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SG10201501816TA - Method of correcting film thickness measurement value, film thickness corrector and eddy current sensor - Google Patents

Method of correcting film thickness measurement value, film thickness corrector and eddy current sensor

Info

Publication number
SG10201501816TA
SG10201501816TA SG10201501816TA SG10201501816TA SG10201501816TA SG 10201501816T A SG10201501816T A SG 10201501816TA SG 10201501816T A SG10201501816T A SG 10201501816TA SG 10201501816T A SG10201501816T A SG 10201501816TA SG 10201501816T A SG10201501816T A SG 10201501816TA
Authority
SG
Singapore
Prior art keywords
film thickness
current sensor
measurement value
eddy current
corrector
Prior art date
Application number
SG10201501816TA
Inventor
Akira Nakamura
Hiroaki Shibue
Yasumasa Hiroo
Hiroshi Ota
Taro Takahashi
Mitsuo Tada
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2014048671A external-priority patent/JP6445771B2/en
Priority claimed from JP2014049622A external-priority patent/JP6445241B2/en
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of SG10201501816TA publication Critical patent/SG10201501816TA/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/005Control means for lapping machines or devices
    • B24B37/013Devices or means for detecting lapping completion
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/10Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
    • B24B49/105Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means using eddy currents
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/02Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
    • G01B7/06Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
    • G01B7/10Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using magnetic means, e.g. by measuring change of reluctance
    • G01B7/105Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using magnetic means, e.g. by measuring change of reluctance for measuring thickness of coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/14Measuring as part of the manufacturing process for electrical parameters, e.g. resistance, deep-levels, CV, diffusions by electrical means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H01L22/26Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
SG10201501816TA 2014-03-12 2015-03-10 Method of correcting film thickness measurement value, film thickness corrector and eddy current sensor SG10201501816TA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014048671A JP6445771B2 (en) 2014-03-12 2014-03-12 Method for correcting film thickness measurement value and film thickness corrector
JP2014049622A JP6445241B2 (en) 2014-03-13 2014-03-13 Eddy current sensor

Publications (1)

Publication Number Publication Date
SG10201501816TA true SG10201501816TA (en) 2015-10-29

Family

ID=54069674

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201501816TA SG10201501816TA (en) 2014-03-12 2015-03-10 Method of correcting film thickness measurement value, film thickness corrector and eddy current sensor

Country Status (5)

Country Link
US (1) US9437507B2 (en)
KR (1) KR102326730B1 (en)
CN (1) CN104907920B (en)
SG (1) SG10201501816TA (en)
TW (2) TWI655999B (en)

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JP2018001296A (en) * 2016-06-28 2018-01-11 株式会社荏原製作所 Polishing device, polishing method, and polishing control program
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JP2018083267A (en) * 2016-11-25 2018-05-31 株式会社荏原製作所 Polishing device and polishing method
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CN109719617B (en) * 2017-10-30 2021-12-17 凯斯科技股份有限公司 Substrate processing apparatus
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JP7083279B2 (en) * 2018-06-22 2022-06-10 株式会社荏原製作所 How to identify the trajectory of the eddy current sensor, how to calculate the progress of polishing the substrate, how to stop the operation of the substrate polishing device and how to equalize the progress of polishing the substrate, to execute these methods. The program and the non-transient recording medium on which the program is recorded
JP7153490B2 (en) * 2018-07-13 2022-10-14 株式会社荏原製作所 Polishing equipment and calibration method
CN111321410B (en) * 2018-12-17 2023-07-04 扬博科技股份有限公司 Substrate thickness detection and automatic correction system and detection and automatic correction method
JP7224202B2 (en) * 2019-02-22 2023-02-17 株式会社荏原製作所 Substrate polishing system and method, and substrate polishing apparatus
JP7435113B2 (en) * 2020-03-23 2024-02-21 株式会社Sumco Double-sided polishing device for workpieces
JP7493414B2 (en) * 2020-08-25 2024-05-31 株式会社荏原製作所 Output signal processing device for eddy current sensor
CN114367919A (en) * 2020-10-14 2022-04-19 长鑫存储技术有限公司 Grinding control method, device and storage medium
JP7532315B2 (en) * 2021-06-28 2024-08-13 株式会社荏原製作所 EDDY CURRENT SENSOR DETECTION SIGNAL PROCESSING APPARATUS AND DETECTION SIGNAL PROCESSING METHOD
CN114589617B (en) * 2022-03-03 2022-10-21 清华大学 Metal film thickness measuring method, film thickness measuring device and chemical mechanical polishing equipment
CN115289958B (en) * 2022-08-04 2025-04-15 北京晶亦精微科技股份有限公司 A method for measuring the thickness of a metal film
CN115946042B (en) * 2022-12-27 2024-05-03 西安奕斯伟材料科技股份有限公司 Polishing device and working method thereof
CN119681782B (en) * 2023-04-17 2025-10-24 华海清科股份有限公司 Metal film thickness online measurement compensation method, film thickness sensor and equipment
CN116772704B (en) * 2023-08-25 2023-10-31 无锡爱博金属制品有限公司 Coating film thickness measuring device and measuring method for electrophoresis processing
CN118789444B (en) * 2024-09-13 2024-12-27 华海清科股份有限公司 Metal film thickness measurement method, device, electronic device and storage medium using multi-modal signal compensation
CN119153350B (en) * 2024-11-13 2025-03-14 华海清科股份有限公司 Calibration method, measurement method, device and equipment for eddy current sensor
CN119159502B (en) * 2024-11-15 2025-04-15 华海清科股份有限公司 Thickness-compensated eddy current detection method, device and storage medium
CN119973878B (en) * 2025-04-15 2025-07-25 宁波弘讯科技股份有限公司 Control method and electronic device for sanding machine

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Also Published As

Publication number Publication date
TW201534432A (en) 2015-09-16
TW201930014A (en) 2019-08-01
CN104907920A (en) 2015-09-16
KR20150106826A (en) 2015-09-22
CN104907920B (en) 2018-07-27
TWI691380B (en) 2020-04-21
US9437507B2 (en) 2016-09-06
KR102326730B1 (en) 2021-11-17
US20150262893A1 (en) 2015-09-17
TWI655999B (en) 2019-04-11

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