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WO2025191843A1 - Charged particle beam device - Google Patents

Charged particle beam device

Info

Publication number
WO2025191843A1
WO2025191843A1 PCT/JP2024/010272 JP2024010272W WO2025191843A1 WO 2025191843 A1 WO2025191843 A1 WO 2025191843A1 JP 2024010272 W JP2024010272 W JP 2024010272W WO 2025191843 A1 WO2025191843 A1 WO 2025191843A1
Authority
WO
WIPO (PCT)
Prior art keywords
charged particle
particle beam
wavelength light
scintillator
long
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/JP2024/010272
Other languages
French (fr)
Japanese (ja)
Inventor
恵理 高橋
伸 今村
俊介 水谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Tech Corp filed Critical Hitachi High Tech Corp
Priority to PCT/JP2024/010272 priority Critical patent/WO2025191843A1/en
Publication of WO2025191843A1 publication Critical patent/WO2025191843A1/en
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01TMEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16Measuring radiation intensity
    • G01T1/20Measuring radiation intensity with scintillation detectors
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01TMEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16Measuring radiation intensity
    • G01T1/20Measuring radiation intensity with scintillation detectors
    • G01T1/208Circuits specially adapted for scintillation detectors, e.g. for the photo-multiplier section
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/244Detectors; Associated components or circuits therefor

