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USD979524S1 - Confinement liner for a substrate processing chamber - Google Patents

Confinement liner for a substrate processing chamber Download PDF

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Publication number
USD979524S1
USD979524S1 US29/728,614 US202029728614F USD979524S US D979524 S1 USD979524 S1 US D979524S1 US 202029728614 F US202029728614 F US 202029728614F US D979524 S USD979524 S US D979524S
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United States
Prior art keywords
processing chamber
substrate processing
confinement
liner
confinement liner
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
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US29/728,614
Inventor
Joseph Perry
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Applied Materials Inc
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Applied Materials Inc
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Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to US29/728,614 priority Critical patent/USD979524S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: PERRY, JOSEPH
Priority to TW109305178F priority patent/TWD215697S/en
Priority to TW109305178D01F priority patent/TWD215698S/en
Priority to JPD2021-5063F priority patent/JP1692414S/ja
Priority to JPD2020-20094F priority patent/JP1686347S/ja
Priority to US29/882,671 priority patent/USD1051867S1/en
Application granted granted Critical
Publication of USD979524S1 publication Critical patent/USD979524S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Description

FIG. 1 is a top isometric view of a confinement liner for a substrate processing chamber showing my new design;
FIG. 2 is a top plan view thereof;
FIG. 3 is a bottom plan view thereof;
FIG. 4 is a front elevation view thereof;
FIG. 5 is a rear elevation view thereof;
FIG. 6 is a left side elevation view thereof;
FIG. 7 is a right side elevation view thereof; and,
FIG. 8 is an enlarged cross sectional view taken along line 8-8 of FIG. 2 .
The broken lines shown in the drawings represent portions of a confinement liner for a substrate processing chamber that form no part of the claimed design.

Claims (1)

    CLAIM
  1. The ornamental design for a confinement liner for a substrate processing chamber, as shown and described.
US29/728,614 2020-03-19 2020-03-19 Confinement liner for a substrate processing chamber Active USD979524S1 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
US29/728,614 USD979524S1 (en) 2020-03-19 2020-03-19 Confinement liner for a substrate processing chamber
TW109305178F TWD215697S (en) 2020-03-19 2020-09-15 Confinement liner for a substrate processing chamber
TW109305178D01F TWD215698S (en) 2020-03-19 2020-09-15 Confinement liner for a substrate processing chamber
JPD2021-5063F JP1692414S (en) 2020-03-19 2020-09-19
JPD2020-20094F JP1686347S (en) 2020-03-19 2020-09-19
US29/882,671 USD1051867S1 (en) 2020-03-19 2023-01-17 Confinement liner for a substrate processing chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/728,614 USD979524S1 (en) 2020-03-19 2020-03-19 Confinement liner for a substrate processing chamber

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US29/882,671 Division USD1051867S1 (en) 2020-03-19 2023-01-17 Confinement liner for a substrate processing chamber

Publications (1)

Publication Number Publication Date
USD979524S1 true USD979524S1 (en) 2023-02-28

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US29/728,614 Active USD979524S1 (en) 2020-03-19 2020-03-19 Confinement liner for a substrate processing chamber
US29/882,671 Active USD1051867S1 (en) 2020-03-19 2023-01-17 Confinement liner for a substrate processing chamber

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JP (2) JP1692414S (en)
TW (2) TWD215697S (en)

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USD1034493S1 (en) * 2022-11-25 2024-07-09 Ap Systems Inc. Chamber wall liner for a semiconductor manufacturing apparatus
USD1049067S1 (en) * 2022-04-04 2024-10-29 Applied Materials, Inc. Ring for an anti-rotation process kit for a substrate processing chamber
USD1051867S1 (en) * 2020-03-19 2024-11-19 Applied Materials, Inc. Confinement liner for a substrate processing chamber
USD1066440S1 (en) * 2022-10-28 2025-03-11 Applied Materials, Inc. Process chamber pumping liner
USD1066275S1 (en) 2022-04-04 2025-03-11 Applied Materials, Inc. Baffle for anti-rotation process kit for substrate processing chamber
USD1071886S1 (en) * 2022-01-20 2025-04-22 Applied Materials, Inc. Substrate support for a substrate processing chamber
USD1073758S1 (en) * 2022-10-13 2025-05-06 Lam Research Corporation Baffle for substrate processing system
USD1086087S1 (en) * 2023-03-30 2025-07-29 Samsung Electronics Co., Ltd. CMP (chemical mechanical planarization) retaining ring
USD1100867S1 (en) * 2023-08-28 2025-11-04 Asm Ip Holding B.V. Vertical flow control ring
USD1103131S1 (en) * 2023-07-17 2025-11-25 Samsung Electronics Co., Ltd. CMP (chemical mechanical planarization) retaining ring
USD1103949S1 (en) * 2023-07-17 2025-12-02 Samsung Electronics Co., Ltd. CMP (chemical mechanical planarization) retaining ring

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USD1071103S1 (en) * 2022-04-11 2025-04-15 Applied Materials, Inc. Gas distribution plate
GB2635058A (en) 2022-07-08 2025-04-30 Tosoh Smd Inc Dynamic vacuum seal system for physical vapor deposition sputter applications
TWD233706S (en) 2023-10-27 2024-09-21 俊龍 吳 Nozzle pad

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USD766849S1 (en) * 2013-05-15 2016-09-20 Ebara Corporation Substrate retaining ring
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TWD197827S (en) 2017-12-19 2019-06-01 Ebara Corp Elastic film for semiconductor wafer polishing
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Cited By (11)

* Cited by examiner, † Cited by third party
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USD1051867S1 (en) * 2020-03-19 2024-11-19 Applied Materials, Inc. Confinement liner for a substrate processing chamber
USD1071886S1 (en) * 2022-01-20 2025-04-22 Applied Materials, Inc. Substrate support for a substrate processing chamber
USD1049067S1 (en) * 2022-04-04 2024-10-29 Applied Materials, Inc. Ring for an anti-rotation process kit for a substrate processing chamber
USD1066275S1 (en) 2022-04-04 2025-03-11 Applied Materials, Inc. Baffle for anti-rotation process kit for substrate processing chamber
USD1073758S1 (en) * 2022-10-13 2025-05-06 Lam Research Corporation Baffle for substrate processing system
USD1066440S1 (en) * 2022-10-28 2025-03-11 Applied Materials, Inc. Process chamber pumping liner
USD1034493S1 (en) * 2022-11-25 2024-07-09 Ap Systems Inc. Chamber wall liner for a semiconductor manufacturing apparatus
USD1086087S1 (en) * 2023-03-30 2025-07-29 Samsung Electronics Co., Ltd. CMP (chemical mechanical planarization) retaining ring
USD1103131S1 (en) * 2023-07-17 2025-11-25 Samsung Electronics Co., Ltd. CMP (chemical mechanical planarization) retaining ring
USD1103949S1 (en) * 2023-07-17 2025-12-02 Samsung Electronics Co., Ltd. CMP (chemical mechanical planarization) retaining ring
USD1100867S1 (en) * 2023-08-28 2025-11-04 Asm Ip Holding B.V. Vertical flow control ring

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Publication number Publication date
TWD215697S (en) 2021-12-01
JP1692414S (en) 2021-08-16
JP1686347S (en) 2021-05-31
TWD215698S (en) 2021-12-01
USD1051867S1 (en) 2024-11-19

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