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WO2011155473A1 - Method for producing fine metal particles and fine metal particle dispersion solution - Google Patents

Method for producing fine metal particles and fine metal particle dispersion solution Download PDF

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Publication number
WO2011155473A1
WO2011155473A1 PCT/JP2011/062992 JP2011062992W WO2011155473A1 WO 2011155473 A1 WO2011155473 A1 WO 2011155473A1 JP 2011062992 W JP2011062992 W JP 2011062992W WO 2011155473 A1 WO2011155473 A1 WO 2011155473A1
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Prior art keywords
solution
fine particles
metal fine
metal
plasma
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French (fr)
Japanese (ja)
Inventor
直樹 松田
晴久 加藤
達朗 中島
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National Institute of Advanced Industrial Science and Technology AIST
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National Institute of Advanced Industrial Science and Technology AIST
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00Making metallic powder or suspensions thereof
    • B22F9/02Making metallic powder or suspensions thereof using physical processes
    • B22F9/14Making metallic powder or suspensions thereof using physical processes using electric discharge
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/14Treatment of metallic powder
    • B22F1/145Chemical treatment, e.g. passivation or decarburisation
    • B22F1/147Making a dispersion
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00Supplementary information concerning processes or compositions relating to powder metallurgy

Definitions

  • the present invention relates to a method for producing metal fine particles and a metal fine particle dispersion. More specifically, in the method for producing metal fine particles using solution plasma, the production of metal fine particles that can easily produce non-aggregated metal fine particles (dispersed metal fine particles) without adding a dispersion solubilizer.
  • the present invention relates to a fine metal particle dispersion solution stably dispersed in a solution to which a method and a dispersion solubilizer are not added.
  • a gas phase method such as a flame method and a plasma method
  • a liquid phase method such as a sol-gel method, and the like are known.
  • Patent Document 1 describes a method for producing metal oxide nanoparticles using vapor phase plasma as a method for producing metal oxide using a vapor phase method.
  • the equipment is large and the cost is high, (2) the synthesis speed is slow and unsuitable for mass production, (3) it is necessary to consider scattering because it handles fine particles in the air, etc. There is a problem.
  • Patent Document 2 describes a method for producing metal nanoparticles in which a metal wire is vaporized in a solution as a method for producing metal fine particles using a liquid phase method.
  • the raw materials used are limited, (2) the raw materials used are generally expensive, (3) the raw materials used are toxic, etc., and handling is often necessary. There are problems such as.
  • both the gas phase method and the liquid phase method have problems in industrially producing metal fine particles.
  • Solution plasma is plasma generated between discharge electrodes by applying a voltage (high electric field) between two discharge electrodes arranged opposite to each other in a solution. Bubbles are generated around the generated plasma, the bubbles surround the plasma, and the solution surrounds the bubbles.
  • the solution plasma is characterized by two interfaces: plasma / gas phase and gas phase / liquid phase. As described above, the solution plasma realizes a state in which the “high energy state” due to the plasma is confined in the solution. As a result, various chemical reactions are promoted in the gas phase, the liquid phase or the interface around the plasma.
  • Patent Document 3 describes a method for producing metal nanoparticles using solution plasma. Specifically, metal ions contained in the aqueous metal salt solution are reduced by applying a high voltage between a pair of discharge electrodes provided in the aqueous metal salt solution with adjusted conductivity to generate plasma. Metal nanoparticles have been manufactured.
  • Patent Document 5 discloses a method for producing fine metal particles by causing a strong arc discharge (several tens of volts, several hundred amperes) intermittently between consumable electrodes arranged in water to evaporate the consumable electrodes. Is described. Further, Patent Document 6 discloses that metal powder is produced by bringing metal ion vapor generated by discharge in plasma water between an elemental metal electrode and a counter electrode into high pressure water by bringing it into contact with water and pulverizing. A method of manufacturing is described.
  • Japanese Patent Publication “JP 2006-55839 A (published March 2, 2006)” Japanese Patent Gazette “Special Table 2009-506205 Gazette (published on February 12, 2009)” Japanese Patent Publication “Japanese Unexamined Patent Application Publication No. 2008-013810 (published January 24, 2008)” Japanese Patent Publication “Japanese Patent Laid-Open No. 2010-9993 (published on Jan. 14, 2010)” Japanese Patent Publication “JP-A-2-166202 (published on June 26, 1990)” WO2003 / 37553 (released on May 8, 2003)
  • Patent Document 3 In order to produce metal fine particles by the method described in Patent Document 3, there is a problem that a complicated process is required to remove the dispersion-dissolving agent. Further, the methods described in Patent Documents 4 and 5 are not suitable as a method for producing metal fine particles.
  • the metal fine particles are likely to aggregate.
  • so-called metal nanoparticles having a particle diameter of 100 nm or less are remarkably easily aggregated.
  • a dispersion solubilizing agent such as gelatin
  • the dispersion solubilizer when a dispersion solubilizer is added to the metal salt aqueous solution, the dispersion solubilizer remains as an impurity in the metal salt aqueous solution. For this reason, a treatment for removing the dispersion-dissolving agent is finally required, but it is difficult to remove the dispersion-dissolving agent without agglomerating the metal fine particles. Further, when a dispersion solubilizer is added, the dispersion solubilizer is adsorbed on the metal fine particles. For this reason, the dispersion
  • Patent Documents 5 and 6 are all based on the premise that plasma is generated by arc discharge. However, in arc discharge, a very large current flows between the discharge electrodes, so that the discharge electrodes are significantly consumed. For this reason, it is unlikely that the plasma state can be maintained for a long time (several tens of minutes) and the metal fine particles can be stably produced. Therefore, the methods described in Patent Documents 5 and 6 are inappropriate as a method for producing metal fine particles.
  • the present invention has been made in view of the above-described conventional problems, and the object thereof is a metal fine particle that is not aggregated without adding a dispersion-dissolving agent in a method for producing metal fine particles using a solution plasma.
  • An object of the present invention is to provide a method for producing metal fine particles, which can easily produce (metal fine particle dispersion).
  • Another object of the present invention is to provide a metal fine particle dispersion solution that is stably dispersed in a solution to which a dispersion solubilizer is not added.
  • the method for producing fine metal particles of the present invention melts a discharge electrode by generating plasma by glow discharge between a pair of discharge electrodes made of the same material arranged in a solution. And a step of forming metal fine particles made of a metal constituting the discharge electrode, wherein the dispersion solution for suppressing aggregation of the metal fine particles is not added to the solution.
  • non-aggregated metal fine particles metal fine particles dispersed in a solution, that is, a metal fine particle dispersion solution
  • a dispersion solubilizer does not remain as an impurity in the solution
  • the metal fine particles dispersed in the solution can be directly used as the metal fine particle dispersion solution.
  • plasma is generated by glow discharge, the current flowing between the discharge electrodes is significantly smaller than in the case of arc discharge. For this reason, the discharge electrode is not easily consumed. Accordingly, the plasma state can be maintained for a long time (several tens of minutes), and the metal fine particles can be stably produced.
  • the manufacturing method of the metal microparticle of this invention forms the metal microparticle which consists of the metal which comprises a discharge electrode by melting a discharge electrode. That is, the raw material for the metal fine particles is supplied from the discharge electrode. For this reason, the discharge electrode is made of a metal that is easily melted by plasma.
  • the method described in Patent Document 3 forms metal fine particles constituting the metal salt by reducing metal ions in the metal salt aqueous solution. That is, the raw material for the metal fine particles is supplied from the metal salt aqueous solution. For this reason, the discharge electrode is made of a metal that is not easily melted by plasma.
  • the method for producing metal fine particles of the present invention is patented in that the origin of the metal fine particles, the metal constituting the discharge electrode, and the aggregation of metal fine particles can be suppressed without the addition of a dispersing and dissolving agent. This is greatly different from the method described in Document 3.
  • the discharge electrode is melted to form metal fine particles, and the discharge electrode is not vaporized in the solution. Therefore, it is different from the method described in Patent Document 2 in which the metal wire is vaporized in the solution. Further, the method described in Patent Document 2 is not a method using the solution plasma method.
  • the metal fine particle dispersion solution of the present invention has metal fine particles dispersed in a solution in which plasma is generated by glow discharge, and suppresses aggregation of the metal fine particles in the solution. It is characterized in that no dispersing solubilizer is added.
  • the metal fine particles are dispersed in the solution in which the plasma is generated by glow discharge, the aggregation of the metal fine particles is suppressed even though the dispersion solution is not added to the solution. Is done. Accordingly, it is possible to provide a metal fine particle dispersion solution that is stably dispersed in a solution to which a dispersion solubilizer is not added.
  • the method for producing fine metal particles of the present invention uses the metal constituting the discharge electrode by generating plasma between a pair of discharge electrodes made of the same material arranged in a solution to melt the discharge electrode. And forming a fine metal particle, and the dispersion solution for suppressing the aggregation of the fine metal particle is not added to the solution. Therefore, in a method for producing metal fine particles using solution plasma, metal particles that are not aggregated (metal fine particles dispersed in a solution, that is, a metal fine particle dispersion solution) are simply produced without adding a dispersion solubilizer. There is an effect that can be.
  • the metal fine particle dispersion solution of the present invention is a dispersion solution in which metal fine particles are dispersed in a solution in which plasma is generated by glow discharge, and the aggregation of the metal fine particles is suppressed in the solution. Is a structure in which is not added. Therefore, there is an effect that it is possible to provide a metal fine particle dispersion solution that is stably dispersed in a solution to which a dispersion solubilizer is not added.
  • FIG. 1 It is the schematic which shows the solution plasma discharge apparatus used for the manufacturing method of the metal microparticles of this invention. It is a figure which shows the state after one month progress of the gold nanoparticle dispersion liquid manufactured in Example 1.
  • FIG. 2 It is a figure which shows the result of having observed the gold nanoparticle manufactured in Example 1 with the atomic force microscope. It is a figure which shows the state after one month progress of the platinum nanoparticle dispersion liquid manufactured in Example 2.
  • FIG. It is a figure which shows the state after one month progress of the gold nanoparticle dispersion liquid manufactured in Example 3.
  • Example 4 It is a figure which shows the state after one month progress of the gold nanoparticle dispersion liquid manufactured in Example 4, (a) shows the gold nanoparticle dispersion liquid using 7.0 w / w% hydrogen peroxide aqueous solution. (B) shows a gold nanoparticle dispersion using a 17.5 w / w% aqueous hydrogen peroxide solution. In Example 4, it is a figure which shows the TEM image of the gold nanoparticle manufactured using 17.5 w / w% hydrogen peroxide aqueous solution. In Example 4, it is a figure which shows the elemental-analysis result by EDS of the gold nanoparticle manufactured using 17.5 w / w% hydrogen peroxide aqueous solution.
  • Example 5 It is a figure which shows the state after one month progress of the platinum nanoparticle dispersion liquid manufactured in Example 5, (a) shows the platinum nanoparticle dispersion liquid using 7.0 w / w% hydrogen peroxide aqueous solution. (B) shows a platinum nanoparticle dispersion using a 17.5 w / w% aqueous hydrogen peroxide solution. In Example 5, it is a figure which shows the TEM image of the platinum nanoparticle manufactured using 7.0 w / w% hydrogen peroxide aqueous solution. In Example 5, it is a figure which shows the elemental-analysis result by EDS of the platinum nanoparticle manufactured using 7.0 w / w% hydrogen peroxide aqueous solution.
  • Example 6 It is a figure which shows the state after one month progress of the silver nanoparticle dispersion liquid manufactured in Example 6, (a) shows the silver nanoparticle dispersion liquid using 0.44 w / w% hydrogen peroxide aqueous solution. , (B) shows a silver nanoparticle dispersion using a 0.88 w / w% aqueous hydrogen peroxide solution, and (c) shows a silver nanoparticle dispersion using a 1.75 w / w% aqueous hydrogen peroxide solution. Indicates. In Example 6, it is a figure which shows the TEM image of the silver nanoparticle manufactured using 0.88 w / w% hydrogen peroxide aqueous solution.
  • Example 6 it is a figure which shows the elemental-analysis result by EDS of the silver nanoparticle manufactured using 0.88 w / w% hydrogen peroxide aqueous solution. It is a figure which shows the state after one month progress of the gold nanoparticle dispersion liquid manufactured in Example 7, (a) shows the gold nanoparticle dispersion liquid using 0.1 mM sodium hydroxide aqueous solution, (b ) Shows a gold nanoparticle dispersion using a 0.5 mM sodium hydroxide aqueous solution, and (c) shows a gold nanoparticle dispersion using a 3.0 mM sodium hydroxide aqueous solution. It is a figure which shows the state after one month progress of the gold nanoparticle dispersion liquid manufactured in Example 8.
  • the manufacturing method of the metal microparticle of this invention is a metal fine particle production method using solution plasma, wherein plasma is generated by glow discharge between a pair of discharge electrodes arranged in a solution to melt the discharge electrode, It is a method including a step of forming metal fine particles made of a metal constituting the discharge electrode.
  • the dispersion solution which suppresses aggregation of metal fine particles is not added to the solution.
  • the method for producing fine metal particles of the present invention when glow discharge is performed in a solution, plasma is generated and the discharge electrode is melted by the plasma. As a result, colloidal metal fine particles are formed in the solution.
  • the metal fine particles can be taken out (isolated) through steps such as precipitation, filtration, and drying.
  • FIG. 1 is a schematic view showing a solution plasma discharge apparatus used in the method for producing fine metal particles of the present invention.
  • a solution plasma discharge apparatus 10 is configured to apply a voltage to a pair of discharge electrodes 1 provided in a solution 5 in a container 6, a ceramic tube 2 that covers the discharge electrodes 1, and the discharge electrodes 1.
  • a plasma generating power source 3 to be applied and a ground 4 connected to the plasma generating power source 3 are provided.
  • the discharge electrodes 1 are each made of a metal that constitutes the target metal fine particles. That is, the pair of discharge electrodes 1 and 1 are made of the same material. Each discharge electrode 1 is covered with a ceramic tube 2 so as to have a portion exposed in the solution 5.
  • the ceramic tube 2 plays a role of fixing the discharge electrode 1, but the ceramic tube 2 may not be used.
  • a material that can withstand the temperature of bubbles generated by plasma for example, a silicone rubber tube
  • the heat-resistant temperature of the ceramic is about 1500 to 1900 ° C., although it varies depending on the contained components. Moreover, the heat-resistant temperature of typical silicon rubber is about 200 degreeC.
  • the distance between electrodes, size, etc. of the discharge electrodes 1 and 1 are not particularly limited. Details of the discharge electrode 1 will be described later.
  • the plasma generating power source 3 supplies the discharge electrode 1 with a voltage for causing glow discharge. As a result, plasma is generated in the region A between the discharge electrodes 1 and 1 by glow discharge.
  • the conditions of the plasma generation power source 3 are not particularly limited as long as plasma is generated by glow discharge. That is, the voltage value, pulse width, pulse frequency, pulse waveform, etc. of the plasma generation power source 3 are not particularly limited as long as glow discharge can be caused.
  • Solution 5 is not particularly limited as long as plasma can be generated by glow discharge.
  • the solution 5 may contain an electrolyte or the like for adjusting the conductivity of the solution 5. That is, the solution 5 may be a single solution, a mixed solution of a plurality of solutions, or various additives such as an electrolyte may be added. However, as described above, a dispersion solubilizer that suppresses aggregation of metal fine particles is not added to the solution 5. Details of the solution 5 will be described later.
  • the solution plasma discharge device 10 generates plasma in the region A between the discharge electrodes 1 and 1 by glow discharge when a voltage (preferably 800 V or more) is applied between the plasma generation power source 3 and the discharge electrode 1. Further, during the glow discharge, the solution 5 is heated by the current flowing between the discharge electrodes 1 and 1. As a result, bubbles are generated in the solution 5, particularly around the plasma. Bubbles generated during voltage application surround the plasma, and the plasma state is stabilized and maintained inside the bubbles.
  • the region A which is a plasma generation region, includes plasma and a gas phase that contains the plasma. Thus, the gas phase surrounds the plasma (plasma phase), and the liquid phase surrounds the gas phase. Such a plasma state promotes melting of the discharge electrode 1, and metal fine particles are formed in the solution 5.
  • the method for producing fine metal particles of the present invention is not limited to the solution plasma discharge device 10, and a known solution plasma discharge device can be used.
  • the solution plasma discharge device described in Patent Document 4 disclosed by the present inventors can be applied.
  • the discharge electrode 1 is an electrode material (conductive material) that melts by plasma generated by glow discharge, and is not particularly limited as long as it is made of a metal that forms the target metal fine particles.
  • the metal constituting the discharge electrode 1 Au (gold), Pt (platinum), Ag (silver), palladium (Pd), rhodium (Rh), iridium (Ir), ruthenium (Ru), osmium (Os) ), Mo (molybdenum) Cu (copper), Zn (zinc), and the like.
  • the single metal microparticle according to the metal material which comprises the discharge electrode 1 can be manufactured.
  • Gold, platinum, and silver are particularly easily melted by plasma.
  • it is preferable that the discharge electrode 1 is comprised from gold
  • the solution 5 is not particularly limited as long as the solution 5 can generate plasma by glow discharge.
  • the dispersion / dissolving agent that is essential for suppressing aggregation of metal fine particles is not added to the solution 5.
  • the method for producing fine metal particles of the present invention when a voltage is applied between the discharge electrodes 1 and 1 provided in the solution 5 to cause discharge, plasma is generated in the region A between the discharge electrodes 1 and 1. As a result, the discharge electrode 1 is melted by the plasma, and metal fine particles made of the metal constituting the discharge electrode 1 are formed. In addition, the aggregation of the metal fine particles is suppressed even though the dispersing and dissolving agent is not added to the solution 5. For this reason, a dispersion
  • metal fine particles dispersed in the solution 5, that is, metal fine particle dispersion solution without adding a dispersion solubilizer.
  • the dispersion solubilizer does not remain as an impurity in the solution 5, the metal fine particles dispersed in the solution 5 can be directly used as a metal fine particle dispersion solution.
  • plasma is generated by glow discharge, so that the current flowing between the discharge electrodes 1 and 1 is significantly smaller than in the case of arc discharge. For this reason, the discharge electrode 1 is hardly consumed. Accordingly, the plasma state can be maintained for a long time (several tens of minutes), and the metal fine particles can be stably produced.
  • the metal fine particles produced according to the present invention do not aggregate is that the metal fine particles or metal colloids dispersed in the solution are positively or negatively charged, and the surrounding particles are oppositely charged. It is considered that this is because (for example, cations, anions, radicals, solvated electrons, hydroxide ions, etc.) surround and are in thermal motion (Brownian motion).
  • the metal fine particles produced by the method for producing metal fine particles of the present invention are given various functions to the metal fine particles by subjecting the metal fine particles to surface modification.
  • it is used as functional metal fine particles by introducing a specific functional group or molecule into the surface of the metal fine particles.
  • the solution 5 does not contain a specific component that interferes with the surface modification of the metal fine particles.
  • the solution 5 preferably does not contain fluorine, chlorine, bromine, iodine, and sulfur atoms, molecules, and ions.
  • fluorine, chlorine, bromine, iodine, and sulfur atoms, molecules, and ions preferably does not contain fluorine, chlorine, bromine, iodine, and sulfur atoms, molecules, and ions.
  • halogen and sulfur atoms, molecules, or ions that are easily chemisorbed or physically adsorbed on the surface of the formed fine metal particles do not exist in the solution. That is, there is no component in the solution that interferes with the surface modification (surface treatment) of the metal fine particles. This facilitates surface modification of the metal fine particles. Therefore, highly versatile metal fine particles can be produced.
  • the solution 5 can be exemplified by a peroxide solution.
  • the “peroxide solution” refers to a liquid in which a peroxide is dissolved or dispersed in a solvent.
  • Peroxide means, for example, a peroxide structure (—O—O—), a hydroperoxide structure (—O—O—H), or a percarboxylic acid structure (—C ( ⁇ O) —O—O—). It is an organic compound having in the molecule, or an inorganic compound having a peroxide ion (O 2 2 ⁇ ) or a hydroperoxide structure (—O—O—H) in the molecule.
  • Peroxide is also referred to as a salt or derivative of a peracid.
  • the “peroxide” is preferably an ionic peroxide.
  • Ionic peroxide refers to a peroxide that is decomposed into hydrogen peroxide by water or acid.
  • hydrogen peroxide (H—O—O—H) is included in the category of “peroxide”. That is, the “peroxide solution” refers to a liquid in which peroxide or hydrogen peroxide is dissolved or dispersed in a solvent.
  • the solvent for dispersing or dissolving the peroxide is generally water, but an organic solvent, an inorganic acid, or the like can also be used as long as the peroxide can be dispersed or dissolved.