Definitions

  • the present invention relates to a charged particle beam device equipped with a detector having a scintillator that emits light when electrons are incident on it.
  • Charged particle beam devices generate observation images of a sample by irradiating the sample with a beam of charged particles, such as an electron beam, and detecting secondary electrons, transmitted electrons, backscattered electrons, and X-rays emitted from the sample.
  • the detector that detects the electrons has a scintillator that emits light when electrons are incident on it, and a photodetector that outputs an electrical signal corresponding to the amount of light emitted by the scintillator.
  • the light emitted by the scintillator contains long-wavelength light, which has a relatively long emission wavelength, and short-wavelength light, which has a relatively short emission wavelength. Long-wavelength light has a longer decay time than short-wavelength light, which reduces the time resolution of the detector.
  • Patent Document 1 discloses a detection device equipped with an optical filter that reduces the intensity of light components with wavelengths greater than 650 nm in order to increase time resolution.
  • Patent Document 1 does not give sufficient consideration to improving the electrical signal output from the detector. If the intensity of long-wavelength light, such as light components with wavelengths greater than 650 nm, is reduced using an optical filter, the electrical signal output from the detector will decrease while electrons are incident, resulting in a degradation of the image quality of the generated observation image.
  • the present invention therefore aims to provide a charged particle beam device that suppresses degradation of the observed image while maintaining the detector's time resolution.
  • the present invention provides a charged particle beam device comprising: a charged particle source that irradiates a sample with a charged particle beam; a detector that detects electrons emitted from the sample by the irradiation of the charged particle beam and outputs an electrical signal; and a control unit that generates an observation image based on the electrical signal and controls each unit;
  • the detector has a scintillator that emits light when electrons are incident on it, a light-receiving element that outputs an electrical signal corresponding to the amount of light emitted by the scintillator, and a long-wavelength light reduction unit that reduces the intensity of long-wavelength light that has a relatively long wavelength among the light emitted by the scintillator; and the control unit controls the detector to reduce the intensity of the long-wavelength light if a parameter of the electrons incident on the scintillator exceeds a predetermined threshold, and not to reduce the intensity of the long-wavelength light if the parameter does
  • the present invention provides a charged particle beam device that suppresses degradation of the observed image while maintaining the time resolution of the detector. Issues, configurations, and advantages other than those described above will become clear from the description of the following embodiments of the invention.
  • FIG. 1 is a schematic diagram illustrating an example of the overall configuration of a charged particle beam device.
  • FIG. 10 is a schematic diagram showing another example of the overall configuration of a charged particle beam device.
  • FIG. 2 is a diagram illustrating the decay time of light emission from a scintillator.
  • FIG. 1 is a diagram comparing the emission spectra of scintillators with the energy of incident electrons.
  • FIG. 10 is a diagram comparing emission spectra with reduced long wavelength light depending on the energy of incident electrons.
  • FIG. 2 is a schematic diagram showing an example of the configuration of a detector.
  • FIG. 10 is a schematic diagram showing another example of the configuration of the detector.
  • FIG. 10 is a schematic diagram showing another example of the configuration of the detector.
  • FIG. 10 is a schematic diagram showing another example of the configuration of the detector.
  • a charged particle beam device is a device that irradiates a sample with a charged particle beam, detects secondary electrons, transmitted electrons, reflected electrons, X-rays, and the like emitted from the sample, and generates an observation image of the sample; for example, it is a scanning electron microscope that scans the sample with an electron beam.
  • the charged particle beam device 1a comprises an electron optical column 7, a sample chamber 8, and a control unit 10.
  • the insides of the electron optical column 7 and the sample chamber 8 are maintained at a vacuum.
  • the electron optical column 7 is equipped with an electron source 2 that emits an electron beam 3.
  • the sample chamber 8 is equipped with a detector 6, in which a sample 4, which is the object to be observed, is placed. The detector 6 detects secondary electrons 5a emitted from the sample 4 when irradiated with the electron beam 3, and outputs an electrical signal.
  • the detector 6 has a scintillator 6a, a light guide 6b, and a photodetector 6c.
  • the scintillator 6a is a material containing at least one element from the group consisting of Ga, Zn, In, Al, Cd, Mg, Ca, Sr, Y, Si, Gd, and Ce, and emits light when electrons are incident on it.
  • the photodetector 6c is, for example, a photomultiplier tube or a semiconductor sensor, and outputs an electrical signal corresponding to the amount of light emitted by the scintillator 6a.
  • the light guide 6b connects the scintillator 6a and the photodetector 6c, and transmits the light emitted by the scintillator 6a to the photodetector 6c, which is located outside the sample chamber 8. Note that if the photodetector 6c is located inside the sample chamber 8, the light guide 6b is not required.
  • a positive voltage may be applied to the scintillator 6a to increase the number of relatively low-energy secondary electrons 5a incident on the scintillator 6a.
  • the control unit 10 is, for example, a computer with an arithmetic unit, and generates an observation image of the sample 4 based on the electrical signal output from the light-receiving element 6c, and controls each component.
  • the charged particle beam device 1b is equipped with an electron optical column 7, a sample chamber 8, and a control unit 10, but the arrangement and shape of the detector 6 differs from that of the charged particle beam device 1a.
  • the detector 6 of the charged particle beam device 1b is placed directly above the sample 4 and has a circular or U-shape with a space through which the electron beam 3 passes.
  • the detector 6 placed directly above the sample 4 can efficiently detect backscattered electrons 5b, which are emitted in smaller quantities than secondary electrons 5a.
  • the decay time of the light emission from the scintillator 6a will be explained using Figure 3.
  • the graph in Figure 3 shows an example of the change in the light emission intensity of the scintillator 6a over time, with the vertical axis representing light emission intensity and the horizontal axis representing time.
  • the incident period is the period during which electrons are incident on the scintillator 6a
  • the non-incident period is the period during which electrons are not incident on the scintillator 6a.
  • the intensity of the light emitted by the scintillator 6a due to the incidence of secondary electrons 5a and backscattered electrons 5b does not immediately reach zero when the non-incident period begins, but decays over time as shown in Figure 3.
  • the decay time which indicates the rate at which the light intensity decays during the non-incident period, varies depending on the emission wavelength, with long-wavelength light having a relatively long emission wavelength being longer than short-wavelength light having a relatively short emission wavelength.
  • the decay time also differs depending on the type of scintillator 6a.
  • Long-wavelength light is a light component with a wavelength longer than, for example, any of 450 nm to 600 nm.
  • the light emitted during the non-incident period is called afterglow, and becomes noise in the detector 6, reducing the time resolution.
  • the reduction in time resolution can be suppressed by reducing the intensity of long-wavelength light, which has a long decay time.
  • the reduction in the intensity of long-wavelength light will be explained using Figures 4 and 5.
  • the graph in Figure 4 is an example of the emission spectrum of the scintillator 6a
  • the graph in Figure 5 is the same as Figure 4 with the intensity of long-wavelength light reduced, with the vertical axis representing emission intensity, the horizontal axis representing emission wavelength, and the depth axis representing time.
  • (a) in Figures 4 and 5 shows a case where the energy of the incident electrons is relatively high
  • (b) shows a case where the energy of the incident electrons is relatively low, with time t0 being the incidence period and time t1 being the non-incidence period.
  • the electrical signal output from the light-receiving element 6c has a value corresponding to the sum of the emission intensity of short-wavelength light and the emission intensity of long-wavelength light.
  • the emission intensity of the long-wavelength light is greater than that of the short-wavelength light, and the afterglow of the long-wavelength light may exceed the detection limit of the light-receiving element 6c. Therefore, by reducing the intensity of the long-wavelength light, as in Figure 5(a), the afterglow of the long-wavelength light can be made below the detection limit, preventing a decrease in time resolution.
  • the emission intensity of the long-wavelength light is lower than that of the short-wavelength light, and the afterglow of the long-wavelength light may fall below the detection limit of the light-receiving element 6c.
  • the emission intensity of the long-wavelength light is lower than that of the short-wavelength light, reducing the intensity of the long-wavelength light, as in Figure 5(b), reduces the emission intensity at time t0, which is the incidence period, and the quality of the observed image deteriorates.
  • the scintillator 6a by controlling whether or not to reduce the emission intensity of long-wavelength light depending on the energy of the electrons incident on the scintillator 6a, it is possible to suppress degradation of the observed image while maintaining the time resolution of the detector 6.
  • the energy of the incident electrons is higher when they are backscattered electrons 5b than when they are secondary electrons 5a.
  • the higher the voltage applied to the scintillator 6a the higher the energy of the incident electrons, so the energy of secondary electrons 5a incident when a voltage is applied to the scintillator 6a may be higher than the energy of backscattered electrons 5b when no applied voltage is present.
  • control of whether or not to reduce the emission intensity of long-wavelength light is not limited to being based on the energy of the incident electrons. For example, even if the emission intensity of long-wavelength light is lower than that of short-wavelength light, if the number of incident electron particles is relatively large, the afterglow of the long-wavelength light may exceed the detection limit of the light-receiving element 6c. In other words, whether or not to reduce the emission intensity of long-wavelength light may be controlled according to the number of electron particles incident on the scintillator 6a. The number of incident electron particles increases as the irradiation density of the electron beam 3 increases.
  • FIG. 6(a) Using Figure 6, an example of a detector 6 that controls the reduction in the intensity of long-wavelength light will be described.
  • the detector 6 illustrated in Figure 6(a) has a scintillator 6a, a variable transmittance filter 60, a light guide 6b, and a light receiving element 6c.
  • the scintillator 6a, light guide 6b, and light receiving element 6c are the same as those in the detector 6 in Figure 1, so their description will be omitted.
  • the variable transmittance filter 60 is an optical filter, such as a liquid crystal element, that is disposed between the scintillator 6a and the light guide 6b and that varies the transmittance of long-wavelength light.
  • the transmittance of the variable transmittance filter 60 is controlled by the control unit 10. More specifically, if the parameters of the electrons incident on the scintillator 6a exceed a predetermined threshold, the transmittance of the long-wavelength light is lowered so as to reduce the intensity of the long-wavelength light. If the parameters of the incident electrons do not exceed the threshold, the transmittance of the long-wavelength light is increased so as not to reduce the intensity of the long-wavelength light.
  • the parameters of the incident electrons include, for example, energy and particle number. If the parameter of the incident electrons is energy, the transmittance of long-wavelength light is reduced when the incident electrons are backscattered electrons 5b or when the acceleration voltage of the electron beam 3 is equal to or greater than a predetermined value. Even when the incident electrons are secondary electrons 5a, the transmittance of long-wavelength light is reduced when the voltage applied to the scintillator 6a is equal to or greater than a predetermined value.
  • the predetermined value is any value between 0.1 kV and 100 kV.
  • the threshold value for the energy of the incident electrons is the energy value at which the intensity of long-wavelength light is greater than the intensity of short-wavelength light, and is determined in advance depending on the type of scintillator 6a.
  • the transmittance of long-wavelength light is reduced when the irradiation density of the electron beam 3 is equal to or greater than a predetermined value.
  • the irradiation density of the electron beam 3 is calculated based on the current value of the electron beam 3 and the magnification of the observed image.
  • the threshold value for the number of particles of the incident electrons is the number of particles at which the intensity of long-wavelength light exceeds a predetermined value, for example, the number of particles at which the afterglow of long-wavelength light exceeds the detection limit of the light-receiving element 6c, and is determined in advance depending on the type of scintillator 6a.
  • the detector 6 illustrated in Figure 6(b) differs from that in (a) in that the variable transmittance filter 60 is positioned between the light guide 6b and the light receiving element 6c.
  • the rest of the configuration is the same as in (a).
  • the detector 6 illustrated in Figure 6(c) has a scintillator 6a, a variable transmittance filter 60, and a light-receiving element 6c, with the variable transmittance filter 60 positioned between the scintillator 6a and the light-receiving element 6c.
  • the functions of the scintillator 6a, variable transmittance filter 60, and light-receiving element 6c are the same as in (a) and (b).
  • the detector 6 may be provided with a fixed transmittance filter, an optical filter that absorbs at least a portion of the long-wavelength light and has a constant transmittance.
  • the control unit 10 controls the position of the fixed transmittance filter via a sliding or rotating mechanism in accordance with the parameters of the incident electrons. That is, if the parameter exceeds a threshold value, the fixed transmittance filter is placed between the scintillator 6a and the light-receiving element 6c to reduce the intensity of the long-wavelength light, and if the threshold value is not exceeded, the fixed transmittance filter is removed from between the scintillator 6a and the light-receiving element 6c.
  • a prism that refracts long-wavelength light may be provided in the detector 6.
  • the control unit 10 controls the direction of the prism via a rotary mechanism according to the parameters of the incident electrons. In other words, the orientation of the prism is controlled so that if the parameter exceeds a threshold value, long-wavelength light is prevented from entering the light-receiving element 6c, and if the parameter does not exceed the threshold value, long-wavelength light is allowed to enter the light-receiving element 6c.
  • FIG. 7 Another example of a detector 6 that controls the reduction in the intensity of long-wavelength light will be described.
  • the detector 6 illustrated in Figure 7 has a scintillator 6a, an optical fiber 70, and a photodetector 6c.
  • the scintillator 6a and photodetector 6c are similar to those in the detector 6 in Figure 1, so their description will be omitted.
  • the optical fiber 70 is a transmission path that transmits the light emitted by the scintillator 6a to the photodetector 6c.
  • the control unit 10 utilizes the difference in transmission time to perform switching control so that the photodetector 6c receives short-wavelength light and does not receive long-wavelength light. In other words, when the parameter exceeds the threshold, the photodetector 6c is turned on during periods when short-wavelength light is transmitted, and turned off during periods when long-wavelength light is transmitted.
  • a shutter that is opened and closed by the control unit 10 may be provided upstream of the light receiving element 6c.
  • the shutter is opened during the period when short wavelength light is transmitted, and closed during the period when long wavelength light is transmitted.
  • FIG. 8 Another example of a detector 6 that controls the reduction in the intensity of long-wavelength light will be described.
  • the detector 6 illustrated in Figure 8 has a scintillator 6a, a spectroscope 80, and a photodetector 6c.
  • the scintillator 6a is similar to the detector 6 in Figure 1, so its description will be omitted.
  • the spectroscope 80 separates the light emitted by the scintillator 6a into short-wavelength light and long-wavelength light.
  • the photodetector 6c is an element that outputs an electrical signal corresponding to the amount of light emitted by the scintillator 6a, and has a first photodetector 6c1 that receives long-wavelength light and a second photodetector 6c2 that receives only short-wavelength light.
  • the control unit 10 controls the first photodetector 6c1 according to the parameter of the incident electrons.
  • the first photodetector 6c1 is turned off and only the electrical signal from the second photodetector 6c2 is received; if the parameter does not exceed the threshold, the first photodetector 6c1 is turned on and electrical signals are received from both the second photodetector 6c2 and the first photodetector 6c1.
  • the intensity of the long-wavelength light may be reduced at the arrival position of the high-energy backscattered electrons 5b1, and the intensity of the long-wavelength light may not be reduced at the arrival position of the low-energy backscattered electrons 5b2.
  • FIG. 9 an example of a detector 6 will be described that reduces the intensity of long-wavelength light at the arrival position of high-energy reflected electrons 5b1, but does not reduce the intensity of long-wavelength light at the arrival position of low-energy reflected electrons 5b2.
  • the detector 6 located at the arrival position of low-energy reflected electrons 5b2 has a scintillator 6a, a light guide 6b, and a photodetector 6c.
  • the detector 6 located at the arrival position of high-energy reflected electrons 5b1 has a scintillator 6a, a long-wavelength light absorbing portion 90, a light guide 6b, and a photodetector 6c.
  • the scintillator 6a, light guide 6b, and photodetector 6c are the same as those in the detector 6 in Figure 1, so their description will be omitted.
  • the long-wavelength light absorbing portion 90 absorbs long-wavelength light, and is located somewhere between the scintillator 6a and the photodetector 6c.
  • the emission intensity of long-wavelength light is higher than that of short-wavelength light, and the afterglow of long-wavelength light reduces the time resolution. Therefore, by reducing the intensity of long-wavelength light using the long-wavelength light absorbing section 90, the reduction in time resolution can be suppressed.
  • the emission intensity of long-wavelength light is lower than that of short-wavelength light, and the afterglow of long-wavelength light is not enough to reduce the time resolution. Therefore, by not providing the long-wavelength light absorbing section 90 and not reducing the intensity of long-wavelength light, the emission intensity during the incident period can be prevented from being reduced.
  • 1a, 1b charged particle beam device
  • 2 electron source
  • 3 electron beam
  • 4 sample
  • 5a secondary electrons
  • 5b backscattered electrons
  • 5b1 high-energy backscattered electrons
  • 5b2 low-energy backscattered electrons
  • 6 detector
  • 6a scintillator
  • 6b light guide
  • 6c photodetector
  • 6c1 first photodetector
  • 6c2 second photodetector
  • 7 electron optical column
  • 8 sample chamber
  • 10 control unit
  • 60 variable transmittance filter
  • 70 optical fiber
  • 80 spectrometer
  • 90 long-wavelength light absorbing unit.

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Molecular Biology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Measurement Of Radiation (AREA)

Abstract

To control deterioration of an observation image while maintaining time resolution of a detector, this charged particle beam device comprises: a charged particle source that exposes a sample to a charged particle beam; a detector that detects electrons emitted from the sample due to the exposure to the charged particle beam and that outputs an electrical signal; and a control unit that, on the basis of the electrical signal, generates an observation image and controls each component. The detector has: a scintillator that emits light when electrons are incident thereon; a light-receiving element that outputs an electrical signal corresponding to the amount of light emitted by the scintillator; and a long-wavelength light reduction unit that reduces the intensity of long-wavelength light having a relatively long emission wavelength, among the light emitted by the scintillator. The control unit controls the detector so as to reduce the intensity of the long-wavelength light if a parameter for the electrons incident on the scintillator exceeds a predetermined threshold, and so as not to reduce the intensity of the long-wavelength light if the parameter does not exceed the threshold.

Description

荷電粒子線装置charged particle beam equipment

 本発明は、電子の入射によって発光するシンチレータを有する検出器を備えた荷電粒子線装置に関する。 The present invention relates to a charged particle beam device equipped with a detector having a scintillator that emits light when electrons are incident on it.

 荷電粒子線装置は、電子線のような荷電粒子線を試料に照射し、試料から放出される二次電子や透過電子、反射電子、X線などを検出することで、試料の観察像を生成する装置である。電子を検出する検出器は、電子の入射によって発光するシンチレータと、シンチレータの発光量に応じた電気信号を出力する受光素子とを有する。シンチレータの発光には、発光波長が比較的長い長波長光と発光波長が比較的短い短波長光とが含まれ、長波長光は短波長光に比べて減衰時間が長いので、検出器の時間分解能を低下させる要因となる。 Charged particle beam devices generate observation images of a sample by irradiating the sample with a beam of charged particles, such as an electron beam, and detecting secondary electrons, transmitted electrons, backscattered electrons, and X-rays emitted from the sample. The detector that detects the electrons has a scintillator that emits light when electrons are incident on it, and a photodetector that outputs an electrical signal corresponding to the amount of light emitted by the scintillator. The light emitted by the scintillator contains long-wavelength light, which has a relatively long emission wavelength, and short-wavelength light, which has a relatively short emission wavelength. Long-wavelength light has a longer decay time than short-wavelength light, which reduces the time resolution of the detector.

 特許文献1には、時間分解能を増大させるために、650nmより大きい波長を有する光成分の強度を低減させる光フィルタを備える検出装置が開示されている。 Patent Document 1 discloses a detection device equipped with an optical filter that reduces the intensity of light components with wavelengths greater than 650 nm in order to increase time resolution.

特表2015-505038号公報Special table 2015-505038 publication

 しかしながら特許文献1では、検出器から出力される電気信号の向上に対する配慮が不十分である。650nmより大きい波長を有する光成分のような長波長光の強度を光フィルタで低減させた場合、電子が入射している期間に検出器から出力される電気信号が低下するので、生成される観察像の画質が劣化する。 However, Patent Document 1 does not give sufficient consideration to improving the electrical signal output from the detector. If the intensity of long-wavelength light, such as light components with wavelengths greater than 650 nm, is reduced using an optical filter, the electrical signal output from the detector will decrease while electrons are incident, resulting in a degradation of the image quality of the generated observation image.

 そこで本発明は、検出器の時間分解能を維持しながら観察像の劣化を抑制する荷電粒子線装置を提供することを目的とする。 The present invention therefore aims to provide a charged particle beam device that suppresses degradation of the observed image while maintaining the detector's time resolution.

 上記目的を達成するために本発明は、試料に荷電粒子線を照射する荷電粒子源と、前記荷電粒子線の照射によって前記試料から放出される電子を検出して電気信号を出力する検出器と、前記電気信号に基づいて観察像を生成するとともに各部を制御する制御部を備える荷電粒子線装置であって、前記検出器は、電子の入射によって発光するシンチレータと、前記シンチレータの発光量に応じた電気信号を出力する受光素子と、前記シンチレータの発光のうち発光波長が比較的長い長波長光の強度を低減させる長波長光低減部を有し、前記制御部は、前記シンチレータに入射する電子のパラメータが予め定められた閾値を超過すれば前記長波長光の強度を低減させ、前記パラメータが前記閾値を超過しなければ前記長波長光の強度を低減させないように前記検出器を制御することを特徴とする。 In order to achieve the above object, the present invention provides a charged particle beam device comprising: a charged particle source that irradiates a sample with a charged particle beam; a detector that detects electrons emitted from the sample by the irradiation of the charged particle beam and outputs an electrical signal; and a control unit that generates an observation image based on the electrical signal and controls each unit; the detector has a scintillator that emits light when electrons are incident on it, a light-receiving element that outputs an electrical signal corresponding to the amount of light emitted by the scintillator, and a long-wavelength light reduction unit that reduces the intensity of long-wavelength light that has a relatively long wavelength among the light emitted by the scintillator; and the control unit controls the detector to reduce the intensity of the long-wavelength light if a parameter of the electrons incident on the scintillator exceeds a predetermined threshold, and not to reduce the intensity of the long-wavelength light if the parameter does not exceed the threshold.

 本発明によれば、検出器の時間分解能を維持しながら観察像の劣化を抑制する荷電粒子線装置を提供できる。上記した以外の課題、構成および効果は、以下の発明を実施するための形態の説明により明らかにされる。 The present invention provides a charged particle beam device that suppresses degradation of the observed image while maintaining the time resolution of the detector. Issues, configurations, and advantages other than those described above will become clear from the description of the following embodiments of the invention.

荷電粒子線装置の全体構成の一例を示す概略図である。1 is a schematic diagram illustrating an example of the overall configuration of a charged particle beam device. 荷電粒子線装置の全体構成の他の例を示す概略図である。FIG. 10 is a schematic diagram showing another example of the overall configuration of a charged particle beam device. シンチレータの発光の減衰時間について説明する図である。FIG. 2 is a diagram illustrating the decay time of light emission from a scintillator. シンチレータの発光スペクトルを入射電子のエネルギーで比較する図である。FIG. 1 is a diagram comparing the emission spectra of scintillators with the energy of incident electrons. 長波長光を低減させた発光スペクトルを入射電子のエネルギーで比較する図である。FIG. 10 is a diagram comparing emission spectra with reduced long wavelength light depending on the energy of incident electrons. 検出器の構成の一例を示す概略図である。FIG. 2 is a schematic diagram showing an example of the configuration of a detector. 検出器の構成の他の例を示す概略図である。FIG. 10 is a schematic diagram showing another example of the configuration of the detector. 検出器の構成の他の例を示す概略図である。FIG. 10 is a schematic diagram showing another example of the configuration of the detector. 検出器の構成の他の例を示す概略図である。FIG. 10 is a schematic diagram showing another example of the configuration of the detector.

 以下、添付図面に従って本発明に係る荷電粒子線装置の実施例について説明する。荷電粒子線装置は、荷電粒子線を試料に照射し、試料から放出される二次電子や透過電子、反射電子、X線などを検出して、試料の観察像を生成する装置であり、例えば電子線で試料を走査する走査電子顕微鏡である。 An embodiment of a charged particle beam device according to the present invention will now be described with reference to the accompanying drawings. A charged particle beam device is a device that irradiates a sample with a charged particle beam, detects secondary electrons, transmitted electrons, reflected electrons, X-rays, and the like emitted from the sample, and generates an observation image of the sample; for example, it is a scanning electron microscope that scans the sample with an electron beam.

 図1を用いて、荷電粒子線装置の全体構成の一例について説明する。荷電粒子線装置1aは、電子光学鏡筒7、試料室8、制御部10を備える。電子光学鏡筒7と試料室8の内部は真空に保たれる。電子光学鏡筒7には、電子線3を出射する電子源2が設けられる。試料室8には、検出器6が設けられ、観察対象物である試料4が配置される。検出器6は、電子線3の照射によって試料4から放出される二次電子5aを検出して電気信号を出力する。 An example of the overall configuration of a charged particle beam device will be described using Figure 1. The charged particle beam device 1a comprises an electron optical column 7, a sample chamber 8, and a control unit 10. The insides of the electron optical column 7 and the sample chamber 8 are maintained at a vacuum. The electron optical column 7 is equipped with an electron source 2 that emits an electron beam 3. The sample chamber 8 is equipped with a detector 6, in which a sample 4, which is the object to be observed, is placed. The detector 6 detects secondary electrons 5a emitted from the sample 4 when irradiated with the electron beam 3, and outputs an electrical signal.

 検出器6は、シンチレータ6aとライトガイド6bと受光素子6cを有する。シンチレータ6aは、Ga、Zn、In、Al、Cd、Mg、Ca、Sr、Y、Si、Gd、Ceの中の少なくとも一つの元素を含む材料であり、電子の入射によって発光する。受光素子6cは、例えば光電子増倍管や半導体センサであり、シンチレータ6aの発光量に応じた電気信号を出力する。ライトガイド6bは、シンチレータ6aと受光素子6cを接続し、試料室8の外に配置される受光素子6cへシンチレータ6aの発光を伝送する。なお受光素子6cが試料室8の中に配置される場合、ライトガイド6bは必須ではない。またエネルギーが比較的低い二次電子5aのシンチレータ6aへの入射数を増やすために、シンチレータ6aに正電圧が印加されても良い。 The detector 6 has a scintillator 6a, a light guide 6b, and a photodetector 6c. The scintillator 6a is a material containing at least one element from the group consisting of Ga, Zn, In, Al, Cd, Mg, Ca, Sr, Y, Si, Gd, and Ce, and emits light when electrons are incident on it. The photodetector 6c is, for example, a photomultiplier tube or a semiconductor sensor, and outputs an electrical signal corresponding to the amount of light emitted by the scintillator 6a. The light guide 6b connects the scintillator 6a and the photodetector 6c, and transmits the light emitted by the scintillator 6a to the photodetector 6c, which is located outside the sample chamber 8. Note that if the photodetector 6c is located inside the sample chamber 8, the light guide 6b is not required. A positive voltage may be applied to the scintillator 6a to increase the number of relatively low-energy secondary electrons 5a incident on the scintillator 6a.

 制御部10は、例えば演算器を有するコンピュータであり、受光素子6cから出力される電気信号に基づいて試料4の観察像を生成するとともに、各部を制御する。 The control unit 10 is, for example, a computer with an arithmetic unit, and generates an observation image of the sample 4 based on the electrical signal output from the light-receiving element 6c, and controls each component.

 図2を用いて、荷電粒子線装置の全体構成の他の例について説明する。荷電粒子線装置1bは、荷電粒子線装置1aと同様に、電子光学鏡筒7、試料室8、制御部10を備えるものの、検出器6の配置と形状が荷電粒子線装置1aと異なる。荷電粒子線装置1bの検出器6は、試料4の直上に配置され、電子線3が通過する空間を有する円環形状やU字形状である。試料4の直上に配置される検出器6は、二次電子5aよりも放出量が少ない反射電子5bを効率的に検出できる。 Another example of the overall configuration of a charged particle beam device will be described using Figure 2. Like the charged particle beam device 1a, the charged particle beam device 1b is equipped with an electron optical column 7, a sample chamber 8, and a control unit 10, but the arrangement and shape of the detector 6 differs from that of the charged particle beam device 1a. The detector 6 of the charged particle beam device 1b is placed directly above the sample 4 and has a circular or U-shape with a space through which the electron beam 3 passes. The detector 6 placed directly above the sample 4 can efficiently detect backscattered electrons 5b, which are emitted in smaller quantities than secondary electrons 5a.

 図3を用いて、シンチレータ6aの発光の減衰時間について説明する。図3のグラフは、シンチレータ6aの発光強度の時間変化の一例を示すものであり、縦軸が発光強度、横軸が時間である。入射期間はシンチレータ6aに電子が入射している期間であり、非入射期間はシンチレータ6aに電子が入射していない期間である。 The decay time of the light emission from the scintillator 6a will be explained using Figure 3. The graph in Figure 3 shows an example of the change in the light emission intensity of the scintillator 6a over time, with the vertical axis representing light emission intensity and the horizontal axis representing time. The incident period is the period during which electrons are incident on the scintillator 6a, and the non-incident period is the period during which electrons are not incident on the scintillator 6a.

 二次電子5aや反射電子5bの入射によって生じるシンチレータ6aの発光の強度は、非入射期間になったときに直ちにゼロになるのではなく、図3のように時間経過とともに減衰する。非入射期間での発光強度の減衰の速さを表す減衰時間は、発光波長によって異なり、発光波長が比較的長い長波長光の方が、発光波長が比較的短い短波長光よりも長い。またシンチレータ6aの種類によっても減衰時間は異なる。長波長光は、例えば450nmから600nmのうちのいずれかよりも長い波長を有する光成分である。 The intensity of the light emitted by the scintillator 6a due to the incidence of secondary electrons 5a and backscattered electrons 5b does not immediately reach zero when the non-incident period begins, but decays over time as shown in Figure 3. The decay time, which indicates the rate at which the light intensity decays during the non-incident period, varies depending on the emission wavelength, with long-wavelength light having a relatively long emission wavelength being longer than short-wavelength light having a relatively short emission wavelength. The decay time also differs depending on the type of scintillator 6a. Long-wavelength light is a light component with a wavelength longer than, for example, any of 450 nm to 600 nm.

 非入射期間に検出される発光は残光と呼ばれ、検出器6のノイズとなり、時間分解能を低下させる。時間分解能の低下は、減衰時間が長い長波長光の強度を低減させることによって抑制できる。 The light emitted during the non-incident period is called afterglow, and becomes noise in the detector 6, reducing the time resolution. The reduction in time resolution can be suppressed by reducing the intensity of long-wavelength light, which has a long decay time.

 図4と図5を用いて、長波長光の強度の低減について説明する。図4のグラフはシンチレータ6aの発光スペクトルの一例、図5のグラフは図4の長波長光の強度を低減させたものであり、縦軸が発光強度、横軸が発光波長、奥行きの軸が時間である。また図4及び図5の(a)は入射電子のエネルギーが比較的高い場合、(b)は入射電子のエネルギーが比較的低い場合であり、時間t0は入射期間、時間t1は非入射期間である。なお受光素子6cから出力される電気信号は、短波長光の発光強度と長波長光の発光強度との和に応じた値になる。 The reduction in the intensity of long-wavelength light will be explained using Figures 4 and 5. The graph in Figure 4 is an example of the emission spectrum of the scintillator 6a, and the graph in Figure 5 is the same as Figure 4 with the intensity of long-wavelength light reduced, with the vertical axis representing emission intensity, the horizontal axis representing emission wavelength, and the depth axis representing time. Also, (a) in Figures 4 and 5 shows a case where the energy of the incident electrons is relatively high, and (b) shows a case where the energy of the incident electrons is relatively low, with time t0 being the incidence period and time t1 being the non-incidence period. The electrical signal output from the light-receiving element 6c has a value corresponding to the sum of the emission intensity of short-wavelength light and the emission intensity of long-wavelength light.

 図4の(a)のように入射電子のエネルギーが比較的高い場合、短波長光よりも長波長光の発光強度が大きく、長波長光の残光が受光素子6cの検出限界を超えることがある。そこで図5の(a)のように長波長光の強度を低減させることにより、長波長光の残光を検出限界未満にし、時間分解能の低下を抑制することができる。 When the energy of the incident electrons is relatively high, as in Figure 4(a), the emission intensity of the long-wavelength light is greater than that of the short-wavelength light, and the afterglow of the long-wavelength light may exceed the detection limit of the light-receiving element 6c. Therefore, by reducing the intensity of the long-wavelength light, as in Figure 5(a), the afterglow of the long-wavelength light can be made below the detection limit, preventing a decrease in time resolution.

 一方、図4の(b)のように入射電子のエネルギーが比較的低い場合、短波長光よりも長波長光の発光強度が小さく、長波長光の残光が受光素子6cの検出限界未満になることがある。短波長光よりも長波長光の発光強度が小さいときに、図5の(b)のように長波長光の強度を低減させると、入射期間である時間t0での発光強度が低下し、観察像の画質が劣化する。 On the other hand, when the energy of the incident electrons is relatively low, as in Figure 4(b), the emission intensity of the long-wavelength light is lower than that of the short-wavelength light, and the afterglow of the long-wavelength light may fall below the detection limit of the light-receiving element 6c. When the emission intensity of the long-wavelength light is lower than that of the short-wavelength light, reducing the intensity of the long-wavelength light, as in Figure 5(b), reduces the emission intensity at time t0, which is the incidence period, and the quality of the observed image deteriorates.

 すなわち、シンチレータ6aに入射する電子のエネルギーに応じて、長波長光の発光強度を低減させるか否かを制御することにより、検出器6の時間分解能を維持しながら観察像の劣化を抑制することができる。入射電子のエネルギーは、電子線3の加速電圧が高いほど高くなる。また入射電子が二次電子5aであるときよりも反射電子5bであるときのほうが入射電子のエネルギーは高い。なおシンチレータ6aに印加される電圧が高いほど入射電子のエネルギーは高くなるので、シンチレータ6aに電圧が印加されているときに入射する二次電子5aのエネルギーは、印加電圧がゼロのときの反射電子5bよりも高い場合がある。 In other words, by controlling whether or not to reduce the emission intensity of long-wavelength light depending on the energy of the electrons incident on the scintillator 6a, it is possible to suppress degradation of the observed image while maintaining the time resolution of the detector 6. The higher the acceleration voltage of the electron beam 3, the higher the energy of the incident electrons. Furthermore, the energy of the incident electrons is higher when they are backscattered electrons 5b than when they are secondary electrons 5a. Note that the higher the voltage applied to the scintillator 6a, the higher the energy of the incident electrons, so the energy of secondary electrons 5a incident when a voltage is applied to the scintillator 6a may be higher than the energy of backscattered electrons 5b when no applied voltage is present.

 また、長波長光の発光強度を低減させるか否かの制御は、入射電子のエネルギーに基づくことに限定されない。例えば、短波長光よりも長波長光の発光強度が小さい場合であっても、入射電子の粒子数が比較的多ければ、長波長光の残光が受光素子6cの検出限界を超過することがある。つまり、シンチレータ6aに入射する電子の粒子数に応じて、長波長光の発光強度を低減させるか否かを制御しても良い。入射電子の粒子数は、電子線3の照射密度が高いほど高くなる。 Furthermore, the control of whether or not to reduce the emission intensity of long-wavelength light is not limited to being based on the energy of the incident electrons. For example, even if the emission intensity of long-wavelength light is lower than that of short-wavelength light, if the number of incident electron particles is relatively large, the afterglow of the long-wavelength light may exceed the detection limit of the light-receiving element 6c. In other words, whether or not to reduce the emission intensity of long-wavelength light may be controlled according to the number of electron particles incident on the scintillator 6a. The number of incident electron particles increases as the irradiation density of the electron beam 3 increases.

 図6を用いて、長波長光の強度の低減を制御する検出器6の一例について説明する。図6の(a)に例示される検出器6は、シンチレータ6aと透過率可変フィルタ60とライトガイド6bと受光素子6cを有する。シンチレータ6aとライトガイド6bと受光素子6cは、図1の検出器6と同様であるので説明を省略する。 Using Figure 6, an example of a detector 6 that controls the reduction in the intensity of long-wavelength light will be described. The detector 6 illustrated in Figure 6(a) has a scintillator 6a, a variable transmittance filter 60, a light guide 6b, and a light receiving element 6c. The scintillator 6a, light guide 6b, and light receiving element 6c are the same as those in the detector 6 in Figure 1, so their description will be omitted.

 透過率可変フィルタ60は、シンチレータ6aとライトガイド6bとの間に配置され、長波長光の透過率が変化する光フィルタであり、例えば液晶素子である。透過率可変フィルタ60の透過率は制御部10によって制御される。より具体的には、シンチレータ6aに入射する電子のパラメータが予め定められた閾値を超過する場合、長波長光の強度を低減させるように、長波長光の透過率が下げられる。また入射電子のパラメータが閾値を超過しない場合、長波長光の強度を低減させないように、長波長光の透過率が上げられる。 The variable transmittance filter 60 is an optical filter, such as a liquid crystal element, that is disposed between the scintillator 6a and the light guide 6b and that varies the transmittance of long-wavelength light. The transmittance of the variable transmittance filter 60 is controlled by the control unit 10. More specifically, if the parameters of the electrons incident on the scintillator 6a exceed a predetermined threshold, the transmittance of the long-wavelength light is lowered so as to reduce the intensity of the long-wavelength light. If the parameters of the incident electrons do not exceed the threshold, the transmittance of the long-wavelength light is increased so as not to reduce the intensity of the long-wavelength light.

 なお入射電子のパラメータは、例えばエネルギーや粒子数である。入射電子のパラメータがエネルギーである場合、入射電子が反射電子5bであるときや電子線3の加速電圧が所定値以上であるときに長波長光の透過率が下げられる。なお入射電子が二次電子5aである場合であっても、シンチレータ6aに印加される電圧が所定値以上であるときに長波長光の透過率が下げられる。ここで所定値は、0.1kV~100kVの中のいずれかの値である。また入射電子のエネルギーに対する閾値は、短波長光の強度よりも長波長光の強度が大きくなるエネルギーの値であり、シンチレータ6aの種類に応じて予め定められる。 The parameters of the incident electrons include, for example, energy and particle number. If the parameter of the incident electrons is energy, the transmittance of long-wavelength light is reduced when the incident electrons are backscattered electrons 5b or when the acceleration voltage of the electron beam 3 is equal to or greater than a predetermined value. Even when the incident electrons are secondary electrons 5a, the transmittance of long-wavelength light is reduced when the voltage applied to the scintillator 6a is equal to or greater than a predetermined value. Here, the predetermined value is any value between 0.1 kV and 100 kV. The threshold value for the energy of the incident electrons is the energy value at which the intensity of long-wavelength light is greater than the intensity of short-wavelength light, and is determined in advance depending on the type of scintillator 6a.

 入射電子のパラメータが粒子数である場合、電子線3の照射密度が所定値以上であるときに長波長光の透過率が下げられる。なお電子線3の照射密度は、電子線3の電流値や観察像の倍率に基づいて算出される。また入射電子の粒子数に対する閾値は、長波長光の強度が所定値以上になる粒子数、例えば長波長光の残光が受光素子6cの検出限界以上になる粒子数の値であり、シンチレータ6aの種類に応じて予め定められる。 If the parameter of the incident electrons is the number of particles, the transmittance of long-wavelength light is reduced when the irradiation density of the electron beam 3 is equal to or greater than a predetermined value. The irradiation density of the electron beam 3 is calculated based on the current value of the electron beam 3 and the magnification of the observed image. The threshold value for the number of particles of the incident electrons is the number of particles at which the intensity of long-wavelength light exceeds a predetermined value, for example, the number of particles at which the afterglow of long-wavelength light exceeds the detection limit of the light-receiving element 6c, and is determined in advance depending on the type of scintillator 6a.

 図6の(b)に例示される検出器6は、透過率可変フィルタ60の位置が(a)と異なり、ライトガイド6bと受光素子6cとの間に配置される。なおその他の構成は(a)と同じである。 The detector 6 illustrated in Figure 6(b) differs from that in (a) in that the variable transmittance filter 60 is positioned between the light guide 6b and the light receiving element 6c. The rest of the configuration is the same as in (a).

 図6の(c)に例示される検出器6は、シンチレータ6aと透過率可変フィルタ60と受光素子6cを有し、透過率可変フィルタ60がシンチレータ6aと受光素子6cとの間に配置される。なおシンチレータ6aと透過率可変フィルタ60と受光素子6cの機能は、(a)や(b)と同じである。 The detector 6 illustrated in Figure 6(c) has a scintillator 6a, a variable transmittance filter 60, and a light-receiving element 6c, with the variable transmittance filter 60 positioned between the scintillator 6a and the light-receiving element 6c. The functions of the scintillator 6a, variable transmittance filter 60, and light-receiving element 6c are the same as in (a) and (b).

 なお透過率可変フィルタ60の代わりに、長波長光の少なくとも一部を吸収する光フィルタであって透過率が一定である透過率固定フィルタが検出器6に設けられても良い。制御部10は、入射電子のパラメータに応じて透過率固定フィルタの位置をスライド式や回転式の機構を介して制御する。すなわち、パラメータが閾値を超過すれば長波長光の強度を低減させるように透過率固定フィルタがシンチレータ6aと受光素子6cとの間に配置され、閾値を超過しなければ透過率固定フィルタはシンチレータ6aと受光素子6cとの間から外される。 Instead of the variable transmittance filter 60, the detector 6 may be provided with a fixed transmittance filter, an optical filter that absorbs at least a portion of the long-wavelength light and has a constant transmittance. The control unit 10 controls the position of the fixed transmittance filter via a sliding or rotating mechanism in accordance with the parameters of the incident electrons. That is, if the parameter exceeds a threshold value, the fixed transmittance filter is placed between the scintillator 6a and the light-receiving element 6c to reduce the intensity of the long-wavelength light, and if the threshold value is not exceeded, the fixed transmittance filter is removed from between the scintillator 6a and the light-receiving element 6c.

 また透過率可変フィルタ60の代わりに、長波長光を屈折させるプリズムが検出器6に設けられても良い。制御部10は、入射電子のパラメータに応じてプリズムの方向を回転式の機構を介して制御する。すなわち、パラメータが閾値を超過すれば受光素子6cへの長波長光の入射を妨げるように、閾値を超過しなければ受光素子6cへ長波長光が入射するようにプリズムの向きが制御される。 Alternatively, instead of the variable transmittance filter 60, a prism that refracts long-wavelength light may be provided in the detector 6. The control unit 10 controls the direction of the prism via a rotary mechanism according to the parameters of the incident electrons. In other words, the orientation of the prism is controlled so that if the parameter exceeds a threshold value, long-wavelength light is prevented from entering the light-receiving element 6c, and if the parameter does not exceed the threshold value, long-wavelength light is allowed to enter the light-receiving element 6c.

 図7を用いて、長波長光の強度の低減を制御する検出器6の他の例について説明する。 図7に例示される検出器6は、シンチレータ6aと光ファイバ70と受光素子6cを有する。シンチレータ6aと受光素子6cは、図1の検出器6と同様であるので説明を省略する。光ファイバ70は、シンチレータ6aの発光を受光素子6cへ伝える伝送路であり、短波長光よりも長波長光の伝送速度が遅い材質が用いられ、短波長光と長波長光との伝送時間にマイクロ秒程度の差異が生じる長さを有する。制御部10は、伝送時間の差異を利用して、受光素子6cが短波長光を受光し、長波長光を受光しないようにスイッチング制御する。すなわち、パラメータが閾値を超過する場合、短波長光が伝送される期間は受光素子6cがオンにされ、長波長光が伝送される期間は受光素子6cがオフにされる。 Using Figure 7, another example of a detector 6 that controls the reduction in the intensity of long-wavelength light will be described. The detector 6 illustrated in Figure 7 has a scintillator 6a, an optical fiber 70, and a photodetector 6c. The scintillator 6a and photodetector 6c are similar to those in the detector 6 in Figure 1, so their description will be omitted. The optical fiber 70 is a transmission path that transmits the light emitted by the scintillator 6a to the photodetector 6c. It is made of a material that transmits long-wavelength light at a slower rate than short-wavelength light, and has a length that results in a difference of about microseconds in the transmission time between short-wavelength light and long-wavelength light. The control unit 10 utilizes the difference in transmission time to perform switching control so that the photodetector 6c receives short-wavelength light and does not receive long-wavelength light. In other words, when the parameter exceeds the threshold, the photodetector 6c is turned on during periods when short-wavelength light is transmitted, and turned off during periods when long-wavelength light is transmitted.

 また受光素子6cのスイッチング制御の代わりに、制御部10によって開閉されるシャッタを受光素子6cの前段に設けられても良い。すなわち、パラメータが閾値を超過する場合、短波長光が伝送される期間はシャッタが開かれ、長波長光が伝送される期間はシャッタが閉じられる。 Instead of switching the light receiving element 6c, a shutter that is opened and closed by the control unit 10 may be provided upstream of the light receiving element 6c. In other words, when the parameter exceeds the threshold value, the shutter is opened during the period when short wavelength light is transmitted, and closed during the period when long wavelength light is transmitted.

 図8を用いて、長波長光の強度の低減を制御する検出器6の他の例について説明する。図8に例示される検出器6は、シンチレータ6aと分光器80と受光素子6cを有する。シンチレータ6aは、図1の検出器6と同様であるので説明を省略する。分光器80は、シンチレータ6aの発光を短波長光と長波長光とに分光するものである。受光素子6cは、シンチレータ6aの発光量に応じた電気信号を出力する素子であり、長波長光を受光する第一受光部6c1と短波長光だけを受光する第二受光部6c2を有する。制御部10は、入射電子のパラメータに応じて第一受光部6c1を制御する。すなわち、パラメータが閾値を超過すれば第一受光部6c1をオフにして第二受光部6c2からの電気信号だけを受信し、閾値を超過しなければ第一受光部6c1をオンにして第二受光部6c2とともに第一受光部6c1からも電気信号を受信する。 Using Figure 8, another example of a detector 6 that controls the reduction in the intensity of long-wavelength light will be described. The detector 6 illustrated in Figure 8 has a scintillator 6a, a spectroscope 80, and a photodetector 6c. The scintillator 6a is similar to the detector 6 in Figure 1, so its description will be omitted. The spectroscope 80 separates the light emitted by the scintillator 6a into short-wavelength light and long-wavelength light. The photodetector 6c is an element that outputs an electrical signal corresponding to the amount of light emitted by the scintillator 6a, and has a first photodetector 6c1 that receives long-wavelength light and a second photodetector 6c2 that receives only short-wavelength light. The control unit 10 controls the first photodetector 6c1 according to the parameter of the incident electrons. That is, if the parameter exceeds a threshold, the first photodetector 6c1 is turned off and only the electrical signal from the second photodetector 6c2 is received; if the parameter does not exceed the threshold, the first photodetector 6c1 is turned on and electrical signals are received from both the second photodetector 6c2 and the first photodetector 6c1.

 図6乃至図8を用いて説明した検出器6の制御により、シンチレータ6aに入射する電子のパラメータに応じて長波長光の強度を低減させることが可能になる。すなわち、入射電子のパラメータが高いときには図5の(a)のようにし、パラメータが低いときには図4の(b)のようにすることができる。その結果、検出器6の時間分解能を維持しながら観察像の劣化を抑制することができる。 By controlling the detector 6 as described using Figures 6 to 8, it is possible to reduce the intensity of long-wavelength light according to the parameters of the electrons incident on the scintillator 6a. That is, when the parameters of the incident electrons are high, it is possible to achieve the effect shown in Figure 5(a), and when the parameters are low, it is possible to achieve the effect shown in Figure 4(b). As a result, it is possible to suppress degradation of the observed image while maintaining the time resolution of the detector 6.

 なお、高エネルギーの電子と低エネルギーの電子とが異なる位置に到達し、それぞれの到達位置が既知である場合、検出器6の制御は不要になる。例えば、高エネルギーの反射電子5b1と低エネルギーの反射電子5b2の到達位置が既知である場合、高エネルギーの反射電子5b1の到達位置では長波長光の強度を低減させ、低エネルギーの反射電子5b2の到達位置では長波長光の強度を低減させないようにしても良い。 Note that if high-energy electrons and low-energy electrons arrive at different positions and the respective arrival positions are known, there is no need to control the detector 6. For example, if the arrival positions of high-energy backscattered electrons 5b1 and low-energy backscattered electrons 5b2 are known, the intensity of the long-wavelength light may be reduced at the arrival position of the high-energy backscattered electrons 5b1, and the intensity of the long-wavelength light may not be reduced at the arrival position of the low-energy backscattered electrons 5b2.

 図9を用いて、高エネルギーの反射電子5b1の到達位置では長波長光の強度を低減させ、低エネルギーの反射電子5b2の到達位置では長波長光の強度を低減させない検出器6の一例について説明する。低エネルギーの反射電子5b2の到達位置に設けられる検出器6は、シンチレータ6aとライトガイド6bと受光素子6cを有する。高エネルギーの反射電子5b1の到達位置に設けられる検出器6は、シンチレータ6aと長波長光吸収部90とライトガイド6bと受光素子6cを有する。シンチレータ6aとライトガイド6bと受光素子6cは、図1の検出器6と同様であるので説明を省略する。長波長光吸収部90は、長波長光を吸収するものであり、シンチレータ6aと受光素子6cとの間のいずれかの場所に設けられる。 Using Figure 9, an example of a detector 6 will be described that reduces the intensity of long-wavelength light at the arrival position of high-energy reflected electrons 5b1, but does not reduce the intensity of long-wavelength light at the arrival position of low-energy reflected electrons 5b2. The detector 6 located at the arrival position of low-energy reflected electrons 5b2 has a scintillator 6a, a light guide 6b, and a photodetector 6c. The detector 6 located at the arrival position of high-energy reflected electrons 5b1 has a scintillator 6a, a long-wavelength light absorbing portion 90, a light guide 6b, and a photodetector 6c. The scintillator 6a, light guide 6b, and photodetector 6c are the same as those in the detector 6 in Figure 1, so their description will be omitted. The long-wavelength light absorbing portion 90 absorbs long-wavelength light, and is located somewhere between the scintillator 6a and the photodetector 6c.

 高エネルギーの反射電子5b1が入射するシンチレータ6aでは、短波長光よりも長波長光の発光強度が高く、長波長光の残光が時間分解能を低下させる。そこで、長波長光吸収部90によって長波長光の強度を低減させることにより、時間分解能の低下を抑制できる。他方、低エネルギーの反射電子5b2が入射するシンチレータ6aでは、短波長光よりも長波長光の発光強度が低く、長波長光の残光は時間分解能を低下させない程度である。そこで、長波長光吸収部90を備えず長波長光の強度を低減させないことにより、入射期間での発光強度を低下させずに済む。 In the scintillator 6a on which high-energy reflected electrons 5b1 are incident, the emission intensity of long-wavelength light is higher than that of short-wavelength light, and the afterglow of long-wavelength light reduces the time resolution. Therefore, by reducing the intensity of long-wavelength light using the long-wavelength light absorbing section 90, the reduction in time resolution can be suppressed. On the other hand, in the scintillator 6a on which low-energy reflected electrons 5b2 are incident, the emission intensity of long-wavelength light is lower than that of short-wavelength light, and the afterglow of long-wavelength light is not enough to reduce the time resolution. Therefore, by not providing the long-wavelength light absorbing section 90 and not reducing the intensity of long-wavelength light, the emission intensity during the incident period can be prevented from being reduced.

 以上、本発明の実施例について説明した。本発明は、上記実施例に限定されるものではなく、発明の要旨を逸脱しない範囲で構成要素を変形して具体化できる。 The above describes an embodiment of the present invention. The present invention is not limited to the above embodiment, and the components can be modified and embodied without departing from the spirit of the invention.

1a、1b:荷電粒子線装置、2:電子源、3:電子線、4:試料、5a:二次電子、5b:反射電子、5b1:高エネルギーの反射電子、5b2:低エネルギーの反射電子、6:検出器、6a:シンチレータ、6b:ライトガイド、6c:受光素子、6c1:第一受光部、6c2:第二受光部、7:電子光学鏡筒、8:試料室、10:制御部、60:透過率可変フィルタ、70:光ファイバ、80:分光器、90:長波長光吸収部。 1a, 1b: charged particle beam device, 2: electron source, 3: electron beam, 4: sample, 5a: secondary electrons, 5b: backscattered electrons, 5b1: high-energy backscattered electrons, 5b2: low-energy backscattered electrons, 6: detector, 6a: scintillator, 6b: light guide, 6c: photodetector, 6c1: first photodetector, 6c2: second photodetector, 7: electron optical column, 8: sample chamber, 10: control unit, 60: variable transmittance filter, 70: optical fiber, 80: spectrometer, 90: long-wavelength light absorbing unit.

Claims (15)

