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WO2003046615A1 - Precursor composition for optical resin, resin for optical use, optical element, and optical article - Google Patents

Precursor composition for optical resin, resin for optical use, optical element, and optical article Download PDF

Info

Publication number
WO2003046615A1
WO2003046615A1 PCT/JP2002/012602 JP0212602W WO03046615A1 WO 2003046615 A1 WO2003046615 A1 WO 2003046615A1 JP 0212602 W JP0212602 W JP 0212602W WO 03046615 A1 WO03046615 A1 WO 03046615A1
Authority
WO
WIPO (PCT)
Prior art keywords
optical
resin
precursor composition
article
optical element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2002/012602
Other languages
English (en)
French (fr)
Inventor
Toru Nakamura
Akiko Miyakawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to AU2002354152A priority Critical patent/AU2002354152A1/en
Priority to EP02785996A priority patent/EP1455200A4/en
Priority to US10/497,083 priority patent/US7553544B2/en
Priority to JP2003547999A priority patent/JP4238729B2/ja
Publication of WO2003046615A1 publication Critical patent/WO2003046615A1/ja
Anticipated expiration legal-status Critical
Priority to US12/495,757 priority patent/US7923116B2/en
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
    • Y10T428/31645—Next to addition polymer from unsaturated monomers
    • Y10T428/31649—Ester, halide or nitrile of addition polymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
PCT/JP2002/012602 2001-11-30 2002-12-02 Precursor composition for optical resin, resin for optical use, optical element, and optical article Ceased WO2003046615A1 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
AU2002354152A AU2002354152A1 (en) 2001-11-30 2002-12-02 Precursor composition for optical resin, resin for optical use, optical element, and optical article
EP02785996A EP1455200A4 (en) 2001-11-30 2002-12-02 OPTICAL RESIN PRECURSOR COMPOSITION, OPTICAL USE RESIN, OPTICAL ELEMENT AND ARTICLE
US10/497,083 US7553544B2 (en) 2001-11-30 2002-12-02 Precursor composition for optical resin, resin for optical use, optical element, and optical article
JP2003547999A JP4238729B2 (ja) 2001-11-30 2002-12-02 密着複層型回折光学素子
US12/495,757 US7923116B2 (en) 2001-11-30 2009-06-30 Optic-purpose precursor composition, optic-purpose resin, optical element, and optical article

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2001365559 2001-11-30
JP2001-365559 2001-11-30
JP2002-83990 2002-03-25
JP2002083990 2002-03-25

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US10497083 A-371-Of-International 2002-12-02
US12/495,757 Continuation US7923116B2 (en) 2001-11-30 2009-06-30 Optic-purpose precursor composition, optic-purpose resin, optical element, and optical article

Publications (1)

Publication Number Publication Date
WO2003046615A1 true WO2003046615A1 (en) 2003-06-05

Family

ID=26624777

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/012602 Ceased WO2003046615A1 (en) 2001-11-30 2002-12-02 Precursor composition for optical resin, resin for optical use, optical element, and optical article

Country Status (6)

