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WO2006053675A1 - Procede de production d'halogenures elementaires - Google Patents

Procede de production d'halogenures elementaires Download PDF

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Publication number
WO2006053675A1
WO2006053675A1 PCT/EP2005/012051 EP2005012051W WO2006053675A1 WO 2006053675 A1 WO2006053675 A1 WO 2006053675A1 EP 2005012051 W EP2005012051 W EP 2005012051W WO 2006053675 A1 WO2006053675 A1 WO 2006053675A1
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WIPO (PCT)
Prior art keywords
carbon
reaction
mixture
halide
elemental
Prior art date
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Ceased
Application number
PCT/EP2005/012051
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German (de)
English (en)
Inventor
Norbert Auner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wacker Chemie AG
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Wacker Chemie AG
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Filing date
Publication date
Priority claimed from DE200510024107 external-priority patent/DE102005024107A1/de
Application filed by Wacker Chemie AG filed Critical Wacker Chemie AG
Publication of WO2006053675A1 publication Critical patent/WO2006053675A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B9/00—General methods of preparing halides
    • C01B9/06—Iodides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B9/00—General methods of preparing halides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B9/00—General methods of preparing halides
    • C01B9/02—Chlorides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B9/00—General methods of preparing halides
    • C01B9/04—Bromides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B9/00—General methods of preparing halides
    • C01B9/08—Fluorides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F7/00—Compounds of aluminium
    • C01F7/48—Halides, with or without other cations besides aluminium
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F7/00—Compounds of aluminium
    • C01F7/48—Halides, with or without other cations besides aluminium
    • C01F7/56—Chlorides
    • C01F7/58—Preparation of anhydrous aluminium chloride
    • C01F7/60—Preparation of anhydrous aluminium chloride from oxygen-containing aluminium compounds
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G1/00—Methods of preparing compounds of metals not covered by subclasses C01B, C01C, C01D, or C01F, in general
    • C01G1/06—Halides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G11/00—Compounds of cadmium
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G19/00—Compounds of tin
    • C01G19/04—Halides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/02—Halides of titanium
    • C01G23/022—Titanium tetrachloride
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G27/00—Compounds of hafnium
    • C01G27/04—Halides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G28/00—Compounds of arsenic
    • C01G28/007—Halides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G49/00—Compounds of iron
    • C01G49/10—Halides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G9/00—Compounds of zinc
    • C01G9/04—Halides

