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WO2019022565A1 - Substrat - Google Patents

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Publication number
WO2019022565A1
WO2019022565A1 PCT/KR2018/008551 KR2018008551W WO2019022565A1 WO 2019022565 A1 WO2019022565 A1 WO 2019022565A1 KR 2018008551 W KR2018008551 W KR 2018008551W WO 2019022565 A1 WO2019022565 A1 WO 2019022565A1
Authority
WO
WIPO (PCT)
Prior art keywords
spacers
less
substrate
square
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2018/008551
Other languages
English (en)
Korean (ko)
Inventor
서한민
황지영
최현
이승헌
오동현
유정선
송철옥
배남석
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Chem Ltd
Original Assignee
LG Chem Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020180087288A external-priority patent/KR102068304B1/ko
Application filed by LG Chem Ltd filed Critical LG Chem Ltd
Priority to EP18838533.0A priority Critical patent/EP3660583B1/fr
Priority to JP2020503782A priority patent/JP7119278B2/ja
Priority to CN201880050289.4A priority patent/CN111033372B/zh
Priority to US16/633,289 priority patent/US11467452B2/en
Publication of WO2019022565A1 publication Critical patent/WO2019022565A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells

Definitions

  • the present application is directed to a substrate.
  • An optical device capable of adjusting the transmittance or color of light by disposing a light modulation layer between two substrates is known.
  • a so-called GH cell guest host cell in which a mixture of a liquid crystal host and a dichroic dye guest is applied is known.
  • spacers are located between the substrates to maintain the spacing between the two substrates.
  • Patent Document 1 European Patent Publication No. 0022311
  • the present application is directed to a substrate, for example, a substrate comprising a spacer.
  • a substrate for example, a substrate comprising a spacer.
  • an optical device in which spacers on a substrate are irregularly arranged with predetermined regularity and irregularity so that a so-called moire phenomenon does not occur and uniform optical characteristics are exhibited in all regions It is an object to provide a substrate.
  • ambient temperature is a natural, non-warming or non-warming temperature, usually at a temperature within the range of about 10 ° C to 30 ° C, or about 23 ° C or about 25 ° C.
  • the unit of temperature is degrees Celsius.
  • the physical properties measured at normal pressure are those measured when the measured pressure affects the result in the physical properties mentioned in this specification.
  • the term atmospheric pressure is a natural temperature without being pressurized or depressurized, and usually about 1 atm is referred to as atmospheric pressure.
  • the substrate of the present application comprises a base layer and a spacer present on the base layer.
  • the substrate layer any base layer used in a substrate in a configuration of a known optical device such as, for example, a liquid crystal display (LCD) can be applied without particular limitation.
  • the substrate layer may be an inorganic substrate layer or an organic substrate layer.
  • the inorganic base layer a glass base layer and the like can be exemplified.
  • the organic base layer various plastic films and the like can be exemplified.
  • Plastic films include TAC (triacetyl cellulose) film; Cycloolefin copolymer (COP) films such as norbornene derivatives; Polyacrylate films such as PMMA (poly (methyl methacrylate), polycarbonate films, polyolefin films such as PE (polyethylene) or PP (polypropylene), polyvinyl alcohol films, DAC (diacetyl cellulose)
  • a polyether sulfone (PES) film, a polyetheretherketone (PES) film, a polyphenylsulfone (PPS) film, a polyetherimide (PEI) film, a polyethylenemaphthatate (PEN) film, a polyethyleneterephtalate (PET) Film or PAR (polyarylate) film, and the like can be exemplified, but are not limited thereto.
  • the thickness of the substrate layer in the substrate of the present application is not particularly limited, and an appropriate range may be selected depending on the application.
  • the spacer may be fixed to the substrate layer.
  • the spacer may be fixed directly in contact with the substrate layer, or may be fixed on the other layer if there is another layer between the substrate layer and the spacer.
  • the type of the other layer includes a known layer necessary for driving the optical device, and for example, there is an electrode layer described later.
  • the plurality of spacers are arranged on the base layer at the same time with predetermined regularity and irregularity. Specifically, at least a part of the plurality of spacers on the base layer is irregular in terms of being arranged so as to have mutually different pitches, but is regular in terms of being arranged with substantially the same density between regions determined according to a predetermined rule.
  • At least some of the spacers disposed on the substrate layer in the substrate of the present application are arranged so as to have mutually different pitches.
  • pitch can be defined as the length of the side of the closed figure when a part of the plurality of spacers is selected so as to form a closed figure in which no other spacer is present therein. Unless otherwise specified, the unit of the pitch is ⁇ .
  • the length of the sides of the closed figure may be up to 600 ⁇ m. In other examples, the maximum length of the length of the sides of the closed figure may be about 550 ⁇ m or less, about 500 ⁇ m or less, about 450 ⁇ m or less, about 400 ⁇ m or less, about 300 ⁇ m or more, about 350 ⁇ m or more, or about 400 ⁇ m or more.
  • the minimum length of the lengths of the sides of the closed figure may be about 10 ⁇ or more.
  • the minimum length of the length of the sides of the closed figure may be less than about 100 ⁇ , less than about 90 ⁇ , less than about 80 ⁇ , less than 70 ⁇ or less than about 65 ⁇ , more than about 20 ⁇ , .
  • the maximum or minimum length can be obtained by using a known random number coordinate program, for example, a CAD, MATLAB or STELLA random number coordinate program or the like.
  • the formed figure to be formed may be triangular, square or hexagonal. That is, when three arbitrary spacers among a plurality of spacers are selected and connected to each other, the triangle is formed. When the four spacers are selected and connected to each other, the square is formed, and the six spacers are selected, When connected, the hexagon is formed.
  • Fig. 1 is an example of a quadrangle which is a closed figure formed by selecting arbitrarily four spacers among the spacers (black dots) existing on the base layer and connecting them with imaginary lines (dotted lines).
  • the closed figure formed at the time of determining the pitch is formed so that no spacer is present therein. Therefore, for example, in the case where spacers are formed so that other spacers are present inside as shown in FIG. 2, they are excluded when determining the pitch.
  • the ratio (%) of the number of sides having the same length among the sides of the triangle, quadrangle, or hexagon, which is the closed figure formed as described above (100 x (number of sides of the same length) 100 ⁇ (number of sides of the same length) / 4 in the case of hexagonal, and 100 ⁇ (number of sides of the same length) / 6 in the case of a hexagon can be 85% or less.
  • the ratio may be 84% or less, 80% or less, 76% or less, 67% or less, 55% or 40% or less.
  • the lower limit of the ratio is not particularly limited. That is, in some cases, since the lengths of all sides of the closed diagram may not be the same, the lower limit of the ratio may be 0%.
  • the arrangement of the spacers of the present application is irregular in that at least some of them have different pitches, but this irregularity is controlled under a certain regularity.
  • the regularity described above may mean that the arrangement density of the spacers is substantially close to each other in a certain region.
  • the normal pitch of the plurality of irregularly arranged spacers is P
  • a plurality of square regions having a length of one side of 10P on the surface of the substrate layer are arbitrarily selected.
  • the standard deviation of the number of spacers is 2 or less.
  • Fig. 3 is a diagram exemplarily showing a case where four rectangular areas (dotted line rectangular areas in Fig. 3) having the length of one side of the 10P are arbitrarily selected.
  • normal pitch means that a plurality of spacers arranged on the base layer in an irregular manner are arranged so that virtually all of the spacers are arranged at the same pitch in consideration of the number of the spacers and the area of the base layer, Means the distance between the centers of the spacers.
  • the standard deviation is a numerical value representing the scattering degree of the number of the spacers, and is a numerical value determined by the square root of the amount of dispersion.
  • a standard deviation of the number of spacers existing in the region after designating at least two or more of the square regions is arbitrarily set on the surface on which the spacer of the base layer is formed, its standard deviation is 2 or less.
  • the standard deviation may be 1.5 or less, 1 or less, or 0.5 or less in other examples.
  • the lower limit of the standard deviation means that the desired regularity is achieved as the numerical value is lower, so that the lower limit is not particularly limited and may be zero, for example.