  • Such a peroxide solution does not contain impurities such as components (halogen, sulfur, etc.) that adsorb on the surface of the metal fine particles and interfere with the surface modification of the metal fine particles. That is, even if it is adsorbed on the surface of the metal fine particles, the surface modification of the metal fine particles is not easily disturbed. This facilitates surface modification of the metal fine particles. Therefore, highly versatile metal fine particles can be produced.
  • an aqueous hydrogen peroxide solution is a simple molecule composed of hydrogen and oxygen. Therefore, highly versatile metal fine particles that can be easily surface-modified can be produced. Furthermore, even when hydrogen peroxide is decomposed, only water and oxygen are generated, so that safety is high.
  • the peroxide content (peroxide solution concentration) in the solution 5 is not particularly limited. However, since the synthesis rate and efficiency generally increase as the concentration increases, it is desirable that the concentration of the solution 5 (peroxide concentration) be as high as possible without reaching the saturation concentration. However, if the concentration is too high, it may become unstable and may cause agglomeration, so the content of peroxide in the solution 5 is within the range of 0.01 w / w% or more and 35.5 w / w% or less. Preferably there is. Thereby, metal microparticles can be produced without causing aggregation in the peroxide solution.
  • an alkaline solution refers to an ionic solution exhibiting alkalinity, such as a solution in which an alkali metal hydroxide or an alkaline earth metal hydroxide is dispersed or dissolved in a solvent (sodium hydroxide solution, potassium hydroxide). Solution, barium hydroxide solution, calcium hydroxide solution, etc.) or sodium carbonate aqueous solution.
  • concentration of the alkaline solution may be as low as the metal fine particles do not aggregate.
  • the alkaline solution is preferably an aqueous solution of 0.01 mM or more and 50 mM or less.
  • the alkaline solution is preferably a low concentration sodium hydroxide aqueous solution.
  • Such a low-concentration alkaline solution does not cause electrostatic shielding to the formed metal fine particles, so that the metal fine particles do not aggregate. Further, components (halogen, sulfur) that adsorb on the surface of the metal fine particles and interfere with the surface modification of the metal fine particles are not present in the solution 5. This facilitates surface modification of the metal fine particles. Therefore, highly versatile metal fine particles can be produced.
  • the solution 5 may contain various additives such as an electrolyte for adjusting the conductivity of the solution 5 in addition to the peroxide solution.
  • an electrolyte for adjusting the conductivity of the solution 5 in addition to the peroxide solution.
  • a process (step) for finally removing the additive from the solution 5 becomes necessary, or the additive component is chemically or physically adsorbed on the surface of the metal fine particles.
  • the properties as metal fine particles may be significantly impaired. For this reason, in order to obtain metal fine particles easily, it is preferable to avoid the addition of the additive to the solution 5 as much as possible.
  • the solution 5 may be any solution that can generate plasma by glow discharge, but preferably does not contain a specific component that interferes with the surface modification of the metal fine particles.
  • an aqueous solution of simple molecules composed only of atoms (for example, atoms selected from C, H, O, and metals) that do not interfere with the surface modification of the metal fine particles is preferable.
  • the solution 5 is preferably a hydrogen peroxide solution, a sodium carbonate solution, a sodium hydroxide solution, a potassium hydroxide solution, a barium hydroxide solution, a calcium hydroxide solution, or the like.
  • the solution 5 is more preferably a peroxide solution or a low-concentration alkaline solution, and particularly preferably an aqueous hydrogen peroxide solution.
  • the combination of the solute and the solvent constituting the solution 5, the concentration, conductivity, pH, etc. of the solution 5 may be set according to the purpose and are not particularly limited.
  • the ease of generating plasma may vary depending on the type of the solution 5, and the dispersibility in the solution 5 may vary depending on the type of metal fine particles.
  • the concentration of the solution 5 may be set in consideration of the ease of generating plasma, the type of metal fine particles, and the dispersibility of the metal fine particles in the solution 5.
  • the temperature of the solution 5 is not limited, but generally, the higher the temperature of the solution 5, the higher the synthesis rate and efficiency. Therefore, the temperature is preferably within the range of 25 ° C. or more and the boiling point or less.
  • the metal fine particle dispersion solution of the present invention is a solution in which metal fine particles are dispersed in a solution in which plasma (solution plasma) is generated by glow discharge.
  • plasma solution plasma
  • the dispersion solution which suppresses aggregation of metal fine particles is not added to the solution.
  • the method for producing the metal fine particle dispersion of the present invention is not particularly limited, but can be produced by the above-described metal fine particle production method or the solution plasma discharge apparatus 10 of the present invention.
  • the metal fine particle dispersion solution of the present invention melts the discharge electrode by generating plasma by a glow discharge between a pair of discharge electrodes made of the same material arranged in the solution, and from the metal constituting the discharge electrode. And a step of dispersing the fine metal particles in the solution, and a method in which the dispersion solution for suppressing the aggregation of the fine metal particles is not added to the solution.
  • the solution in which the metal fine particles are dispersed is the same as the solution 5 described above, and thus the description thereof is omitted.
  • the solution in which the metal fine particles are dispersed will be described as the solution 5.
  • the fine metal particles are dispersed in the solution 5 in which plasma is generated by glow discharge, the dispersion of the fine metal particles is not added to the solution even though the dispersion solution is not added to the solution. Aggregation is suppressed. Accordingly, it is possible to provide a metal fine particle dispersion solution that is stably dispersed in the solution 5 to which no dispersion solubilizer is added.
  • the metal fine particles are positively or negatively charged, and the surroundings are particles having an opposite charge (for example, cation, anion, radical, solvated electron, hydroxylation) It is preferable that product ions and the like are surrounded. In other words, it is preferable that particles having the opposite charge to the surface of the metal fine particles are attracted near the surface of the metal fine particles.
  • the surface of the metal fine particles is positively charged. Therefore, it is more preferable that the surface of the metal fine particles is positively charged, and the negatively charged particles are attracted around the metal fine particles.
  • the negatively charged particles are attracted around the surface of the positively charged metal fine particles. That is, a fixed layer (Stern layer: also referred to as a Stern layer) is formed around the metal fine particles.
  • a fixed layer (Stern layer: also referred to as a Stern layer) is formed around the metal fine particles.
  • the metal fine particles and the fixed layer move together in the solution 5. Therefore, the metal fine particles can be stably dispersed in the solution 5 that does not contain the dispersing and dissolving agent.
  • the zeta potential is related to the surface charge at the particle interface, and is the potential difference between the electric double layer surface (slip surface) and the bulk portion of the solution sufficiently away from the interface.
  • the absolute value of the zeta potential increases, the repulsion between the metal fine particles in the solution 5 becomes stronger. That is, the dispersion stability of the metal fine particles in the solution 5 is increased.
  • the absolute value of the zeta potential is closer to zero, the metal fine particles are more likely to aggregate.
  • the absolute value of the zeta potential of the solution 5 is preferably as large as possible.
  • the absolute value of the zeta potential is preferably 25 mV or more, more preferably 30 mV or more, and particularly preferably 30 mV to 80 mV.
  • the absolute value of the zeta potential indicating the dispersion stability of the metal fine particles is 25 mV or more. Therefore, the repulsion between metal fine particles becomes strong, and the dispersion stability of the metal fine particles in the solution 5 becomes high. Therefore, the metal fine particles can be stably dispersed in the solution 5 to which no dispersion solubilizer is added.
  • the metal fine particle dispersion solution of the present invention has the advantage that the dispersion of the metal fine particles is suppressed and stably dispersed in the solution even though the dispersion solubilizer is not added to the solution. It has the characteristics of
  • the fine metal particles obtained by the method for producing fine metal particles of the present invention preferably have an average particle size of 500 nm or less, and more preferably 100 nm or less.
  • the lower limit of the average particle diameter of the metal fine particles is preferably 50 nm or more, and more preferably 10 nm or more.
  • the average particle diameter of the metal fine particles can also be confirmed by an AFM image obtained by an atomic force microscope (AFM). Furthermore, depending on the type of the solution 5 and the metal fine particles, the particle diameter of the metal fine particles can be confirmed from the color of the solution 5 in which the metal fine particles are dispersed. For example, in Examples 1 and 3 to be described later, the average particle diameter of the gold particles was also confirmed from the color of the gold nanoparticle dispersion after discharge.
  • the present invention can also be expressed as follows.
  • the solution preferably does not contain fluorine, chlorine, bromine, iodine, and sulfur atoms, molecules, and ions.
  • halogen and sulfur atoms, molecules, or ions that are easily chemically or physically adsorbed on the surface of the formed metal fine particles are not present in the solution. That is, there is no component in the solution that interferes with the surface modification (surface treatment) of the metal fine particles. This facilitates surface modification of the metal fine particles. Therefore, highly versatile metal fine particles can be produced.
  • the solution is preferably a peroxide solution.
  • a peroxide solution is used as the solution. Even if the peroxide solution is adsorbed on the surface of the metal fine particles, the surface modification of the metal fine particles is not easily disturbed. This facilitates surface modification of the metal fine particles. Therefore, highly versatile metal fine particles can be produced.
  • the peroxide content in the peroxide solution is preferably 0.01 w / w% or more and 35.5 w / w% or less.
  • the peroxide content in the peroxide solution is in the range of 0.01 w / w% to 35.5 w / w%.
  • the peroxide solution is preferably an aqueous hydrogen peroxide solution.
  • a simple molecular hydrogen peroxide solution composed of hydrogen and oxygen is used as the solution. That is, impurities such as components (halogen, sulfur, etc.), metal, and metal oxide that adsorb on the surface of the metal fine particles and interfere with the surface modification of the metal fine particles are not present in the solution. Therefore, highly versatile metal fine particles that can be easily surface-modified can be produced. Furthermore, even if hydrogen peroxide is decomposed, since only water and oxygen are generated, a highly safe method for producing fine metal particles can be realized.
  • the solution is preferably an alkaline solution of 0.01 mM or more and 50 mM or less.
  • the alkaline solution is more preferably a sodium hydroxide aqueous solution.
  • a low concentration alkaline solution of 0.01 mM or more and 50 mM or less is used as the solution. That is, there are no components (halogen, sulfur, etc.) that adsorb on the surface of the metal fine particles and interfere with the surface modification of the metal fine particles in the solution. This facilitates surface modification of the metal fine particles. Therefore, highly versatile metal fine particles can be produced.
  • the average particle size of the fine metal particles is preferably 500 nm or less.
  • the metal fine particle which has a specific property different from a bulk metal can be manufactured.
  • Such metal fine particles can be suitably used in chemical and bio fields such as pharmaceuticals, cosmetics, catalysts, electronic materials and optical materials.
  • the surface of the metal fine particles is positively charged, and the negatively charged particles are attracted around the metal fine particles.
  • the negatively charged particles are attracted around the surface of the positively charged metal fine particles. That is, a fixed layer (Stern layer: also referred to as a Stern layer) is formed around the metal fine particles.
  • a fixed layer (Stern layer: also referred to as a Stern layer) is formed around the metal fine particles.
  • the metal fine particles and the fixed layer move together in the solution. Therefore, the metal fine particles can be stably dispersed in a solution that does not contain the dispersing and dissolving agent.
  • the absolute value of the zeta potential of the solution is preferably 25 mV or more.
  • the absolute value of the zeta potential indicating the dispersion stability of the metal fine particles is 25 mV or more.
  • Example 1 Gold fine particles were produced using the solution plasma discharge apparatus 10 of FIG. Specifically, a gold electrode having a purity of 99.9% and a diameter of 1 mm is used as each discharge electrode 1, the distance between the discharge electrodes 1 and 1 is 0.5 mm, and the solution 5 is 3.5 w / w% peroxide. Only aqueous hydrogen solution was used. The solution 5 contains no additives such as a dispersion solubilizer other than the hydrogen peroxide solution. In order to generate plasma by glow discharge between the discharge electrodes 1 and 1 of such a solution plasma discharge apparatus 10, the discharge start voltage applied between the discharge electrodes 1 and 1 is set to 800 V, and a voltage is applied for 4 minutes. .
  • FIG. 2 is a view showing a state after one month of the gold nanoparticle dispersion produced in Example 1.
  • FIG. As shown in the figure, since the gold nanoparticle dispersion has a transparent feeling, it was confirmed that the gold nanoparticles were not aggregated even after one month had elapsed since the production of the gold fine particles. In addition, when a gold nanoparticle aggregates, an aggregate precipitates. Since the aqueous hydrogen peroxide solution was transparent, dissolution of the gold electrode was observed immediately after the start of discharge.
  • FIG. 3 is a diagram showing the results of observation of the gold nanoparticles produced in Example 1 with an atomic force microscope.
  • the horizontal axis indicates the particle size (0 to 1.0 ⁇ m)
  • the vertical axis indicates the thickness from the glass plate in color. As shown in FIG. 3, it was confirmed that gold nanoparticles of 100 nm or less were formed.
  • the atomic force microscope cannot confirm the formed particle component (element). However, under the conditions of this example, there is no metal element contained in the hydrogen peroxide solution other than gold derived from the gold electrode. It was also confirmed that the residue on the glass substrate after evaporation and drying was visually similar to gold. Furthermore, as described above, the color of the dispersion is the same as that of the gold solution. Therefore, the particles produced according to this example are gold nanoparticles.
  • Example 2 Platinum fine particles were produced under the same conditions as in Example 1 except that a platinum electrode having a purity of 99.9% and a diameter of 1 mm was used as the discharge electrode 1.
  • 4 is a view showing a state after one month of the platinum nanoparticle dispersion produced in Example 2.
  • FIG. As shown in the figure, since the platinum nanoparticle dispersion liquid is transparent, it was confirmed that the platinum nanoparticles were not aggregated even after one month from the production of the platinum fine particles. In addition, dissolution of the platinum electrode was observed immediately after the start of discharge, and the platinum nanoparticle dispersion after application of the voltage exhibited a light brown color, confirming the production of platinum nanoparticles.
  • Example 3 Gold fine particles were produced under the same conditions as in Example 1 except that 5 mM sodium hydroxide aqueous solution was used as the solution 5.
  • FIG. 5 is a view showing a state after one month of the gold nanoparticle dispersion liquid produced in Example 3.
  • FIG. 5 As shown in the figure, since the gold nanoparticle dispersion has a transparent feeling, it was confirmed that the gold nanoparticles were not aggregated even after one month had elapsed since the production of the gold fine particles.
  • dissolution of the gold electrode was observed immediately after the start of discharge, the gold nanoparticle dispersion after application of voltage was red, and the gold nanoparticle dispersion after one month was slightly purple. It was confirmed that the gold nanoparticles were produced.
  • Example 4 Gold fine particles were produced under the same conditions as in Example 1 except that 7.0 w / w% and 17.5 w / w% aqueous hydrogen peroxide solution was used as Solution 5.
  • FIG. 6 is a diagram showing a state after one month of the gold nanoparticle dispersion produced in Example 4, wherein (a) is a gold nanoparticle using a 7.0 w / w% aqueous hydrogen peroxide solution. A dispersion liquid is shown, and (b) shows a gold nanoparticle dispersion liquid using a 17.5 w / w% aqueous hydrogen peroxide solution.
  • FIG. 7 is a diagram showing a TEM image of gold nanoparticles produced using a 17.5 w / w% aqueous hydrogen peroxide solution in Example 4.
  • FIG. As shown in the figure, it was confirmed that gold nanoparticles of 10 nm to 100 nm were produced.
  • EDS Electronic Data Dispersive X-ray Spectrometer
  • Example 5 Example 1 except that a platinum electrode having a purity of 99.9% and a diameter of 1 mm was used as the discharge electrode 1 and a 7.0 w / w% and 17.5 w / w% aqueous hydrogen peroxide solution was used as the solution 5. Platinum fine particles were produced under the same conditions.
  • FIG. 9 is a diagram showing a state after one month of the platinum nanoparticle dispersion produced in Example 5, wherein (a) is a platinum nanoparticle using a 7.0 w / w% aqueous hydrogen peroxide solution. A dispersion liquid is shown, and (b) shows a platinum nanoparticle dispersion liquid using a 17.5 w / w% aqueous hydrogen peroxide solution.
  • FIG. 10 is a diagram showing a TEM image of platinum nanoparticles produced in Example 5 using a 7.0 w / w% aqueous hydrogen peroxide solution. As shown in the figure, it was confirmed that platinum nanoparticles of 1 nm to 100 nm were produced.
  • FIG. 10 is a diagram showing a TEM image of platinum nanoparticles produced in Example 5 using a 7.0 w / w% aqueous hydrogen peroxide solution. As shown in the figure, it was confirmed that platinum nanoparticles of 1 nm to 100 nm were produced.
  • FIG. 10 is a diagram showing a TEM image of platinum nanoparticles produced in Example 5 using a 7.0 w / w% aqueous hydrogen peroxide solution. As shown in the figure, it was confirmed that platinum nanoparticles of 1 nm to 100 nm were produced.
  • FIG. 10 is a diagram showing a TEM image of platinum nanoparticles produced in Example 5 using a 7.0
  • FIG. 11 is a diagram showing an elemental analysis result by EDS of platinum nanoparticles produced in Example 5 using a 7.0 w / w% aqueous hydrogen peroxide solution. As shown in FIG. 11, as a result of elemental analysis by EDS, it was confirmed that the produced nanoparticles were platinum.
  • Example 6 A silver electrode having a purity of 99.9% and a diameter of 1 mm is used as the discharge electrode 1, and 0.44 w / w%, 0.88 w / w%, and 1.75 w / w% aqueous hydrogen peroxide solution is used as the solution 5. Except for the above, fine platinum particles were produced under the same conditions as in Example 1.
  • FIG. 12 is a view showing a state after one month of the silver nanoparticle dispersion produced in Example 6, wherein (a) is a silver nanoparticle using a 0.44 w / w% aqueous hydrogen peroxide solution.
  • FIG. 1 shows a dispersion
  • (b) shows a silver nanoparticle dispersion using a 0.88 w / w% aqueous hydrogen peroxide solution
  • (c) shows a silver using a 1.75 w / w% aqueous hydrogen peroxide solution.
  • a nanoparticle dispersion is shown.
  • FIG. 13 is a diagram showing a TEM image of silver nanoparticles produced using a 0.88 w / w% aqueous hydrogen peroxide solution in Example 6.
  • FIG. 14 is a diagram showing an elemental analysis result by EDS of silver nanoparticles produced in Example 6 using a 0.88 w / w% aqueous hydrogen peroxide solution. As shown in FIG. 14, as a result of elemental analysis by EDS, it was confirmed that the produced nanoparticles were silver.
  • Example 7 Gold fine particles were produced under the same conditions as in Example 1 except that 0.1 mM, 0.5 mM, and 3 mM sodium hydroxide aqueous solutions were used as the solution 5.
  • FIG. 15 is a view showing a state after one month of the gold nanoparticle dispersion produced in Example 7, wherein (a) shows a gold nanoparticle dispersion using a 0.1 mM sodium hydroxide aqueous solution. (B) shows a gold nanoparticle dispersion using a 0.5 mM aqueous sodium hydroxide solution, and (c) shows a gold nanoparticle dispersion using a 3.0 mM aqueous sodium hydroxide solution.
  • the gold nanoparticle dispersion has a transparent feeling, it was confirmed that the gold nanoparticles were not aggregated even after one month had elapsed since the production of the gold fine particles.
  • dissolution of the gold electrode was observed immediately after the start of discharge, the gold nanoparticle dispersion after application of voltage was red, and the gold nanoparticle dispersion after one month was slightly purple. It was confirmed that the gold nanoparticles were produced.
  • Example 8 Gold fine particles were produced under the same conditions as in Example 1 except that 7.0 w / w% aqueous hydrogen peroxide solution was used as Solution 5.
  • FIG. 16 is a diagram showing a state after one month of the gold nanoparticle dispersion liquid produced in Example 8. As shown in the figure, since the gold nanoparticle dispersion has a transparent feeling, it was confirmed that the gold nanoparticles were not aggregated even after one month had elapsed since the production of the gold fine particles. In addition, dissolution of the gold electrode was observed immediately after the start of discharge, the gold nanoparticle dispersion after application of voltage was red, and the gold nanoparticle dispersion after one month was slightly purple. It was confirmed that the gold nanoparticles were produced. In FIG. 16, “160 V”, “180 V”, and “220 V” indicate supply average voltages, and do not indicate discharge start voltages.
  • the zeta potential of the gold nanoparticle dispersion after half a month passed was measured by electrophoretic light scattering measurement using a zeta potential measuring device.
  • the zeta potential when the supply average voltage is 160 V is ⁇ 38.9 mV (repetitive standard deviation is 1.1 mV)
  • the zeta potential when the supply average voltage is 180 V is ⁇ 31.9 mV (repetitive standard).
  • the deviation was 2.2 mV
  • the zeta potential when the supply average voltage was 220 V was ⁇ 32.9 mV (repetitive standard deviation was 1.1 mV).
  • the measurement result of zeta potential has shown the average value measured 3 times.
  • the absolute value of the zeta potential of the solution was 30 mV or more, and it was confirmed that the gold nanoparticles were stably dispersed in the solution to which no dispersion solubilizer was added.
  • the metal fine particles obtained by the present invention have specific properties different from those of bulk metals. Therefore, it can be suitably used in chemical and bio fields such as pharmaceuticals, cosmetics, catalysts, electronic materials, optical materials and the like.

