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CN104081499A - n型扩散层形成用组合物、n型扩散层形成用组合物套剂、带n型扩散层的半导体基板的制造方法、以及太阳能电池元件的制造方法 - Google Patents

n型扩散层形成用组合物、n型扩散层形成用组合物套剂、带n型扩散层的半导体基板的制造方法、以及太阳能电池元件的制造方法 Download PDF

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Publication number
CN104081499A
CN104081499A CN201380005051.7A CN201380005051A CN104081499A CN 104081499 A CN104081499 A CN 104081499A CN 201380005051 A CN201380005051 A CN 201380005051A CN 104081499 A CN104081499 A CN 104081499A
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CN
China
Prior art keywords
composition
forming
type diffusion
diffusion layer
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201380005051.7A
Other languages
English (en)
Chinese (zh)
Inventor
织田明博
吉田诚人
野尻刚
仓田靖
町井洋一
岩室光则
清水麻理
佐藤铁也
芦泽寅之助
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Publication of CN104081499A publication Critical patent/CN104081499A/zh
Pending legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/2225Diffusion sources
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/225Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
    • H01L21/2251Diffusion into or out of group IV semiconductors
    • H01L21/2254Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides
    • H01L21/2255Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides the applied layer comprising oxides only, e.g. P2O5, PSG, H3BO3, doped oxides
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/14Photovoltaic cells having only PN homojunction potential barriers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/14Photovoltaic cells having only PN homojunction potential barriers
    • H10F10/146Back-junction photovoltaic cells, e.g. having interdigitated base-emitter regions on the back side
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/121The active layers comprising only Group IV materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photovoltaic Devices (AREA)
CN201380005051.7A 2012-01-10 2013-01-10 n型扩散层形成用组合物、n型扩散层形成用组合物套剂、带n型扩散层的半导体基板的制造方法、以及太阳能电池元件的制造方法 Pending CN104081499A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012002632 2012-01-10
JP2012-002632 2012-01-10
PCT/JP2013/050303 WO2013105602A1 (fr) 2012-01-10 2013-01-10 COMPOSITION DE FORMATION DE COUCHE DE DIFFUSION DE TYPE n, ENSEMBLE DE COMPOSITIONS DE FORMATION DE COUCHE DE DIFFUSION DE TYPE n, PROCÉDÉ DE PRODUCTION DESTINÉ À UN SUBSTRAT SEMI-CONDUCTEUR DOTÉ D'UNE COUCHE DE DIFFUSION DE TYPE n ET PROCÉDÉ DE PRODUCTION DESTINÉ À UN ÉLÉMENT DE CELLULE SOLAIRE

Publications (1)

Publication Number Publication Date
CN104081499A true CN104081499A (zh) 2014-10-01

Family

ID=48781546

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380005051.7A Pending CN104081499A (zh) 2012-01-10 2013-01-10 n型扩散层形成用组合物、n型扩散层形成用组合物套剂、带n型扩散层的半导体基板的制造方法、以及太阳能电池元件的制造方法

Country Status (4)

Country Link
JP (2) JP5892178B2 (fr)
CN (1) CN104081499A (fr)
TW (1) TW201331991A (fr)
WO (1) WO2013105602A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113782423A (zh) * 2021-08-25 2021-12-10 中国科学院宁波材料技术与工程研究所 杂质扩散方法和太阳能电池制造方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5892178B2 (ja) * 2012-01-10 2016-03-23 日立化成株式会社 n型拡散層形成組成物セット、n型拡散層付き半導体基板の製造方法、及び太陽電池素子の製造方法
JP2015130406A (ja) * 2014-01-07 2015-07-16 三菱電機株式会社 光起電力装置およびその製造方法、光起電力モジュール
WO2016122731A1 (fr) * 2015-01-26 2016-08-04 1366 Technologies, Inc. Procédé de création de plaquette de semi-conducteur à dopage profilé et plaquettes et composants de cellule solaire à champ profilé, comme de surface de dérive et arrière

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2794846A (en) * 1955-06-28 1957-06-04 Bell Telephone Labor Inc Fabrication of semiconductor devices
JP2010062334A (ja) * 2008-09-03 2010-03-18 Japan Vam & Poval Co Ltd リン拡散用塗布液
CN102194672A (zh) * 2010-01-25 2011-09-21 日立化成工业株式会社 形成n型扩散层的组合物和方法,及制备光伏电池的方法
WO2011132777A1 (fr) * 2010-04-23 2011-10-27 日立化成工業株式会社 COMPOSITION FORMANT UNE COUCHE DE DIFFUSION DE TYPE n, PROCÉDÉ DE PRODUCTION D'UNE COUCHE DE DIFFUSION DE TYPE n ET PROCÉDÉ DE PRODUCTION D'UN ÉLÉMENT DE CELLULE SOLAIRE

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004221149A (ja) * 2003-01-10 2004-08-05 Hitachi Ltd 太陽電池の製造方法
JP4481869B2 (ja) * 2005-04-26 2010-06-16 信越半導体株式会社 太陽電池の製造方法及び太陽電池並びに半導体装置の製造方法
JP2009091548A (ja) * 2007-09-21 2009-04-30 Ricoh Co Ltd ペースト組成物、絶縁膜、多層配線構造、プリント基板、画像表示装置、及びペースト組成物の製造方法
US8053867B2 (en) * 2008-08-20 2011-11-08 Honeywell International Inc. Phosphorous-comprising dopants and methods for forming phosphorous-doped regions in semiconductor substrates using phosphorous-comprising dopants
WO2012005253A1 (fr) * 2010-07-07 2012-01-12 日立化成工業株式会社 Composition et procédé de formation d'une couche de diffusion d'impuretés, procédé de fabrication d'une couches de diffusion d'impuretés, et procédé de fabrication d'un élément de cellule photovoltaïque
JP5892178B2 (ja) * 2012-01-10 2016-03-23 日立化成株式会社 n型拡散層形成組成物セット、n型拡散層付き半導体基板の製造方法、及び太陽電池素子の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2794846A (en) * 1955-06-28 1957-06-04 Bell Telephone Labor Inc Fabrication of semiconductor devices
JP2010062334A (ja) * 2008-09-03 2010-03-18 Japan Vam & Poval Co Ltd リン拡散用塗布液
CN102194672A (zh) * 2010-01-25 2011-09-21 日立化成工业株式会社 形成n型扩散层的组合物和方法,及制备光伏电池的方法
WO2011132777A1 (fr) * 2010-04-23 2011-10-27 日立化成工業株式会社 COMPOSITION FORMANT UNE COUCHE DE DIFFUSION DE TYPE n, PROCÉDÉ DE PRODUCTION D'UNE COUCHE DE DIFFUSION DE TYPE n ET PROCÉDÉ DE PRODUCTION D'UN ÉLÉMENT DE CELLULE SOLAIRE

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113782423A (zh) * 2021-08-25 2021-12-10 中国科学院宁波材料技术与工程研究所 杂质扩散方法和太阳能电池制造方法
CN113782423B (zh) * 2021-08-25 2022-08-23 中国科学院宁波材料技术与工程研究所 杂质扩散方法和太阳能电池制造方法

Also Published As

Publication number Publication date
JP2016021588A (ja) 2016-02-04
TW201331991A (zh) 2013-08-01
JP5892178B2 (ja) 2016-03-23
WO2013105602A1 (fr) 2013-07-18
JPWO2013105602A1 (ja) 2015-05-11

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Application publication date: 20141001