Country Link
US (2) US7553544B2 (ja)
EP (1) EP1455200A4 (ja)
JP (2) JP4238729B2 (ja)
CN (1) CN100454042C (ja)
AU (1) AU2002354152A1 (ja)
WO (1) WO2003046615A1 (ja)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004051941A (ja) * 2002-05-31 2004-02-19 Jsr Corp 光硬化性組成物および光学部材
JP2005532431A (ja) * 2002-06-11 2005-10-27 ビーエーエスエフ アクチェンゲゼルシャフト ポリアルコキシル化されたグリセリンの（メタ）アクリルエステル
JP2006113588A (ja) * 2004-10-13 2006-04-27 Schott Ag ビーム形成複合材
JPWO2004113971A1 (ja) * 2003-06-19 2006-08-03 株式会社ニコン 光学素子
EP1677128A4 (en) * 2003-09-30 2007-10-10 Nikon Corp Bending optical device and method of making a diffractive optical device
JP2007314791A (ja) * 2006-05-24 2007-12-06 Lg Phillips Lcd Co Ltd パターン形成用レジン組成物及びこれを利用するインプレーンプリンティング工程方法
JP2010055052A (ja) * 2008-07-30 2010-03-11 Hitachi Chem Co Ltd 感光性樹脂組成物、並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
WO2011007558A1 (ja) * 2009-07-16 2011-01-20 パナソニック株式会社 複合光学素子、ならびに当該複合光学素子を備えた撮像装置および光学式記録再生装置
JP2011126991A (ja) * 2009-12-17 2011-06-30 Kyoeisha Chem Co Ltd 光学材料用樹脂組成物
JP4872671B2 (ja) * 2004-12-20 2012-02-08 株式会社ニコン 密着複層型回折光学素子
WO2012020763A1 (ja) * 2010-08-11 2012-02-16 積水化学工業株式会社 硬化性組成物及び透明複合シート
JP2012072316A (ja) * 2010-09-29 2012-04-12 Sekisui Chem Co Ltd 硬化性組成物及び透明複合シート
WO2013047079A1 (ja) * 2011-09-30 2013-04-04 ペンタックスリコーイメージング株式会社 複合光学素子及び撮影光学系
WO2017038979A1 (ja) * 2015-09-03 2017-03-09 三菱瓦斯化学株式会社 化合物及びその製造方法、並びに、組成物、光学部品形成用組成物、リソグラフィー用膜形成組成物、レジスト組成物、レジストパターンの形成方法、感放射線性組成物、アモルファス膜の製造方法、リソグラフィー用下層膜形成材料、リソグラフィー用下層膜形成用組成物、リソグラフィー用下層膜の製造方法、レジストパターン形成方法、回路パターン形成方法、及び、精製方法
JPWO2018016614A1 (ja) * 2016-07-21 2019-05-09 三菱瓦斯化学株式会社 化合物、樹脂、組成物及びパターン形成方法
JP2019151809A (ja) * 2018-03-06 2019-09-12 株式会社タムロン 光学素子形成用樹脂組成物及び光学素子

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WO2003046615A1 (en) * 2001-11-30 2003-06-05 Nikon Corporation Precursor composition for optical resin, resin for optical use, optical element, and optical article
US20080094712A1 (en) * 2004-12-20 2008-04-24 Nikon Corporation Close-Bonded Diffractive Optical Element, Optical Material Used Therefore, Resin Precursor And Resin Precursor Composition
KR101174180B1 (ko) * 2005-02-22 2012-08-14 가부시키가이샤 니콘 회절 광학 소자
WO2008121465A1 (en) 2007-02-27 2008-10-09 3M Innovative Properties Company Brightness enhancing film comprising nanocomposite structure having improved crack resistance
US20080221291A1 (en) 2007-03-07 2008-09-11 3M Innovative Properties Company Microstructured optical films comprising biphenyl difunctional monomers
KR101494026B1 (ko) 2007-03-09 2015-02-16 쓰리엠 이노베이티브 프로퍼티즈 컴파니 미세구조화 광학 필름에 적합한 트라이페닐 단량체
JP5288321B2 (ja) * 2007-07-20 2013-09-11 株式会社ニコン 回折光学系
JP5109712B2 (ja) 2008-02-25 2012-12-26 株式会社ニコン 対物レンズ
WO2010148424A1 (en) * 2009-06-23 2010-12-29 Carl Zeiss Vision Australia Holdings Limited Thiourethane-based lens elements and processes for their production
WO2011007557A1 (ja) * 2009-07-16 2011-01-20 パナソニック株式会社 複合光学素子およびその製造方法、ならびに当該複合光学素子を備えた撮像装置および光学式記録再生装置
US20110024686A1 (en) * 2009-07-30 2011-02-03 Taiwan Textile Research Institute Composition and Process for Preparing Phosphorescent Masterbatch and Phosphorescent Article Containing the Same
JP5341679B2 (ja) * 2009-08-31 2013-11-13 株式会社日立製作所 半導体装置
JP5692804B2 (ja) * 2011-05-17 2015-04-01 日本化薬株式会社 光学レンズシート用エネルギー線硬化型樹脂組成物及びその硬化物
FR2993200B1 (fr) * 2012-07-13 2014-07-18 Saint Gobain Element transparent a reflexion diffuse comprenant une couche sol-gel
JP5940496B2 (ja) * 2012-09-26 2016-06-29 富士フイルム株式会社 半硬化物、硬化物およびそれらの製造方法、光学部品、硬化樹脂組成物ならびに化合物
JP6893083B2 (ja) 2015-11-09 2021-06-23 株式会社タムロン 密着積層型回折光学素子
CN108780166B (zh) 2016-04-11 2021-09-28 三菱瓦斯化学株式会社 复合衍射光学元件用的高折射率低色散树脂用组合物、和使用其的复合衍射光学元件
TWI660143B (zh) * 2016-10-13 2019-05-21 樺薪光電有限公司 車燈機構
JP6809540B2 (ja) 2017-01-17 2021-01-06 株式会社ニコン （メタ）アクリレート化合物、光学用樹脂添加剤、光学素子、及び光学装置
WO2021220512A1 (ja) * 2020-05-01 2021-11-04 株式会社ニコン 化合物、樹脂前駆体、硬化物、光学素子、光学系、カメラ用交換レンズ、光学装置、接合レンズ、及び接合レンズの製造方法
CN111929978A (zh) * 2020-10-15 2020-11-13 成都菲斯特科技有限公司 一种投影屏幕及投影系统