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Abstract

Plasma is generated by a glow discharge between a pair of discharge electrodes (1) and (1) that are disposed in a solution (5) into which no dispersing/dissolving agent is added, so that the discharge electrodes (1) and (1) are melted, thereby forming fine metal particles which are formed from the metal that constitutes the discharge electrodes (1) and (1). Consequently, metal fine particles that are not agglomerated (a fine metal particle dispersion liquid) can be easily produced despite the fact that no dispersing/dissolving agent is added in a method for producing fine metal particles using solution plasma.

Description

金属微粒子の製造方法および金属微粒子分散溶液Method for producing metal fine particles and metal fine particle dispersion

 本発明は、金属微粒子の製造方法および金属微粒子分散溶液に関するものである。より詳細には、ソリューションプラズマを用いた金属微粒子の製造方法において、分散溶解剤を添加せずに、凝集していない金属微粒子(分散した金属微粒子)を簡便に製造することのできる金属微粒子の製造方法および分散溶解剤が添加されていない溶液中に安定して分散した金属微粒子分散溶液に関するものである。 The present invention relates to a method for producing metal fine particles and a metal fine particle dispersion. More specifically, in the method for producing metal fine particles using solution plasma, the production of metal fine particles that can easily produce non-aggregated metal fine particles (dispersed metal fine particles) without adding a dispersion solubilizer. The present invention relates to a fine metal particle dispersion solution stably dispersed in a solution to which a method and a dispersion solubilizer are not added.

 従来、金属微粒子または金属酸化物の微粒子等をはじめとする各種微粒子を製造する方法として、火炎法やプラズマ法等の気相法、ゾルゲル法等の液相法などが知られている。 Conventionally, as a method for producing various fine particles including metal fine particles or metal oxide fine particles, a gas phase method such as a flame method and a plasma method, a liquid phase method such as a sol-gel method, and the like are known.

 例えば、特許文献1には、気相法を用いた金属酸化物の製造方法として、気相プラズマを用いた金属酸化物のナノ粒子の製造方法が記載されている。しかし、気相法では、(1)設備が大がかりでコストが高くなる、(2)合成速度が遅く量産に不向きである、(3)気中で微粒子を扱うため飛散に配慮が必要である等の問題がある。 For example, Patent Document 1 describes a method for producing metal oxide nanoparticles using vapor phase plasma as a method for producing metal oxide using a vapor phase method. However, in the vapor phase method, (1) the equipment is large and the cost is high, (2) the synthesis speed is slow and unsuitable for mass production, (3) it is necessary to consider scattering because it handles fine particles in the air, etc. There is a problem.

 一方、特許文献2には、液相法を用いた金属微粒子の製造方法として、溶液中で金属ワイヤを気化させる金属ナノ粒子の製造方法が記載されている。しかし、液相法でも、(1)使用原料が限定される、(2)使用原料が一般的に高価である、(3)使用原料に毒性等があり取扱いに注意が必要な場合が多い、等の問題がある。 On the other hand, Patent Document 2 describes a method for producing metal nanoparticles in which a metal wire is vaporized in a solution as a method for producing metal fine particles using a liquid phase method. However, even in the liquid phase method, (1) the raw materials used are limited, (2) the raw materials used are generally expensive, (3) the raw materials used are toxic, etc., and handling is often necessary. There are problems such as.

 このように、気相法も液相法も、工業的に金属微粒子を製造するには問題点がある。 Thus, both the gas phase method and the liquid phase method have problems in industrially producing metal fine particles.

 そこで近年、金属微粒子を製造する方法として、液中放電によりプラズマを発生させ、その還元作用により金属微粒子を製造する方法が注目されている。このような液体中のプラズマは、主に溶液中で利用されるので「ソリューションプラズマ」と呼ばれる。 Therefore, in recent years, as a method for producing metal fine particles, a method for producing metal fine particles by generating plasma by submerged discharge and reducing the same has attracted attention. Such plasma in liquid is called “solution plasma” because it is mainly used in solution.

 ソリューションプラズマは、溶液中に対向配置された2つの放電電極間に電圧(高電場)を印加することにより、放電電極間に発生するプラズマである。発生したプラズマの周囲には気泡が発生し、その気泡がプラズマを取り囲んでおり、その気泡の周囲を溶液が取り囲んでいる。つまり、ソリューションプラズマには、プラズマ/気相,気相/液相という2つの界面が存在するという特徴がある。このように、ソリューションプラズマは、プラズマによる「高エネルギー状態」を溶液内に閉じ込めるという状態を実現している。これにより、プラズマの周囲の気相、液相またはその界面で様々な化学反応が促進される。 Solution plasma is plasma generated between discharge electrodes by applying a voltage (high electric field) between two discharge electrodes arranged opposite to each other in a solution. Bubbles are generated around the generated plasma, the bubbles surround the plasma, and the solution surrounds the bubbles. In other words, the solution plasma is characterized by two interfaces: plasma / gas phase and gas phase / liquid phase. As described above, the solution plasma realizes a state in which the “high energy state” due to the plasma is confined in the solution. As a result, various chemical reactions are promoted in the gas phase, the liquid phase or the interface around the plasma.

 例えば、特許文献3には、ソリューションプラズマを用いた金属ナノ粒子の製造方法が記載されている。具体的には、導電率を調整した金属塩水溶液中に設けられた1対の放電電極間に高電圧を印加してプラズマを発生させることによって、金属塩水溶液中に含まれる金属イオンを還元し、金属ナノ粒子が製造されている。 For example, Patent Document 3 describes a method for producing metal nanoparticles using solution plasma. Specifically, metal ions contained in the aqueous metal salt solution are reduced by applying a high voltage between a pair of discharge electrodes provided in the aqueous metal salt solution with adjusted conductivity to generate plasma. Metal nanoparticles have been manufactured.

 また、特許文献5には、水中に配置された消耗電極間に断続的に強いアーク放電(数十ボルト,数百アンペア)を起こして消耗電極を蒸発気化させることによって、金属微粒子を製造する方法が記載されている。また、特許文献6には、高圧水中において、アーク放電により、元素金属の電極と対極との間でプラズマ水中放電して生ずる金属イオン蒸気を水と接触させて粉末化させることにより、金属粉末を製造する方法が記載されている。 Patent Document 5 discloses a method for producing fine metal particles by causing a strong arc discharge (several tens of volts, several hundred amperes) intermittently between consumable electrodes arranged in water to evaporate the consumable electrodes. Is described. Further, Patent Document 6 discloses that metal powder is produced by bringing metal ion vapor generated by discharge in plasma water between an elemental metal electrode and a counter electrode into high pressure water by bringing it into contact with water and pulverizing. A method of manufacturing is described.

日本国公開特許公報「特開2006-55839号公報(2006年3月2日公開)」Japanese Patent Publication “JP 2006-55839 A (published March 2, 2006)” 日本国公表特許公報「特表2009-506205号公報(2009年2月12日公表)」Japanese Patent Gazette "Special Table 2009-506205 Gazette (published on February 12, 2009)" 日本国公開特許公報「特開2008-013810号公報(2008年1月24日公開)」Japanese Patent Publication “Japanese Unexamined Patent Application Publication No. 2008-013810 (published January 24, 2008)” 日本国公開特許公報「特開2010-9993号公報(2010年1月14日公開)」Japanese Patent Publication “Japanese Patent Laid-Open No. 2010-9993 (published on Jan. 14, 2010)” 日本国公開特許公報「特開平2-166202号公報(1990年6月26日公開)」Japanese Patent Publication “JP-A-2-166202 (published on June 26, 1990)” WO2003/37553(2003年5月8日公開)WO2003 / 37553 (released on May 8, 2003)

 しかしながら、特許文献3に記載の方法によって金属微粒子を製造するためには、分散溶解剤を除去するために、煩雑な処理が必要になるという問題がある。また、特許文献4,5に記載の方法は、金属微粒子の製造方法として適さない。 However, in order to produce metal fine particles by the method described in Patent Document 3, there is a problem that a complicated process is required to remove the dispersion-dissolving agent. Further, the methods described in Patent Documents 4 and 5 are not suitable as a method for producing metal fine particles.

 具体的には、金属微粒子の粒子径が小さくなると、金属微粒子が凝集しやすい。特に、粒子径が100nm以下のいわゆる金属ナノ粒子は、著しく凝集しやすい。このため、特許文献3に記載の方法では、形成された金属微粒子(金属ナノ粒子)が時間の経過と共に凝集するのを避けるために、金属塩水溶液へのゼラチン等の分散溶解剤の添加が必要不可欠である。 Specifically, when the particle diameter of the metal fine particles is small, the metal fine particles are likely to aggregate. In particular, so-called metal nanoparticles having a particle diameter of 100 nm or less are remarkably easily aggregated. For this reason, in the method described in Patent Document 3, it is necessary to add a dispersion solubilizing agent such as gelatin to the metal salt aqueous solution in order to prevent the formed fine metal particles (metal nanoparticles) from aggregating with time. It is essential.

 しかし、金属塩水溶液に分散溶解剤を添加した場合、金属塩水溶液中には、分散溶解剤が不純物として残存することになる。このため、最終的には分散溶解剤を除去するための処理が必要になるが、金属微粒子を凝集させずに分散溶解剤を除去することは困難である。さらに、分散溶解剤を添加した場合、分散溶解剤が金属微粒子に吸着してしまう。このため、金属微粒子に吸着した分散溶解剤を完全に除去することはできない。このように、分散溶解剤を添加した場合、金属微粒子の凝集を避けることはできるものの、分散溶解剤を除去するための煩雑な処理(工程)が必要になる。従って、特許文献3に記載の方法は、簡便な金属微粒子の製造方法であるとはいえない。 However, when a dispersion solubilizer is added to the metal salt aqueous solution, the dispersion solubilizer remains as an impurity in the metal salt aqueous solution. For this reason, a treatment for removing the dispersion-dissolving agent is finally required, but it is difficult to remove the dispersion-dissolving agent without agglomerating the metal fine particles. Further, when a dispersion solubilizer is added, the dispersion solubilizer is adsorbed on the metal fine particles. For this reason, the dispersion | dissolution solubilizer adsorbed | sucked to the metal microparticle cannot be removed completely. As described above, when the dispersion solubilizer is added, aggregation of the metal fine particles can be avoided, but a complicated process (step) for removing the dispersion solubilizer is required. Therefore, the method described in Patent Document 3 cannot be said to be a simple method for producing fine metal particles.

 また、特許文献5,6に記載の方法は、いずれもアーク放電によりプラズマを発生させることが前提となっている。しかし、アーク放電は、放電電極間に非常に大きな電流が流れるため、放電電極の消耗が著しく激しい。このため、長時間(数十分間)プラズマ状態を維持し、金属微粒子を安定して製造できるとは到底考えられない。従って、特許文献5,6に記載の方法は、金属微粒子の製造方法としては不適切である。 The methods described in Patent Documents 5 and 6 are all based on the premise that plasma is generated by arc discharge. However, in arc discharge, a very large current flows between the discharge electrodes, so that the discharge electrodes are significantly consumed. For this reason, it is unlikely that the plasma state can be maintained for a long time (several tens of minutes) and the metal fine particles can be stably produced. Therefore, the methods described in Patent Documents 5 and 6 are inappropriate as a method for producing metal fine particles.

 本発明は、上記従来の問題点に鑑みてなされたものであって、その目的は、ソリューションプラズマを用いた金属微粒子の製造方法において、分散溶解剤を添加せずに、凝集していない金属微粒子(金属微粒子分散溶液)を簡便に製造することのできる金属微粒子の製造方法を提供することにある。また、本発明の別の課題は、分散溶解剤が添加されていない溶液中に安定して分散した金属微粒子分散溶液を提供することにある。 The present invention has been made in view of the above-described conventional problems, and the object thereof is a metal fine particle that is not aggregated without adding a dispersion-dissolving agent in a method for producing metal fine particles using a solution plasma. An object of the present invention is to provide a method for producing metal fine particles, which can easily produce (metal fine particle dispersion). Another object of the present invention is to provide a metal fine particle dispersion solution that is stably dispersed in a solution to which a dispersion solubilizer is not added.

 本発明の金属微粒子の製造方法は、上記の課題を解決するために、溶液中に配置された同一材料からなる1対の放電電極間に、グロー放電によりプラズマを発生させて放電電極を融解し、放電電極を構成する金属からなる金属微粒子を形成する工程を有し、上記溶液中に、上記金属微粒子の凝集を抑制する分散溶解剤が添加されていないことを特徴としている。 In order to solve the above-described problems, the method for producing fine metal particles of the present invention melts a discharge electrode by generating plasma by glow discharge between a pair of discharge electrodes made of the same material arranged in a solution. And a step of forming metal fine particles made of a metal constituting the discharge electrode, wherein the dispersion solution for suppressing aggregation of the metal fine particles is not added to the solution.

 上記の発明によれば、溶液中に設けられた放電電極間に電圧を印加し放電させると、放電電極間にプラズマが発生する。その結果、プラズマにより放電電極が融解され、放電電極を構成する金属からなる金属微粒子が形成される。しかも、分散溶解剤が溶液中に添加されていないにも拘らず、金属微粒子の凝集が抑制される。このため、分散溶解剤が不純物として残存することはなく、分散溶解剤を除去するための煩雑な処理も必要ない。従って、分散溶解剤を添加せずに、凝集していない金属微粒子(溶液中に分散した金属微粒子,つまり金属微粒子分散溶液)を簡便に製造することができる。また、溶液中には分散溶解剤が不純物として残存しないため、溶液中に分散した金属微粒子をそのまま、金属微粒子分散溶液として利用することもできる。また、上記の発明によれば、グロー放電によってプラズマを発生させるため、放電電極間に流れる電流が、アーク放電の場合よりも、大幅に小さい。このため、放電電極が消耗しにくい。従って、長時間(数十分間)プラズマ状態を維持し、金属微粒子を安定して製造することができる。 According to the above invention, when a voltage is applied between the discharge electrodes provided in the solution to cause discharge, plasma is generated between the discharge electrodes. As a result, the discharge electrode is melted by the plasma, and metal fine particles made of metal constituting the discharge electrode are formed. In addition, the aggregation of the metal fine particles is suppressed despite the fact that no dispersing and dissolving agent is added to the solution. For this reason, a dispersion | distribution solubilizer does not remain as an impurity and the complicated process for removing a dispersion | distribution solubilizer is also unnecessary. Therefore, it is possible to easily produce non-aggregated metal fine particles (metal fine particles dispersed in a solution, that is, a metal fine particle dispersion solution) without adding a dispersion solubilizer. Further, since the dispersion solubilizer does not remain as an impurity in the solution, the metal fine particles dispersed in the solution can be directly used as the metal fine particle dispersion solution. Moreover, according to said invention, since plasma is generated by glow discharge, the current flowing between the discharge electrodes is significantly smaller than in the case of arc discharge. For this reason, the discharge electrode is not easily consumed. Accordingly, the plasma state can be maintained for a long time (several tens of minutes), and the metal fine particles can be stably produced.

 なお、本発明の金属微粒子の製造方法は、放電電極を融解することにより、放電電極を構成する金属からなる金属微粒子を形成する。つまり、金属微粒子の原料は、放電電極から供給される。このため、放電電極は、プラズマによって融解されやすい金属から構成される。これに対し、特許文献3に記載の方法は、金属塩水溶液中の金属イオンを還元することにより、金属塩を構成する金属微粒子を形成する。つまり、金属微粒子の原料は、金属塩水溶液から供給される。このため、放電電極は、プラズマによって融解されにくい金属から構成される。 In addition, the manufacturing method of the metal microparticle of this invention forms the metal microparticle which consists of the metal which comprises a discharge electrode by melting a discharge electrode. That is, the raw material for the metal fine particles is supplied from the discharge electrode. For this reason, the discharge electrode is made of a metal that is easily melted by plasma. On the other hand, the method described in Patent Document 3 forms metal fine particles constituting the metal salt by reducing metal ions in the metal salt aqueous solution. That is, the raw material for the metal fine particles is supplied from the metal salt aqueous solution. For this reason, the discharge electrode is made of a metal that is not easily melted by plasma.

 しかも、本発明の金属微粒子の製造方法では、分散溶解剤を添加せずに、金属微粒子の凝集が抑制されている。これに対し、特許文献3に記載の方法では、金属微粒子の凝集を抑制するために、分散溶解剤の添加が必須である。 Moreover, in the method for producing metal fine particles of the present invention, aggregation of the metal fine particles is suppressed without adding a dispersion solubilizer. On the other hand, in the method described in Patent Document 3, it is essential to add a dispersion solubilizer in order to suppress aggregation of metal fine particles.

 このように、本発明の金属微粒子の製造方法は、金属微粒子の原料の由来、放電電極を構成する金属、および、分散溶解剤を添加しなくても金属微粒子の凝集を抑制できる点が、特許文献3に記載の方法とは大きく異なる。 Thus, the method for producing metal fine particles of the present invention is patented in that the origin of the metal fine particles, the metal constituting the discharge electrode, and the aggregation of metal fine particles can be suppressed without the addition of a dispersing and dissolving agent. This is greatly different from the method described in Document 3.

 また、本発明の金属微粒子の製造方法では、放電電極が融解して金属微粒子が形成されており、溶液中で放電電極は気化しない。従って、溶液中で金属ワイヤが気化する特許文献2に記載の方法とも異なる。また、特許文献2に記載の方法は、ソリューションプラズマ法を用いる方法でもない。 In the method for producing metal fine particles of the present invention, the discharge electrode is melted to form metal fine particles, and the discharge electrode is not vaporized in the solution. Therefore, it is different from the method described in Patent Document 2 in which the metal wire is vaporized in the solution. Further, the method described in Patent Document 2 is not a method using the solution plasma method.

 さらに、グロー放電とアーク放電とでは、放電電極間に流れる電流だけでなく、電界強度(kV/m),温度(K),電子密度(m-3)もが大きく異なる。すなわち、グロー放電(低温プラズマ)の電界強度は、アーク放電(熱プラズマ)の電界強度よりも大きく、グロー放電の温度および電子密度は、アーク放電の温度および電子密度よりも低い(小さい)。このため、プラズマの化学的作用も異なる。従って、金属微粒子の粒子径、金属微粒子の分散性等も異なる。このように、本願発明のようにグロー放電により発生させたプラズマと、特許文献5,6のようにアーク放電により発生させたプラズマとでは、プラズマの状態が全く異なる。 Furthermore, not only the current flowing between the discharge electrodes but also the electric field strength (kV / m), temperature (K), and electron density (m −3 ) differ greatly between glow discharge and arc discharge. That is, the electric field strength of glow discharge (low temperature plasma) is larger than the electric field strength of arc discharge (thermal plasma), and the temperature and electron density of glow discharge are lower (smaller) than the temperature and electron density of arc discharge. For this reason, the chemical action of the plasma is also different. Accordingly, the particle diameter of the metal fine particles, the dispersibility of the metal fine particles, and the like are also different. Thus, the plasma state is completely different between the plasma generated by glow discharge as in the present invention and the plasma generated by arc discharge as in Patent Documents 5 and 6.

 本発明の金属微粒子分散溶液は、上記の課題を解決するために、グロー放電によりプラズマを発生させた溶液中に、金属微粒子が分散しており、上記溶液中に、上記金属微粒子の凝集を抑制する分散溶解剤が添加されていないことを特徴としている。 In order to solve the above problems, the metal fine particle dispersion solution of the present invention has metal fine particles dispersed in a solution in which plasma is generated by glow discharge, and suppresses aggregation of the metal fine particles in the solution. It is characterized in that no dispersing solubilizer is added.

 上記の発明によれば、グロー放電によりプラズマを発生させた溶液中に、金属微粒子が分散しているため、分散溶解剤が溶液中に添加されていないにも拘らず、金属微粒子の凝集が抑制される。従って、分散溶解剤が添加されていない溶液中に安定して分散した金属微粒子分散溶液を提供することができる。 According to the above invention, since the metal fine particles are dispersed in the solution in which the plasma is generated by glow discharge, the aggregation of the metal fine particles is suppressed even though the dispersion solution is not added to the solution. Is done. Accordingly, it is possible to provide a metal fine particle dispersion solution that is stably dispersed in a solution to which a dispersion solubilizer is not added.

 本発明の金属微粒子の製造方法は、以上のように、溶液中に配置された同一材料からなる1対の放電電極間にプラズマを発生させて放電電極を融解し、放電電極を構成する金属からなる金属微粒子を形成する工程を有し、上記溶液中に、上記金属微粒子の凝集を抑制する分散溶解剤が添加されていない方法である。それゆえ、ソリューションプラズマを用いた金属微粒子の製造方法において、分散溶解剤を添加せずに、凝集していない金属微粒子(溶液中に分散した金属微粒子,つまり金属微粒子分散溶液)を簡便に製造することができるという効果を奏する。 As described above, the method for producing fine metal particles of the present invention uses the metal constituting the discharge electrode by generating plasma between a pair of discharge electrodes made of the same material arranged in a solution to melt the discharge electrode. And forming a fine metal particle, and the dispersion solution for suppressing the aggregation of the fine metal particle is not added to the solution. Therefore, in a method for producing metal fine particles using solution plasma, metal particles that are not aggregated (metal fine particles dispersed in a solution, that is, a metal fine particle dispersion solution) are simply produced without adding a dispersion solubilizer. There is an effect that can be.

 本発明の金属微粒子分散溶液は、以上のように、グロー放電によりプラズマを発生させた溶液中に、金属微粒子が分散しており、上記溶液中に、上記金属微粒子の凝集を抑制する分散溶解剤が添加されていない構成である。それゆえ、分散溶解剤が添加されていない溶液中に安定して分散した金属微粒子分散溶液を提供することができるという効果を奏する。 As described above, the metal fine particle dispersion solution of the present invention is a dispersion solution in which metal fine particles are dispersed in a solution in which plasma is generated by glow discharge, and the aggregation of the metal fine particles is suppressed in the solution. Is a structure in which is not added. Therefore, there is an effect that it is possible to provide a metal fine particle dispersion solution that is stably dispersed in a solution to which a dispersion solubilizer is not added.

 本発明のさらに他の目的、特徴、および優れた点は、以下に示す記載によって充分分かるであろう。また、本発明の利点は、添付図面を参照した次の説明で明白になるであろう。 Further objects, features, and superior points of the present invention will be fully understood from the following description. The advantages of the present invention will become apparent from the following description with reference to the accompanying drawings.

本発明の金属微粒子の製造方法に用いられるソリューションプラズマ放電装置を示す概略図である。It is the schematic which shows the solution plasma discharge apparatus used for the manufacturing method of the metal microparticles of this invention. 実施例1で製造された金ナノ粒子分散液の1ヶ月経過後の状態を示す図である。It is a figure which shows the state after one month progress of the gold nanoparticle dispersion liquid manufactured in Example 1. FIG. 実施例1で製造された金ナノ粒子を原子間力顕微鏡によって観察した結果を示す図である。It is a figure which shows the result of having observed the gold nanoparticle manufactured in Example 1 with the atomic force microscope. 実施例2で製造された白金ナノ粒子分散液の1ヶ月経過後の状態を示す図である。It is a figure which shows the state after one month progress of the platinum nanoparticle dispersion liquid manufactured in Example 2. FIG. 実施例3で製造された金ナノ粒子分散液の1ヶ月経過後の状態を示す図である。It is a figure which shows the state after one month progress of the gold nanoparticle dispersion liquid manufactured in Example 3. FIG. 実施例4で製造された金ナノ粒子分散液の1ヶ月経過後の状態を示す図であり、(a)は7.0w/w%の過酸化水素水溶液を用いた金ナノ粒子分散液を示し、(b)は17.5w/w%の過酸化水素水溶液を用いた金ナノ粒子分散液を示す。It is a figure which shows the state after one month progress of the gold nanoparticle dispersion liquid manufactured in Example 4, (a) shows the gold nanoparticle dispersion liquid using 7.0 w / w% hydrogen peroxide aqueous solution. (B) shows a gold nanoparticle dispersion using a 17.5 w / w% aqueous hydrogen peroxide solution. 実施例4において、17.5w/w%の過酸化水素水溶液を用いて製造された金ナノ粒子のTEM画像を示す図である。In Example 4, it is a figure which shows the TEM image of the gold nanoparticle manufactured using 17.5 w / w% hydrogen peroxide aqueous solution. 実施例4において、17.5w/w%の過酸化水素水溶液を用いて製造された金ナノ粒子のEDSによる元素分析結果を示す図である。In Example 4, it is a figure which shows the elemental-analysis result by EDS of the gold nanoparticle manufactured using 17.5 w / w% hydrogen peroxide aqueous solution. 実施例5で製造された白金ナノ粒子分散液の1ヶ月経過後の状態を示す図であり、(a)は7.0w/w%の過酸化水素水溶液を用いた白金ナノ粒子分散液を示し、(b)は17.5w/w%の過酸化水素水溶液を用いた白金ナノ粒子分散液を示す。It is a figure which shows the state after one month progress of the platinum nanoparticle dispersion liquid manufactured in Example 5, (a) shows the platinum nanoparticle dispersion liquid using 7.0 w / w% hydrogen peroxide aqueous solution. (B) shows a platinum nanoparticle dispersion using a 17.5 w / w% aqueous hydrogen peroxide solution. 実施例5において、7.0w/w%の過酸化水素水溶液を用いて製造された白金ナノ粒子のTEM画像を示す図である。In Example 5, it is a figure which shows the TEM image of the platinum nanoparticle manufactured using 7.0 w / w% hydrogen peroxide aqueous solution. 実施例5において、7.0w/w%の過酸化水素水溶液を用いて製造された白金ナノ粒子のEDSによる元素分析結果を示す図である。In Example 5, it is a figure which shows the elemental-analysis result by EDS of the platinum nanoparticle manufactured using 7.0 w / w% hydrogen peroxide aqueous solution. 実施例6で製造された銀ナノ粒子分散液の1ヶ月経過後の状態を示す図であり、(a)は0.44w/w%の過酸化水素水溶液を用いた銀ナノ粒子分散液を示し、(b)は0.88w/w%の過酸化水素水溶液を用いた銀ナノ粒子分散液を示し、(c)は1.75w/w%の過酸化水素水溶液を用いた銀ナノ粒子分散液を示す。It is a figure which shows the state after one month progress of the silver nanoparticle dispersion liquid manufactured in Example 6, (a) shows the silver nanoparticle dispersion liquid using 0.44 w / w% hydrogen peroxide aqueous solution. , (B) shows a silver nanoparticle dispersion using a 0.88 w / w% aqueous hydrogen peroxide solution, and (c) shows a silver nanoparticle dispersion using a 1.75 w / w% aqueous hydrogen peroxide solution. Indicates. 実施例6において、0.88w/w%の過酸化水素水溶液を用いて製造された銀ナノ粒子のTEM画像を示す図である。In Example 6, it is a figure which shows the TEM image of the silver nanoparticle manufactured using 0.88 w / w% hydrogen peroxide aqueous solution. 実施例6において、0.88w/w%の過酸化水素水溶液を用いて製造された銀ナノ粒子のEDSによる元素分析結果を示す図である。In Example 6, it is a figure which shows the elemental-analysis result by EDS of the silver nanoparticle manufactured using 0.88 w / w% hydrogen peroxide aqueous solution. 実施例7で製造された金ナノ粒子分散液の1ヶ月経過後の状態を示す図であり、(a)は0.1mMの水酸化ナトリウム水溶液を用いた金ナノ粒子分散液を示し、(b)は0.5mMの水酸化ナトリウム水溶液を用いた金ナノ粒子分散液を示し、(c)は3.0mMの水酸化ナトリウム水溶液を用いた金ナノ粒子分散液を示す。It is a figure which shows the state after one month progress of the gold nanoparticle dispersion liquid manufactured in Example 7, (a) shows the gold nanoparticle dispersion liquid using 0.1 mM sodium hydroxide aqueous solution, (b ) Shows a gold nanoparticle dispersion using a 0.5 mM sodium hydroxide aqueous solution, and (c) shows a gold nanoparticle dispersion using a 3.0 mM sodium hydroxide aqueous solution. 実施例8で製造された金ナノ粒子分散液の1ヶ月経過後の状態を示す図である。It is a figure which shows the state after one month progress of the gold nanoparticle dispersion liquid manufactured in Example 8. FIG.

 以下、本発明の一実施形態について、図1~図16に基づいて説明する。ただし、本発明の範囲は以下の説明に拘束されることはなく、以下の例示以外についても、本発明の趣旨を損なわない範囲で適宜変更して実施し得るものである。つまり、本発明は、以下の実施形態に限定されるものではなく、請求項に示した範囲で種々の変更が可能である。すなわち、請求項に示した範囲で適宜変更した技術的手段を組み合わせて得られる実施形態についても本発明の技術的範囲に含まれる。 Hereinafter, an embodiment of the present invention will be described with reference to FIGS. However, the scope of the present invention is not limited to the following description, and other than the following examples, the scope of the present invention can be appropriately modified and implemented without departing from the spirit of the present invention. That is, the present invention is not limited to the following embodiments, and various modifications can be made within the scope of the claims. That is, embodiments obtained by combining technical means appropriately changed within the scope of the claims are also included in the technical scope of the present invention.

