EP1192297B1 - Bain acide pour deposer par voie electrolytique des couches d'or ou d'alliage d'or brillantes, et agent de brillantage prevu a cet effet - Google Patents
Bain acide pour deposer par voie electrolytique des couches d'or ou d'alliage d'or brillantes, et agent de brillantage prevu a cet effet Download PDFInfo
- Publication number
- EP1192297B1 EP1192297B1 EP00929491A EP00929491A EP1192297B1 EP 1192297 B1 EP1192297 B1 EP 1192297B1 EP 00929491 A EP00929491 A EP 00929491A EP 00929491 A EP00929491 A EP 00929491A EP 1192297 B1 EP1192297 B1 EP 1192297B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- gold
- acid
- atoms
- sulfate
- lustring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 title claims description 33
- 239000010931 gold Substances 0.000 title claims description 33
- 229910052737 gold Inorganic materials 0.000 title claims description 33
- 239000000654 additive Substances 0.000 title claims description 18
- 230000008021 deposition Effects 0.000 title claims description 15
- 230000000996 additive effect Effects 0.000 title claims description 12
- 230000002378 acidificating effect Effects 0.000 title claims description 10
- 229910001020 Au alloy Inorganic materials 0.000 title claims description 8
- 239000003353 gold alloy Substances 0.000 title claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 21
- 150000001875 compounds Chemical class 0.000 claims description 18
- 238000000151 deposition Methods 0.000 claims description 14
- 150000003839 salts Chemical class 0.000 claims description 13
- 238000004070 electrodeposition Methods 0.000 claims description 12
- DVECLMOWYVDJRM-UHFFFAOYSA-N pyridine-3-sulfonic acid Chemical compound OS(=O)(=O)C1=CC=CN=C1 DVECLMOWYVDJRM-UHFFFAOYSA-N 0.000 claims description 11
- CUYKNJBYIJFRCU-UHFFFAOYSA-N 3-aminopyridine Chemical compound NC1=CC=CN=C1 CUYKNJBYIJFRCU-UHFFFAOYSA-N 0.000 claims description 9
- PVNIIMVLHYAWGP-UHFFFAOYSA-N Niacin Chemical compound OC(=O)C1=CC=CN=C1 PVNIIMVLHYAWGP-UHFFFAOYSA-N 0.000 claims description 9
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 9
- DFPAKSUCGFBDDF-UHFFFAOYSA-N Nicotinamide Chemical compound NC(=O)C1=CC=CN=C1 DFPAKSUCGFBDDF-UHFFFAOYSA-N 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 6
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 claims description 6
- VUVORVXMOLQFMO-ONEGZZNKSA-N (e)-3-pyridin-3-ylprop-2-enoic acid Chemical compound OC(=O)\C=C\C1=CC=CN=C1 VUVORVXMOLQFMO-ONEGZZNKSA-N 0.000 claims description 5
- WTZDTUCKEBDJIM-UHFFFAOYSA-N 2,3-dipyridin-2-ylpyrazine Chemical compound N1=CC=CC=C1C1=NC=CN=C1C1=CC=CC=N1 WTZDTUCKEBDJIM-UHFFFAOYSA-N 0.000 claims description 5
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 claims description 5
- 125000001072 heteroaryl group Chemical group 0.000 claims description 5
- FPOVRMNPSROFGX-UHFFFAOYSA-N hydroxy(pyridin-3-yl)methanesulfonic acid Chemical compound OS(=O)(=O)C(O)C1=CC=CN=C1 FPOVRMNPSROFGX-UHFFFAOYSA-N 0.000 claims description 5
- ZZYXNRREDYWPLN-UHFFFAOYSA-N pyridine-2,3-diamine Chemical compound NC1=CC=CN=C1N ZZYXNRREDYWPLN-UHFFFAOYSA-N 0.000 claims description 5
- REEBJQTUIJTGAL-UHFFFAOYSA-N 3-pyridin-1-ium-1-ylpropane-1-sulfonate Chemical compound [O-]S(=O)(=O)CCC[N+]1=CC=CC=C1 REEBJQTUIJTGAL-UHFFFAOYSA-N 0.000 claims description 4
