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WO2005106066A3 - Verdampfungseinrichtung und verfahren zum verdampfen von beschichtungsmaterial - Google Patents

Verdampfungseinrichtung und verfahren zum verdampfen von beschichtungsmaterial Download PDF

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Publication number
WO2005106066A3
WO2005106066A3 PCT/DE2005/000703 DE2005000703W WO2005106066A3 WO 2005106066 A3 WO2005106066 A3 WO 2005106066A3 DE 2005000703 W DE2005000703 W DE 2005000703W WO 2005106066 A3 WO2005106066 A3 WO 2005106066A3
Authority
WO
WIPO (PCT)
Prior art keywords
vaporizing
coating material
chamber
vacuum
evaporation chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE2005/000703
Other languages
English (en)
French (fr)
Other versions
WO2005106066A2 (de
Inventor
Lutz Gottsmann
Ulf Seyfert
Bernd-Dieter Wenzel
Reinhard Jaeger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Von Ardenne Anlagentechnik GmbH
Original Assignee
Von Ardenne Anlagentechnik GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Von Ardenne Anlagentechnik GmbH filed Critical Von Ardenne Anlagentechnik GmbH
Priority to JP2007509870A priority Critical patent/JP2007534844A/ja
Priority to CA002564269A priority patent/CA2564269A1/en
Priority to CN2005800134611A priority patent/CN1946872B/zh
Priority to EP05735463A priority patent/EP1743046A2/de
Priority to US11/568,329 priority patent/US20080193636A1/en
Publication of WO2005106066A2 publication Critical patent/WO2005106066A2/de
Publication of WO2005106066A3 publication Critical patent/WO2005106066A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Die Erfindung betrifft eine Verdampfungseinrichtung zum Verdampfen von Beschichtungsmaterial, die als Teil einer Beschichtungseinrichtung in einer Vakuumkammer enthalten ist, wobei das Beschichtungsmaterial (5) zum Verdampfen in einem befüllbaren Tiegel (6) angeordnet ist. Die Lösung der erfindungsgemäßen Aufgabenstellung, eine Verdampfungseinrichtung bzw. ein Verfahren zum Verdampfen von Beschichtungsmaterial zur kontinuierlichen thermischen Vakuumbeschichtung bereitzustellen, wodurch die Standzeiten verkürzt und die Reinigungs- und Wartungsintervalle verlängert werden, wird dadurch erreicht, dass die Verdampfungseinrichtung eine Verdampfungskammer (2) aufweist die über ein Vakuumventil (9) mit einer evakuierbaren Ladekammer (8) verbunden ist, wobei in der Verdampfungskammer ein Verdampfer angeordnet ist, der den mit Beschichtungsmaterial befüllbaren Tiegel enthält und der dampfaustrittsseitig, also der der Vakuumkammer zugewandten Seite, über ein erstes Dampfsperr-Ventil (4) mit der Verdampfungskammer verbunden ist.
PCT/DE2005/000703 2004-04-27 2005-04-16 Verdampfungseinrichtung und verfahren zum verdampfen von beschichtungsmaterial Ceased WO2005106066A2 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2007509870A JP2007534844A (ja) 2004-04-27 2005-04-16 蒸発装置および被覆材料を蒸発する方法
CA002564269A CA2564269A1 (en) 2004-04-27 2005-04-16 Vaporizing device and method for vaporizing coating material
CN2005800134611A CN1946872B (zh) 2004-04-27 2005-04-16 蒸发装置及蒸发涂料的方法
EP05735463A EP1743046A2 (de) 2004-04-27 2005-04-16 Verdampfungseinrichtung und verfahren zum verdampfen von beschichtungsmaterial
US11/568,329 US20080193636A1 (en) 2004-04-27 2005-04-16 Vaporizing Device and Method for Vaporizing Coating Material

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE102004020843.3 2004-04-27
DE102004020843 2004-04-27
DE102004041846A DE102004041846B4 (de) 2004-04-27 2004-08-27 Verdampfungseinrichtung und Verfahren zum Verdampfen von Beschichtungsmaterial
DE102004041846.2 2004-08-27

Publications (2)

Publication Number Publication Date
WO2005106066A2 WO2005106066A2 (de) 2005-11-10
WO2005106066A3 true WO2005106066A3 (de) 2006-05-26

Family

ID=34967080

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2005/000703 Ceased WO2005106066A2 (de) 2004-04-27 2005-04-16 Verdampfungseinrichtung und verfahren zum verdampfen von beschichtungsmaterial

Country Status (8)

Country Link
US (1) US20080193636A1 (de)
EP (1) EP1743046A2 (de)
JP (1) JP2007534844A (de)
KR (1) KR100892474B1 (de)
CN (1) CN1946872B (de)
CA (1) CA2564269A1 (de)
DE (1) DE102004041846B4 (de)
WO (1) WO2005106066A2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007012370A1 (de) * 2007-03-14 2008-09-18 Createc Fischer & Co. Gmbh Bedampfungseinrichtung und Bedampfungsverfahren zur Molekularstrahlbedampfung und Molekularstrahlepitaxie
JP5512660B2 (ja) * 2008-05-30 2014-06-04 アプライド マテリアルズ インコーポレイテッド 基板をコーティングするための装置
JP2010111916A (ja) * 2008-11-06 2010-05-20 Ulvac Japan Ltd 真空蒸着装置、蒸着源、成膜室、蒸着容器交換方法
DE102010030126B4 (de) * 2010-02-15 2016-09-22 Von Ardenne Gmbh Verdampfereinrichtung und Beschichtungsanlage
KR101353605B1 (ko) 2011-12-05 2014-01-27 재단법인 포항산업과학연구원 자기이방성 희토류 영구자석 소결장치
AU2013208044A1 (en) * 2012-01-10 2014-03-20 Hzo, Inc. Precursor supplies, material processing systems with which precursor supplies are configured to be used and associated methods
FR3020381B1 (fr) * 2014-04-24 2017-09-29 Riber Cellule d'evaporation
CN106902707B (zh) * 2017-04-07 2022-10-21 东莞市升微机电设备科技有限公司 一种voc、甲醛加速蒸发及加料室
CN107858666A (zh) * 2017-12-13 2018-03-30 北京创昱科技有限公司 一种真空镀膜用集成腔室
CN112538603A (zh) * 2019-09-23 2021-03-23 宝山钢铁股份有限公司 一种可连续填料的真空镀膜装置及其连续填料方法
JP7346329B2 (ja) * 2020-02-28 2023-09-19 株式会社アルバック 材料供給装置
CN115279935A (zh) * 2020-03-26 2022-11-01 应用材料公司 蒸发源、具有蒸发源的沉积设备及其方法
CN112011763A (zh) * 2020-08-05 2020-12-01 Tcl华星光电技术有限公司 蒸镀设备及其补料方法
CN119465389A (zh) * 2024-11-17 2025-02-18 江苏布里其曼科技股份有限公司 一种基于固态前驱体蒸发的气相沉积法晶体制备装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3542613A1 (de) * 1985-12-03 1987-06-04 Licentia Gmbh Nachfuellvorrichtung fuer eine verdampfungsquelle in einer vakuumkammer
JP2003297564A (ja) * 2002-03-29 2003-10-17 Matsushita Electric Ind Co Ltd 蒸着装置、及び成膜の製造方法
EP1357200A1 (de) * 2002-04-25 2003-10-29 Eastman Kodak Company Thermische PVD Vorrichtung mit abnehmbarer(n) Dampfquelle(n)
US20030221620A1 (en) * 2002-06-03 2003-12-04 Semiconductor Energy Laboratory Co., Ltd. Vapor deposition device
WO2005107392A2 (en) * 2004-04-30 2005-11-17 Eastman Kodak Company System for vaporizing materials onto substrate surface

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08269696A (ja) * 1995-03-28 1996-10-15 Nisshin Steel Co Ltd Ｍｇの蒸発方法
JPH1161386A (ja) * 1997-08-22 1999-03-05 Fuji Electric Co Ltd 有機薄膜発光素子の成膜装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3542613A1 (de) * 1985-12-03 1987-06-04 Licentia Gmbh Nachfuellvorrichtung fuer eine verdampfungsquelle in einer vakuumkammer
JP2003297564A (ja) * 2002-03-29 2003-10-17 Matsushita Electric Ind Co Ltd 蒸着装置、及び成膜の製造方法
EP1357200A1 (de) * 2002-04-25 2003-10-29 Eastman Kodak Company Thermische PVD Vorrichtung mit abnehmbarer(n) Dampfquelle(n)
US20030221620A1 (en) * 2002-06-03 2003-12-04 Semiconductor Energy Laboratory Co., Ltd. Vapor deposition device
WO2005107392A2 (en) * 2004-04-30 2005-11-17 Eastman Kodak Company System for vaporizing materials onto substrate surface

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 2003, no. 12 5 December 2003 (2003-12-05) *

Also Published As

Publication number Publication date
WO2005106066A2 (de) 2005-11-10
JP2007534844A (ja) 2007-11-29
DE102004041846A1 (de) 2005-11-24
CN1946872B (zh) 2012-07-18
EP1743046A2 (de) 2007-01-17
CA2564269A1 (en) 2005-11-10
CN1946872A (zh) 2007-04-11
US20080193636A1 (en) 2008-08-14
KR100892474B1 (ko) 2009-04-10
DE102004041846B4 (de) 2007-08-02
KR20070011544A (ko) 2007-01-24

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