WO2017038701A1 - 蛍光x線分析装置 - Google Patents
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- WO2017038701A1 WO2017038701A1 PCT/JP2016/075033 JP2016075033W WO2017038701A1 WO 2017038701 A1 WO2017038701 A1 WO 2017038701A1 JP 2016075033 W JP2016075033 W JP 2016075033W WO 2017038701 A1 WO2017038701 A1 WO 2017038701A1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
- G01N23/2076—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/2209—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using wavelength dispersive spectroscopy [WDS]
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
Definitions
- the present invention relates to a scanning X-ray fluorescence analyzer that measures the intensity of secondary X-rays generated by irradiating a sample with primary X-rays.
- a sample is irradiated with primary X-rays, and the intensity of secondary X-rays such as fluorescent X-rays generated from the sample is measured. Based on the measured intensity, for example, quantitative analysis of the element content in the sample is performed.
- a scanning X-ray fluorescence analyzer to perform.
- a standard sample corresponding to the sample to be analyzed is provided, and the analysis target element in the sample to be analyzed and the sample constituent elements in the standard sample and their content (chemical analysis value) are set in advance as quantitative analysis conditions. Is set, a standard sample is measured to create a calibration curve, and the analysis target sample is quantitatively analyzed.
- an element whose content is unknown is included in the standard sample, and the analysis of the analysis target element may be affected by the inclusion of the element, and in such a case, an error may occur. Even if a fluorescent X-ray analyzer such as the above is used, elements that have unknown contents in the standard sample are not considered when setting quantitative analysis conditions according to the sample type in advance. Accurate analysis is not possible.
- the present invention has been made in view of such problems, and even when the standard sample contains an element whose content is unknown, appropriate addition of the analysis target element is automatically made in the quantitative analysis conditions, It is an object of the present invention to provide a scanning X-ray fluorescence analyzer capable of accurate analysis.
- the present invention is a scanning X-ray fluorescence analyzer that measures the intensity of secondary X-rays generated by irradiating a sample with primary X-rays, and corresponds to the sample to be analyzed.
- the quantitative analysis condition setting means performs a qualitative analysis on the standard sample and a semi-quantitative analysis that is a quantitative analysis based on a qualitative analysis result, detects an element other than a preset sample constituent element as a new detection element, Calculate the theoretical matrix correction factor for the absorption excitation of fluorescent X-rays using the fundamental parameter method (hereinafter also referred to as FP method) for the detection element and the sample constituent elements set in advance.
- FP method fundamental parameter method
- the influence degree of the absorption excitation of the fluorescent X-rays by the new detection element on the analysis value of the analysis target element is calculated as the absorption excitation influence degree, and the corresponding predetermined value is calculated. Compare with the reference value.
- the quantitative analysis condition setting means calls the overlap correction coefficient of the interference line due to the new detection element with respect to the analysis line of the analysis target element from the overlap correction table stored in advance, and the overlap correction coefficient and the semi-quantitative analysis value of the new detection element And based on the pre-set content of the sample constituent elements, the influence of overlapping of interference lines by the new detection element on the analysis line of the target element is calculated as the overlap influence and compared with the corresponding reference value. When at least one of the absorption excitation influence degree and the overlap influence degree is larger than a corresponding predetermined reference value, the new detection element is added as an analysis target element in the analysis target sample as a quantitative analysis condition.
- the fluorescence X with respect to the analysis value of the analysis target element for a newly detected element other than the preset sample constituent element Since there is a quantitative analysis condition setting means that determines whether or not to add as an analysis element from the absorption excitation influence degree of the line and the influence influence of the interference line overlap with the analysis line of the analysis element, Even when an element with an unknown content rate is included, the element to be analyzed is appropriately added automatically under the quantitative analysis conditions, and an accurate analysis can be performed.
- the quantitative analysis condition setting means analyzes the new detection element as a quantitative analysis condition. It is preferable to set it as a residual element without adding as an element to be analyzed in the sample.
- the main component of iron should be a residual element and should not be an element to be analyzed, but this is preferable because the iron can be detected as a new detection element. According to the configuration, such a new detection element is set as a residual element without being added as an analysis target element in the analysis target sample based on the semi-quantitative analysis value.
- the fundamental parameter using the device sensitivity constant stored in advance as the quantitative analysis condition It is preferable to set quantitative calculation conditions by the method.