Definitions

  • a process for the preparation of elemental halides is described, which is characterized in that in a first step, a mixture of a material containing the respective element and carbon or carbonaceous material is prepared and brought this mixture with a gaseous under the selected reaction conditions hydrogen halide in contact and heated.
  • Elemental halides are compounds of elements with the halogens fluorine, chlorine, bromine, iodine or mixtures of these halogens.
  • the element-halogen bond here ionogenic character, such as a halogen-alkali metal bond, such as NaCl, or predominantly covalent character as for metal-halogen bonds, such as SiCl 4 , or non-metal halide bonds, such as PCl 3 , have.
  • Elemental halides are widely used in the art. Some elements, such as aluminum, titanium, boron or silicon, are derived from element halides. Also, in some elements, a halogenating oxidation and subsequent dehalogenating reduction serve to present these elements in particularly high purity.
  • the elemental halogen compounds in this case by sublimation, such as AlCl 3 , or distillation, such as TiCl4, are additionally purified.
  • the dehalogenation can be carried out, for example, by means of hydrogen, such as, for example, BCI 3 , or by thermal decomposition, such as, for example, decomposition of BBr 3 to tungsten wire.
  • element halides are also important starting materials for CVD or similar processes.
  • elemental halides are fundamental building blocks for, for example, technically and synthetically important catalysts, such as Friedel-Crafts electrophilic aromatic substitution catalysts, alkylation, acylation, or Ziegler-Natta catalysts for polymerizations, to form element-to-member bonds, such as by Wurtz couplings , Grignard reactions, salt metathesis to elemental oxygen, elemental phosphorous, elemental nitrogen, elemental boron, elemental sulfur bonds,
  • catalysts such as Friedel-Crafts electrophilic aromatic substitution catalysts, alkylation, acylation, or Ziegler-Natta catalysts for polymerizations, to form element-to-member bonds, such as by Wurtz couplings , Grignard reactions, salt metathesis to elemental oxygen, elemental phosphorous, elemental nitrogen, elemental boron, elemental sulfur bonds,
  • the chlorine-withdrawing reagent may be copper or mercury.
  • carbochlorination is meant a reaction of preferably elemental oxides with carbon and chlorine with the introduction of thermal energy, and for some elements as well
  • Chlorine-containing compounds are, for example, tetrachlorosilane or carbon, sodium chloride or chlorine-containing sulfur compounds, such as thionyl chloride and sufururic chloride.
  • cadmium chloride may be cadmium oxide according to:
  • Catalysts are often used to increase yields or to improve the reaction rates, as for example in US Pat. No. 1,565,220 by addition of sulfur in the carbochlorination of alumina for accelerating the reaction and US Pat. No. 4,083,927 by addition of
  • the present invention is based on the object
  • This object is achieved by a method for producing element halide, characterized in that a mixture of a material comprising the element with carbon or carbonaceous material is brought under heating with a gas stream containing under the reaction conditions gaseous hydrogen halide in contact dissolved.
  • the mixture is heated by generating an alternating electromagnetic field, in particular microwave energy.
  • an alternating electromagnetic field preferably microwave radiation
  • the carbon or carbonaceous material used must be in a form suitable for converting electromagnetic waves into thermal energy, i. to be thermally excited by alternating electromagnetic fields.
  • the elemental halides may optionally be separated after halogenation of the mixtures by known physical or chemical methods, for example by distillation of liquid or gaseous element halides, by sublimation of solid
  • Element halides or filtration to separate liquid or gaseous elemental halides from solid elemental halides Element halides or filtration to separate liquid or gaseous elemental halides from solid elemental halides.
  • the method may be coupled with a deposition of the elemental halides by means of hydrogen.
  • the hydrogen produced during the use of hydrogen halide for halogenation can be used for this purpose.
  • the released hydrogen may alternatively be used to recover some of the energy needed for the process.
  • energy and production costs can be saved with the one-step process presented here.
  • the production of the Elements omitted. Formally, the process often proceeds without altering the oxidation state of the element.
  • Hydrogen chloride used In addition to the avoidance of phosgene hydrogen chloride is also technologically preferable due to its much lower boiling point compared to chlorine, since it is easier to separate from the desired elemental halides. Hydrogen chloride is also advantageous for reactor construction since hydrogen chloride acts less oxidatively on the reactor materials than chlorine. Additionally, hydrogen chloride is technically available at most chemical manufacturing sites.
  • the method according to the invention is not limited to the type of material used containing the element, but also to the specific surface area of this material. Also, there are hardly any restrictions on the type and specific surface area of the carbon or carbonaceous material used.
  • starting materials are chosen for the process according to the invention, which can be easily mixed technically. These may be, for example, ground products of the element-containing or carbon-containing materials which are subjected to a milling process separately or already premixed.
  • the components of the mixture or the mixture itself may be porous. Particularly preferably, the mixture should have such a large pore space that it can be penetrated by the gaseous halogen or the gaseous halogen compound, thus promoting the reaction taking place.
  • Compact materials having a low specific surface area for example coarsely comminuted natural minerals such as bauxite, ilmenite, quartz or sand, can also be reacted with the method according to the invention.