 <本発明の金属微粒子の製造方法>
 本発明の金属微粒子の製造方法は、ソリューションプラズマを用いた金属微粒子の製造方法において、溶液中に配置された1対の放電電極間に、グロー放電によりプラズマを発生させて放電電極を融解し、放電電極を構成する金属からなる金属微粒子を形成する工程を含む方法である。ただし、上記溶液中には、金属微粒子の凝集を抑制する分散溶解剤が添加されていない。
<The manufacturing method of the metal microparticle of this invention>
The metal fine particle production method of the present invention is a metal fine particle production method using solution plasma, wherein plasma is generated by glow discharge between a pair of discharge electrodes arranged in a solution to melt the discharge electrode, It is a method including a step of forming metal fine particles made of a metal constituting the discharge electrode. However, the dispersion solution which suppresses aggregation of metal fine particles is not added to the solution.

 本発明の金属微粒子の製造方法において、溶液中でグロー放電を行うと、プラズマが発生し、プラズマにより放電電極が融解する。その結果、溶液中にコロイド状の金属微粒子が形成される。この金属微粒子は、沈殿、濾過、乾燥などの工程を経て取り出す(単離する)ことができる。なお、本発明の金属微粒子の製造方法において、得られた金属微粒子の結晶や粒径を調整するため、さらに熱処理を加えてもよい。 In the method for producing fine metal particles of the present invention, when glow discharge is performed in a solution, plasma is generated and the discharge electrode is melted by the plasma. As a result, colloidal metal fine particles are formed in the solution. The metal fine particles can be taken out (isolated) through steps such as precipitation, filtration, and drying. In addition, in the manufacturing method of the metal fine particle of this invention, in order to adjust the crystal | crystallization and particle size of the obtained metal fine particle, you may add heat processing.

 <本発明に用いられるソリューションプラズマ放電装置>
 本発明の金属微粒子の製造方法は、例えば、図1に示すようなソリューションプラズマ放電装置10を用いて行うことができる。図1は、本発明の金属微粒子の製造方法に用いられるソリューションプラズマ放電装置を示す概略図である。図1に示すように、ソリューションプラズマ放電装置10は、容器6内の溶液5中に設けられた1対の放電電極1と、放電電極1を被覆するセラミックチューブ2と、放電電極1に電圧を印加するプラズマ発生電源3と、プラズマ発生電源3に接続されたアース4とを備えている。
<Solution Plasma Discharge Device Used in the Present Invention>
The metal fine particle production method of the present invention can be performed using, for example, a solution plasma discharge apparatus 10 as shown in FIG. FIG. 1 is a schematic view showing a solution plasma discharge apparatus used in the method for producing fine metal particles of the present invention. As shown in FIG. 1, a solution plasma discharge apparatus 10 is configured to apply a voltage to a pair of discharge electrodes 1 provided in a solution 5 in a container 6, a ceramic tube 2 that covers the discharge electrodes 1, and the discharge electrodes 1. A plasma generating power source 3 to be applied and a ground 4 connected to the plasma generating power source 3 are provided.

 放電電極1は、いずれも、目的とする金属微粒子を構成する金属から構成されている。つまり、1対の放電電極1・1は、同一材料から構成されている。各放電電極1は、溶液5中に露出する部分を有するように、セラミックチューブ2で覆われている。セラミックチューブ2は、放電電極1を固定する役割を果たすが、セラミックチューブ2は用いなくてもよい。また、セラミックチューブ2の代わりに、プラズマにより発熱した気泡の温度に耐えられる材料(例えば、シリコンゴムチューブ等)を使用することもできる。なお、セラミックの耐熱温度は、含有成分によって異なるが、約1500~1900℃である。また、代表的なシリコンゴムの耐熱温度は、約200℃である。放電電極1・1の、電極間距離,大きさなどは、特に限定されるものではない。放電電極1の詳細は後述する。 The discharge electrodes 1 are each made of a metal that constitutes the target metal fine particles. That is, the pair of discharge electrodes 1 and 1 are made of the same material. Each discharge electrode 1 is covered with a ceramic tube 2 so as to have a portion exposed in the solution 5. The ceramic tube 2 plays a role of fixing the discharge electrode 1, but the ceramic tube 2 may not be used. Instead of the ceramic tube 2, a material that can withstand the temperature of bubbles generated by plasma (for example, a silicone rubber tube) can be used. The heat-resistant temperature of the ceramic is about 1500 to 1900 ° C., although it varies depending on the contained components. Moreover, the heat-resistant temperature of typical silicon rubber is about 200 degreeC. The distance between electrodes, size, etc. of the discharge electrodes 1 and 1 are not particularly limited. Details of the discharge electrode 1 will be described later.

 プラズマ発生電源3は、放電電極1に、グロー放電を起こすための電圧を供給する。これにより、放電電極1・1間の領域Aには、グロー放電によりプラズマが発生する。なお、プラズマ発生電源3の条件は、グロー放電によりプラズマが発生する条件であれば、特に限定されるものではない。すなわち、プラズマ発生電源3の電圧値、パルス幅,パルス周波数,パルス波形などは、グロー放電を起こすことができれば特に限定されるものではない。 The plasma generating power source 3 supplies the discharge electrode 1 with a voltage for causing glow discharge. As a result, plasma is generated in the region A between the discharge electrodes 1 and 1 by glow discharge. The conditions of the plasma generation power source 3 are not particularly limited as long as plasma is generated by glow discharge. That is, the voltage value, pulse width, pulse frequency, pulse waveform, etc. of the plasma generation power source 3 are not particularly limited as long as glow discharge can be caused.

 溶液5は、グロー放電によりプラズマを発生させることができれば、特に限定されるものではない。溶液5には、溶液5の導電性を調整するための電解質等を含んでいてもよい。つまり、溶液5は、単独の溶液であっても、複数の溶液の混合溶液であっても、電解質等の各種添加剤が添加されていてもよい。ただし、上述のように、溶液5中には、金属微粒子の凝集を抑制する分散溶解剤は添加されない。溶液5の詳細は後述する。 Solution 5 is not particularly limited as long as plasma can be generated by glow discharge. The solution 5 may contain an electrolyte or the like for adjusting the conductivity of the solution 5. That is, the solution 5 may be a single solution, a mixed solution of a plurality of solutions, or various additives such as an electrolyte may be added. However, as described above, a dispersion solubilizer that suppresses aggregation of metal fine particles is not added to the solution 5. Details of the solution 5 will be described later.

 ソリューションプラズマ放電装置10は、プラズマ発生電源3から放電電極1間に電圧(好ましくは800V以上)が印加されると、グロー放電により放電電極1・1間の領域Aにプラズマが発生する。さらに、このグロー放電の際、放電電極1・1間に流れる電流により、溶液5が加熱される。これにより、溶液5中、特にプラズマの周囲には、気泡が発生する。電圧印加中に発生した気泡は、プラズマを取り囲み、プラズマ状態が気泡内部で安定化して維持される。プラズマ発生領域である領域Aには、プラズマと、プラズマを内包する気相とからなっている。このように、プラズマ(プラズマ相)の周囲を気相が取り囲み、さらにその気相の周囲を液相が取り囲んでいる。そして、このようなプラズマ状態が放電電極1の融解を促進し、溶液5中に金属微粒子が形成される。 The solution plasma discharge device 10 generates plasma in the region A between the discharge electrodes 1 and 1 by glow discharge when a voltage (preferably 800 V or more) is applied between the plasma generation power source 3 and the discharge electrode 1. Further, during the glow discharge, the solution 5 is heated by the current flowing between the discharge electrodes 1 and 1. As a result, bubbles are generated in the solution 5, particularly around the plasma. Bubbles generated during voltage application surround the plasma, and the plasma state is stabilized and maintained inside the bubbles. The region A, which is a plasma generation region, includes plasma and a gas phase that contains the plasma. Thus, the gas phase surrounds the plasma (plasma phase), and the liquid phase surrounds the gas phase. Such a plasma state promotes melting of the discharge electrode 1, and metal fine particles are formed in the solution 5.

 なお、容器6内に複数対の放電電極1を設ければ、金属微粒子の合成速度を上げることが可能である。また、金属微粒子を長時間にわたって安定して製造するためには、溶液5の温度や濃度を調整するための装置を付加しておくことが望ましい。また、本発明の金属微粒子の製造方法には、ソリューションプラズマ放電装置10に限らず、公知のソリューションプラズマ放電装置を用いることができる。例えば、本願発明者等によって開示された、特許文献4に記載のソリューションプラズマ放電装置を適用することもできる。 It should be noted that if a plurality of pairs of discharge electrodes 1 are provided in the container 6, the synthesis rate of the metal fine particles can be increased. Further, in order to stably produce the metal fine particles over a long period of time, it is desirable to add a device for adjusting the temperature and concentration of the solution 5. In addition, the method for producing fine metal particles of the present invention is not limited to the solution plasma discharge device 10, and a known solution plasma discharge device can be used. For example, the solution plasma discharge device described in Patent Document 4 disclosed by the present inventors can be applied.

 <放電電極1>
 放電電極1は、グロー放電によって生じたプラズマによって融解する電極材料(導電性材料)であって、目的とする金属微粒子を構成する金属から構成されていれば特に限定されるものではない。例えば、放電電極1を構成する金属としては、Au(金),Pt(白金),Ag(銀),パラジウム(Pd),ロジウム(Rh),イリジウム(Ir),ルテニウム(Ru),オスミウム(Os),Mo(モリブデン)Cu(銅),Zn(亜鉛)などが挙げられる。これにより、放電電極1を構成する金属材料に応じた、単体の金属微粒子を製造することができる。また、金、白金、および銀は、特にプラズマによって融解しやすい。このため、放電電極1は、金、白金、または銀から構成されていることが好ましい。これにより、金微粒子、白金微粒子、銀微粒子を効率よく製造することができる。
<Discharge electrode 1>
The discharge electrode 1 is an electrode material (conductive material) that melts by plasma generated by glow discharge, and is not particularly limited as long as it is made of a metal that forms the target metal fine particles. For example, as the metal constituting the discharge electrode 1, Au (gold), Pt (platinum), Ag (silver), palladium (Pd), rhodium (Rh), iridium (Ir), ruthenium (Ru), osmium (Os) ), Mo (molybdenum) Cu (copper), Zn (zinc), and the like. Thereby, the single metal microparticle according to the metal material which comprises the discharge electrode 1 can be manufactured. Gold, platinum, and silver are particularly easily melted by plasma. For this reason, it is preferable that the discharge electrode 1 is comprised from gold | metal | money, platinum, or silver. Thereby, gold fine particles, platinum fine particles, and silver fine particles can be efficiently produced.

 <溶液5>
 溶液5は、グロー放電によりプラズマを発生させることができる溶液であれば特に限定されるものではない。ただし、従来のソリューションプラズマを用いた金属微粒子の製造方法(特許文献3参照)において、金属微粒子の凝集を抑制するために必須であった分散溶解剤が、溶液5中に添加されていない。
<Solution 5>
The solution 5 is not particularly limited as long as the solution 5 can generate plasma by glow discharge. However, in the conventional method for producing metal fine particles using solution plasma (see Patent Document 3), the dispersion / dissolving agent that is essential for suppressing aggregation of metal fine particles is not added to the solution 5.

 本発明の金属微粒子の製造方法では、溶液5中に設けられた放電電極1・1間に電圧を印加し放電させると、放電電極1・1間の領域Aにプラズマが発生する。その結果、プラズマによって放電電極1が融解され、放電電極1を構成する金属からなる金属微粒子が形成される。しかも、分散溶解剤が溶液5に添加されていないも拘らず、金属微粒子の凝集が抑制される。このため、溶液5中に分散溶解剤が不純物として残存することはなく、分散溶解剤を除去するための煩雑な処理も必要ない。従って、分散溶解剤を添加せずに、凝集していない金属微粒子(溶液5中に分散した金属微粒子,つまり金属微粒子分散溶液)を簡便に製造することができる。また、溶液5中には分散溶解剤が不純物として残存しないため、溶液5中に分散した金属微粒子をそのまま、金属微粒子分散溶液として利用することもできる。さらに、本発明の金属微粒子の製造方法では、グロー放電によってプラズマを発生させるため、放電電極1・1間に流れる電流が、アーク放電の場合よりも、大幅に小さい。このため、放電電極1が消耗しにくい。従って、長時間(数十分間)プラズマ状態を維持し、金属微粒子を安定して製造することができる。 In the method for producing fine metal particles of the present invention, when a voltage is applied between the discharge electrodes 1 and 1 provided in the solution 5 to cause discharge, plasma is generated in the region A between the discharge electrodes 1 and 1. As a result, the discharge electrode 1 is melted by the plasma, and metal fine particles made of the metal constituting the discharge electrode 1 are formed. In addition, the aggregation of the metal fine particles is suppressed even though the dispersing and dissolving agent is not added to the solution 5. For this reason, a dispersion | dissolution solubilizer does not remain as an impurity in the solution 5, and the complicated process for removing a dispersion | distribution solubilizer is also unnecessary. Accordingly, it is possible to easily produce non-aggregated metal fine particles (metal fine particles dispersed in the solution 5, that is, metal fine particle dispersion solution) without adding a dispersion solubilizer. Further, since the dispersion solubilizer does not remain as an impurity in the solution 5, the metal fine particles dispersed in the solution 5 can be directly used as a metal fine particle dispersion solution. Furthermore, in the method for producing fine metal particles of the present invention, plasma is generated by glow discharge, so that the current flowing between the discharge electrodes 1 and 1 is significantly smaller than in the case of arc discharge. For this reason, the discharge electrode 1 is hardly consumed. Accordingly, the plasma state can be maintained for a long time (several tens of minutes), and the metal fine particles can be stably produced.

 なお、本発明によって製造された金属微粒子が凝集しない理由としては、溶液中に分散している金属微粒子または金属コロイドが、プラスまたはマイナスに帯電しており、その周囲を、逆の電荷を持つ粒子(例えば、陽イオン、陰イオン、ラジカル、溶媒和電子、水酸化物イオンなど)が取り巻いて熱運動(ブラウン運動)しているためであると考えられる。 The reason why the metal fine particles produced according to the present invention do not aggregate is that the metal fine particles or metal colloids dispersed in the solution are positively or negatively charged, and the surrounding particles are oppositely charged. It is considered that this is because (for example, cations, anions, radicals, solvated electrons, hydroxide ions, etc.) surround and are in thermal motion (Brownian motion).

 ところで、本発明の金属微粒子の製造方法によって製造される金属微粒子は、金属微粒子の表面修飾が施されることによって、様々な機能が金属微粒子に付与される。例えば、金属微粒子の表面に特定の官能基または分子等を導入することによって、機能性金属微粒子として利用される。 By the way, the metal fine particles produced by the method for producing metal fine particles of the present invention are given various functions to the metal fine particles by subjecting the metal fine particles to surface modification. For example, it is used as functional metal fine particles by introducing a specific functional group or molecule into the surface of the metal fine particles.

 このため、溶液5は、金属微粒子の表面修飾を妨害する特定の成分を含有しないことが好ましい。例えば、溶液5は、フッ素、塩素、臭素、ヨウ素、および硫黄の原子、分子、およびイオンを含有しないことが好ましい。この場合、形成された金属微粒子の表面に化学吸着または物理吸着しやすいハロゲンおよび硫黄の各原子、各分子、または各イオンが、溶液中に存在しない。つまり、金属微粒子の表面修飾(表面処理)を妨害する成分が、溶液中に存在しない。これにより、金属微粒子の表面修飾が容易になる。従って、汎用性の高い金属微粒子を製造することができる。 For this reason, it is preferable that the solution 5 does not contain a specific component that interferes with the surface modification of the metal fine particles. For example, the solution 5 preferably does not contain fluorine, chlorine, bromine, iodine, and sulfur atoms, molecules, and ions. In this case, halogen and sulfur atoms, molecules, or ions that are easily chemisorbed or physically adsorbed on the surface of the formed fine metal particles do not exist in the solution. That is, there is no component in the solution that interferes with the surface modification (surface treatment) of the metal fine particles. This facilitates surface modification of the metal fine particles. Therefore, highly versatile metal fine particles can be produced.

 より具体的には、溶液5としては、過酸化物溶液を例示することができる。ここで、「過酸化物溶液」とは、過酸化物が溶媒中に溶解または分散した液体を示す。「過酸化物」は、例えば、ペルオキシド構造(-O-O-)、ヒドロペルオキシド構造(-O-O-H)、または過カルボン酸構造(-C(=O)-O-O-)を分子内に有する有機化合物、または、過酸化物イオン(O 2-)またはヒドロペルオキシド構造(-O-O-H)を分子内に有する無機化合物である。「過酸化物」は、過酸の塩または誘導体とも言い換えられる。また、「過酸化物」は、イオン性過酸化物であることが好ましい。「イオン性過酸化物」は、水や酸などによって、過酸化水素に分解される過酸化物を示す。 More specifically, the solution 5 can be exemplified by a peroxide solution. Here, the “peroxide solution” refers to a liquid in which a peroxide is dissolved or dispersed in a solvent. “Peroxide” means, for example, a peroxide structure (—O—O—), a hydroperoxide structure (—O—O—H), or a percarboxylic acid structure (—C (═O) —O—O—). It is an organic compound having in the molecule, or an inorganic compound having a peroxide ion (O 2 2− ) or a hydroperoxide structure (—O—O—H) in the molecule. “Peroxide” is also referred to as a salt or derivative of a peracid. The “peroxide” is preferably an ionic peroxide. “Ionic peroxide” refers to a peroxide that is decomposed into hydrogen peroxide by water or acid.

 なお、「過酸化物」の範疇には、過酸化水素(H-O-O-H)も含むものとする。つまり、「過酸化物溶液」とは、過酸化物または過酸化水素が溶媒中に溶解または分散した液体を示す。 Note that hydrogen peroxide (H—O—O—H) is included in the category of “peroxide”. That is, the “peroxide solution” refers to a liquid in which peroxide or hydrogen peroxide is dissolved or dispersed in a solvent.

