TW201815863A - 活性酯組成物及其硬化物 - Google Patents
活性酯組成物及其硬化物 Download PDFInfo
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- TW201815863A TW201815863A TW106121200A TW106121200A TW201815863A TW 201815863 A TW201815863 A TW 201815863A TW 106121200 A TW106121200 A TW 106121200A TW 106121200 A TW106121200 A TW 106121200A TW 201815863 A TW201815863 A TW 201815863A
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- Prior art keywords
- compound
- active ester
- phenolic hydroxyl
- composition
- resin
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Classifications
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- C08L67/02—Polyesters derived from dicarboxylic acids and dihydroxy compounds
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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- C08G59/02—Polycondensates containing more than one epoxy group per molecule
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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- C08G59/621—Phenols
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
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- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
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- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
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- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
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- C08L2203/20—Applications use in electrical or conductive gadgets
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0326—Organic insulating material consisting of one material containing O
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Abstract
本發明提供一種硬化性高、且硬化物之低介電性等各個性能優異的活性酯組成物、其硬化物、使用上述活性酯組成物而成之半導體密封材料及印刷配線基板。本發明係一種活性酯組成物、其硬化物、使用上述活性酯組成物而成之半導體密封材料及印刷配線基板,該活性酯組成物其特徵在於:以活性酯化合物(A)與含酚性羥基之化合物(B)為必須成分,且,上述活性酯化合物(A)係分子結構中具有一個酚性羥基之化合物(a1)與芳香族多羧酸或其酸性鹵化物(acid halide)(a2)之酯化物。
