CN104081499A - n型扩散层形成用组合物、n型扩散层形成用组合物套剂、带n型扩散层的半导体基板的制造方法、以及太阳能电池元件的制造方法 - Google Patents
n型扩散层形成用组合物、n型扩散层形成用组合物套剂、带n型扩散层的半导体基板的制造方法、以及太阳能电池元件的制造方法 Download PDFInfo
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- CN104081499A CN104081499A CN201380005051.7A CN201380005051A CN104081499A CN 104081499 A CN104081499 A CN 104081499A CN 201380005051 A CN201380005051 A CN 201380005051A CN 104081499 A CN104081499 A CN 104081499A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/2225—Diffusion sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
- H01L21/2251—Diffusion into or out of group IV semiconductors
- H01L21/2254—Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides
- H01L21/2255—Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides the applied layer comprising oxides only, e.g. P2O5, PSG, H3BO3, doped oxides
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
- H10F10/146—Back-junction photovoltaic cells, e.g. having interdigitated base-emitter regions on the back side
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/121—The active layers comprising only Group IV materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012002632 | 2012-01-10 | ||
| JP2012-002632 | 2012-01-10 | ||
| PCT/JP2013/050303 WO2013105602A1 (fr) | 2012-01-10 | 2013-01-10 | COMPOSITION DE FORMATION DE COUCHE DE DIFFUSION DE TYPE n, ENSEMBLE DE COMPOSITIONS DE FORMATION DE COUCHE DE DIFFUSION DE TYPE n, PROCÉDÉ DE PRODUCTION DESTINÉ À UN SUBSTRAT SEMI-CONDUCTEUR DOTÉ D'UNE COUCHE DE DIFFUSION DE TYPE n ET PROCÉDÉ DE PRODUCTION DESTINÉ À UN ÉLÉMENT DE CELLULE SOLAIRE |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104081499A true CN104081499A (zh) | 2014-10-01 |
Family
ID=48781546
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201380005051.7A Pending CN104081499A (zh) | 2012-01-10 | 2013-01-10 | n型扩散层形成用组合物、n型扩散层形成用组合物套剂、带n型扩散层的半导体基板的制造方法、以及太阳能电池元件的制造方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (2) | JP5892178B2 (fr) |
| CN (1) | CN104081499A (fr) |
| TW (1) | TW201331991A (fr) |
| WO (1) | WO2013105602A1 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113782423A (zh) * | 2021-08-25 | 2021-12-10 | 中国科学院宁波材料技术与工程研究所 | 杂质扩散方法和太阳能电池制造方法 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5892178B2 (ja) * | 2012-01-10 | 2016-03-23 | 日立化成株式会社 | n型拡散層形成組成物セット、n型拡散層付き半導体基板の製造方法、及び太陽電池素子の製造方法 |
| JP2015130406A (ja) * | 2014-01-07 | 2015-07-16 | 三菱電機株式会社 | 光起電力装置およびその製造方法、光起電力モジュール |
| WO2016122731A1 (fr) * | 2015-01-26 | 2016-08-04 | 1366 Technologies, Inc. | Procédé de création de plaquette de semi-conducteur à dopage profilé et plaquettes et composants de cellule solaire à champ profilé, comme de surface de dérive et arrière |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2794846A (en) * | 1955-06-28 | 1957-06-04 | Bell Telephone Labor Inc | Fabrication of semiconductor devices |
| JP2010062334A (ja) * | 2008-09-03 | 2010-03-18 | Japan Vam & Poval Co Ltd | リン拡散用塗布液 |
| CN102194672A (zh) * | 2010-01-25 | 2011-09-21 | 日立化成工业株式会社 | 形成n型扩散层的组合物和方法,及制备光伏电池的方法 |
| WO2011132777A1 (fr) * | 2010-04-23 | 2011-10-27 | 日立化成工業株式会社 | COMPOSITION FORMANT UNE COUCHE DE DIFFUSION DE TYPE n, PROCÉDÉ DE PRODUCTION D'UNE COUCHE DE DIFFUSION DE TYPE n ET PROCÉDÉ DE PRODUCTION D'UN ÉLÉMENT DE CELLULE SOLAIRE |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004221149A (ja) * | 2003-01-10 | 2004-08-05 | Hitachi Ltd | 太陽電池の製造方法 |
| JP4481869B2 (ja) * | 2005-04-26 | 2010-06-16 | 信越半導体株式会社 | 太陽電池の製造方法及び太陽電池並びに半導体装置の製造方法 |
| JP2009091548A (ja) * | 2007-09-21 | 2009-04-30 | Ricoh Co Ltd | ペースト組成物、絶縁膜、多層配線構造、プリント基板、画像表示装置、及びペースト組成物の製造方法 |
| US8053867B2 (en) * | 2008-08-20 | 2011-11-08 | Honeywell International Inc. | Phosphorous-comprising dopants and methods for forming phosphorous-doped regions in semiconductor substrates using phosphorous-comprising dopants |
| WO2012005253A1 (fr) * | 2010-07-07 | 2012-01-12 | 日立化成工業株式会社 | Composition et procédé de formation d'une couche de diffusion d'impuretés, procédé de fabrication d'une couches de diffusion d'impuretés, et procédé de fabrication d'un élément de cellule photovoltaïque |
| JP5892178B2 (ja) * | 2012-01-10 | 2016-03-23 | 日立化成株式会社 | n型拡散層形成組成物セット、n型拡散層付き半導体基板の製造方法、及び太陽電池素子の製造方法 |
-
2013
- 2013-01-10 JP JP2013553307A patent/JP5892178B2/ja not_active Expired - Fee Related
- 2013-01-10 CN CN201380005051.7A patent/CN104081499A/zh active Pending
- 2013-01-10 TW TW102100937A patent/TW201331991A/zh unknown
- 2013-01-10 WO PCT/JP2013/050303 patent/WO2013105602A1/fr not_active Ceased
-
2015
- 2015-09-10 JP JP2015178696A patent/JP2016021588A/ja active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2794846A (en) * | 1955-06-28 | 1957-06-04 | Bell Telephone Labor Inc | Fabrication of semiconductor devices |
| JP2010062334A (ja) * | 2008-09-03 | 2010-03-18 | Japan Vam & Poval Co Ltd | リン拡散用塗布液 |
| CN102194672A (zh) * | 2010-01-25 | 2011-09-21 | 日立化成工业株式会社 | 形成n型扩散层的组合物和方法,及制备光伏电池的方法 |
| WO2011132777A1 (fr) * | 2010-04-23 | 2011-10-27 | 日立化成工業株式会社 | COMPOSITION FORMANT UNE COUCHE DE DIFFUSION DE TYPE n, PROCÉDÉ DE PRODUCTION D'UNE COUCHE DE DIFFUSION DE TYPE n ET PROCÉDÉ DE PRODUCTION D'UN ÉLÉMENT DE CELLULE SOLAIRE |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113782423A (zh) * | 2021-08-25 | 2021-12-10 | 中国科学院宁波材料技术与工程研究所 | 杂质扩散方法和太阳能电池制造方法 |
| CN113782423B (zh) * | 2021-08-25 | 2022-08-23 | 中国科学院宁波材料技术与工程研究所 | 杂质扩散方法和太阳能电池制造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2016021588A (ja) | 2016-02-04 |
| TW201331991A (zh) | 2013-08-01 |
| JP5892178B2 (ja) | 2016-03-23 |
| WO2013105602A1 (fr) | 2013-07-18 |
| JPWO2013105602A1 (ja) | 2015-05-11 |
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| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20141001 |