 過酸化物を分散または溶解させる溶媒は、水が一般的であるが、過酸化物を分散または溶解させることができれば有機溶媒や無機酸等を使用することも可能である。 The solvent for dispersing or dissolving the peroxide is generally water, but an organic solvent, an inorganic acid, or the like can also be used as long as the peroxide can be dispersed or dissolved.

 このような過酸化物溶液は、金属微粒子の表面に吸着し、金属微粒子の表面修飾を妨害する成分(ハロゲン、硫黄など)などの不純物を含有しない。つまり、金属微粒子の表面に吸着したとしても、金属微粒子の表面修飾は妨害されにくい。これにより、金属微粒子の表面修飾が容易になる。従って、汎用性の高い金属微粒子を製造することができる。特に、過酸化水素水溶液は、水素および酸素から構成される単純な分子である。従って、表面修飾を容易に行うことのできる汎用性の高い金属微粒子を製造することができる。さらに、過酸化水素が分解されたとしても、発生するのは水と酸素のみであるため、安全性も高い。 Such a peroxide solution does not contain impurities such as components (halogen, sulfur, etc.) that adsorb on the surface of the metal fine particles and interfere with the surface modification of the metal fine particles. That is, even if it is adsorbed on the surface of the metal fine particles, the surface modification of the metal fine particles is not easily disturbed. This facilitates surface modification of the metal fine particles. Therefore, highly versatile metal fine particles can be produced. In particular, an aqueous hydrogen peroxide solution is a simple molecule composed of hydrogen and oxygen. Therefore, highly versatile metal fine particles that can be easily surface-modified can be produced. Furthermore, even when hydrogen peroxide is decomposed, only water and oxygen are generated, so that safety is high.

 溶液5が過酸化物溶液である場合、溶液5中における過酸化物の含有量(過酸化物溶液の濃度)は、特に限定されるものではない。しかし、一般的に濃度が高いほど合成速度や効率が上昇するので、溶液5の濃度(過酸化物の濃度)は飽和濃度に達しない範囲で高い方が望ましい。ただし、濃度が高すぎると不安定になり、凝集を生じる場合もあるので、溶液5中の過酸化物の含有量は0.01w/w%以上、35.5w/w%以下の範囲内であることが好ましい。これにより、過酸化物溶液中に凝集を生じることなく金属微粒子を製造することができる。 When the solution 5 is a peroxide solution, the peroxide content (peroxide solution concentration) in the solution 5 is not particularly limited. However, since the synthesis rate and efficiency generally increase as the concentration increases, it is desirable that the concentration of the solution 5 (peroxide concentration) be as high as possible without reaching the saturation concentration. However, if the concentration is too high, it may become unstable and may cause agglomeration, so the content of peroxide in the solution 5 is within the range of 0.01 w / w% or more and 35.5 w / w% or less. Preferably there is. Thereby, metal microparticles can be produced without causing aggregation in the peroxide solution.

 また、溶液5としては、アルカリ溶液を用いることもできる。「アルカリ溶液」とは、アルカリ性を示すイオン溶液を示し、例えば、アルカリ金属の水酸化物またはアルカリ土類金属の水酸化物が溶媒に分散または溶解させた溶液(水酸化ナトリウム溶液,水酸化カリウム溶液,水酸化バリウム溶液,水酸化カルシウム溶液など)、または、炭酸ナトリウム水溶液などである。アルカリ溶液の濃度は、金属微粒子が凝集しない程度の低濃度であればよい。例えば、アルカリ溶液は、0.01mM以上、50mM以下の水溶液であることが好ましい。また、アルカリ溶液は、低濃度の水酸化ナトリウム水溶液であることが好ましい。このような低濃度のアルカリ溶液は、形成された金属微粒子に静電遮蔽を起こさないため、金属微粒子が凝集しない。さらに、金属微粒子の表面に吸着し、金属微粒子の表面修飾を妨害する成分(ハロゲン、硫黄)も、溶液5中に存在しない。これにより、金属微粒子の表面修飾が容易になる。従って、汎用性の高い金属微粒子を製造することができる。 Further, as the solution 5, an alkaline solution can also be used. “Alkaline solution” refers to an ionic solution exhibiting alkalinity, such as a solution in which an alkali metal hydroxide or an alkaline earth metal hydroxide is dispersed or dissolved in a solvent (sodium hydroxide solution, potassium hydroxide). Solution, barium hydroxide solution, calcium hydroxide solution, etc.) or sodium carbonate aqueous solution. The concentration of the alkaline solution may be as low as the metal fine particles do not aggregate. For example, the alkaline solution is preferably an aqueous solution of 0.01 mM or more and 50 mM or less. The alkaline solution is preferably a low concentration sodium hydroxide aqueous solution. Such a low-concentration alkaline solution does not cause electrostatic shielding to the formed metal fine particles, so that the metal fine particles do not aggregate. Further, components (halogen, sulfur) that adsorb on the surface of the metal fine particles and interfere with the surface modification of the metal fine particles are not present in the solution 5. This facilitates surface modification of the metal fine particles. Therefore, highly versatile metal fine particles can be produced.

 なお、溶液5には、過酸化物溶液以外に、例えば、溶液5の導電性を調整するための電解質等の各種添加剤を含んでいてもよい。しかし、溶液5が添加剤を含有していると、最終的に溶液5から添加剤を除去する処理(工程)が必要になったり、添加剤の成分が金属微粒子の表面に化学吸着または物理吸着したりする可能性がある。また、金属微粒子(特に金属ナノ粒子)としての特性が著しく損なわれる可能性もある。このため、簡便に金属微粒子を得るためには、溶液5への添加剤の添加は極力避けることが好ましい。 The solution 5 may contain various additives such as an electrolyte for adjusting the conductivity of the solution 5 in addition to the peroxide solution. However, when the solution 5 contains an additive, a process (step) for finally removing the additive from the solution 5 becomes necessary, or the additive component is chemically or physically adsorbed on the surface of the metal fine particles. There is a possibility of doing. In addition, the properties as metal fine particles (particularly metal nanoparticles) may be significantly impaired. For this reason, in order to obtain metal fine particles easily, it is preferable to avoid the addition of the additive to the solution 5 as much as possible.

 以上のように、溶液5は、グロー放電によりプラズマを発生させることができる溶液であればよいが、金属微粒子の表面修飾を妨害する特定成分を含有しないことが好ましい。言い換えれば、金属微粒子の表面修飾を妨害しない原子(例えば、C,H,O,および金属から選択される原子)のみで構成された単純な分子の水溶液であることが好ましい。具体的には、溶液5は、過酸化水素水溶液,炭酸ナトリウム水溶液,水酸化ナトリウム水溶液,水酸化カリウム水溶液,水酸化バリウム水溶液,水酸化カルシウム水溶液などであることが好ましい。さらに、溶液5は、過酸化物溶液または低濃度のアルカリ溶液であることがより好ましく、過酸化水素水溶液であることが特に好ましい。 As described above, the solution 5 may be any solution that can generate plasma by glow discharge, but preferably does not contain a specific component that interferes with the surface modification of the metal fine particles. In other words, an aqueous solution of simple molecules composed only of atoms (for example, atoms selected from C, H, O, and metals) that do not interfere with the surface modification of the metal fine particles is preferable. Specifically, the solution 5 is preferably a hydrogen peroxide solution, a sodium carbonate solution, a sodium hydroxide solution, a potassium hydroxide solution, a barium hydroxide solution, a calcium hydroxide solution, or the like. Furthermore, the solution 5 is more preferably a peroxide solution or a low-concentration alkaline solution, and particularly preferably an aqueous hydrogen peroxide solution.

 なお、溶液5を構成する溶質と溶媒との組み合わせ,溶液5の濃度,導電率,pHなどは、目的に応じて設定すればよく、特に限定されるものではない。なお、溶液5の種類によってプラズマの発生させやすさが異なる場合や、金属微粒子の種類によって溶液5への分散性が異なる場合がある。このため、溶液5の濃度は、プラズマの発生させやすさ、金属微粒子の種類、金属微粒子の溶液5への分散性を考慮して設定すればよい。また、溶液5の温度も限定されるものではないが、一般的に溶液5の温度が高いほど合成速度や効率が上昇するので、25℃以上沸点以下の範囲内であることが好ましい。 It should be noted that the combination of the solute and the solvent constituting the solution 5, the concentration, conductivity, pH, etc. of the solution 5 may be set according to the purpose and are not particularly limited. Note that the ease of generating plasma may vary depending on the type of the solution 5, and the dispersibility in the solution 5 may vary depending on the type of metal fine particles. For this reason, the concentration of the solution 5 may be set in consideration of the ease of generating plasma, the type of metal fine particles, and the dispersibility of the metal fine particles in the solution 5. Further, the temperature of the solution 5 is not limited, but generally, the higher the temperature of the solution 5, the higher the synthesis rate and efficiency. Therefore, the temperature is preferably within the range of 25 ° C. or more and the boiling point or less.

 <本発明の金属微粒子分散溶液>
 本発明の金属微粒子分散溶液は、グロー放電によりプラズマ(ソリューションプラズマ)を発生させた溶液中に、金属微粒子が分散した溶液である。ただし、上記溶液中には、金属微粒子の凝集を抑制する分散溶解剤が添加されていない。
<Metal fine particle dispersion of the present invention>
The metal fine particle dispersion solution of the present invention is a solution in which metal fine particles are dispersed in a solution in which plasma (solution plasma) is generated by glow discharge. However, the dispersion solution which suppresses aggregation of metal fine particles is not added to the solution.

 本発明の金属微粒子分散溶液の製造方法は、特に限定されるものではないが、上述した本発明の金属微粒子の製造方法またはソリューションプラズマ放電装置10によって製造することができる。 The method for producing the metal fine particle dispersion of the present invention is not particularly limited, but can be produced by the above-described metal fine particle production method or the solution plasma discharge apparatus 10 of the present invention.

 すなわち、本発明の金属微粒子分散溶液は、溶液中に配置された同一材料からなる1対の放電電極間に、グロー放電によりプラズマを発生させて放電電極を融解し、放電電極を構成する金属からなる金属微粒子を溶液中に分散させる工程を有し、上記溶液中に、上記金属微粒子の凝集を抑制する分散溶解剤が添加されていない方法によって製造することができる。 That is, the metal fine particle dispersion solution of the present invention melts the discharge electrode by generating plasma by a glow discharge between a pair of discharge electrodes made of the same material arranged in the solution, and from the metal constituting the discharge electrode. And a step of dispersing the fine metal particles in the solution, and a method in which the dispersion solution for suppressing the aggregation of the fine metal particles is not added to the solution.

 なお、本発明の金属微粒子分散溶液において、金属微粒子が分散される溶液は、上述した溶液5と同様であるため、説明を省略する。また、以下では金属微粒子が分散される溶液を、溶液5として説明する。 In addition, in the metal fine particle dispersion solution of the present invention, the solution in which the metal fine particles are dispersed is the same as the solution 5 described above, and thus the description thereof is omitted. Hereinafter, the solution in which the metal fine particles are dispersed will be described as the solution 5.

 本発明の金属微粒子分散溶液では、グロー放電によりプラズマを発生させた溶液5中に、金属微粒子が分散しているため、分散溶解剤が溶液中に添加されていないにも拘らず、金属微粒子の凝集が抑制される。従って、分散溶解剤が添加されていない溶液5中に安定して分散した金属微粒子分散溶液を提供することができる。 In the fine metal particle dispersion solution of the present invention, since the fine metal particles are dispersed in the solution 5 in which plasma is generated by glow discharge, the dispersion of the fine metal particles is not added to the solution even though the dispersion solution is not added to the solution. Aggregation is suppressed. Accordingly, it is possible to provide a metal fine particle dispersion solution that is stably dispersed in the solution 5 to which no dispersion solubilizer is added.

 金属微粒子を溶液5に分散させるためには、金属微粒子がプラスまたはマイナスに帯電しており、その周囲を逆の電荷を持つ粒子(例えば、陽イオン、陰イオン、ラジカル、溶媒和電子、水酸化物イオンなど)が取り巻いていることが好ましい。言い換えれば、金属微粒子の表面近傍には、金属微粒子の表面の電荷と反対電荷の粒子が引き寄せられていることが好ましい。通常、金属微粒子の表面は、プラスに帯電している。従って、金属微粒子の表面がプラスに帯電しており、金属微粒子の周囲に、マイナスに帯電した粒子が引き寄せられていることがより好ましい。 In order to disperse the metal fine particles in the solution 5, the metal fine particles are positively or negatively charged, and the surroundings are particles having an opposite charge (for example, cation, anion, radical, solvated electron, hydroxylation) It is preferable that product ions and the like are surrounded. In other words, it is preferable that particles having the opposite charge to the surface of the metal fine particles are attracted near the surface of the metal fine particles. Usually, the surface of the metal fine particles is positively charged. Therefore, it is more preferable that the surface of the metal fine particles is positively charged, and the negatively charged particles are attracted around the metal fine particles.

 この場合、プラスに帯電した金属微粒子表面の周囲に、マイナスに帯電した粒子が引き寄せられている。つまり、金属微粒子の周囲に、固定層(Stern層:シュテルン層とも称される)が形成されている。これにより、金属微粒子と固定層とが一体となって溶液5中を移動する。従って、分散溶解剤を含まない溶液5中に、金属微粒子が安定して分散することができる。 In this case, the negatively charged particles are attracted around the surface of the positively charged metal fine particles. That is, a fixed layer (Stern layer: also referred to as a Stern layer) is formed around the metal fine particles. Thereby, the metal fine particles and the fixed layer move together in the solution 5. Therefore, the metal fine particles can be stably dispersed in the solution 5 that does not contain the dispersing and dissolving agent.

 一方、金属微粒子の溶液5中での分散性(分散安定性)を評価する指標として、ゼータ電位がある。ゼータ電位は、粒子界面における表面電荷に関係し、電気二重層表面(すべり面)と界面から充分に離れた溶液のバルク部分との電位差である。ゼータ電位の絶対値が増加すればするほど、溶液5中での金属微粒子間の反発が強くなる。すなわち、溶液5中での金属微粒子の分散安定性が高くなる。一方、ゼータ電位の絶対値がゼロに近くなるほど、金属微粒子は凝集しやすくなる。1
 従って、本発明の金属微粒子分散溶液において、溶液5のゼータ電位の絶対値は、できるかぎり大きいことが好ましい。具体的には、ゼータ電位の絶対値は、25mV以上であることが好ましく、30mV以上であることがより好ましく、30mV~80mVであることが特に好ましい。
On the other hand, as an index for evaluating the dispersibility (dispersion stability) of the metal fine particles in the solution 5, there is a zeta potential. The zeta potential is related to the surface charge at the particle interface, and is the potential difference between the electric double layer surface (slip surface) and the bulk portion of the solution sufficiently away from the interface. As the absolute value of the zeta potential increases, the repulsion between the metal fine particles in the solution 5 becomes stronger. That is, the dispersion stability of the metal fine particles in the solution 5 is increased. On the other hand, as the absolute value of the zeta potential is closer to zero, the metal fine particles are more likely to aggregate. 1
Therefore, in the metal fine particle dispersion of the present invention, the absolute value of the zeta potential of the solution 5 is preferably as large as possible. Specifically, the absolute value of the zeta potential is preferably 25 mV or more, more preferably 30 mV or more, and particularly preferably 30 mV to 80 mV.

 このように、金属微粒子の分散安定性を示すゼータ電位の絶対値が、25mV以上となっていることが好ましい。これにより、金属微粒子間の反発が強くなり、溶液5中での金属微粒子の分散安定性が高くなる。従って、分散溶解剤が添加されていない溶液5中に、金属微粒子が安定して分散することができる。 Thus, it is preferable that the absolute value of the zeta potential indicating the dispersion stability of the metal fine particles is 25 mV or more. Thereby, the repulsion between metal fine particles becomes strong, and the dispersion stability of the metal fine particles in the solution 5 becomes high. Therefore, the metal fine particles can be stably dispersed in the solution 5 to which no dispersion solubilizer is added.

 このように、本発明の金属微粒子分散溶液は、分散溶解剤が溶液中に添加されていないにも拘らず、金属微粒子の凝集が抑制され、溶液中に安定して分散している点を最大の特徴としている。 As described above, the metal fine particle dispersion solution of the present invention has the advantage that the dispersion of the metal fine particles is suppressed and stably dispersed in the solution even though the dispersion solubilizer is not added to the solution. It has the characteristics of

 <本発明によって製造される金属微粒子>
 本発明の金属微粒子の製造方法によって得られる金属微粒子は、平均粒子径が500nm以下であることが好ましく、100nm以下であることがより好ましい。一方、金属微粒子の平均粒子径の下限値は、50nm以上であることが好ましく、10nm以上であることがより好ましい。これにより、バルク金属とは異なる特異的な性質を有する金属微粒子を製造することができる。このような金属微粒子(金属ナノ粒子)は、医薬品、化粧品、触媒、電子材料、光学材料などの化学およびバイオ関連の分野において好適に利用することができる。なお、金属微粒子の平均粒子径は、透過型電子顕微鏡(TEM:Transmission Electron Microscope)観察によって確認することができる。また、金属微粒子の平均粒子径は、原子間力顕微鏡(AFM:Atomic Force Microscope)によるAFM像によっても確認することもできる。さらに、溶液5および金属微粒子の種類によっては、金属微粒子が分散した溶液5の色から、金属微粒子の粒子径を確認することができる。例えば、後述する実施例1,3では、放電後の金ナノ粒子分散液の色からも、金粒子の平均粒子径を確認した。
<Metal fine particles produced by the present invention>
The fine metal particles obtained by the method for producing fine metal particles of the present invention preferably have an average particle size of 500 nm or less, and more preferably 100 nm or less. On the other hand, the lower limit of the average particle diameter of the metal fine particles is preferably 50 nm or more, and more preferably 10 nm or more. Thereby, the metal fine particle which has a specific property different from a bulk metal can be manufactured. Such metal fine particles (metal nanoparticles) can be suitably used in chemical and bio-related fields such as pharmaceuticals, cosmetics, catalysts, electronic materials, and optical materials. The average particle diameter of the metal fine particles can be confirmed by observation with a transmission electron microscope (TEM). The average particle diameter of the metal fine particles can also be confirmed by an AFM image obtained by an atomic force microscope (AFM). Furthermore, depending on the type of the solution 5 and the metal fine particles, the particle diameter of the metal fine particles can be confirmed from the color of the solution 5 in which the metal fine particles are dispersed. For example, in Examples 1 and 3 to be described later, the average particle diameter of the gold particles was also confirmed from the color of the gold nanoparticle dispersion after discharge.

