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WO2008114475A1 - バリア膜形成装置、バリア膜形成方法及びバリア膜被覆容器 - Google Patents

バリア膜形成装置、バリア膜形成方法及びバリア膜被覆容器 Download PDF

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Publication number
WO2008114475A1
WO2008114475A1 PCT/JP2007/072619 JP2007072619W WO2008114475A1 WO 2008114475 A1 WO2008114475 A1 WO 2008114475A1 JP 2007072619 W JP2007072619 W JP 2007072619W WO 2008114475 A1 WO2008114475 A1 WO 2008114475A1
Authority
WO
WIPO (PCT)
Prior art keywords
barrier
film forming
container
film
forming apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2007/072619
Other languages
English (en)
French (fr)
Inventor
Yuji Asahara
Hideo Yamakoshi
Minoru Danno
Seiji Goto
Akira Shirakura
Masaki Nakaya
Kiyoshi Hiroya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kirin Brewery Co Ltd
Mitsubishi Heavy Industries Machinery Systems Co Ltd
Original Assignee
Kirin Brewery Co Ltd
Mitsubishi Heavy Industries Food and Packaging Machinery Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kirin Brewery Co Ltd, Mitsubishi Heavy Industries Food and Packaging Machinery Co Ltd filed Critical Kirin Brewery Co Ltd
Priority to US12/524,784 priority Critical patent/US8950356B2/en
Priority to KR20097019253A priority patent/KR101171427B1/ko
Priority to CN2007800521990A priority patent/CN101636523B/zh
Priority to EP07832348.2A priority patent/EP2147988B1/en
Priority to AU2007349770A priority patent/AU2007349770B2/en
Publication of WO2008114475A1 publication Critical patent/WO2008114475A1/ja
Anticipated expiration legal-status Critical
Priority to US14/579,349 priority patent/US20150108031A1/en
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using DC or AC discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D23/00—Details of bottles or jars not otherwise provided for
    • B65D23/02—Linings or internal coatings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D25/00—Details of other kinds or types of rigid or semi-rigid containers
    • B65D25/14—Linings or internal coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)
  • Plasma Technology (AREA)
  • Spectroscopy & Molecular Physics (AREA)

Abstract

　凹凸部（１２ａ）を有する容器（１２）を被処理物とし、内面にバリア膜を成膜するバリア膜形成装置であって、前記容器（１２）を取り囲む大きさの空洞を有する誘電体部材（５０）と、該誘電体部材（５０）の外周側を覆う外部電極（１３）と、前記容器（１２）の口部（１１）が位置する側の前記外部電極（１３）の端面に絶縁部材（２６）を介して取り付けられ、前記容器（１２）の内部を、排気管（１４）を介して減圧する排気手段と、前記排気管（１４）側から挿入され、前記容器（１２）内にバリア膜生成用の媒質ガス（１９）を吹き出すためのガス吹出し部を兼用する内部電極（１７）と、前記外部電極（１３）と接地電極間に放電を発生させるための電界を付与するための電界付与手段とを具備する。
PCT/JP2007/072619 2007-03-16 2007-11-22 バリア膜形成装置、バリア膜形成方法及びバリア膜被覆容器 Ceased WO2008114475A1 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
US12/524,784 US8950356B2 (en) 2007-03-16 2007-11-22 Barrier-film forming apparatus, barrier-film forming method, and barrier-film coated container
KR20097019253A KR101171427B1 (ko) 2007-03-16 2007-11-22 배리어막 형성 장치, 배리어막 형성 방법 및 배리어막 피복 용기
CN2007800521990A CN101636523B (zh) 2007-03-16 2007-11-22 阻隔膜形成装置、阻隔膜形成方法及阻隔膜被覆容器
EP07832348.2A EP2147988B1 (en) 2007-03-16 2007-11-22 Barrier-film forming apparatus and barrier-film forming method
AU2007349770A AU2007349770B2 (en) 2007-03-16 2007-11-22 Barrier-film forming apparatus, barrier-film forming method, and barrier-film coated container
US14/579,349 US20150108031A1 (en) 2007-03-16 2014-12-22 Barrier-film forming apparatus, barrier-film forming method, and barrier-film coated container

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-069462 2007-03-16
JP2007069462A JP5355860B2 (ja) 2007-03-16 2007-03-16 バリア膜形成装置、バリア膜形成方法及びバリア膜被覆容器

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US12/524,784 A-371-Of-International US8950356B2 (en) 2007-03-16 2007-11-22 Barrier-film forming apparatus, barrier-film forming method, and barrier-film coated container
US14/579,349 Division US20150108031A1 (en) 2007-03-16 2014-12-22 Barrier-film forming apparatus, barrier-film forming method, and barrier-film coated container

Publications (1)

Publication Number Publication Date
WO2008114475A1 true WO2008114475A1 (ja) 2008-09-25

Family

ID=39765594

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/072619 Ceased WO2008114475A1 (ja) 2007-03-16 2007-11-22 バリア膜形成装置、バリア膜形成方法及びバリア膜被覆容器