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5818601A (ja) * 1981-07-27 1983-02-03 Seiko Epson Corp 合成樹脂レンズ
JPH01108247A (ja) * 1987-10-20 1989-04-25 Mitsubishi Rayon Co Ltd 透明樹脂組成物
JPH0611607A (ja) * 1992-06-29 1994-01-21 Dainippon Printing Co Ltd 回折格子の製造方法
JPH0649152A (ja) * 1992-08-04 1994-02-22 Nippon Kayaku Co Ltd 樹脂組成物、透過型スクリーン用樹脂組成物及びその硬化物
JP2001305305A (ja) * 2000-04-26 2001-10-31 Omron Corp 耐光性マイクロレンズアレイ
US20010055157A1 (en) * 2000-04-20 2001-12-27 Takashi Shirasuna Zoom lens and optical equipment using the same

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60124607A (ja) * 1983-12-09 1985-07-03 Japan Synthetic Rubber Co Ltd シクロペンタジエン誘導体からなる重合体の製造方法
JPS63173001A (ja) * 1987-01-12 1988-07-16 Nippon Sheet Glass Co Ltd 光学用低分散樹脂組成物
JPH0768326B2 (ja) * 1989-10-09 1995-07-26 三井東圧化学株式会社 ウレタン系レンズ用樹脂の製造方法
JPH04366115A (ja) * 1991-06-12 1992-12-18 Nikon Corp 低屈折率高分散の光学用プラスチック
JP3717555B2 (ja) 1994-09-12 2005-11-16 オリンパス株式会社 回折光学素子
US5847877A (en) 1994-09-12 1998-12-08 Olympus Optical Co., Ltd. Diffractive optical element
US5694195A (en) * 1994-09-30 1997-12-02 Signet Armorlite, Inc. Polyester resin-based high index ophthalmic lenses having improved optical uniformity and/or tintability
KR100232996B1 (ko) * 1996-11-22 1999-12-01 안승균 카메라용 필터 조립체
KR19980049229A (ko) * 1996-12-19 1998-09-15 이대원 줌렌즈 광학계
CN1112594C (zh) * 1997-10-02 2003-06-25 旭硝子株式会社 折射率分布型光学树脂材料
JP2001235608A (ja) 2000-02-24 2001-08-31 Olympus Optical Co Ltd 回折光学素子の製造方法
WO2003046615A1 (en) * 2001-11-30 2003-06-05 Nikon Corporation Precursor composition for optical resin, resin for optical use, optical element, and optical article

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5818601A (ja) * 1981-07-27 1983-02-03 Seiko Epson Corp 合成樹脂レンズ
JPH01108247A (ja) * 1987-10-20 1989-04-25 Mitsubishi Rayon Co Ltd 透明樹脂組成物
JPH0611607A (ja) * 1992-06-29 1994-01-21 Dainippon Printing Co Ltd 回折格子の製造方法
JPH0649152A (ja) * 1992-08-04 1994-02-22 Nippon Kayaku Co Ltd 樹脂組成物、透過型スクリーン用樹脂組成物及びその硬化物
US20010055157A1 (en) * 2000-04-20 2001-12-27 Takashi Shirasuna Zoom lens and optical equipment using the same
JP2001305305A (ja) * 2000-04-26 2001-10-31 Omron Corp 耐光性マイクロレンズアレイ