 なお、本発明は、以下のように表現することもできる。 The present invention can also be expressed as follows.

 本発明の金属微粒子の製造方法において、上記溶液は、フッ素、塩素、臭素、ヨウ素、および硫黄の原子、分子、およびイオンを含有しないことが好ましい。 In the method for producing fine metal particles of the present invention, the solution preferably does not contain fluorine, chlorine, bromine, iodine, and sulfur atoms, molecules, and ions.

 上記の発明によれば、形成された金属微粒子の表面に化学吸着または物理吸着しやすいハロゲンおよび硫黄の各原子、各分子、または各イオンが、溶液中に存在しない。つまり、金属微粒子の表面修飾(表面処理)を妨害する成分が、溶液中に存在しない。これにより、金属微粒子の表面修飾が容易になる。従って、汎用性の高い金属微粒子を製造することができる。 According to the above invention, halogen and sulfur atoms, molecules, or ions that are easily chemically or physically adsorbed on the surface of the formed metal fine particles are not present in the solution. That is, there is no component in the solution that interferes with the surface modification (surface treatment) of the metal fine particles. This facilitates surface modification of the metal fine particles. Therefore, highly versatile metal fine particles can be produced.

 本発明の金属微粒子の製造方法において、上記溶液は、過酸化物溶液であることが好ましい。 In the method for producing fine metal particles of the present invention, the solution is preferably a peroxide solution.

 上記の発明によれば、溶液として過酸化物溶液が用いられる。過酸化物溶液が金属微粒子の表面に吸着したとしても、金属微粒子の表面修飾は妨害されにくい。これにより、金属微粒子の表面修飾が容易になる。従って、汎用性の高い金属微粒子を製造することができる。 According to the above invention, a peroxide solution is used as the solution. Even if the peroxide solution is adsorbed on the surface of the metal fine particles, the surface modification of the metal fine particles is not easily disturbed. This facilitates surface modification of the metal fine particles. Therefore, highly versatile metal fine particles can be produced.

 本発明の金属微粒子の製造方法において、上記過酸化物溶液における過酸化物の含有量は、0.01w/w%以上、35.5w/w%以下であることが好ましい。 In the method for producing metal fine particles of the present invention, the peroxide content in the peroxide solution is preferably 0.01 w / w% or more and 35.5 w / w% or less.

 上記の発明によれば、過酸化物溶液中の過酸化物の含有量が、0.01w/w%以上、35.5w/w%以下の範囲である。これにより、過酸化物溶液中に凝集を生じることなく金属微粒子を製造することができる。 According to the above invention, the peroxide content in the peroxide solution is in the range of 0.01 w / w% to 35.5 w / w%. Thereby, metal microparticles can be produced without causing aggregation in the peroxide solution.

 本発明の金属微粒子の製造方法において、上記過酸化物溶液は、過酸化水素水溶液であることが好ましい。 In the method for producing fine metal particles of the present invention, the peroxide solution is preferably an aqueous hydrogen peroxide solution.

 上記の発明によれば、水素および酸素から構成される単純な分子の過酸化水素水溶液が溶液として用いられる。つまり、金属微粒子の表面に吸着し、金属微粒子の表面修飾を妨害する成分(ハロゲン、硫黄など)、金属、および金属酸化物などの不純物が、溶液中に存在しない。従って、表面修飾を容易に行うことのできる汎用性の高い金属微粒子を製造することができる。さらに、過酸化水素が分解されたとしても、発生するのは水と酸素のみであるため、安全性の高い金属微粒子の製造方法を実現することができる。 According to the above invention, a simple molecular hydrogen peroxide solution composed of hydrogen and oxygen is used as the solution. That is, impurities such as components (halogen, sulfur, etc.), metal, and metal oxide that adsorb on the surface of the metal fine particles and interfere with the surface modification of the metal fine particles are not present in the solution. Therefore, highly versatile metal fine particles that can be easily surface-modified can be produced. Furthermore, even if hydrogen peroxide is decomposed, since only water and oxygen are generated, a highly safe method for producing fine metal particles can be realized.

 本発明の金属微粒子の製造方法において、上記溶液は、0.01mM以上、50mM以下以下のアルカリ溶液であることが好ましい。また、上記アルカリ溶液は、水酸化ナトリウム水溶液であることがより好ましい。 In the method for producing fine metal particles of the present invention, the solution is preferably an alkaline solution of 0.01 mM or more and 50 mM or less. The alkaline solution is more preferably a sodium hydroxide aqueous solution.

 上記の発明によれば、0.01mM以上、50mM以下の低濃度のアルカリ溶液が、溶液として用いられる。つまり、金属微粒子の表面に吸着し、金属微粒子の表面修飾を妨害する成分(ハロゲン、硫黄など)が、溶液中に存在しない。これにより、金属微粒子の表面修飾が容易になる。従って、汎用性の高い金属微粒子を製造することができる。 According to the above invention, a low concentration alkaline solution of 0.01 mM or more and 50 mM or less is used as the solution. That is, there are no components (halogen, sulfur, etc.) that adsorb on the surface of the metal fine particles and interfere with the surface modification of the metal fine particles in the solution. This facilitates surface modification of the metal fine particles. Therefore, highly versatile metal fine particles can be produced.

 本発明の金属微粒子の製造方法において、上記金属微粒子の平均粒子径が、500nm以下であることが好ましい。これにより、バルク金属とは異なる特異的な性質を有する金属微粒子を製造することができる。このような金属微粒子は、医薬品、化粧品、触媒、電子材料、光学材料などの化学およびバイオ分野において好適に利用することができる。 In the method for producing fine metal particles of the present invention, the average particle size of the fine metal particles is preferably 500 nm or less. Thereby, the metal fine particle which has a specific property different from a bulk metal can be manufactured. Such metal fine particles can be suitably used in chemical and bio fields such as pharmaceuticals, cosmetics, catalysts, electronic materials and optical materials.

 本発明の金属微粒子分散溶液において、上記金属微粒子の表面がプラスに帯電しており、上記金属微粒子の周囲に、マイナスに帯電した粒子が引き寄せられていることが好ましい。 In the metal fine particle dispersion of the present invention, it is preferable that the surface of the metal fine particles is positively charged, and the negatively charged particles are attracted around the metal fine particles.

 上記の発明によれば、プラスに帯電した金属微粒子表面の周囲に、マイナスに帯電した粒子が引き寄せられている。つまり、金属微粒子の周囲に、固定層(Stern層:シュテルン層とも称される)が形成されている。これにより、金属微粒子と固定層とが一体となって溶液中を移動する。従って、分散溶解剤を含まない溶液中に、金属微粒子が安定して分散することができる。 According to the above invention, the negatively charged particles are attracted around the surface of the positively charged metal fine particles. That is, a fixed layer (Stern layer: also referred to as a Stern layer) is formed around the metal fine particles. As a result, the metal fine particles and the fixed layer move together in the solution. Therefore, the metal fine particles can be stably dispersed in a solution that does not contain the dispersing and dissolving agent.

 本発明の金属微粒子分散溶液において、上記溶液のゼータ電位の絶対値が、25mV以上であることが好ましい。 In the metal fine particle dispersion of the present invention, the absolute value of the zeta potential of the solution is preferably 25 mV or more.

 上記の発明によれば、金属微粒子の分散安定性を示すゼータ電位の絶対値が、25mV以上となっている。これにより、金属微粒子間の反発が強くなり、溶液中での金属微粒子の安定性が高くなる。従って、分散溶解剤が添加されていない溶液中に、金属微粒子が安定して分散することができる。 According to the above invention, the absolute value of the zeta potential indicating the dispersion stability of the metal fine particles is 25 mV or more. Thereby, the repulsion between metal fine particles becomes strong, and the stability of the metal fine particles in a solution becomes high. Therefore, the metal fine particles can be stably dispersed in the solution to which the dispersion solubilizer is not added.

 以下に、本発明の金属微粒子の製造方法について、実施例を用いてより具体的に説明する。ただし、本発明の金属微粒子の製造方法は、以下の実施例にのみ限定されるものではない。 Hereinafter, the method for producing metal fine particles of the present invention will be described more specifically with reference to examples. However, the method for producing metal fine particles of the present invention is not limited to the following examples.

 〔実施例1〕
 図1のソリューションプラズマ放電装置10を用い、金微粒子を製造した。具体的には、各放電電極1として純度99.9%、直径1mmの金電極を用い、放電電極間1・1間距離を0.5mmとし、溶液5として3.5w/w%の過酸化水素水溶液のみを用いた。溶液5には、過酸化水素水以外に、分散溶解剤等の添加剤が添加されていない。このようなソリューションプラズマ放電装置10の放電電極1・1間にグロー放電によりプラズマを発生させるために、放電電極1・1間に印加する放電開始電圧を800Vに設定し、4分間電圧を印加した。放電電極1・1間に流れる最大電流は、4.7Aであった。図2は、実施例1で製造された金ナノ粒子分散液の1ヶ月経過後の状態を示す図である。同図に示すように、金ナノ粒子分散液は透明感があることから、金微粒子を製造して1ヶ月経過後も、金ナノ粒子が凝集していないことが確認された。なお、金ナノ粒子が凝集した場合、凝集体が沈降する。なお、過酸化水素水溶液は透明であるため、放電開始直後から金電極の溶解が観察された。さらに、電圧印加終了後の金ナノ粒子分散液が赤色を呈し、1ヶ月経過後の金ナノ粒子分散液がやや紫色を呈したことから、100nm以下の金ナノ粒子が製造されたことが確認された。さらに、金ナノ粒子分散液を薄いガラス板上で自然蒸発乾燥させて、原子間顕微鏡によって観察した。図3は、実施例1で製造された金ナノ粒子を原子間力顕微鏡によって観察した結果を示す図である。同図において横軸は粒子のサイズ(0~1.0μm)を示し、縦軸はガラス板からの厚さを色表示したものである。図3に示すように、100nm以下の金ナノ粒子が形成されていることが確認された。なお、原子間力顕微鏡は、形成された粒子成分(元素)を確認することはできない。しかし、本実施例の条件下において、過酸化水素溶液に含まれる金属元素は、金電極に由来する金以外に存在しない。また、蒸発乾燥後のガラス基板上の残渣が、視覚的に金と同様であることも確認された。さらに、上述のように分散液の色も、金溶液と同様である。従って、本実施例によって製造された粒子は、金ナノ粒子である。
[Example 1]
Gold fine particles were produced using the solution plasma discharge apparatus 10 of FIG. Specifically, a gold electrode having a purity of 99.9% and a diameter of 1 mm is used as each discharge electrode 1, the distance between the discharge electrodes 1 and 1 is 0.5 mm, and the solution 5 is 3.5 w / w% peroxide. Only aqueous hydrogen solution was used. The solution 5 contains no additives such as a dispersion solubilizer other than the hydrogen peroxide solution. In order to generate plasma by glow discharge between the discharge electrodes 1 and 1 of such a solution plasma discharge apparatus 10, the discharge start voltage applied between the discharge electrodes 1 and 1 is set to 800 V, and a voltage is applied for 4 minutes. . The maximum current flowing between the discharge electrodes 1 and 1 was 4.7A. FIG. 2 is a view showing a state after one month of the gold nanoparticle dispersion produced in Example 1. FIG. As shown in the figure, since the gold nanoparticle dispersion has a transparent feeling, it was confirmed that the gold nanoparticles were not aggregated even after one month had elapsed since the production of the gold fine particles. In addition, when a gold nanoparticle aggregates, an aggregate precipitates. Since the aqueous hydrogen peroxide solution was transparent, dissolution of the gold electrode was observed immediately after the start of discharge. Furthermore, since the gold nanoparticle dispersion liquid after the voltage application was finished was red and the gold nanoparticle dispersion liquid after one month was slightly purple, it was confirmed that gold nanoparticles of 100 nm or less were produced. It was. Further, the gold nanoparticle dispersion was naturally evaporated and dried on a thin glass plate and observed with an atomic microscope. FIG. 3 is a diagram showing the results of observation of the gold nanoparticles produced in Example 1 with an atomic force microscope. In the figure, the horizontal axis indicates the particle size (0 to 1.0 μm), and the vertical axis indicates the thickness from the glass plate in color. As shown in FIG. 3, it was confirmed that gold nanoparticles of 100 nm or less were formed. Note that the atomic force microscope cannot confirm the formed particle component (element). However, under the conditions of this example, there is no metal element contained in the hydrogen peroxide solution other than gold derived from the gold electrode. It was also confirmed that the residue on the glass substrate after evaporation and drying was visually similar to gold. Furthermore, as described above, the color of the dispersion is the same as that of the gold solution. Therefore, the particles produced according to this example are gold nanoparticles.

 〔実施例2〕
 放電電極1として、純度99.9%、直径1mmの白金電極を用いた以外は、実施例1と同条件で、白金微粒子を製造した。図4は、実施例2で製造された白金ナノ粒子分散液の1ヶ月経過後の状態を示す図である。同図に示すように、白金ナノ粒子分散液は透明感があることから、白金微粒子を製造して1ヶ月経過後も、白金ナノ粒子が凝集していないことが確認された。なお、放電開始直後から白金電極の溶解が観察され、電圧印加終了後の白金ナノ粒子分散液が薄い褐色を呈したことから、白金ナノ粒子が製造されたことが確認された。
[Example 2]
Platinum fine particles were produced under the same conditions as in Example 1 except that a platinum electrode having a purity of 99.9% and a diameter of 1 mm was used as the discharge electrode 1. 4 is a view showing a state after one month of the platinum nanoparticle dispersion produced in Example 2. FIG. As shown in the figure, since the platinum nanoparticle dispersion liquid is transparent, it was confirmed that the platinum nanoparticles were not aggregated even after one month from the production of the platinum fine particles. In addition, dissolution of the platinum electrode was observed immediately after the start of discharge, and the platinum nanoparticle dispersion after application of the voltage exhibited a light brown color, confirming the production of platinum nanoparticles.

 〔実施例3〕
 溶液5として5mMの水酸化ナトリウム水溶液を用いた以外は、実施例1と同条件で金微粒子を製造した。図5は、実施例3で製造された金ナノ粒子分散液の1ヶ月経過後の状態を示す図である。同図に示すように、金ナノ粒子分散液は透明感があることから、金微粒子を製造して1ヶ月経過後も、金ナノ粒子が凝集していないことが確認された。また、放電開始直後から金電極の溶解が観察され、電圧印加終了後の金ナノ粒子分散液が赤色を呈し、1ヶ月経過後の金ナノ粒子分散液がやや紫色を呈したことから、100nm以下の金ナノ粒子が製造されたことが確認された。
Example 3
Gold fine particles were produced under the same conditions as in Example 1 except that 5 mM sodium hydroxide aqueous solution was used as the solution 5. FIG. 5 is a view showing a state after one month of the gold nanoparticle dispersion liquid produced in Example 3. FIG. As shown in the figure, since the gold nanoparticle dispersion has a transparent feeling, it was confirmed that the gold nanoparticles were not aggregated even after one month had elapsed since the production of the gold fine particles. In addition, dissolution of the gold electrode was observed immediately after the start of discharge, the gold nanoparticle dispersion after application of voltage was red, and the gold nanoparticle dispersion after one month was slightly purple. It was confirmed that the gold nanoparticles were produced.

 〔実施例4〕
 溶液5として7.0w/w%および17.5w/w%の過酸化水素水溶液を用いた以外は、実施例1と同条件で金微粒子を製造した。図6は、実施例4で製造された金ナノ粒子分散液の1ヶ月経過後の状態を示す図であり、(a)は7.0w/w%の過酸化水素水溶液を用いた金ナノ粒子分散液を示し、(b)は17.5w/w%の過酸化水素水溶液を用いた金ナノ粒子分散液を示す。同図に示すように、金ナノ粒子分散液は透明感があることから、金微粒子を製造して1ヶ月経過後も、金ナノ粒子が凝集していないことが確認された。また、放電開始直後から金電極の溶解が観察され、電圧印加終了後の金ナノ粒子分散液が赤色を呈し、1ヶ月経過後の金ナノ粒子分散液がやや紫色を呈したことから、100nm以下の金ナノ粒子が製造されたことが確認された。図7は、実施例4において、17.5w/w%の過酸化水素水溶液を用いて製造された金ナノ粒子のTEM画像を示す図である。同図に示すように、10nm以上100nm以下の金ナノ粒子が製造されたことが確認された。図8は、実施例4において、17.5w/w%の過酸化水素水溶液を用いて製造された金ナノ粒子のEDS(エネルギー分散型X線分光器;Energy Dispersive X-ray Spectrometer)による元素分析結果を示す図である。EDSは、試料に電子ビームを照射し、試料から発生したX線のエネルギーを分解して、そのスペクトルから試料に含まれる元素を分析する。透過型電子顕微鏡(TEM)や走査型電子顕微鏡(SEM)等に搭載され、微小領域の元素分析に用いられる。図8のように、EDSによる元素分析の結果、製造されたナノ粒子が金であることが確認された。
Example 4
Gold fine particles were produced under the same conditions as in Example 1 except that 7.0 w / w% and 17.5 w / w% aqueous hydrogen peroxide solution was used as Solution 5. FIG. 6 is a diagram showing a state after one month of the gold nanoparticle dispersion produced in Example 4, wherein (a) is a gold nanoparticle using a 7.0 w / w% aqueous hydrogen peroxide solution. A dispersion liquid is shown, and (b) shows a gold nanoparticle dispersion liquid using a 17.5 w / w% aqueous hydrogen peroxide solution. As shown in the figure, since the gold nanoparticle dispersion has a transparent feeling, it was confirmed that the gold nanoparticles were not aggregated even after one month had elapsed since the production of the gold fine particles. In addition, dissolution of the gold electrode was observed immediately after the start of discharge, the gold nanoparticle dispersion after application of voltage was red, and the gold nanoparticle dispersion after one month was slightly purple. It was confirmed that the gold nanoparticles were produced. 7 is a diagram showing a TEM image of gold nanoparticles produced using a 17.5 w / w% aqueous hydrogen peroxide solution in Example 4. FIG. As shown in the figure, it was confirmed that gold nanoparticles of 10 nm to 100 nm were produced. FIG. 8 is an elemental analysis by EDS (Energy Dispersive X-ray Spectrometer) of gold nanoparticles produced using a 17.5 w / w% aqueous hydrogen peroxide solution in Example 4. It is a figure which shows a result. EDS irradiates a sample with an electron beam, decomposes the energy of X-rays generated from the sample, and analyzes elements contained in the sample from the spectrum. It is mounted on a transmission electron microscope (TEM), a scanning electron microscope (SEM), etc., and used for elemental analysis of a minute region. As shown in FIG. 8, as a result of elemental analysis by EDS, it was confirmed that the produced nanoparticles were gold.

 〔実施例5〕
 放電電極1として、純度99.9%、直径1mmの白金電極を用い、溶液5として7.0w/w%および17.5w/w%の過酸化水素水溶液を用いた以外は、実施例1と同条件で白金微粒子を製造した。図9は、実施例5で製造された白金ナノ粒子分散液の1ヶ月経過後の状態を示す図であり、(a)は7.0w/w%の過酸化水素水溶液を用いた白金ナノ粒子分散液を示し、(b)は17.5w/w%の過酸化水素水溶液を用いた白金ナノ粒子分散液を示す。同図に示すように、白金ナノ粒子分散液は透明感があることから、白金微粒子を製造して1ヶ月経過後も、白金ナノ粒子が凝集していないことが確認された。また、放電開始直後から白金電極の溶解が観察され、電圧印加終了後の白金ナノ粒子分散液が薄い褐色を呈したことから、白金ナノ粒子が製造されたことが確認された。図10は、実施例5において、7.0w/w%の過酸化水素水溶液を用いて製造された白金ナノ粒子のTEM画像を示す図である。同図に示すように、1nm以上100nm以下の白金ナノ粒子が製造されたことが確認された。図11は、実施例5において、7.0w/w%の過酸化水素水溶液を用いて製造された白金ナノ粒子のEDSによる元素分析結果を示す図である。図11のように、EDSによる元素分析の結果、製造されたナノ粒子が白金であることが確認された。
Example 5
Example 1 except that a platinum electrode having a purity of 99.9% and a diameter of 1 mm was used as the discharge electrode 1 and a 7.0 w / w% and 17.5 w / w% aqueous hydrogen peroxide solution was used as the solution 5. Platinum fine particles were produced under the same conditions. FIG. 9 is a diagram showing a state after one month of the platinum nanoparticle dispersion produced in Example 5, wherein (a) is a platinum nanoparticle using a 7.0 w / w% aqueous hydrogen peroxide solution. A dispersion liquid is shown, and (b) shows a platinum nanoparticle dispersion liquid using a 17.5 w / w% aqueous hydrogen peroxide solution. As shown in the figure, since the platinum nanoparticle dispersion liquid is transparent, it was confirmed that the platinum nanoparticles were not aggregated even after one month from the production of the platinum fine particles. Moreover, dissolution of the platinum electrode was observed immediately after the start of discharge, and the platinum nanoparticle dispersion liquid after the voltage application was finished showed a light brown color, confirming the production of platinum nanoparticles. FIG. 10 is a diagram showing a TEM image of platinum nanoparticles produced in Example 5 using a 7.0 w / w% aqueous hydrogen peroxide solution. As shown in the figure, it was confirmed that platinum nanoparticles of 1 nm to 100 nm were produced. FIG. 11 is a diagram showing an elemental analysis result by EDS of platinum nanoparticles produced in Example 5 using a 7.0 w / w% aqueous hydrogen peroxide solution. As shown in FIG. 11, as a result of elemental analysis by EDS, it was confirmed that the produced nanoparticles were platinum.

 〔実施例6〕
 放電電極1として、純度99.9%、直径1mmの銀電極を用い、溶液5として0.44w/w%、0.88w/w%、および1.75w/w%の過酸化水素水溶液を用いた以外は、実施例1と同条件で白金微粒子を製造した。図12は、実施例6で製造された銀ナノ粒子分散液の1ヶ月経過後の状態を示す図であり、(a)は0.44w/w%の過酸化水素水溶液を用いた銀ナノ粒子分散液を示し、(b)は0.88w/w%の過酸化水素水溶液を用いた銀ナノ粒子分散液を示し、(c)は1.75w/w%の過酸化水素水溶液を用いた銀ナノ粒子分散液を示す。同図に示すように、銀ナノ粒子分散液は透明感があることから、銀微粒子を製造して1ヶ月経過後も、銀ナノ粒子が凝集していないことが確認された。図13は、実施例6において、0.88w/w%の過酸化水素水溶液を用いて製造された銀ナノ粒子のTEM画像を示す図である。同図に示すように、10nm以上100nm以下の銀ナノ粒子が製造されたことが確認された。図14は、実施例6において、0.88w/w%の過酸化水素水溶液を用いて製造された銀ナノ粒子のEDSによる元素分析結果を示す図である。図14のように、EDSによる元素分析の結果、製造されたナノ粒子が銀であることが確認された。
Example 6
A silver electrode having a purity of 99.9% and a diameter of 1 mm is used as the discharge electrode 1, and 0.44 w / w%, 0.88 w / w%, and 1.75 w / w% aqueous hydrogen peroxide solution is used as the solution 5. Except for the above, fine platinum particles were produced under the same conditions as in Example 1. FIG. 12 is a view showing a state after one month of the silver nanoparticle dispersion produced in Example 6, wherein (a) is a silver nanoparticle using a 0.44 w / w% aqueous hydrogen peroxide solution. 1 shows a dispersion, (b) shows a silver nanoparticle dispersion using a 0.88 w / w% aqueous hydrogen peroxide solution, and (c) shows a silver using a 1.75 w / w% aqueous hydrogen peroxide solution. A nanoparticle dispersion is shown. As shown in the figure, since the silver nanoparticle dispersion has a transparent feeling, it was confirmed that the silver nanoparticles were not aggregated even after one month had elapsed since the production of the silver fine particles. FIG. 13 is a diagram showing a TEM image of silver nanoparticles produced using a 0.88 w / w% aqueous hydrogen peroxide solution in Example 6. FIG. As shown in the figure, it was confirmed that silver nanoparticles of 10 nm to 100 nm were produced. FIG. 14 is a diagram showing an elemental analysis result by EDS of silver nanoparticles produced in Example 6 using a 0.88 w / w% aqueous hydrogen peroxide solution. As shown in FIG. 14, as a result of elemental analysis by EDS, it was confirmed that the produced nanoparticles were silver.

 〔実施例7〕
 溶液5として0.1mM、0.5mM、および3mMの水酸化ナトリウム水溶液を用いた以外は、実施例1と同条件で金微粒子を製造した。図15は、実施例7で製造された金ナノ粒子分散液の1ヶ月経過後の状態を示す図であり、(a)は0.1mMの水酸化ナトリウム水溶液を用いた金ナノ粒子分散液を示し、(b)は0.5mMの水酸化ナトリウム水溶液を用いた金ナノ粒子分散液を示し、(c)は3.0mMの水酸化ナトリウム水溶液を用いた金ナノ粒子分散液を示す。同図に示すように、金ナノ粒子分散液は透明感があることから、金微粒子を製造して1ヶ月経過後も、金ナノ粒子が凝集していないことが確認された。また、放電開始直後から金電極の溶解が観察され、電圧印加終了後の金ナノ粒子分散液が赤色を呈し、1ヶ月経過後の金ナノ粒子分散液がやや紫色を呈したことから、100nm以下の金ナノ粒子が製造されたことが確認された。
Example 7
Gold fine particles were produced under the same conditions as in Example 1 except that 0.1 mM, 0.5 mM, and 3 mM sodium hydroxide aqueous solutions were used as the solution 5. FIG. 15 is a view showing a state after one month of the gold nanoparticle dispersion produced in Example 7, wherein (a) shows a gold nanoparticle dispersion using a 0.1 mM sodium hydroxide aqueous solution. (B) shows a gold nanoparticle dispersion using a 0.5 mM aqueous sodium hydroxide solution, and (c) shows a gold nanoparticle dispersion using a 3.0 mM aqueous sodium hydroxide solution. As shown in the figure, since the gold nanoparticle dispersion has a transparent feeling, it was confirmed that the gold nanoparticles were not aggregated even after one month had elapsed since the production of the gold fine particles. In addition, dissolution of the gold electrode was observed immediately after the start of discharge, the gold nanoparticle dispersion after application of voltage was red, and the gold nanoparticle dispersion after one month was slightly purple. It was confirmed that the gold nanoparticles were produced.

 〔実施例8〕
 溶液5として7.0w/w%の過酸化水素水溶液を用いた以外は、実施例1と同条件で金微粒子を製造した。図16は、実施例8で製造された金ナノ粒子分散液の1ヶ月経過後の状態を示す図である。同図に示すように、金ナノ粒子分散液は透明感があることから、金微粒子を製造して1ヶ月経過後も、金ナノ粒子が凝集していないことが確認された。また、放電開始直後から金電極の溶解が観察され、電圧印加終了後の金ナノ粒子分散液が赤色を呈し、1ヶ月経過後の金ナノ粒子分散液がやや紫色を呈したことから、100nm以下の金ナノ粒子が製造されたことが確認された。なお、図16における、「160V」、「180V」、「220V」は、各々供給平均電圧を示しており、放電開始電圧を示すものではない。
Example 8
Gold fine particles were produced under the same conditions as in Example 1 except that 7.0 w / w% aqueous hydrogen peroxide solution was used as Solution 5. FIG. 16 is a diagram showing a state after one month of the gold nanoparticle dispersion liquid produced in Example 8. As shown in the figure, since the gold nanoparticle dispersion has a transparent feeling, it was confirmed that the gold nanoparticles were not aggregated even after one month had elapsed since the production of the gold fine particles. In addition, dissolution of the gold electrode was observed immediately after the start of discharge, the gold nanoparticle dispersion after application of voltage was red, and the gold nanoparticle dispersion after one month was slightly purple. It was confirmed that the gold nanoparticles were produced. In FIG. 16, “160 V”, “180 V”, and “220 V” indicate supply average voltages, and do not indicate discharge start voltages.

 次に、半月経過後の金ナノ粒子分散液のゼータ電位を、ゼータ電位測定装置を用いて電気泳動光散乱測定法にて測定した。その結果、供給平均電圧が160Vの場合のゼータ電位は、-38.9mV(繰り返し標準偏差は1.1mV)であり、供給平均電圧が180Vの場合のゼータ電位は、-31.9mV(繰り返し標準偏差は2.2mV)であり、供給平均電圧が220Vの場合のゼータ電位は、-32.9mV(繰り返し標準偏差は1.1mV)となった。なお、ゼータ電位の測定結果は、3回測定した平均値を示している。このように、溶液のゼータ電位の絶対値は、30mV以上となっており、分散溶解剤が添加されていない溶液中に、金ナノ粒子が安定して分散していることが確認された。 Next, the zeta potential of the gold nanoparticle dispersion after half a month passed was measured by electrophoretic light scattering measurement using a zeta potential measuring device. As a result, the zeta potential when the supply average voltage is 160 V is −38.9 mV (repetitive standard deviation is 1.1 mV), and the zeta potential when the supply average voltage is 180 V is −31.9 mV (repetitive standard). The deviation was 2.2 mV), and the zeta potential when the supply average voltage was 220 V was −32.9 mV (repetitive standard deviation was 1.1 mV). In addition, the measurement result of zeta potential has shown the average value measured 3 times. Thus, the absolute value of the zeta potential of the solution was 30 mV or more, and it was confirmed that the gold nanoparticles were stably dispersed in the solution to which no dispersion solubilizer was added.

 発明の詳細な説明の項においてなした具体的な実施態様または実施例は、あくまでも、本発明の技術内容を明らかにするものであって、そのような具体例にのみ限定して狭義に解釈されるべきものではなく、本発明の精神と次に記載する特許請求事項の範囲内で、いろいろと変更して実施することができるものである。 Specific embodiments or examples made in the section of the detailed description of the invention are merely to clarify the technical contents of the present invention, and are limited to such specific examples and interpreted in a narrow sense. It should be understood that various modifications may be made within the spirit of the invention and the scope of the following claims.

 本発明によって得られた金属微粒子は、バルク金属とは異なる特異的な性質を有する。それゆえ、医薬品、化粧品、触媒、電子材料、光学材料などの化学およびバイオ分野において好適に利用することができる。 The metal fine particles obtained by the present invention have specific properties different from those of bulk metals. Therefore, it can be suitably used in chemical and bio fields such as pharmaceuticals, cosmetics, catalysts, electronic materials, optical materials and the like.

 1  放電電極
 2  セラミックチューブ
 3  プラズマ発生電源
 4  アース
 5  溶液
 6  容器
 10 ソリューションプラズマ放電装置
DESCRIPTION OF SYMBOLS 1 Discharge electrode 2 Ceramic tube 3 Plasma generation power source 4 Ground 5 Solution 6 Container 10 Solution plasma discharge device

Claims (11)

 溶液中に配置された同一材料からなる1対の放電電極間に、グロー放電によりプラズマを発生させて放電電極を融解し、放電電極を構成する金属からなる金属微粒子を形成する工程を有し、
 上記溶液中に、上記金属微粒子の凝集を抑制する分散溶解剤が添加されていないことを特徴とする金属微粒子の製造方法。
A step of generating plasma by glow discharge to melt the discharge electrode between a pair of discharge electrodes made of the same material disposed in the solution, and forming metal fine particles made of metal constituting the discharge electrode;
A method for producing metal fine particles, characterized in that a dispersion-dissolving agent that suppresses aggregation of the metal fine particles is not added to the solution.
 上記溶液は、フッ素、塩素、臭素、ヨウ素、および硫黄の原子、分子、およびイオンを含有しないことを特徴とする請求項1に記載の金属微粒子の製造方法。 The method for producing fine metal particles according to claim 1, wherein the solution does not contain fluorine, chlorine, bromine, iodine, and sulfur atoms, molecules, and ions.  上記溶液は、過酸化物溶液であることを特徴とする請求項1または2に記載の金属微粒子の製造方法。 The method for producing fine metal particles according to claim 1 or 2, wherein the solution is a peroxide solution.  上記過酸化物溶液における過酸化物の含有量は、0.01w/w%以上、35.5w/w%以下であることを特徴とする請求項3に記載の金属微粒子の製造方法。 The method for producing metal fine particles according to claim 3, wherein the peroxide content in the peroxide solution is 0.01 w / w% or more and 35.5 w / w% or less.  上記過酸化物溶液は、過酸化水素水溶液であることを特徴とする請求項3または4に記載の金属微粒子の製造方法。 5. The method for producing fine metal particles according to claim 3, wherein the peroxide solution is an aqueous hydrogen peroxide solution.  上記溶液は、0.01mM以上、50mM以下のアルカリ溶液であることを特徴とする請求項1または2に記載の金属微粒子の製造方法。 The method for producing fine metal particles according to claim 1 or 2, wherein the solution is an alkaline solution of 0.01 mM or more and 50 mM or less.  上記アルカリ溶液は、水酸化ナトリウム水溶液であることを特徴とする請求項6に記載の金属微粒子の製造方法。 The method for producing fine metal particles according to claim 6, wherein the alkaline solution is an aqueous sodium hydroxide solution.  上記金属微粒子の平均粒子径が、500nm以下であることを特徴とする請求項1~7のいずれか1項に記載の金属微粒子の製造方法。 The method for producing metal fine particles according to any one of claims 1 to 7, wherein an average particle diameter of the metal fine particles is 500 nm or less.  グロー放電によりプラズマを発生させた溶液中に、金属微粒子が分散しており、
 上記溶液中に、上記金属微粒子の凝集を抑制する分散溶解剤が添加されていないことを特徴とする金属微粒子分散溶液。
Metal fine particles are dispersed in the solution in which plasma is generated by glow discharge.
A metal fine particle dispersion solution, wherein a dispersion solubilizing agent that suppresses aggregation of the metal fine particles is not added to the solution.
 上記金属微粒子の表面がプラスに帯電しており、
 上記金属微粒子の周囲に、マイナスに帯電した粒子が引き寄せられていることを特徴とする請求項9に記載の金属微粒子分散溶液。
The surface of the metal fine particles is positively charged,
The metal fine particle dispersion solution according to claim 9, wherein negatively charged particles are attracted around the metal fine particles.
 上記溶液のゼータ電位の絶対値が、25mV以上であることを特徴とする請求項9または10に記載の金属微粒子分散溶液。 The metal fine particle dispersion solution according to claim 9 or 10, wherein the absolute value of the zeta potential of the solution is 25 mV or more.
PCT/JP2011/062992 2010-06-07 2011-06-07 Method for producing fine metal particles and fine metal particle dispersion solution Ceased WO2011155473A1 (en)

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