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WO2002009890A1 - Procede pour former un film protecteur - Google Patents

Procede pour former un film protecteur Download PDF

Info

Publication number
WO2002009890A1
WO2002009890A1 PCT/JP2001/006509 JP0106509W WO0209890A1 WO 2002009890 A1 WO2002009890 A1 WO 2002009890A1 JP 0106509 W JP0106509 W JP 0106509W WO 0209890 A1 WO0209890 A1 WO 0209890A1
Authority
WO
WIPO (PCT)
Prior art keywords
protective film
forming protective
film
base
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2001/006509
Other languages
English (en)
French (fr)
Inventor
Minoru Kurisaki
Katsuyuki Sakamoto
Junichi Fukuzawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Clariant Japan KK
Original Assignee
Clariant Japan KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Clariant Japan KK filed Critical Clariant Japan KK
Priority to KR1020027003956A priority Critical patent/KR20020048420A/ko
Publication of WO2002009890A1 publication Critical patent/WO2002009890A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures

Landscapes

  • Materials For Photolithography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)
PCT/JP2001/006509 2000-07-28 2001-07-30 Procede pour former un film protecteur Ceased WO2002009890A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020027003956A KR20020048420A (ko) 2000-07-28 2001-07-30 보호막의 형성방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000-229338 2000-07-28
JP2000229338A JP2002035684A (ja) 2000-07-28 2000-07-28 保護膜の形成方法

Publications (1)

Publication Number Publication Date
WO2002009890A1 true WO2002009890A1 (fr) 2002-02-07

Family

ID=18722470

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2001/006509 Ceased WO2002009890A1 (fr) 2000-07-28 2001-07-30 Procede pour former un film protecteur

Country Status (5)

Country Link
JP (1) JP2002035684A (ja)
KR (1) KR20020048420A (ja)
CN (1) CN1386072A (ja)
TW (1) TW537933B (ja)
WO (1) WO2002009890A1 (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3994994B2 (ja) 2003-10-23 2007-10-24 セイコーエプソン株式会社 有機ｅｌ装置の製造方法、有機ｅｌ装置、電子機器
JP5151038B2 (ja) * 2006-02-16 2013-02-27 富士通株式会社 レジストカバー膜形成材料、レジストパターンの形成方法、半導体装置及びその製造方法
WO2009001466A1 (ja) 2007-06-28 2008-12-31 Fujitsu Microelectronics Limited 熱処理装置、及び半導体装置の製造方法
JP2013061647A (ja) 2011-09-09 2013-04-04 Rohm & Haas Electronic Materials Llc フォトリソグラフィ方法
TWI474112B (zh) * 2012-09-27 2015-02-21 Chi Mei Corp 感光性樹脂組成物、保護膜及具有保護膜的元件
TWI582536B (zh) 2014-10-31 2017-05-11 羅門哈斯電子材料有限公司 圖案形成方法
JP6134367B2 (ja) 2014-10-31 2017-05-24 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ フォトレジスト保護膜組成物
CN104530806A (zh) * 2014-12-19 2015-04-22 江南大学 一种高光泽、高流平性水性涂料助剂的制备方法及用途
CN115044323B (zh) * 2022-06-01 2024-01-09 广东莱尔新材料科技股份有限公司 一种可用于pvd工艺的耐高温保护膜及其制备方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0784369A (ja) * 1993-08-27 1995-03-31 E I Du Pont De Nemours & Co 水性現像可能なフレキソグラフ印刷板
JPH08245461A (ja) * 1995-03-08 1996-09-24 Sumitomo Chem Co Ltd テトラフェノール系化合物、その製法および用途
JPH09134005A (ja) * 1995-11-07 1997-05-20 Fuji Photo Film Co Ltd ポジ型フォトレジスト組成物
JPH11327137A (ja) * 1998-03-18 1999-11-26 Morton Internatl Inc ネガ型光画像形成性組成物
JP2000187326A (ja) * 1998-10-15 2000-07-04 Mitsui Chemicals Inc ポジ型感熱性樹脂組成物及びそれを用いたレジストパタ―ン形成方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0784369A (ja) * 1993-08-27 1995-03-31 E I Du Pont De Nemours & Co 水性現像可能なフレキソグラフ印刷板
JPH08245461A (ja) * 1995-03-08 1996-09-24 Sumitomo Chem Co Ltd テトラフェノール系化合物、その製法および用途
JPH09134005A (ja) * 1995-11-07 1997-05-20 Fuji Photo Film Co Ltd ポジ型フォトレジスト組成物
JPH11327137A (ja) * 1998-03-18 1999-11-26 Morton Internatl Inc ネガ型光画像形成性組成物
JP2000187326A (ja) * 1998-10-15 2000-07-04 Mitsui Chemicals Inc ポジ型感熱性樹脂組成物及びそれを用いたレジストパタ―ン形成方法

Also Published As

Publication number Publication date
CN1386072A (zh) 2002-12-18
TW537933B (en) 2003-06-21
KR20020048420A (ko) 2002-06-22
JP2002035684A (ja) 2002-02-05

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