  • the carbon or the corresponding carbonaceous material used in the method according to the invention acts, on the one hand, optionally as a reducing agent for the element-containing material, on the other hand in the embodiment with the action of electromagnetic alternating fields, such as microwave irradiation, as a heating element within the mix. Furthermore, the carbon used traps water by reduction to hydrogen and thus prevents water, which can be introduced, for example, by the starting materials or is liberated in the reaction, adversely affecting the production of hydrolysis-sensitive element halides.
  • the element halide can be obtained almost quantitatively.
  • any compound containing the element can be used.
  • catalysts can be added to the reaction mixture in order to increase the reaction rates or
  • the catalysts can be introduced into the reaction mixture before entry into the reactor, as solids, liquids or gases are fed separately during the reaction or pass as gas in a mixture with the hydrogen halide in the reaction space.
  • the material containing element is preferably used in the form of particles, such as powder, grains, spheres or granules, in order to allow a good passage of the gaseous halogen or the gaseous halogen compound.
  • a preferred molar ratio of element to carbon can not be universally defined as the process divided into several subregions, which require different minimum amounts of carbon for the quantitative production of the desired elemental halide:
  • Reducing agent acts against the elemental compound; the carbon or carbonaceous material is consumed only by reacting with impurities or by-products of halogenation, and functions mainly as a filler or, in embodiments having alternating electromagnetic fields, also mainly as a heating element. Therefore, to produce a homogeneous reaction mixture, only mixing with the supplemented element-containing starting material must take place again and again.
  • the molar ratio of element to carbon is preferably 100: 1 to 1: 2.
  • Carbon serves as a reducing agent of pure elemental compounds, here enough carbon must be present to ensure the stoichiometric reaction of the element. In particular, in embodiments with the action of alternating electromagnetic fields, an excess of stoichiometry is advantageous so that heat can be generated consistently.
  • the molar ratio of element to carbon is preferably 1: 1 to 1:10 here.
  • Carbon is used to reduce contaminated elemental compounds. In this case not only must sufficient carbon be present to produce the desired element halide, but, if complete conversion of the starting material is desired, the impurities must also be quantitatively reacted; by the choice of suitable reaction parameters is a Of course, selective reaction also possible, especially if, for example, in accordance with the patent US 4,083,927 in the implementation of the method according to the invention catalysts are used.
  • the molar ratio of carbon to all the halide compounds produced is preferably 10: 1 to 1: 1.
  • reaction temperatures are for the preparation of hydrolysis-sensitive element halides preferably more than 700 0 C, more preferably more than 800 0 C.
  • the hydrogen halide gas used is preferably hydrogen chloride gas (HCl). Hydrogen fluoride (HF) can also be used.
  • the halogen-containing gas may be used in pure form or together with a carrier gas.
  • Carrier gases are CO 2 or inert gases selected from the group containing helium, nitrogen and argon, and mixtures thereof are preferred.
  • the material containing the element consists of SiO x sources which are selected from the group comprising highly dispersed silicic acid, preferably having a surface area of at least 50 m 2 / g, preferably of at least 250 m 2 / g, measured using the BET method, quartz flour preferably having micron a mean particle size of at least 0.1, preferably at least 1 micron, and preferably having a theoretical specific surface area of at least 0.1 m 2 / g, preferably 0.5 m 2 / g, silica sand having an average Particle size of at least 0.005 mm, preferably 0.1 mm and a theoretical specific surface area of at least 10 cm 2 / g, preferably 50 cm 2 / g, desert sand preferably having a particle size of 0.001 to 1 mm, bottle glass, such as soda-lime glass , preferably pounded or milled, quartz glass, mica and SiO 2 powder preferably having a particle size of 0.01 micro
  • the method has not only in terms of the type of SiO x used , but also in terms of the design of the particles, such as their shape and grain size, of this material hardly limits if the SiO x material used only with the Carbon or the carbonaceous material mix. Also, with respect to the kind and grain size of the carbon or carbonaceous material used, there are hardly any limitations if the above-mentioned mixing is possible. However, the mixture should preferably have such a large pore space that it can be permeated by the hydrogen halide to thereby promote the reaction taking place.
  • the molar ratio SiO x to carbon is preferably 1: 1 to 1:10, particularly preferably 1: 2 to 1: 7.
  • the silicon tetrahalide can be obtained almost quantitatively.
  • Almost any SiO x source can be used in the method according to the invention.
  • SiO 2 is used, but it is also possible to use SiO.
  • Suitable SiO x sources are, for example, sand, such as desert or quartz sand, glass, rice ash and silicates. It is therefore possible to use all materials which consist of SiO x or contain SiO x , and also corresponding silicates.
  • desert sand is used as a suitable source of SiO x , since this is available in large quantities stands.
  • a desert sand usually has a SiO 2 content of greater than 80%.
  • SiO x or the SiO x -containing material is preferably used in the form of particles, such as, for example, powders, granules, spheres or granules, in order to allow good mixing and good passage of the gaseous hydrogen halide.
  • Heat transfer agent for the production of element halide acting carbon or the corresponding carbonaceous material is also preferably particulate, for example in the form of powder, grains, spheres or granules, used to allow good mixing and passage of the halogen gas or the halogen compound.
  • the nature of the used material is not critical. A particularly preferred material is crushed activated carbon.
  • Pelleting or granulation of the mixture of elemental compound and carbonaceous material results in particularly intimate contact between the two components and, at the same time, allows greater gas flow rates due to the porosity of the beds formed from the pellets or granules, so that higher reaction rates than in the case of mixed powders are observed.
  • Pelleting or granulation may be accomplished by adding up to 20% binder to the mixture of elemental compound and carbonaceous material.
  • Suitable binders are generally carbon-containing compounds such as polyvinyl alcohol, polyvinyl acetate, cellulose, starch or molasses as well as elemental compounds.
  • the element-containing material is added in liquid form or as gas, optionally at elevated temperature, to the solid and heated carbon or carbonaceous material.
  • the carbonaceous material is introduced into the reaction space in liquid form or as gas, optionally at elevated temperature.
  • At least the portion of the carbonaceous material serving as reducing agent is in liquid form or as gas, optionally with increased Temperature, introduced into the reaction space. If carbon or a carbonaceous material which can be heated by an electromagnetic alternating field is already present in the reaction space, then it is not necessary that the liquid or gaseous carbonaceous material used as reducing agent can likewise be heated by electromagnetic alternating fields.
  • Substance mixture transferred into a form that can be heated by the electromagnetic alternating field.
  • the inventive method can in addition to the described embodiment in a fixed bed reactor in reactors with a moving bed of the reaction mixture are carried out, such as stirring the bed, moving the bed by vibration or using a fluidized bed process.
  • fluid bed arrangements are appropriate for continuous operation.
  • the inventive method is preferably used for the preparation of element chlorides using hydrogen chloride as the reaction gas.
  • the naturally occurring materials such as desert sand or bauxite
  • the inventive method in addition to its versatility is characterized by easy handling and low costs.
  • the apparatus and reaction materials used are made of quartz glass due to their availability and temperature resistance. This is attacked under the reaction conditions of HCl, but the reaction rate is significantly reduced by the low surface area compared to the powdered or granular reaction mixtures, so that destruction of the silica glassware during a single reaction was not observed. According to GC / MS analysis, phosgene could not be detected as a by-product in any of the examples below.
  • Example 5 4 g of quartz powder (average particle size 3 ⁇ m, corresponds to a theoretical specific surface area of 0.75 m 2 / g), 4.2 g of powdered activated carbon and 2 g of dextran were treated as in Example 1 and the reaction with HCl at a temperature of 800 c C executed. The reaction was not complete after 12 hours. The isolated yield of SiCl 4 was 0.72 g (6% of the theoretical total conversion).
  • quartz powder average particle size 3 ⁇ m, corresponds to a theoretical specific surface area of 0.75 m 2 / g
  • 4.2 g of powdered activated carbon and 2 g of dextran were treated as in Example 1 and the reaction with HCl at a temperature of 800 c C executed. The reaction was not complete after 12 hours.
  • the isolated yield of SiCl 4 was 0.72 g (6% of the theoretical total conversion).
  • Example 5 4 g of quartz powder (average particle size 3 ⁇ m, corresponds to a theoretical specific surface area of 0.75 m 2 /
  • the quartz glass carrier was introduced into a reaction tube (glass tube, diameter 30 mm with two chimneys, drop tube plus riser, average distance 100 mm), which was placed in the hotspot of a microwave reactor (Panasonic domestic appliance).
  • Into the reaction tube was introduced a mixture of reaction (hydrogen chloride, 60 l / h) and inert gas (nitrogen, 40 l / h). After heating, the reaction product (SiCl 4 ) was condensed out in a cold trap in which pentane was initially charged with an ethanol cold bath at below -30 ° C. The analysis was quantitative and qualitative.
  • quartz glass support halved quartz glass tube, diameter 13 mm, length about 100 mm, feet of quartz glass 5 mm
  • the quartz glass carrier was introduced into a reaction tube (quartz glass tube, diameter 30 mm, length 550 mm), which was introduced into the hotspot of a microwave reactor (MX 4000, MUEGGE Electronic GmbH).
  • An HCl gas stream (1-5 L / min) was passed through the reaction tube with heating (550-1300 0 C) by activation of the microwave reactor.
  • Element-containing compounds aluminum (III) oxide; ⁇ 150 ⁇ m, 99%
  • Iron (III) oxide ⁇ 5 ⁇ m,> 99%
  • Quartz fine meal (mean particle size 3 ⁇ m, theoretical specific surface 0.75 m 2 / g)
  • Quartz sand (average particle size 0.32 mm, theoretical specific surface 75 cm 2 / g)
  • Silicon tetrachloride was detected by GCMS and 29 Si NMR compared to purchased standard compounds.
  • Boron trichloride as the diethyl ether adduct and phosphorus trichloride were detected by 11 B NMR and 31 P NMR against purchased standard compounds.
  • Iron dichloride, aluminum trichloride and hafnium tetrachloride were detected by EDX and X-ray powder diffractometry.
  • Titanium tetrachloride could not be detected directly with the available laboratory equipment.
  • the strongly fumed pentane solution was transferred to GC vials. After settling the resulting precipitate, the supernatant clear solution was lifted through the septum and transferred to a new vial through the septum. This clear solution was mixed with water through the septum. There was immediately a white voluminous precipitate. This was dried and identified by means of EDX as titanium oxide.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
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  • Environmental & Geological Engineering (AREA)
  • General Life Sciences & Earth Sciences (AREA)
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Abstract

