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WO2002009890A1 - Method of forming protective film - Google Patents

Method of forming protective film Download PDF

Info

Publication number
WO2002009890A1
WO2002009890A1 PCT/JP2001/006509 JP0106509W WO0209890A1 WO 2002009890 A1 WO2002009890 A1 WO 2002009890A1 JP 0106509 W JP0106509 W JP 0106509W WO 0209890 A1 WO0209890 A1 WO 0209890A1
Authority
WO
WIPO (PCT)
Prior art keywords
protective film
forming protective
film
base
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2001/006509
Other languages
French (fr)
Japanese (ja)
Inventor
Minoru Kurisaki
Katsuyuki Sakamoto
Junichi Fukuzawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Clariant Japan KK
Original Assignee
Clariant Japan KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Clariant Japan KK filed Critical Clariant Japan KK
Priority to KR1020027003956A priority Critical patent/KR20020048420A/en
Publication of WO2002009890A1 publication Critical patent/WO2002009890A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures

Landscapes

  • Materials For Photolithography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)

Abstract

A method of forming a protective film which comprises applying a composition comprising a polymer and a solvent to a base to form a coating film and heating and curing the film in an inert gas atmosphere to thereby form a protective film on the base. The protective film thus formed can have excellent transparency. Also provided is an article having the protective film formed by the method.
PCT/JP2001/006509 2000-07-28 2001-07-30 Method of forming protective film Ceased WO2002009890A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020027003956A KR20020048420A (en) 2000-07-28 2001-07-30 Method of forming protective film

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000-229338 2000-07-28
JP2000229338A JP2002035684A (en) 2000-07-28 2000-07-28 Method for forming protective film

Publications (1)

Publication Number Publication Date
WO2002009890A1 true WO2002009890A1 (en) 2002-02-07

Family

ID=18722470

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2001/006509 Ceased WO2002009890A1 (en) 2000-07-28 2001-07-30 Method of forming protective film

Country Status (5)

Country Link
JP (1) JP2002035684A (en)
KR (1) KR20020048420A (en)
CN (1) CN1386072A (en)
TW (1) TW537933B (en)
WO (1) WO2002009890A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3994994B2 (en) 2003-10-23 2007-10-24 セイコーエプソン株式会社 Organic EL device manufacturing method, organic EL device, and electronic apparatus
JP5151038B2 (en) * 2006-02-16 2013-02-27 富士通株式会社 Resist cover film forming material, resist pattern forming method, semiconductor device and manufacturing method thereof
WO2009001466A1 (en) 2007-06-28 2008-12-31 Fujitsu Microelectronics Limited Heat treatment apparatus and process for producing semiconductor device
JP2013061647A (en) 2011-09-09 2013-04-04 Rohm & Haas Electronic Materials Llc Photolithographic method
TWI474112B (en) * 2012-09-27 2015-02-21 Chi Mei Corp Photosensitive resin composition, protecting film, and a device containing the protecting film
TWI582536B (en) 2014-10-31 2017-05-11 羅門哈斯電子材料有限公司 Pattern forming method
JP6134367B2 (en) 2014-10-31 2017-05-24 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ Photoresist protective film composition
CN104530806A (en) * 2014-12-19 2015-04-22 江南大学 Preparation method and application of high-golss and high-leveling-property water-based coating additive
CN115044323B (en) * 2022-06-01 2024-01-09 广东莱尔新材料科技股份有限公司 High-temperature-resistant protective film applicable to PVD (physical vapor deposition) process and preparation method thereof

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0784369A (en) * 1993-08-27 1995-03-31 E I Du Pont De Nemours & Co Flexographic printing plate can be hydraulically developed
JPH08245461A (en) * 1995-03-08 1996-09-24 Sumitomo Chem Co Ltd Tetraphenol compound, its manufacturing method and use
JPH09134005A (en) * 1995-11-07 1997-05-20 Fuji Photo Film Co Ltd Positive photoresist composition
JPH11327137A (en) * 1998-03-18 1999-11-26 Morton Internatl Inc Negative optical image forming compound
JP2000187326A (en) * 1998-10-15 2000-07-04 Mitsui Chemicals Inc Ultraviolet sensitive positive resin composition and resist pattern forming method by using same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0784369A (en) * 1993-08-27 1995-03-31 E I Du Pont De Nemours & Co Flexographic printing plate can be hydraulically developed
JPH08245461A (en) * 1995-03-08 1996-09-24 Sumitomo Chem Co Ltd Tetraphenol compound, its manufacturing method and use
JPH09134005A (en) * 1995-11-07 1997-05-20 Fuji Photo Film Co Ltd Positive photoresist composition
JPH11327137A (en) * 1998-03-18 1999-11-26 Morton Internatl Inc Negative optical image forming compound
JP2000187326A (en) * 1998-10-15 2000-07-04 Mitsui Chemicals Inc Ultraviolet sensitive positive resin composition and resist pattern forming method by using same

Also Published As

Publication number Publication date
CN1386072A (en) 2002-12-18
TW537933B (en) 2003-06-21
KR20020048420A (en) 2002-06-22
JP2002035684A (en) 2002-02-05

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