SG10201803738UA - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- SG10201803738UA SG10201803738UA SG10201803738UA SG10201803738UA SG10201803738UA SG 10201803738U A SG10201803738U A SG 10201803738UA SG 10201803738U A SG10201803738U A SG 10201803738UA SG 10201803738U A SG10201803738U A SG 10201803738UA SG 10201803738U A SG10201803738U A SG 10201803738UA
- Authority
- SG
- Singapore
- Prior art keywords
- dielectric layer
- pad
- chip
- lower dielectric
- region
- Prior art date
Links
Classifications
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- H01L23/482—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body (electrodes)
- H01L23/485—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body (electrodes) consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
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- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
A semiconductor device includes a semiconductor substrate having a chip region and an edge region, a lower dielectric layer on the semiconductor substrate, a chip pad on the lower dielectric layer of the chip region, an upper dielectric layer on the lower dielectric layer, which includes a first opening exposing the chip pad on the chip region and a second opening exposing the lower dielectric layer on the edge region, and a redistribution pad connected to the chip pad. The redistribution pad includes a via portion in the first opening and a pad portion extending from the via portion onto the upper dielectric layer. FIG. 5B
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020170094903A KR102428328B1 (en) | 2017-07-26 | 2017-07-26 | Semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
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| US10163859B2 (en) | 2015-10-21 | 2018-12-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Structure and formation method for chip package |
| KR102571558B1 (en) | 2018-09-17 | 2023-08-29 | 삼성전자주식회사 | Semiconductor device |
| KR102227858B1 (en) | 2019-03-28 | 2021-03-12 | 매그나칩 반도체 유한회사 | Semiconductor Die Formation and Packaging Thereof |
| CN111785686B (en) * | 2019-04-03 | 2023-08-15 | 华邦电子股份有限公司 | Wafer cutting method and grain |
| US11088094B2 (en) * | 2019-05-31 | 2021-08-10 | Taiwan Semiconductor Manufacturing Company, Ltd. | Air channel formation in packaging process |
| JP6817372B2 (en) * | 2019-06-13 | 2021-01-20 | 華邦電子股▲ふん▼有限公司Winbond Electronics Corp. | Wafer dicing method and die |
| US10896878B2 (en) * | 2019-06-18 | 2021-01-19 | Nxp B.V. | Integrated circuit saw bow break point |
| KR102714984B1 (en) * | 2019-06-25 | 2024-10-10 | 삼성전자주식회사 | chip stacked semiconductor package and method of manufacturing the same |
| JP7370182B2 (en) * | 2019-07-08 | 2023-10-27 | エイブリック株式会社 | Semiconductor device and its inspection method |
| KR102735219B1 (en) * | 2019-08-20 | 2024-11-27 | 삼성전자주식회사 | Semiconductor chips having dielectrics with low dielectric constant |
| US11735487B2 (en) * | 2019-10-30 | 2023-08-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor structure and method of fabricating the same |
| CN112786458B (en) | 2019-11-07 | 2025-01-10 | 长鑫存储技术有限公司 | Semiconductor structure and method for manufacturing the same |
| US11764164B2 (en) * | 2020-06-15 | 2023-09-19 | Micron Technology, Inc. | Semiconductor device and method of forming the same |
| KR20220005188A (en) * | 2020-07-06 | 2022-01-13 | 매그나칩 반도체 유한회사 | Method for forming semiconductor die and semiconductor device thereof |
| KR102714907B1 (en) | 2020-07-10 | 2024-10-07 | 삼성전자주식회사 | Semiconductor package |
| JP7613020B2 (en) * | 2020-07-28 | 2025-01-15 | 株式会社ソシオネクスト | Manufacturing method of semiconductor device, semiconductor package, and manufacturing method of semiconductor package |
| US11715704B2 (en) | 2021-04-14 | 2023-08-01 | Micron Technology, Inc. | Scribe structure for memory device |
| US11769736B2 (en) | 2021-04-14 | 2023-09-26 | Micron Technology, Inc. | Scribe structure for memory device |
| US11600578B2 (en) * | 2021-04-22 | 2023-03-07 | Micron Technology, Inc. | Scribe structure for memory device |
| JPWO2023042416A1 (en) * | 2021-09-16 | 2023-03-23 | ||
| CN115831926B (en) * | 2021-09-17 | 2025-09-05 | 长鑫存储技术有限公司 | Wafer test structure and preparation method thereof |
| US20230230981A1 (en) * | 2022-01-18 | 2023-07-20 | Changxin Memory Technologies, Inc, | Semiconductor structure and manufacturing method thereof |
| KR20230159924A (en) * | 2022-05-16 | 2023-11-23 | 에스케이하이닉스 주식회사 | Semiconductor device and method of manufacturing semiconductor device |
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| JP4434606B2 (en) * | 2003-03-27 | 2010-03-17 | 株式会社東芝 | Semiconductor device and method for manufacturing semiconductor device |
| WO2004097916A1 (en) | 2003-04-30 | 2004-11-11 | Fujitsu Limited | Method for fabricating semiconductor device, semiconductor wafer and semiconductor device |
| KR100583966B1 (en) * | 2004-06-08 | 2006-05-26 | 삼성전자주식회사 | Integrated Circuit Packages With Repositioned Metal Wiring and Methods of Manufacturing the Same |
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| US7160756B2 (en) | 2004-10-12 | 2007-01-09 | Agency For Science, Techology And Research | Polymer encapsulated dicing lane (PEDL) technology for Cu/low/ultra-low k devices |
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| JP4995551B2 (en) | 2006-12-01 | 2012-08-08 | ローム株式会社 | Semiconductor device and manufacturing method of semiconductor device |
| JP5448304B2 (en) | 2007-04-19 | 2014-03-19 | パナソニック株式会社 | Semiconductor device |
| JP5583320B2 (en) | 2007-12-05 | 2014-09-03 | ピーエスフォー ルクスコ エスエイアールエル | Semiconductor wafer and manufacturing method thereof |
| JP5638818B2 (en) * | 2010-03-15 | 2014-12-10 | セイコーインスツル株式会社 | Semiconductor device and manufacturing method thereof |
| JP2012138449A (en) * | 2010-12-27 | 2012-07-19 | Teramikros Inc | Semiconductor device manufacturing method |
| JP5834934B2 (en) * | 2012-01-17 | 2015-12-24 | 富士通セミコンダクター株式会社 | Semiconductor device and manufacturing method of semiconductor device |
| US9324756B2 (en) | 2012-07-25 | 2016-04-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | CIS chips and methods for forming the same |
| US9275924B2 (en) | 2012-08-14 | 2016-03-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor package having a recess filled with a molding compound |
| US8952497B2 (en) * | 2012-09-14 | 2015-02-10 | Taiwan Semiconductor Manufacturing Company, Ltd. | Scribe lines in wafers |
| JP6234725B2 (en) * | 2013-07-18 | 2017-11-22 | シナプティクス・ジャパン合同会社 | Semiconductor wafer, semiconductor IC chip and manufacturing method thereof |
| JP6639141B2 (en) * | 2015-08-05 | 2020-02-05 | ルネサスエレクトロニクス株式会社 | Semiconductor device manufacturing method and semiconductor device |
| CN108140576A (en) * | 2015-10-01 | 2018-06-08 | 瑞萨电子株式会社 | Semiconductor devices and its manufacturing method |
| JP6564669B2 (en) | 2015-10-06 | 2019-08-21 | 株式会社ディスコ | Device manufacturing method |
| US10163859B2 (en) * | 2015-10-21 | 2018-12-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Structure and formation method for chip package |
| US9865516B2 (en) | 2016-01-10 | 2018-01-09 | Micron Technology, Inc. | Wafers having a die region and a scribe-line region adjacent to the die region |
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| JP2019029654A (en) | 2019-02-21 |
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