- a quantitative calculation method for new detection elements to be added as analysis target elements in the analysis target sample there is a calibration curve method in which a semi-quantitative analysis value is set as the content of the analysis target element added in the standard sample, but a goniometer is scanned.
- the semi-quantitative analysis value based on the measured X-ray intensity is not sufficiently accurate.
- the fundamental parameter method using the device sensitivity constant stored in advance is applied, and the goniometer is fixed and measured. Since a more accurate quantitative analysis value based on the X-ray intensity is used, more accurate analysis can be performed as a whole.
- FIG. 1 is a schematic view showing a fluorescent X-ray analyzer according to an embodiment of the present invention. It is a flowchart which shows operation
- this apparatus is a scanning X-ray fluorescence analyzer that measures the intensity of secondary X-rays 5 generated by irradiating samples 1 and 14 with primary X-rays 3. 1 and 14, a sample stage 2, an X-ray source 4 such as an X-ray tube that irradiates the samples 1 and 14 with primary X-rays 3, and two fluorescent X-rays generated from the samples 1 and 14
- a spectroscopic element 6 that splits the secondary X-ray 5 and a detector 8 that receives the secondary X-ray 7 dispersed by the spectroscopic element 6 and detects the intensity thereof are provided.
- the output of the detector 8 is input to a control means 11 for controlling the entire apparatus through an amplifier, a wave height analyzer, a counting means, etc. (not shown).
- This apparatus is a wavelength dispersion type and scanning type X-ray fluorescence analyzer, and interlocks the spectroscopic element 6 and the detector 8 so that the wavelength of the secondary X-ray 7 incident on the detector 8 changes.
- Means 10, ie a so-called goniometer, is provided.
- the extension line 9 of the secondary X-ray 5 and the secondary X-ray 7 dispersed (diffracted) by the spectroscopic element 6 have an incident angle ⁇ of 2.
- the interlocking unit 10 changes the wavelength of the secondary X-ray 7 that is split by changing the spectral angle 2 ⁇ , while the split secondary X-ray 7 is transmitted to the detector 8.
- the spectroscopic element 6 is rotated about an axis O perpendicular to the paper plane passing through the center of the surface so as to be incident, and the detector 8 is moved along the circle 12 about the axis O by twice the rotation angle. Rotate.
- the value of the spectral angle 2 ⁇ (2 ⁇ angle) is input from the interlocking unit 10 to the control unit 11.
- This apparatus includes a plurality of standard samples 14 having different compositions for creating a calibration curve corresponding to the analysis target sample 1, and the analysis target element and each standard in the analysis target sample 1 as the quantitative analysis conditions in advance.
- Quantitative analysis condition setting means 13 for setting the sample constituent elements and their content in the sample 14 is provided as part of the control means 11.
- the analysis target sample 1 and the standard sample 14 are collectively referred to as samples 1 and 14.
- Quantitative analysis condition setting means 13 performs qualitative analysis and semi-quantitative analysis based on qualitative analysis results for each standard sample 14, and detects elements other than the preset sample constituent elements as new detection elements.
- the qualitative analysis refers to an analysis in which a spectrum is obtained by measuring the intensity of the secondary X-ray 5 in a wide wavelength range under a predetermined standard analysis condition, and a peak identification analysis is performed.
- the goniometer 10 is scanned to measure the spectrum of all elements from F to U, and the peak detected from the measured spectrum is identified and analyzed.
- Semi-quantitative analysis refers to analysis in which the content of each element is quantified based on the X-ray intensity measured by qualitative analysis.
- the quantitative analysis is based on the X-ray intensity measured with the goniometer 10 fixed, using a calibration curve corresponding to the sample 1 to be analyzed, or by the fundamental parameter method using the instrument sensitivity constant stored in advance. An analysis that quantifies the rate.
- the quantitative analysis condition setting means 13 calculates a theoretical matrix correction coefficient for absorption excitation of fluorescent X-rays by a fundamental parameter method for a new detection element and a preset sample constituent element, and the theoretical matrix correction coefficient, the new detection element Based on the semi-quantitative analysis value of the sample and the content of the sample constituent elements set in advance, the influence level of the absorption excitation of fluorescent X-rays by the new detection element on the analysis value of the target element is calculated and supported Compare with a predetermined reference value.
- the quantitative analysis condition setting means 13 calls the overlap correction coefficient of the interference line by the new detection element for the analysis line of the analysis target element from the overlap correction table stored in advance, and the overlap correction coefficient and the semi-quantitative analysis value of the new detection element Based on the preset content of the constituent elements of the sample, the influence of the overlap of the interference line by the new detection element on the analysis line of the target element is calculated as the overlap influence and compared with the corresponding predetermined reference value.
- the quantitative analysis condition setting means 13 sets the new detection element as the analysis target sample as the quantitative analysis condition when at least one of the absorption excitation influence degree and the overlap influence degree is larger than the corresponding predetermined reference value. 1 as an analysis target element.
- the quantitative analysis condition setting means 13 has a semi-quantitative analysis value of a new detection element having a predetermined content rate. If it is larger than that, the new detection element is set as a residual element without being added as an analysis target element in the analysis target sample 1 as a quantitative analysis condition.
- the quantitative analysis condition setting means 13 adds a new detection added as an analysis target element in the analysis target sample 1
- quantitative calculation conditions by the fundamental parameter method using apparatus sensitivity constants stored in advance are set as quantitative analysis conditions.
- the quantitative analysis condition setting means 13 included in the fluorescent X-ray analyzer of the present embodiment specifically operates as shown in the flowchart of FIG. In FIG. 2, YES is abbreviated as Y and NO is abbreviated as N.
- the quantitative analysis condition setting means 13 includes, as quantitative analysis conditions, the analysis target element in the analysis target sample 1, the sample constituent elements in each standard sample 14 (including the analysis target element in the analysis target sample 1), and the contents thereof
- the overlap correction table which is a table of overlap correction coefficients based on the theoretical strengths obtained for each combination of rate, possible analysis line and interference line, the measured intensity obtained by measuring pure substances for the representative elements, and the theory based on the FP method
- a sensitivity library which is a library of device sensitivity constants obtained from the intensity ratio, is set.
- step S1 each standard sample 14 is subjected to qualitative analysis and semi-quantitative analysis that is quantitative analysis based on the qualitative analysis results.
- step S2 if no element other than the preset sample constituent element is detected in the semi-quantitative analysis result, the operation is terminated. If detected, the element or elements are newly detected elements. Then, the process proceeds to step S3.
- step S3 it is determined whether or not the semi-quantitative analysis value of the element having the maximum content among the newly detected elements is greater than a predetermined content (for example, 50%). This is a determination as to whether or not the new detection element having the maximum content is the main component.
- a predetermined content for example, 50%
- the process proceeds to step S6 described later.
- the process proceeds to step S4. move on.
- step S4 the new detection element is set as a residual element without being added as an analysis target element in the analysis target sample 1 as a quantitative analysis condition.
- step S5 it is confirmed whether there is still a new detection element other than the new detection element set as the residual element in step S4. If not, the operation is terminated. If there is, the process proceeds to step S6.
- step S6 theoretical matrix correction coefficients ⁇ ik and ⁇ ij for the absorption excitation of fluorescent X-rays are calculated by the fundamental parameter method for the newly detected element k and preset sample constituent elements i and j, and the theoretical matrix is calculated.
- the sample constituent elements j include all the new detection elements k, and the content ratios W i and W j of the sample constituent elements i and j (including the semi-quantitative analysis values W k of the new detection elements k).
- the new detection that is the object of determination in the absorption excitation influence degree ⁇ W i / W i of the equation (1)
- the semi-quantitative analysis value W k of the element k the maximum values in the plurality of standard samples 14 are used, and the content rates W i and W j of the other sample constituent elements i and j (new detection not subject to determination) for comprises a semi-quantitative analysis value W k of elements k), the total content of the semi-quantitative analysis value W k with the maximum value of 100% (mass%, adjusted to be below the same).
- step S7 if the absorption excitation influence degree ⁇ W i / W i calculated for each analysis target element i is larger than a corresponding predetermined reference value, the new detection element to be determined k is affected.
- the predetermined reference value corresponding to the degree of absorption excitation influence is, for example, 0.005 when the average content of the analysis target element i in the plurality of standard samples 14 is greater than 0.1%, and 0.1 In the case of% or less, 0.02.
