USD708651S1 - Electrostatic chuck - Google Patents
Electrostatic chuck Download PDFInfo
- Publication number
- USD708651S1 USD708651S1 US29/407,085 US201129407085F USD708651S US D708651 S1 USD708651 S1 US D708651S1 US 201129407085 F US201129407085 F US 201129407085F US D708651 S USD708651 S US D708651S
- Authority
- US
- United States
- Prior art keywords
- electrostatic chuck
- view
- color
- perspective
- enlarged partial
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
Images
Description
The patent or application file contains at least one drawing executed in color. Copies of this patent or patent application publication with color drawing(s) will be provided by the Office upon request and payment of the necessary fee.
The broken lines in the figures form no part of the claimed design.
The drawings are lined for color. The pattern on the surface of the claimed design represents the color copper.
Claims (1)
- The ornamental design for an electrostatic chuck, as shown and described.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/407,085 USD708651S1 (en) | 2011-11-22 | 2011-11-22 | Electrostatic chuck |
| TW102300097F TWD165013S (en) | 2011-11-22 | 2012-05-08 | Portion of electrostatic chuck |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/407,085 USD708651S1 (en) | 2011-11-22 | 2011-11-22 | Electrostatic chuck |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USD708651S1 true USD708651S1 (en) | 2014-07-08 |
Family
ID=51032253
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/407,085 Active USD708651S1 (en) | 2011-11-22 | 2011-11-22 | Electrostatic chuck |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | USD708651S1 (en) |
| TW (1) | TWD165013S (en) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD845770S1 (en) | 2017-01-10 | 2019-04-16 | Rockwood & Hines Glass Group Co. | Bottle |
| TWD213398S (en) | 2019-07-30 | 2021-08-21 | 美商應用材料股份有限公司 | Substrate support pedestal |
| USD936187S1 (en) | 2020-02-12 | 2021-11-16 | Applied Materials, Inc. | Gas distribution assembly lid |
| USD947802S1 (en) | 2020-05-20 | 2022-04-05 | Applied Materials, Inc. | Replaceable substrate carrier interfacing film |
| USD1037778S1 (en) | 2022-07-19 | 2024-08-06 | Applied Materials, Inc. | Gas distribution plate |
| USD1054388S1 (en) * | 2021-10-15 | 2024-12-17 | Shin-Etsu Chemical Co., Ltd. | Carrier substrate for handling |
| USD1066620S1 (en) | 2021-02-12 | 2025-03-11 | Applied Materials, Inc. | Patterned heater pedestal with groove extensions |
| USD1071103S1 (en) | 2022-04-11 | 2025-04-15 | Applied Materials, Inc. | Gas distribution plate |
| USD1085029S1 (en) | 2022-07-19 | 2025-07-22 | Applied Materials, Inc. | Gas distribution plate |
| USD1092578S1 (en) * | 2023-10-10 | 2025-09-09 | Guangzhou Avison Trading Co., Ltd. | Chuck set |
| USD1103948S1 (en) | 2021-08-21 | 2025-12-02 | Applied Materials, Inc. | Gas distribution plate |
Citations (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4724510A (en) * | 1986-12-12 | 1988-02-09 | Tegal Corporation | Electrostatic wafer clamp |
| US5055964A (en) * | 1990-09-07 | 1991-10-08 | International Business Machines Corporation | Electrostatic chuck having tapered electrodes |
| US5213349A (en) * | 1991-12-18 | 1993-05-25 | Elliott Joe C | Electrostatic chuck |
| US5350479A (en) * | 1992-12-02 | 1994-09-27 | Applied Materials, Inc. | Electrostatic chuck for high power plasma processing |
| US5382311A (en) * | 1992-12-17 | 1995-01-17 | Tokyo Electron Limited | Stage having electrostatic chuck and plasma processing apparatus using same |
| US5530616A (en) * | 1993-11-29 | 1996-06-25 | Toto Ltd. | Electrostastic chuck |
| US5539609A (en) * | 1992-12-02 | 1996-07-23 | Applied Materials, Inc. | Electrostatic chuck usable in high density plasma |
| US5671117A (en) * | 1994-02-28 | 1997-09-23 | Applied Materials Inc. | Electrostatic chuck |
| US5822171A (en) | 1994-02-22 | 1998-10-13 | Applied Materials, Inc. | Electrostatic chuck with improved erosion resistance |
| US5883778A (en) | 1994-02-28 | 1999-03-16 | Applied Materials, Inc. | Electrostatic chuck with fluid flow regulator |
| US6028762A (en) * | 1996-01-31 | 2000-02-22 | Kyocera Corporation | Electrostatic chuck |
| US6215642B1 (en) * | 1999-03-11 | 2001-04-10 | Nikon Corporation Of Japan | Vacuum compatible, deformable electrostatic chuck with high thermal conductivity |
| US6583980B1 (en) * | 2000-08-18 | 2003-06-24 | Applied Materials Inc. | Substrate support tolerant to thermal expansion stresses |
| US20030198004A1 (en) * | 2000-05-10 | 2003-10-23 | Ibiden Co., Ltd. | Electrostatic chuck |
