200617603 A TW 200617603A
Authority
TW
Taiwan
Prior art keywords
silsesquioxane
compound
meth
containing compound
acrylic ester
Prior art date
Application number
TW094124856A
Other languages
English (en)
Other versions
TWI413864B (zh
Inventor
Yoshiaki Horiuchi
Shingo Kanaya
Original Assignee
Nagase Chemtex Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nagase Chemtex Corp filed Critical Nagase Chemtex Corp
Publication of TW200617603A publication Critical patent/TW200617603A/zh
Application granted granted Critical
Publication of TWI413864B publication Critical patent/TWI413864B/zh

Links

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Silicon Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
TW094124856A 2004-08-03 2005-07-22 含倍半矽氧烷之化合物及其製造方法 TWI413864B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004226978A JP4517229B2 (ja) 2004-08-03 2004-08-03 シルセスキオキサン含有化合物及びその製造方法

Publications (2)

Publication Number Publication Date
TW200617603A true TW200617603A (en) 2006-06-01
TWI413864B TWI413864B (zh) 2013-11-01

Family

ID=36024281

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094124856A TWI413864B (zh) 2004-08-03 2005-07-22 含倍半矽氧烷之化合物及其製造方法

Country Status (3)

Country Link
JP (1) JP4517229B2 (zh)
KR (1) KR101196146B1 (zh)
TW (1) TWI413864B (zh)

Cited By (2)

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US9796878B2 (en) 2012-12-26 2017-10-24 Industrial Technology Research Institute Coating composition, film prepared from the coating composition, and method for preparing the coating composition
TWI606101B (zh) * 2016-12-28 2017-11-21 財團法人工業技術研究院 塗佈組合物及其製備方法

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4618512B2 (ja) * 2005-03-08 2011-01-26 Ｄｉｃ株式会社 紫外線硬化性樹脂組成物、紫外線硬化性塗料及び塗装物。
TWI394801B (zh) 2005-03-08 2013-05-01 Dainippon Ink & Chemicals 紫外線硬化性樹脂組成物、紫外線硬化性塗料及塗裝物
DE102006032077A1 (de) * 2006-07-11 2008-01-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Hybride Polymermaterialien durch Copolymerisation
JP4885742B2 (ja) * 2007-01-05 2012-02-29 昭和電工株式会社 感光性樹脂組成物
JP4896755B2 (ja) * 2007-02-01 2012-03-14 東京応化工業株式会社 液晶表示素子用平坦化絶縁膜形成用組成物および液晶表示素子用平坦化絶縁膜の製造方法
JP5135820B2 (ja) * 2007-02-20 2013-02-06 Ｊｓｒ株式会社 アルカリ可溶性重合体、着色層形成用感放射線性組成物、カラーフィルタおよび液晶表示素子
EP2133744B1 (en) 2007-04-04 2011-07-13 Asahi Kasei E-materials Corporation Photosensitive resin composition
JP4899100B2 (ja) * 2007-05-29 2012-03-21 ナガセケムテックス株式会社 感光性組成物
JP4938571B2 (ja) * 2007-07-11 2012-05-23 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
KR100936998B1 (ko) * 2007-10-19 2010-01-15 에스화인켐 주식회사 감광성 폴리실세스퀴옥산 수지 조성물 및 이를 이용한박막의 패턴 형성 방법
KR100930671B1 (ko) * 2007-12-20 2009-12-09 제일모직주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
US8138274B2 (en) * 2009-12-08 2012-03-20 Le Centre National De La Recherche Scien Process for preparation of fluorosilicon polymer
JP5515714B2 (ja) * 2009-12-16 2014-06-11 Ｊｓｒ株式会社 着色組成物、カラーフィルタおよびカラー液晶表示素子
JP6032461B2 (ja) * 2011-03-30 2016-11-30 Dic株式会社 フォトレジスト材料、及びフォトレジスト膜の形成方法
JP5983151B2 (ja) * 2011-07-29 2016-08-31 Dic株式会社 ドライエッチングレジスト材料、レジスト膜及びパターン形成物
TW201418333A (zh) * 2012-10-15 2014-05-16 Dainippon Ink & Chemicals 耐熱材料及耐熱構件
US11506979B2 (en) * 2016-12-14 2022-11-22 Rohm And Haas Electronic Materials Llc Method using silicon-containing underlayers
US11708470B2 (en) 2016-12-21 2023-07-25 Ppg Industries Ohio, Inc. Plastic substrate adhesion promoter with random copolymer
JP7152749B2 (ja) * 2018-07-23 2022-10-13 小西化学工業株式会社 ポリシルセスキオキサン及びその製造方法
JP2020084105A (ja) * 2018-11-29 2020-06-04 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ アクリル重合化ポリシロキサン、これを含んでなる組成物、およびこれを用いた硬化膜
KR102377031B1 (ko) * 2019-04-17 2022-03-22 단국대학교 산학협력단 폴리 아크릴산 그래프트 다면체 올리고머 실세스퀴옥산을 이용한 pH 민감성 약물전달체
JP2021026029A (ja) 2019-07-31 2021-02-22 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ ネガ型感光性組成物