 試料に荷電粒子線を照射する荷電粒子源と、
 前記荷電粒子線の照射によって前記試料から放出される電子を検出して電気信号を出力する検出器と、
 前記電気信号に基づいて観察像を生成するとともに各部を制御する制御部を備える荷電粒子線装置であって、
 前記検出器は、電子の入射によって発光するシンチレータと、前記シンチレータの発光量に応じた電気信号を出力する受光素子と、前記シンチレータの発光のうち発光波長が比較的長い長波長光の強度を低減させる長波長光低減部を有し、
 前記制御部は、前記シンチレータに入射する電子のパラメータが予め定められた閾値を超過すれば前記長波長光の強度を低減させ、前記パラメータが前記閾値を超過しなければ前記長波長光の強度を低減させないように前記検出器を制御することを特徴とする荷電粒子線装置。
a charged particle source that irradiates a sample with a charged particle beam;
a detector that detects electrons emitted from the sample by irradiation with the charged particle beam and outputs an electrical signal;
a charged particle beam device including a control unit that generates an observation image based on the electrical signal and controls each unit,
the detector includes a scintillator that emits light in response to incidence of electrons, a light receiving element that outputs an electrical signal corresponding to the amount of light emitted by the scintillator, and a long wavelength light reducing unit that reduces the intensity of long wavelength light, which has a relatively long emission wavelength, among the light emitted by the scintillator;
The control unit controls the detector to reduce the intensity of the long-wavelength light if a parameter of electrons incident on the scintillator exceeds a predetermined threshold, and not to reduce the intensity of the long-wavelength light if the parameter does not exceed the threshold.
 請求項1に記載の荷電粒子線装置であって、
 前記パラメータは、前記シンチレータに入射する電子のエネルギーであり、
 前記制御部は、前記シンチレータに入射する電子が二次電子か反射電子かに応じて前記検出器を制御することを特徴とする荷電粒子線装置。
The charged particle beam device according to claim 1,
the parameter is the energy of electrons incident on the scintillator;
The charged particle beam device is characterized in that the control unit controls the detector depending on whether the electrons incident on the scintillator are secondary electrons or backscattered electrons.
 請求項1に記載の荷電粒子線装置であって、
 前記パラメータは、前記シンチレータに入射する電子のエネルギーであり、
 前記制御部は、前記荷電粒子線の加速電圧に応じて前記検出器を制御することを特徴とする荷電粒子線装置。
The charged particle beam device according to claim 1,
the parameter is the energy of electrons incident on the scintillator;
The charged particle beam device is characterized in that the control unit controls the detector in accordance with an acceleration voltage of the charged particle beam.
 請求項1に記載の荷電粒子線装置であって、
 前記パラメータは、前記シンチレータに入射する電子のエネルギーであり、
 前記シンチレータには、前記試料から放出される電子を引き込むための電圧である引込み電圧が印加され、
 前記制御部は、前記引込み電圧の値に応じて前記検出器を制御することを特徴とする荷電粒子線装置。
The charged particle beam device according to claim 1,
the parameter is the energy of electrons incident on the scintillator;
A pull-in voltage, which is a voltage for pulling in electrons emitted from the sample, is applied to the scintillator;
The charged particle beam device is characterized in that the control unit controls the detector in accordance with the value of the pull-in voltage.
 請求項1に記載の荷電粒子線装置であって、
 前記パラメータは、前記シンチレータに入射する電子の粒子数であり、
 前記制御部は、前記荷電粒子線の照射密度に応じて前記検出器を制御することを特徴とする荷電粒子線装置。
The charged particle beam device according to claim 1,
the parameter is the number of electron particles incident on the scintillator,
The charged particle beam device is characterized in that the control unit controls the detector in accordance with the irradiation density of the charged particle beam.
 請求項1に記載の荷電粒子線装置であって、
 前記シンチレータは、Ga、Zn、In、Al、Cd、Mg、Ca、Sr、Y、Si、Gd、Ceの中の少なくとも一つの元素を含み、
 前記パラメータは、前記シンチレータに入射する電子のエネルギーであり、
 前記閾値は、発光波長が比較的短い短波長光の強度よりも前記長波長光の強度が大きくなるエネルギーの値であって、前記シンチレータの種類に応じて定められることを特徴とする荷電粒子線装置。
The charged particle beam device according to claim 1,
the scintillator contains at least one element selected from Ga, Zn, In, Al, Cd, Mg, Ca, Sr, Y, Si, Gd, and Ce;
the parameter is the energy of electrons incident on the scintillator;
A charged particle beam device characterized in that the threshold is an energy value at which the intensity of long-wavelength light is greater than the intensity of short-wavelength light, which has a relatively short emission wavelength, and is determined depending on the type of scintillator.
 請求項1に記載の荷電粒子線装置であって、
 前記シンチレータは、Ga、Zn、In、Al、Cd、Mg、Ca、Sr、Y、Si、Gd、Ceの中の少なくとも一つの元素を含み、
 前記パラメータは、前記シンチレータに入射する電子の粒子数であって、
 前記閾値は、前記長波長光の強度が所定値以上になる粒子数の値であって、前記シンチレータの種類に応じて定められることを特徴とする荷電粒子線装置。
The charged particle beam device according to claim 1,
the scintillator contains at least one element selected from Ga, Zn, In, Al, Cd, Mg, Ca, Sr, Y, Si, Gd, and Ce;
The parameter is the number of electron particles incident on the scintillator,
The charged particle beam device is characterized in that the threshold value is a value of the number of particles at which the intensity of the long wavelength light becomes equal to or greater than a predetermined value, and is determined depending on the type of the scintillator.
 請求項1に記載の荷電粒子線装置であって、
 前記長波長光低減部は、前記長波長光の透過率が変化する透過率可変フィルタを有し、
 前記制御部は、前記パラメータに応じて、前記透過率可変フィルタの透過率を制御することを特徴とする荷電粒子線装置。
The charged particle beam device according to claim 1,
the long wavelength light reduction unit has a variable transmittance filter that changes the transmittance of the long wavelength light,
The charged particle beam device is characterized in that the control unit controls the transmittance of the variable transmittance filter in accordance with the parameter.
 請求項1に記載の荷電粒子線装置であって、
 前記長波長光低減部は、前記長波長光の少なくとも一部を吸収する透過率固定フィルタを有し、
 前記制御部は、前記パラメータに応じて、前記透過率固定フィルタの位置を制御することを特徴とする荷電粒子線装置。
The charged particle beam device according to claim 1,
the long wavelength light reducing unit has a fixed transmittance filter that absorbs at least a portion of the long wavelength light,
The charged particle beam device is characterized in that the control unit controls the position of the fixed transmittance filter in accordance with the parameter.
 請求項1に記載の荷電粒子線装置であって、
 前記長波長光低減部は、前記長波長光を屈折させるプリズムを有し、
 前記制御部は、前記パラメータに応じて、前記プリズムの向きを制御することを特徴とする荷電粒子線装置。
The charged particle beam device according to claim 1,
the long-wavelength light reducing unit has a prism that refracts the long-wavelength light,
The charged particle beam device is characterized in that the control unit controls the orientation of the prism in accordance with the parameter.
 請求項1に記載の荷電粒子線装置であって、
 前記長波長光低減部は、前記シンチレータと前記受光素子を接続し、発光波長が比較的短い短波長光よりも前記長波長光の伝送速度が遅い光ファイバを有し、
 前記制御部は、前記短波長光が伝送される期間は前記受光素子をオンにし、前記長波長光が伝送される期間は前記受光素子をオフにすることを特徴とする荷電粒子線装置。
The charged particle beam device according to claim 1,
the long-wavelength light reducing unit includes an optical fiber that connects the scintillator and the light receiving element and has a slower transmission speed of the long-wavelength light than of the short-wavelength light having a relatively short emission wavelength;
The charged particle beam device is characterized in that the control unit turns on the light receiving element during a period in which the short wavelength light is transmitted, and turns off the light receiving element during a period in which the long wavelength light is transmitted.
 請求項1に記載の荷電粒子線装置であって、
 前記長波長光低減部は、前記シンチレータに接続され、発光波長が比較的短い短波長光よりも前記長波長光の伝送速度が遅い光ファイバと、前記光ファイバと前記受光素子との間に設けられ、開閉するシャッタを有し、
 前記制御部は、前記短波長光が伝送される期間は前記シャッタを開かせ、前記長波長光が伝送される期間は前記シャッタを閉じさせることを特徴とする荷電粒子線装置。
The charged particle beam device according to claim 1,
the long wavelength light reducing unit includes an optical fiber connected to the scintillator, the optical fiber having a slower transmission speed for the long wavelength light than for the short wavelength light having a relatively short emission wavelength, and a shutter that is provided between the optical fiber and the light receiving element and that opens and closes;
The charged particle beam device is characterized in that the control unit opens the shutter during a period in which the short wavelength light is transmitted, and closes the shutter during a period in which the long wavelength light is transmitted.
 請求項1に記載の荷電粒子線装置であって、
 前記長波長光低減部は、発光波長が比較的短い短波長光と前記長波長光とに分光する分光器を有し、
 前記受光素子は、前記長波長光を受光して電気信号を出力する第一受光部と、前記短波長光だけを受光して電気信号を出力する第二受光部とを有し、
 前記制御部は、前記パラメータに応じて、前記第一受光部を制御することを特徴とする荷電粒子線装置。
The charged particle beam device according to claim 1,
the long wavelength light reduction unit has a spectroscope that separates light into short wavelength light having a relatively short emission wavelength and the long wavelength light,
the light receiving element has a first light receiving section that receives the long wavelength light and outputs an electrical signal, and a second light receiving section that receives only the short wavelength light and outputs an electrical signal;
The charged particle beam device is characterized in that the control unit controls the first light receiving unit in accordance with the parameter.
 請求項1に記載の荷電粒子線装置であって、
 前記長波長光は、450nmから600nmのうちのいずれかよりも長い波長を有することを特徴とする荷電粒子線装置。
The charged particle beam device according to claim 1,
A charged particle beam device, wherein the long wavelength light has a wavelength longer than any one of 450 nm to 600 nm.
 試料に荷電粒子線を照射する荷電粒子源と、
 前記荷電粒子線の照射によって前記試料から放出される電子を検出して電気信号を出力する検出器と、
 前記電気信号に基づいて観察像を生成するとともに各部を制御する制御部を備える荷電粒子線装置であって、
 前記検出器は、電子の入射によって発光するシンチレータと前記シンチレータの発光量に応じた電気信号を出力する受光素子を有する第一検出部と、前記シンチレータと前記受光素子と前記シンチレータの発光のうち発光波長が比較的長い長波長光を吸収する長波長光吸収部を有する第二検出部を備え、
 前記第一検出部は、低エネルギーの反射電子が到達する位置に設けられ、
 前記第二検出部は、高エネルギーの反射電子が到達する位置に設けられることを特徴とする荷電粒子線装置。
a charged particle source that irradiates a sample with a charged particle beam;
a detector that detects electrons emitted from the sample by irradiation with the charged particle beam and outputs an electrical signal;
a charged particle beam device including a control unit that generates an observation image based on the electrical signal and controls each unit,
the detector comprises a first detection unit having a scintillator that emits light in response to incidence of electrons and a light-receiving element that outputs an electrical signal corresponding to the amount of light emitted by the scintillator, and a second detection unit having the scintillator, the light-receiving element, and a long-wavelength light absorbing unit that absorbs long-wavelength light having a relatively long emission wavelength among the light emitted by the scintillator,
the first detection unit is provided at a position where low-energy reflected electrons reach,
The charged particle beam device is characterized in that the second detection unit is provided at a position where high-energy reflected electrons reach.
PCT/JP2024/010272 2024-03-15 2024-03-15 Charged particle beam device Pending WO2025191843A1 (en)

Priority Applications (1)

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Application Number Priority Date Filing Date Title
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012009247A (en) * 2010-06-24 2012-01-12 Topcon Corp Electron microscope system
JP2018152232A (en) * 2017-03-13 2018-09-27 株式会社日立製作所 Charged particle detector and charged particle beam apparatus using the same
WO2021005743A1 (en) * 2019-07-10 2021-01-14 株式会社日立ハイテク Scintillator for charged particle beam device and charged particle beam device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012009247A (en) * 2010-06-24 2012-01-12 Topcon Corp Electron microscope system
JP2018152232A (en) * 2017-03-13 2018-09-27 株式会社日立製作所 Charged particle detector and charged particle beam apparatus using the same
WO2021005743A1 (en) * 2019-07-10 2021-01-14 株式会社日立ハイテク Scintillator for charged particle beam device and charged particle beam device

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