Description
本發明係關於一種硬化性高、且硬化物之低介電性等各個性能優異的活性酯組成物、硬化性組成物與其硬化物、使用上述硬化性組成物而成之半導體密封材料及印刷配線基板。
於半導體或多層印刷基板等所使用之絕緣材料之技術領域中,隨著各種電子構件之薄型化或小型化,正謀求開發遵循該等市場動向之新的樹脂材料。例如,為了減少於訊號之高速化及高頻率化所伴隨之發熱能量損耗,正在進行硬化物之介電常數及低介電損耗正切都低的樹脂材料的開發。進一步,作為半導體密封材料所要求之性能,例如可列舉:為了提高回流性,高溫條件下之彈性模數較低;為了抑制半導體之薄型化所致之構件之「翹曲」而造成的可靠性降低,而硬化收縮率較低等。
作為硬化物之介電常數或介電損耗正切低之樹脂材料,已知有使用二(α-萘基)異酞酸酯(di(α-naphthyl)isophthalate)來作為環氧樹脂之硬化劑的技術(參照下述專利文獻1)。關於專利文獻1記載之環氧樹脂組成物,若將其與使用如苯酚酚醛清漆型樹脂之習知型態的環氧樹脂硬化劑之情形相比,則藉由使用二(α-萘基)異酞酸酯來作為環氧 樹脂硬化劑,硬化物之介電常數或介電損耗正切的值確實較低,但是由於硬化性較低、需要高溫且長時間之硬化,因此於工業上的利用時,在生產性降低或耗能之方面有其課題。
[先前技術文獻]
[專利文獻]
[專利文獻1]日本特開2003-82063號公報
因此,本發明所欲解決之課題在於提供一種硬化性高、且硬化物之低介電性等各個性能優異的活性酯組成物、硬化性組成物與其硬化物、使用上述硬化性組成物而成之半導體密封材料及印刷配線基板。
本發明人等為了解決上述課題進行了努力研究,結果發現如下組成物其硬化性高、且硬化物之低介電性等各個性能優異,從而完成了本發明;該組成物係:含有酯化物與含酚性羥基之化合物,該酯化物係含酚性羥基之化合物與芳香族多羧酸或其酸性鹵化物的酯化物。
即,本發明係關於一種活性酯組成物,其特徵在於:以活性酯化合物(A)與含酚性羥基之化合物(B)為必須成分,且,上述活性酯化合物(A)係分子結構中具有一個酚性羥基之化合物(a1)與芳香族多羧酸或其酸性鹵化物(a2)之酯化物。
本發明進而係關於一種硬化性組成物,其含有上述活性酯組成物、及硬化劑。
本發明進而係關於一種硬化物,其係上述硬化性組成物之硬化物。
本發明進而係關於一種半導體密封材料,其係使用上述硬化性組成物而成。
本發明進而係關於一種印刷配線基板,其係使用上述硬化性組成物而成。
根據本發明,可提供一種硬化性高、且硬化物之低介電性等各個性能優異的活性酯組成物、硬化性組成物與其硬化物、使用上述硬化性組成物而成之半導體密封材料及印刷配線基板。
以下,對本發明詳細地進行說明。
本發明之活性酯組成物其特徵在於:以活性酯化合物(A)與含酚性羥基之化合物(B)為必須成分,且,上述活性酯化合物(A)係分子結構中具有一個酚性羥基之化合物(a1)與芳香族多羧酸或其酸性鹵化物(acid halide)(a2)之酯化物。
上述活性酯化合物(A)只要為分子結構中具有一個酚性羥基之化合物(a1)與芳香族多羧酸或其酸性鹵化物(a2)的酯化物,則其具體結構並無特別限定,可使用各種具有多種分子結構的化合物。
上述分子結構中具有一個酚性羥基之化合物(a1)只要為芳香環上具有一個羥基之芳香族化合物,則可為任一化合物,其他具體結構並無特別限定。本發明中,於分子結構中具有一個酚性羥基之化合物(a1)可單獨使用一種,亦可併用兩種以上而使用。關於上述於分子結構中具有一個酚性羥基之化合物(a1),具體而言,可列舉:苯酚或苯酚之芳香核上具有一個至多個取代基之苯酚化合物;萘酚或萘酚之芳香核上具有一個至多個取代基之萘酚化合物;蒽酚或蒽酚之芳香核上具有一個至多個取代基之蒽酚化合物等。芳香核上之取代基例如可列舉:甲基、乙基、乙烯基、丙基、丁基、戊基、己基、環己基、庚基、辛基、壬基等脂肪族烴基;甲氧基、乙氧基、丙氧基、丁氧基等烷氧基;氟原子、氯原子、溴原子等鹵素原子;苯基、萘基、蒽基、及該等之芳香核上取代有上述脂肪族烴基或烷氧基、鹵素原子等之芳基;苯基甲基、苯基乙基、萘基甲基、萘基乙基、及該等之芳香核上取代有上述脂肪族烴基或烷氧基、鹵素原子等之芳烷基等。
該等之中,就可得到硬化收縮率小、高溫條件下之彈性模數低之硬化物此方面而言,較佳為苯酚化合物或萘酚化合物,更佳為苯酚、萘酚或其等之芳香核上具有一個至多個脂肪族烴基或芳基之化合物。
上述芳香族多羧酸或其酸性鹵化物(a2)只要為可與上述分子結構中具有一個酚性羥基之化合物(a1)所具有之酚性羥基反應而生 成酯鍵結的芳香族化合物,則具體結構並無特別限定,可為任一化合物。作為具體例,例如可列舉:間苯二甲酸、對苯二甲酸等苯二羧酸;1,2,4-苯三甲酸等苯三羧酸;萘-1,4-二羧酸、萘-2,3-二羧酸、萘-2,6-二羧酸、萘-2,7-二羧酸等萘二羧酸;該等之酸性鹵化物、及該等之芳香核上取代有上述脂肪族烴基或烷氧基、鹵素原子等之化合物等。酸性鹵化物例如可列舉:酸氯化物、酸溴化物、酸氟化物、酸碘化物等。該等可分別單獨使用,亦可併用2種以上。其中,就成為硬化時之收縮率及硬化物之高溫條件下的彈性模數皆低的活性酯組成物此方面而言,較佳為間苯二甲酸或對苯二甲酸等苯二羧酸或其酸性鹵化物。
由上可知,作為上述活性酯化合物(A)之較佳的具體結構,例如可列舉下述結構式(1)等。
(式中,R1分別獨立地為脂肪族烴基、烷氧基、鹵素原子、芳基、芳烷基中之任一者,m為0或1~7之整數)
上述分子結構中具有一個酚性羥基之化合物(a1)與上述芳香族多羧酸或其酸性鹵化物(a2)之反應例如可藉由下述方法來進行,即:於鹼觸媒之存在下,於40~65℃左右之溫度條件下進行加熱攪拌。反應亦可視需要於有機溶劑中進行。又,反應結束後亦可視需要藉由水洗或再沈澱等將反應產物進行純化。
上述鹼觸媒例如可列舉:氫氧化鈉、氫氧化鉀、三乙基胺、吡啶等。該等可分別單獨使用,亦可併用2種以上。又,亦可製成3.0~30%左右之水溶液而使用。其中,較佳為觸媒能較高之氫氧化鈉或氫氧化鉀。
上述有機溶劑例如可列舉:丙酮、甲基乙基酮、環己酮等酮溶劑;乙酸乙酯、乙酸丁酯、乙酸賽璐蘇、丙二醇單甲醚乙酸酯、卡必醇乙酸酯等乙酸酯溶劑;賽璐蘇、丁基卡必醇等卡必醇溶劑;甲苯、二甲苯等芳香族烴溶劑;二甲基甲醯胺、二甲基乙醯胺、N-甲基吡咯啶酮等。該等可分別單獨使用,亦可製成2種以上之混合溶劑。
就以高產率獲得目標之活性酯化合物(A)此方面而言,上述分子結構中具有一個酚性羥基之化合物(a1)與上述芳香族多羧酸或其酸性鹵化物(a2)之反應比例,較佳為相對於上述芳香族多羧酸或其酸性鹵化物(a2)所具有之羧基或醯鹵基之合計1莫耳,上述分子結構中具有一個酚性羥基之化合物(a1)成為0.95~1.05莫耳的比例。
上述活性酯化合物(A)之熔融黏度,較佳為依據ASTMD4287並利用ICI黏度計所測得之150℃下之值為0.01~5dPa‧s之範圍。
本發明之活性酯組成物,除了上述活性酯化合物(A),亦可含有其他活性酯化合物或樹脂。上述其他活性酯化合物或樹脂,例如可列舉以分子結構中具有一個酚性羥基之化合物(a3)、分子結構中具有兩個以上酚性羥基之化合物(a4)及芳香族多羧酸或其酸性鹵化物(a5)作為必須之反應原料的活性酯樹脂(A’)等。
關於上述活性酯樹脂(A’),上述分子結構中具有一個酚性羥基之化合物(a3)可列舉與上述分子結構中具有一個酚性羥基之化合物(a1)相同者。
上述分子結構中具有兩個以上酚性羥基之化合物(a4)例如可列舉:以與上述分子結構中具有一個酚性羥基之化合物(a1)相同之化合物作為反應原料之酚醛清漆型樹脂,或以與上述分子結構中具有一個酚性羥基之化合物(a1)相同之化合物和下述結構式(x-1)~(x-5)之任一者所表示之化合物(x)作為必須之反應原料的反應物等。化合物(a4)例如可藉由將上述化合物(a1)與化合物(x)在酸觸媒條件下、80~180℃左右之溫度條件下進行加熱攪拌之方法來製造。
[式中,h為0或1。R2分別獨立地為脂肪族烴基、烷氧基、鹵素原子、芳基、芳烷基之任一者,i為0或1~4之整數。Z為乙烯基、鹵甲 基、羥基甲基、烷氧基甲基之任一者。Y為碳原子數1~4之伸烷基、氧原子、硫原子、羰基之任一者。j為1~4之整數]
上述芳香族多羧酸或其酸性鹵化物(a5)可列舉與上述芳香族多羧酸或其酸性鹵化物(a2)相同者。
關於上述活性酯樹脂(A’),除了上述(a3)~(a5)成分以外,亦可進一步以其他化合物作為反應原料。其他化合物例如可列舉:用來導入脂肪族烴基、烷氧基、鹵素原子、芳基、芳烷基來作為活性酯樹脂(A2)中之芳香環上之取代基的取代基導入劑(a6)等。
製造上述活性酯樹脂(A’)之方法並無特別限定,例如可藉由如下方法進行,即:於鹼觸媒之存在下,於40~65℃左右之溫度條件下對包含上述(a3)~(a5)成分之反應原料進行加熱攪拌。反應亦可視需要於有機溶劑中進行。又,反應結束後亦可視需要藉由水洗或再沈澱等將反應產物進行純化。
上述鹼觸媒例如可列舉:氫氧化鈉、氫氧化鉀、三乙基胺、吡啶等。該等可分別單獨使用,亦可併用2種以上。又,亦可製成3.0~30%左右之水溶液而使用。其中,較佳為觸媒能較高之氫氧化鈉或氫氧化鉀。
上述有機溶劑例如可列舉:丙酮、甲基乙基酮、環己酮等酮溶劑;乙酸乙酯、乙酸丁酯、乙酸賽璐蘇、丙二醇單甲醚乙酸酯、卡必醇乙酸酯等乙酸酯溶劑;賽璐蘇、丁基卡必醇等卡必醇溶劑;甲苯、二甲苯等芳香族烴溶劑;二甲基甲醯胺、二甲基乙醯胺、N-甲基吡咯啶酮等。該等可分別單獨使用,亦可製成2種以上之混合溶劑。
上述分子結構中具有一個酚性羥基之化合物(a3)、上述分子結構中具有兩個以上酚性羥基之化合物(a4)、及上述芳香族多羧酸或其酸性鹵化物(a5)之反應比例可根據所欲之分子設計適當進行變更。其中,就成為溶劑溶解性較高且容易利用於各種用途之活性酯樹脂組成物此方面而言,較佳為上述分子結構中具有一個酚性羥基之化合物(a3)所具有之羥基之莫耳數(a3OH)與上述分子結構中具有兩個以上酚性羥基之化合物(a4)所具有之羥基之莫耳數(a4OH)之比例[(a3OH)/(a4OH)]成為10/90~75/25之比例,更佳為成為25/75~50/50之比例。
又,較佳為相對於芳香族多羧酸或其酸性鹵化物(a5)所具有之羧基或鹵化醯基之合計1莫耳,上述分子結構中具有一個酚性羥基之化合物(a3)所具有之羥基之莫耳數與上述分子結構中具有兩個以上酚性羥基之化合物(a4)所具有之羥基之莫耳數之合計成為0.95~1.05莫耳的比例。
活性酯樹脂(A’)較佳為其重量平均分子量(Mw)在600~5,000之範圍,特佳為在800~3,000之範圍。再者,活性酯樹脂(A’)之重量平均分子量(Mw)係利用下述條件之GPC所測定之值。
測定裝置:Tosoh股份有限公司製造之「HLC-8320GPC」、管柱:Tosoh股份有限公司製造之保護管柱「HXL-L」+Tosoh股份有限公司製造之「TSK-GEL G4000HXL」+Tosoh股份有限公司製造之「TSK-GEL G3000HXL」+Tosoh股份有限公司製造之「TSK-GEL G2000HXL」 +Tosoh股份有限公司製造之「TSK-GEL G2000HXL」
檢測器:RI(示差折射計)
資料處理:Tosoh股份有限公司製造之「GPC工作站EcoSEC-WorkStation」
測定條件:管柱溫度40℃
展開溶劑:四氫呋喃
流速:1.0ml/分鐘
標準:依據上述「GPC-8320」之測定手冊,使用分子量已知之下述單分散聚苯乙烯。
(使用聚苯乙烯)
Tosoh股份有限公司製造之「A-500」
Tosoh股份有限公司製造之「A-1000」
Tosoh股份有限公司製造之「A-2500」
Tosoh股份有限公司製造之「A-5000」
Tosoh股份有限公司製造之「F-1」
Tosoh股份有限公司製造之「F-2」
Tosoh股份有限公司製造之「F-4」
Tosoh股份有限公司製造之「F-10」
Tosoh股份有限公司製造之「F-20」
Tosoh股份有限公司製造之「F-40」
Tosoh股份有限公司製造之「F-80」
Tosoh股份有限公司製造之「F-128」
試樣:將以樹脂固形物成分換算計1.0質量%之四氫呋喃溶液利用微過濾器進行過濾而得者(50μl)
又,上述活性酯樹脂(A’)之軟化點係基於JIS K7234測定之值且較佳為100~180℃之範圍,更佳為120~170℃之範圍。
本發明之活性酯組成物在一併含有上述活性酯化合物(A)與上述活性酯樹脂(A’)之情形時,就成為硬化時之收縮率及硬化物之高溫條件下的彈性模數皆低之活性酯組成物此方面而言,上述活性酯化合物(A)相對於兩者之合計之比例,較佳為40~99質量%之範圍,更佳為50~99質量%之範圍,特佳為65~99質量%之範圍。
上述含酚性羥基之化合物(B)只要為分子結構中具有一個至多個酚性羥基之化合物,則其具體結構或分子量、羥基當量等並無特別限定,可使用各式各樣之化合物。
作為上述含酚性羥基之化合物(B),例如可列舉:於苯、萘、蔥骨架上具有一個至多個酚性羥基之含酚性羥基之單分子化合物(B1),或以上述含酚性羥基之單分子化合物(B1)作為反應原料之含酚性羥基之樹脂(B2)等。
關於上述含酚性羥基之單分子化合物(B1),就成為硬化性與硬化物之低介電性等各個性能之平衡上優異之活性酯組成物此方面而言,一分子中之酚性羥基之數量較佳為1~3之範圍。也就是說,上述含酚性羥基的含酚性羥基之單分子化合物(B1)可列舉:苯酚、二羥苯、三羥苯、萘酚、二羥萘、三羥萘、蒽酚、二羥基蒽、三羥基蒽、於其等之芳香核上具有一個至多個取代基之化合物。芳香核上之取代基例如可列舉: 甲基、乙基、乙烯基、丙基、丁基、戊基、己基、環己基、庚基、辛基、壬基等脂肪族烴基;甲氧基、乙氧基、丙氧基、丁氧基等烷氧基;氟原子、氯原子、溴原子等鹵素原子;苯基、萘基、蒽基、及該等之芳香核上取代有上述脂肪族烴基或烷氧基、鹵素原子等之芳基;苯基甲基、苯基乙基、萘基甲基、萘基乙基、及該等之芳香核上取代有上述脂肪族烴基或烷氧基、鹵素原子等之芳烷基等。該等之中,就成為硬化性與硬化物之低介電性等各個性能之平衡上優異之活性酯組成物此方面而言,較佳為苯酚、二羥苯、三羥苯、萘酚、二羥萘、三羥萘、蒽酚、二羥基蒽、三羥基蒽中之任一化合物。
含酚性羥基之樹脂(B2)例如可列舉:上述含酚性羥基之單分子化合物(B1)與醛化合物之縮合反應物即酚醛清漆型樹脂,或以上述含酚性羥基之單分子化合物(B1)與上述結構式(x-1)~(x-5)之任一者所表示之化合物(x)作為必須之反應原料的反應物等。
關於上述含酚性羥基之單分子化合物(B1)與醛化合物之縮合反應物即酚醛清漆型樹脂,所使用之醛化合物除了甲醛之外,可列舉乙醛等烷基醛、苯甲醛等芳香族醛等。上述含酚性羥基之單分子化合物(B1)與醛化合物之反應比例可根據所欲之分子量等來進行適當調整,例如較佳為在「相對於上述含酚性羥基之單分子化合物(B1)1莫耳,醛化合物為0.01~0.9莫耳」之範圍使用。該酚醛清漆型樹脂可利用與一般之苯酚酚醛清漆型樹脂相同的方法來製造,例如可藉由下述方法來製造,即:由於酸觸媒條件下,視需要使用有機溶劑,於80~180℃左右之溫度條件下進行加熱攪拌。上述酚醛清漆型樹脂之羥基當量較佳為100~250g /當量之範圍,軟化點較佳為60~130℃之範圍。
以上述含酚性羥基之單分子化合物(B1)與上述結構式(x-1)~(x-5)之任一者所表示之化合物(x)作為必須之反應原料的反應物例如可藉由下述方法來製造,即:於酸觸媒條件下,視需要使用有機溶劑,於80~180℃左右之溫度條件下將上述含酚性羥基之單分子化合物(B1)與上述化合物(x)進行加熱攪拌。所得到之反應物之羥基當量較佳為150~300g/當量之範圍,軟化點較佳為60~150℃之範圍。以上述含酚性羥基之單分子化合物(B1)與上述結構式(x-1)~(x-5)之任一者所表示之化合物(x)作為必須之反應原料的反應物之中,使用上述結構式(x-2)所表示者來作為化合物(x)而得到者,為相當於通常被稱作為苯酚芳烷基樹脂等者。又,使用上述結構式(x-3)所表示者來作為化合物(x)而得到者,為相當於通常被稱作為聯苯芳烷基樹脂等者。
於本發明之活性酯組成物中,上述活性酯化合物(A)與上述含酚性羥基之化合物(B)之摻合比例係根據所欲之硬化性或硬化物的物性來進行適當調整,特別是,就硬化性與硬化物之物性之平衡優異此方面而言,較佳為相對於上述活性酯化合物(A)100質量份,以0.1~300質量份之範圍含有上述含酚性羥基之化合物(B)。進一步,於使用上述含酚性羥基之單分子化合物(B1)作為上述含酚性羥基之化合物(B)之情形時,較佳為相對於上述活性酯化合物(A)100質量份,以0.1~50質量份之範圍含有上述含酚性羥基之單分子化合物(B1),較佳為以0.5~20質量份之範圍含有上述含酚性羥基之單分子化合物(B1)。 另一方面,於使用上述上述含酚性羥基之樹脂(B2)作為上述含酚性羥基之化合物(B)之情形時,較佳為相對於上述活性酯化合物(A)100質量份,以1~300質量份之範圍含有上述含酚性羥基之樹脂(B2),較佳為以5~200質量份之範圍含有上述含酚性羥基之樹脂(B2),更佳為以10~200質量份之範圍含有上述含酚性羥基之樹脂(B2)。
就硬化性與硬化物之物性之平衡優異此方面而言,本發明之活性酯組成物之官能基當量較佳為150~360g/當量之範圍。再者,於本發明中,所謂活性酯組成物中之官能基,係指活性酯組成物中之酯鍵部位及酚性羥基。又,活性酯組成物之官能基當量係根據反應原料之添加量而算出之值。
本發明之硬化性組成物含有上述活性酯組成物及硬化劑。上述硬化劑只要為可與本發明之活性酯組成物反應之化合物即可,可利用各種化合物而無特別限定。作為硬化劑之一例,例如可列舉環氧樹脂。
上述環氧樹脂例如可列舉:苯酚酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂、萘酚酚醛清漆型環氧樹脂、雙酚酚醛清漆型環氧樹脂、聯苯酚酚醛清漆型環氧樹脂、雙酚型環氧樹脂、聯苯型環氧樹脂、三苯酚甲烷型環氧樹脂、四苯酚乙烷型環氧樹脂、二環戊二烯-苯酚加成反應型環氧樹脂、苯酚芳烷基型環氧樹脂、萘酚芳烷基型環氧樹脂等。
於本發明之硬化性組成物中,活性酯組成物與硬化劑之摻合比例並無特別限定,可根據所欲之硬化物性能等適當調整。作為於使用環氧樹脂作為硬化劑之情形時之摻合之一例,較佳為相對於環氧樹脂中之環氧基之合計1莫耳,上述活性酯組成物中之官能基之合計成為0.7~1.5 莫耳的比例。
本發明之硬化性組成物亦可進一步含有硬化促進劑。上述硬化促進劑例如可列舉:磷系化合物、三級胺、咪唑化合物、吡啶化合物、有機酸金屬鹽、路易斯酸、胺錯合鹽等。其中,就硬化性、耐熱性、介電特性、耐吸濕性等優異之方面而言,磷系化合物中較佳為三苯基膦,三級胺中較佳為1,8-二氮雜雙環-[5.4.0]-十一烯(DBU),咪唑化合物中較佳為2-乙基-4-甲基咪唑,吡啶化合物中較佳為4-二甲基胺基吡啶、2-苯咪唑。其等硬化促進劑之添加量,較佳為在硬化性組成物100質量份中為0.01~15質量%之範圍。
本發明之硬化性組成物可進而含有其他樹脂成分。其他樹脂成分例如可列舉:二胺基二苯基甲烷、二伸乙基三胺、三伸乙基四胺、二胺基二苯基碸、異佛酮二胺、咪唑、BF3-胺錯合物、胍衍生物等胺化合物;二氰二胺、由次亞麻油酸之二聚物與乙二胺所合成之聚醯胺樹脂等醯胺化合物;鄰苯二甲酸酐、1,2,4-苯三甲酸酐、焦蜜石酸酐、順丁烯二酸酐、四氫鄰苯二甲酸酐、甲基四氫鄰苯二甲酸酐、甲基耐地酸酐(methyl nadic anhydride)、六氫鄰苯二甲酸酐、甲基六氫鄰苯二甲酸酐等酸酐;氰酸酯樹脂;雙馬來亞醯胺樹脂;苯并樹脂;苯乙烯-順丁烯二酸酐樹脂;以二烯丙基雙酚或異三聚氰酸三烯丙基酯為代表之含烯丙基樹脂;聚磷酸酯或磷酸酯-碳酸酯共聚物等。該等可分別單獨使用,亦可併用2種以上。
該等其他樹脂成分之摻合比例並無特別限定,可根據所欲之硬化物性能等適當調整。作為摻合比例之一例,較佳為於本發明之硬化 性組成物中在1~50質量%之範圍使用。
本發明之硬化性組成物亦可視需要含有阻燃劑、無機填充材、矽烷偶合劑、脫模劑、顏料、乳化劑等各種添加劑。
上述阻燃劑例如可列舉:紅磷、磷酸二氫銨、磷酸二銨、磷酸三銨、聚磷酸銨等磷酸銨、磷酸醯胺等無機磷化合物;磷酸酯化合物、膦酸化合物、次膦酸(phosphinic acid)化合物、氧化膦化合物、磷烷(phosphorane)化合物、有機系含氮磷化合物、9,10-二氫-9-氧雜-10-磷雜菲-10-氧化物(9,10-dihydro-9-oxa-10-phospha phenanthrene-10-oxide)、10-(2,5-二羥基苯基)-10H-9-氧雜-10-磷雜菲-10-氧化物、10-(2,7-二羥基萘基)-10H-9-氧雜-10-磷雜菲-10-氧化物等環狀有機磷化合物、及使其與環氧樹脂或酚樹脂等化合物反應而得之衍生物等有機磷化合物;三化合物、三聚氰酸化合物、異三聚氰酸化合物、啡噻等氮系阻燃劑;聚矽氧油、聚矽氧橡膠、聚矽氧樹脂等聚矽氧系阻燃劑;金屬氫氧化物、金屬氧化物、金屬碳酸鹽化合物、金屬粉、硼化合物、低熔點玻璃等無機阻燃劑等。於使用該等阻燃劑之情形時,較佳為於硬化性組成物中為0.1~20質量%之範圍。
上述無機填充材例如於將本發明之硬化性組成物用於半導體密封材料用途之情形時等進行摻合。上述無機填充材例如可列舉:熔融二氧化矽、晶質二氧化矽、氧化鋁、氮化矽、氫氧化鋁等。其中,就可更多地摻合無機填充材之方面而言,較佳為上述熔融二氧化矽。上述熔融二氧化矽為破碎狀、球狀之任一形狀均可使用,為了提高熔融二氧化矽之摻合量且抑制硬化性組成物之熔融黏度之上升,較佳為主要使用球狀者。進 而,為了提高球狀二氧化矽之摻合量,較佳為適當調整球狀二氧化矽之粒度分佈。其填充率較佳為於硬化性樹脂組成物100質量份中,以0.5~95質量份之範圍進行摻合。
此外,於將本發明之硬化性組成物使用於導電膏等用途之情形時,可使用銀粉或銅粉等導電性填充劑。