- step S8 if it is determined that there is an influence in step S7, the process proceeds to step S11 described later, and if it is not determined that there is an effect in step S7, the process proceeds to step S9.
- step S9 the overlap correction coefficient 3 ⁇ ik of the interference line by the new detection element k with respect to the analysis line of the analysis target element i is called from the previously stored overlap correction table, and the overlap correction coefficient 3 ⁇ ik , the new detection element Based on the theoretical intensity T I k of the interference line by k and the theoretical intensity T I i of the analysis line of the analysis element i, the influence of the overlap of the interference line by the new detection element k on the analysis line of the analysis element i is expressed as follows: The overlap influence degree 3 ⁇ ik T I k / T I i in the following equation (2) is calculated.
- the analyte element i per the overlapping calculated influence 3 ⁇ ik T I k / T I i is greater than any corresponding predetermined reference value, the subject of determination It is assumed that there is an influence on the newly detected element k.
- the predetermined reference value corresponding to the overlapping influence degree is, for example, the element to be analyzed in the plurality of standard samples 14 in the same manner as the predetermined reference value corresponding to the absorption excitation influence degree ⁇ W i / W i in step S7.
- the average content rate of i is larger than 0.1%, it is set to 0.005, and when it is 0.1% or less, 0.02.
- step S11 it is confirmed whether or not an undetermined new detection element k remains. If it remains, the process returns to step S6, and if not, the process proceeds to step S12.
- step S12 as a quantitative analysis condition, a new detection element k that is considered to be affected is added as an analysis target element i in the analysis target sample 1, and the operation is terminated.
- the new detection element k to be added as the analysis target element i a known content rate (chemical analysis value) is not set in the standard sample 14, but as a quantitative calculation method in the analysis target sample 1, the standard sample 14 is used.
- the quantitative analysis condition setting unit 13 adds the new detection element k determined to be affected as the analysis target element i in the analysis target sample 1 in step S12, for its new analyte element i, as quantitative analysis conditions, such as the following, to set quantitative calculation condition by fundamental parameter method using a previously stored device sensitivity constant k i.
- quantitative analysis conditions such as the following
- T I iP is the theoretical intensity in a pure substance whose analysis target element i is 100%
- W i (0) is the initial content rate
- W i (n) is the n-th content rate
- T I in is the content of each element
- the theoretical intensity W i (n + 1) for the analysis target element i calculated from the composition at the n-th content rate is the n + 1-th content rate, that is, a quantitative analysis value.
- W i (n + 1) W i (n) ⁇ T I Mi / T I in ... (5)
- the analysis element i originally set in the quantitative analysis conditions is subjected to the iterative calculation according to the following equations (6) and (7) of the calibration curve method. Is called.
- a and B are calibration curve constants
- ⁇ j is a theoretical matrix correction coefficient.
- the overlap correction term is omitted in the equations (4) to (7).
- the analysis target element i originally set as the quantitative analysis condition as part of the composition for calculating the theoretical strength T I in is the nth time according to the formula (7).
- the fundamental parameter method using the device sensitivity constant k i stored in advance is applied to the added new analysis target element i and is based on the X-ray intensity I Mi measured with the goniometer 10 fixed. Since the quantitative analysis value W i (n + 1) with higher accuracy is used, more accurate analysis can be performed as a whole.
- the analysis is performed for the new detection element k other than the preset sample constituent element.
- Analysis from the absorption excitation degree ⁇ W i / W i of the fluorescent X-ray with respect to the analysis value of the target element i and the overlapping degree 3 ⁇ ik T I k / T I i of the interference line with respect to the analysis line of the analysis target element i Since the quantitative analysis condition setting means 11 for determining whether or not to add as the target element i is provided, even if the standard sample 14 contains an element whose content is unknown, the analysis target element i under the quantitative analysis condition. Appropriate addition is automatically made and accurate analysis is possible.
