TW200914994A - Radiation-sensitive composition and compound - Google Patents
Radiation-sensitive composition and compound Download PDFInfo
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- TW200914994A TW200914994A TW97129705A TW97129705A TW200914994A TW 200914994 A TW200914994 A TW 200914994A TW 97129705 A TW97129705 A TW 97129705A TW 97129705 A TW97129705 A TW 97129705A TW 200914994 A TW200914994 A TW 200914994A
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 101
- 230000005855 radiation Effects 0.000 title claims abstract description 75
- 239000000203 mixture Substances 0.000 title claims abstract description 63
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- 125000000217 alkyl group Chemical group 0.000 claims abstract description 32
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 30
- -1 2-methyl-2-adamantyl group Chemical group 0.000 claims description 104
- 229910052799 carbon Inorganic materials 0.000 claims description 40
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 18
- 239000000126 substance Substances 0.000 claims description 18
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- 238000009792 diffusion process Methods 0.000 claims description 16
- 125000001424 substituent group Chemical group 0.000 claims description 15
- 125000005842 heteroatom Chemical group 0.000 claims description 10
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- 125000004122 cyclic group Chemical group 0.000 claims description 9
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- 125000003118 aryl group Chemical group 0.000 claims description 6
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- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 210000003802 sputum Anatomy 0.000 description 1
- 208000024794 sputum Diseases 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
- 235000018553 tannin Nutrition 0.000 description 1
- 229920001864 tannin Polymers 0.000 description 1
- 239000001648 tannin Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- IXXMVXXFAJGOQO-UHFFFAOYSA-N tert-butyl 2-hydroxypropanoate Chemical compound CC(O)C(=O)OC(C)(C)C IXXMVXXFAJGOQO-UHFFFAOYSA-N 0.000 description 1
- PWQLFIKTGRINFF-UHFFFAOYSA-N tert-butyl 4-hydroxypiperidine-1-carboxylate Chemical compound CC(C)(C)OC(=O)N1CCC(O)CC1 PWQLFIKTGRINFF-UHFFFAOYSA-N 0.000 description 1
- QBOVXIMGMVOPQK-UHFFFAOYSA-N tert-butyl adamantane-1-carboxylate Chemical compound C1C(C2)CC3CC2CC1(C(=O)OC(C)(C)C)C3 QBOVXIMGMVOPQK-UHFFFAOYSA-N 0.000 description 1
- WIURVMHVEPTKHB-UHFFFAOYSA-N tert-butyl n,n-dicyclohexylcarbamate Chemical compound C1CCCCC1N(C(=O)OC(C)(C)C)C1CCCCC1 WIURVMHVEPTKHB-UHFFFAOYSA-N 0.000 description 1
- LPQZERIRKRYGGM-UHFFFAOYSA-N tert-butyl pyrrolidine-1-carboxylate Chemical compound CC(C)(C)OC(=O)N1CCCC1 LPQZERIRKRYGGM-UHFFFAOYSA-N 0.000 description 1
- 125000005931 tert-butyloxycarbonyl group Chemical group [H]C([H])([H])C(OC(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000012085 test solution Substances 0.000 description 1
- 229960002180 tetracycline Drugs 0.000 description 1
- 229930101283 tetracycline Natural products 0.000 description 1
- 235000019364 tetracycline Nutrition 0.000 description 1
- 150000003522 tetracyclines Chemical class 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 1
- 229940070710 valerate Drugs 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 235000013311 vegetables Nutrition 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
- C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
- C07C39/17—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings containing other rings in addition to the six-membered aromatic rings, e.g. cyclohexylphenol
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/96—Esters of carbonic or haloformic acids
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Electron Beam Exposure (AREA)
- Materials For Photolithography (AREA)
- Steroid Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007208320 | 2007-08-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200914994A true TW200914994A (en) | 2009-04-01 |
Family
ID=40341269
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW97129705A TW200914994A (en) | 2007-08-09 | 2008-08-05 | Radiation-sensitive composition and compound |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5353699B2 (fr) |
| TW (1) | TW200914994A (fr) |
| WO (1) | WO2009020035A1 (fr) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5820171B2 (ja) * | 2011-07-14 | 2015-11-24 | Jsr株式会社 | 包接化合物およびその製造方法 |
| JP6996116B2 (ja) * | 2016-06-30 | 2022-01-17 | 住友化学株式会社 | 化合物、レジスト組成物及びレジストパターンの製造方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101135771B1 (ko) * | 2004-02-04 | 2012-04-20 | 각고우호우진 가나가와 다이가쿠 | 칼릭스아렌계 화합물, 그의 제조 방법, 그의 중간체 및그의 조성물 |
| JP4895537B2 (ja) * | 2005-06-30 | 2012-03-14 | Ｊｓｒ株式会社 | カリックスアレーン系ポリマー及びその製造方法 |
| JP4657030B2 (ja) * | 2005-06-30 | 2011-03-23 | Ｊｓｒ株式会社 | カリックスアレーン系誘導体及びそれを含有する組成物 |
| JP5596258B2 (ja) * | 2007-05-09 | 2014-09-24 | 学校法人神奈川大学 | カリックスアレーンダイマー化合物およびその製造方法 |
-
2008
- 2008-07-31 WO PCT/JP2008/063738 patent/WO2009020035A1/fr not_active Ceased
- 2008-07-31 JP JP2009526413A patent/JP5353699B2/ja active Active
- 2008-08-05 TW TW97129705A patent/TW200914994A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2009020035A1 (ja) | 2010-11-04 |
| WO2009020035A1 (fr) | 2009-02-12 |
| JP5353699B2 (ja) | 2013-11-27 |
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