SG10201501816TA - Method of correcting film thickness measurement value, film thickness corrector and eddy current sensor - Google Patents
Method of correcting film thickness measurement value, film thickness corrector and eddy current sensorInfo
- Publication number
- SG10201501816TA SG10201501816TA SG10201501816TA SG10201501816TA SG10201501816TA SG 10201501816T A SG10201501816T A SG 10201501816TA SG 10201501816T A SG10201501816T A SG 10201501816TA SG 10201501816T A SG10201501816T A SG 10201501816TA SG 10201501816T A SG10201501816T A SG 10201501816TA
- Authority
- SG
- Singapore
- Prior art keywords
- film thickness
- current sensor
- measurement value
- eddy current
- corrector
- Prior art date
Links
- 238000005259 measurement Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/013—Devices or means for detecting lapping completion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/10—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
- B24B49/105—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means using eddy currents
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
- G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
- G01B7/10—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using magnetic means, e.g. by measuring change of reluctance
- G01B7/105—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using magnetic means, e.g. by measuring change of reluctance for measuring thickness of coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/14—Measuring as part of the manufacturing process for electrical parameters, e.g. resistance, deep-levels, CV, diffusions by electrical means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014048671A JP6445771B2 (en) | 2014-03-12 | 2014-03-12 | Method for correcting film thickness measurement value and film thickness corrector |
| JP2014049622A JP6445241B2 (en) | 2014-03-13 | 2014-03-13 | Eddy current sensor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG10201501816TA true SG10201501816TA (en) | 2015-10-29 |
Family
ID=54069674
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG10201501816TA SG10201501816TA (en) | 2014-03-12 | 2015-03-10 | Method of correcting film thickness measurement value, film thickness corrector and eddy current sensor |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9437507B2 (en) |
| KR (1) | KR102326730B1 (en) |
| CN (1) | CN104907920B (en) |
| SG (1) | SG10201501816TA (en) |
| TW (2) | TWI655999B (en) |
Families Citing this family (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102326730B1 (en) * | 2014-03-12 | 2021-11-17 | 가부시키가이샤 에바라 세이사꾸쇼 | Correction method of film thickness measurement value, film thickness corrector and eddy current sensor |
| KR101684842B1 (en) * | 2015-10-27 | 2016-12-20 | 주식회사 케이씨텍 | Chemical mechanical polishing apparatus |
| KR101712920B1 (en) * | 2015-12-07 | 2017-03-08 | 주식회사 케이씨텍 | Chemical mechanical polishing apparatus |
| US10598477B2 (en) * | 2016-02-04 | 2020-03-24 | Kla-Tencor Corporation | Dynamic determination of metal film thickness from sheet resistance and TCR value |
| JP6779633B2 (en) * | 2016-02-23 | 2020-11-04 | 株式会社荏原製作所 | Polishing equipment |
| CN105965380B (en) * | 2016-05-04 | 2017-09-19 | 中国电子科技集团公司第四十五研究所 | eddy current measuring device for wafer surface metal film polishing process |
| CN106002603B (en) * | 2016-05-30 | 2018-10-16 | 上海华力微电子有限公司 | A kind of copper grinding method and system |
| CN107543487B (en) * | 2016-06-27 | 2019-11-29 | 北京北方华创微电子装备有限公司 | A kind of original position film thickness monitoring method and device |
| JP2018001296A (en) * | 2016-06-28 | 2018-01-11 | 株式会社荏原製作所 | Polishing device, polishing method, and polishing control program |
| JP6795337B2 (en) * | 2016-06-29 | 2020-12-02 | 株式会社荏原製作所 | Film thickness signal processing device, polishing device, film thickness signal processing method, and polishing method |
| JP6842851B2 (en) * | 2016-07-13 | 2021-03-17 | 株式会社荏原製作所 | Film thickness measuring device, polishing device, film thickness measuring method, and polishing method |
| TW201822953A (en) * | 2016-09-16 | 2018-07-01 | 美商應用材料股份有限公司 | Overpolishing based on electromagnetic inductive monitoring of trench depth |
| JP2018083267A (en) * | 2016-11-25 | 2018-05-31 | 株式会社荏原製作所 | Polishing device and polishing method |
| US11231392B2 (en) * | 2016-12-27 | 2022-01-25 | Industrial Technology Research Institute | Detecting device and method thereof |
| JP6465914B2 (en) * | 2017-03-21 | 2019-02-06 | 本田技研工業株式会社 | Electrode manufacturing method and apparatus |