| USD490827S1 (en) * | 2002-12-20 | 2004-06-01 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
| USD497171S1 (en) * | 2002-12-20 | 2004-10-12 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
| US20040233609A1 (en) * | 2002-12-26 | 2004-11-25 | Kazuto Yoshida | Electrostatic chuck and its manufacturing method |
| US20060221539A1 (en) * | 2005-03-31 | 2006-10-05 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
| USD534135S1 (en) * | 2003-09-16 | 2006-12-26 | Traad Monique | Electromagnetic shield |
| USD561206S1 (en) * | 2005-11-25 | 2008-02-05 | Momentive Performance Materials Inc. | Electrostatic chuck |
-
2011
- 2011-11-22 US US29/407,085 patent/USD708651S1/en active Active
-
2012
- 2012-05-08 TW TW102300097F patent/TWD165013S/en unknown
Patent Citations (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4724510A (en) * | 1986-12-12 | 1988-02-09 | Tegal Corporation | Electrostatic wafer clamp |
| US5055964A (en) * | 1990-09-07 | 1991-10-08 | International Business Machines Corporation | Electrostatic chuck having tapered electrodes |
| US5213349A (en) * | 1991-12-18 | 1993-05-25 | Elliott Joe C | Electrostatic chuck |
| US5350479A (en) * | 1992-12-02 | 1994-09-27 | Applied Materials, Inc. | Electrostatic chuck for high power plasma processing |
| US5539609A (en) * | 1992-12-02 | 1996-07-23 | Applied Materials, Inc. | Electrostatic chuck usable in high density plasma |
| US5382311A (en) * | 1992-12-17 | 1995-01-17 | Tokyo Electron Limited | Stage having electrostatic chuck and plasma processing apparatus using same |
| US5530616A (en) * | 1993-11-29 | 1996-06-25 | Toto Ltd. | Electrostastic chuck |
| US5822171A (en) | 1994-02-22 | 1998-10-13 | Applied Materials, Inc. | Electrostatic chuck with improved erosion resistance |
| US5671117A (en) * | 1994-02-28 | 1997-09-23 | Applied Materials Inc. | Electrostatic chuck |
| US5883778A (en) | 1994-02-28 | 1999-03-16 | Applied Materials, Inc. | Electrostatic chuck with fluid flow regulator |
| US6028762A (en) * | 1996-01-31 | 2000-02-22 | Kyocera Corporation | Electrostatic chuck |
| US6215642B1 (en) * | 1999-03-11 | 2001-04-10 | Nikon Corporation Of Japan | Vacuum compatible, deformable electrostatic chuck with high thermal conductivity |
| US20030198004A1 (en) * | 2000-05-10 | 2003-10-23 | Ibiden Co., Ltd. | Electrostatic chuck |
| US6583980B1 (en) * | 2000-08-18 | 2003-06-24 | Applied Materials Inc. | Substrate support tolerant to thermal expansion stresses |
| USD490827S1 (en) * | 2002-12-20 | 2004-06-01 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
| USD497171S1 (en) * | 2002-12-20 | 2004-10-12 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
| US20040233609A1 (en) * | 2002-12-26 | 2004-11-25 | Kazuto Yoshida | Electrostatic chuck and its manufacturing method |
| USD534135S1 (en) * | 2003-09-16 | 2006-12-26 | Traad Monique | Electromagnetic shield |
| US20060221539A1 (en) * | 2005-03-31 | 2006-10-05 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
| USD561206S1 (en) * | 2005-11-25 | 2008-02-05 | Momentive Performance Materials Inc. | Electrostatic chuck |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD845770S1 (en) | 2017-01-10 | 2019-04-16 | Rockwood & Hines Glass Group Co. | Bottle |
| TWD213398S (en) | 2019-07-30 | 2021-08-21 | 美商應用材料股份有限公司 | Substrate support pedestal |
| USD931240S1 (en) * | 2019-07-30 | 2021-09-21 | Applied Materials, Inc. | Substrate support pedestal |
| USD936187S1 (en) | 2020-02-12 | 2021-11-16 | Applied Materials, Inc. | Gas distribution assembly lid |
| USD947802S1 (en) | 2020-05-20 | 2022-04-05 | Applied Materials, Inc. | Replaceable substrate carrier interfacing film |
| USD1066620S1 (en) | 2021-02-12 | 2025-03-11 | Applied Materials, Inc. | Patterned heater pedestal with groove extensions |
| USD1103948S1 (en) | 2021-08-21 | 2025-12-02 | Applied Materials, Inc. | Gas distribution plate |
| USD1104086S1 (en) | 2021-08-21 | 2025-12-02 | Applied Materials, Inc. | Gas distribution plate |
| USD1054388S1 (en) * | 2021-10-15 | 2024-12-17 | Shin-Etsu Chemical Co., Ltd. | Carrier substrate for handling |
| USD1071103S1 (en) | 2022-04-11 | 2025-04-15 | Applied Materials, Inc. | Gas distribution plate |
| USD1085029S1 (en) | 2022-07-19 | 2025-07-22 | Applied Materials, Inc. | Gas distribution plate |
| USD1037778S1 (en) | 2022-07-19 | 2024-08-06 | Applied Materials, Inc. | Gas distribution plate |
| USD1092578S1 (en) * | 2023-10-10 | 2025-09-09 | Guangzhou Avison Trading Co., Ltd. | Chuck set |
Also Published As
| Publication number | Publication date |
|---|---|
| TWD165013S (en) | 2014-12-21 |
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