- 235000001968 nicotinic acid Nutrition 0.000 claims description 4
- 239000011664 nicotinic acid Substances 0.000 claims description 4
- 229960003512 nicotinic acid Drugs 0.000 claims description 4
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 4
- LOIYMIARKYCTBW-OWOJBTEDSA-N trans-urocanic acid Chemical compound OC(=O)\C=C\C1=CNC=N1 LOIYMIARKYCTBW-OWOJBTEDSA-N 0.000 claims description 4
- QHNFACMTBFJLAT-UHFFFAOYSA-N 3-isoquinolin-1-ylpropane-1-sulfonic acid Chemical compound C1=CC=C2C(CCCS(=O)(=O)O)=NC=CC2=C1 QHNFACMTBFJLAT-UHFFFAOYSA-N 0.000 claims description 3
- 229960003237 betaine Drugs 0.000 claims description 3
- UZZYXUGECOQHPU-UHFFFAOYSA-M n-octyl sulfate Chemical compound CCCCCCCCOS([O-])(=O)=O UZZYXUGECOQHPU-UHFFFAOYSA-M 0.000 claims description 3
- 235000005152 nicotinamide Nutrition 0.000 claims description 3
- 239000011570 nicotinamide Substances 0.000 claims description 3
- 229940067739 octyl sulfate Drugs 0.000 claims description 3
- ZKIHLVYBGPFUAD-UHFFFAOYSA-N quinoline-2-sulfonic acid Chemical compound C1=CC=CC2=NC(S(=O)(=O)O)=CC=C21 ZKIHLVYBGPFUAD-UHFFFAOYSA-N 0.000 claims description 3
- UZZYXUGECOQHPU-UHFFFAOYSA-N sulfuric acid monooctyl ester Natural products CCCCCCCCOS(O)(=O)=O UZZYXUGECOQHPU-UHFFFAOYSA-N 0.000 claims description 3
- CSMFSDCPJHNZRY-UHFFFAOYSA-M decyl sulfate Chemical compound CCCCCCCCCCOS([O-])(=O)=O CSMFSDCPJHNZRY-UHFFFAOYSA-M 0.000 claims description 2
- FYAQQULBLMNGAH-UHFFFAOYSA-N hexane-1-sulfonic acid Chemical compound CCCCCCS(O)(=O)=O FYAQQULBLMNGAH-UHFFFAOYSA-N 0.000 claims description 2
- IDUWTCGPAPTSFB-UHFFFAOYSA-N hexyl hydrogen sulfate Chemical compound CCCCCCOS(O)(=O)=O IDUWTCGPAPTSFB-UHFFFAOYSA-N 0.000 claims description 2
- 238000000034 method Methods 0.000 claims description 2
- KETHQOOVMIVLCH-UHFFFAOYSA-M nonyl sulfate(1-) Chemical compound CCCCCCCCCOS([O-])(=O)=O KETHQOOVMIVLCH-UHFFFAOYSA-M 0.000 claims description 2
- CSMFSDCPJHNZRY-UHFFFAOYSA-N sulfuric acid monodecyl ester Natural products CCCCCCCCCCOS(O)(=O)=O CSMFSDCPJHNZRY-UHFFFAOYSA-N 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 claims 3
- 229910045601 alloy Inorganic materials 0.000 claims 2
- 239000000956 alloy Substances 0.000 claims 2
- KVGOXGQSTGQXDD-UHFFFAOYSA-N 1-decane-sulfonic-acid Chemical compound CCCCCCCCCCS(O)(=O)=O KVGOXGQSTGQXDD-UHFFFAOYSA-N 0.000 claims 1
- LDMOEFOXLIZJOW-UHFFFAOYSA-N 1-dodecanesulfonic acid Chemical compound CCCCCCCCCCCCS(O)(=O)=O LDMOEFOXLIZJOW-UHFFFAOYSA-N 0.000 claims 1
- ZHGASCUQXLPSDT-UHFFFAOYSA-N cyclohexanesulfonic acid Chemical compound OS(=O)(=O)C1CCCCC1 ZHGASCUQXLPSDT-UHFFFAOYSA-N 0.000 claims 1
- UCZUCGRGTXIWLR-UHFFFAOYSA-N cyclohexyl hydrogen sulfate Chemical compound OS(=O)(=O)OC1CCCCC1 UCZUCGRGTXIWLR-UHFFFAOYSA-N 0.000 claims 1
- MOTZDAYCYVMXPC-UHFFFAOYSA-N dodecyl hydrogen sulfate Chemical compound CCCCCCCCCCCCOS(O)(=O)=O MOTZDAYCYVMXPC-UHFFFAOYSA-N 0.000 claims 1
- 229940043264 dodecyl sulfate Drugs 0.000 claims 1
- AKRQHOWXVSDJEF-UHFFFAOYSA-N heptane-1-sulfonic acid Chemical compound CCCCCCCS(O)(=O)=O AKRQHOWXVSDJEF-UHFFFAOYSA-N 0.000 claims 1
- MIHVYISIUZTFER-UHFFFAOYSA-N heptyl hydrogen sulfate Chemical compound CCCCCCCOS(O)(=O)=O MIHVYISIUZTFER-UHFFFAOYSA-N 0.000 claims 1
