[go: up one dir, main page]

TWD227251S - Substrate support for a substrate processing chamber - Google Patents

Substrate support for a substrate processing chamber Download PDF

Info

Publication number
TWD227251S
TWD227251S TW111303298F TW111303298F TWD227251S TW D227251 S TWD227251 S TW D227251S TW 111303298 F TW111303298 F TW 111303298F TW 111303298 F TW111303298 F TW 111303298F TW D227251 S TWD227251 S TW D227251S
Authority
TW
Taiwan
Prior art keywords
substrate
processing chamber
support
substrate processing
design
Prior art date
Application number
TW111303298F
Other languages
Chinese (zh)
Inventor
梁志修
麥可史特林 傑克森
疆 呂
振雄 蔡
松下智治
黃祖濱
Original Assignee
美商應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD227251S publication Critical patent/TWD227251S/en

Links

Abstract

【物品用途】;本設計所請求之基板處理腔室用的基板支撐件係用於在基板處理腔室中支撐基板。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。[Use of article]; The substrate support for the substrate processing chamber requested by this design is used to support the substrate in the substrate processing chamber. ;[Design Description];The dotted line portion disclosed in the drawing is the part of this case that does not require design.

Description

基板處理腔室用的基板支撐件 Substrate supports for substrate processing chambers

本設計所請求之基板處理腔室用的基板支撐件係用於在基板處理腔室中支撐基板。 The substrate support member for the substrate processing chamber requested in this design is used to support the substrate in the substrate processing chamber.

圖式所揭露之虛線部分，為本案不主張設計之部分。 The dotted line parts revealed in the diagram are the parts that are not designed in this case.

TW111303298F 2022-01-20 2022-07-05 Substrate support for a substrate processing chamber TWD227251S (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/823,917 USD1071886S1 (en) 2022-01-20 2022-01-20 Substrate support for a substrate processing chamber
US29/823,917 2022-01-20

Publications (1)

Publication Number Publication Date
TWD227251S true TWD227251S (en) 2023-09-01

Family

ID=84601223

Family Applications (2)

Application Number Title Priority Date Filing Date
TW111303301F TWD227252S (en) 2022-01-20 2022-07-05 Substrate support for a substrate processing chamber
TW111303298F TWD227251S (en) 2022-01-20 2022-07-05 Substrate support for a substrate processing chamber

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW111303301F TWD227252S (en) 2022-01-20 2022-07-05 Substrate support for a substrate processing chamber

Country Status (3)

Country Link
US (1) USD1071886S1 (en)
JP (2) JP1733479S (en)
TW (2) TWD227252S (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD235071S (en) 2020-12-10 2024-12-01 日商紐富來科技股份有限公司 (日本) Top plate

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1101709S1 (en) * 2024-04-12 2025-11-11 Applied Materials, Inc. Process chamber shower head

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD214316S (en) 2019-08-28 2021-10-01 美商應用材料股份有限公司 Inner shield for a substrate processing chamber