Country Status (8)

Country Link
US (2) US8950356B2 (ja)
EP (1) EP2147988B1 (ja)
JP (1) JP5355860B2 (ja)
KR (1) KR101171427B1 (ja)
CN (2) CN101636523B (ja)
AU (1) AU2007349770B2 (ja)
RU (1) RU2434080C2 (ja)
WO (1) WO2008114475A1 (ja)

Cited By (3)

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Publication number Priority date Publication date Assignee Title
WO2010095011A1 (en) * 2009-02-18 2010-08-26 Council Of Scientific & Industrial Research Process to deposit diamond like carbon as protective coating on inner surface of a shaped object.
JP2019059992A (ja) * 2017-09-27 2019-04-18 株式会社吉野工業所 バリア膜形成装置及びバリア膜形成方法
JP2021008669A (ja) * 2020-09-29 2021-01-28 三菱ケミカル株式会社 ガスバリア性膜の成膜装置及び成膜方法とガスバリア性膜付プラスチック容器の製造方法

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JP5355860B2 (ja) 2007-03-16 2013-11-27 三菱重工食品包装機械株式会社 バリア膜形成装置、バリア膜形成方法及びバリア膜被覆容器
JP5643528B2 (ja) * 2009-03-30 2014-12-17 東京エレクトロン株式会社 基板処理装置
DE102009041132B4 (de) 2009-09-14 2014-08-14 Schott Ag Verfahren zur Herstellung einer Gleitschicht und pharmazeutisches Packmittel mit Gleitschicht
JP5865617B2 (ja) * 2010-07-15 2016-02-17 太陽誘電ケミカルテクノロジー株式会社 プラズマ発生方法及びそのための装置
US20120128896A1 (en) * 2010-11-19 2012-05-24 Tucker Edward B Stain-resistant container and method
JP5610345B2 (ja) * 2010-12-01 2014-10-22 麒麟麦酒株式会社 ガスバリア性を有するプラスチック容器の製造方法、小型容器用アダプター及び薄膜成膜装置
WO2012091095A1 (ja) * 2010-12-28 2012-07-05 麒麟麦酒株式会社 ガスバリア性プラスチック成形体の製造方法
DE102011009056B4 (de) * 2011-01-20 2016-04-07 Schott Ag Vorrichtung zur Plasmabehandlung von Hohlkörpern
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EP2683836B1 (en) * 2011-03-10 2021-02-17 Kaiatech, Inc. Method and apparatus for treating containers
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JP5897998B2 (ja) * 2012-06-14 2016-04-06 三菱樹脂株式会社 成膜装置及び薄膜形成方法
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JP6086826B2 (ja) * 2013-06-20 2017-03-01 三菱重工食品包装機械株式会社 バリア膜形成装置
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JP6446289B2 (ja) * 2015-02-26 2018-12-26 株式会社吉野工業所 バリア膜形成装置、バリア膜形成方法
JP6566686B2 (ja) * 2015-03-31 2019-08-28 三菱重工機械システム株式会社 容器に成膜する装置
TWI551712B (zh) 2015-09-02 2016-10-01 財團法人工業技術研究院 容器內部鍍膜裝置及其方法
JP2016074984A (ja) * 2015-11-12 2016-05-12 三菱樹脂株式会社 誘電体部材、成膜装置及び薄膜形成方法
JP6927713B2 (ja) * 2017-02-24 2021-09-01 三菱重工機械システム株式会社 バリア膜形成装置
CN107662385A (zh) * 2017-10-12 2018-02-06 丹阳市维尼光学有限公司 双层阻隔膜
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JP7159694B2 (ja) * 2018-08-28 2022-10-25 日本電産株式会社 プラズマ処理装置
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JP7494059B2 (ja) * 2020-08-27 2024-06-03 キオクシア株式会社 排気配管装置
US20240066161A1 (en) * 2021-08-09 2024-02-29 TellaPure, LLC Methods and apparatus for generating atmospheric pressure, low temperature plasma
JP7725346B2 (ja) * 2021-11-25 2025-08-19 キオクシア株式会社 排気配管装置
CN115810862B (zh) * 2022-01-27 2025-02-18 宁德时代新能源科技股份有限公司 电极组件的隔离膜、制备电极组件的隔离膜的方法和设备
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JP2025139147A (ja) * 2024-03-12 2025-09-26 三菱重工機械システム株式会社 バリア膜形成装置

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AU2007349770A1 (en) 2008-09-25
CN102605350A (zh) 2012-07-25
RU2434080C2 (ru) 2011-11-20
US20100096393A1 (en) 2010-04-22
JP2008231468A (ja) 2008-10-02
EP2147988B1 (en) 2019-03-27
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US8950356B2 (en) 2015-02-10
JP5355860B2 (ja) 2013-11-27
RU2009138244A (ru) 2011-04-27
AU2007349770B2 (en) 2012-02-09
CN102605350B (zh) 2016-01-20
EP2147988A1 (en) 2010-01-27
EP2147988A4 (en) 2015-04-29
CN101636523A (zh) 2010-01-27

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