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WO2021015517A1 - Dispositif de mesure d'épaisseur - Google Patents

Dispositif de mesure d'épaisseur Download PDF

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Publication number
WO2021015517A1
WO2021015517A1 PCT/KR2020/009536 KR2020009536W WO2021015517A1 WO 2021015517 A1 WO2021015517 A1 WO 2021015517A1 KR 2020009536 W KR2020009536 W KR 2020009536W WO 2021015517 A1 WO2021015517 A1 WO 2021015517A1
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WO
WIPO (PCT)
Prior art keywords
thickness
electromagnetic wave
specimen
frequency
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2020/009536
Other languages
English (en)
Korean (ko)
Inventor
김학성
박동운
오경환
김헌수
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Industry University Cooperation Foundation IUCF HYU
Original Assignee
Industry University Cooperation Foundation IUCF HYU
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Industry University Cooperation Foundation IUCF HYU filed Critical Industry University Cooperation Foundation IUCF HYU
Priority to US17/629,163 priority Critical patent/US20220268568A1/en
Publication of WO2021015517A1 publication Critical patent/WO2021015517A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • G01B15/025—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness by measuring absorption
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F17/00—Digital computing or data processing equipment or methods, specially adapted for specific functions
    • G06F17/10—Complex mathematical operations
    • G06F17/14—Fourier, Walsh or analogous domain transformations, e.g. Laplace, Hilbert, Karhunen-Loeve, transforms
    • G06F17/141—Discrete Fourier transforms
    • G06F17/142—Fast Fourier transforms, e.g. using a Cooley-Tukey type algorithm
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions

Definitions

  • the present invention relates to an apparatus for measuring thickness, and to an apparatus for measuring the thickness of a specimen using electromagnetic waves.
  • specimens having various thicknesses and shapes used for micro-precision parts are being manufactured.
  • the specimens may correspond to thin films. Since the specimens have a great influence on the performance of the product, it is necessary to manufacture the specimen so that the thickness of the specimen is uniformly formed. Therefore, it is necessary to precisely measure the thickness of the specimen during the manufacturing process of the specimen.
  • the embodiments provide a system for measuring the thickness of a specimen using electromagnetic waves.
  • Embodiments provide an apparatus for measuring the thickness of a specimen using electromagnetic waves.
  • Embodiments provide a thickness measuring apparatus that compares the thickness of a specimen using a peak point of electromagnetic waves measured using electromagnetic waves.
  • Embodiments provide a thickness measuring apparatus for calculating the thickness of a specimen in a frequency domain by using an FFT algorithm for an electromagnetic wave reflected from a specimen.
  • the embodiments provide a thickness measuring apparatus for calculating the thickness of the specimen by calculating a complex relative refractive index and an extinction coefficient in a frequency domain of an electromagnetic wave reflected from a specimen.
  • the embodiments provide a thickness measuring apparatus that calculates a complex relative refractive index and extinction coefficient of an electromagnetic wave reflected from a specimen in a frequency domain, and calculates the thickness of the specimen based on a previously stored function.
  • the embodiments provide a thickness measuring apparatus in which the thickness of a specimen is calculated by a function stored in advance, and the function can be modified by the calculated thickness information of the specimen.
  • the thickness measuring device includes a radiating unit for irradiating electromagnetic waves in a direction of a specimen, a receiving unit for receiving an electromagnetic wave output from a direction in which the specimen is positioned, and a signal received from the And a control unit for calculating a thickness, wherein when the specimen has a first thickness, the reception unit receives a first electromagnetic wave, and when the specimen has a second thickness, the reception unit receives a second electromagnetic wave, and the When the first electromagnetic wave has a first peak value at a first time point, the second electromagnetic wave has a second peak value at a second time point, and the first thickness is greater than the second thickness, the first peak value is It is a value smaller than the second peak value.
  • the thickness measurement apparatus may measure the thickness of the specimen by irradiating electromagnetic waves on the specimen, and thus, there is an effect of performing a non-destructive test on the specimen.
  • the electromagnetic wave is a terahertz wave, it has a stronger transmittance than visible light or infrared light, so it can be used in the presence of external light, and there is an effect of measuring the thickness of the specimen without a separate process of blocking external light.
  • the thickness measurement apparatus can compare the thickness of the specimen based on the peak value of the electromagnetic wave reflected and received by the specimen and the point at which the peak occurs, so that it is easy to compare the thickness of a plurality of specimens in a short time. You can shorten the time to measure.
  • the thickness measuring apparatus may measure the thickness of the specimen based on a previously stored function by irradiating an electromagnetic wave toward a specimen and calculating a complex relative refractive index and an extinction coefficient in the frequency domain of the electromagnetic wave reflected on the specimen, There is an effect of improving the accuracy of the calculated thickness of the specimen.
  • a function stored in advance can be modified each time the thickness measurement apparatus calculates the thickness of the specimen, so that accuracy is improved each time the thickness of the specimen is measured.
  • the thickness measuring apparatus may measure the thickness of a specimen in a non-contact and non-destructive manner.
  • the accuracy can be improved than that calculated based on the time difference of the electromagnetic waves reflected or transmitted from the specimen, there is an effect of having high utilization.
  • FIG. 1 is a diagram illustrating a thickness measurement system according to an exemplary embodiment.
  • FIG. 2 is a block diagram illustrating a control unit, an emission unit, and a receiving unit of a thickness measurement apparatus according to an exemplary embodiment.
  • FIG. 3 is a block diagram illustrating a configuration of a control unit of a thickness measuring apparatus according to an exemplary embodiment.
  • FIGS. 4 and 5 are diagrams illustrating electromagnetic waves reflected from a specimen in a thickness measuring apparatus according to an exemplary embodiment.
  • FIG. 6 is a diagram illustrating an electromagnetic wave received by a receiver of a thickness measuring apparatus according to an exemplary embodiment as a graph of time.
  • FIGS. 7 and 8 are diagrams illustrating a graph of a complex relative refractive index versus frequency using an FFT algorithm for an electromagnetic wave received by a receiver of a thickness measuring apparatus according to an exemplary embodiment.
  • FIGS. 9 and 10 are diagrams illustrating a graph of an extinction coefficient versus frequency for an electromagnetic wave received by a receiver of a thickness measurement apparatus according to an exemplary embodiment using an FFT algorithm.
  • the emission unit for irradiating electromagnetic waves in the direction of the specimen A receiving unit for receiving an electromagnetic wave output from a direction in which the specimen is positioned; And a control unit configured to receive a signal from the receiving unit and calculate the thickness of the specimen, and when the specimen has a first thickness, the reception unit receives a first electromagnetic wave, and when the specimen has a second thickness, the The receiving unit receives a second electromagnetic wave, the first electromagnetic wave has a first peak value at a first time point, the second electromagnetic wave has a second peak value at a second time point, and the first thickness is the second thickness When it is larger, a thickness measuring apparatus in which the first peak value is smaller than the second peak value may be provided.
  • a thickness measuring apparatus may be provided in which the first viewpoint is earlier than the second viewpoint.
  • a thickness measuring apparatus in which the first thickness is in inverse proportion to the first point in time and the first peak value may be provided.
  • control unit includes a complex relative refractive index calculator for calculating a complex relative refractive index of the specimen using a Fast Fourier Transform (FFT) algorithm for the first electromagnetic wave and the second electromagnetic wave, and an extinction coefficient calculator
  • FFT Fast Fourier Transform
  • extinction coefficient calculator A thickness measuring device including may be provided.
  • control unit includes a function storage unit for storing a function of a complex relative refractive index and an extinction coefficient for the thickness of the specimen in a frequency domain in advance, and a value calculated from the complex relative refractive index calculation unit and the extinction coefficient calculation unit And a thickness calculator configured to calculate a thickness of the specimen based on a value stored in the function storage unit.
  • control unit includes a data storage unit for storing the data calculated from the thickness calculation unit, and the data stored in the data storage unit is transferred to the function storage unit, so that the function stored in the function storage unit is modified. Can be provided.
  • a thickness measuring apparatus may be provided in which the complex relative refractive index of the first electromagnetic wave is smaller than the complex relative refractive index of the second electromagnetic wave.
  • a thickness measuring apparatus may be provided in which the extinction coefficient of the first electromagnetic wave is greater than the extinction coefficient of the second electromagnetic wave.
  • a thickness measurement apparatus may be provided that also increases the complex relative refractive index of the first electromagnetic wave.
  • the first electromagnetic wave has a first complex relative refractive index at a first frequency, a second complex relative refractive index at a second frequency, and the first electromagnetic wave has a first complex relative refractive index at the first frequency.
  • 1 has a slope, a second slope with respect to the second complex relative refractive index at the second frequency, and when the first frequency is less than the second frequency, the first slope is greater than the second slope.
  • a thickness measuring apparatus may be provided in which the extinction coefficient of the first electromagnetic wave decreases.
  • the first electromagnetic wave has a first extinction coefficient at a first frequency, a second extinction coefficient at a second frequency, and the first electromagnetic wave has a first slope with respect to the first extinction coefficient at the first frequency. And having a second slope with respect to the second extinction coefficient at the second frequency, and when the first frequency is less than the second frequency, the absolute value of the first slope is greater than the absolute value of the second slope.
  • a thickness measuring device may be provided.
  • first electromagnetic wave and the second electromagnetic wave may be provided with a thickness measuring apparatus of terahertz fine.
  • a thickness measurement system according to an embodiment of the present application will be described.
  • FIG. 1 is a diagram illustrating a thickness measurement system according to an exemplary embodiment.
  • the thickness measurement system 1 may include a thickness measurement device 5, a specimen 10, and a supporter 30.
  • the thickness measurement system 1 is a system for measuring the thickness of the specimen 10.
  • the thickness measurement system 1 may measure the thickness of the specimen 10 disposed on the supporter 30.
  • the thickness measuring apparatus 5 may include a control unit 100, an emission unit 200, a reception unit 300, and a beam splitter 400.
  • the thickness measurement device 5 may measure the thickness of the specimen 10 supported by the supporter 30 by emitting electromagnetic waves from the emission unit 200 under the control of the controller 100.
  • the thickness measuring device 5 may measure the thickness of the specimen 10 by receiving an electromagnetic wave reflected from the specimen 10 and passing through the beam splitter 400 by the receiver 300.
  • the thickness measuring device 5 may measure the thickness of the specimen 10 based on the electromagnetic wave reflected from the specimen 10.
  • the compound deposited on the specimen 10 may be silicon nitride or another material.
  • the specimen 10 may have a certain thickness.
  • the compound deposited on the specimen 10 may have a certain thickness.
  • the specimen 10 may correspond to a thin film.
  • the specimen 10 may be silicon nitride or other material deposited on a silicon wafer.
  • the specimen 10 may be a first specimen having a first thickness d1.
  • the specimen 10 may be a second specimen having a second thickness d2.
  • the first specimen and the second specimen may be the same specimen or different specimens.
  • the first thickness d1 may be the same or different from the second thickness d2.
  • At least one area of the specimen 10 may be in contact with the supporter 30.
  • the specimen 10 may be fixed to the supporter 30 or may be placed without being fixed.
  • the supporter 30 may serve to support the specimen 10.
  • the supporter 30 may be made of a material capable of reflecting or transmitting the electromagnetic wave emitted from the emission unit 200. When at least a part of the electromagnetic wave emitted from the emission part 200 passes through the specimen 10 and reaches the supporter 30, the supporter 30 At least a part of the transmitted electromagnetic wave may be reflected or transmitted.
  • the control unit 100 may calculate the thickness of the specimen 10 by irradiating the electromagnetic wave in the direction of the specimen 10 by the emission unit 200.
  • the specimen 10 When at least a part of the electromagnetic wave emitted from the emission part 200 reaches the surface of the specimen 10 under the control of the controller 100, the specimen 10 reaches the surface of the specimen 10 At least part of an electromagnetic wave may be reflected or transmitted.
  • the specimen 10 When at least some of the electromagnetic waves emitted from the emission unit 200 reach the rear surface of the specimen 10 under the control of the control unit 100, the specimen 10 reaches the rear surface of the specimen 10 At least part of an electromagnetic wave may be reflected or transmitted.
  • the control unit 100 may receive the electromagnetic wave output from the specimen 10 by the receiving unit 300 and know the received wavelength.
  • the control unit 100 may calculate the thickness of the specimen 10 based on the wavelength received by the receiving unit 300.
  • the control unit 100 may calculate the thickness of the specimen 10 based on the wavelength received by the receiving unit 300.
  • the control unit 100 may calculate the thickness of the specimen 10 based on a peak generation time and a peak value of an electromagnetic wave included in a predetermined time interval among wavelengths received by the receiver 300.
  • the control unit 100 may detect a peak value and a peak generation time of the electromagnetic wave received by the receiving unit 300.
  • the control unit 100 may calculate the thickness of the specimen 10 based on the peak generation time of the electromagnetic wave received by the receiving unit 300.
  • the control unit 100 may calculate a complex relative refractive index and an extinction coefficient of the electromagnetic wave using a Fast Fourier Transform (FFT) algorithm on the electromagnetic wave received by the receiving unit 300.
  • FFT Fast Fourier Transform
  • the control unit 100 may pre-store a function of the complex relative refractive index and the thickness of the specimen.
  • the control unit 100 may store an extinction coefficient and a function of the thickness of the specimen in advance.
  • the control unit 100 may calculate the thickness of the specimen 10 based on a complex relative refractive index of the electromagnetic wave received by the receiving unit 300 and a previously stored complex relative refractive index-thickness function.
  • the control unit 100 may calculate the thickness of the specimen 10 based on an extinction coefficient of the electromagnetic wave received by the receiving unit 300 and a pre-stored extinction coefficient-thickness function.
  • the discharge part 200 may be located above the specimen 10.
  • the discharge part 200 may be positioned to be spaced apart in a vertical direction with respect to the specimen 10.
  • the discharge part 200 may face the specimen 10.
  • the emission unit 200 may emit electromagnetic waves.
  • the emission part 200 may emit terahertz waves.
  • the wavelength of the electromagnetic wave emitted from the emission unit 200 may be 3 mm to 30 ⁇ m.
  • the electromagnetic wave may be a continuous type or a pulse type.
  • One or a plurality of light sources for the electromagnetic wave may be used.
  • the frequency of the electromagnetic wave may be 0.1 THz to 10 THz.
  • the emitter 200 may emit electromagnetic waves within the frequency range and may have a stronger transmittance than visible light or infrared light.
  • the electromagnetic wave emitted from the emission unit 200 can be used in the presence of external light, so that the thickness of the specimen 10 can be measured without a separate process of blocking external light.
  • the electromagnetic wave emitted from the emission unit 200 has a strong transmittance, so that it may be reflected or transmitted in at least one area on the surface of the specimen 10 to reach the rear surface of the specimen 10.
  • the receiving unit 300 may receive an electromagnetic wave reflected by the specimen 10.
  • the receiving unit 300 may be spaced apart from the beam splitter 400.
  • the receiving unit 300 may be located on a path through which the electromagnetic wave reflected from the specimen 10 is reflected through the beam splitter 400. From the beam splitter 400, a direction toward the emission unit 200 and a direction toward the reception unit 300 may form a right angle.
  • the receiving unit 300 may receive different electromagnetic waves according to the thickness of the specimen 10.
  • the receiving unit 300 may receive a first electromagnetic wave w1 that is emitted from the emission unit 200 and reflected by the first specimen having the first thickness d1 and output.
  • the receiving unit 300 may receive a second electromagnetic wave w2 that is emitted from the emission unit 200 and reflected by the second specimen having the second thickness d2 and output.
  • the beam splitter 400 may be located between the emission part 200 and the specimen 10.
  • the beam splitter 400 may be located on a path of an electromagnetic wave emitted from the emission part 200 toward the specimen 10.
  • the beam splitter 400 may reflect or transmit a part of incident light.
  • the beam splitter 400 may transmit a part of the light irradiated from the emission unit 200, the transmitted light is reflected by the specimen 10 on the supporter 30, and a part of the reflected light is It may be reflected by the splitter 400 and received by the receiving unit 300.
  • An optical path in the thickness measurement system 1 according to an embodiment of the present invention is as follows.
  • the emission unit 200 may emit electromagnetic waves in the direction of the specimen 10.
  • the electromagnetic wave emitted from the emission unit 200 may reach the beam splitter 400. At least a portion of the electromagnetic wave reaching the beam splitter 400 may reach the surface of the specimen 10.
  • At least a portion of the electromagnetic wave reaching the surface of the specimen 10 is reflected from the surface of the specimen 10. At least a part of the electromagnetic wave reaching the surface of the specimen 10 is transmitted to reach the rear surface of the specimen 10. At least a portion of the light reaching the rear surface of the specimen 10 is reflected from the rear surface of the specimen 10.
  • Electromagnetic waves reflected from the surface and the rear surface of the specimen 10 may reach the beam splitter 400. At least a part of the electromagnetic wave reaching the beam splitter 400 may reach the receiver 300.
  • the receiving unit 300 may receive electromagnetic waves reflected from the surface of the specimen 10.
  • the receiving unit 300 may receive an electromagnetic wave reflected from the rear surface of the specimen 10.
  • optical path of the electromagnetic wave described above is an embodiment of the present invention, and the optical path of the electromagnetic wave in the present invention is not limited thereto.
  • the optical path of the electromagnetic wave may vary depending on the arrangement of the configuration of the thickness measuring device 5.
  • FIG. 2 is a block diagram illustrating a control unit, an emission unit, and a receiving unit of a thickness measurement apparatus according to an exemplary embodiment.
  • the thickness measuring apparatus 5 includes the control unit 100, the emission unit 200, and the reception unit 300.
  • the control unit 100 may control both the emission unit 200 and the reception unit 300.
  • the emission unit 200 may be operated by a signal from the control unit 100.
  • the emission unit 200 may irradiate electromagnetic waves in the direction of the specimen 30 by a signal from the control unit 100.
  • the receiving unit 300 may operate by a signal from the control unit 100.
  • the receiving unit 300 may receive an electromagnetic wave output from the specimen 10 by a signal from the control unit 100.
  • FIG. 3 is a block diagram illustrating a configuration of a control unit of a thickness measuring apparatus according to an exemplary embodiment.
  • the control unit 100 of the thickness measurement device 5 includes a driving unit 110, a receiving control unit 120, a peak detection unit 130, a function storage unit 140, and an FFT.
  • a processing unit 150, a thickness calculating unit 160, a data storage unit 170, and a data output unit 180 may be included.
  • the FFT processing unit 150 may include a complex relative refractive index calculation unit 151 and an extinction coefficient calculation unit 153.
  • the driving unit 110 may control the emission unit 200 to emit electromagnetic waves.
  • the driving unit 110 may control to emit electromagnetic waves when the specimen 10 is positioned at a position corresponding to the emission unit 200.
  • the driving unit 110 may control to emit electromagnetic waves.
  • the reception control unit 120 may control the reception unit 300 to receive an electromagnetic wave.
  • the receiving unit 300 may receive an electromagnetic wave under the control of the receiving control unit 120.
  • the reception unit 300 may transmit a result of the received wavelength to the reception control unit 120.
  • the reception control unit 120 may control to transmit the result of the wavelength received by the reception unit 300.
  • the reception control unit 120 may transmit a result of the received wavelength to the FFT processing unit 150.
  • the peak detection unit 130 may detect a peak value and a peak generation time of the electromagnetic wave received by the reception unit 300.
  • the peak detection unit 130 may detect a peak value and a peak occurrence time of each of a plurality of electromagnetic waves received by the reception unit 300.
  • the peak detection unit 130 may detect a peak value and a peak generation time of the electromagnetic wave and transmit the result to the thickness calculation unit 160 and the data storage unit 180.
  • the function storage unit 140 may pre-store a function for a correlation between the complex relative refractive index and the thickness of the specimen in the frequency domain.
  • the function storage unit 140 may pre-store a function for a correlation between the extinction coefficient and the thickness of the specimen in the frequency domain.
  • the function for the complex relative refractive index-thickness stored in the function storage unit 140 may be obtained at a specific frequency. Accuracy can be improved by obtaining a function of the complex relative refractive index-thickness at a frequency where the magnitude of the electromagnetic wave is 45 dB or more.
  • the function of the extinction coefficient-thickness stored in the function storage unit 140 may be obtained at a specific frequency. Accuracy can be improved by obtaining a function of the extinction coefficient-thickness at a frequency where the magnitude of the electromagnetic wave is 45 dB or more.
  • the FFT processing unit 150 may receive the result of the wavelength received by the reception control unit 120 from the reception reception unit 300.
  • the FFT processing unit 150 may convert a result received from the reception control unit 120 from a time domain to a frequency domain using a Fast Fourier Transform (FFT) algorithm.
  • FFT Fast Fourier Transform
  • the FFT processing unit 150 may include a complex relative refractive index calculating unit 151 capable of calculating a complex relative refractive index in an electromagnetic wave in a frequency domain.
  • the FFT processing unit 150 may include an extinction coefficient calculator 151 capable of calculating an extinction coefficient in an electromagnetic wave in a frequency domain.
  • the complex relative refractive index calculation unit 151 may calculate a complex relative refractive index of an electromagnetic wave.
  • the complex relative refractive index calculation unit 151 may calculate a relationship between the complex relative refractive index according to the frequency.
  • the extinction coefficient calculator 153 may calculate an extinction coefficient of an electromagnetic wave.
  • the extinction coefficient calculating unit 153 may calculate a relationship between the extinction coefficient according to the frequency.
  • the complex relative refractive index calculation unit 151 and the extinction coefficient calculation unit 153 may transfer the calculated result to the thickness calculation unit 160 and the function storage unit 140.
  • the thickness calculation unit 160 may calculate the thickness of the specimen 10.
  • the thickness calculator 160 may calculate the thickness of the specimen 10 by using the results transmitted from the peak detection unit 130 and the FFT processing unit 150.
  • the thickness calculation unit 160 may calculate the thickness of the specimen 10 based on a peak value and a peak occurrence time of the electromagnetic wave detected by the peak detection unit 130.
  • the thickness calculating unit 160 may calculate the thickness of the specimen 10 based on the complex relative refractive index of the electromagnetic wave calculated by the complex relative refractive index calculating unit 151.
  • the thickness calculation unit 160 may calculate the thickness of the specimen 10 based on a complex relative refractive index-thickness function of the specimen 10 predetermined in the function storage unit 140.
  • the thickness calculation unit 160 may calculate the thickness of the specimen 10 based on the absorption coefficient of the electromagnetic wave calculated by the absorption coefficient calculation unit 153.
  • the thickness calculation unit 160 may calculate the thickness of the specimen 10 based on an extinction coefficient-thickness function of the specimen 10 predetermined in the function storage unit 140.
  • the thickness calculation unit 160 may transfer the calculated result value to the data storage unit 180.
  • the thickness calculation unit 160 may transfer the calculated result value to the function storage unit 140.
  • the function transfer unit 140 may modify a complex relative refractive index-thickness function and an extinction coefficient-thickness function stored in advance based on results received from the FFT processing unit 150 and the thickness calculation unit 160. Accordingly, functions previously stored in the function transfer unit 140 may be modified by the FFT processing unit 150 and the thickness calculation unit 160.
  • the data storage unit 180 may store a peak value of an electromagnetic wave detected by the peak detection unit 130 and data on a peak occurrence time.
  • the data storage unit 180 may store data on the thickness of the specimen 10 calculated by the thickness calculation unit 160.
  • the data output unit 180 may output data on the thickness of the specimen 10 calculated by the thickness calculator 160.
  • FIGS. 4 and 5 are diagrams illustrating electromagnetic waves reflected and output from a specimen in a thickness measuring apparatus according to an exemplary embodiment.
  • FIG. 5 is a diagram illustrating an electromagnetic wave reflected and output from the specimen 10 when the specimen 10 is a thin film deposited on a silicon wafer.
  • the specimen 10 may correspond to an object.
  • the emission part 200 emits electromagnetic waves in the direction of the specimen 10.
  • the electromagnetic wave emitted from the emission part 200 may be reflected or transmitted by the specimen 10.
  • Electromagnetic waves transmitted through the surface of the specimen 10 and reflected from the rear surface of the specimen 10 may be received by the receiving unit 300 (not shown).
  • the specimen 10 may correspond to a thin film deposited on a silicon wafer.
  • the emission part 200 emits electromagnetic waves in the direction of the specimen 10.
  • the electromagnetic wave emitted from the emission part 200 may be reflected or transmitted from the surface of the specimen 10. It may pass through the surface of the specimen 10 discharged from the emission unit 200 and be reflected at an interface between the rear surface of the specimen 10 and the surface of the silicon wafer. Electromagnetic waves reflected from the interface between the rear surface of the specimen 10 and the surface of the silicon wafer may be received by the receiving unit 300 (not shown).
  • the emission unit 200 emits electromagnetic waves in the direction of the specimen 10.
  • the electromagnetic wave emitted from the emission part 200 may be reflected or transmitted by the specimen 10.
  • Electromagnetic waves transmitted through the surface of the specimen 10 and reflected from the rear surface of the specimen 10 may be received by the receiving unit 300 (not shown).
  • the emission part 200 emits electromagnetic waves in the direction of the first specimen having the first thickness d1.
  • the electromagnetic wave reflected from the first specimen is output in the form of a first electromagnetic wave w1.
  • the first electromagnetic wave w1 may be received by the receiving unit 300.
  • the emission part 200 emits electromagnetic waves in the direction of the second specimen having the second thickness d2.
  • the electromagnetic wave reflected from the second specimen is output in the form of a second electromagnetic wave w2.
  • the second electromagnetic wave w2 may be received by the receiving unit 300.
  • FIG. 6 is a diagram illustrating an electromagnetic wave received by a receiver of a thickness measuring apparatus according to an exemplary embodiment as a graph of time.
  • the first electromagnetic wave w1 reflected from the first specimen having the first thickness d1 is controlled by the reception control unit 120 of the control unit 100, and the reception unit 300 ) Is received.
  • the reception unit 300 may receive the first electromagnetic wave w1 reflected from the first specimen having the first thickness d1.
  • the first electromagnetic wave w1 has a first peak value p1, and a time point at which the first peak value p1 occurs is a first time point t1.
  • the first peak value p1 and the first time point t1 may be detected by the peak detector 130.
  • the receiving unit 300 may receive the second electromagnetic wave w2 reflected from the second specimen having the second thickness d2.
  • the second electromagnetic wave w2 has a second peak value p2, and a time point at which the second peak value p2 occurs is a second time point t2.
  • the second peak value p2 and the second time point t2 may be detected by the peak detector 130.
  • the peak value and the peak generation time of the received electromagnetic wave may be different.
  • the first peak value p1 may be a value smaller than the second peak value p2.
  • the first time point t1 at which the first peak value p1 is generated may be a time point earlier than the second time point t2 at which the second peak value p2 is generated.
  • the first thickness d1 may be in inverse proportion to the first time point t1 and the first peak value p1.
  • the second thickness d2 may be in inverse proportion to the second time point t2 and the second peak value p2.
  • the thickness of the specimen 10 may be in inverse proportion to a point at which the peak value and the peak value of the electromagnetic wave reflected and output from the specimen 10 occur.
  • the thickness measuring device 5 includes the first thickness d1 and the second specimen based on the peak values and peak generation times of the first electromagnetic wave w1 and the second electromagnetic wave w2.
  • the second thickness d2 of may be compared.
  • the thickness measurement device 5 includes the thickness of the first region based on the peak value and the peak generation time of the electromagnetic wave reflected and output from the first region of the specimen 10 and the electromagnetic wave reflected from the second region and output. The thickness of the second region can be compared. Therefore, the thickness measuring device 5 can measure the uniformity of the specimen 10.
  • FIG. 7 to 8 are graphs showing a complex relative refractive index according to a frequency using an FFT algorithm for an electromagnetic wave received by a receiver of a thickness measuring apparatus according to an exemplary embodiment.
  • FIG. 7 is a graph showing complex relative refractive indices of the first electromagnetic wave and the second electromagnetic wave according to frequency.
  • 8 is a graph showing a complex relative refractive index of the first electromagnetic wave according to frequency.
  • the first electromagnetic wave w1 is an electromagnetic wave reflected from the first specimen having the first thickness d1 and received by the receiver 300.
  • the second electromagnetic wave w2 is an electromagnetic wave reflected from the second specimen having the second thickness d2 and received by the receiver 300.
  • the complex relative refractive index of the first electromagnetic wave w1 has a value greater than the complex relative refractive index of the second electromagnetic wave w2 at any frequency. I can.
  • the thickness measuring device 5 may compare the thicknesses of the first specimen and the second specimen by comparing the complex relative refractive indices of the first specimen and the second specimen.
  • the first electromagnetic wave w1 is an electromagnetic wave reflected from the first specimen having the first thickness d1 and received by the receiver 300.
  • a value of the complex relative refractive index of the first electromagnetic wave w1 may increase as the frequency increases.
  • the complex relative refractive index of the first electromagnetic wave w1 may be in a proportional relationship with the frequency.
  • the complex relative refractive index with respect to the frequency of the first electromagnetic wave w1 may have a positive first order differential coefficient.
  • the complex relative refractive index with respect to the frequency of the first electromagnetic wave w1 may have a negative second-order differential coefficient.
  • the first electromagnetic wave w1 may have a first complex relative refractive index r1 at a first frequency f1.
  • the first electromagnetic wave w1 may have a first slope s1 that is an instantaneous slope with respect to the first complex relative refractive index r1 at a first frequency f1.
  • the first electromagnetic wave w1 may have a second complex relative refractive index r2 at a second frequency f2.
  • the first electromagnetic wave w1 may have a second slope s2 that is an instantaneous slope with respect to the second complex relative refractive index r2 at a second frequency f2.
  • the first slope s1 may be a value greater than the second slope s2.
  • the complex relative refractive index of the first electromagnetic wave w1 may have a proportional relationship with a frequency and a relationship in which an increase width decreases.
  • the complex relative refractive index calculator 151 may calculate complex relative refractive indices of the first electromagnetic wave w1 and the second electromagnetic wave w2 at a specific frequency.
  • the thickness calculating unit 160 may calculate the thickness of the specimen 10 based on a value calculated by the complex relative refractive index calculating unit 151 and a function previously stored in the function storage unit 140.
  • the complex relative refractive index-thickness function previously stored in the function storage unit 140 may be a decreasing graph.
  • the complex relative refractive index and the thickness of the specimen may have an inverse relationship.
  • the thickness of the specimen may decrease.
  • a result value calculated by the complex relative refractive index calculating unit 151 and a result value calculated by the thickness calculating unit 160 may be transferred to the function storage unit 140.
  • the function storage unit 140 may modify the complex relative refractive index-thickness function based on results received from the complex relative refractive index calculation unit 151 and the thickness calculation unit 160.
  • 9 to 10 are graphs showing an extinction coefficient according to a frequency using an FFT algorithm for an electromagnetic wave received by a receiver of a thickness measuring apparatus according to an exemplary embodiment.
  • 9 is a graph showing extinction coefficients of the first electromagnetic wave and the second electromagnetic wave according to frequency.
  • 10 is a graph showing the extinction coefficient of the first electromagnetic wave according to frequency.
  • the first electromagnetic wave w1 is an electromagnetic wave reflected from the first specimen having the first thickness d1 and received by the receiver 300.
  • the second electromagnetic wave w2 is an electromagnetic wave reflected from the second specimen having the second thickness d2 and received by the receiver 300.
  • the extinction coefficient of the first electromagnetic wave w1 may have a value smaller than the extinction coefficient of the second electromagnetic wave w2 at any frequency.
  • the thickness measuring apparatus 5 may compare the thickness of the first specimen and the second specimen by comparing the extinction coefficient of the first specimen and the second specimen.
  • the first electromagnetic wave w1 is an electromagnetic wave reflected from the first specimen having the first thickness d1 and received by the receiver 300.
  • the extinction coefficient of the first electromagnetic wave w1 may decrease as the frequency increases.
  • the extinction coefficient of the first electromagnetic wave w1 may be in inverse proportion to the frequency.
  • the extinction coefficient with respect to the frequency of the first electromagnetic wave w1 may have a negative first order differential coefficient.
  • the extinction coefficient for the frequency of the first electromagnetic wave w1 may have a positive second-order differential coefficient.
  • the first electromagnetic wave w1 may have a first extinction coefficient e1 at a first frequency f1.
  • the first electromagnetic wave w1 may have a first slope s1 that is an instantaneous slope with respect to the first extinction coefficient e1 at a first frequency f1.
  • the first electromagnetic wave w1 may have a second extinction coefficient e2 at a second frequency f2.
  • the first electromagnetic wave w1 may have a second slope s2 that is an instantaneous slope with respect to the second extinction coefficient e2 at a second frequency f2.
  • the absolute value of the first slope s1 may be a value greater than the absolute value of the second slope s2.
  • the extinction coefficient of the first electromagnetic wave w1 may be inversely proportional to the frequency and may be in a relationship in which the width of a decrease is decreased.
  • the extinction coefficient calculator 153 may calculate an extinction coefficient of the first electromagnetic wave w1 and the second electromagnetic wave w2 at a specific frequency.
  • the thickness calculating unit 160 may calculate the thickness of the specimen 10 based on a value calculated by the extinction coefficient calculating unit 153 and a function previously stored in the function storage unit 140.
  • the extinction coefficient-thickness function previously stored in the function storage unit 140 may be an increasing graph. At a specific frequency, the extinction coefficient and the thickness of the specimen may have a proportional relationship. As the extinction coefficient increases at a specific frequency, the thickness of the specimen may also increase.
  • a result value calculated by the extinction coefficient calculating unit 153 and a result value calculated by the thickness calculating unit 160 may be transferred to the function storage unit 140.
  • the function storage unit 140 may modify an extinction coefficient-thickness function based on results received from the extinction coefficient calculation unit 153 and the thickness calculation unit 160.

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  • Length Measuring Devices By Optical Means (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)

Abstract

La présente invention concerne, selon un mode de réalisation, un dispositif de mesure d'épaisseur comprenant : une unité d'émission permettant d'émettre une onde électromagnétique vers un échantillon ; une unité de réception permettant de recevoir l'onde électromagnétique émise dans la direction dans laquelle l'échantillon est situé ; et une unité de commande, laquelle reçoit un signal en provenance de l'unité de réception de façon à calculer l'épaisseur de l'échantillon. L'unité de réception reçoit une première onde électromagnétique lorsque l'échantillon présente une première épaisseur, l'unité de réception reçoit une seconde onde électromagnétique lorsque l'échantillon présente une seconde épaisseur, la première onde électromagnétique présente une première valeur de pic à un premier instant, la seconde onde électromagnétique présente une seconde valeur de pic à un second instant, et si la première épaisseur est supérieure à la seconde épaisseur, la première valeur de pic est inférieure à la seconde valeur de pic.
PCT/KR2020/009536 2019-07-24 2020-07-20 Dispositif de mesure d'épaisseur Ceased WO2021015517A1 (fr)

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KR20150103488A (ko) * 2014-03-03 2015-09-11 광주과학기술원 시료 집합체 및 이를 이용한 광학 상수 측정 장치
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