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3070205B2 (ja) * 1991-11-19 2000-07-31 ジェイエスアール株式会社 コーティング用組成物
JP3502495B2 (ja) * 1996-01-11 2004-03-02 株式会社日本触媒 有機質−無機質複合体粒子、その製造法および用途
JP4096364B2 (ja) * 1995-12-06 2008-06-04 大日本インキ化学工業株式会社 複合樹脂の製造法
JPH09241538A (ja) * 1996-03-06 1997-09-16 Shin Etsu Chem Co Ltd 粉体塗料
EP1004936B1 (en) * 1997-08-14 2003-10-08 Showa Denko K K Resist resin, resist resin composition, and process for patterning therewith
DE69813144T2 (de) * 1997-11-07 2003-12-04 Rohm & Haas Kunstoffsubstrate zur Verwendung in elektronischen Anzeigesystemen
JP3984701B2 (ja) * 1998-04-24 2007-10-03 岡本化学工業株式会社 平版印刷版用感光性組成物
JP2001092129A (ja) * 1999-09-24 2001-04-06 Toshiba Corp 紫外線硬化性樹脂組成物
JP3457232B2 (ja) * 1999-10-19 2003-10-14 大日本塗料株式会社 有機無機複合樹脂水性エマルジョン、その製造方法及び二液型コーティング組成物
JP2001125264A (ja) * 1999-10-25 2001-05-11 Toagosei Co Ltd 硬化型組成物
JP4447753B2 (ja) * 2000-08-11 2010-04-07 株式会社カネカ ブロック共重合体を含有する硬化性組成物
JP4846177B2 (ja) * 2002-02-27 2011-12-28 三菱化学株式会社 有機無機複合体、その製造方法及びそれを用いた活性エネルギー線硬化性組成物ならびに硬化被膜形成物品
JP2003262955A (ja) * 2002-03-08 2003-09-19 Toagosei Co Ltd エッチングレジスト用硬化型組成物
JP4718114B2 (ja) * 2003-11-17 2011-07-06 信越化学工業株式会社 珪素含有高分子化合物、レジスト材料及びパターン形成方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9796878B2 (en) 2012-12-26 2017-10-24 Industrial Technology Research Institute Coating composition, film prepared from the coating composition, and method for preparing the coating composition
TWI606101B (zh) * 2016-12-28 2017-11-21 財團法人工業技術研究院 塗佈組合物及其製備方法
US10457837B2 (en) 2016-12-28 2019-10-29 Industrial Technology Research Institute Coating composition and method of preparing the same

Also Published As

Publication number Publication date
JP2006045316A (ja) 2006-02-16
KR101196146B1 (ko) 2012-10-30
KR20060049045A (ko) 2006-05-18
JP4517229B2 (ja) 2010-08-04
TWI413864B (zh) 2013-11-01

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees