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MX2019011879A - Metodo y dispositivo de electroenchapado. - Google Patents

Metodo y dispositivo de electroenchapado.

Info

Publication number
MX2019011879A
MX2019011879A MX2019011879A MX2019011879A MX2019011879A MX 2019011879 A MX2019011879 A MX 2019011879A MX 2019011879 A MX2019011879 A MX 2019011879A MX 2019011879 A MX2019011879 A MX 2019011879A MX 2019011879 A MX2019011879 A MX 2019011879A
Authority
MX
Mexico
Prior art keywords
substrates
electroplating tank
circumferential direction
electroplating
flow
Prior art date
Application number
MX2019011879A
Other languages
English (en)
Inventor
Iimori Masayuki
Takeda Ryosuke
Original Assignee
Ykk Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ykk Corp filed Critical Ykk Corp
Publication of MX2019011879A publication Critical patent/MX2019011879A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/02—Slide fasteners
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/16—Apparatus for electrolytic coating of small objects in bulk
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/16—Apparatus for electrolytic coating of small objects in bulk
    • C25D17/18—Apparatus for electrolytic coating of small objects in bulk having closed containers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/007—Electroplating using magnetic fields, e.g. magnets
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • A—HUMAN NECESSITIES
    • A44—HABERDASHERY; JEWELLERY
    • A44B—BUTTONS, PINS, BUCKLES, SLIDE FASTENERS, OR THE LIKE
    • A44B19/00—Slide fasteners
    • A44B19/24—Details
    • A44B19/26—Sliders
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/10—Agitating of electrolytes; Moving of racks
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/58—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/625—Discontinuous layers, e.g. microcracked layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

Un método para electroenchapado puede incluir: un paso para agitar múltiples miembros de base (51) que se han sumergido en una solución electrolítica dentro de un tanque de electroenchapado (10) para que fluyan en una dirección de circunferencia a lo largo de una pared interior (19) del tanque de electroenchapado (10); y un paso de electroenchapado de los múltiples miembros de base (51) que fluyen a lo largo de la dirección de la circunferencia en la solución electrolítica dentro del tanque de electroenchapado (10). El flujo de los múltiples miembros de base (51) a lo largo de la circunferencia la dirección es causado por un flujo de medios magnéticos (30) a lo largo de la dirección de la circunferencia en la solución electrolítica dentro del tanque de electroenchapado (10) o es causado por la rotación de una unidad de agitación (46) provista en un lado inferior del tanque de electroenchapado (10). Al menos uno de los múltiples miembros de la base (51) que fluye a lo largo de la dirección de la circunferencia en la solución electrolítica dentro del tanque de electroenchapado (10) toca un cátodo inferior (21) provisto en un lado inferior del tanque de electroenchapado (10) y un miembro de base (51) colocado hacia arriba con relación a dicho miembro de base (51) que toca el cátodo inferior (21) está conectado eléctricamente al cátodo inferior (21) a través de al menos dicho miembro de base (51) que toca el cátodo inferior (21).
MX2019011879A 2017-04-14 2017-05-11 Metodo y dispositivo de electroenchapado. MX2019011879A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/JP2017/015365 WO2018189901A1 (ja) 2017-04-14 2017-04-14 めっき材及びその製造方法
PCT/JP2017/017949 WO2018189916A1 (ja) 2017-04-14 2017-05-11 電気めっき方法及び装置

Publications (1)

Publication Number Publication Date
MX2019011879A true MX2019011879A (es) 2019-12-02

Family

ID=63792499

Family Applications (2)

Application Number Title Priority Date Filing Date
MX2019011879A MX2019011879A (es) 2017-04-14 2017-05-11 Metodo y dispositivo de electroenchapado.
MX2019010840A MX2019010840A (es) 2017-04-14 2018-04-03 Material enchapado y metodo de fabricacion del mismo.

Family Applications After (1)

Application Number Title Priority Date Filing Date
MX2019010840A MX2019010840A (es) 2017-04-14 2018-04-03 Material enchapado y metodo de fabricacion del mismo.

Country Status (12)

Country Link
US (2) US11236431B2 (es)
EP (2) EP3611294B1 (es)
JP (2) JP6722821B2 (es)
KR (2) KR102282185B1 (es)
CN (2) CN110475913B (es)
BR (1) BR112019011899B1 (es)
ES (1) ES2975060T3 (es)
MX (2) MX2019011879A (es)
PL (1) PL3611294T3 (es)
RU (1) RU2718587C1 (es)
TW (2) TWI679315B (es)
WO (3) WO2018189901A1 (es)

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Also Published As

Publication number Publication date
WO2018190202A1 (ja) 2018-10-18
MX2019010840A (es) 2019-11-18
BR112019011899B1 (pt) 2023-01-17
KR102282185B1 (ko) 2021-07-27
BR112019011972A2 (pt) 2019-11-05
JPWO2018190202A1 (ja) 2019-11-07
TWI679315B (zh) 2019-12-11
KR20190087586A (ko) 2019-07-24
JP6793251B2 (ja) 2020-12-02
EP3611293B1 (en) 2024-01-03
US20200095700A1 (en) 2020-03-26
EP3611294A1 (en) 2020-02-19
CN110475913B (zh) 2020-09-01
RU2718587C1 (ru) 2020-04-08
WO2018189916A1 (ja) 2018-10-18
TW201842235A (zh) 2018-12-01
PL3611294T3 (pl) 2024-06-24
US11072866B2 (en) 2021-07-27
CN110462110A (zh) 2019-11-15
EP3611293A4 (en) 2021-02-17
EP3611293A1 (en) 2020-02-19
US11236431B2 (en) 2022-02-01
CN110462110B (zh) 2020-08-11
TW201942420A (zh) 2019-11-01
JPWO2018189916A1 (ja) 2019-11-07
BR112019011899A2 (pt) 2019-10-22
US20200032410A1 (en) 2020-01-30
WO2018189901A1 (ja) 2018-10-18
CN110475913A (zh) 2019-11-19
EP3611294B1 (en) 2024-01-24
JP6722821B2 (ja) 2020-07-15
TWI691621B (zh) 2020-04-21
KR20190087585A (ko) 2019-07-24
KR102243188B1 (ko) 2021-04-22
EP3611294A4 (en) 2021-01-13
ES2975060T3 (es) 2024-07-03

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