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP1455200A4 *

Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004051941A (ja) * 2002-05-31 2004-02-19 Jsr Corp 光硬化性組成物および光学部材
JP2005532431A (ja) * 2002-06-11 2005-10-27 ビーエーエスエフ アクチェンゲゼルシャフト ポリアルコキシル化されたグリセリンの（メタ）アクリルエステル
JPWO2004113971A1 (ja) * 2003-06-19 2006-08-03 株式会社ニコン 光学素子
EP1635197A4 (en) * 2003-06-19 2007-10-10 Nikon Corp OPTICAL ELEMENT
CN100514091C (zh) * 2003-06-19 2009-07-15 株式会社尼康 光学元件
EP1677128A4 (en) * 2003-09-30 2007-10-10 Nikon Corp Bending optical device and method of making a diffractive optical device
JP2006113588A (ja) * 2004-10-13 2006-04-27 Schott Ag ビーム形成複合材
JP4872671B2 (ja) * 2004-12-20 2012-02-08 株式会社ニコン 密着複層型回折光学素子
JP2007314791A (ja) * 2006-05-24 2007-12-06 Lg Phillips Lcd Co Ltd パターン形成用レジン組成物及びこれを利用するインプレーンプリンティング工程方法
JP2010055052A (ja) * 2008-07-30 2010-03-11 Hitachi Chem Co Ltd 感光性樹脂組成物、並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
WO2011007558A1 (ja) * 2009-07-16 2011-01-20 パナソニック株式会社 複合光学素子、ならびに当該複合光学素子を備えた撮像装置および光学式記録再生装置
JP2011126991A (ja) * 2009-12-17 2011-06-30 Kyoeisha Chem Co Ltd 光学材料用樹脂組成物
WO2012020763A1 (ja) * 2010-08-11 2012-02-16 積水化学工業株式会社 硬化性組成物及び透明複合シート
JP4944277B2 (ja) * 2010-08-11 2012-05-30 積水化学工業株式会社 硬化物及び透明複合シート
JP2012072316A (ja) * 2010-09-29 2012-04-12 Sekisui Chem Co Ltd 硬化性組成物及び透明複合シート
WO2013047079A1 (ja) * 2011-09-30 2013-04-04 ペンタックスリコーイメージング株式会社 複合光学素子及び撮影光学系
WO2017038979A1 (ja) * 2015-09-03 2017-03-09 三菱瓦斯化学株式会社 化合物及びその製造方法、並びに、組成物、光学部品形成用組成物、リソグラフィー用膜形成組成物、レジスト組成物、レジストパターンの形成方法、感放射線性組成物、アモルファス膜の製造方法、リソグラフィー用下層膜形成材料、リソグラフィー用下層膜形成用組成物、リソグラフィー用下層膜の製造方法、レジストパターン形成方法、回路パターン形成方法、及び、精製方法
JPWO2017038979A1 (ja) * 2015-09-03 2018-08-16 三菱瓦斯化学株式会社 化合物及びその製造方法、並びに、組成物、光学部品形成用組成物、リソグラフィー用膜形成組成物、レジスト組成物、レジストパターンの形成方法、感放射線性組成物、アモルファス膜の製造方法、リソグラフィー用下層膜形成材料、リソグラフィー用下層膜形成用組成物、リソグラフィー用下層膜の製造方法、レジストパターン形成方法、回路パターン形成方法、及び、精製方法
US11067889B2 (en) 2015-09-03 2021-07-20 Mitsubishi Gas Chemical Company, Inc. Compound, composition, and method for producing same, underlayer film forming material for lithography, composition for underlayer film formation for lithography, and purification method
JP7212449B2 (ja) 2015-09-03 2023-01-25 三菱瓦斯化学株式会社 化合物及びその製造方法、並びに、組成物、光学部品形成用組成物、リソグラフィー用膜形成組成物、レジスト組成物、レジストパターンの形成方法、感放射線性組成物、アモルファス膜の製造方法、リソグラフィー用下層膜形成材料、リソグラフィー用下層膜形成用組成物、リソグラフィー用下層膜の製造方法、レジストパターン形成方法、回路パターン形成方法、及び、精製方法
JPWO2018016614A1 (ja) * 2016-07-21 2019-05-09 三菱瓦斯化学株式会社 化合物、樹脂、組成物及びパターン形成方法
JP7194355B2 (ja) 2016-07-21 2022-12-22 三菱瓦斯化学株式会社 化合物、樹脂、組成物及びパターン形成方法
JP2019151809A (ja) * 2018-03-06 2019-09-12 株式会社タムロン 光学素子形成用樹脂組成物及び光学素子

Also Published As

Publication number Publication date
JPWO2003046615A1 (ja) 2005-04-07
US20050014088A1 (en) 2005-01-20
JP5136358B2 (ja) 2013-02-06
JP2009079225A (ja) 2009-04-16
JP4238729B2 (ja) 2009-03-18
CN100454042C (zh) 2009-01-21
US7923116B2 (en) 2011-04-12
AU2002354152A1 (en) 2003-06-10
EP1455200A1 (en) 2004-09-08
CN1599870A (zh) 2005-03-23
US7553544B2 (en) 2009-06-30
EP1455200A4 (en) 2005-09-28
US20100060986A1 (en) 2010-03-11

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