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USD1103948S1 - Gas distribution plate - Google Patents

Gas distribution plate

Info

Publication number
USD1103948S1
USD1103948S1 US29/804,613 US202129804613F USD1103948S US D1103948 S1 USD1103948 S1 US D1103948S1 US 202129804613 F US202129804613 F US 202129804613F US D1103948 S USD1103948 S US D1103948S
Authority
US
United States
Prior art keywords
gas distribution
distribution plate
view
design
broken line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/804,613
Inventor
Dhritiman Subha Kashyap
Chaowei Wang
Prahallad IYENGAR
Kartik Shah
Sanjeev Baluja
Joseph AuBuchon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to US29/804,613 priority Critical patent/USD1103948S1/en
Priority to JP2022003334F priority patent/JP1729409S/en
Priority to TW111300840F priority patent/TWD223814S/en
Application granted granted Critical
Publication of USD1103948S1 publication Critical patent/USD1103948S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Description

FIG. 1 is a top-front isometric view of a gas distribution plate;
FIG. 2 is a top-rear isometric view of the gas distribution plate of FIG. 1 ;
FIG. 3 is a front view of the gas distribution plate of FIG. 1 ;
FIG. 4 is a rear view of the gas distribution plate of FIG. 1 ;
FIG. 5 is a left side view of the gas distribution plate of FIG. 1 ;
FIG. 6 is a right side view of the gas distribution plate of FIG. 1 ;
FIG. 7 is a top view of the gas distribution plate of FIG. 1 ;
FIG. 8 is a bottom view of the gas distribution plate of FIG. 1 ; and,
FIG. 9 is an enlarged view of area IX in FIG. 3 .
The broken lines in the drawings illustrate portions of the article that form no part of the claimed design.
The dot-dash broken line, shown in FIGS. 1, 3 and 9 , illustrates a claim boundary and forms no part of the claimed design. The darker line weight broken line shown in FIGS. 3 & 9 illustrates the boundary of the enlarged view identified by area IX, shown in FIG. 3 . The lighter line weight broken line forms no part of the claimed design.
The surfaces illustrated without any surface shading form no part of the claimed design.

Claims (1)

    CLAIM
  1. The ornamental design for a gas distribution plate, substantially as shown and described.
US29/804,613 2021-08-21 2021-08-21 Gas distribution plate Active USD1103948S1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US29/804,613 USD1103948S1 (en) 2021-08-21 2021-08-21 Gas distribution plate
JP2022003334F JP1729409S (en) 2021-08-21 2022-02-21 gas distribution plate
TW111300840F TWD223814S (en) 2021-08-21 2022-02-21 Gas distribution plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/804,613 USD1103948S1 (en) 2021-08-21 2021-08-21 Gas distribution plate

Publications (1)

Publication Number Publication Date
USD1103948S1 true USD1103948S1 (en) 2025-12-02

Family

ID=83931417

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/804,613 Active USD1103948S1 (en) 2021-08-21 2021-08-21 Gas distribution plate

Country Status (3)

Country Link
US (1) USD1103948S1 (en)
JP (1) JP1729409S (en)
TW (1) TWD223814S (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1037778S1 (en) * 2022-07-19 2024-08-06 Applied Materials, Inc. Gas distribution plate
USD1052548S1 (en) 2023-06-26 2024-11-26 Applied Materials, Inc. Gas diffuser

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USD699199S1 (en) * 2011-09-30 2014-02-11 Tokyo Electron Limited Electrode plate for a plasma processing apparatus
USD708651S1 (en) 2011-11-22 2014-07-08 Applied Materials, Inc. Electrostatic chuck
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USD724701S1 (en) * 2014-02-04 2015-03-17 ASM IP Holding, B.V. Shower plate
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USD795208S1 (en) * 2015-08-18 2017-08-22 Tokyo Electron Limited Electrostatic chuck for semiconductor manufacturing equipment
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USD797690S1 (en) 2015-03-16 2017-09-19 Nuflare Technology, Inc. Heater for semiconductor manufacturing apparatus
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USD801942S1 (en) * 2015-04-16 2017-11-07 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
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US20180142352A1 (en) 2016-11-21 2018-05-24 Applied Materials, Inc. Two zone flow cooling plate design with concentric or spiral channel for efficient gas distribution assembly cooling
USD819580S1 (en) 2016-04-01 2018-06-05 Veeco Instruments, Inc. Self-centering wafer carrier for chemical vapor deposition
USD830981S1 (en) * 2017-04-07 2018-10-16 Asm Ip Holding B.V. Susceptor for semiconductor substrate processing apparatus
USD836572S1 (en) * 2016-09-30 2018-12-25 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
TWM576592U (en) 2017-04-27 2019-04-11 美商應用材料股份有限公司 Gas distribution plate and processing chamber including the same
USD851613S1 (en) * 2017-10-05 2019-06-18 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
JP1640252S (en) 2018-03-09 2019-09-02
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USD864134S1 (en) * 2018-10-24 2019-10-22 Asm Ip Holding B.V. Susceptor
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USD868993S1 (en) * 2017-08-31 2019-12-03 Hitachi High-Technologies Corporation Electrode plate for a plasma processing apparatus
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USD982216S1 (en) * 2019-07-05 2023-03-28 Livingstyle Enterprises Limited Light guiding plate having v-shaped notches
USD984895S1 (en) * 2020-12-22 2023-05-02 Applied Materials, Inc. Packaging insert for a process chamber component
USD984972S1 (en) * 2021-03-29 2023-05-02 Beijing Naura Microelectronics Equipment Co., Ltd. Electrostatic chuck for semiconductor manufacture
USD1008986S1 (en) * 2021-04-26 2023-12-26 Hitachi High-Tech Corporation Ion shield plate for plasma processing apparatus
USD1012051S1 (en) 2019-06-17 2024-01-23 Tokyo Electron Limited Electrostatic chuck for semiconductor manufacturing device
USD1035598S1 (en) * 2020-09-02 2024-07-16 Applied Materials, Inc. Gas distribution plate for a semiconductor processing chamber
USD1037778S1 (en) * 2022-07-19 2024-08-06 Applied Materials, Inc. Gas distribution plate
USD1052548S1 (en) * 2023-06-26 2024-11-26 Applied Materials, Inc. Gas diffuser
USD1071103S1 (en) * 2022-04-11 2025-04-15 Applied Materials, Inc. Gas distribution plate
USD1073913S1 (en) * 2021-11-26 2025-05-06 Tomoegawa Corporation Heat exchange plate
USD1085029S1 (en) * 2022-07-19 2025-07-22 Applied Materials, Inc. Gas distribution plate
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USD411516S (en) * 1996-03-15 1999-06-29 Tokyo Electron Limited Gas diffusion plate for electrode of semiconductor wafer processing apparatus
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USD407073S (en) * 1997-12-24 1999-03-23 Applied Materials, Inc. Electrostatic chuck with improved spacing and charge migration reduction mask
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USD548705S1 (en) * 2005-09-29 2007-08-14 Tokyo Electron Limited Attracting disc for an electrostatic chuck for semiconductor production
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USD587222S1 (en) * 2006-08-01 2009-02-24 Tokyo Electron Limited Attracting plate of an electrostatic chuck for semiconductor manufacturing
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USD614593S1 (en) * 2008-07-21 2010-04-27 Asm Genitech Korea Ltd Substrate support for a semiconductor deposition apparatus
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Non-Final Office Action in U.S. Appl. No. 29/804,614 dated Mar. 27, 2024, 17 pages.

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