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Abstract
Description
3 1次X線
5 2次X線
13 定量分析条件設定手段
14 標準試料
Claims (3)
- 試料に1次X線を照射して発生する2次X線の強度を測定する走査型の蛍光X線分析装置であって、
分析対象試料に対応する検量線を作成するための複数の標準試料と、
定量分析条件として、あらかじめ、分析対象試料における分析対象元素ならびに標準試料における試料構成元素およびその含有率が設定される定量分析条件設定手段とを備え、
前記定量分析条件設定手段が、
標準試料について定性分析および定性分析結果に基づく定量分析である半定量分析を行い、あらかじめ設定された試料構成元素以外の元素を新規検出元素として検出し、
新規検出元素およびあらかじめ設定された試料構成元素についてファンダメンタルパラメーター法により蛍光X線の吸収励起に関する理論マトリックス補正係数を計算し、その理論マトリックス補正係数、新規検出元素の半定量分析値およびあらかじめ設定された試料構成元素の含有率に基づいて、分析対象元素の分析値に対する新規検出元素による蛍光X線の吸収励起の影響度を吸収励起影響度として計算して対応する所定の基準値と比較し、
あらかじめ記憶した重なり補正テーブルから分析対象元素の分析線に対する新規検出元素による妨害線の重なり補正係数を呼び出し、その重なり補正係数、新規検出元素の半定量分析値およびあらかじめ設定された試料構成元素の含有率に基づいて、分析対象元素の分析線に対する新規検出元素による妨害線の重なりの影響度を重なり影響度として計算して対応する所定の基準値と比較し、
前記吸収励起影響度および前記重なり影響度の少なくとも一方が、対応する所定の基準値よりも大きい場合に、定量分析条件として、当該新規検出元素を分析対象試料における分析対象元素として追加する蛍光X線分析装置。 - 請求項1に記載の蛍光X線分析装置において、
前記定量分析条件設定手段が、
新規検出元素の半定量分析値が所定の含有率よりも大きい場合に、定量分析条件として、当該新規検出元素を分析対象試料における分析対象元素として追加することなく、残分元素として設定する蛍光X線分析装置。 - 請求項1に記載の蛍光X線分析装置において、
前記定量分析条件設定手段が、
分析対象試料における分析対象元素として追加する新規検出元素については、定量分析条件として、あらかじめ記憶した装置感度定数を用いるファンダメンタルパラメーター法による定量演算条件を設定する蛍光X線分析装置。
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| CN201680006771.9A CN107209132B (zh) | 2015-08-28 | 2016-08-26 | 荧光x射线分析装置 |
| US15/544,896 US10082475B2 (en) | 2015-08-28 | 2016-08-26 | X-ray fluorescence spectrometer |
| JP2017537853A JP6232568B2 (ja) | 2015-08-28 | 2016-08-26 | 蛍光x線分析装置 |
| EP16841733.5A EP3239702B1 (en) | 2015-08-28 | 2016-08-26 | X-ray fluorescence spectrometer |
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| JP6797421B2 (ja) * | 2018-08-09 | 2020-12-09 | 株式会社リガク | 蛍光x線分析装置 |
| JP6998608B2 (ja) * | 2019-09-20 | 2022-01-18 | 株式会社リガク | 定量分析方法、定量分析プログラム、及び、蛍光x線分析装置 |
| JP7190749B2 (ja) * | 2020-05-18 | 2022-12-16 | 株式会社リガク | 蛍光x線分析装置 |
| JP7190751B2 (ja) * | 2020-10-30 | 2022-12-16 | 株式会社リガク | 蛍光x線分析装置 |
| RU2756666C1 (ru) * | 2021-02-01 | 2021-10-04 | Акционерное общество "Чепецкий механический завод" | Способ определения содержания гафния в металлическом цирконии и сплавах на его основе |
| JP7325849B2 (ja) * | 2021-10-28 | 2023-08-15 | 株式会社リガク | ピーク同定解析プログラム及び蛍光x線分析装置 |
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| JP2002340822A (ja) * | 2001-05-16 | 2002-11-27 | Rigaku Industrial Co | 蛍光x線分析装置 |
| JP2013205080A (ja) * | 2012-03-27 | 2013-10-07 | Rigaku Corp | 蛍光x線分析装置 |
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| WO2021059597A1 (ja) * | 2019-09-26 | 2021-04-01 | 株式会社リガク | 蛍光x線分析装置 |
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| US10161889B2 (en) | 2018-12-25 |
| CN107209132B (zh) | 2019-06-21 |
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| EP3343211B1 (en) | 2020-07-29 |
| US20180180563A1 (en) | 2018-06-28 |
| JP6232568B2 (ja) | 2017-11-22 |
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