- ZGAZPDWSRYNUSZ-UHFFFAOYSA-N nonane-1-sulfonic acid Chemical compound CCCCCCCCCS(O)(=O)=O ZGAZPDWSRYNUSZ-UHFFFAOYSA-N 0.000 claims 1
- WLGDAKIJYPIYLR-UHFFFAOYSA-N octane-1-sulfonic acid Chemical compound CCCCCCCCS(O)(=O)=O WLGDAKIJYPIYLR-UHFFFAOYSA-N 0.000 claims 1
- RJQRCOMHVBLQIH-UHFFFAOYSA-N pentane-1-sulfonic acid Chemical compound CCCCCS(O)(=O)=O RJQRCOMHVBLQIH-UHFFFAOYSA-N 0.000 claims 1
- ZIRHAFGGEBQZKX-UHFFFAOYSA-N pentyl hydrogen sulfate Chemical compound CCCCCOS(O)(=O)=O ZIRHAFGGEBQZKX-UHFFFAOYSA-N 0.000 claims 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Natural products OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 19
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 15
- 238000000926 separation method Methods 0.000 description 13
- 239000003792 electrolyte Substances 0.000 description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- OBITVHZFHDIQGH-UHFFFAOYSA-N [Au].[K]C#N Chemical compound [Au].[K]C#N OBITVHZFHDIQGH-UHFFFAOYSA-N 0.000 description 5
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 5
- SFOSJWNBROHOFJ-UHFFFAOYSA-N cobalt gold Chemical compound [Co].[Au] SFOSJWNBROHOFJ-UHFFFAOYSA-N 0.000 description 5
- -1 heteroaryl sulfates Chemical class 0.000 description 5
- 229910017052 cobalt Inorganic materials 0.000 description 4
- 239000010941 cobalt Substances 0.000 description 4
- 238000005275 alloying Methods 0.000 description 3
- 229940044175 cobalt sulfate Drugs 0.000 description 3
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 3
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 3
- 230000000875 corresponding effect Effects 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- WOFVPNPAVMKHCX-UHFFFAOYSA-N N#C[Au](C#N)C#N Chemical class N#C[Au](C#N)C#N WOFVPNPAVMKHCX-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- 238000005187 foaming Methods 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 235000005985 organic acids Nutrition 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 125000004076 pyridyl group Chemical group 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- VUVORVXMOLQFMO-UHFFFAOYSA-N 3-pyridin-3-ylprop-2-enoic acid Chemical compound OC(=O)C=CC1=CC=CN=C1 VUVORVXMOLQFMO-UHFFFAOYSA-N 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- DFPAKSUCGFBDDF-ZQBYOMGUSA-N [14c]-nicotinamide Chemical compound N[14C](=O)C1=CC=CN=C1 DFPAKSUCGFBDDF-ZQBYOMGUSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229940045714 alkyl sulfonate alkylating agent Drugs 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- 229910002065 alloy metal Inorganic materials 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- 239000000337 buffer salt Substances 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 150000001860 citric acid derivatives Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000009189 diving Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 150000002343 gold Chemical class 0.000 description 1
- NPEWZDADCAZMNF-UHFFFAOYSA-N gold iron Chemical compound [Fe].[Au] NPEWZDADCAZMNF-UHFFFAOYSA-N 0.000 description 1
- MSNOMDLPLDYDME-UHFFFAOYSA-N gold nickel Chemical compound [Ni].[Au] MSNOMDLPLDYDME-UHFFFAOYSA-N 0.000 description 1
