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TWD237730S - Collimator for use in a physical vapor deposition (pvd) chamber - Google Patents

Collimator for use in a physical vapor deposition (pvd) chamber Download PDF

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Publication number
TWD237730S
TWD237730S TW111300791F TW111300791F TWD237730S TW D237730 S TWD237730 S TW D237730S TW 111300791 F TW111300791 F TW 111300791F TW 111300791 F TW111300791 F TW 111300791F TW D237730 S TWD237730 S TW D237730S
Authority
TW
Taiwan
Prior art keywords
pvd
chamber
vapor deposition
physical vapor
collimator
Prior art date
Application number
TW111300791F
Other languages
Chinese (zh)
Inventor
萊克馬丁李
馬丁李 萊克
張富宏
富宏 張
仲蘭蘭
卡拉瑟帕蘭比爾奇索庫瑪
奇索庫瑪 卡拉瑟帕蘭比爾
Original Assignee
美商應用材料股份有限公司 (美國)
美商應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商應用材料股份有限公司 (美國), 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司 (美國)
Priority to TW111300791F priority Critical patent/TWD237730S/en
Publication of TWD237730S publication Critical patent/TWD237730S/en

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Abstract

【物品用途】;本設計係請求用於物理氣相沉積(PVD)腔室中的準直器之外觀設計。;【設計說明】;無。【Item Purpose】;This design is for the appearance design of a collimator used in a physical vapor deposition (PVD) chamber. ;【Design Description】;None.

Description

用於物理氣相沉積(PVD)腔室中的準直器 Collimators for use in physical vapor deposition (PVD) chambers

本設計係請求用於物理氣相沉積(PVD)腔室中的準直器之外觀設計。 This design is requesting the appearance design of a collimator used in a physical vapor deposition (PVD) chamber.

TW111300791F 2022-02-17 2022-02-17 Collimator for use in a physical vapor deposition (pvd) chamber TWD237730S (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW111300791F TWD237730S (en) 2022-02-17 2022-02-17 Collimator for use in a physical vapor deposition (pvd) chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW111300791F TWD237730S (en) 2022-02-17 2022-02-17 Collimator for use in a physical vapor deposition (pvd) chamber

Publications (1)

Publication Number Publication Date
TWD237730S true TWD237730S (en) 2025-04-21

Family

ID=95451196

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111300791F TWD237730S (en) 2022-02-17 2022-02-17 Collimator for use in a physical vapor deposition (pvd) chamber

Country Status (1)

Country Link
TW (1) TWD237730S (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD200242S (en) 2018-03-16 2019-10-11 美商應用材料股份有限公司 A collimator for use in a physical vapor deposition (pvd) chamber

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD200242S (en) 2018-03-16 2019-10-11 美商應用材料股份有限公司 A collimator for use in a physical vapor deposition (pvd) chamber

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