[go: up one dir, main page]

WO2022039254A1 - Récipient pour photomasque - Google Patents

Récipient pour photomasque Download PDF

Info

Publication number
WO2022039254A1
WO2022039254A1 PCT/JP2021/030541 JP2021030541W WO2022039254A1 WO 2022039254 A1 WO2022039254 A1 WO 2022039254A1 JP 2021030541 W JP2021030541 W JP 2021030541W WO 2022039254 A1 WO2022039254 A1 WO 2022039254A1
Authority
WO
WIPO (PCT)
Prior art keywords
photomask
container
photomask substrate
wall
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2021/030541
Other languages
English (en)
Japanese (ja)
Inventor
淳一 中島
智也 北條
孝志 福井
淳人 田所
智孝 堀内
健人 前田
幹夫 福井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NET PLASTIC CO Ltd
Sekisui Seikei Co Ltd
Original Assignee
NET PLASTIC CO Ltd
Sekisui Seikei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NET PLASTIC CO Ltd, Sekisui Seikei Co Ltd filed Critical NET PLASTIC CO Ltd
Priority to CN202180050837.5A priority Critical patent/CN116097168A/zh
Priority to KR1020237009146A priority patent/KR20230049743A/ko
Priority to JP2022544017A priority patent/JP7333925B2/ja
Publication of WO2022039254A1 publication Critical patent/WO2022039254A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders

Definitions

  • the present invention relates to a photomask container for storing and transporting a photomask substrate.
  • a photomask substrate is created in a factory having a clean room, and the created photomask substrate is transported to a factory in the next process to display a liquid crystal display panel or the like.
  • Manufactures equipment In recent years, in order to manufacture a display device such as a liquid crystal display panel, a photomask substrate is created in a factory having a clean room, and the created photomask substrate is transported to a factory in the next process to display a liquid crystal display panel or the like. Manufactures equipment.
  • Display devices such as liquid crystal display panels are precision equipment, and when transporting a photomask board, dust (fine particles) adheres to the surface, or the board circuit or the board itself is damaged due to electrical damage, etc. In some cases, it became impossible to manufacture the display device.
  • the photomask substrate is required to be enormous (larger area) in order to print multiple display devices at once in order to increase the screen size of display devices such as liquid crystal display panels, improve productivity, and save labor. Therefore, a size of 750 x 750 mm or more is required.
  • the manufacture of final products such as display devices such as liquid crystal display panels from the manufacture of photomask substrates is carried out not only within one factory but also at remote locations in Japan and overseas. It is stored in a photomask container and transported by truck, ship, airplane, etc.
  • the photomask container can firmly hold the photomask substrate, can be transported without dust (fine particles) adhering to the surface or being damaged, and is lightweight and has mechanical strength. It was desired to be excellent.
  • airlifted by air it is transported under reduced pressure or low temperature, so that unnecessary stress is not applied to the photomask substrate or photomask container, and the photomask substrate storage section of the photomask container. It is desired that dew condensation is suppressed and the degree of cleanliness is excellent.
  • a mask case for transporting a photomask substrate in a housed state the holding means for holding the photomask substrate, the base provided with the holding means, and the base detachably attached to the base.
  • a mask case provided with a lid portion for covering the photomask substrate. (See, for example, Patent Document 1),“ A main body portion having a substantially symmetrical structure having a peripheral portion for sealing that is in contact with each other. ” It is a container for accommodating a large precision sheet-shaped product or semi-finished product (hereinafter collectively referred to as "precision sheet-shaped (semi-) product”), and is composed of a main body and a lid.
  • Each part is composed of a plurality of antistatic resin plates that extend in a plane to each other and are joined to each other at an intermediate contact part. It has a sealing bolted structure, and on the bottom of the main body, precision sheet-shaped (semi) products are placed in the X, Y and Z directions (that is, precision sheet-shaped (semi) products) perpendicular to each other. It has a fixed support structure that can be fixed and supported in the vertical direction), and the fixed support structure is placed on a support portion for mounting a precision sheet-shaped (semi) product on the support portion and on the support portion.
  • It has at least one set of a fixed support that applies a pressing force in the thickness direction to the edge of the precision sheet-shaped (semi) product, and the fixed support is fixed to the bottom of the main body.
  • a fixed support that applies a pressing force in the thickness direction to the edge of the precision sheet-shaped (semi) product
  • the fixed support is fixed to the bottom of the main body.
  • a large precision sheet (semi) characterized by having a tipping open position that allows a precision sheet (semi) product to be placed on the support, and a movable part that is rotatably supported between them.
  • Semi) Sealed container for products. (For example, see Patent Document 2) and the like have been proposed.
  • the above photomask container has a large number of parts and requires a lot of man-hours to manufacture each part, so that there is a limit to the improvement of production efficiency and it takes a lot of time to maintain quality stability.
  • it has the disadvantage of being heavy and difficult to carry.
  • an object of the present invention is that the photomask substrate is lightweight and has excellent mechanical strength, the photomask substrate can be firmly held, the occurrence of dew condensation in the photomask substrate storage portion is suppressed, and the degree of cleanliness is high.
  • a photomask substrate storage portion is formed by a container body and a lid, and the photomask substrate is a photomask container for storing and transporting the photomask substrate in a state of being stored in the photomask substrate storage portion.
  • a box consisting of a substantially flat plate-shaped base made of a high-density polyethylene resin having a melt flow rate (MFR) of 0.6 (g / 10 minutes) or less and a side wall portion installed in a direction substantially perpendicular to the end of the base.
  • MFR melt flow rate
  • a photomask container which is a shape and is a two-layer hollow structure composed of an inner wall and an outer wall.
  • the photomask container [6] lid according to any one of the above [1] to [4] is made of a high-density polyethylene resin having a melt flow rate (MFR) of 0.6 (g / 10 minutes) or less. It is a box-shaped body composed of a substantially flat plate-shaped base and a side wall portion installed in a direction substantially perpendicular to the end of the base, and is characterized by being a two-layer hollow structure composed of an inner wall and an outer wall.
  • MFR melt flow rate
  • the configuration of the photomask container of the present invention is as described above, and the photomask container is easy to manufacture, inexpensive, lightweight, has excellent mechanical strength, and can firmly hold the photomask substrate. It can be stored and transported without dust (fine particles) adhering to or deforming the surface. Therefore, even if the photomask substrate or the photomask container is stored and transported under reduced pressure or at a low temperature, unnecessary stress is not applied to the photomask substrate or the photomask container, and dew condensation on the photomask substrate storage portion of the photomask container is suppressed. Due to its excellent cleanliness, it can be suitably airlifted by air.
  • FIG. 2 is a cross-sectional view taken along the line AA in FIG.
  • FIG. 2 is a cross-sectional view taken along the line BB in FIG.
  • FIG. 5 is a sectional view taken along the line CC in FIG.
  • the photomask container of the present invention is a photomask container in which a photomask substrate storage portion is formed by a container body and a lid, and the photomask substrate is stored and transported in a state of being stored in the photomask substrate storage portion.
  • the container body was installed in a substantially flat base made of a high-density polyethylene resin having a melt flow rate (MFR) of 0.6 (g / 10 min) or less, and in a direction substantially perpendicular to the end of the base. It is a box-shaped body composed of a side wall portion, and is a two-layer hollow structure composed of an inner wall and an outer wall.
  • the container body is made of high-density polyethylene resin because it is integrally molded by a blow molding method and has high mechanical strength so as not to be deformed or broken during transportation or storage.
  • the high-density polyethylene resin is a polyethylene resin polymerized by a medium-low pressure method and having a density of 0.945 to 0.965 g / cm 3 , and a trace amount of propylene, butene-1, penten-1, hexene-1, and octene-1. Etc. ⁇ -olefin may be copolymerized.
  • melt flow rate (MFR) of the high-density polyethylene resin The smaller the melt flow rate (MFR) of the high-density polyethylene resin, the better the film formability, and the melt flow rate (MFR) is particularly suitable for blow molding and also excellent in mechanical strength.
  • MFR melt flow rate
  • the MFR is an index showing the melt viscosity of the thermoplastic resin specified in JIS K7210.
  • the weight average molecular weight of the high-density polyethylene resin when the weight average molecular weight is less than 100,000, the mechanical strength or creep resistance and the like decrease, and conversely, when the weight average molecular weight exceeds 500,000, the melt viscosity becomes high. Therefore, the heat melt moldability is lowered and it becomes difficult to obtain a uniform container body, so 100,000 to 500,000 is preferable.
  • the weight average molecular weight is a value measured by gel permeation chromatography (GPC).
  • medium-density polyethylene resin low-density polyethylene resin
  • linear low-density polyethylene resin polypropylene resin, ethylene-propylene copolymer, ethylene-butene-1 copolymer, and ethylene-pentene-1 copolymer weight.
  • An olefin resin such as a propylene-butene copolymer may be added in a small amount as long as the physical properties such as mechanical strength do not deteriorate.
  • the above-mentioned high-density polyethylene resin is coated with a heat stabilizer, a heat-resistant improver, a light stabilizer, an ultraviolet absorber, an antioxidant, an antistatic agent, an impact improver, an antifogging agent, a flame retardant, and a coloring agent, if necessary. Agents and the like may be added.
  • the container body is made of high-density polyethylene resin, it is easily charged and easily adsorbs dust (fine particles). Therefore, dust (fine particles) easily adheres to the surface of the photomask substrate and is easily contaminated. Therefore, it is preferable to add an antistatic agent, and the surface intrinsic resistance value thereof is 108 ⁇ or more and less than 10 10 ⁇ . Is preferable.
  • antistatic agent examples include antistatic agents conventionally used for processing plastics such as glycerin fatty acid ester-based surfactants and organic boron-based antistatic agents, carbon black and the like.
  • the antistatic agent is preferably an organoboron-based antistatic agent, and examples of the organoboron-based antistatic agent include a donor-acceptor-based molecular compound-type antistatic agent represented by the general formula (1).
  • R 1 and R 2 are independently acyl groups or H having 12 to 22 carbon atoms, and at least one of R 1 and R 2 is an acyl group having 12 to 22 carbon atoms, and R 3 , R 4 and R 5 are independently CH 3 , C 2 H 5 , CH 2 OH, C 2 H 4 OH, CH 2 CH (CH 3 ) OH, and an alkyl group or an alkenyl group having 12 to 22 carbon atoms.
  • An acyloxyalkyl group having a total carbon number of 13 to 25, or an acylaminoalkyl group having a total carbon number of 14 to 25, and at least one of R3, R4 , and R5 is an alkyl group having 12 to 22 carbon atoms. It is an alkenyl group, an acyloxyalkyl group having a total carbon number of 13 to 25, or an acylaminoalkyl group having a total carbon number of 14 to 25.
  • antistatic agent represented by the general formula (1) are represented by the following chemical formulas (2) to (12), for example.
  • the donor-acceptor-based molecular compound type antistatic agent represented by the above general formula (1) may be adsorbed on the surface of the inorganic filler powder to be a powdery antistatic agent.
  • the inorganic filler powder is not particularly limited as long as it is an inorganic filler powder conventionally used for plastic molded bodies, and is, for example, calcium carbonate, magnesium carbonate, aluminum oxide, magnesium oxide, titanium oxide, magnesium hydroxide. , Tarku, mica, clay and the like.
  • the method for producing the inorganic filler powder in which the antistatic agent is adsorbed on the surface is not particularly limited.
  • the inorganic filler powder is supplied to an organic solvent in which the antistatic agent is dissolved, and the mixture is stirred and mixed to charge the powder.
  • a method of evaporating the organic solvent after adsorbing the inhibitor on the surface of the inorganic filler powder can be mentioned.
  • the organic solvent is not particularly limited as long as it is an organic solvent capable of dissolving the antistatic agent, and for example, lower alcohols such as methyl alcohol, ethyl alcohol, propyl alcohol, isopropyl alcohol and butyl alcohol, acetone, methyl ethyl ketone, and the like.
  • lower alcohols such as methyl alcohol, ethyl alcohol, propyl alcohol, isopropyl alcohol and butyl alcohol, acetone, methyl ethyl ketone, and the like.
  • ketones such as methylisobutylketone
  • esters such as ethyl acetate and isopropyl acetate
  • tetrahydrofuran and the like are examples of these compounds that are examples thereof.
  • the amount of the donor / acceptor-based molecular compound type antistatic agent represented by the general formula (1) is generally preferably 0.01 to 1.0 part by weight with respect to 100 parts by weight of the high-density polyethylene resin.
  • FIG. 1 is a schematic cross-sectional view showing an example of the photomask container of the present invention.
  • 1 is a container body and 2 is a lid. Both the container body 1 and the lid 2 are box-shaped, and the photomask substrate storage portion 3 is formed by covering the container body 1 with the lid 2.
  • 4, 4, ... Are photomask substrate support and fixing portions, which are formed on the photomask substrate storage portion 3 side of the container body 1 and the lid body 2, and when the container body 1 is covered with the lid body 2, the container body is formed.
  • the photomask substrate support / fixing portion 4 of 1 and the photomask substrate support / fixing portion 4 of the lid 2 are formed so as to face each other.
  • Reference numeral 5 is a handle portion.
  • the container body 1 from which the lid 2 has been removed is placed horizontally, and the photomask substrate 6 is placed on the photomask substrate support fixing portion 4 of the container body 1. Place on top.
  • the lid 2 is placed so that the photomask substrate accommodating portion 3 is formed, and the photomask substrate is supported and fixed by the photomask substrate supporting and fixing portion 4 of the container body 1 and the photomask substrate supporting and fixing portion 4 of the lid 2. Hold 6 and fix it.
  • a band-shaped body such as a synthetic resin band-shaped body or a metal band-shaped body, or fixed with a fixing jig such as a snap lock or a ratchet buckle lock.
  • the photomask container 1 may be transported horizontally as it is, but the casters are attached to the photomask container 1, and the casters are raised so as to be on the lower side, and the photo is taken.
  • the mask substrate 6 may be transported in a standing state.
  • FIG. 2 is a plan view showing an example of the container body 1 of the photomask container of the present invention
  • FIG. 3 is a sectional view taken along the line AA in FIG. 2
  • FIG. 4 is a sectional view taken along the line BB in FIG.
  • reference numeral 1 denotes a container body, which is a box-shaped body including a substantially flat plate-shaped base portion 11 and a side wall portion 12 installed in a direction substantially perpendicular to the end portion of the base portion 11.
  • the base portion 11 is a two-layer hollow structure composed of an inner wall 111 and an outer wall 112, and ribs 13 are provided by partially forming a hollow portion 113 between them.
  • the base 11 may be a two-layer structure in which the inner wall 111 and the outer wall 112 are in close contact with each other.
  • the side wall portion 12 is a two-layer hollow structure composed of an inner wall 111 and an outer wall 112, and a hollow portion 113 is formed between them, and the thickness thereof is made thicker than the thickness of the base portion for weight reduction and reinforcement. ing.
  • 5, 5 are handle portions for inserting a finger to move the photomask container, and a plurality of handles are formed at the upper end portion of the side wall portion 12.
  • the handle portion 5 is formed by providing a through hole in a side edge portion in which the upper end portion of the side wall portion 12 extends laterally.
  • Reference numeral 42 is a packing interposed between the bolt 41 and the base portion 11 for tightly fixing the two, and 43 is fixed to the inside below the photomask substrate support fixing portion 4 and screwed the bolt 41.
  • This is an insert nut for fixing the base portion 11 and the photomask substrate accommodating portion 3.
  • Any conventionally known supporting holding means, positioning holding means (see, for example, Patent Documents 1 and 2) and the like may be used in combination with the photomask substrate supporting and fixing portion 4.
  • reference numeral 7 is a degassing part for communicating the inside and the outside of the photomask substrate storage part 3 and allowing the inside and outside gas to move, and keeping the temperature, humidity, pressure, etc. inside and outside the same.
  • the degassing portion 7 is provided with a through hole 71 so that a step portion 72 is formed on the inner wall 111 and the outer wall 112 of the base portion 11, and a filter 73 is laminated on the step portion 72 so as to close the through hole 71.
  • the filter 73 is formed by being fixed to the base 11 by a ring-shaped fixative 74.
  • the gas inside and outside the photomask substrate storage portion 3 communicates with each other, and there is no difference in air pressure, humidity and temperature between the inside and outside of the photomask substrate storage portion 3, and the airplane. It is possible to prevent the photomask container from being deformed or destroyed due to the difference in atmospheric pressure during transportation, and to prevent dew condensation from occurring in the photomask substrate housing portion 3 due to the temperature difference.
  • reference numeral 8 is a peephole portion for inspecting the inside of the photomask substrate storage portion 3 and observing the stored photomask substrate 6.
  • the peephole portion 8 is formed by forming a through hole in the base portion 11 and inserting a transparent resin plate such as a polycarbonate resin or ABS resin, a glass plate, or the like.
  • reference numeral 9 denotes an O-ring for tightly sealing the photomask substrate storage portion 3 when the lid body 2 is covered with the container body 1 to form the photomask substrate storage portion 3, and the O-ring 9 is a container. It is fitted into a concave groove formed on the upper surface of the side wall portion 12 of the main body 1.
  • the O-ring 9 is preferably made of an elastic resin such as silicon-based rubber, fluororubber, urethane-based rubber, or norbornene-based rubber.
  • 13, 13 ... Are ribs provided on the base 11 to reinforce the container body 1.
  • the rib 13 is formed by providing a hollow portion 113 between the inner wall 111 and the outer wall 112.
  • the rib 13 may be formed by bending the inner wall 111 and / and the outer wall 112 to form the hollow portion 113 or without forming the hollow portion 113. Further, it is preferable that a large number of ribs 13 are provided, and the ribs 13 may also be provided on the side wall portion 12.
  • fixing jigs for example, snap locks, ratchet locks, etc.
  • the photomask container formed by covering the container body 1 with the lid 2 and forming the photomask substrate storage portion. It is a notch portion provided near the upper end portion of the side wall portion 12 for installing a buckle lock or the like). Further, in order to hermetically fix the photomask container, it may be bound with a string-shaped body or a band-shaped body made of synthetic resin or metal.
  • FIG. 5 is a plan view showing different examples of the container body of the photomask container of the present invention
  • FIG. 6 is a sectional view taken along the line CC in FIG.
  • Reference numeral 1 is a container body, and the container body 1 is a box composed of a substantially flat plate-shaped base portion 11 integrally molded by blow molding and a side wall portion 12 installed in a direction substantially perpendicular to the end portion of the base portion 11.
  • the base portion 11 and the side wall portion 12 are a partially hollow two-layer hollow structure composed of an inner wall 111 and an outer wall 112.
  • reference numeral 12 denotes a side wall portion installed in a direction substantially perpendicular to the end portion of the base portion 11, and the side wall portion 12 is a hollow two-layer structure in which a hollow portion 113 is formed inside by an inner wall 111 and an outer wall 112. be. Since the side wall portion 12 is a hollow two-layer structure, it is made thicker than the thickness of the base portion 11, and a concave groove is formed on the upper surface of the side wall portion 12, and an O-ring 9 is fitted in the concave groove. It was
  • 4, 4, ... Are photomask substrate support and fixing portions for mounting, supporting and fixing the photomask substrate.
  • the inner wall 111 of the base portion 11 and / or the inner wall 111 of the side wall portion 12 is deformed toward the photomask substrate storage portion (upper or inward), and the inner wall 111 of the base portion 11 and the side wall portion 12 and the inner wall 111 of the base portion 11 and the side wall portion 12 are deformed.
  • a hollow portion 113 is formed between the outer walls 112, and is integrally formed with the base portion 11 and the side wall portion 12.
  • a stepped portion having a low inside is formed by the hollow portion 113.
  • the inside of the step portion is low, the upper surface of the low step portion is the photomask substrate mounting portion 44, and the high side surface outside the step portion is the lateral positioning portion 45. That is, the photomask substrate to be stored and transported has its end mounted on the photomask substrate mounting portions 44, 44 ..., and is positioned and firmly fixed by the lateral positioning portions 45, 45 ... To.
  • the container body 1 is preferably molded by a blow molding method.
  • a thermoplastic resin is extruded in a molten state to form a tubular parison, and then the obtained parison is supplied to a molding die, and a gas is blown into the parison to form the molding die. It is a method of manufacturing a molded product by molding.
  • a large container body 1 can be integrally and easily molded, and the obtained container body 1 has a two-layer structure of an inner wall and an outer wall, and a hollow portion is partially formed. It has and is integrally molded without any seams, and is lightweight and has excellent mechanical strength.
  • the lid 2 is not particularly limited as long as it functions as a lid of the container body 1, but if the lid 2 has the same shape as the container body 1, the photomask substrate 6 is photographed as shown in FIG. It is preferable because it can be easily stored and held in the mask substrate storage unit 3. That is, the lid is made of a high-density polyethylene resin having a melflorate (MFR) of 0.6 (g / 10 minutes) or less, from a substantially flat base and a side wall suspended from the end of the base. It is preferably a box-shaped body and a two-layer structure composed of an inner wall and an outer wall.
  • MFR melflorate
  • an antistatic sheet, an antistatic molded body, or the like may be laminated on the inner wall of the base (on the side of the photomask substrate storage portion) so that the inside of the photomask substrate storage portion is not charged, or an antistatic paint is applied and laminated. You may.
  • the photomask container of the present invention is lightweight and has excellent mechanical strength, can firmly hold the photomask substrate, and is transported without dust (fine particles) adhering to or deforming on the surface. be able to. Even when transported under reduced pressure or low temperature, unnecessary stress is not applied to the photomask substrate or photomask container, dew condensation is suppressed in the photomask substrate storage part of the photomask container, and the cleanliness is excellent. Therefore, since it can be suitably transported by air by air, it can be suitably used as a photomask container for storing and transporting a photomask.
  • Container body 11 base 111 inner wall 112 outer wall 113 Hollow part 113 12 Side wall part 13 Rib 14 Notch recess 2 Lid 3 Photomask board storage part 4 Photomask board support fixing part 41 Bolt 42 Packing 43 Insert nut 44 Photomask board mounting part 45 Lateral positioning part 5 Handle part 6 Photomask Board 7 Degassing part 71 Through hole 72 Step part 73 Filter 74 Fixture 8 Peep window part 9 O-ring

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Packaging Frangible Articles (AREA)

Abstract

La présente invention concerne un récipient pour photomasque qui peut maintenir fermement un substrat de photomasque, qui supprime la condensation dans une partie de réception de substrat de photomasque, qui fournit un excellent niveau de propreté, qui rend difficile l'adhérence de débris (particules fines) sur la surface du substrat de photomasque, et qui est léger et qui présente un niveau supérieur de résistance mécanique.　La partie de réception de substrat de photomasque est formée par l'intermédiaire d'un corps de récipient et d'un corps de couvercle, et le récipient de photomasque est utilisé pour stocker et transporter le substrat de photomasque dans un état dans lequel il est logé dans la partie de réception de substrat de photomasque. Le récipient de photomasque est caractérisé en ce que le corps de récipient est un corps en forme de boîte formé à partir d'une résine de polyéthylène haute densité ayant un indice de fluidité à chaud (MFR) de 0,6 (g/10 min) ou moins et comprend une section de base sensiblement plane et une section de paroi latérale installée dans une direction sensiblement perpendiculaire par rapport à une partie d'extrémité de la section de base, et en ce qu'il est une structure creuse à deux couches comprenant une paroi interne et une paroi externe.
PCT/JP2021/030541 2020-08-21 2021-08-20 Récipient pour photomasque Ceased WO2022039254A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN202180050837.5A CN116097168A (zh) 2020-08-21 2021-08-20 光掩膜容器
KR1020237009146A KR20230049743A (ko) 2020-08-21 2021-08-20 포토마스크 용기
JP2022544017A JP7333925B2 (ja) 2020-08-21 2021-08-20 フォトマスク容器

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020-140441 2020-08-21
JP2020140441 2020-08-21

Publications (1)

Publication Number Publication Date
WO2022039254A1 true WO2022039254A1 (fr) 2022-02-24

Family

ID=80322971

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2021/030541 Ceased WO2022039254A1 (fr) 2020-08-21 2021-08-20 Récipient pour photomasque

Country Status (5)

Country Link
JP (1) JP7333925B2 (fr)
KR (1) KR20230049743A (fr)
CN (1) CN116097168A (fr)
TW (1) TWI859464B (fr)
WO (1) WO2022039254A1 (fr)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003140324A (ja) * 2001-11-06 2003-05-14 Shin Etsu Chem Co Ltd 基板収納容器
JP2007091296A (ja) * 2005-09-29 2007-04-12 Hoya Corp マスクブランク収納容器、マスクブランクの収納方法及びマスクブランク収納体
JP2008522414A (ja) * 2004-11-24 2008-06-26 インテグリス・インコーポレーテッド フォトマスクコンテナ
JP2008531416A (ja) * 2005-02-27 2008-08-14 インテグリス・インコーポレーテッド 絶縁システムを備えるレチクルポッド

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4476727B2 (ja) 2003-11-18 2010-06-09 株式会社 ネットプラスチック 大型精密シート状（半）製品用密封容器
TW200700925A (en) * 2004-11-24 2007-01-01 Entegris Inc Photomask container
JP2008032915A (ja) 2006-07-27 2008-02-14 Hoya Corp マスクケース
JPWO2013147187A1 (ja) * 2012-03-30 2015-12-14 三菱レイヨン株式会社 複合中空糸膜及び中空糸膜モジュール
JP6492269B2 (ja) * 2013-10-21 2019-04-03 株式会社Ｔｂｍ フィラー含有プラスチックシートの製造方法
JP6828276B2 (ja) * 2016-06-09 2021-02-10 大日本印刷株式会社 ヒートシール性樹脂フィルムおよびその製造方法、積層体ならびに包装材料
MX2020012574A (es) * 2018-06-04 2021-03-31 Sekisui Fuller Co Ltd Pelicula de resina termoplastica, bolsa fundible, y adhesivo de fusion por calor envasado.

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003140324A (ja) * 2001-11-06 2003-05-14 Shin Etsu Chem Co Ltd 基板収納容器
JP2008522414A (ja) * 2004-11-24 2008-06-26 インテグリス・インコーポレーテッド フォトマスクコンテナ
JP2008531416A (ja) * 2005-02-27 2008-08-14 インテグリス・インコーポレーテッド 絶縁システムを備えるレチクルポッド
JP2007091296A (ja) * 2005-09-29 2007-04-12 Hoya Corp マスクブランク収納容器、マスクブランクの収納方法及びマスクブランク収納体

Also Published As

Publication number Publication date
JP7333925B2 (ja) 2023-08-28
TWI859464B (zh) 2024-10-21
TW202212460A (zh) 2022-04-01
JPWO2022039254A1 (fr) 2022-02-24
CN116097168A (zh) 2023-05-09
KR20230049743A (ko) 2023-04-13

Similar Documents

Publication Publication Date Title
US5588531A (en) Glass substrate transport box
JP4973875B2 (ja) フォトマスク用合成石英ガラス基板保管ケース
JP2011235963A (ja) 表示装置ガラス基板包装用ボックス
TWI690468B (zh) 具有強化圍阻的基板容器
TW201635010A (zh) 防塵薄膜組件收納容器
US20050152121A1 (en) Substrate accommodating tray
WO2022039254A1 (fr) Récipient pour photomasque
CN101111802B (zh) 大型光罩保护膜收纳容器
CN100450892C (zh) 大尺寸精密板状半成品或成品用气密容器
KR20230146493A (ko) 펠리클 수납 용기
JP2004051131A (ja) ガラス基板搬送用ボックス
JP2008030756A (ja) ガラス基板搬送用ボックス及びガラス基板搬送用包装体
WO2022215311A1 (fr) Contenant de réception de panneau
JP2005170507A (ja) 大型精密シート状（半）製品用密封容器
KR20070104242A (ko) 유리 기판용 반송 상자
JP2010275006A (ja) 基板保護用の保護部材および該保護部材を用いた基板の保護方法
JP5031857B2 (ja) ガラス基板のパックおよびアンパック方法
JP2010100308A (ja) 突起を有する平板部材の搬送容器とそれを用いた平板部材搬送体
CN102745420B (zh) 缓冲包装盒
JP3325385B2 (ja) ガラス基板搬送用ボックス
WO2022176244A1 (fr) Récipient de stockage de panneau
JP6696009B2 (ja) テープ装置
JP4485963B2 (ja) 板状物収納容器
JPH10278990A (ja) 基板搬送用ボックス
TWI574102B (zh) Piege film assembly container

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 21858397

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2022544017

Country of ref document: JP

Kind code of ref document: A

ENP Entry into the national phase

Ref document number: 20237009146

Country of ref document: KR

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 21858397

Country of ref document: EP

Kind code of ref document: A1