- IZLAVFWQHMDDGK-UHFFFAOYSA-N gold(1+);cyanide Chemical compound [Au+].N#[C-] IZLAVFWQHMDDGK-UHFFFAOYSA-N 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- NPFOYSMITVOQOS-UHFFFAOYSA-K iron(III) citrate Chemical compound [Fe+3].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NPFOYSMITVOQOS-UHFFFAOYSA-K 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- UUWCBFKLGFQDME-UHFFFAOYSA-N platinum titanium Chemical compound [Ti].[Pt] UUWCBFKLGFQDME-UHFFFAOYSA-N 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- LOIYMIARKYCTBW-UHFFFAOYSA-N urocanic acid Chemical compound OC(=O)C=CC1=CNC=N1 LOIYMIARKYCTBW-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/48—Electroplating: Baths therefor from solutions of gold
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/62—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold
Definitions
- Such electrolytes are based predominantly on gold cyanide complexes. It is necessary to adjust these electrolytes with the help of inorganic and / or organic acids and buffer salts to a weakly to moderately acidic pH.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Claims (6)
- Bain acide pour déposer par voie électrolytique des couches d'or ou d'alliage d'or brillantes,
contenant de l'or et le cas échéant un ou plusieurs éléments d'alliage sous forme dissoute, ainsi qu'au moins un premier agent de brillantage, sélectionné parmi les substances suivantes : acide pyridine-3-sulfonique, acide nicotinique, amide d'acide nicotinique, acide 3-(3-pyridyl)-acrylique, acide 3-(4-imidazolyl)-acrylique, acide 3-pyridylhydroxyméthanesulfonique, pyridine, picoline, acide quinoléine-sulfonique, 3-aminopyridine, 2,3-diaminopyridine, 2,3-di-(2-pyridyl)pyrazine, acide 2-(pyridyl)-4-éthanesulfonique. 1-(3-sulfopropyl)-pyridiniumbétaïne, 1-(3-sulfopropyl)-isoquinoléiniumbétaïne et leurs sels et dérivés,
et contenant comme second agent de brillantage au moins un composé selon la formule générale
R - SOm-H (I)
dans laquellem désigne le nombre 3 ou 4 ;R désigne un groupe alkyle à chaîne linéaire ou ramifiée, ou encore cyclique, comportant jusqu'à 20 atomes C, et dans le cas m = 4 également un groupe aryle ou hétéroaryle comportant jusqu'à 10 atomes C qui peuvent être substitués le cas échéant de façon simple ou multiple à l'aide de groupes alkyle à chaîne linéaire ou ramifiée comportant de 1 à 14 atomes C. - Bain électrolytique selon la revendication 1,
contenant, comme second agent de brillantage, au moins un composé selon la formule I dans laquelle R est un groupe alkyle à chaîne linéaire ou ramifiée comportant de 5 à 12 atomes C, de préférence un groupe alkyle à chaîne ramifiée comportant de 6 à 10 atomes C. - Bain électrolytique selon la revendication 1 ou 2,
contenant, comme second agent de brillantage au moins un composé sélectionné parmi les substances suivantes : sulfonate de pentyle, sulfonate d'hexyle, sulfonate d'heptyle, sulfonate d'octyle, sulfonate de nonyle, sulfonate de décyle, sulfonate de dodécyle, sulfonate de cyclohexyle, sulfate de pentyle, sulfate d'hexyle, sulfate d'heptyle, sulfate d'octyle, sulfate de nonyle, sulfate de décyle, sulfate de dodécyle, sulfate de cyclohexyle ou leurs isomères. - Bain électrolytique selon les revendications 1 à 3,
