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AU2003255718A1 - Detection of metal contaminants on a surface of an as-cleaned semiconductor structure based on photoluminescence measurements - Google Patents

Detection of metal contaminants on a surface of an as-cleaned semiconductor structure based on photoluminescence measurements

Info

Publication number
AU2003255718A1
AU2003255718A1 AU2003255718A AU2003255718A AU2003255718A1 AU 2003255718 A1 AU2003255718 A1 AU 2003255718A1 AU 2003255718 A AU2003255718 A AU 2003255718A AU 2003255718 A AU2003255718 A AU 2003255718A AU 2003255718 A1 AU2003255718 A1 AU 2003255718A1
Authority
AU
Australia
Prior art keywords
detection
semiconductor structure
structure based
metal contaminants
cleaned semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003255718A
Inventor
Victor Higgs
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aoti Operating Co Inc
Original Assignee
Aoti Operating Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aoti Operating Co Inc filed Critical Aoti Operating Co Inc
Publication of AU2003255718A1 publication Critical patent/AU2003255718A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64—Fluorescence; Phosphorescence
    • G01N21/6489—Photoluminescence of semiconductors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers

Landscapes

  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
AU2003255718A 2002-07-17 2003-07-14 Detection of metal contaminants on a surface of an as-cleaned semiconductor structure based on photoluminescence measurements Abandoned AU2003255718A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB0216620.5 2002-07-17
GB0216620A GB0216620D0 (en) 2002-07-17 2002-07-17 Detection method and apparatus
PCT/GB2003/003071 WO2004008125A1 (en) 2002-07-17 2003-07-14 Detection of metal contaminants on a surface of an as-cleaned semiconductor structure based on photoluminescence measurements

Publications (1)

Publication Number Publication Date
AU2003255718A1 true AU2003255718A1 (en) 2004-02-02

Family

ID=9940655

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003255718A Abandoned AU2003255718A1 (en) 2002-07-17 2003-07-14 Detection of metal contaminants on a surface of an as-cleaned semiconductor structure based on photoluminescence measurements

Country Status (4)

Country Link
AU (1) AU2003255718A1 (en)
GB (1) GB0216620D0 (en)
TW (1) TW200408806A (en)
WO (1) WO2004008125A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006204292A (en) * 2004-12-27 2006-08-10 Asahi Kasei Corp Human embryonic stem cell differentiation inhibitor
WO2011015412A1 (en) * 2009-08-04 2011-02-10 Asml Netherlands B.V. Object inspection systems and methods
US9274441B2 (en) 2010-08-16 2016-03-01 Asml Netherlands B.V. Inspection method for imprint lithography and apparatus therefor
JP2014503843A (en) 2010-12-06 2014-02-13 エーエスエムエル ネザーランズ ビー．ブイ． Article inspection method and inspection apparatus, EUV lithography reticle, lithographic apparatus, and device manufacturing method
US20170066020A1 (en) * 2014-02-27 2017-03-09 Walter Surface Technologies Inc. Industrial cleanliness measurement methodology
CN108613967B (en) * 2018-08-09 2020-12-08 江苏师范大学 A Raman Spectroscopy System
CN118841342B (en) * 2024-06-18 2025-02-25 昆山麦普恩精密组件有限公司 A control method and system for surface treatment of semiconductor parts

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5922606A (en) * 1997-09-16 1999-07-13 Nalco Chemical Company Fluorometric method for increasing the efficiency of the rinsing and water recovery process in the manufacture of semiconductor chips
US6911347B2 (en) * 2000-10-06 2005-06-28 Aoti Operating Company, Inc. Method to detect surface metal contamination

Also Published As

Publication number Publication date
TW200408806A (en) 2004-06-01
GB0216620D0 (en) 2002-08-28
WO2004008125A1 (en) 2004-01-22

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase