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WO2002055990A8 - Microfabrication process for electrospray ionization mass spectrometry emitters - Google Patents

Microfabrication process for electrospray ionization mass spectrometry emitters

Info

Publication number
WO2002055990A8
WO2002055990A8 PCT/US2002/000705 US0200705W WO02055990A8 WO 2002055990 A8 WO2002055990 A8 WO 2002055990A8 US 0200705 W US0200705 W US 0200705W WO 02055990 A8 WO02055990 A8 WO 02055990A8
Authority
WO
WIPO (PCT)
Prior art keywords
layer
photo resist
radiation
wafer
resist material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2002/000705
Other languages
French (fr)
Other versions
WO2002055990A3 (en
WO2002055990A2 (en
WO2002055990A9 (en
Inventor
Daniel R Knapp
Jin-Sung Kim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MUSC Foundation for Research and Development
Original Assignee
MUSC Foundation for Research and Development
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MUSC Foundation for Research and Development filed Critical MUSC Foundation for Research and Development
Priority to AU2002243506A priority Critical patent/AU2002243506A1/en
Publication of WO2002055990A2 publication Critical patent/WO2002055990A2/en
Publication of WO2002055990A3 publication Critical patent/WO2002055990A3/en
Publication of WO2002055990A9 publication Critical patent/WO2002055990A9/en
Publication of WO2002055990A8 publication Critical patent/WO2002055990A8/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • G01N30/02—Column chromatography
    • G01N30/62—Detectors specially adapted therefor
    • G01N30/72—Mass spectrometers
    • G01N30/7233—Mass spectrometers interfaced to liquid or supercritical fluid chromatograph
    • G01N30/724—Nebulising, aerosol formation or ionisation
    • G01N30/7266—Nebulising, aerosol formation or ionisation by electric field, e.g. electrospray
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/0013—Miniaturised spectrometers, e.g. having smaller than usual scale, integrated conventional components
    • H01J49/0018—Microminiaturised spectrometers, e.g. chip-integrated devices, Micro-Electro-Mechanical Systems [MEMS]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/16—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission
    • H01J49/165—Electrospray ionisation
    • H01J49/167—Capillaries and nozzles specially adapted therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • G01N30/02—Column chromatography
    • G01N30/60—Construction of the column
    • G01N30/6004—Construction of the column end pieces
    • G01N2030/6013—Construction of the column end pieces interfaces to detectors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • G01N30/02—Column chromatography
    • G01N30/60—Construction of the column
    • G01N30/6095—Micromachined or nanomachined, e.g. micro- or nanosize

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Dispersion Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Materials For Photolithography (AREA)
  • Micromachines (AREA)

Abstract

Microfabricated emitters for electrospray ionization mass spectrometry (ESI-MS) are produced using a soft lithography process. A substrate (6) is coated with a photo resist material (8). A photo mask (20) is positioned over the photo resist material (8) to selectively permit or prevent exposure of the photo resist material (8) to radiation, such as UV radiation. The resulting wafer is developed so that the portion of the photo resist that was not exposed to radiation is removed and the wafer forms a mold. Using a barrier or dam (10) on the photo resist patterned wafer, a suitable material such as polydimethylsiloxane (PDMS) is then prepared as a two-part material which is then poured over the wafer thus forming one layer of the emitter (18). The adjoining layer may be similarly formed with the top layer and bottom layer joined, such as by the application of oxygen plasma. The substrate may be coated with a second layer of photo resist material after radiation exposure of the first layer, but prior to development of the first layer, so as to provide more complex shapes.
PCT/US2002/000705 2001-01-11 2002-01-09 Microfabrication process for electrospray ionization mass spectrometry emitters Ceased WO2002055990A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2002243506A AU2002243506A1 (en) 2001-01-11 2002-01-09 Microfabrication process for electrospray ionization mass spectrometry emitters

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US26065501P 2001-01-11 2001-01-11
US60/260,655 2001-01-11

Publications (4)

Publication Number Publication Date
WO2002055990A2 WO2002055990A2 (en) 2002-07-18
WO2002055990A3 WO2002055990A3 (en) 2002-11-07
WO2002055990A9 WO2002055990A9 (en) 2002-12-27
WO2002055990A8 true WO2002055990A8 (en) 2003-02-27

Family

ID=22990074

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/000705 Ceased WO2002055990A2 (en) 2001-01-11 2002-01-09 Microfabrication process for electrospray ionization mass spectrometry emitters

Country Status (2)

Country Link
AU (1) AU2002243506A1 (en)
WO (1) WO2002055990A2 (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6803568B2 (en) 2001-09-19 2004-10-12 Predicant Biosciences, Inc. Multi-channel microfluidic chip for electrospray ionization
US7105810B2 (en) 2001-12-21 2006-09-12 Cornell Research Foundation, Inc. Electrospray emitter for microfluidic channel
US7007710B2 (en) 2003-04-21 2006-03-07 Predicant Biosciences, Inc. Microfluidic devices and methods
US7537807B2 (en) 2003-09-26 2009-05-26 Cornell University Scanned source oriented nanofiber formation
FR2862006B1 (en) * 2003-11-12 2006-01-27 Univ Lille Sciences Tech PLANAR ELECTRONEBULATING SOURCES ON THE MODEL OF A CALLIGRAPHIC FEATHER AND THEIR MANUFACTURE.
US20060060769A1 (en) 2004-09-21 2006-03-23 Predicant Biosciences, Inc. Electrospray apparatus with an integrated electrode
US7591883B2 (en) 2004-09-27 2009-09-22 Cornell Research Foundation, Inc. Microfiber supported nanofiber membrane
US10125052B2 (en) 2008-05-06 2018-11-13 Massachusetts Institute Of Technology Method of fabricating electrically conductive aerogels
US8785881B2 (en) 2008-05-06 2014-07-22 Massachusetts Institute Of Technology Method and apparatus for a porous electrospray emitter
US8207496B2 (en) * 2010-02-05 2012-06-26 Thermo Finnigan Llc Multi-needle multi-parallel nanospray ionization source for mass spectrometry
US10308377B2 (en) 2011-05-03 2019-06-04 Massachusetts Institute Of Technology Propellant tank and loading for electrospray thruster
US9669416B2 (en) 2013-05-28 2017-06-06 Massachusetts Institute Of Technology Electrospraying systems and associated methods
US10141855B2 (en) 2017-04-12 2018-11-27 Accion Systems, Inc. System and method for power conversion
WO2020236961A1 (en) 2019-05-21 2020-11-26 Accion Systems, Inc. Apparatus for electrospray emission
EP4200218A4 (en) 2020-08-24 2024-08-07 Accion Systems, Inc. PROPELLER DEVICE

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6087006A (en) * 1994-08-31 2000-07-11 Hitachi, Ltd. Surface-protecting film and resin-sealed semiconductor device having said film
US6033202A (en) * 1998-03-27 2000-03-07 Lucent Technologies Inc. Mold for non - photolithographic fabrication of microstructures
US6245227B1 (en) * 1998-09-17 2001-06-12 Kionix, Inc. Integrated monolithic microfabricated electrospray and liquid chromatography system and method
US6319634B1 (en) * 1999-03-12 2001-11-20 Corning Incorporated Projection lithography photomasks and methods of making

Also Published As

Publication number Publication date
WO2002055990A3 (en) 2002-11-07
AU2002243506A1 (en) 2002-07-24
WO2002055990A2 (en) 2002-07-18
WO2002055990A9 (en) 2002-12-27

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