本發明之活性酯組成物及使用有其之硬化性組成物具有硬化性高、硬化物之低介電性等各個性能優異之特徴。作為硬化物性能,除了低介電性以外,可列舉如下等:高溫條件下之彈性模數低、耐吸濕性或耐熱性優異。此外,其係「於硬化時之硬化收縮率低、通用有機溶劑中之溶解性高」等樹脂材料所要求之通常之要求性能亦充分高者。因此,除了半導體密封材料或印刷配線基板、抗蝕劑材料等電子材料用途以外,還可廣泛利用於塗料或接著劑、成型品等用途。
於將本發明之硬化性組成物用於半導體密封材料用途之情形時,一般而言,較佳為摻合無機填充材。半導體密封材料例如可使用擠出機、捏合機、輥等將摻合物進行混合而製備。關於使用所獲得之半導體密封材料使半導體封裝成型之方法,例如可列舉使用鑄型或轉移成形機、射出成型機等使該半導體密封材料成形,進而於50~200℃之溫度條件下加熱2~10小時的方法,藉由此種方法可獲得為成形物之半導體裝置。
於將本發明之硬化性組成物用於印刷配線基板用途或增層接著膜用途之情形時,一般而言,較佳為摻合有機溶劑進行稀釋而使用。上述有機溶劑可列舉:甲基乙基酮、丙酮、二甲基甲醯胺、甲基異丁基酮、甲氧基丙醇、環己酮、甲賽璐蘇、乙基二乙二醇乙酸酯、丙二醇單甲 醚乙酸酯等。有機溶劑之種類或摻合量可根據硬化性組成物之使用環境進行適當調整,例如印刷配線板用途中,較佳為甲基乙基酮、丙酮、二甲基甲醯胺等沸點為160℃以下之極性溶劑,較佳為以不揮發成分成為40~80質量%之比例來使用。增層接著膜用途中,較佳為使用丙酮、甲基乙基酮、環己酮等酮溶劑;乙酸乙酯、乙酸丁酯、乙酸賽璐蘇、丙二醇單甲醚乙酸酯、卡必醇乙酸酯等乙酸酯溶劑;賽璐蘇、丁基卡必醇等卡必醇溶劑;甲苯、二甲苯等芳香族烴溶劑;二甲基甲醯胺、二甲基乙醯胺、N-甲基吡咯啶酮等;較佳為以不揮發成分成為30~60質量%之比例來使用。
又,使用本發明之硬化性組成物製造印刷配線基板之方法例如可列舉如下方法:使補強基材含浸硬化性組成物並使之硬化而獲得預浸體,將其與銅箔重疊並進行加熱壓接。上述補強基材可列舉:紙、玻璃布、玻璃不織布、聚芳醯胺紙、聚芳醯胺布、玻璃氈、玻璃粗紗布等。硬化性組成物之含浸量並無特別限定,通常較佳為以預浸體中之樹脂成分成為20~60質量%之方式進行製備。
[實施例]
繼而,藉由實施例、比較例對本發明更具體地進行說明。關於實施例中之「份」及「%」之記載,只要無特別說明,則為質量基準。
於本實施例中,活性酯化合物(A)之熔融黏度,係依據ASTM D4287,利用ICI黏度計所測得之150℃下之值。
製造例1:活性酯化合物(A1)之製造
於安裝有溫度計、滴液漏斗、冷凝管、分流管、及攪拌器之燒瓶中添加間苯二甲醯氯202.0g、甲苯1250g,並一面於反應系統內進行減壓氮氣置換一面使之溶解。繼而,添加1-萘酚288.0g,並一面於反應系統內進行減壓氮氣置換一面使之溶解。加入溴化四丁基銨0.63g,一面實施氮氣沖洗,一面將反應系統內控制於60℃以下,並歷時3小時滴加20%氫氧化鈉水溶液400g。滴加結束後,直接繼續攪拌1小時進行反應。反應結束後,將反應混合物靜置進行分液,並去除水層。於殘留之有機層中加入水並攪拌約15分鐘進行混合,其後,將混合物靜置進行分液,並去除水層。重複進行該操作直至水層之pH成為7,其後,利用傾析脫水去除水分及甲苯,所獲得之活性酯化合物(A1)的活性酯化合物(A1)之熔融黏度為0.6dPa‧s。
製造例2:活性酯化合物(A-2)之製造
於安裝有溫度計、滴液漏斗、冷凝管、分流管、及攪拌器之燒瓶中添加間苯二甲醯氯202.0g、甲苯1400g,並一面於反應系統內進行減壓氮氣置換一面使之溶解。繼而,添加鄰苯基苯酚340.0g,並一面於反應系統內進行減壓氮氣置換一面使之溶解。加入溴化四丁基銨0.70g,一面實施氮氣沖洗,一面將反應系統內控制於60℃以下,並歷時3小時滴加20%氫氧化鈉水溶液400g。滴加結束後,直接繼續攪拌1小時進行反應。反應結束後,將反應混合物靜置進行分液,並去除水層。於殘留之有機層中加入水並攪拌約15分鐘進行混合,其後,將混合物靜置進行分液,並去除水層。重複進行該操作直至水層之pH成為7,其後,利用傾析脫水去除水分及甲苯,而獲得活性酯化合物(A-2)。活性酯化合物(A-2)之熔 融黏度為0.2dP.s。
實施例1~7及比較例1、2
按照下述表1所示之比例摻合各成分,而獲得硬化性組成物。針對所獲得之硬化性組成物,按照下述要點對膠化時間、硬化物之介電常數、高溫條件下之彈性模數進行測定。將結果示於表1
膠化時間之測定
以表1所示之比例摻合各成分,於形成硬化性組成物後,馬上將硬化性組成物0.15g載置於加熱至175℃的熱板上,一面利用刮勺進行攪拌一面測定至成為膠狀為止之時間。重複進行三次相同操作,利用其平均值來進行評價。