Family Cites Families (56)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6382276B1 (en) * 2001-05-22 2002-05-07 Wolfcraft, Inc. Router table adapter base plate
US20040095738A1 (en) * 2002-11-15 2004-05-20 Der-Ming Juang Base plate for a light emitting diode chip
DE102005004312A1 (en) * 2005-01-31 2006-08-03 Aixtron Ag Gas distributor for a chemical vapor deposition or organic vapor phase deposition reactor is characterized in that process gases are distributed radially in a first plane and then circumferentially in a second plane
US7520969B2 (en) * 2006-03-07 2009-04-21 Applied Materials, Inc. Notched deposition ring
US20070283884A1 (en) * 2006-05-30 2007-12-13 Applied Materials, Inc. Ring assembly for substrate processing chamber
USD614593S1 (en) * 2008-07-21 2010-04-27 Asm Genitech Korea Ltd Substrate support for a semiconductor deposition apparatus
JP5457216B2 (en) * 2009-02-27 2014-04-02 キヤノンアネルバ株式会社 Substrate support apparatus, substrate transfer apparatus, and electrical device manufacturing method
USD616390S1 (en) * 2009-03-06 2010-05-25 Tokyo Electron Limited Quartz cover for manufacturing semiconductor wafers
US20110088566A1 (en) * 2009-10-15 2011-04-21 Deborah Ann Doxie Disposable base plate
US20120263569A1 (en) * 2011-04-14 2012-10-18 Scott Wayne Priddy Substrate holders and methods of substrate mounting
WO2014051153A1 (en) * 2012-09-28 2014-04-03 Hoya株式会社 Magnetic-disc glass substrate and magnetic disc
US20140235069A1 (en) * 2013-02-15 2014-08-21 Novellus Systems, Inc. Multi-plenum showerhead with temperature control
FR3002242B1 (en) * 2013-02-21 2015-04-03 Altatech Semiconductor CHEMICAL VAPOR DEPOSITION DEVICE
USD716742S1 (en) * 2013-09-13 2014-11-04 Asm Ip Holding B.V. Substrate supporter for semiconductor deposition apparatus
USD724553S1 (en) * 2013-09-13 2015-03-17 Asm Ip Holding B.V. Substrate supporter for semiconductor deposition apparatus
USD720838S1 (en) * 2014-02-04 2015-01-06 Asm Ip Holding B.V. Shower plate
USD724701S1 (en) * 2014-02-04 2015-03-17 ASM IP Holding, B.V. Shower plate
US20160002778A1 (en) * 2014-07-03 2016-01-07 Applied Materials, Inc. Substrate support with more uniform edge purge
US9888528B2 (en) * 2014-12-31 2018-02-06 Applied Materials, Inc. Substrate support with multiple heating zones
USD753269S1 (en) * 2015-01-09 2016-04-05 Asm Ip Holding B.V. Top plate
USD797067S1 (en) 2015-04-21 2017-09-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD798248S1 (en) 2015-06-18 2017-09-26 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD800782S1 (en) * 2015-11-09 2017-10-24 Eaton Corporation Drive plate
USD787458S1 (en) * 2015-11-18 2017-05-23 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
TWD178424S (en) * 2016-01-08 2016-09-21 Asm Ip Holding Bv Gas flow control plate for semiconductor manufacturing apparatus
USD834686S1 (en) * 2016-12-15 2018-11-27 Asm Ip Holding B.V. Shower plate
USD830981S1 (en) * 2017-04-07 2018-10-16 Asm Ip Holding B.V. Susceptor for semiconductor substrate processing apparatus
JP1624334S (en) * 2018-05-18 2019-02-12
USD948463S1 (en) * 2018-10-24 2022-04-12 Asm Ip Holding B.V. Susceptor for semiconductor substrate supporting apparatus
US11961723B2 (en) * 2018-12-17 2024-04-16 Applied Materials, Inc. Process kit having tall deposition ring for PVD chamber
TWI788618B (en) * 2019-01-25 2023-01-01 美商應用材料股份有限公司 Physical vapor deposition target assembly
JP1655453S (en) * 2019-06-17 2020-03-23
USD893441S1 (en) * 2019-06-28 2020-08-18 Applied Materials, Inc. Base plate for a processing chamber substrate support
USD931240S1 (en) * 2019-07-30 2021-09-21 Applied Materials, Inc. Substrate support pedestal
USD930782S1 (en) * 2019-08-22 2021-09-14 Asm Ip Holding B.V. Gas distributor
USD908645S1 (en) * 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD979524S1 (en) * 2020-03-19 2023-02-28 Applied Materials, Inc. Confinement liner for a substrate processing chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD1035598S1 (en) * 2020-09-02 2024-07-16 Applied Materials, Inc. Gas distribution plate for a semiconductor processing chamber
USD1038049S1 (en) * 2020-11-18 2024-08-06 Applied Materials, Inc. Cover ring for use in semiconductor processing chamber
USD947914S1 (en) * 2020-11-23 2022-04-05 Applied Materials, Inc. Base plate for a processing chamber substrate support
USD940765S1 (en) * 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
TWD235071S (en) * 2020-12-10 2024-12-01 日商紐富來科技股份有限公司 (日本) Top plate
USD928269S1 (en) * 2020-12-15 2021-08-17 Qilin Cheng Target
USD998758S1 (en) * 2020-12-28 2023-09-12 Shanghai Advanced Research Institute, Chinese Academy Of Science Sealing disc for sealing vacuum valve
USD1006768S1 (en) * 2021-01-07 2023-12-05 Solaero Technologies Corp. Semiconductor wafer for mosaic solar cell fabrication
JP1700776S (en) * 2021-03-04 2021-11-29 Substrate placement plate for substrate processing apparatus
TWD223375S (en) * 2021-03-29 2023-02-01 大陸商北京北方華創微電子裝備有限公司 Electrostatic chuck
USD1007449S1 (en) * 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1023959S1 (en) * 2021-05-11 2024-04-23 Asm Ip Holding B.V. Electrode for substrate processing apparatus
USD980813S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas flow control plate for substrate processing apparatus
USD980814S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas distributor for substrate processing apparatus
USD990441S1 (en) * 2021-09-07 2023-06-27 Asm Ip Holding B.V. Gas flow control plate
USD1038900S1 (en) * 2021-09-30 2024-08-13 Lam Research Corporation Showerhead for semiconductor processing
USD1038901S1 (en) * 2022-01-12 2024-08-13 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD1005974S1 (en) * 2022-05-19 2023-11-28 Asm Ip Holding B.V. Gas distributor for semiconductor manufacturing apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD214316S (en) 2019-08-28 2021-10-01 美商應用材料股份有限公司 Inner shield for a substrate processing chamber

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD235071S (en) 2020-12-10 2024-12-01 日商紐富來科技股份有限公司 (日本) Top plate

Also Published As

Publication number Publication date
USD1071886S1 (en) 2025-04-22
JP1733480S (en) 2022-12-28
JP1733479S (en) 2022-12-28
TWD227252S (en) 2023-09-01

Similar Documents

Publication Publication Date Title
TWD224469S (en) Base plate for a substrate support
TWD215398S (en) Process shield for a substrate processing chamber
TWD217686S (en) Deposition ring for a semiconductor processing chamber
TWD215402S (en) Deposition ring for a substrate processing chamber
TWD207742S (en) Process shield for a substrate processing chamber
TWD227498S (en) Gas distribution plate
TWD222669S (en) Cover ring for use in semiconductor processing chamber
TWD210894S (en) Process shield for a substrate processing chamber
TWD215401S (en) Process shield for a substrate processing chamber
TWD218475S (en) Earring
TWD230345S (en) Camera mount
TWD237732S (en) Target for a physical vapor deposition chamber
TWD211969S (en) A collimator for use in a physical vapor deposition (pvd) chamber
TWD213399S (en) Susceptor shaft
TWD224691S (en) Collimator for use in a physical vapor deposition (pvd) chamber
TWD227251S (en) Substrate support for a substrate processing chamber
TWD240712S (en) Portion of router
TWD226154S (en) Ornament
TWD227211S (en) Injector
TWD211584S (en) Lower shield for a substrate processing chamber
TWD227585S (en) Collimator for use in a physical vapor deposition (pvd) chamber
TWD225726S (en) Earring
TWD222584S (en) Earring
TWD224341S (en) Adjustable arm
TWD230836S (en) Controller unit