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WO2025169485A1 - Measurement system and control system - Google Patents

Measurement system and control system

Info

Publication number
WO2025169485A1
WO2025169485A1 PCT/JP2024/004632 JP2024004632W WO2025169485A1 WO 2025169485 A1 WO2025169485 A1 WO 2025169485A1 JP 2024004632 W JP2024004632 W JP 2024004632W WO 2025169485 A1 WO2025169485 A1 WO 2025169485A1
Authority
WO
WIPO (PCT)
Prior art keywords
light
reflecting member
pattern
irradiation
measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/JP2024/004632
Other languages
French (fr)
Japanese (ja)
Inventor
隆志 中村
岩田 浩志
裕一 井之上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to PCT/JP2024/004632 priority Critical patent/WO2025169485A1/en
Publication of WO2025169485A1 publication Critical patent/WO2025169485A1/en
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01CMEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C15/00Surveying instruments or accessories not provided for in groups G01C1/00 - G01C13/00
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated

Definitions

  • This disclosure relates to measurement systems and control systems.
  • a system has been proposed that uses a measuring device to measure the position of part of a robot (see, for example, Patent Document 1).
  • the measurement system disclosed herein comprises a measurement device that emits light in a predetermined irradiation direction and is capable of receiving light reflected by an object illuminated by the light, and a control device that controls the measurement device, wherein the measurement device receives light reflected by a first reflecting member, and the control device controls the irradiation direction of the light from the measurement device based on the result of receiving the light reflected by the first reflecting member so that the light is irradiated onto a second reflecting member different from the first reflecting member.
  • the measurement system disclosed herein comprises a measurement device that irradiates a reflective member with light and receives the light reflected by the reflective member, and a control device that controls the direction of light irradiation from the measurement device.
  • the control device controls the direction of light irradiation so that the trajectory of light on a surface that intersects with the optical path of the light from the measurement device exhibits a first pattern, and then controls the direction of light irradiation so that the trajectory of light on the surface exhibits a second pattern different from the first pattern, and obtains information regarding the position of the reflective member based on the results of receiving the light.
  • the measurement system disclosed herein comprises a measurement device that irradiates a reflective member with light and receives the light reflected by the reflective member, and a control device that controls the direction of light irradiation from the measurement device.
  • the measurement device comprises an irradiation device that can irradiate light in a predetermined direction based on control by the control device.
  • the control device can change the direction of light irradiation from the measurement device by rotating the irradiation device along at least one of a first rotation axis and a second rotation axis intersecting the first rotation axis.
  • the control device controls the irradiation device to rotate in a first manner along at least one of the first rotation axis and the second rotation axis to irradiate light, and then rotate the irradiation device in a second manner different from the first manner along at least one of the first rotation axis and the second rotation axis to irradiate the light, and obtains information regarding the position of the reflective member based on the result of receiving the light.
  • Figure 1 is a schematic diagram showing the overall configuration of the measurement system.
  • the measurement system 100 has a measurement device 1, a control device 2, an imaging device 3, and a movable body 4.
  • the measurement device 1, imaging device 3, movable body 4, and control device 2 are communicatively connected via a communication network NW.
  • the communication network NW includes a wired local area network.
  • the communication network NW may also include a wireless local area network, a wireless wide area network, or other communication network.
  • the measurement system 100 may include one or more measurement devices.
  • the control device 2 may be included in the measurement device 1.
  • the imaging device 3 may be included in the measurement device 1.
  • the measurement system 100 may not include a movable body 4.
  • the measurement system 100 may not include an imaging device.
  • the measuring device 1 emits light in a predetermined irradiation direction.
  • the measuring device 1 can also receive light reflected from an object illuminated by the light and transmit the light reception results to the control device 2.
  • the control device 2 controls at least one of the measuring device 1, the imaging device 3, and the movable body 4 to perform a predetermined operation.
  • the control device 2 may generate control information for causing at least one of the measuring device 1, the imaging device 3, and the movable body 4 to perform a predetermined operation, and transmit the generated control information to the device to be controlled via the communication network NW.
  • the control device 2 can also receive information from at least one of the measuring device 1, the imaging device 3, and the movable body 4 via the communication network NW.
  • the control device 2 may control the operation of at least one of the measuring device 1, the imaging device 3, and the movable body 4 based on the received information.
  • the control device 2 may generate control information for controlling the operation of at least one of the measuring device 1, the imaging device 3, and the movable body 4 based on the received information.
  • the control device 2 may also transmit the control information to an external device of the measurement system 100 via the communication network NW.
  • the movable body 4 has a part (movable part) whose position and/or posture can be changed.
  • the movable body 4 is, for example, a robot capable of performing predetermined processes on an object, such as various processes including grasping, cutting, welding, screwing, polishing, and painting, or various measurements of shape, position, physical properties, electrical properties, etc.
  • the movable body 4 may be a mobile body such as an AGV (Automatic Guided Vehicle), RGV (Rail Guided Vehicle), AMR (Autonomous Mobile Robot), drone, or unmanned aerial vehicle.
  • the movable body 4 may be equipped with an end effector capable of performing predetermined processes.
  • the reflective member 5 is a member that reflects incident light in a direction opposite to the incident direction.
  • the reflective member 5 can also be referred to as a retroreflective member that retroreflects light that is incident on the reflective member 5.
  • the reflective member 5 may be, for example, a corner cube reflector or a ball reflector.
  • the reflective member 5 may also be composed of a spherically mounted retroreflector (SMR (Spherically Mounted Retroreflector)) composed of a metal sphere and a retroreflector embedded therein.
  • SMR Spherically Mounted Retroreflector
  • the reflective member 5 may also be a marker that displays a predetermined pattern.
  • the reflective member 5 may be attached to the movable body 4.
  • the reflective member 5 may be attached to an end effector provided on the movable body 4 or near the end effector.
  • the reflective member 5 includes a first reflective member 51, a second reflective member 52, and a third reflective member 53.
  • the number of reflective members 5 provided on the movable body 4 is not limited to three and may be more or less than three.
  • multiple reflective members 5 may be attached to different objects.
  • the first reflecting member 51 may be attached to the movable body 4, and the second reflecting member 52 may be attached to an object different from the movable body 4.
  • At least one of the position and posture of the movable parts of the different objects to which multiple reflecting members 5 are attached may be changed so as to maintain the positional relationship between the reflecting members 5.
  • the part to which the reflecting members 5 are attached may be attached to an object that is not a movable body, or may be attached to a part other than the movable part of the movable body 4.
  • FIG. 2 is a schematic diagram showing the configuration of the measurement device 1.
  • the measurement device 1 has an optical comb interferometer 11, an optical path branching member 12, a mirror 13, and a light receiving element 14.
  • the optical comb interferometer 11 generates, for example, laser light as irradiation light for irradiating the reflecting member 5 from the measurement device 1.
  • the optical comb interferometer 11 may be an optical comb light source that generates pulsed light containing frequency components evenly spaced on the frequency axis. At least a portion of the irradiation light generated by the optical comb interferometer 11 passes through the optical path branching member 12 and is irradiated onto the mirror 13.
  • the optical path branching member 12 is a prism having a branching surface that transmits part of the incident light and reflects part of it.
  • the optical path branching member 12 may also be a half mirror having a branching surface.
  • the mirror 13 reflects at least a portion of the incident light and is supported so that its direction can be changed.
  • the irradiation light reflected by the mirror 13 can be irradiated onto the reflecting member 5.
  • the mirror 13 can be considered an irradiation device that can irradiate light having a predetermined diameter in a predetermined irradiation direction.
  • the light irradiated by the mirror 13 may be laser light.
  • the diameter of the light irradiated by the mirror 13 can also be referred to as the beam diameter.
  • the light irradiated onto the reflecting member 5 is reflected by the reflecting surface of the reflecting member 5 in the opposite direction to the incident direction of the irradiated light.
  • the reflected light reflected by the reflecting member 5 is incident on the mirror 13, reflected by the mirror 13, and incident on the light path branching member 12.
  • a portion of the reflected light incident on the light path branching member 12 is reflected by the branching surface of the light path branching member 12 and incident on the light receiving element 14.
  • the light receiving element 14 may be a four-part PSD (Position Sensitive Detector) that detects the position of the incident light based on the output of a photodiode located on each of the four divided light receiving surfaces according to the amount of incident light.
  • PSD Position Sensitive Detector
  • the measuring device 1 outputs the results of receiving the reflected light received by the light receiving element 14 to the control device 2 via the communication network NW. Based on the results of receiving the reflected light, the control device 2 can obtain the distance to the reflective member 5, for example, using an interferometric measurement method. The control device 2 may also obtain the distance to the reflective member 5 using a triangulation method. The control device 2 determines the position of the reflective member 5 in the measurement coordinate system based on the distance to the reflective member 5 and the angle of the light irradiated onto the reflective member 5 by the mirror 13. Information indicating the position of the reflective member 5 is one example of information related to the position of the reflective member 5. The direction of the reflective member 5 relative to the measuring device 1 is another example of information related to the position of the reflective member 5. The measuring device 1 measures the reflective member 5 based on the information related to the position of the reflective member 5.
  • FIG. 3 is a schematic diagram showing the general configuration of the control device 2.
  • the control device 2 is a computer having a communication interface 21, memory 22, and processor 23.
  • the communication interface 21 is an example of a communication unit, and has an interface circuit for accepting data to be processed by the control device 2, or for outputting data processed by the control device 2.
  • the communication interface 21 includes, for example, a communication interface circuit for connecting the control device 2 to the communication network NW.
  • the processor 23 is an example of a control unit and includes one or more processors and their peripheral circuits.
  • the processor 23 may further include other arithmetic circuits, such as a logic operation unit, a numerical operation unit, or a graphics processing unit.
  • the processor 23 executes the computer program code 220 stored in the memory 22, causing the control device 2 to perform the various processes described in this embodiment.
  • logical functional blocks for executing the operations to be performed by the control device 2 may be realized within the processor 23.
  • the processor 23 can function as a controller for realizing logical functional blocks for executing the operations to be performed by the control device 2.
  • any device typically, a computer
  • any device that executes the computer program code 220 can function as the control device 2.
  • At least one of the memory 22 and the processor 23 may be referred to as a control circuit (or circuit).
  • the control device 2 controls the direction of light emitted from the measurement device 1 so that light is irradiated onto the second reflecting member 52. At this time, the control device 2 may control the direction of light emitted from the measurement device 1 so as to search for the second reflecting member 52. It can also be said that the control device 2 controls the direction of light emitted from the measurement device 1 to search for the second reflecting member 52. In other words, the control device 2 controls the direction of light emitted from the measurement device 1 so that light is irradiated onto multiple positions on any surface PL that intersects with the optical path OP of the light from the measurement device 1.
  • the control device 2 may also control the measurement device 1 so that light is emitted from the start point of the locus R, which is an arbitrary point (for example, a vertex of a polygon) included in a range that includes the position where the target reflective member 5 is estimated to be present.
  • the control device 2 may first control the direction of light irradiation from the measurement device 1 so that the light trajectory R on the surface PL shows a first pattern, and then control the direction of light irradiation from the measurement device 1 so that the light trajectory R on the surface PL shows a second pattern different from the first pattern.
  • the second pattern may be a pattern with a narrower pitch than the first pattern, a narrower irradiation range than the first pattern, or a higher density than the first pattern when compared on the same surface PL as the first pattern.
  • the second pattern can also be said to be a pattern that searches for the reflective member 5 with higher accuracy than the first pattern.
  • the irradiation of light on the surface PL so that the trajectory R shows the first pattern can be referred to as rough scanning
  • the irradiation of light on the surface PL so that the trajectory R shows the second pattern can be referred to as fine scanning.
  • the control by the control device 2 to cause the measurement device 1 to irradiate light so that the reflective member is searched for by rough scanning can be referred to as control in the first search mode
  • the control by the control device 2 to cause the measurement device 1 to irradiate light so that the reflective member is searched for by fine scanning can be referred to as control in the second search mode.
  • the measurement coordinate system of the measurement device 1 can be expressed, for example, with the left-right direction from the measurement device 1 toward the measurement object (movable body 4) as the X axis, the front-to-back direction as the Y axis, and the up-down direction (vertical direction) as the Z axis.
  • the plane PL that intersects with the optical path OP of the light from the measurement device 1 may, as one example, be a plane that is orthogonal to the Y axis in the measurement coordinate system, or a plane that is not orthogonal. In this example, a state in which the plane PL is orthogonal to the Y axis will be described as an example.
  • Figures 4-10 are diagrams showing examples of patterns indicated by the light trajectory R.

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

Provided is a measurement system comprising: a measurement device that emits light in a prescribed radiation direction and that can receive light reflected by an object irradiated with light; and a control device that controls the measurement device. The measurement system is configured such that: the measurement device receives light reflected by a first reflection member; and the control device controls the radiation direction of light from the measurement device such that a second reflection member different from the first reflection member is irradiated with light on the basis of the light-reception result pertaining to the light reflected by the first reflection member. The measurement system may be configured such that the control device controls the radiation direction of light such that the trajectory of light in a plane intersecting the optical path of the light from the measurement device indicates a first pattern, then controls the radiation direction of light such that the trajectory of light in said plane indicates a second pattern different from the first pattern, and acquires information relating to the positions of the reflection members on the basis of light-reception results.

Description

計測システムおよび制御システムMeasurement and Control Systems

 本開示は、計測システムおよび制御システムに関する。 This disclosure relates to measurement systems and control systems.

 ロボットの一部の位置を計測装置により計測するシステムが提案されている(例えば特許文献1を参照)。 A system has been proposed that uses a measuring device to measure the position of part of a robot (see, for example, Patent Document 1).

国際公開第2007/002319号International Publication No. 2007/002319

 本開示にかかる計測システムは、光を所定の照射方向に射出し、光により照射された物体で反射された光を受光可能な計測装置と、計測装置を制御する制御装置と、を備え、計測装置は、第1反射部材で反射された光を受光し、制御装置は、第1反射部材で反射された光の受光の結果に基づき第1反射部材と異なる第2反射部材に光が照射されるように計測装置からの光の照射方向を制御する。 The measurement system disclosed herein comprises a measurement device that emits light in a predetermined irradiation direction and is capable of receiving light reflected by an object illuminated by the light, and a control device that controls the measurement device, wherein the measurement device receives light reflected by a first reflecting member, and the control device controls the irradiation direction of the light from the measurement device based on the result of receiving the light reflected by the first reflecting member so that the light is irradiated onto a second reflecting member different from the first reflecting member.

 本開示にかかる計測システムは、反射部材に光を照射し、反射部材で反射された光を受光する計測装置と、計測装置からの光の照射方向を制御する制御装置と、を備え、制御装置は、計測装置からの光の光路と交差する面における光の軌跡が第1パターンを示すように光の照射方向を制御した後に、面における光の軌跡が第1パターンと異なる第2パターンを示すように光の照射方向を制御し、光の受光の結果に基づき反射部材の位置に関する情報を取得する。 The measurement system disclosed herein comprises a measurement device that irradiates a reflective member with light and receives the light reflected by the reflective member, and a control device that controls the direction of light irradiation from the measurement device. The control device controls the direction of light irradiation so that the trajectory of light on a surface that intersects with the optical path of the light from the measurement device exhibits a first pattern, and then controls the direction of light irradiation so that the trajectory of light on the surface exhibits a second pattern different from the first pattern, and obtains information regarding the position of the reflective member based on the results of receiving the light.

 本開示にかかる計測システムは、反射部材に光を照射し反射部材で反射された光を受光する計測装置と、計測装置からの光の照射方向を制御する制御装置と、を備え、計測装置は、制御装置による制御に基づいて所定の方向に光を照射可能な照射装置を備え、制御装置は、第1回転軸および第1回転軸と交差する第2回転軸の少なくとも一方の回転軸に従って照射装置を回転させることにより計測装置からの光の照射方向を変更可能であり、制御装置は、第1回転軸および第2回転軸の少なくとも一方の回転軸に従って照射装置を第1態様で回転させて光を照射した後に、第1回転軸および第2回転軸の少なくとも一方の回転軸に従って照射装置を第1態様とは異なる第2態様で回転させて前記光を照射するように制御し、光の受光の結果に基づいて反射部材の位置に関する情報を取得する。 The measurement system disclosed herein comprises a measurement device that irradiates a reflective member with light and receives the light reflected by the reflective member, and a control device that controls the direction of light irradiation from the measurement device. The measurement device comprises an irradiation device that can irradiate light in a predetermined direction based on control by the control device. The control device can change the direction of light irradiation from the measurement device by rotating the irradiation device along at least one of a first rotation axis and a second rotation axis intersecting the first rotation axis. The control device controls the irradiation device to rotate in a first manner along at least one of the first rotation axis and the second rotation axis to irradiate light, and then rotate the irradiation device in a second manner different from the first manner along at least one of the first rotation axis and the second rotation axis to irradiate the light, and obtains information regarding the position of the reflective member based on the result of receiving the light.

図1は、計測システムの全体構成を表す模式図である。FIG. 1 is a schematic diagram showing the overall configuration of the measurement system. 図2は、計測装置の構成を表す模式図である。FIG. 2 is a schematic diagram showing the configuration of the measurement device. 図3は、制御装置の概略構成を示す模式図である。FIG. 3 is a schematic diagram showing the general configuration of the control device. 図4は、光の軌跡が示すパターンの第1の例を表す図である。FIG. 4 is a diagram showing a first example of a pattern indicated by a light trajectory. 図5は、光の軌跡が示すパターンの第2の例を表す図である。FIG. 5 is a diagram showing a second example of a pattern indicated by a light trajectory. 図6は、光の軌跡が示すパターンの第3の例を表す図である。FIG. 6 is a diagram showing a third example of a pattern indicated by a light trajectory. 図7は、光の軌跡が示すパターンの第4の例を表す図である。FIG. 7 is a diagram showing a fourth example of a pattern indicated by a light trajectory. 図8は、光の軌跡が示すパターンの第5の例を表す図である。FIG. 8 is a diagram showing a fifth example of a pattern indicated by a light trajectory. 図9は、光の軌跡が示すパターンの第6の例を表す図である。FIG. 9 is a diagram showing a sixth example of a pattern indicated by a light trajectory. 図10は、光の軌跡が示すパターンの第7の例を表す図である。FIG. 10 is a diagram showing a seventh example of a pattern indicated by a light trajectory. 図11は、第1の計測処理のフローチャートである。FIG. 11 is a flowchart of the first measurement process. 図12は、第2の計測処理のフローチャートである。FIG. 12 is a flowchart of the second measurement process. 図13は、第3の計測処理のフローチャートである。FIG. 13 is a flowchart of the third measurement process.

 以下、図面を参照して本願の計測システムおよび制御システムについて詳細に説明する。 The measurement system and control system of the present application will be described in detail below with reference to the drawings.

 図1は計測システムの全体構成を表す模式図である。 Figure 1 is a schematic diagram showing the overall configuration of the measurement system.

 本実施形態において、計測システム100は、計測装置1と、制御装置2と、撮像装置3と、可動体4とを有する。計測装置1、撮像装置3、および可動体4と、制御装置2とは、通信ネットワークNWを介して通信可能に接続される。通信ネットワークNWは、有線ローカルエリアネットワークを有する。通信ネットワークNWは、無線ローカルエリアネットワーク、無線広域ネットワーク、その他の通信ネットワークを有していてもよい。計測システム100は、1以上の計測装置を有していてもよい。制御装置2は、計測装置1に含まれていてもよい。撮像装置3は、計測装置1に含まれていてもよい。計測システム100は、可動体4を有さなくてもよい。計測システム100は、撮像装置を有さなくてもよい。 In this embodiment, the measurement system 100 has a measurement device 1, a control device 2, an imaging device 3, and a movable body 4. The measurement device 1, imaging device 3, movable body 4, and control device 2 are communicatively connected via a communication network NW. The communication network NW includes a wired local area network. The communication network NW may also include a wireless local area network, a wireless wide area network, or other communication network. The measurement system 100 may include one or more measurement devices. The control device 2 may be included in the measurement device 1. The imaging device 3 may be included in the measurement device 1. The measurement system 100 may not include a movable body 4. The measurement system 100 may not include an imaging device.

 計測装置1は、光を所定の照射方向に射出する。また、計測装置1は、光により照射された物体で反射された光を受光し、受光の結果を制御装置2に送信することができる。 The measuring device 1 emits light in a predetermined irradiation direction. The measuring device 1 can also receive light reflected from an object illuminated by the light and transmit the light reception results to the control device 2.

 制御装置2は、計測装置1、撮像装置3、および可動体4の少なくとも一つが所定の動作を実行するよう制御する。例えば、制御装置2は、計測装置1、撮像装置3、および可動体4の少なくとも一つに所定の動作を実行させるための制御情報を生成し、生成された制御情報を、通信ネットワークNWを介して制御対象となる装置に送信してよい。また、制御装置2は、通信ネットワークNWを介して、計測装置1、撮像装置3、および可動体4の少なくとも一つから情報を受信することができる。制御装置2は、受信した情報に基づいて、計測装置1、撮像装置3、および可動体4の少なくとも一つの動作を制御してよい。制御装置2は、受信した情報に基づいて、計測装置1、撮像装置3、および可動体4の少なくとも一つの動作を制御する制御情報を生成してよい。制御装置2は、通信ネットワークNWを介して、計測システム100の外部に制御情報を送信してもよい。 The control device 2 controls at least one of the measuring device 1, the imaging device 3, and the movable body 4 to perform a predetermined operation. For example, the control device 2 may generate control information for causing at least one of the measuring device 1, the imaging device 3, and the movable body 4 to perform a predetermined operation, and transmit the generated control information to the device to be controlled via the communication network NW. The control device 2 can also receive information from at least one of the measuring device 1, the imaging device 3, and the movable body 4 via the communication network NW. The control device 2 may control the operation of at least one of the measuring device 1, the imaging device 3, and the movable body 4 based on the received information. The control device 2 may generate control information for controlling the operation of at least one of the measuring device 1, the imaging device 3, and the movable body 4 based on the received information. The control device 2 may also transmit the control information to an external device of the measurement system 100 via the communication network NW.

 撮像装置3は、物体を撮像し、撮像結果として物体を表す画像を生成する。撮像装置3は、一対の撮像光学系を有するステレオカメラであってよい。ステレオカメラが生成する画像によると、画像に表された視差に基づいて、対象となる画素に対応する物体までの距離を計算し、物体の三次元位置を推定することができる。撮像装置3は、単眼カメラであってもよい。計測システム100は、撮像装置3を一つ有していてもよく、二つ以上有していてもよい。撮像装置3は、物体の方向に関する情報を取得してもよい。撮像装置3は、生成された画像を、通信ネットワークNWを介して制御装置2に送信してよい。 The imaging device 3 captures an image of an object and generates an image representing the object as the captured image. The imaging device 3 may be a stereo camera having a pair of imaging optical systems. From the image generated by the stereo camera, the distance to the object corresponding to the target pixel can be calculated based on the parallax shown in the image, and the three-dimensional position of the object can be estimated. The imaging device 3 may be a monocular camera. The measurement system 100 may have one imaging device 3, or two or more. The imaging device 3 may acquire information regarding the direction of the object. The imaging device 3 may transmit the generated image to the control device 2 via the communication network NW.

 可動体4は、位置および姿勢の少なくとも一方を変更可能な部分(可動部分)を有する。可動体4は、例えば、物体に対し、把持、切削、溶接、ねじ締め、研磨、塗装をはじめとする様々な加工、または、形状や位置、物理特性、電気特性等の様々な計測といった所定の処理を実行可能なロボットである。可動体4は、AGV(Automatic Guided Vehicle)、RGV(Rail Guided Vehicle)、AMR(Autonomous Mobile Robot)、ドローン、無人航空機といった移動可能な移動体であってもよい。可動体4は、所定の処理を実行可能なエンドエフェクタを備えてもよい。この場合、エンドエフェクタは可動体4の移動に伴って移動するため、エンドエフェクタを可動体4ということもできる。可動体4は、位置および姿勢の少なくとも一部を、通信ネットワークNWを介して制御装置2から受信した制御情報に従って変更してよい。なお、図1では、可動体4の一部のみが表されている。 The movable body 4 has a part (movable part) whose position and/or posture can be changed. The movable body 4 is, for example, a robot capable of performing predetermined processes on an object, such as various processes including grasping, cutting, welding, screwing, polishing, and painting, or various measurements of shape, position, physical properties, electrical properties, etc. The movable body 4 may be a mobile body such as an AGV (Automatic Guided Vehicle), RGV (Rail Guided Vehicle), AMR (Autonomous Mobile Robot), drone, or unmanned aerial vehicle. The movable body 4 may be equipped with an end effector capable of performing predetermined processes. In this case, the end effector moves in conjunction with the movement of the movable body 4, and therefore the end effector can also be referred to as the movable body 4. The movable body 4 may change at least a portion of its position and posture in accordance with control information received from the control device 2 via the communication network NW. Note that only a portion of the movable body 4 is shown in FIG. 1.

 反射部材5は、入射した光を入射方向と逆向きに反射する部材である。反射部材5は、反射部材5に入射する光を再帰反射する再帰反射部材ともいうことができる。反射部材5は、例えば、コーナーキューブリフレクタやボールレフレクタ等であってよい。反射部材5は、金属球及びそれに埋め込まれた再帰反射器で構成された球面実装型再帰反射器(SMR(Spherically Mounted Retroreflector))で構成されていてもよい。また、反射部材5は、所定のパターンが表されたマーカーであってもよい。反射部材5は、可動体4に取り付けられてもよい。反射部材5は、可動体4が備えるエンドエフェクタ、または、エンドエフェクタの近傍に取り付けられてもよい。図1の例において、反射部材5は、第1反射部材51、第2反射部材52、および第3反射部材53を含む。可動体4に設けられる反射部材5の数は3に限られず、それよりも多くてもよく、少なくてもよい。また、複数の反射部材5が、異なる対象物に取り付けられていてもよい。例えば、第1反射部材51が可動体4に取り付けられ、第2反射部材52が可動体4と異なる物体に取り付けられてもよい。複数の反射部材5がそれぞれ取り付けられた異なる対象物における可動部分は、反射部材5どうしの位置関係を維持するように、位置および姿勢の少なくとも一方が変更されてよい。反射部材5の取り付け先となる部分は、可動体でない対象物に取り付けられていてもよく、可動体4における可動部分以外に取り付けられていてもよい。 The reflective member 5 is a member that reflects incident light in a direction opposite to the incident direction. The reflective member 5 can also be referred to as a retroreflective member that retroreflects light that is incident on the reflective member 5. The reflective member 5 may be, for example, a corner cube reflector or a ball reflector. The reflective member 5 may also be composed of a spherically mounted retroreflector (SMR (Spherically Mounted Retroreflector)) composed of a metal sphere and a retroreflector embedded therein. The reflective member 5 may also be a marker that displays a predetermined pattern. The reflective member 5 may be attached to the movable body 4. The reflective member 5 may be attached to an end effector provided on the movable body 4 or near the end effector. In the example of Figure 1, the reflective member 5 includes a first reflective member 51, a second reflective member 52, and a third reflective member 53. The number of reflective members 5 provided on the movable body 4 is not limited to three and may be more or less than three. Furthermore, multiple reflective members 5 may be attached to different objects. For example, the first reflecting member 51 may be attached to the movable body 4, and the second reflecting member 52 may be attached to an object different from the movable body 4. At least one of the position and posture of the movable parts of the different objects to which multiple reflecting members 5 are attached may be changed so as to maintain the positional relationship between the reflecting members 5. The part to which the reflecting members 5 are attached may be attached to an object that is not a movable body, or may be attached to a part other than the movable part of the movable body 4.

 図2は計測装置1の構成を表す模式図である。計測装置1は、光コム干渉計11と、光路分岐部材12と、ミラー13と、受光素子14とを有する。 Figure 2 is a schematic diagram showing the configuration of the measurement device 1. The measurement device 1 has an optical comb interferometer 11, an optical path branching member 12, a mirror 13, and a light receiving element 14.

 光コム干渉計11は、計測装置1から反射部材5を照射するための照射光として、例えばレーザー光を発生させる。光コム干渉計11は、周波数軸上で等間隔に並んだ周波数成分を含むパルス光を発生する光コム光源であってもよい。光コム干渉計11により発生された照射光の少なくとも一部は、光路分岐部材12を透過してミラー13に照射される。光路分岐部材12は、入射した光の一部を透過し一部を反射する分岐面を有するプリズムである。光路分岐部材12は、分岐面を有するハーフミラーであってもよい。ミラー13は、入射した光の少なくとも一部を反射するミラーであり、方向を変更できるように支持されている。ミラー13で反射された照射光は、反射部材5を照射可能である。ミラー13は、所定の径を有する光を所定の照射方向で照射可能な照射装置と言うことができる。ミラー13により照射される光はレーザー光であってよい。この場合、ミラー13により照射される光の径は、ビーム径と言うこともできる。 The optical comb interferometer 11 generates, for example, laser light as irradiation light for irradiating the reflecting member 5 from the measurement device 1. The optical comb interferometer 11 may be an optical comb light source that generates pulsed light containing frequency components evenly spaced on the frequency axis. At least a portion of the irradiation light generated by the optical comb interferometer 11 passes through the optical path branching member 12 and is irradiated onto the mirror 13. The optical path branching member 12 is a prism having a branching surface that transmits part of the incident light and reflects part of it. The optical path branching member 12 may also be a half mirror having a branching surface. The mirror 13 reflects at least a portion of the incident light and is supported so that its direction can be changed. The irradiation light reflected by the mirror 13 can be irradiated onto the reflecting member 5. The mirror 13 can be considered an irradiation device that can irradiate light having a predetermined diameter in a predetermined irradiation direction. The light irradiated by the mirror 13 may be laser light. In this case, the diameter of the light irradiated by the mirror 13 can also be referred to as the beam diameter.

 反射部材5に照射された照射光は、反射部材5が有する反射面により、照射光が入射した方向と逆向きに反射される。反射部材5に反射された反射光はミラー13に入射し、ミラー13で反射されて光路分岐部材12に入射する。光路分岐部材12に入射した反射光の一部は、光路分岐部材12の分岐面で反射されて受光素子14に入射する。受光素子14は、四つに分割された受光面のそれぞれに配置されたフォトダイオードの入射光の光量に応じた出力に基づいて入射光の位置を検出する四分割PSD(Position Sensitive Detector)であってもよい。 The light irradiated onto the reflecting member 5 is reflected by the reflecting surface of the reflecting member 5 in the opposite direction to the incident direction of the irradiated light. The reflected light reflected by the reflecting member 5 is incident on the mirror 13, reflected by the mirror 13, and incident on the light path branching member 12. A portion of the reflected light incident on the light path branching member 12 is reflected by the branching surface of the light path branching member 12 and incident on the light receiving element 14. The light receiving element 14 may be a four-part PSD (Position Sensitive Detector) that detects the position of the incident light based on the output of a photodiode located on each of the four divided light receiving surfaces according to the amount of incident light.

 計測装置1は、受光素子14で受光した反射光の受光の結果を、通信ネットワークNWを介して制御装置2に出力する。制御装置2は、受信した反射光の受光の結果に基づき、例えば干渉計測法に従って反射部材5までの距離を得ることができる。なお、制御装置2は、反射部材5までの距離を三角測距法に従って得てもよい。制御装置2は、反射部材5までの距離と、ミラー13により反射部材5に照射される照射光の角度とに基づいて、計測座標系における反射部材5の位置を求める。反射部材5の位置を示す情報は、反射部材5の位置に関する情報の一例である。計測装置1を基準とする反射部材5の方向は、反射部材5の位置に関する情報の他の一例である。計測装置1は、反射部材5の位置に関する情報に基づいて、反射部材5の計測を行う。 The measuring device 1 outputs the results of receiving the reflected light received by the light receiving element 14 to the control device 2 via the communication network NW. Based on the results of receiving the reflected light, the control device 2 can obtain the distance to the reflective member 5, for example, using an interferometric measurement method. The control device 2 may also obtain the distance to the reflective member 5 using a triangulation method. The control device 2 determines the position of the reflective member 5 in the measurement coordinate system based on the distance to the reflective member 5 and the angle of the light irradiated onto the reflective member 5 by the mirror 13. Information indicating the position of the reflective member 5 is one example of information related to the position of the reflective member 5. The direction of the reflective member 5 relative to the measuring device 1 is another example of information related to the position of the reflective member 5. The measuring device 1 measures the reflective member 5 based on the information related to the position of the reflective member 5.

 図3は制御装置2の概略構成を示す模式図である。制御装置2は、通信インタフェース21、メモリ22、およびプロセッサ23を有するコンピュータである。 Figure 3 is a schematic diagram showing the general configuration of the control device 2. The control device 2 is a computer having a communication interface 21, memory 22, and processor 23.

 通信インタフェース21は、通信部の一例であり、制御装置2が処理すべきデータを受け付け、または、制御装置2により処理されたデータを出力するためのインタフェース回路を有する。通信インタフェース21は、例えば制御装置2を通信ネットワークNWに接続するための通信インタフェース回路を含む。 The communication interface 21 is an example of a communication unit, and has an interface circuit for accepting data to be processed by the control device 2, or for outputting data processed by the control device 2. The communication interface 21 includes, for example, a communication interface circuit for connecting the control device 2 to the communication network NW.

 メモリ22は、記憶部の一例であり、揮発性の半導体メモリおよび不揮発性の半導体メモリを有する。メモリ22は、プロセッサ23による処理に用いられる各種データ、例えば計測装置1から取得した受光の結果、反射部材5に関する初期情報等を記憶する。反射部材5に関する初期情報は、例えば反射部材5が存在すると推定される位置を示す情報を含んでよい。反射部材5が存在すると推定される位置を示す情報は、例えば、計測装置1の計測座標系における座標である。反射部材5が存在すると推定される位置を示す座標は、例えば可動体4の基準となる位置および姿勢における反射部材5の位置を示す座標と、可動体4においてエンコーダにより生成される所定の回転軸に従った回転角度を示す情報と、可動体4の各部分のサイズとに基づいて算出されてよい。また、反射部材5が存在すると推定される位置を示す座標は、予め計測装置1により計測された反射部材5の位置を示す座標であってよい。また、反射部材5が存在すると推定される位置を示す座標は、撮像装置3により生成される画像に基づいて推定される位置を示す座標であってよい。また、メモリ22は、反射部材5に関する初期情報として、反射部材5に含まれる第1反射部材51、第2反射部材52および第3反射部材53のそれぞれの相対的な位置関係を記憶していてよい。相対的な位置関係は、例えば第1反射部材51の位置を基準とした他の反射部材の相対位置として表されてよい。また、反射部材5に関する初期情報は、反射部材5が配置されていると推定される方向を示す情報を含んでよい。反射部材5が配置されていると推定される方向は、反射部材5の推定される姿勢と言うこともできる。また、メモリ22は、各種コンピュータプログラムコード、例えば計測処理を実行するためのコンピュータプログラムコード220等を保存する。このコンピュータプログラムコード220は、後述する処理を実行できるようにするロジック及びルーチンを提供する。 Memory 22 is an example of a storage unit and includes volatile and non-volatile semiconductor memory. Memory 22 stores various data used in processing by processor 23, such as the results of light reception obtained from measurement device 1 and initial information regarding reflective member 5. The initial information regarding reflective member 5 may include, for example, information indicating the estimated position of reflective member 5. The information indicating the estimated position of reflective member 5 is, for example, coordinates in the measurement coordinate system of measurement device 1. The coordinates indicating the estimated position of reflective member 5 may be calculated based on, for example, coordinates indicating the position of reflective member 5 in the reference position and orientation of movable body 4, information indicating the rotation angle according to a predetermined rotation axis generated by an encoder in movable body 4, and the size of each part of movable body 4. Furthermore, the coordinates indicating the estimated position of reflective member 5 may be coordinates indicating the position of reflective member 5 measured in advance by measurement device 1. Furthermore, the coordinates indicating the estimated position of reflective member 5 may be coordinates indicating a position estimated based on an image generated by imaging device 3. The memory 22 may also store the relative positional relationships of the first reflecting member 51, second reflecting member 52, and third reflecting member 53 included in the reflecting member 5 as initial information related to the reflecting member 5. The relative positional relationships may be expressed, for example, as the relative positions of the other reflecting members based on the position of the first reflecting member 51. The initial information related to the reflecting member 5 may also include information indicating the estimated direction in which the reflecting member 5 is disposed. The estimated direction in which the reflecting member 5 is disposed can also be referred to as the estimated attitude of the reflecting member 5. The memory 22 also stores various computer program codes, such as computer program code 220 for executing measurement processing. This computer program code 220 provides logic and routines that enable the processing described below to be executed.

 プロセッサ23は、制御部の一例であり、1以上のプロセッサおよびその周辺回路を有する。プロセッサ23は、論理演算ユニット、数値演算ユニット、またはグラフィック処理ユニットといった他の演算回路をさらに有していてもよい。プロセッサ23がメモリ22に記憶されたコンピュータプログラムコード220を実行することにより、制御装置2は本実施形態に記載の種々の処理を実行する。その結果、プロセッサ23内には、制御装置2が行うべき動作を実行するための論理的な機能ブロックが実現されてもよい。このように、プロセッサ23は、制御装置2が行うべき動作を実行するための論理的な機能ブロックを実現するためのコントローラとして機能可能である。この場合、コンピュータプログラムコード220を実行した任意の装置(典型的には、コンピュータ)は、制御装置2として機能可能である。なお、メモリ22及びプロセッサ23のうち少なくとも一方は制御回路(あるいは回路)と称されてもよい。 The processor 23 is an example of a control unit and includes one or more processors and their peripheral circuits. The processor 23 may further include other arithmetic circuits, such as a logic operation unit, a numerical operation unit, or a graphics processing unit. The processor 23 executes the computer program code 220 stored in the memory 22, causing the control device 2 to perform the various processes described in this embodiment. As a result, logical functional blocks for executing the operations to be performed by the control device 2 may be realized within the processor 23. In this way, the processor 23 can function as a controller for realizing logical functional blocks for executing the operations to be performed by the control device 2. In this case, any device (typically, a computer) that executes the computer program code 220 can function as the control device 2. At least one of the memory 22 and the processor 23 may be referred to as a control circuit (or circuit).

 制御装置2は、第1反射部材51で反射された光の受光の結果に基づき、第2反射部材52に光が照射されるように計測装置1からの光の照射方向を制御する。このとき、制御装置2は、第2反射部材52を探索するように、計測装置1からの光の照射方向を制御してよい。制御装置2は、計測装置1からの光の照射方向を制御して、第2反射部材52を探索すると言うこともできる。言い換えると、制御装置2は、計測装置1からの光の光路OPと交差する任意の面PLにおける複数の位置に光が照射されるように、計測装置1からの光の照射方向を制御する。さらに言い換えると、計測装置1からの光の光路OPと交差する面PLを走査するように、計測装置1からの光の照射方向を制御する。制御装置2は、面PLにおける複数の位置に光が照射されるように計測装置1からの光の照射方向が制御されることで、面PLにおける光が通過した経路を軌跡Rとするとき、軌跡Rは、所定のパターンを示す。面PLにおける光の軌跡Rは、軌道もしくは経路と言うこともできる。制御装置2は、対象となる反射部材5が存在すると推定される位置を軌跡Rの始点として光が照射されるように計測装置1を制御してよい。また、制御装置2は、対象となる反射部材5が存在すると推定される位置を軌跡Rの終点として光が照射されるように計測装置1を制御してよい。また、制御装置2は、対象となる反射部材5が存在すると推定される位置を含む範囲に含まれる任意の点(例えば多角形の頂点)を軌跡Rの始点として光が照射されるように計測装置1を制御してもよい。 Based on the result of receiving light reflected by the first reflecting member 51, the control device 2 controls the direction of light emitted from the measurement device 1 so that light is irradiated onto the second reflecting member 52. At this time, the control device 2 may control the direction of light emitted from the measurement device 1 so as to search for the second reflecting member 52. It can also be said that the control device 2 controls the direction of light emitted from the measurement device 1 to search for the second reflecting member 52. In other words, the control device 2 controls the direction of light emitted from the measurement device 1 so that light is irradiated onto multiple positions on any surface PL that intersects with the optical path OP of the light from the measurement device 1. In yet another way, the control device 2 controls the direction of light emitted from the measurement device 1 so that light is irradiated onto multiple positions on the surface PL. When the path traveled by the light on the surface PL is taken as a trajectory R, the trajectory R exhibits a predetermined pattern. The trajectory R of light on the surface PL can also be referred to as a track or a path. The control device 2 may control the measurement device 1 so that light is emitted from the position where the target reflective member 5 is estimated to be present, which is the start point of the locus R. The control device 2 may also control the measurement device 1 so that light is emitted from the position where the target reflective member 5 is estimated to be present, which is the end point of the locus R. The control device 2 may also control the measurement device 1 so that light is emitted from the start point of the locus R, which is an arbitrary point (for example, a vertex of a polygon) included in a range that includes the position where the target reflective member 5 is estimated to be present.

 制御装置2は、面PLにおける光の軌跡Rが第1パターンを示すように計測装置1からの光の照射方向を制御した後に、面PLにおける光の軌跡Rが第1パターンと異なる第2パターンを示すように計測装置1からの光の照射方向を制御してもよい。第2パターンは、第1パターンと同一の面PLで比較したときに、第1パターンよりもピッチの狭いパターン、第1パターンよりも照射範囲の狭いパターン、または第1パターンよりも密度が高いパターンであってよい。第2パターンは、第1パターンよりも高精度に反射部材5を探索するパターンであるとも言える。したがって、面PLにおいて軌跡Rが第1パターンを示す光の照射をラフスキャンと言うことができ、面PLにおいて軌跡Rが第2パターンを示す光の照射をファインスキャンと言うことができる。また、制御装置2がラフスキャンにより反射部材を探索するよう計測装置1に光を照射させる制御を第1探索モードによる制御と言うことができ、制御装置2がファインスキャンにより反射部材を探索するよう計測装置1に光を照射させる制御を第2探索モードによる制御と言うことができる。 The control device 2 may first control the direction of light irradiation from the measurement device 1 so that the light trajectory R on the surface PL shows a first pattern, and then control the direction of light irradiation from the measurement device 1 so that the light trajectory R on the surface PL shows a second pattern different from the first pattern. The second pattern may be a pattern with a narrower pitch than the first pattern, a narrower irradiation range than the first pattern, or a higher density than the first pattern when compared on the same surface PL as the first pattern. The second pattern can also be said to be a pattern that searches for the reflective member 5 with higher accuracy than the first pattern. Therefore, the irradiation of light on the surface PL so that the trajectory R shows the first pattern can be referred to as rough scanning, and the irradiation of light on the surface PL so that the trajectory R shows the second pattern can be referred to as fine scanning. Furthermore, the control by the control device 2 to cause the measurement device 1 to irradiate light so that the reflective member is searched for by rough scanning can be referred to as control in the first search mode, and the control by the control device 2 to cause the measurement device 1 to irradiate light so that the reflective member is searched for by fine scanning can be referred to as control in the second search mode.

 計測装置1の計測座標系は、例えば、計測装置1から計測対象物(可動体4)に向かって左右方向をX軸、前後方向をY軸、上下方向(鉛直方向)をZ軸として表すことができる。計測装置1からの光の光路OPと交差する面PLは、一例として、計測座標系においてY軸と直交する平面であってもよく、直交しない平面であってもよい。本実施例では、面PLがY軸と直交する状態を一例として説明する。 The measurement coordinate system of the measurement device 1 can be expressed, for example, with the left-right direction from the measurement device 1 toward the measurement object (movable body 4) as the X axis, the front-to-back direction as the Y axis, and the up-down direction (vertical direction) as the Z axis. The plane PL that intersects with the optical path OP of the light from the measurement device 1 may, as one example, be a plane that is orthogonal to the Y axis in the measurement coordinate system, or a plane that is not orthogonal. In this example, a state in which the plane PL is orthogonal to the Y axis will be described as an example.

 図4-10は、それぞれ、光の軌跡Rが示すパターンの例を表す図である。 Figures 4-10 are diagrams showing examples of patterns indicated by the light trajectory R.

 図4では、計測座標系におけるY軸に直交する平面において軌跡Rが示すパターンRP1と、光を照射する計測装置1とが、説明のため異なる視点により表されている。図4に表されるパターンRP1は、始点SRP1から旋回するにつれ始点SRP1から遠ざかる渦巻形状をなす。パターンRP1における渦巻形状は、最遠点から旋回するにつれ始点SRP1に近づく形状とも言える。 4, the pattern RP1 indicated by the locus R on a plane perpendicular to the Y axis in the measurement coordinate system and the measurement device 1 that emits light are shown from different viewpoints for the sake of explanation. The pattern RP1 shown in FIG. 4 has a spiral shape that moves away from the starting point S RP1 as it turns from the starting point S RP1 . The spiral shape of the pattern RP1 can also be said to be a shape that moves closer to the starting point S RP1 as it turns from the farthest point.

 パターンRP1は、定数a(a>0)および媒介変数θを用いて(x,z)=(aθcosθ,aθsinθ)で表されるアルキメデス螺旋に対応し、円形に基づく周期的な形状と言える。 Pattern RP1 corresponds to an Archimedean spiral, expressed as (x,z)=(aθcosθ,aθsinθ) using the constant a (a>0) and the parameter θ, and can be said to be a periodic shape based on a circle.

 パターンRP1において、線分LSRP1は、始点SRP1と、軌跡Rにおいて始点SRP1からの直線距離が最も長い最遠点FRP1とを結ぶ線分である。線分LSRP1は、軌跡Rと最初に交点I1RP1で交わり、次に交点I2RP1で交わる。間隔D12RP1は、交点I1RP1と交点I2RP1との間隔を示す。 In pattern RP1, line segment LS RP1 is a line segment that connects start point S RP1 and farthest point F RP1 , which is the point on locus R that has the longest straight-line distance from start point S RP1 . Line segment LS RP1 intersects with locus R first at intersection point I1 RP1 and then at intersection point I2 RP1 . Distance D12 RP1 indicates the distance between intersection point I1 RP1 and intersection point I2 RP1 .

 パターンRP1において、間隔DNLRP1は、軌跡R上の点PTRP1と、点PTRP1における法線NLRP1および軌跡Rが一度目に交わる点との間隔を示す。 In the pattern RP1, the distance DNL RP1 indicates the distance between the point PT RP1 on the locus R and the point where the normal NL RP1 at the point PT RP1 and the locus R intersect for the first time.

 パターンRP1において、軌跡Rは、面PLに予め設定された単位領域UAを2回通る。 In pattern RP1, trajectory R passes through a unit area UA preset on surface PL twice.

 計測装置1は、X軸およびZ軸のそれぞれに従ってミラー13を回転させることにより、光の照射方向を変更することができる。パターンRP1において、角度範囲ARXRP1はX軸に従った回転の最大角度範囲であり、角度範囲ARZRP1はZ軸に従った回転の最大角度範囲である。なお、最大角度範囲は、対応するパターンにおいて回転しうる最大の角度の範囲をいい、実際の照射において必ずしもその範囲内のすべての角度に向けてミラー13が回転されることを意味しない。例えば、始点SRP1から照射を開始して最遠点FRP1に至る前に対象となる反射部材5が照射された(反射部材5で反射された光が受光された)場合、制御装置2は計測装置1にそれ以降の光の照射を中止させてよい。 The measurement device 1 can change the light irradiation direction by rotating the mirror 13 along each of the X and Z axes. In the pattern RP1, the angle range ARX RP1 is the maximum angle range of rotation along the X axis, and the angle range ARZ RP1 is the maximum angle range of rotation along the Z axis. Note that the maximum angle range refers to the maximum angle range that can be rotated in the corresponding pattern, and does not necessarily mean that the mirror 13 is rotated to all angles within that range during actual irradiation. For example, if irradiation starts from the start point S RP1 and the target reflective member 5 is irradiated (light reflected by the reflective member 5 is received) before reaching the farthest point F RP1 , the control device 2 may cause the measurement device 1 to stop irradiating light thereafter.

 図5では、計測座標系におけるY軸に直交する平面である面PLにおいて軌跡Rが示すパターンRP2と、光を照射する計測装置1とが、図4と同様に説明のため異なる視点により表されている。図5に表されるパターンRP2は、始点SRP2から旋回するにつれ始点SRP2から遠ざかる渦巻形状をなす。パターンRP2における渦巻形状は、最遠点から旋回するにつれ始点SRP2に近づく形状とも言える。 5, the pattern RP2 indicated by the locus R on a plane PL, which is a plane perpendicular to the Y axis in the measurement coordinate system, and the measurement device 1 that emits light are shown from a different viewpoint for ease of explanation, as in FIG. 4. The pattern RP2 shown in FIG. 5 has a spiral shape that moves away from the starting point S RP2 as it turns from the starting point S RP2 . The spiral shape of the pattern RP2 can also be said to be a shape that moves closer to the starting point S RP2 as it turns from the farthest point.

 パターンRP2は、定数b(a>b>0)および媒介変数θを用いて(x,z)=(bθcosθ,θsinθ)で表されるアルキメデス螺旋に対応し、円形に基づく周期的な形状と言える。すなわち、パターンRP2は、パターンRP1と同様の外観を有し、渦巻形状における軌跡Rどうしの間隔がパターンRP1のものよりも小さい。 Pattern RP2 corresponds to an Archimedean spiral, expressed as (x, z) = (bθ cosθ, θ sinθ) using the constant b (a>b>0) and the parameter θ, and can be said to be a periodic shape based on a circle. In other words, pattern RP2 has the same appearance as pattern RP1, but the spacing between the trajectories R in the spiral shape is smaller than that of pattern RP1.

 パターンRP2において、線分LSRP2は、始点SRP2と、軌跡Rにおいて始点SRP2からの直線距離が最も長い最遠点FRP2とを結ぶ線分である。線分LSRP2は、パターンRP1における線分LSRP1よりも短い。線分LSRP2は、軌跡Rと最初に交点I1RP2で交わり、次に交点I2RP2で交わる。間隔D12RP2は、交点I1RP2と交点I2RP2との間隔を示す。間隔D12RP2は、パターンRP1における間隔D12RP1よりも短い。 In pattern RP2, line segment LS RP2 is a line segment that connects start point S RP2 and farthest point F RP2 , which is the point on locus R that has the longest straight-line distance from start point S RP2. Line segment LS RP2 is shorter than line segment LS RP1 in pattern RP1. Line segment LS RP2 intersects with locus R first at intersection point I1 RP2 and then at intersection point I2 RP2 . Distance D12 RP2 indicates the distance between intersection point I1 RP2 and intersection point I2 RP2 . Distance D12 RP2 is shorter than distance D12 RP1 in pattern RP1.

 パターンRP2において、間隔DNLRP2は、軌跡R上の点PTRP2と、点PTRP2における法線NLRP2および軌跡Rが一度目に交わる点との間隔を示す。間隔DNLRP2は、パターンRP1における間隔DNLRP1よりも短い。 In the pattern RP2, the interval DNL RP2 indicates the interval between the point PT RP2 on the locus R and the first intersection point of the normal NL RP2 at the point PT RP2 and the locus R. The interval DNL RP2 is shorter than the interval DNL RP1 in the pattern RP1.

 パターンRP2において、軌跡Rは、面PLに予め設定された単位領域UAを3回通る。パターンRP2において単位領域UAを通る軌跡Rの長さは、パターンRP1において単位領域UAを通る軌跡Rの長さよりも長い。 In pattern RP2, the trajectory R passes through the unit area UA preset on the surface PL three times. The length of the trajectory R passing through the unit area UA in pattern RP2 is longer than the length of the trajectory R passing through the unit area UA in pattern RP1.

 パターンRP2において、角度範囲ARXRP2はX軸に従った回転の最大角度範囲であり、角度範囲ARZRP2はZ軸に従った回転の最大角度範囲である。角度範囲ARXRP2は、パターンRP1における角度範囲ARXRP1よりも小さい。また、角度範囲ARZRP2は、パターンRP1における角度範囲ARZRP1よりも小さい。 In pattern RP2, the angular range ARX RP2 is the maximum angular range of rotation along the X axis, and the angular range ARZ RP2 is the maximum angular range of rotation along the Z axis. The angular range ARX RP2 is smaller than the angular range ARX RP1 in pattern RP1. Also, the angular range ARZ RP2 is smaller than the angular range ARZ RP1 in pattern RP1.

 図6では、計測座標系におけるY軸に直交する平面において軌跡Rが示すパターンRP3が表されている。図6に表されるパターンRP3は、始点から旋回するにつれ始点から遠ざかる渦巻形状をなす。パターンRP3における渦巻形状は、最遠点から旋回するにつれ始点に近づく形状とも言える。 Figure 6 shows pattern RP3 indicated by trajectory R on a plane perpendicular to the Y axis in the measurement coordinate system. Pattern RP3 shown in Figure 6 forms a spiral shape that moves away from the starting point as it rotates from the starting point. The spiral shape of pattern RP3 can also be said to be a shape that moves closer to the starting point as it rotates from the farthest point.

 パターンRP3は、定数c,d(c>d>0)および媒介変数θを用いて(x,z)=(cθcosθ,dθsinθ)で表されるアルキメデス螺旋に対応し、楕円形に基づく周期的な形状と言える。 Pattern RP3 corresponds to an Archimedean spiral expressed as (x,z)=(cθcosθ,dθsinθ) using constants c and d (c>d>0) and parameter θ, and can be said to be a periodic shape based on an ellipse.

 図7では、計測座標系におけるY軸に直交する平面において軌跡Rが示すパターンRP4が表されている。図7に表されるパターンRP4は、始点から旋回するにつれ始点から遠ざかる渦巻形状をなす。パターンRP4における渦巻形状は、最遠点から旋回するにつれ始点に近づく形状とも言える。 Figure 7 shows pattern RP4 indicated by trajectory R on a plane perpendicular to the Y axis in the measurement coordinate system. Pattern RP4 shown in Figure 7 forms a spiral shape that moves away from the starting point as it rotates from the starting point. The spiral shape of pattern RP4 can also be said to be a shape that moves closer to the starting point as it rotates from the farthest point.

 パターンRP4は、直線により構成され、多角形に基づく形状と言える。また、パターンRP4において始点からi番目の点の座標(x,z)は、始点からi-1番目の点の座標(xi-1,zi-1)の満たす条件に応じて、xi-1、zi-1、および定数pを用いて表すことができる。そのため、パターンRP4は周期的な形状と言える。 Pattern RP4 is composed of straight lines and can be said to have a shape based on a polygon. Furthermore, the coordinates (x i , z i ) of the i-th point from the starting point in pattern RP4 can be expressed using x i-1 , z i-1 , and a constant p, depending on the condition satisfied by the coordinates (x i-1 , z i - 1 ) of the i-1-th point from the starting point. Therefore, pattern RP4 can be said to have a periodic shape.

 図8では、計測座標系におけるY軸に直交する平面において軌跡Rが示すパターンRP5が表されている。図8に表されるパターンRP5において、軌跡Rは、平面上の直線が所定の長さで折り返しを繰り返すことで形成されるラスターパターンを示す。パターンRP5では、軌跡がZ軸に沿った所定の幅(振幅)に達した地点で折り返して所定距離(ピッチ)だけX軸に沿って動くようにラスターパターンが構成されているが、ラスターパターンはこれに限られず、振幅およびその移動方向について、X軸とZ軸とが逆であってもよく、X軸またはZ軸と平行でなくてもよく、直交していなくてもよい。 Figure 8 shows pattern RP5 indicated by locus R on a plane perpendicular to the Y axis in the measurement coordinate system. In pattern RP5 shown in Figure 8, locus R indicates a raster pattern formed by a straight line on a plane repeatedly folding back at a predetermined length. In pattern RP5, the raster pattern is configured so that the locus folds back at a point where it reaches a predetermined width (amplitude) along the Z axis and moves a predetermined distance (pitch) along the X axis, but the raster pattern is not limited to this; the amplitude and direction of movement may be reversed between the X and Z axes, and the movement need not be parallel to or perpendicular to the X or Z axes.

 パターンRP5において、軌跡R上の各点のZ軸の値は、X軸の値、振幅、およびピッチを用いて表すことができる。そのため、パターンRP5は周期的な形状と言える。 In pattern RP5, the Z-axis value of each point on locus R can be expressed using the X-axis value, amplitude, and pitch. Therefore, pattern RP5 can be said to have a periodic shape.

 図9では、計測座標系におけるY軸に直交する平面において軌跡Rが示すパターンRP6が表されている。図9に表されるパターンRP6において、軌跡Rは、平面上の直線が所定の長さで折り返しを繰り返すことで形成されるラスターパターンを示す。パターンRP5では、軌跡がZ軸に沿った所定の幅(振幅)に達した地点で所定距離(ピッチ)だけX軸に沿って動き、その後Z軸に沿って逆方向に進むようにラスターパターンが構成されているが、ラスターパターンはこれに限られず、振幅およびその移動方向について、X軸とZ軸とが逆であってもよく、X軸またはZ軸と平行でなくてもよく、直交していなくてもよい。 Figure 9 shows pattern RP6 indicated by locus R on a plane perpendicular to the Y axis in the measurement coordinate system. In pattern RP6 shown in Figure 9, locus R indicates a raster pattern formed by a straight line on a plane repeatedly folding back at a predetermined length. In pattern RP5, the raster pattern is configured so that when the locus reaches a predetermined width (amplitude) along the Z axis, it moves along the X axis by a predetermined distance (pitch), and then moves in the opposite direction along the Z axis, but the raster pattern is not limited to this; the amplitude and movement direction may be reversed between the X and Z axes, and the X and Z axes may not be parallel or perpendicular to each other.

 パターンRP6において、軌跡R上の各点のZ軸の値は、X軸の値、振幅、およびピッチを用いて表すことができる。そのため、パターンRP6は周期的な形状と言える。 In pattern RP6, the Z-axis value of each point on locus R can be expressed using the X-axis value, amplitude, and pitch. Therefore, pattern RP6 can be said to have a periodic shape.

 図10では、計測座標系におけるY軸に直交する平面において軌跡Rが示すパターンRP7が表されている。図10に表されるパターンRP7において、軌跡Rは、始点から旋回するにつれ始点から遠ざかる渦巻形状をなす。パターンRP7における渦巻形状は、最遠点から旋回するにつれ始点に近づく形状とも言える。 Figure 10 shows pattern RP7 indicated by trajectory R on a plane perpendicular to the Y axis in the measurement coordinate system. In pattern RP7 shown in Figure 10, trajectory R forms a spiral shape that moves away from the starting point as it rotates from the starting point. The spiral shape in pattern RP7 can also be said to be a shape that moves closer to the starting point as it rotates from the farthest point.

 パターンRP7において、軌跡の間隔は中央近傍と周辺とで異なっており、パターンRP7は非周期的な形状と言える。 In pattern RP7, the spacing between the trajectories is different near the center and at the periphery, and pattern RP7 can be said to have a non-periodic shape.

 上述のパターンRP1-7は、計測座標系におけるY軸に直交する平面において光の軌跡Rが示すパターンの一例であり、光の軌跡Rは他のパターンを示してもよい。そのようなパターンは、周期的な形状であってよく、非周期的な形状(例えばランダムパターン)であってもよい。 The above-mentioned patterns RP1-7 are examples of patterns indicated by the light trajectory R in a plane perpendicular to the Y axis in the measurement coordinate system, and the light trajectory R may indicate other patterns. Such patterns may be periodic or non-periodic (e.g., random patterns).

 制御装置2は、計測装置1のミラー13を所定の態様で回転させることで、計測座標系におけるY軸に直交する平面における光の軌跡Rが所定のパターンを示すように制御することができる。 By rotating the mirror 13 of the measurement device 1 in a predetermined manner, the control device 2 can control the light trajectory R in a plane perpendicular to the Y axis in the measurement coordinate system to show a predetermined pattern.

 例えば、制御装置2は、計測装置1のミラー13を、第1回転軸および第1回転軸と異なる第2回転軸の少なくとも一方の回転軸に従って所定の態様で回転させてよい。制御装置2は、計測装置1のミラー13を第1回転軸および第2回転軸の両方の回転軸に従って回転させる場合、第1回転軸に従って回転させると同時に第2回転軸に従って回転させてもよく、第1回転軸および第2回転軸の一方に従って回転させた後に他方に従って回転させてもよい。また、例えば、第1回転軸および第2回転軸は、それぞれ、計測座標系におけるZ軸およびX軸であってよい。第1回転軸がZ軸である場合において、第1回転軸に従った最大回転角度は、光が照射される範囲のX軸方向の大きさに対応する。第2回転軸がX軸である場合において、第2回転軸に従った最大回転角度は、光が照射される範囲のZ軸方向の大きさに対応する。 For example, the control device 2 may rotate the mirror 13 of the measurement device 1 in a predetermined manner around at least one of the first rotation axis and a second rotation axis different from the first rotation axis. When the control device 2 rotates the mirror 13 of the measurement device 1 around both the first rotation axis and the second rotation axis, it may rotate the mirror 13 around the first rotation axis and the second rotation axis at the same time, or it may rotate the mirror 13 around one of the first rotation axis and the second rotation axis and then rotate the mirror 13 around the other. Furthermore, for example, the first rotation axis and the second rotation axis may be the Z axis and the X axis, respectively, in a measurement coordinate system. When the first rotation axis is the Z axis, the maximum rotation angle around the first rotation axis corresponds to the size of the range irradiated with light in the X axis direction. When the second rotation axis is the X axis, the maximum rotation angle around the second rotation axis corresponds to the size of the range irradiated with light in the Z axis direction.

 制御装置2は、計測装置1のミラー13を、第1回転軸および第2回転軸の少なくとも一方の回転軸に従って所定の態様で回転させることで、計測座標系におけるY軸に直交する平面における光の軌跡Rが、所定のパターンを示すように制御する。より具体的には、制御装置2は、計測装置1のミラー13を、第1回転軸および第2回転軸の少なくとも一方の回転軸に従って第1の態様および第2の態様で回転させることで、計測座標系におけるY軸に直交する平面における光の軌跡Rが、それぞれ第1パターンおよび第2パターンを示すように制御してよい。 The control device 2 controls the mirror 13 of the measurement device 1 to rotate in a predetermined manner around at least one of the first and second rotation axes, so that the light trajectory R in a plane perpendicular to the Y axis in the measurement coordinate system shows a predetermined pattern. More specifically, the control device 2 may control the mirror 13 of the measurement device 1 to rotate in a first manner and a second manner around at least one of the first and second rotation axes, so that the light trajectory R in a plane perpendicular to the Y axis in the measurement coordinate system shows a first pattern and a second pattern, respectively.

 第1パターンおよび第2パターンは、それぞれ、パターンRP1およびパターンRP2であってよい。このとき、第1パターンを示すための第1態様におけるZ軸に従った最大回転角度は、図4に表される角度範囲ARZRP1である。一方、第2パターンを示すための第2態様におけるZ軸に従った最大回転角度は、図5に表される角度範囲ARZRP2である。上述したように、角度範囲ARZRP2は、角度範囲ARZRP1よりも小さい。つまり、第2パターンを示すための第2態様は、第1パターンを示すための第1態様よりも、Z軸に従った最大回転角度が小さい態様と言うことができる。同様に、第2パターンを示すための第2態様は、第1パターンを示すための第1態様よりも、X軸に従った最大回転角度が小さい態様と言うことができる。 The first pattern and the second pattern may be pattern RP1 and pattern RP2, respectively. In this case, the maximum rotation angle along the Z axis in the first aspect for showing the first pattern is the angle range ARZ RP1 shown in FIG. 4 . On the other hand, the maximum rotation angle along the Z axis in the second aspect for showing the second pattern is the angle range ARZ RP2 shown in FIG. 5 . As described above, the angle range ARZ RP2 is smaller than the angle range ARZ RP1 . In other words, the second aspect for showing the second pattern can be said to have a smaller maximum rotation angle along the Z axis than the first aspect for showing the first pattern. Similarly, the second aspect for showing the second pattern can be said to have a smaller maximum rotation angle along the X axis than the first aspect for showing the first pattern.

 光の軌跡Rが、計測座標系におけるY軸に直交する平面において、X座標の値が等しい二つの点を通るとき、それぞれの点を通るときのZ軸に従った回転の回転角度は互いに等しい。パターンの中央近傍の始点から始まる渦巻形状の軌跡Rにおいて、二つの点のうち一方の点を通るときの回転角度と、他方の点を通るときとのX軸に従った回転角度とは、これらの点のZ座標の差に応じた差を有する。パターンRP2における、X座標の値が等しい二つの点におけるZ座標の値の差は、パターンRP1における値よりも小さい。そのため、パターンRP2においてX座標の値が等しい二つの点についてのX軸に従った回転角度の差は、パターンRP1においてX座標の値が等しい二つの点についてのX軸に従った回転角度の差よりも小さい。 When light trajectory R passes through two points with the same X coordinate value in a plane perpendicular to the Y axis in the measurement coordinate system, the rotation angles along the Z axis when passing through each point are equal. In a spiral-shaped trajectory R that begins from a starting point near the center of the pattern, the rotation angle along the X axis when passing through one of the two points differs from the rotation angle along the X axis when passing through the other point according to the difference in the Z coordinates of these points. The difference in Z coordinate values between two points with the same X coordinate value in pattern RP2 is smaller than the value in pattern RP1. Therefore, the difference in rotation angles along the X axis between two points with the same X coordinate value in pattern RP2 is smaller than the difference in rotation angles along the X axis between two points with the same X coordinate value in pattern RP1.

 制御装置2は、面PLにおける光の軌跡Rが所定のパターンを示すように計測装置1を制御する。このとき、制御装置2は、光コム干渉計11から射出されミラー13で反射される光の径に基づき、計測装置1を制御するための制御パラメータを設定してよい。制御パラメータは、計測装置1におけるミラー13の回転軸に従った回転の態様を設定するパラメータであってよい。 The control device 2 controls the measurement device 1 so that the light trajectory R on the surface PL shows a predetermined pattern. At this time, the control device 2 may set a control parameter for controlling the measurement device 1 based on the diameter of the light emitted from the optical comb interferometer 11 and reflected by the mirror 13. The control parameter may be a parameter that sets the manner of rotation of the mirror 13 in the measurement device 1 around the rotation axis.

 計測装置1を制御するための制御パラメータは、面PLにおいて光の軌跡Rどうしが隣接する間隔(ピッチ)および光が照射される最大範囲およびミラー13を回転させる回転軸の角度範囲の少なくとも一つを含んでよい。ピッチはビーム間隔とも言うことができる。制御装置2は、ピッチを光の径に基づいて、例えば、ピッチの値が反射部材5の径未満となるように設定してもよい。また、制御装置2は、反射部材5の径に基づき、計測装置1を制御するための制御パラメータを設定してよい。ピッチの値を反射部材5の径未満とすることで、反射部材5が光と光との間に位置し光が照射されない状態を防ぐことができる。例えば、制御装置2は、ピッチの値が反射部材5の径未満となるように設定してもよい。制御装置2は、ピッチを光の径に基づいて計測装置1を制御するための制御パラメータを設定してもよい。ピッチを光の径に基づいて設定することで、光を反射部材5の範囲内に収まるように照射し、光の漏れを防ぐことができる。さらに、計測装置1からの光が反射部材5の外縁近傍に照射されると、反射部材5で反射された光は反射部材5の中心からずれた位置を示すため、計測システム100は反射部材5の位置を適切に計測することが困難となる。ピッチを光の径および反射部材の径の少なくとも一方に基づいて設定することで、制御装置2は、反射部材5を適切に計測するよう計測装置1を制御できる。 The control parameters for controlling the measuring device 1 may include at least one of the interval (pitch) between adjacent light trajectories R on the surface PL, the maximum range over which the light is irradiated, and the angular range of the rotation axis around which the mirror 13 rotates. The pitch can also be referred to as the beam spacing. The control device 2 may set the pitch based on the diameter of the light, for example, so that the pitch value is less than the diameter of the reflecting member 5. The control device 2 may also set the control parameters for controlling the measuring device 1 based on the diameter of the reflecting member 5. Setting the pitch value less than the diameter of the reflecting member 5 can prevent a state in which the reflecting member 5 is positioned between two beams of light and therefore the light is not irradiated. For example, the control device 2 may set the pitch value less than the diameter of the reflecting member 5. The control device 2 may also set the control parameters for controlling the measuring device 1 based on the diameter of the light. Setting the pitch based on the diameter of the light allows the light to be irradiated so that it remains within the range of the reflecting member 5, preventing light leakage. Furthermore, when light from the measurement device 1 is irradiated near the outer edge of the reflecting member 5, the light reflected by the reflecting member 5 indicates a position that is offset from the center of the reflecting member 5, making it difficult for the measurement system 100 to properly measure the position of the reflecting member 5. By setting the pitch based on at least one of the diameter of the light and the diameter of the reflecting member, the control device 2 can control the measurement device 1 to properly measure the reflecting member 5.

 図11は、第1の計測処理のフローチャートである。計測システム100は、以下のフローチャートに従って、反射部材5を計測する第1の計測処理を実行してよい。 FIG. 11 is a flowchart of the first measurement process. The measurement system 100 may execute the first measurement process for measuring the reflective member 5 according to the following flowchart.

 まず、計測システム100の制御装置2は、第1反射部材51に関する初期情報(「第1初期情報」ともいう)を取得する(ステップS11)。制御装置2は、第1反射部材51、第2反射部材52、および第3反射部材53の相対位置に関する初期情報を取得してもよい。第1初期情報は、計測座標系において第1反射部材51が存在すると推定される位置の座標情報であってよい。制御装置2は、第1初期情報を、メモリ22から読み出すことにより取得する。また、制御装置2は、撮像装置3に反射部材5を含む領域を撮像されることにより得られる画像に基づいて、反射部材5に関する初期情報を取得してもよい。また、制御装置2は、計測システム100の外部と通信して反射部材5に関する初期情報を取得してもよい。 First, the control device 2 of the measurement system 100 acquires initial information (also referred to as "first initial information") regarding the first reflecting member 51 (step S11). The control device 2 may acquire initial information regarding the relative positions of the first reflecting member 51, the second reflecting member 52, and the third reflecting member 53. The first initial information may be coordinate information of the position where the first reflecting member 51 is estimated to be located in the measurement coordinate system. The control device 2 acquires the first initial information by reading it from the memory 22. The control device 2 may also acquire the initial information regarding the reflecting member 5 based on an image obtained by the imaging device 3 capturing an image of an area including the reflecting member 5. The control device 2 may also acquire the initial information regarding the reflecting member 5 by communicating with an external device outside the measurement system 100.

 続いて、制御装置2は、計測装置1に光を照射させる(ステップS12)。制御装置2は、第1反射部材51が存在すると推定される位置を含む範囲に光を照射するように、計測装置1からの光の照射方向を制御する。このとき、制御装置2は、第1反射部材51を探索するように、計測装置1からの光の照射方向を制御してよい。制御装置2は、第1反射部材51が存在すると推定される位置を、第1初期情報に基づき取得してもよい。制御装置2は、第1反射部材51が存在すると推定される位置を、撮像装置3の撮像結果に基づき取得してもよい。制御装置2は、計測装置1からの光の光路と交差する面における光の軌跡Rが所定のパターンを示すように、計測装置1からの光の照射方向を制御してよい。制御装置2は、計測装置1のミラー13が第1回転軸および第2回転軸の少なくとも一方の回転軸に従って所定の態様で回転するように制御することで、計測装置1からの光の照射方向を制御してよい。所定のパターンにおける光の軌跡Rは、渦巻形状のパターン、ラスターパターン、および非周期的なパターンのうちいずれかを示してよい。ステップS12における光の照射は、第1の走査の一例である。 Next, the control device 2 causes the measurement device 1 to emit light (step S12). The control device 2 controls the direction of light emitted from the measurement device 1 so that light is emitted to a range including the position where the first reflecting member 51 is estimated to be present. At this time, the control device 2 may control the direction of light emitted from the measurement device 1 so as to search for the first reflecting member 51. The control device 2 may acquire the position where the first reflecting member 51 is estimated to be present based on the first initial information. The control device 2 may acquire the position where the first reflecting member 51 is estimated to be present based on the imaging results of the imaging device 3. The control device 2 may control the direction of light emitted from the measurement device 1 so that the light trajectory R on a plane intersecting the optical path of the light from the measurement device 1 shows a predetermined pattern. The control device 2 may control the direction of light emitted from the measurement device 1 by controlling the mirror 13 of the measurement device 1 to rotate in a predetermined manner according to at least one of the first rotation axis and the second rotation axis. The light trajectory R in the predetermined pattern may be any of a spiral pattern, a raster pattern, and a non-periodic pattern. The light irradiation in step S12 is an example of a first scan.

 また、制御装置2は、第1反射部材51で反射された光の受光の結果に基づき、第1反射部材51の位置に関する情報を取得する(ステップS13)。まず、制御装置2は、計測装置1から、第1反射部材51で反射された光の受光の結果を取得する。第1反射部材51で反射された光の受光の結果は、例えば、計測装置1の受光素子14が出力する信号に含まれる情報であってよい。制御装置2は、受信した反射光の受光の結果に基づき、例えば干渉計測法に従って得られる第1反射部材5までの距離と、ミラー13により第1反射部材51に照射される照射光の角度とに基づいて、計測座標系における第1反射部材51の位置を求めることができる。第1反射部材51で反射された光の受光の結果に基づいて取得された第1反射部材51の位置に関する情報は、第1位置情報と言うこともできる。 The control device 2 also acquires information about the position of the first reflecting member 51 based on the results of receiving the light reflected by the first reflecting member 51 (step S13). First, the control device 2 acquires the results of receiving the light reflected by the first reflecting member 51 from the measurement device 1. The results of receiving the light reflected by the first reflecting member 51 may be, for example, information contained in a signal output by the light-receiving element 14 of the measurement device 1. Based on the results of receiving the received reflected light, the control device 2 can determine the position of the first reflecting member 51 in the measurement coordinate system, for example, based on the distance to the first reflecting member 5 obtained according to an interferometry method and the angle of the light irradiated onto the first reflecting member 51 by the mirror 13. The information about the position of the first reflecting member 51 acquired based on the results of receiving the light reflected by the first reflecting member 51 can also be referred to as first position information.

 そして、制御装置2は、第1初期情報と第1位置情報とに基づき、第2反射部材52に光が照射されるように計測装置1からの光の照射方向を制御する(ステップS14)。例えば、制御装置2は、第1初期情報に含まれる第1反射部材51の位置と受光の結果に基づく第1反射部材51の位置との差分を計算する。そして、この差分に従って、メモリ22に記憶された第2反射部材52の位置に関する初期情報(「第2初期情報」ともいう)を補正し、補正された位置に第2反射部材52が存在すると推定する。また、制御装置2は、第2反射部材52が存在する位置を推定しなくてもよい。この場合、制御装置2は、第1初期情報と第1位置情報とに基づき、第2反射部材52に光が照射されるように光を照射するための照射範囲を設定してもよい。制御装置2は、第1初期情報と第1位置情報とに基づいて、第1初期情報に対応する位置から第1反射部材51の位置に平行移動させるための並進情報を取得し、この並進情報に基づいて、第2反射部材52を探索するように計測装置1からの光の照射方向を制御してもよい。また、制御装置2は、第1初期情報と第1位置情報とに基づき、第2反射部材52に光が照射されるように軌跡が所定のパターンを示す光の照射の開始位置を設定してもよい。制御装置2は、第2反射部材52が存在すると推定される位置を、撮像装置3の撮像結果に基づき取得してもよい。ステップS14における光の照射は、第2の走査の一例である。 Then, based on the first initial information and the first position information, the control device 2 controls the direction of light irradiation from the measurement device 1 so that light is irradiated onto the second reflecting member 52 (step S14). For example, the control device 2 calculates the difference between the position of the first reflecting member 51 included in the first initial information and the position of the first reflecting member 51 based on the light reception results. Then, according to this difference, the control device 2 corrects the initial information regarding the position of the second reflecting member 52 (also referred to as "second initial information") stored in memory 22 and estimates that the second reflecting member 52 is located at the corrected position. Furthermore, the control device 2 does not need to estimate the position where the second reflecting member 52 is located. In this case, the control device 2 may set an irradiation range for irradiating light so that light is irradiated onto the second reflecting member 52 based on the first initial information and the first position information. Based on the first initial information and the first position information, the control device 2 may acquire translation information for translating from a position corresponding to the first initial information to the position of the first reflecting member 51, and may control the direction of light irradiation from the measurement device 1 to search for the second reflecting member 52 based on this translation information. Furthermore, based on the first initial information and the first position information, the control device 2 may set a start position for irradiating light whose trajectory shows a predetermined pattern so that light is irradiated onto the second reflecting member 52. The control device 2 may acquire the estimated position where the second reflecting member 52 is located based on the imaging results of the imaging device 3. The light irradiation in step S14 is an example of a second scan.

 制御装置2は、第2反射部材52に光が照射されるように、計測装置1からの光の照射方向を制御する。このとき、制御装置2は、第2反射部材52を探索するように、計測装置1からの光の照射方向を制御してよい。制御装置2は、計測装置1からの光の光路と交差する面における光の軌跡Rが第1パターンを示すように、計測装置1からの光の照射方向を制御してよい。制御装置2は、計測装置1のミラー13が第1回転軸および第2回転軸の少なくとも一方の回転軸に従って第1態様で回転するように制御することで、計測装置1からの光の照射方向を制御してよい。第1パターンにおける光の軌跡Rは、渦巻形状のパターン、ラスターパターン、および非周期的なパターンのうちいずれかを示してよい。 The control device 2 controls the direction of light emitted from the measurement device 1 so that the light is emitted onto the second reflecting member 52. At this time, the control device 2 may control the direction of light emitted from the measurement device 1 so as to search for the second reflecting member 52. The control device 2 may control the direction of light emitted from the measurement device 1 so that the trajectory R of light on a plane intersecting the optical path of the light from the measurement device 1 shows a first pattern. The control device 2 may control the direction of light emitted from the measurement device 1 by controlling the mirror 13 of the measurement device 1 to rotate in a first manner along at least one of the first and second rotation axes. The trajectory R of light in the first pattern may show any one of a spiral pattern, a raster pattern, and a non-periodic pattern.

 制御装置2は、計測装置1からの光の光路と交差する面における光の軌跡Rが第1パターンを示すように計測装置1からの光の照射方向を制御した後、さらに、計測装置1からの光の光路と交差する面における光の軌跡Rが第2パターンを示すように計測装置1からの光の照射方向を制御してもよい。制御装置2は、軌跡Rが第1パターンを示し第2反射部材52で反射された光の受光の結果を取得し、この受光の結果に基づいて、光の軌跡Rが第2パターンを示すように計測装置1からの光の照射方向を制御してもよい。軌跡Rが第1パターンを示し第2反射部材52で反射された光の受光の結果に基づいて取得される第2反射部材52の位置に関する情報は、第2反射部材52の暫定位置情報とも呼ぶことができる。制御装置2は、第2パターンとして、同一の面で比較したときに、第1パターンよりもピッチの狭いパターン、または第1パターンよりも照射範囲の狭いパターンを設定してよい。第2パターンは、第1パターンよりも高精度なパターンであるとも言える。つまり、制御装置2は、第2反射部材52に対するラフスキャンの結果に基づいて、第2反射部材に対してファインスキャンを行ってよい。制御装置2は、第1パターンを示すよう照射された光であって第2反射部材52で反射された光を受光した場合、第1パターンを示す光の照射を途中で中止し、第2パターンを示す光の照射を開始してもよい。 The control device 2 may control the direction of light irradiation from the measurement device 1 so that the light trajectory R on a plane intersecting with the optical path of the light from the measurement device 1 shows a first pattern, and then further control the direction of light irradiation from the measurement device 1 so that the light trajectory R on a plane intersecting with the optical path of the light from the measurement device 1 shows a second pattern. The control device 2 may obtain the result of receiving light reflected by the second reflecting member 52, with the trajectory R showing the first pattern, and control the direction of light irradiation from the measurement device 1 so that the light trajectory R shows the second pattern based on this light reception result. Information regarding the position of the second reflecting member 52 obtained based on the result of receiving light reflected by the second reflecting member 52, with the trajectory R showing the first pattern, may also be referred to as temporary position information of the second reflecting member 52. The control device 2 may set, as the second pattern, a pattern with a narrower pitch than the first pattern or a narrower irradiation range than the first pattern when compared on the same plane. The second pattern can also be said to be a pattern with higher precision than the first pattern. In other words, the control device 2 may perform a fine scan of the second reflecting member 52 based on the results of the rough scan of the second reflecting member 52. When the control device 2 receives light that was irradiated to represent the first pattern and reflected by the second reflecting member 52, it may stop irradiating the light that represents the first pattern midway and start irradiating the light that represents the second pattern.

 制御装置2は、第2反射部材52で反射された光の受光の結果に基づき、第2反射部材52の位置に関する情報を取得し(ステップS15)、計測処理を終了する。第2反射部材52で反射された光の受光の結果に基づく第2反射部材52の位置に関する情報の取得は、ステップS13で説明した第1反射部材51で反射された光の受光の結果に基づく第1反射部材51の位置に関する情報の取得と同様のため、詳細な説明を省略する。第2反射部材52で反射された光の受光の結果に基づいて取得された第2反射部材52の位置に関する情報は、第2位置情報と言うことができる。また、軌跡Rが第1パターンを示し第2反射部材52で反射された光の受光の結果に基づいて取得される第2反射部材52の位置に関する情報を第2反射部材52の暫定位置情報と呼ぶことに対応して、軌跡Rが第2パターンを示し第2反射部材52で反射された光の受光の結果に基づいて取得される第2反射部材52の位置に関する情報を第2反射部材52の確定位置情報と呼ぶことができる。制御装置2は、第2反射部材52の暫定位置情報に基づき、第2パターンを示すように光の照射方向を制御してもよい。 The control device 2 acquires information regarding the position of the second reflecting member 52 based on the results of receiving light reflected by the second reflecting member 52 (step S15), and terminates the measurement process. Acquiring information regarding the position of the second reflecting member 52 based on the results of receiving light reflected by the second reflecting member 52 is similar to acquiring information regarding the position of the first reflecting member 51 based on the results of receiving light reflected by the first reflecting member 51, as described in step S13, and therefore will not be described in detail again. Information regarding the position of the second reflecting member 52 acquired based on the results of receiving light reflected by the second reflecting member 52 can be referred to as second position information. Furthermore, information regarding the position of the second reflecting member 52 acquired based on the results of receiving light reflected by the second reflecting member 52, where the trajectory R indicates a first pattern, can be referred to as provisional position information of the second reflecting member 52. Similarly, information regarding the position of the second reflecting member 52 acquired based on the results of receiving light reflected by the second reflecting member 52, where the trajectory R indicates a second pattern, can be referred to as final position information of the second reflecting member 52. The control device 2 may control the direction of light irradiation to show the second pattern based on the temporary position information of the second reflecting member 52.

 第1の計測処理は、ステップS15と処理の終了との間に、制御装置2が、第2反射部材52より後に計測される第3反射部材53に光が照射されるように、計測装置1からの光の照射方向を制御し、第3反射部材53で反射された光の受光の結果に基づき、第3反射部材53の位置に関する位置情報を取得するステップをさらに有してもよい。 The first measurement process may further include, between step S15 and the end of the process, a step in which the control device 2 controls the direction of light irradiation from the measurement device 1 so that light is irradiated onto the third reflecting member 53, which is measured after the second reflecting member 52, and acquires position information regarding the position of the third reflecting member 53 based on the result of receiving the light reflected by the third reflecting member 53.

 制御装置2は、第3反射部材53を探索するように計測装置1からの光の照射方向を制御してよい。制御装置2は、第1位置情報と第2位置情報とに基づいて、計測装置1からの光の照射方向を制御してよい。制御装置2は、第1初期情報と、第2初期情報と、にさらに基づき、計測装置1からの光の照射方向を制御してよい。制御装置2は、第1初期情報と、第2初期情報と、第1位置情報と、第2位置情報と、に基づき、第1初期情報に対応する位置および第2初期情報に対応する位置を、それぞれ、第1位置情報に対応する位置および第2位置情報に対応する位置に回転移動させるための回転情報を取得し、この回転情報に基づいて、第3反射部材53を探索するように計測装置1からの光の照射方向を制御してもよい。制御装置2は、第1反射部材51と第2反射部材52との相対位置関係に関する初期情報と、第1位置情報と第2位置情報との相対位置関係に関する位置情報とに基づき、第3反射部材53の初期情報に対する回転情報を計算し、計測装置1からの光の照射方向を制御してもよい。また、反射部材5が取り付けられた可動体4の位置または姿勢に関する情報に基づいて、反射部材5に関する初期情報に対する回転情報を計算してもよい。 The control device 2 may control the direction of light emitted from the measurement device 1 so as to search for the third reflecting member 53. The control device 2 may control the direction of light emitted from the measurement device 1 based on the first position information and the second position information. The control device 2 may control the direction of light emitted from the measurement device 1 further based on the first initial information and the second initial information. Based on the first initial information, the second initial information, the first position information, and the second position information, the control device 2 may acquire rotation information for rotating and moving the positions corresponding to the first initial information and the second initial information to positions corresponding to the first position information and the second position information, respectively, and may control the direction of light emitted from the measurement device 1 so as to search for the third reflecting member 53 based on this rotation information. The control device 2 may calculate rotation information relative to the initial information for the third reflecting member 53 based on initial information regarding the relative positional relationship between the first reflecting member 51 and the second reflecting member 52 and position information regarding the relative positional relationship between the first position information and the second position information, and control the direction of light irradiation from the measurement device 1. The control device 2 may also calculate rotation information relative to the initial information for the reflecting member 5 based on information regarding the position or posture of the movable body 4 to which the reflecting member 5 is attached.

 制御装置2は、第1反射部材51への光の照射において、軌跡Rが第1パターンを示し第1反射部材51で反射された光の受光の結果を取得し、この受光の結果に基づいて、光の軌跡Rが第2パターンを示すように計測装置1からの光の照射方向を制御してもよい。制御装置2は、第1反射部材51に対するラフスキャンの結果に基づいて、第2反射部材52に対してファインスキャンを行ってもよい。 When irradiating light onto the first reflecting member 51, the control device 2 may obtain the results of receiving light reflected by the first reflecting member 51, with the trajectory R showing a first pattern, and, based on this light reception result, control the direction of light irradiation from the measurement device 1 so that the light trajectory R shows a second pattern. The control device 2 may also perform a fine scan of the second reflecting member 52 based on the results of the rough scan of the first reflecting member 51.

 制御装置2は、第2反射部材52の探索において、第2反射部材52に対してラフスキャンおよびファインスキャンの少なくとも一方を行ってもよい。 When searching for the second reflecting member 52, the control device 2 may perform at least one of a rough scan and a fine scan on the second reflecting member 52.

 制御装置2は、第3反射部材53の探索において、ラフスキャンおよびファインスキャンのいずれも行わずに第3反射部材53で反射された光の受光の結果に基づいて第3反射部材53の位置に関する情報を取得してもよい。 When searching for the third reflecting member 53, the control device 2 may obtain information regarding the position of the third reflecting member 53 based on the results of receiving light reflected by the third reflecting member 53, without performing either a rough scan or a fine scan.

 このように第1の計測処理を実行することにより、計測システム100は、反射部材5の位置を効率的に計測することができる。 By performing the first measurement process in this manner, the measurement system 100 can efficiently measure the position of the reflecting member 5.

 図12は、第2の計測処理のフローチャートである。計測システム100は、以下のフローチャートに従って、反射部材5を計測する第2の計測処理を実行してよい。 FIG. 12 is a flowchart of the second measurement process. The measurement system 100 may execute the second measurement process for measuring the reflective member 5 according to the following flowchart.

 まず、計測システム100の制御装置2は、計測装置1からの光の光路と交差する面PLにおける光の軌跡Rが第1パターンを示すように光の照射方向を制御する(ステップS21)。制御装置2は、面PLにおいて軌跡Rが第1パターンを示す光が、第1反射部材51と第2反射部材52とを含む範囲に照射されるように光の照射方向を制御してよい。面PLにおいて軌跡Rが第1パターンを示す光の照射範囲に、2以上の反射部材5が含まれていてもよい。第1パターンにおける光の軌跡Rは、渦巻形状のパターン、ラスターパターン、および非周期的なパターンのうちいずれかを示してよい。制御装置2は、計測装置1から照射される光の光路上に反射部材5が存在すると推定される位置を含むように、面PLにおける光の軌跡が第1パターンを示す光の照射方向を制御してよい。つまり、制御装置2は、面PLにおいて第1パターンを示す光の軌跡のいずれかの位置に照射される光の光路上に反射部材5が存在すると推定される位置が含まれるように、光の照射方向を制御する。ステップS21における光の照射は、第1の走査の他の一例である。 First, the control device 2 of the measurement system 100 controls the direction of light irradiation so that the light trajectory R on the surface PL intersects with the optical path of the light from the measurement device 1 shows a first pattern (step S21). The control device 2 may control the direction of light irradiation so that the light whose trajectory R shows the first pattern on the surface PL is irradiated to a range including the first reflecting member 51 and the second reflecting member 52. Two or more reflecting members 5 may be included in the irradiation range of the light whose trajectory R shows the first pattern on the surface PL. The light trajectory R in the first pattern may show any of a spiral pattern, a raster pattern, and a non-periodic pattern. The control device 2 may control the direction of light irradiation so that the position where the reflective member 5 is estimated to be present on the optical path of the light irradiated from the measurement device 1 includes the position where the reflective member 5 is estimated to be present on the optical path of the light irradiated to any position of the light trajectory showing the first pattern on the surface PL. In other words, the control device 2 controls the direction of light irradiation so that the position where the reflective member 5 is estimated to be present is included on the optical path of the light irradiated to any position of the light trajectory showing the first pattern on the surface PL. The light irradiation in step S21 is another example of the first scan.

 次に、制御装置2は、面PLにおける光の軌跡Rが第1パターンと異なる第2パターンを示すように光の照射方向を制御する(ステップS22)。制御装置2は、面PLにおいて軌跡Rが第2パターンを示す光が、第1反射部材51を含む範囲に照射されるように光の照射方向を制御してよい。第2パターンにおける光の軌跡Rは、渦巻形状のパターン、ラスターパターン、および非周期的なパターンのうちいずれかを示してよい。制御装置2は、軌跡Rが第1パターンを示し反射部材5で反射された光が受光された後に、軌跡Rが第2パターンを示すように光の照射方向を制御してよい。このとき、制御装置2は、軌跡Rが第1パターンを示し反射部材5で反射された光の受光の結果に基づいて光の照射方向を制御してよい。ステップS22における光の照射は、第2の走査の他の一例である。 Next, the control device 2 controls the direction of light irradiation so that the light trajectory R on the surface PL indicates a second pattern different from the first pattern (step S22). The control device 2 may control the direction of light irradiation so that light on the surface PL, whose trajectory R indicates the second pattern, is irradiated onto an area including the first reflecting member 51. The light trajectory R in the second pattern may indicate any one of a spiral pattern, a raster pattern, and a non-periodic pattern. After the control device 2 receives the light whose trajectory R indicates the first pattern and is reflected by the reflecting member 5, the control device 2 may control the direction of light irradiation so that the trajectory R indicates the second pattern. In this case, the control device 2 may control the direction of light irradiation based on the result of receiving the light whose trajectory R indicates the first pattern and is reflected by the reflecting member 5. The light irradiation in step S22 is another example of a second scan.

 制御装置2は、反射部材5で反射された光を受光し、受光の結果に基づいて反射部材5の位置に関する情報を取得し(ステップS23)、計測処理を終了する。例えば、制御装置2は、軌跡Rが第2パターンを示し反射部材5で反射された光の受光の結果に基づいて、反射部材5の位置に関する情報を取得する。面PLにおいて軌跡Rが第1パターンを示す光が、第1反射部材51と第2反射部材52とを含む範囲に照射されるように光の照射方向を制御され、軌跡Rが第2パターンを示す光が、第1反射部材51とを含む範囲に照射されるように光の照射方向を制御される場合、制御装置2は、第2反射部材52で反射された、軌跡Rが第1パターンを示す光の受光の結果と、第1反射部材51で反射された、軌跡Rが第2パターンを示す光の受光の結果とに基づいて、第2反射部材52の位置に関する情報を取得してよい。 The control device 2 receives the light reflected by the reflective member 5, acquires information about the position of the reflective member 5 based on the light reception results (step S23), and terminates the measurement process. For example, the control device 2 acquires information about the position of the reflective member 5 based on the light reception results of light whose trajectory R indicates the second pattern and is reflected by the reflective member 5. If the light irradiation direction on the surface PL is controlled so that light whose trajectory R indicates the first pattern is irradiated onto a range including the first reflective member 51 and the second reflective member 52, and the light irradiation direction is controlled so that light whose trajectory R indicates the second pattern is irradiated onto a range including the first reflective member 51, the control device 2 may acquire information about the position of the second reflective member 52 based on the light reception results of light whose trajectory R indicates the first pattern and is reflected by the first reflective member 51, and the light reception results of light whose trajectory R indicates the second pattern and is reflected by the first reflective member 51.

 第2の計測処理は、ステップS23と処理の終了との間に、面PLにおける光の軌跡Rが第1パターンと異なる第3パターンを示すように光の照射方向を制御し、第3反射部材53で反射された光の受光の結果に基づき、第3反射部材53の位置に関する位置情報を取得するステップをさらに有してもよい。このとき、制御装置2は、面PLにおいて軌跡Rが第1パターンを示す光が第1反射部材51と第2反射部材52とを含む範囲に照射され、軌跡Rが第2パターンを示す光が第1反射部材51を含む範囲に照射され、軌跡Rが第3パターンを示す光が第2反射部材を含む範囲に照射されるように光の照射方向を制御してよい。第3パターンは、第2パターンと同じパターンであってもよい。ここで、パターンについて、同じ/異なるとは、同一の面PLにおける軌跡Rが同一であるか否かに対応する。同一の面PLにおける軌跡Rが相似となるパターンは、互いに異なるパターンである。このステップによると、制御装置2は、複数の反射部材が存在する範囲を軌跡Rが第1パターンを示す光によって照射(ラフスキャン)し、各反射部材で反射された光の受光の結果に基づいて、各反射部材が存在すると推定される範囲を軌跡Rが第2パターンまたは第3パターンを示す光によって照射(ファインスキャン)するよう計測装置1を制御する。このように制御することで、制御装置2は、ラフスキャンにより各反射部材の暫定位置情報を取得し、暫定位置情報に基づいてファインスキャンを行い、各反射部材の確定位置情報を効率的に取得することができる。 The second measurement process may further include, between step S23 and the end of the process, a step of controlling the direction of light irradiation so that the light trajectory R on the surface PL indicates a third pattern different from the first pattern, and acquiring position information regarding the position of the third reflecting member 53 based on the result of receiving the light reflected by the third reflecting member 53. In this case, the control device 2 may control the direction of light irradiation so that light whose trajectory R indicates the first pattern is irradiated onto an area on the surface PL including the first reflecting member 51 and the second reflecting member 52, light whose trajectory R indicates the second pattern is irradiated onto an area including the first reflecting member 51, and light whose trajectory R indicates the third pattern is irradiated onto an area including the second reflecting member. The third pattern may be the same as the second pattern. Here, with regard to patterns, "same"/"different" corresponds to whether the trajectories R on the same surface PL are the same. Patterns whose trajectories R on the same surface PL are similar are mutually different patterns. In this step, the control device 2 controls the measurement device 1 to irradiate the area where multiple reflective members are present with light whose trajectory R indicates the first pattern (rough scan), and then, based on the results of receiving the light reflected by each reflective member, to irradiate the area where each reflective member is estimated to be present with light whose trajectory R indicates the second or third pattern (fine scan). By controlling in this manner, the control device 2 can obtain provisional position information for each reflective member through a rough scan, and then perform a fine scan based on the provisional position information, thereby efficiently obtaining definitive position information for each reflective member.

 なお、ラフスキャンおよびファインスキャンの対象および範囲は上記の例に限定されない。ファインスキャンの対象は、ラフスキャンの対象と同じかより少ないことが好ましい。例えば、制御装置2は、一つの反射部材を対象としてラフスキャンを行った後で、その反射部材5を対象としてファインスキャンを行うよう計測装置1を制御してよい。また、制御装置2は、複数の反射部材5を対象としてラフスキャンを行った後で、複数の反射部材5の少なくとも一部を対象としてファインスキャンを行うよう計測装置1を制御してよい。また、ファインスキャンを行う対象となる反射部材5は、ラフスキャンの対象とされた反射部材5でなくてもよい。ラフスキャンの対象とされた反射部材5の暫定位置情報に基づいて、ファインスキャンを行う対象となる反射部材5の位置を推定することにより、制御装置2は、対象とする反射部材5に対して効率的にファインスキャンを行うことができる。すなわち、制御装置2は、反射部材5の位置に関する情報を、その反射部材5に対するファインスキャンおよびラフスキャンによって取得してもよく、その反射部材5に対するファインスキャンによって取得してもよく、その反射部材5に対するファインスキャンおよびラフスキャンのいずれにもよらず(他の反射部材5に対するファインスキャンまたはラフスキャンの結果に基づいて)取得してもよい。 Note that the targets and ranges of the rough scan and fine scan are not limited to the above examples. It is preferable that the number of targets for the fine scan be the same or fewer than the number of targets for the rough scan. For example, the control device 2 may perform a rough scan on one reflective member 5, and then control the measuring device 1 to perform a fine scan on that reflective member 5. Furthermore, the control device 2 may perform a rough scan on multiple reflective members 5, and then control the measuring device 1 to perform a fine scan on at least some of the multiple reflective members 5. The reflective members 5 to be fine-scanned do not have to be the reflective members 5 that were the target of the rough scan. By estimating the position of the reflective member 5 to be fine-scanned based on the provisional position information of the reflective member 5 that was the target of the rough scan, the control device 2 can efficiently perform a fine scan on the target reflective member 5. In other words, the control device 2 may obtain information regarding the position of the reflective member 5 by fine scanning and rough scanning that reflective member 5, or by fine scanning that reflective member 5, or may obtain information regardless of either fine scanning or rough scanning that reflective member 5 (based on the results of fine scanning or rough scanning of other reflective members 5).

 また、ファインスキャンの範囲は、ラフスキャンの範囲と同じかより狭いことが好ましい。例えば、制御装置2は、ラフスキャンの範囲と同じ範囲に対しファインスキャンを行うよう計測装置1を制御してよい。また、制御装置2は、ラフスキャンを行った範囲に含まれる範囲に対しファインスキャンを行うよう計測装置1を制御してよい。また、ファインスキャンの範囲は、ラフスキャンの範囲に含まれていなくてもよい。ラフスキャンの範囲に含まれる反射部材5の位置情報に基づいて、ファインスキャンの範囲に存在する反射部材5の位置を推定することにより、制御装置2は、対象とする反射部材5に対して効率的にファインスキャンを行うことができる。 Furthermore, it is preferable that the fine scan range is the same as or narrower than the rough scan range. For example, the control device 2 may control the measuring device 1 to perform a fine scan over the same range as the rough scan range. Alternatively, the control device 2 may control the measuring device 1 to perform a fine scan over a range included in the range where the rough scan was performed. Furthermore, the fine scan range does not have to be included in the rough scan range. By estimating the position of the reflective members 5 present within the fine scan range based on position information of the reflective members 5 included in the rough scan range, the control device 2 can efficiently perform a fine scan on the target reflective members 5.

 このように第2の計測処理を実行することにより、計測システム100は、反射部材5の位置を効率的に計測することができる。 By performing the second measurement process in this manner, the measurement system 100 can efficiently measure the position of the reflecting member 5.

 図13は、第3の計測処理のフローチャートである。計測システム100は、以下のフローチャートに従って、反射部材5を計測する第3の計測処理を実行してよい。 Figure 13 is a flowchart of the third measurement process. The measurement system 100 may execute the third measurement process for measuring the reflective member 5 according to the following flowchart.

 まず、計測システム100の制御装置2は、計測装置1が有する照射装置を第1態様で回転させて光を照射するよう計測装置1を制御する(ステップS31)。制御装置2は、照射装置を第1態様で回転させて照射される光が、第1反射部材51と第2反射部材52とを含む範囲に照射されるように計測装置1を制御してよい。制御装置2が照射装置を第1態様で回転させるよう計測装置1を制御することにより、照射装置は、第1回転軸および第1回転軸と交差する第2回転軸の少なくとも一方の回転軸に従って回転する。その結果、計測装置1からの光の光路と交差する面PLにおける光の軌跡Rは第1パターンを示す。第1パターンにおける光の軌跡Rは、渦巻形状のパターン、ラスターパターン、および非周期的なパターンのうちいずれかを示してよい。制御装置2は、計測装置1から照射される光の光路上に反射部材5が存在すると推定される位置を含むように、照射装置を第1態様で回転させて光を照射するよう計測装置1を制御してよい。つまり、制御装置2は、面PLにおいて第1パターンを示す光の軌跡のいずれかの位置に照射される光の光路上に反射部材5が存在すると推定される位置が含まれるように、照射装置の回転の態様を計測装置に制御させる。ステップS31における光の照射は、第1の走査の他の一例である。 First, the control device 2 of the measurement system 100 controls the measurement device 1 to rotate the irradiation device of the measurement device 1 in a first manner to irradiate light (step S31). The control device 2 may control the measurement device 1 so that the light irradiated by rotating the irradiation device in the first manner is irradiated onto a range including the first reflecting member 51 and the second reflecting member 52. When the control device 2 controls the measurement device 1 to rotate the irradiation device in the first manner, the irradiation device rotates along at least one of the first rotation axis and the second rotation axis intersecting the first rotation axis. As a result, the light trajectory R on the plane PL intersecting the optical path of the light from the measurement device 1 exhibits a first pattern. The light trajectory R in the first pattern may exhibit any one of a spiral pattern, a raster pattern, and a non-periodic pattern. The control device 2 may control the measurement device 1 to rotate the irradiation device in the first manner to irradiate light so that the optical path of the light irradiated from the measurement device 1 includes a position where the reflecting member 5 is estimated to be present. In other words, the control device 2 controls the rotation of the irradiation device by the measurement device so that a position where the reflective member 5 is estimated to be present is included on the optical path of the light irradiated at any position on the trajectory of light representing the first pattern on the surface PL. The irradiation of light in step S31 is another example of a first scan.

 次に、制御装置2は、照射装置を第1態様と異なる第2態様で回転させて光を照射するよう計測装置1を制御する(ステップS32)。制御装置2は、照射装置を第2態様で回転させて照射される光が、第1反射部材51を含む範囲に照射されるように計測装置1を制御してよい。制御装置2が照射装置を第2態様で回転させるよう計測装置1を制御することにより、照射装置は、第1回転軸および第1回転軸と交差する第2回転軸の少なくとも一方の回転軸に従って回転する。その結果、計測装置1からの光の光路と交差する面PLにおける光の軌跡Rは第1パターンと異なる第2パターンを示す。第2パターンにおける光の軌跡Rは、渦巻形状のパターン、ラスターパターン、および非周期的なパターンのうちいずれかを示してよい。制御装置2は、照射装置を第1態様で回転させて照射され反射部材5で反射された光が受光された後に、照射装置を第2態様で回転させるよう計測装置1を制御してよい。このとき、制御装置2は、照射装置を第1態様で回転させて照射され反射部材5で反射された光の受光の結果に基づいて、計測装置1に照射装置の回転の態様を制御させてよい。ステップS32における光の照射は、第2の走査の他の一例である。 Next, the control device 2 controls the measurement device 1 to rotate the irradiation device in a second mode different from the first mode and irradiate light (step S32). The control device 2 may control the measurement device 1 so that the light irradiated by rotating the irradiation device in the second mode is irradiated onto a range including the first reflecting member 51. By the control device 2 controlling the measurement device 1 to rotate the irradiation device in the second mode, the irradiation device rotates along at least one of the first rotation axis and a second rotation axis intersecting the first rotation axis. As a result, the light trajectory R on the plane PL intersecting the optical path of the light from the measurement device 1 exhibits a second pattern different from the first pattern. The light trajectory R in the second pattern may exhibit any one of a spiral pattern, a raster pattern, and a non-periodic pattern. The control device 2 may control the measurement device 1 to rotate the irradiation device in the second mode after receiving the light irradiated by rotating the irradiation device in the first mode and reflected by the reflecting member 5. At this time, the control device 2 may cause the measurement device 1 to control the rotational mode of the irradiation device based on the results of receiving light that is irradiated by rotating the irradiation device in the first mode and reflected by the reflecting member 5. The light irradiation in step S32 is another example of the second scan.

 制御装置2は、反射部材5で反射された光を受光し、受光の結果に基づいて反射部材5の位置に関する情報を取得し(ステップS33)、計測処理を終了する。例えば、制御装置2は、照射装置を第2態様で回転させて照射され反射部材5で反射された光の受光の結果に基づいて、反射部材5の位置に関する情報を取得する。照射装置を第1態様で回転させて照射される光が、第1反射部材51と第2反射部材52とを含む範囲に照射されるように光の照射方向を制御され、照射装置を第2態様で回転させて照射される光が、第1反射部材51とを含む範囲に照射されるように光の照射方向を制御される場合、制御装置2は、第2反射部材52で反射された、照射装置を第1態様で回転させて照射される光の受光の結果と、第1反射部材51で反射された、照射装置を第2態様で回転させて照射される光の受光の結果とに基づいて、第2反射部材52の位置に関する情報を取得してよい。 The control device 2 receives the light reflected by the reflecting member 5 and acquires information about the position of the reflecting member 5 based on the light reception results (step S33), completing the measurement process. For example, the control device 2 acquires information about the position of the reflecting member 5 based on the light reception results of the light irradiated by rotating the irradiation device in the second mode and reflected by the reflecting member 5. If the light irradiation direction is controlled so that the light irradiated by rotating the irradiation device in the first mode is irradiated onto a range including the first reflecting member 51 and the second reflecting member 52, and the light irradiation direction is controlled so that the light irradiated by rotating the irradiation device in the second mode is irradiated onto a range including the first reflecting member 51, the control device 2 may acquire information about the position of the second reflecting member 52 based on the light reception results of the light irradiated by rotating the irradiation device in the first mode and reflected by the second reflecting member 52, and the light reception results of the light irradiated by rotating the irradiation device in the second mode and reflected by the first reflecting member 51.

 第3の計測処理は、ステップS33と処理の終了との間に、照射装置を第1態様と異なる第3態様で回転させて光を照射するよう計測装置1を制御し、照射装置を第3態様で回転させて照射され反射部材5で反射された光の受光の結果に基づき、第3反射部材53の位置に関する位置情報を取得するステップをさらに有してもよい。このとき、制御装置2は、照射装置を第1態様で回転させて照射される光が第1反射部材51と第2反射部材52とを含む範囲に照射され、照射装置を第1態様で回転させて照射される光が第1反射部材51を含む範囲に照射され、照射装置を第1態様で回転させて照射される光が第2反射部材を含む範囲に照射されるように光の照射方向を制御してよい。第3態様は、第2態様と同じ態様であってもよい。このステップによると、制御装置2は、複数の反射部材が存在する範囲を、照射装置を第1態様で回転させて照射(ラフスキャン)し、各反射部材で反射された光の受光の結果に基づいて、各反射部材が存在すると推定される範囲を、照射装置を第2態様または第3態様で回転させて照射(ファインスキャン)するよう計測装置1を制御する。このように制御することで、制御装置2は、ラフスキャンにより各反射部材の暫定位置情報を取得し、暫定位置情報に基づいてファインスキャンし、各反射部材の確定位置情報を効率的に取得することができる。
The third measurement process may further include, between step S33 and the end of the process, a step of controlling the measurement device 1 to rotate the irradiation device in a third state different from the first state and irradiate light, and acquiring position information regarding the position of the third reflecting member 53 based on the result of receiving light irradiated by rotating the irradiation device in the third state and reflected by the reflecting member 5. In this case, the control device 2 may control the irradiation direction of light so that the light irradiated by rotating the irradiation device in the first state is irradiated onto a range including the first reflecting member 51 and the second reflecting member 52, the light irradiated by rotating the irradiation device in the first state is irradiated onto a range including the first reflecting member 51, and the light irradiated by rotating the irradiation device in the first state is irradiated onto a range including the second reflecting member. The third state may be the same as the second state. According to this step, the control device 2 controls the measurement device 1 to rotate the irradiation device in a first mode to irradiate an area where a plurality of reflective members are present (rough scan), and then, based on the results of receiving light reflected by each reflective member, to rotate the irradiation device in a second or third mode to irradiate an area where each reflective member is estimated to be present (fine scan). By controlling in this manner, the control device 2 can acquire provisional position information of each reflective member by rough scanning, and then perform a fine scan based on the provisional position information, thereby efficiently acquiring definitive position information of each reflective member.

 このように第3の計測処理を実行することにより、計測システム100は、反射部材5の位置を効率的に計測することができる。 By performing the third measurement process in this manner, the measurement system 100 can efficiently measure the position of the reflecting member 5.

 制御装置2は、取得した反射部材5の位置に関する情報に基づいて可動体4を制御することができる。制御装置2は、例えば、可動体4の位置および姿勢の少なくとも一方を制御してよい。したがって、計測システム100は、取得した反射部材5の位置に関する情報に基づいて可動体4を制御する制御システムと言うこともできる。 The control device 2 can control the movable body 4 based on the acquired information about the position of the reflecting member 5. The control device 2 may, for example, control at least one of the position and orientation of the movable body 4. Therefore, the measurement system 100 can also be said to be a control system that controls the movable body 4 based on the acquired information about the position of the reflecting member 5.

 以上説明した実施形態に関し、さらに以下の付記を開示する。 The following additional notes are provided regarding the embodiment described above.

[付記1]
 対象物に設けられた、入射光を入射方向と逆向きに反射する複数の反射部材のうち少なくとも二つの反射部材のそれぞれについて第1の走査を行い、前記第1の走査の結果に基づいて、前記第1の走査と異なる第2の走査を行うことで、当該反射部材の位置を計測する計測装置。
[Appendix 1]
A measuring device that measures the positions of at least two reflective members out of a plurality of reflective members provided on an object that reflect incident light in a direction opposite to the incident direction, by performing a first scan on each of the reflective members, and then performing a second scan different from the first scan based on the results of the first scan.

[付記2]
 前記第1の走査は、当該反射部材に対応する第1の範囲に対する第1の形状をなす軌道に沿った第1の間隔による走査であり、前記第2の走査は、当該反射部材に対応する第2の範囲に対する第2の形状をなす軌道をなす軌道に沿った第2の間隔による走査であり、前記第1の範囲および前記第2の範囲、前記第1の形状および前記第2の形状、前記第1の間隔および前記第2の間隔の少なくとも一つは相違する付記1に記載の計測装置。
[Appendix 2]
The measuring device described in Appendix 1, wherein the first scan is a scan at a first interval along a trajectory having a first shape for a first range corresponding to the reflective member, and the second scan is a scan at a second interval along a trajectory having a second shape for a second range corresponding to the reflective member, and at least one of the first range and the second range, the first shape and the second shape, and the first interval and the second interval is different.

[付記3]
 前記第2の範囲は前記第1の範囲より小さい付記2に記載の計測装置。
[Appendix 3]
3. The measurement device of claim 2, wherein the second range is smaller than the first range.

[付記4]
 前記第2の形状は前記第1の形状と異なる付記2また3に記載の計測装置。
[Appendix 4]
4. The measurement device of claim 2 or 3, wherein the second shape is different from the first shape.

[付記5]
 前記第2の間隔は前記第1の間隔より小さい付記2-4のいずれか一つに記載の計測装置。
[Appendix 5]
5. The measuring device of claim 2, wherein the second distance is smaller than the first distance.

[付記6]
 光を所定の照射方向に射出し、前記光により照射された物体で反射された光を受光可能な計測装置と、
 少なくとも一つのプロセッサと、
 コンピュータプログラムコードが格納された少なくとも一つのメモリと、を備え、
 前記少なくとも一つのプロセッサは、前記コンピュータプログラムコードを実行することで、前記計測装置に、
  第1反射部材が存在すると推定される位置を含む領域に光を照射し、
  前記第1反射部材で反射された光の受光の結果に基づいて前記第1反射部材と異なる第2反射部材が存在すると推定される位置を含む領域に、前記光を照射する、
 ことを含む処理を実行させる計測システム。
[Appendix 6]
a measuring device that emits light in a predetermined irradiation direction and receives light reflected from an object illuminated by the light;
at least one processor;
at least one memory having computer program code stored therein;
The at least one processor executes the computer program code to cause the measurement device to:
irradiating a region including a position where a first reflecting member is estimated to be present with light;
irradiating the light onto an area including a position where a second reflecting member different from the first reflecting member is estimated to be present based on a result of receiving the light reflected by the first reflecting member;
A measurement system that performs a process including the steps of:

[付記7]
 光を反射部材に照射し、前記反射部材で反射された光を受光可能な計測装置と、
 少なくとも一つのプロセッサと、
 コンピュータプログラムコードが格納された少なくとも一つのメモリと、を備え、
 前記少なくとも一つのプロセッサは、前記コンピュータプログラムコードを実行することで、
  前記光の光路と交差する面における前記光の軌跡が第1パターンを示すように、前記計測装置からの前記光の照射方向を制御し、
  前記面における前記光の軌跡が前記第1パターンと異なる第2パターンを示すように、前記計測装置からの前記光の照射方向を制御し、
  前記光の受光の結果に基づき前記反射部材の位置に関する情報を取得する、
 ことを含む処理を実行させる計測システム。
[Appendix 7]
a measuring device that can irradiate a reflecting member with light and receive the light reflected by the reflecting member;
at least one processor;
at least one memory having computer program code stored therein;
The at least one processor executes the computer program code to
controlling an irradiation direction of the light from the measurement device so that a trajectory of the light on a plane intersecting an optical path of the light shows a first pattern;
controlling an irradiation direction of the light from the measurement device so that a trajectory of the light on the surface shows a second pattern different from the first pattern;
acquiring information about the position of the reflecting member based on the result of receiving the light;
A measurement system that performs a process including the steps of:

[付記8]
 光を反射部材に照射可能な照射装置を有し、前記反射部材で反射された光を受光可能な計測装置と、
 少なくとも一つのプロセッサと、
 コンピュータプログラムコードが格納された少なくとも一つのメモリと、を備え、
 前記少なくとも一つのプロセッサは、前記コンピュータプログラムコードを実行することで、
  第1回転軸および前記第1回転軸と交差する第2回転軸の少なくとも一方の回転軸に従って前記照射装置を第1態様で回転させて前記光を照射し、
  前記第1回転軸および前記第2回転軸の少なくとも一方の回転軸に従って前記第1態様と異なる第2態様で回転させて前記光を照射し、
  前記光の受光の結果に基づき前記反射部材の位置に関する情報を取得する、
 ことを含む処理を実行させる計測システム。
[Appendix 8]
a measuring device having an irradiation device capable of irradiating a reflecting member with light and capable of receiving the light reflected by the reflecting member;
at least one processor;
at least one memory having computer program code stored therein;
The at least one processor executes the computer program code to
rotating the irradiation device in a first manner along at least one of a first rotation axis and a second rotation axis intersecting the first rotation axis to irradiate the light;
rotating the light source in a second direction different from the first direction about at least one of the first rotation axis and the second rotation axis, and irradiating the light;
acquiring information about the position of the reflecting member based on the result of receiving the light;
A measurement system that performs a process including the steps of:

[付記9]
 第1反射部材が存在すると推定される位置を含む領域に光を照射し、
 前記第1反射部材で反射された光の受光の結果に基づき、前記第1反射部材と異なる第2反射部材が存在する位置を推定し、
 前記推定された位置を含む領域に前記光を照射する、
 ことを含む計測方法。
[Appendix 9]
irradiating a region including a position where a first reflecting member is estimated to be present with light;
estimating a position where a second reflecting member different from the first reflecting member is present based on a result of receiving the light reflected by the first reflecting member;
irradiating the light onto an area including the estimated position;
Measurement methods that include:

[付記10]
 反射部材を照射するための光の光路と交差する面における前記光の軌跡が第1パターンを示すように、前記光の照射方向を制御し、
 前記面における前記光の軌跡が前記第1パターンと異なる第2パターンを示すように、前記光の照射方向を制御し、
 前記光の受光の結果に基づき前記反射部材の位置に関する情報を取得する、
 ことを含む計測方法。
[Supplementary Note 10]
controlling an irradiation direction of the light so that a trajectory of the light on a plane intersecting an optical path of the light for irradiating the reflecting member shows a first pattern;
controlling the irradiation direction of the light so that the trajectory of the light on the surface exhibits a second pattern different from the first pattern;
acquiring information about the position of the reflecting member based on the result of receiving the light;
Measurement methods that include:

[付記11]
 光を反射部材に照射可能な照射装置を、第1回転軸および前記第1回転軸と交差する第2回転軸の少なくとも一方の回転軸に従って第1態様で回転させて前記光を照射し、
 前記照射装置を、前記第1回転軸および前記第2回転軸の少なくとも一方の回転軸に従って前記第1態様と異なる第2態様で回転させて前記光を照射し、
 前記光の受光の結果に基づき前記反射部材の位置に関する情報を取得する、
 ことを含む計測方法。
[Appendix 11]
an irradiation device capable of irradiating a reflecting member with light is rotated in a first manner about at least one of a first rotation axis and a second rotation axis intersecting the first rotation axis to irradiate the reflecting member with the light;
the irradiation device is rotated about at least one of the first rotation axis and the second rotation axis in a second direction different from the first direction to irradiate the light;
acquiring information about the position of the reflecting member based on the result of receiving the light;
Measurement methods that include:

[付記12]
 光を所定の照射方向に射出し、前記光により照射された物体で反射された光を受光可能な計測装置と、
 前記計測装置を制御する制御装置と、を備え、
 前記計測装置は、第1反射部材で反射された前記光を受光し、
 前記制御装置は、前記第1反射部材で反射された光の受光の結果に基づき前記第1反射部材と異なる第2反射部材を探索するように、第1探索モードおよび前記第1探索モードよりも狭い領域を探索する第2探索モードで前記計測装置に前記光を照射させる、
 計測システム。
[Appendix 12]
a measuring device that emits light in a predetermined irradiation direction and receives light reflected from an object illuminated by the light;
a control device that controls the measuring device,
the measuring device receives the light reflected by the first reflecting member;
the control device causes the measurement device to irradiate the light in a first search mode and a second search mode that searches a narrower area than that in the first search mode, so as to search for a second reflecting member different from the first reflecting member based on a result of receiving the light reflected by the first reflecting member.
Measurement system.

[付記13]
 光を所定の照射方向に射出し、前記光により照射された物体で反射された光を受光可能な計測装置と、
 前記計測装置を制御する制御装置と、を備え、
 前記計測装置は、第1反射部材で反射された前記光を受光し、
 前記制御装置は、前記第1反射部材で反射された光の受光の結果に基づき前記第1反射部材と異なる第2反射部材を探索するように、第1探索モードおよび前記第1探査モードよりも高密度に探索する第2探索モードで前記計測装置に前記光を照射させる、
 計測システム。
[Appendix 13]
a measuring device that emits light in a predetermined irradiation direction and receives light reflected from an object illuminated by the light;
a control device that controls the measuring device,
the measuring device receives the light reflected by the first reflecting member;
the control device causes the measurement device to irradiate the light in a first search mode and a second search mode that searches more densely than the first search mode, so as to search for a second reflecting member different from the first reflecting member based on a result of receiving the light reflected by the first reflecting member.
Measurement system.

 当業者は、本開示の精神および範囲から外れることなく、種々の変更、置換および修正をこれに加えることが可能であることを理解されたい。 It will be appreciated by those skilled in the art that various changes, substitutions, and alterations can be made thereto without departing from the spirit and scope of the present disclosure.

 100  計測システム
 1  計測装置
 2  制御装置
 3  撮像装置
 4  可動体
 5  反射部材
100 Measurement system 1 Measurement device 2 Control device 3 Imaging device 4 Movable body 5 Reflecting member

Claims (64)

 光を所定の照射方向に射出し、前記光により照射された物体で反射された光を受光可能な計測装置と、
 前記計測装置を制御する制御装置と、を備え、
 前記計測装置は、第1反射部材で反射された前記光を受光し、
 前記制御装置は、前記第1反射部材で反射された光の受光の結果に基づき前記第1反射部材と異なる第2反射部材に前記光が照射されるように前記計測装置からの前記光の照射方向を制御する、
 計測システム。
a measuring device that emits light in a predetermined irradiation direction and receives light reflected from an object illuminated by the light;
a control device that controls the measuring device,
the measuring device receives the light reflected by the first reflecting member;
the control device controls the irradiation direction of the light from the measurement device based on a result of receiving the light reflected by the first reflecting member so that the light is irradiated onto a second reflecting member different from the first reflecting member.
Measurement system.
 前記制御装置は、前記第2反射部材を探索するように前記計測装置からの前記光の照射方向を制御する、請求項1に記載の計測システム。 The measurement system described in claim 1, wherein the control device controls the direction of irradiation of the light from the measurement device so as to search for the second reflecting member.  前記制御装置は、前記第1反射部材で反射された光の受光の結果に基づき前記第1反射部材の位置に関する第1位置情報を取得する請求項2に記載の計測システム。 The measurement system described in claim 2, wherein the control device acquires first position information regarding the position of the first reflecting member based on the result of receiving light reflected by the first reflecting member.  前記制御装置は、前記第1位置情報に基づいて前記計測装置からの前記光の照射方向を制御する請求項3に記載の計測システム。 The measurement system described in claim 3, wherein the control device controls the direction of light irradiation from the measurement device based on the first position information.  前記制御装置は、予め取得された前記第1反射部材に関する第1初期情報と前記第1位置情報とに基づいて前記計測装置からの前記光の照射方向を制御する請求項4に記載の計測システム。 The measurement system described in claim 4, wherein the control device controls the direction of light irradiation from the measurement device based on first initial information regarding the first reflecting member and the first position information acquired in advance.  前記制御装置は、
 前記第1初期情報と前記第1位置情報とに基づいて、前記第1初期情報に対応する位置を、第1位置情報に対応する位置に平行移動させるための並進情報を取得し、
 前記並進情報に基づき前記第2反射部材を探索するための前記光の照射方向を制御する、
 請求項5に記載の計測システム。
The control device
acquiring translation information for translating a position corresponding to the first initial information to a position corresponding to the first position information, based on the first initial information and the first position information;
controlling the irradiation direction of the light for searching the second reflecting member based on the translation information;
The measurement system according to claim 5 .
 前記制御装置は、前記第1反射部材で反射された前記光の受光の結果に基づき、前記第2反射部材の位置に関する第2位置情報を取得する請求項3-6のいずれか一項に記載の計測システム。 The measurement system described in any one of claims 3 to 6, wherein the control device acquires second position information regarding the position of the second reflecting member based on the result of receiving the light reflected by the first reflecting member.  前記制御装置は、
 前記計測装置からの前記光の光路と交差する面における前記光の軌跡が第1パターンを示すように前記光の照射方向を制御して、前記第2反射部材で反射された前記光の受光の結果に基づき前記第2反射部材に関する情報を取得し、
 前記第2反射部材に関する前記情報に基づき、前記面における前記光の軌跡が前記第1パターンと異なる第2パターンを示すように前記光の照射方向を制御して、前記第2反射部材で反射された前記光の受光結果に基づき前記第2位置情報を取得する、
 請求項7に記載の計測システム。
The control device
controlling an irradiation direction of the light so that a trajectory of the light on a plane intersecting an optical path of the light from the measurement device shows a first pattern, and acquiring information about the second reflecting member based on a result of receiving the light reflected by the second reflecting member;
controlling an irradiation direction of the light based on the information regarding the second reflecting member so that a trajectory of the light on the surface shows a second pattern different from the first pattern, and acquiring the second position information based on a light reception result of the light reflected by the second reflecting member.
The measurement system of claim 7 .
 前記制御装置は、前記計測装置からの前記光の光路と交差する面における前記光の軌跡が第1パターンを示すように前記光の照射方向を制御した後に、前記面における前記光の軌跡が前記第1パターンと異なる第2パターンを示すように前記計測装置からの前記光の照射方向を制御する、請求項3-7のいずれか一項に記載の計測システム。 The measurement system described in any one of claims 3-7, wherein the control device controls the irradiation direction of the light from the measurement device so that the trajectory of the light on a plane intersecting the optical path of the light from the measurement device exhibits a first pattern, and then controls the irradiation direction of the light from the measurement device so that the trajectory of the light on the plane exhibits a second pattern different from the first pattern.  前記面における前記第1パターンを示す前記光の軌跡の始点と前記第1パターンを示す前記光の始点から最も距離が長い軌跡上の点とを結ぶ線分は、前記面における前記第2パターンを示す前記光の軌跡の始点と前記第2パターンを示す前記光の始点から最も距離が長い軌跡上の点とを結ぶ線分よりも長い請求項9に記載の計測システム。 The measurement system of claim 9, wherein the line segment connecting the starting point of the trajectory of the light representing the first pattern on the surface to the point on the trajectory that is the furthest distance from the starting point of the light representing the first pattern is longer than the line segment connecting the starting point of the trajectory of the light representing the second pattern on the surface to the point on the trajectory that is the furthest distance from the starting point of the light representing the second pattern.  前記面において、前記第1パターンについての前記線分と前記軌跡とが交わる点と当該点の次に交わる点との間隔は、前記第2パターンについての前記線分と前記軌跡とが交わる点と当該点の次に交わる点との間隔よりも大きい請求項10に記載の計測システム。 The measurement system of claim 10, wherein the distance between the point where the line segment and the trajectory intersect with the first pattern and the next point of intersection on the surface is greater than the distance between the point where the line segment and the trajectory intersect with the second pattern and the next point of intersection on the surface.  前記面において、前記第1パターンについての前記軌跡の任意の点における前記面内における法線と前記軌跡とが一度目に交わる点と次に交わる点との間隔は、前記第2パターンについての前記軌跡の任意の点における前記面内における法線と前記軌跡とが一度目に交わる点と次に交わる点との間隔よりも大きい請求項9に記載の計測システム。 The measurement system of claim 9, wherein the distance between the first and second intersecting points of the normal to the surface and the locus at any point of the locus for the first pattern is greater than the distance between the first and second intersecting points of the normal to the surface and the locus at any point of the locus for the second pattern.  前記第2パターンを示す前記光の軌跡の前記面内における単位面積あたりの長さは、前記第1パターンを示す前記光の軌跡の前記面内における単位面積あたりの長さよりも長い請求項9に記載の計測システム。 The measurement system of claim 9, wherein the length per unit area in the plane of the light trajectory representing the second pattern is longer than the length per unit area in the plane of the light trajectory representing the first pattern.  前記計測装置は前記光を照射する照射装置を備え、
 前記制御装置は、第1回転軸および前記第1回転軸と交差する第2回転軸の少なくとも一方の回転軸に従って前記照射装置を回転させることにより前記光の照射方向を変更するよう前記計測装置からの前記光の照射方向を制御する請求項1-13のいずれか一項に記載の計測システム。
the measurement device includes an irradiation device that irradiates the light,
The control device controls the irradiation direction of the light from the measurement device to change the irradiation direction of the light by rotating the irradiation device along at least one of a first rotation axis and a second rotation axis intersecting the first rotation axis. The measurement system according to any one of claims 1 to 13.
 前記計測装置は前記光を照射する照射装置を備え、
 前記制御装置は、第1回転軸および前記第1回転軸と交差する第2回転軸の少なくとも一方の回転軸に従って前記照射装置を回転させることにより前記光の照射方向を変更するよう前記計測装置を制御可能であり、
 前記制御装置は、前記第1回転軸および前記第2回転軸の少なくとも一方の回転軸に従って前記照射装置を第1態様で回転させた後に、前記第1回転軸および前記第2回転軸の少なくとも一方の回転軸に従って前記照射装置を前記第1態様とは異なる第2態様で回転させるよう前記計測装置からの前記光の照射方向を制御する、
 請求項2-13のいずれか一項に記載の計測システム。
the measurement device includes an irradiation device that irradiates the light,
the control device is capable of controlling the measurement device to change the irradiation direction of the light by rotating the irradiation device along at least one of a first rotation axis and a second rotation axis intersecting the first rotation axis;
the control device rotates the irradiation device in a first manner about at least one of the first rotation axis and the second rotation axis, and then controls the irradiation direction of the light from the measurement device so as to rotate the irradiation device in a second manner different from the first manner about at least one of the first rotation axis and the second rotation axis.
A measurement system according to any one of claims 2 to 13.
 前記第1態様における前記照射装置の前記第1回転軸に従った回転の最大角度範囲は、前記第2態様における前記照射装置の前記第1回転軸に従った回転の最大角度範囲よりも大きい請求項15に記載の計測システム。 The measurement system described in claim 15, wherein the maximum angular range of rotation about the first rotation axis of the irradiation device in the first embodiment is greater than the maximum angular range of rotation about the first rotation axis of the irradiation device in the second embodiment.  前記第1態様における前記照射装置の前記第2回転軸に従った回転の最大角度範囲は、前記第2態様における前記照射装置の前記第2回転軸に従った回転の最大角度範囲よりも大きい請求項15または16に記載の計測システム。 The measurement system described in claim 15 or 16, wherein the maximum angular range of rotation about the second rotation axis of the irradiation device in the first embodiment is greater than the maximum angular range of rotation about the second rotation axis of the irradiation device in the second embodiment.  前記照射装置は、前記第1回転軸に従って回転する動作と前記第2回転軸に従って回転する動作とを実行可能であり、
 前記制御装置は、前記第1態様における、前記第1回転軸に従った任意の回転角度に一度目になるときの前記第2回転軸に従った回転角度と、前記第1回転軸に従った前記任意の回転角度に二度目になるときの前記第2回転軸に従った回転角度との差が、前記第2態様における、前記第1回転軸に従った任意の回転角度に一度目になるときの前記第2回転軸に従った回転角度と、前記第1回転軸に従った前記任意の回転角度に二度目になるときの前記第2回転軸に従った回転角度との差よりも大きくなるよう前記計測装置を制御する、
 請求項15に記載の計測システム。
the irradiation device is capable of rotating about the first rotation axis and rotating about the second rotation axis,
the control device controls the measurement device so that a difference between a rotation angle about the second rotation axis when the arbitrary rotation angle about the first rotation axis is reached for the first time and a rotation angle about the second rotation axis when the arbitrary rotation angle about the first rotation axis is reached for the second time in the first mode is larger than a difference between a rotation angle about the second rotation axis when the arbitrary rotation angle about the first rotation axis is reached for the first time and a rotation angle about the second rotation axis when the arbitrary rotation angle about the first rotation axis is reached for the second time in the second mode.
The measurement system of claim 15.
 前記計測装置は前記光を照射する照射装置を備え、
 前記制御装置は、第1回転軸と前記第1回転軸と交差する第2回転軸の少なくとも一方の回転軸に従って前記照射装置を回転させることにより前記光の照射方向を変更するよう前記計測装置を制御可能であり、
 前記制御装置は、前記面における前記軌跡が前記第1パターンを示すように前記第1回転軸と前記第2回転軸の少なくとも一方の回転軸に従って前記照射装置が第1態様で回転するよう前記計測装置を制御した後に、前記面における前記軌跡が前記第2パターンを示すように前記第1回転軸と前記第2回転軸の少なくとも一方の回転軸に従って前記照射装置が前記第1態様とは異なる第2態様で回転するよう前記計測装置を制御する、
 請求項8-13のいずれか一項に記載の計測システム。
the measurement device includes an irradiation device that irradiates the light,
the control device is capable of controlling the measurement device to change the irradiation direction of the light by rotating the irradiation device along at least one of a first rotation axis and a second rotation axis intersecting the first rotation axis;
the control device controls the measurement device to rotate the irradiation device in a first manner about at least one of the first rotation axis and the second rotation axis so that the locus on the surface shows the first pattern, and then controls the measurement device to rotate the irradiation device in a second manner different from the first manner about at least one of the first rotation axis and the second rotation axis so that the locus on the surface shows the second pattern.
A measurement system according to any one of claims 8 to 13.
 前記第1態様での前記照射装置の回転により前記面における前記軌跡は前記第1パターンを示し、
 前記第2態様での前記照射装置の回転により前記面における前記軌跡は前記第2パターンを示し、
 前記第1態様での前記照射装置の前記第1回転軸に従った回転の最大角度範囲は、前記第2態様での前記照射装置の前記第1回転軸に従った回転の最大角度範囲よりも大きい、
 請求項19に記載の計測システム。
the rotation of the irradiation device in the first mode causes the locus on the surface to show the first pattern;
the rotation of the irradiation device in the second mode causes the locus on the surface to show the second pattern;
a maximum angular range of rotation about the first rotation axis of the irradiation device in the first aspect is greater than a maximum angular range of rotation about the first rotation axis of the irradiation device in the second aspect;
20. The measurement system of claim 19.
 前記第1態様での前記照射装置の回転により前記面における前記軌跡は前記第1パターンを示し、
 前記第2態様での前記照射装置の回転により前記面における前記軌跡は前記第2パターンを示し、
 前記第1態様での前記照射装置の前記第2回転軸に従った回転の最大角度範囲は、前記第2態様での前記照射装置の前記第2回転軸に従った回転の最大角度範囲よりも大きい、
 請求項19または20に記載の計測システム。
the rotation of the irradiation device in the first mode causes the locus on the surface to show the first pattern;
the rotation of the irradiation device in the second mode causes the locus on the surface to show the second pattern;
a maximum angular range of rotation about the second rotation axis of the irradiation device in the first aspect is greater than a maximum angular range of rotation about the second rotation axis of the irradiation device in the second aspect;
21. The measurement system according to claim 19 or 20.
 前記第1態様での前記照射装置の回転により前記面における前記軌跡は前記第1パターンを示し、
 前記第2態様での前記照射装置の回転により前記面における前記軌跡は前記第2パターンを示し、
 前記照射装置は、前記第1回転軸に従って回転する動作と前記第2回転軸に従って回転する動作とを実行可能であり、
 前記制御装置は、前記第1態様における、前記第1回転軸に従った任意の回転角度に一度目になるときの前記第2回転軸に従った回転角度と、前記第1回転軸に従った前記任意の回転角度に二度目になるときの前記第2回転軸に従った回転角度との差が、前記第2態様における、前記第1回転軸に従った任意の回転角度に一度目になるときの前記第2回転軸に従った回転角度と、前記第1回転軸に従った任意の回転角度に二度目になるときの前記第2回転軸に従った回転角度との差よりも大きくなるように前記計測装置を制御する、
 請求項19に記載の計測システム。
the rotation of the irradiation device in the first mode causes the locus on the surface to show the first pattern;
the rotation of the irradiation device in the second mode causes the locus on the surface to show the second pattern;
the irradiation device is capable of rotating about the first rotation axis and rotating about the second rotation axis,
the control device controls the measurement device so that a difference between a rotation angle about the second rotation axis when the arbitrary rotation angle about the first rotation axis is reached for the first time and a rotation angle about the second rotation axis when the arbitrary rotation angle about the first rotation axis is reached for the second time in the first mode is larger than a difference between a rotation angle about the second rotation axis when the arbitrary rotation angle about the first rotation axis is reached for the first time and a rotation angle about the second rotation axis when the arbitrary rotation angle about the first rotation axis is reached for the second time in the second mode.
20. The measurement system of claim 19.
 前記制御装置は、前記光の径に基づき、前記面における前記軌跡が前記第1パターンおよび前記第2パターンの少なくとも一方を示すように前記計測装置を制御するための制御パラメータを設定する請求項8-13、19-22のいずれか一項に記載の計測システム。 The measurement system described in any one of claims 8-13 and 19-22, wherein the control device sets control parameters for controlling the measurement device based on the diameter of the light so that the trajectory on the surface indicates at least one of the first pattern and the second pattern.  前記制御装置は、前記第2反射部材の径に基づき、前記面における前記軌跡が前記第1パターンおよび前記第2パターンの少なくとも一方を示すように前記計測装置を制御するための制御パラメータを設定する請求項8-13、19-23のいずれか一項に記載の計測システム。 The measurement system described in any one of claims 8-13 and 19-23, wherein the control device sets control parameters for controlling the measurement device based on the diameter of the second reflecting member so that the trajectory on the surface indicates at least one of the first pattern and the second pattern.  前記制御装置は、前記光の径に基づき、前記照射装置が前記第1態様および前記第2態様の少なくとも一方で回転するように前記計測装置を制御するための制御パラメータを設定する請求項15-22のいずれか一項に記載の計測システム。 The measurement system described in any one of claims 15-22, wherein the control device sets control parameters for controlling the measurement device so that the irradiation device rotates in at least one of the first and second modes based on the diameter of the light.  前記制御装置は、前記第2反射部材の径に基づき、前記面における前記軌跡が前記第1パターンおよび前記第2パターンの少なくとも一方を示すように前記計測装置を制御するための制御パラメータを設定する請求項8-13、19-24のいずれか一項に記載の計測システム。 The measurement system described in any one of claims 8-13 and 19-24, wherein the control device sets control parameters for controlling the measurement device based on the diameter of the second reflecting member so that the trajectory on the surface indicates at least one of the first pattern and the second pattern.  前記制御装置は、前記計測装置からの前記光の光路と交差する面における前記光の軌跡が所定のパターンを示すように前記計測装置における前記光の照射方向を制御する請求項2-26のいずれか一項に記載の計測システム。 The measurement system described in any one of claims 2-26, wherein the control device controls the direction of light irradiation in the measurement device so that the trajectory of the light on a plane intersecting the optical path of the light from the measurement device shows a predetermined pattern.  前記面において、前記軌跡が示すパターンは渦巻形状である請求項27に記載の計測システム。 The measurement system of claim 27, wherein the pattern indicated by the trajectory on the surface is a spiral shape.  前記渦巻形状は円形に基づく形状である請求項28に記載の計測システム。 The measurement system described in claim 28, wherein the spiral shape is a shape based on a circle.  前記渦巻形状は楕円形に基づく形状である請求項28に記載の計測システム。 The measurement system described in claim 28, wherein the spiral shape is based on an ellipse.  前記渦巻形状は多角形に基づく形状である請求項28に記載の計測システム。 The measurement system described in claim 28, wherein the spiral shape is a polygon-based shape.  前記面における前記光の軌跡はラスターパターンを示す請求項27に記載の計測システム。 The measurement system described in claim 27, wherein the light trajectory on the surface exhibits a raster pattern.  前記計測装置からの前記光の光路と交差する面における前記光の軌跡は非周期的なパターンを示す、請求項2に記載の計測システム。 The measurement system described in claim 2, wherein the trajectory of the light in a plane intersecting the optical path of the light from the measurement device exhibits a non-periodic pattern.  前記制御装置は、前記第1反射部材で反射された光の受光の結果に基づき取得された前記第1反射部材に関する第1位置情報と、前記第2反射部材で反射された光の受光の結果に基づき取得された前記第2反射部材に関する第2位置情報とに基づいて、前記第2反射部材より後に計測される第3反射部材に前記光が照射されるように前記計測装置からの前記光の照射方向を制御する、請求項1-33のいずれか一項に記載の計測システム。 The measurement system described in any one of claims 1-33, wherein the control device controls the direction of light irradiation from the measurement device so that the light is irradiated onto a third reflecting member, which is measured after the second reflecting member, based on first position information regarding the first reflecting member obtained based on the result of receiving light reflected by the first reflecting member and second position information regarding the second reflecting member obtained based on the result of receiving light reflected by the second reflecting member.  前記制御装置は、予め取得された前記第1反射部材に関する第1初期情報と、前記第1位置情報と、予め取得された前記第2反射部材に関する第2初期情報と、前記第2位置情報とに基づき、前記計測装置からの前記光の照射方向を制御する、請求項34に記載の計測システム。 The measurement system described in claim 34, wherein the control device controls the direction of irradiation of the light from the measurement device based on first initial information regarding the first reflecting member, the first position information, second initial information regarding the second reflecting member, and the second position information, which have been acquired in advance.  前記制御装置は、前記第3反射部材を探索するように前記計測装置からの前記光の照射方向を制御する請求項35に記載の計測システム。 The measurement system described in claim 35, wherein the control device controls the direction of light emitted from the measurement device so as to search for the third reflecting member.  前記制御装置は、
 前記第1初期情報と、前記第1位置情報と、第2初期情報と、前記第2位置情報と、に基づいて、前記第1初期情報に対応する位置および前記第2初期情報に対応する位置を、それぞれ、前記第1位置情報に対応する位置および前記第2位置情報に対応する位置に回転移動させるための回転情報を取得し、
 前記回転情報に基づき前記第3反射部材を探索するための前記光の照射方向を制御する、
 請求項35に記載の計測システム。
The control device
acquiring rotation information for rotating and moving the position corresponding to the first initial information and the position corresponding to the second initial information to the position corresponding to the first position information and the position corresponding to the second position information, respectively, based on the first initial information, the first position information, the second initial information, and the second position information;
controlling the irradiation direction of the light for searching the third reflecting member based on the rotation information;
36. The measurement system of claim 35.
 前記制御装置は、前記第3反射部材で反射された前記光の受光の結果に基づき、前記第3反射部材の位置に関する位置情報を取得する請求項34-37のいずれか一項に記載の計測システム。 The measurement system described in any one of claims 34-37, wherein the control device acquires position information regarding the position of the third reflecting member based on the result of receiving the light reflected by the third reflecting member.  前記制御装置は、
 前記計測装置からの前記光の光路と交差する面において前記光の軌跡が第4パターンを示すように前記光の照射方向を制御し、前記計測装置からの前記光が前記第2反射部材で反射された前記光の受光の結果に基づき前記第3反射部材に関する情報を取得し、
 前記第3反射部材に関する前記情報に基づき、前記計測装置からの前記光の光路と交差する面において前記光の軌跡が前記第4パターンと異なる第5パターンを示すように前記光の照射方向を制御して、前記計測装置からの前記光が前記第3反射部材で反射された前記光の受光の結果に基づき前記第3反射部材の位置に関する位置情報を取得する、
 請求項36または37に記載の計測システム。
The control device
controlling an irradiation direction of the light so that a trajectory of the light shows a fourth pattern on a plane intersecting an optical path of the light from the measurement device; and acquiring information about the third reflecting member based on a result of receiving the light that is the light from the measurement device reflected by the second reflecting member;
based on the information on the third reflecting member, controlling the irradiation direction of the light so that the trajectory of the light shows a fifth pattern different from the fourth pattern on a plane intersecting with the optical path of the light from the measurement device, and acquiring position information on the position of the third reflecting member based on a result of receiving the light reflected by the third reflecting member from the measurement device.
38. The measurement system according to claim 36 or 37.
 前記計測装置は物体を撮像可能な撮像装置を備え、
 前記制御装置は、前記第1反射部材が存在すると推定される位置と前記第2反射部材が存在すると推定される位置の少なくとも一方を、前記撮像装置による撮像結果に基づき取得する、
 請求項1-39のいずれか一項に記載の計測システム。
the measurement device includes an imaging device capable of imaging an object,
the control device acquires at least one of a position where the first reflecting member is estimated to be present and a position where the second reflecting member is estimated to be present based on an imaging result obtained by the imaging device;
A measurement system according to any one of claims 1 to 39.
 前記制御装置は、前記撮像装置による撮像結果に基づき前記第1反射部材および前記第2反射部材の少なくとも一つに前記光が照射されるように前記計測装置からの前記光の照射方向を制御する、請求項40に記載の計測システム。 The measurement system described in claim 40, wherein the control device controls the direction of irradiation of the light from the measurement device based on the imaging results of the imaging device so that the light is irradiated onto at least one of the first reflecting member and the second reflecting member.  前記第1反射部材および前記第2反射部材の少なくとも一つは可動体に取り付けられ、
 前記制御装置は、前記第1反射部材で反射した前記光の受光の結果および前記第2反射部材で反射した前記光の受光の結果の少なくとも一つに基づき前記可動体を制御する、
 請求項1-41のいずれか一項に記載の計測システム。
At least one of the first reflecting member and the second reflecting member is attached to a movable body,
the control device controls the movable body based on at least one of a result of receiving the light reflected by the first reflecting member and a result of receiving the light reflected by the second reflecting member.
A measurement system according to any one of claims 1 to 41.
 前記制御装置は、前記可動体の位置および姿勢の少なくとも一方を制御する、請求項42に記載の計測システム。 The measurement system described in claim 42, wherein the control device controls at least one of the position and orientation of the movable body.  請求項1-43のいずれか一項に記載の計測システムを備え、
 前記制御装置は、前記計測システムが取得した前記第1反射部材および前記第2反射部材の少なくとも一つの位置に関する情報に基づき、前記第1反射部材および前記第2反射部材の少なくとも一つが取り付けられた可動体を制御する制御システム。
A measurement system according to any one of claims 1 to 43,
The control device is a control system that controls a movable body to which at least one of the first reflecting member and the second reflecting member is attached, based on information regarding the position of at least one of the first reflecting member and the second reflecting member obtained by the measurement system.
 反射部材に光を照射し、前記反射部材で反射された前記光を受光する計測装置と、
 前記計測装置からの前記光の照射方向を制御する制御装置と、を備え、
 前記制御装置は、前記計測装置からの前記光の光路と交差する面における前記光の軌跡が第1パターンを示すように前記光の照射方向を制御した後に、前記面における前記光の軌跡が前記第1パターンと異なる第2パターンを示すように前記光の照射方向を制御し、前記光の受光の結果に基づき前記反射部材の位置に関する情報を取得する計測システム。
a measuring device that irradiates a reflecting member with light and receives the light reflected by the reflecting member;
a control device that controls the irradiation direction of the light from the measurement device,
The control device controls the direction of irradiation of the light so that the trajectory of the light on a plane that intersects with the optical path of the light from the measurement device shows a first pattern, and then controls the direction of irradiation of the light so that the trajectory of the light on the plane shows a second pattern different from the first pattern, and obtains information regarding the position of the reflective member based on the result of receiving the light.
 前記制御装置は、前記面における前記光の軌跡が前記第1パターンを示すように前記計測装置からの光の照射方向を制御し、前記反射部材で反射された前記光が前記計測装置で受光された後に、前記面における前記光の軌跡が前記第2パターンを示すように前記計測装置からの光の照射方向を制御する請求項45に記載の計測システム。 The measurement system described in claim 45, wherein the control device controls the direction of light emitted from the measurement device so that the trajectory of the light on the surface shows the first pattern, and after the light reflected by the reflecting member is received by the measurement device, controls the direction of light emitted from the measurement device so that the trajectory of the light on the surface shows the second pattern.  前記制御装置は、前記計測装置から照射される光の光路上に前記反射部材が存在すると推定される位置を含むとともに、前記面における前記光の軌跡が前記第1パターンを示すように前記計測装置からの光の照射方向を制御する、請求項45または46に記載の計測システム。 The measurement system described in claim 45 or 46, wherein the control device includes a position where the reflective member is estimated to be present on the optical path of the light emitted from the measurement device, and controls the direction of light emitted from the measurement device so that the trajectory of the light on the surface shows the first pattern.  前記反射部材は、第1反射部材と、前記第1反射部材とは異なる第2反射部材とを含み、
 前記制御装置は、前記面における前記光の軌跡が前記第2パターンを示すように前記計測装置からの前記光の照射方向を制御した後に、面における前記光の軌跡が前記第1パターンと異なる第3パターンを示すように前記計測装置からの前記光の照射方向を制御し、
 前記制御装置は、前記面において軌跡が前記第1パターンを示す前記光が、前記第1反射部材と前記第2反射部材とを含む範囲に照射され、前記面において軌跡が前記第2パターンを示す前記光が、前記第1反射部材を含む範囲に照射され、前記面において軌跡が前記第3パターンを示す前記光が、前記第2反射部材を含む範囲に照射されるよう前記計測装置からの前記光の照射方向を制御する、
 請求項45-47のいずれか一項に記載の計測システム。
the reflecting member includes a first reflecting member and a second reflecting member different from the first reflecting member,
the control device controls the irradiation direction of the light from the measurement device so that the trajectory of the light on the surface shows the second pattern, and then controls the irradiation direction of the light from the measurement device so that the trajectory of the light on the surface shows a third pattern different from the first pattern;
the control device controls the irradiation direction of the light from the measurement device so that the light, whose locus on the surface indicates the first pattern, is irradiated onto a range including the first reflecting member and the second reflecting member, the light, whose locus on the surface indicates the second pattern, is irradiated onto a range including the first reflecting member, and the light, whose locus on the surface indicates the third pattern, is irradiated onto a range including the second reflecting member.
A measurement system according to any one of claims 45 to 47.
 前記第2パターンおよび前記第3パターンは同じパターンを示す請求項48に記載の計測システム。 The measurement system of claim 48, wherein the second pattern and the third pattern represent the same pattern.  前記反射部材は、第1反射部材と、前記第1反射部材と異なる第2反射部材とを含み、
 前記制御装置は、
  前記面において軌跡が前記第1パターンを示す光が前記第1反射部材と前記第2反射部材とを含む範囲に照射され、前記面において軌跡が前記第2パターンを示す光が前記第1反射部材を含む範囲に照射されるよう前記計測装置からの前記光の照射方向を制御し、
  前記第1反射部材で反射された、軌跡が前記第1パターンを示す光の受光の結果と、前記第2反射部材で反射された、軌跡が前記第1パターンを示す光の受光の結果と、前記第1反射部材で反射された、軌跡が前記第2パターンを示す光の受光の結果とに基づいて、前記第2反射部材の位置に関する情報を取得する、
 請求項45-49のいずれか一項に記載の計測システム。
the reflecting member includes a first reflecting member and a second reflecting member different from the first reflecting member,
The control device
controlling an irradiation direction of the light from the measurement device so that light whose locus indicates the first pattern on the surface is irradiated onto a range including the first reflecting member and the second reflecting member, and light whose locus indicates the second pattern on the surface is irradiated onto a range including the first reflecting member;
acquiring information about the position of the second reflecting member based on a result of receiving light reflected by the first reflecting member and whose locus indicates the first pattern, a result of receiving light reflected by the second reflecting member and whose locus indicates the first pattern, and a result of receiving light reflected by the first reflecting member and whose locus indicates the second pattern;
A measurement system according to any one of claims 45 to 49.
 反射部材に光を照射し反射部材で反射された前記光を受光する計測装置と、
 前記計測装置からの前記光の照射方向を制御する制御装置と、を備え、
 前記計測装置は、前記制御装置による制御に基づいて所定の方向に前記光を照射可能な照射装置を備え、
 前記制御装置は、第1回転軸および前記第1回転軸と交差する第2回転軸の少なくとも一方の回転軸に従って前記照射装置を回転させることにより前記計測装置からの前記光の照射方向を変更可能であり、
 前記制御装置は、前記第1回転軸および前記第2回転軸の少なくとも一方の回転軸に従って前記照射装置を第1態様で回転させて前記光を照射した後に、前記第1回転軸および前記第2回転軸の少なくとも一方の回転軸に従って前記照射装置を前記第1態様とは異なる第2態様で回転させて前記光を照射するように制御し、前記光の受光の結果に基づいて前記反射部材の位置に関する情報を取得する、計測システム。
a measuring device that irradiates a reflecting member with light and receives the light reflected by the reflecting member;
a control device that controls the irradiation direction of the light from the measurement device,
the measurement device includes an irradiation device that can irradiate the light in a predetermined direction under control of the control device,
the control device is capable of changing the irradiation direction of the light from the measurement device by rotating the irradiation device along at least one of a first rotation axis and a second rotation axis intersecting the first rotation axis;
the control device controls the irradiation device to rotate in a first manner according to at least one of the first rotation axis and the second rotation axis to irradiate the light, and then controls the irradiation device to rotate in a second manner different from the first manner according to at least one of the first rotation axis and the second rotation axis to irradiate the light, and acquires information regarding the position of the reflective member based on a result of receiving the light.
 前記制御装置は、前記第1態様で回転する前記照射装置からの光の照射により前記反射部材で反射された前記光が前記計測装置で受光された後に、前記第2態様で回転する前記照射装置からの光の照射を行うよう前記計測装置を制御する請求項51に記載の計測システム。 The measurement system described in claim 51, wherein the control device controls the measurement device to irradiate light from the irradiation device rotating in the second mode after the light irradiated from the irradiation device rotating in the first mode and reflected by the reflecting member is received by the measurement device.  前記制御装置は、前記照射装置から照射される光の光路上に前記反射部材が存在すると推定される位置を含むように、前記第1態様で回転する前記照射装置からの光の照射方向を制御する、請求項51または52に記載の計測システム。 The measurement system described in claim 51 or 52, wherein the control device controls the direction of light emitted from the irradiation device rotating in the first mode so that the position where the reflective member is estimated to be present is included on the optical path of the light emitted from the irradiation device.  前記反射部材は、第1反射部材と、前記第1反射部材と異なる第2反射部材とを含み、
 前記制御装置は、前記第2態様で前記光を照射した後に、前記第1回転軸および前記第2回転軸の少なくとも一方の回転軸に従って前記照射装置を前記第1態様と異なる第3態様で回転させることにより前記光の照射方向を制御し、
 前記制御装置は、前記第1態様で回転する前記照射装置からの前記光が前記第1反射部材および前記第2反射部材を含む範囲に照射され、前記第2態様で回転する前記照射装置からの前記光が前記第1反射部材を含む範囲に照射され、前記第3態様で回転する前記照射装置からの前記光が前記第2反射部材を含む範囲に照射されるよう前記照射装置からの前記光の照射方向を制御する、
 請求項51-53のいずれか一項に記載の計測システム。
the reflecting member includes a first reflecting member and a second reflecting member different from the first reflecting member,
the control device controls the irradiation direction of the light by rotating the irradiation device in a third aspect different from the first aspect around at least one of the first rotation axis and the second rotation axis after irradiating the light in the second aspect;
the control device controls the irradiation direction of the light from the irradiation device so that the light from the irradiation device rotating in the first aspect is irradiated onto a range including the first reflecting member and the second reflecting member, the light from the irradiation device rotating in the second aspect is irradiated onto a range including the first reflecting member, and the light from the irradiation device rotating in the third aspect is irradiated onto a range including the second reflecting member.
A measurement system according to any one of claims 51 to 53.
 前記第2態様と前記第3態様とは同じ態様を示す請求項54に記載の計測システム。 The measurement system described in claim 54, wherein the second aspect and the third aspect represent the same aspect.  前記反射部材は、第1反射部材と、前記第1反射部材と異なる第2反射部材とを含み、
 前記制御装置は、
  前記第1態様で回転する前記照射装置から照射される光が前記第1反射部材と前記第2反射部材とを含む範囲に照射され、前記第2態様で回転する前記照射装置から照射される光が前記第1反射部材を含む範囲に照射されるよう前記照射装置からの光の照射方向を制御し、
  前記第1反射部材で反射された、前記第1態様で回転する前記照射装置から照射される光の受光の結果と、前記第2反射部材で反射された、前記第1態様で回転する前記照射装置から照射される光の受光の結果と、前記第1反射部材で反射された、前記第2態様で回転する前記照射装置から照射される光の受光の結果とに基づいて、前記第2反射部材の位置に関する情報を取得する、
 請求項51-53のいずれか一項に記載の計測システム。
the reflecting member includes a first reflecting member and a second reflecting member different from the first reflecting member,
The control device
controlling an irradiation direction of light from the irradiation device so that the light irradiated from the irradiation device rotating in the first aspect is irradiated onto a range including the first reflecting member and the second reflecting member, and the light irradiated from the irradiation device rotating in the second aspect is irradiated onto a range including the first reflecting member;
acquiring information about the position of the second reflecting member based on a result of receiving the light reflected by the first reflecting member and irradiated from the irradiation device rotating in the first aspect, a result of receiving the light reflected by the second reflecting member and irradiated from the irradiation device rotating in the first aspect, and a result of receiving the light reflected by the first reflecting member and irradiated from the irradiation device rotating in the second aspect;
A measurement system according to any one of claims 51 to 53.
 前記計測装置は撮像装置を備え、
 前記制御装置は、前記反射部材が存在すると推定される位置を前記撮像装置による撮像結果に基づき取得する、
 請求項45-56のいずれか一項に記載の計測システム。
the measurement device includes an imaging device;
the control device acquires the position where the reflective member is estimated to be present based on the image capturing result obtained by the image capturing device;
A measurement system according to any one of claims 45 to 56.
 前記制御装置は、前記撮像装置による撮像結果に基づき前記反射部材が存在すると推定される位置に前記計測装置からの光が照射されるように、前記計測装置からの前記光の照射方向を制御する請求項57に記載の計測システム。 The measurement system described in claim 57, wherein the control device controls the direction of light emitted from the measurement device so that light from the measurement device is emitted at a position where the reflective member is estimated to be present based on the imaging results of the imaging device.  前記反射部材は可動体に取り付けられ、
 前記制御装置は、前記反射部材で反射された前記光の受光の結果に基づき前記可動体を制御する、
 請求項45-58のいずれか一項に記載の計測システム。
The reflecting member is attached to a movable body,
the control device controls the movable body based on a result of receiving the light reflected by the reflecting member.
A measurement system according to any one of claims 45 to 58.
 前記制御装置は前記可動体の位置および姿勢の少なくとも一方を制御する請求項59に記載の計測システム。 The measurement system described in claim 59, wherein the control device controls at least one of the position and orientation of the movable body.  請求項45-58のいずれか一項に記載の計測システムと、前記反射部材が取り付けられた可動体とを備え、
 前記制御装置は、前記反射部材の位置に関する情報に基づいて前記可動体を制御する制御システム。
A measurement system comprising: the measurement system according to any one of claims 45 to 58; and a movable body to which the reflecting member is attached;
The control device is a control system that controls the movable body based on information about the position of the reflecting member.
 前記計測装置は、前記光として所定のビーム径を有するレーザー光を照射する、請求項45に記載の計測システム。 The measurement system described in claim 45, wherein the measurement device irradiates laser light having a predetermined beam diameter as the light.  前記制御装置は、前記反射部材からの反射光を受光することで前記反射部材の位置に関する情報を取得する、請求項62に記載の計測システム。 The measurement system described in claim 62, wherein the control device acquires information regarding the position of the reflecting member by receiving light reflected from the reflecting member.  前記制御装置は、前記計測装置からの前記光の光路と交差する面における前記光の軌跡が前記面における所定の領域に複数含まれる場合における前記光の軌跡どうしの間隔が、前記ビーム径に基づいて設定されるビーム間隔となるように、前記計測装置を制御する、
 請求項62または63に記載の計測システム。
the control device controls the measurement device so that, when a plurality of trajectories of the light on a plane intersecting with the optical path of the light from the measurement device are included in a predetermined area on the plane, an interval between the trajectories of the light becomes a beam interval set based on the beam diameter.
64. The measurement system of claim 62 or 63.
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Publication number Priority date Publication date Assignee Title
JP2008089393A (en) * 2006-10-02 2008-04-17 Soatec Inc Optical device and optical measurement system
JP2014224790A (en) * 2013-05-17 2014-12-04 株式会社ミツトヨ Tracking laser device
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