contenant de 0,01 à 10 g/litre, de préférence de 0,1 à 5 g/litre, de composé selon la formule I. - Utilisation de composés selon la formule générale
R - SOm-H (I)
dans laquellem désigne le nombre 3 ou 4 ; etR désigne un groupe alkyle à chaîne linéaire ou ramifiée, ou encore cyclique, comportant jusqu'à 20 atomes C, et dans le cas m = 4 également un groupe aryle ou hétéroaryle comportant jusqu'à 10 atomes C qui peuvent être substitués le cas échéant de façon simple ou multiple à l'aide de groupes alkyle à chaîne linéaire ou ramifiée comportant de 1 à 14 atomes C,comme second agent de brillantage dans des bains acides pour déposer par voie électrolytique des couches d'or ou d'alliage d'or brillantes, bains contenant de l'or et le cas échéant un ou plusieurs éléments d'alliage sous forme dissoute, ainsi qu'au moins un premier agent de brillantage, sélectionné parmi les substances suivantes : acide pyridine-3-sulfonique, acide nicotinique, amide d'acide nicotinique, acide 3-(3-pyridyl)-acrylique, acide 3-(4-imidazolyl)-acrylique, acide 3-pyridylhydroxyméthanesulfonique, pyridine, picoline, acide quinoléine-sulfonique, 3-aminopyridine, 2,3-diaminopyridine, 2,3-di-(2-pyridyl)pyrazine, acide 2-(pyridyl)-4-éthanesulfonique, 1-(3-sulfopropyl)-pyridiniumbétaïne, 1-(3-sulfopropyl)-isoquinoléiniumbétaïne et leurs sels et dérivés. - Procédé pour déposer par voie électrolytique des couches d'or ou d'alliage d'or brillantes,
le dépôt s'effectuant à partir d'un bain selon les revendications 1 à 4 pour un pH situé dans la gamme de 3 à 6, de préférence de 4 à 5.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19927642 | 1999-06-17 | ||
| DE19927642 | 1999-06-17 | ||
| DE10007325 | 2000-02-17 | ||
| DE10007325A DE10007325A1 (de) | 1999-06-17 | 2000-02-17 | Saures Bad zur galvanischen Abscheidung von glänzenden Gold- und Goldlegierungsschichten und Glanzzusatz hierfür |
| PCT/EP2000/003993 WO2000079031A1 (fr) | 1999-06-17 | 2000-05-04 | Bain acide pour deposer par voie electrolytique des couches d'or ou d'alliage d'or brillantes, et agent de brillantage prevu a cet effet |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP1192297A1 EP1192297A1 (fr) | 2002-04-03 |
| EP1192297B1 true EP1192297B1 (fr) | 2007-01-10 |
Family
ID=26004396
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP00929491A Expired - Lifetime EP1192297B1 (fr) | 1999-06-17 | 2000-05-04 | Bain acide pour deposer par voie electrolytique des couches d'or ou d'alliage d'or brillantes, et agent de brillantage prevu a cet effet |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6814850B1 (fr) |
| EP (1) | EP1192297B1 (fr) |
| JP (1) | JP3933930B2 (fr) |
| CN (1) | CN1205360C (fr) |
| DE (1) | DE50013952D1 (fr) |
| HK (1) | HK1047773B (fr) |
| TW (1) | TWI234591B (fr) |
| WO (1) | WO2000079031A1 (fr) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6736954B2 (en) * | 2001-10-02 | 2004-05-18 | Shipley Company, L.L.C. | Plating bath and method for depositing a metal layer on a substrate |
| JP4868116B2 (ja) * | 2005-09-30 | 2012-02-01 | 学校法人早稲田大学 | 金−コバルト系アモルファス合金めっき皮膜、電気めっき液及び電気めっき方法 |
| JP4868121B2 (ja) * | 2005-12-21 | 2012-02-01 | 学校法人早稲田大学 | アモルファス金−ニッケル系合金めっき皮膜形成用電気めっき液及び電気めっき方法 |
| JP4945193B2 (ja) * | 2006-08-21 | 2012-06-06 | ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． | 硬質金合金めっき液 |
| CH714243B1 (fr) * | 2006-10-03 | 2019-04-15 | Swatch Group Res & Dev Ltd | Procédé d'électroformage et pièce ou couche obtenue par ce procédé. |
| CH710184B1 (fr) | 2007-09-21 | 2016-03-31 | Aliprandini Laboratoires G | Procédé d'obtention d'un dépôt d'alliage d'or jaune par galvanoplastie sans utilisation de métaux ou métalloïdes toxiques. |
| EP2312021B1 (fr) * | 2009-10-15 | 2020-03-18 | The Swatch Group Research and Development Ltd. | Procédé d'obtention d'un dépôt d'alliage d'or jaune par galvanoplastie sans utilisation de métaux toxiques |
| JP5471276B2 (ja) * | 2009-10-15 | 2014-04-16 | 上村工業株式会社 | 電気銅めっき浴及び電気銅めっき方法 |
| JP2011122192A (ja) * | 2009-12-09 | 2011-06-23 | Ne Chemcat Corp | 電解硬質金めっき液及びこれを用いるめっき方法 |
| SG179380A1 (en) * | 2010-09-21 | 2012-04-27 | Rohm & Haas Elect Mat | Cyanide-free silver electroplating solutions |
| JP2013177654A (ja) * | 2012-02-28 | 2013-09-09 | Matex Japan Co Ltd | 電解硬質金めっき液、めっき方法、及び、金−鉄合金被膜の製造方法 |
| CN105463530A (zh) * | 2015-12-23 | 2016-04-06 | 苏州市金星工艺镀饰有限公司 | 一种装饰性镍铜金三元合金电镀液 |
| CN105401180A (zh) * | 2015-12-23 | 2016-03-16 | 苏州市金星工艺镀饰有限公司 | 一种耐磨镀金膜的电镀液及其电镀方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2355581C3 (de) | 1973-11-07 | 1979-07-12 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler, 6000 Frankfurt | Galvanisches Glanzgoldbad mit hoher Abscheidungsgeschwindigkeit |
| CH629258A5 (en) * | 1978-02-23 | 1982-04-15 | Systemes Traitements Surfaces | Bath for electrolytic deposition of white gold alloy |
| DE3032469A1 (de) * | 1980-08-28 | 1982-04-01 | Siemens AG, 1000 Berlin und 8000 München | Cyanidische goldbaeder und verfahren zur galvanischen abscheidung von feststoffschmiermittel-haltigen gold-dispersionsueberzuegen und seine anwendung |
| JPS604920B2 (ja) | 1981-03-30 | 1985-02-07 | 日本鉱業株式会社 | 耐摩耗性良好な黒色ロジウムメッキ被覆物品の製造方法 |
| US4402802A (en) | 1981-01-03 | 1983-09-06 | Dequssa Aktiengesellschaft | Electrolytic bath for the deposition of rhodium coatings |
| CH680370A5 (fr) * | 1989-12-19 | 1992-08-14 | H E Finishing Sa | |
| JPH1150295A (ja) | 1997-07-28 | 1999-02-23 | Daiwa Kasei Kenkyusho:Kk | めっき浴 |
-
2000
- 2000-05-04 US US10/009,467 patent/US6814850B1/en not_active Expired - Fee Related
- 2000-05-04 HK HK02109454.8A patent/HK1047773B/zh not_active IP Right Cessation
- 2000-05-04 CN CNB00808582XA patent/CN1205360C/zh not_active Expired - Fee Related
- 2000-05-04 WO PCT/EP2000/003993 patent/WO2000079031A1/fr not_active Ceased
- 2000-05-04 JP JP2001505372A patent/JP3933930B2/ja not_active Expired - Fee Related
- 2000-05-04 EP EP00929491A patent/EP1192297B1/fr not_active Expired - Lifetime
- 2000-05-04 DE DE50013952T patent/DE50013952D1/de not_active Expired - Lifetime
- 2000-06-12 TW TW089111445A patent/TWI234591B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JP2003502513A (ja) | 2003-01-21 |
| HK1047773B (zh) | 2006-01-27 |
| US6814850B1 (en) | 2004-11-09 |
| EP1192297A1 (fr) | 2002-04-03 |
| CN1205360C (zh) | 2005-06-08 |
| WO2000079031A1 (fr) | 2000-12-28 |
| CN1357060A (zh) | 2002-07-03 |
| TWI234591B (en) | 2005-06-21 |
| DE50013952D1 (de) | 2007-02-22 |
| JP3933930B2 (ja) | 2007-06-20 |
| HK1047773A1 (en) | 2003-03-07 |
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