A:10秒以上且未達50秒
B:50秒以上且未達100秒
C:100秒以上且未達150秒
D:150秒以上
介電常數之測定
使用壓製機,使硬化性組成物流入模框中,於175℃之溫度成型10分鐘。自模框取出成型物,使之於175℃之溫度硬化5小時。將硬化後之成形物切取出1mm×54mm×1.6mm之大小,並將其作為試片。
根據JIS-C-6481,使用Agilent Technology股份有限公司製造之Impedance Material Analyzers「HP4291B」,對加熱真空乾燥後保管在23℃、濕度50%的室內24小時之試片測定其1GHz下的介電常數及介電損耗正切。
A:未達3.00
B:3.00以上
高溫條件下之彈性模數之測定
使用壓製機,使硬化性組成物流入模框中,於175℃之溫度成型10分鐘。自模框取出成型物,使之於175℃之溫度硬化5小時。將硬化後之成形物切取出5mm×54mm×2.4mm之大小,並將其作為試片。
使用黏彈性測定裝置(Rheometrics公司製造之「固體黏彈性測定裝置RSAII」),利用矩形張力法於頻率1Hz、升溫溫度3℃/分鐘之條件下對試片之260℃下之儲存模數進行測定。
A:1MPa以上且未達25MPa
B:25MPa以上且未達50MPa
C:50MPa以上
表中各成分之詳細
含酚性羥基之單分子化合物(B1-1):五倍子酚
含酚性羥基之樹脂(B2-1):苯酚酚醛清漆型樹脂(DIC股份有限公司製造之「TD-2131」、羥基當量104g/當量、軟化點80℃)
含酚性羥基之樹脂(B2-2):苯酚芳烷基樹脂(AIR WATER股份有限公司製造之「HE100C-15」、羥基當量174g/當量、軟化點75℃)
含酚性羥基之樹脂(B2-3):聯苯芳烷基樹脂(AIR WATER股份有限公司製造之「HE200C-10」、羥基當量204g/當量、軟化點72℃)
環氧樹脂(1):甲酚酚醛清漆型環氧樹脂(DIC股份有限公司製造之「N-655-EXP-S」、環氧當量202g/當量)
實施例8~14及比較例3
按照下述表2所示之比例摻合各成分,而獲得硬化性組成物。針對所獲得之硬化性組成物,按照下述要點對硬化物之耐吸濕性與硬化收縮率進行測定。將結果示於表2。
耐吸濕性之評價
使用壓製機,使硬化性組成物流入模框中,於175℃之溫度成型10分鐘。自模框取出成型物,使之於175℃之溫度硬化5小時。將硬化後之成形物切取出90mm×110mm×2.4mm之大小,並將其作為試片。
將所得到之成形物放置於85℃/85%RH之環境下300個小時,而進行吸濕試驗。測定試驗前後之成形物的質量,將其質量變化率評價為吸濕率。
A:未達1質量%
B:1質量%以上
硬化收縮率之測定
使用轉移成形機(Kohtaki Precision Machine股份有限公司製造之「KTS-15-1.5C」),於模具溫度154℃、成形壓力9.8MPa、硬化時間600秒之條件下將硬化性組成物注入成形,而獲得長110mm、寬12.7mm、厚1.6mm之成形物。繼而,使所獲得之成形物於175℃硬化5小 時,其後,於室溫(25℃)放置24小時以上,將其作為試片。對試片於室溫下之縱方向尺寸、模具於154℃下之縱方向內尺寸分別進行測定,並利用下述式算出硬化收縮率。
硬化收縮率(%)={(模具於154℃下之縱方向內尺寸)-(試片於室溫下之縱方向尺寸)}/(模具於154℃下之縱方向內尺寸)×100(%)
A:未達1%
B:1%以上
Claims (6)
- 一種活性酯組成物,其以活性酯化合物(A)與含酚性羥基之化合物(B)為必須成分,且,上述活性酯化合物(A)係分子結構中具有一個酚性羥基之化合物(a1)與芳香族多羧酸或其酸性鹵化物(acid halide)(a2)之酯化物。
- 如申請專利範圍第1項之活性酯組成物,其中,相對於上述活性酯化合物(A)100質量份,以0.1~300質量份之範圍含有上述含酚性羥基之化合物(B)
- 一種硬化性組成物,其含有申請專利範圍第1或2項之活性酯組成物、及硬化劑。
- 一種硬化物,其係申請專利範圍第3項之硬化性組成物之硬化物。
- 一種半導體密封材料,其係使用申請專利範圍第3項之硬化性組成物而成。
- 一種印刷配線基板,其係使用申請專利範圍第3項之硬化性組成物而成。
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