| JP7019305B2 (en) * | 2017-04-26 | 2022-02-15 | 株式会社荏原製作所 | How to calibrate the eddy current sensor |
| CN109719617B (en) * | 2017-10-30 | 2021-12-17 | 凯斯科技股份有限公司 | Substrate processing apparatus |
| KR102538861B1 (en) * | 2017-12-26 | 2023-06-01 | 가부시키가이샤 에바라 세이사꾸쇼 | Magnetic element and eddy current type sensor using the same |
| US20190390949A1 (en) * | 2018-06-21 | 2019-12-26 | Applied Materials, Inc. | Methods, apparatuses and systems for conductive film layer thickness measurements |
| JP7083279B2 (en) * | 2018-06-22 | 2022-06-10 | 株式会社荏原製作所 | How to identify the trajectory of the eddy current sensor, how to calculate the progress of polishing the substrate, how to stop the operation of the substrate polishing device and how to equalize the progress of polishing the substrate, to execute these methods. The program and the non-transient recording medium on which the program is recorded |
| JP7153490B2 (en) * | 2018-07-13 | 2022-10-14 | 株式会社荏原製作所 | Polishing equipment and calibration method |
| CN111321410B (en) * | 2018-12-17 | 2023-07-04 | 扬博科技股份有限公司 | Substrate thickness detection and automatic correction system and detection and automatic correction method |
| JP7224202B2 (en) * | 2019-02-22 | 2023-02-17 | 株式会社荏原製作所 | Substrate polishing system and method, and substrate polishing apparatus |
| JP7435113B2 (en) * | 2020-03-23 | 2024-02-21 | 株式会社Sumco | Double-sided polishing device for workpieces |
| JP7493414B2 (en) * | 2020-08-25 | 2024-05-31 | 株式会社荏原製作所 | Output signal processing device for eddy current sensor |
| CN114367919A (en) * | 2020-10-14 | 2022-04-19 | 长鑫存储技术有限公司 | Grinding control method, device and storage medium |
| JP7532315B2 (en) * | 2021-06-28 | 2024-08-13 | 株式会社荏原製作所 | EDDY CURRENT SENSOR DETECTION SIGNAL PROCESSING APPARATUS AND DETECTION SIGNAL PROCESSING METHOD |
| CN114589617B (en) * | 2022-03-03 | 2022-10-21 | 清华大学 | Metal film thickness measuring method, film thickness measuring device and chemical mechanical polishing equipment |
| CN115289958B (en) * | 2022-08-04 | 2025-04-15 | 北京晶亦精微科技股份有限公司 | A method for measuring the thickness of a metal film |
| CN115946042B (en) * | 2022-12-27 | 2024-05-03 | 西安奕斯伟材料科技股份有限公司 | Polishing device and working method thereof |
| CN119681782B (en) * | 2023-04-17 | 2025-10-24 | 华海清科股份有限公司 | Metal film thickness online measurement compensation method, film thickness sensor and equipment |
| CN116772704B (en) * | 2023-08-25 | 2023-10-31 | 无锡爱博金属制品有限公司 | Coating film thickness measuring device and measuring method for electrophoresis processing |
| CN118789444B (en) * | 2024-09-13 | 2024-12-27 | 华海清科股份有限公司 | Metal film thickness measurement method, device, electronic device and storage medium using multi-modal signal compensation |
| CN119153350B (en) * | 2024-11-13 | 2025-03-14 | 华海清科股份有限公司 | Calibration method, measurement method, device and equipment for eddy current sensor |
| CN119159502B (en) * | 2024-11-15 | 2025-04-15 | 华海清科股份有限公司 | Thickness-compensated eddy current detection method, device and storage medium |
| CN119973878B (en) * | 2025-04-15 | 2025-07-25 | 宁波弘讯科技股份有限公司 | Control method and electronic device for sanding machine |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5449977U (en) * | 1977-09-13 | 1979-04-06 | ||
| US5559428A (en) * | 1995-04-10 | 1996-09-24 | International Business Machines Corporation | In-situ monitoring of the change in thickness of films |
| EP1244907A1 (en) * | 1999-12-23 | 2002-10-02 | KLA-Tencor Corporation | In-situ metalization monitoring using eddy current measurements and optical measurements |
| US6707540B1 (en) * | 1999-12-23 | 2004-03-16 | Kla-Tencor Corporation | In-situ metalization monitoring using eddy current and optical measurements |
| JP2004195629A (en) * | 2002-12-20 | 2004-07-15 | Ebara Corp | Polishing device |
| JP2005011977A (en) * | 2003-06-18 | 2005-01-13 | Ebara Corp | Device and method for substrate polishing |
| US7112960B2 (en) * | 2003-07-31 | 2006-09-26 | Applied Materials, Inc. | Eddy current system for in-situ profile measurement |
| JP4451111B2 (en) | 2003-10-20 | 2010-04-14 | 株式会社荏原製作所 | Eddy current sensor |
| TWI235692B (en) * | 2004-03-09 | 2005-07-11 | Applied Materials Inc | Apparatus and method for detecting film thickness in polishing machine |
| JP4940446B2 (en) * | 2005-06-28 | 2012-05-30 | サムスン エレクトロニクス カンパニー リミテッド | Biodrive device and analysis method using the same |
| US7282909B2 (en) * | 2005-06-29 | 2007-10-16 | Lam Research Corporation | Methods and apparatus for determining the thickness of a conductive layer on a substrate |
| US7173418B2 (en) | 2005-06-30 | 2007-02-06 | Lam Research Corporation | Methods and apparatus for optimizing an electrical response to a set of conductive layers on a substrate |
| US7821257B2 (en) * | 2007-09-03 | 2010-10-26 | Tokyo Seimitsu Co., Ltd | Method and device for forecasting/detecting polishing end point and method and device for monitoring real-time film thickness |
| JP5080933B2 (en) * | 2007-10-18 | 2012-11-21 | 株式会社荏原製作所 | Polishing monitoring method and polishing apparatus |
| JP5495493B2 (en) * | 2008-02-07 | 2014-05-21 | 株式会社東京精密 | Film thickness measuring apparatus and film thickness measuring method |
| JP5730747B2 (en) * | 2010-12-10 | 2015-06-10 | 株式会社荏原製作所 | Eddy current sensor and polishing method and apparatus |
| JP6050571B2 (en) | 2011-08-09 | 2016-12-21 | 株式会社荏原製作所 | Polishing monitoring method and polishing apparatus |
| US20130065493A1 (en) * | 2011-08-09 | 2013-03-14 | Taro Takahashi | Polishing monitoring method, polishing end point detection method, and polishing apparatus |
| JP2013222856A (en) * | 2012-04-17 | 2013-10-28 | Ebara Corp | Polishing device and polishing method |
| US9281253B2 (en) * | 2013-10-29 | 2016-03-08 | Applied Materials, Inc. | Determination of gain for eddy current sensor |
| KR102326730B1 (en) * | 2014-03-12 | 2021-11-17 | 가부시키가이샤 에바라 세이사꾸쇼 | Correction method of film thickness measurement value, film thickness corrector and eddy current sensor |
| JP6399873B2 (en) * | 2014-09-17 | 2018-10-03 | 株式会社荏原製作所 | Film thickness signal processing apparatus, polishing apparatus, film thickness signal processing method, and polishing method |
-
2015
- 2015-02-11 KR KR1020150020712A patent/KR102326730B1/en active Active
- 2015-03-06 TW TW104107162A patent/TWI655999B/en active
- 2015-03-06 TW TW108107025A patent/TWI691380B/en active
- 2015-03-10 SG SG10201501816TA patent/SG10201501816TA/en unknown
- 2015-03-12 CN CN201510109221.7A patent/CN104907920B/en active Active
- 2015-03-12 US US14/656,429 patent/US9437507B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| TW201534432A (en) | 2015-09-16 |
| TW201930014A (en) | 2019-08-01 |
| CN104907920A (en) | 2015-09-16 |
| KR20150106826A (en) | 2015-09-22 |
| CN104907920B (en) | 2018-07-27 |
| TWI691380B (en) | 2020-04-21 |
| US9437507B2 (en) | 2016-09-06 |
| KR102326730B1 (en) | 2021-11-17 |
| US20150262893A1 (en) | 2015-09-17 |
| TWI655999B (en) | 2019-04-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| SG10201501816TA (en) | Method of correcting film thickness measurement value, film thickness corrector and eddy current sensor | |
| EP3164355A4 (en) | Sensor and method for detecting mercury | |
| EP3223120A4 (en) | Film touch sensor and manufacturing method therefor | |
| EP3182329A4 (en) | Fingerprint sensor and correction method thereof | |
| EP3216210A4 (en) | Image sensor apparatus and method for obtaining multiple exposures with zero interframe time | |
| SG10201606968PA (en) | Eddy current sensor | |
| GB201406615D0 (en) | An apparatus and method for sensing | |
| EP3228975A4 (en) | Eddy current sensor | |
| GB2571046B (en) | Sensor error detection and correction | |
| SG11201608133PA (en) | Film-forming device, method for measuring film thickness of organic film, and film thickness sensor for organic film | |
| EP3125319A4 (en) | Magnetic sensor, method for manufacturing magnetic sensor, and current sensor | |
| GB201718916D0 (en) | Sensor and method | |
| GB201419515D0 (en) | Magnetic field sensor and method for making same | |
| HUE061545T2 (en) | Electrochemical sensor and method for producing thereof | |
| GB201719239D0 (en) | Defect detection and correction | |
| PL2918995T3 (en) | Gas sensor assembling method and gas sensor assembling apparatus | |
| SG10201601407RA (en) | Protective film detecting method | |
| PL3037829T3 (en) | Current sensor and method for manufacturing such a sensor | |
| PL3589742T3 (en) | Method of detection | |
| GB2538905B (en) | Magnetic current sensor calibration system and method | |
| EP3094949A4 (en) | Arrangement and method for measuring temperature | |
| EP3127158A4 (en) | Membrane-based sensor and method for robust manufacture of a membrane-based sensor | |
| EP3158346A4 (en) | Energy-optimized eddy current measurement systems and methods | |
| KR102402386B9 (en) | Method apparatus and the system for detecting thickness of an object | |
| GB2559258B (en) | Method and sensor for measuring an alternating current |