L'invention concerne un procédé permettant de produire des halogénures élémentaires, qui se caractérise en ce que dans une première étape, un mélange d'un matériau contenant l'élément correspondant et du carbone ou un matériau à base de carbone est produit. Ce mélange est mis en contact avec de l'halogénure d'hydrogène gazeux, dans des conditions de réaction, puis est chauffé.
PCT/EP2005/012051 2004-11-18 2005-11-10 Procede de production d'halogenures elementaires Ceased WO2006053675A1 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE102004055688 2004-11-18
DE102004055688.1 2004-11-18
DE200510024107 DE102005024107A1 (de) 2005-05-25 2005-05-25 Verfahren zur Herstellung von Elementhalogeniden
DE102005024107.7 2005-05-25

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Publication Number Publication Date
WO2006053675A1 true WO2006053675A1 (fr) 2006-05-26

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013060863A1 (fr) * 2011-10-27 2013-05-02 Norbert Auner Procédé de production de tétrahalogénosilanes
WO2014082110A1 (fr) 2012-11-27 2014-06-05 Activ Solar Gmbh Procédé de production chimique par plasma de chlorosilanes

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2954274A (en) * 1956-03-13 1960-09-27 Columbia Southern Chem Corp Metal chloride manufacture
US3173760A (en) * 1960-11-14 1965-03-16 Nat Distillers Chem Corp Process for the preparation of a boron trihalide
US4327062A (en) * 1980-02-13 1982-04-27 Ube Industries, Ltd. Process for producing chloride of elements of Group III, IV or V of Periodic Table
DE3442370A1 (de) * 1983-11-21 1985-05-30 Denki Kagaku Kogyo K.K., Tokio/Tokyo Verfahren zur herstellung von siliciumtetrachlorid
EP0167156A2 (fr) * 1984-07-06 1986-01-08 Wacker-Chemie Gmbh Procédé de préparation de tétrachlorure de silicium
JPS62143813A (ja) * 1985-12-17 1987-06-27 Jgc Corp 四塩化ケイ素の製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2954274A (en) * 1956-03-13 1960-09-27 Columbia Southern Chem Corp Metal chloride manufacture
US3173760A (en) * 1960-11-14 1965-03-16 Nat Distillers Chem Corp Process for the preparation of a boron trihalide
US4327062A (en) * 1980-02-13 1982-04-27 Ube Industries, Ltd. Process for producing chloride of elements of Group III, IV or V of Periodic Table
DE3442370A1 (de) * 1983-11-21 1985-05-30 Denki Kagaku Kogyo K.K., Tokio/Tokyo Verfahren zur herstellung von siliciumtetrachlorid
EP0167156A2 (fr) * 1984-07-06 1986-01-08 Wacker-Chemie Gmbh Procédé de préparation de tétrachlorure de silicium
JPS62143813A (ja) * 1985-12-17 1987-06-27 Jgc Corp 四塩化ケイ素の製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 011, no. 371 (C - 462) 3 December 1987 (1987-12-03) *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013060863A1 (fr) * 2011-10-27 2013-05-02 Norbert Auner Procédé de production de tétrahalogénosilanes
CN104169217A (zh) * 2011-10-27 2014-11-26 斯帕恩特私人有限公司 用于制备四卤代硅烷的方法
WO2014082110A1 (fr) 2012-11-27 2014-06-05 Activ Solar Gmbh Procédé de production chimique par plasma de chlorosilanes

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