  • the number of the rectangular regions specified above is not particularly limited as long as it is two or more, in one example, the rectangular regions are arbitrarily selected so as not to overlap each other on the surface of the base layer, At least 10%, at least 20%, at least 30%, at least 40%, at least 50%, at least 60%, at least 70%, at least 80% or at least 90% of the total area of the substrate.
  • the range of the normal pitch P forming one side of the arbitrary rectangular area is not particularly limited as long as it can be determined by the number of spacers present on the base layer and the area of the base layer as described above, Mu] m to 1,000 [mu] m.
  • the normal pitch P may be about 60 ⁇ or more, 70 ⁇ or more, 80 ⁇ or more, 90 ⁇ or more, 100 ⁇ or 110 ⁇ or more, about 900 ⁇ or less, 800 ⁇ or less, Not more than 600 mu m, not more than 500 mu m, not more than 400 mu m, not more than 300 mu m, not more than 200 mu m, or not more than 150 mu m.
  • the average number of spacers present in the randomly selected square regions as described above may be, for example, about 80 to about 150.
  • the average number may be 82 or more, 84 or more, 86 or more, 88 or more, 90 or more, 92 or more, 94 or more, 96 or 98 or more.
  • the average number is 148 or less, 146 or less, 144 or less, 142 or less, 140 or less, 138 or less, 136 or less, 134 or less, 132 or less, 130 or less, 128 Or less, 126 or less, 124 or less, 122 or less, 120 or less, 118 or less, 116 or less, 114 or less, or 112 or less.
  • the ratio SD / A of the average number A of the spacers to the standard deviation SD mentioned above may be 0.1 or less. In other examples, the ratio may be 0.09 or less, 0.08 or less, 0.07 or less, 0.06 or less, 0.05 or less, 0.04 or less, 0.03 or less, 0.02 or less or 0.01 or less.
  • the ratio SD / A may be 0 or more or about 0.005 or more.
  • the average number (A) and the ratio (SD / A) may be changed depending on the case.
  • the transmittance, the cell gap, and / or the uniformity of the cell gap required in the device to which the substrate is applied The above values may be changed.
  • the standard deviation of the number of the spacers in each unit region may be 2 or less.
  • the standard deviation thereof is 2 or less.
  • the shape of each divided unit area is not particularly limited as long as the unit areas are divided so as to have the same area, but may be, for example, a triangular, square, or hexagonal area.
  • the standard deviation may be 1.5 or less, 1 or less or 0.5 or less, 0 or more, 0.5 or more, 1 or more, or 1.5 or more.
  • the number of unit regions is not particularly limited, but in one example, the base layer may be divided into two or more, four or more, six or more, eight or more, or ten or more regions having the same area.
  • the average number of the spacers existing in the area is 0 to 4 It can be in range.
  • the average number may be 3.5 or less, 3 or less, 2.5 or less, 2 or less, or 1.5 or less in other examples.
  • the average number may also be greater than or equal to 0.5 in other examples.
  • the number of square regions having a normal pitch P of one side arbitrarily specified is not particularly limited as long as the number of square regions is two or more.
  • the square regions are arbitrarily selected so as not to overlap each other on the surface of the base layer,
  • the area occupied by the randomly selected area is at least about 10%, at least 20%, at least 30%, at least 40%, at least 50%, at least 60%, at least 70%, at least 80%, or at least 90% Or more.
  • the total density of the plurality of spacers can be adjusted so that the ratio of the area occupied by the spacers to the entire area of the base layer is about 50% or less. In another example, less than or equal to about 45%, less than or equal to about 40%, less than or equal to about 35%, less than or equal to about 30%, less than or equal to about 25%, less than or equal to about 20%, less than or equal to about 15%, less than or equal to about 10% , Not more than 9%, not more than 8.5%, not more than 8%, not more than 7.5%, not more than 7%, not more than 6.5%, not more than 6%, not more than 5.5%, not more than 5%, not more than 4.5% Or less, 2.5% or less, 2% or less, or 1.5% or less. In another example, the ratio may be about 0.1% or more, 0.2% or more, 0.3% or more, 0.4% or more, 0.5% or more, 0.6% or more, 0.7% or more, 0.8% or more, 0.9% or more or 0.95% or more.
  • the spacers are formed so as to maintain the uniform cell gap between the substrates, while ensuring uniform optical characteristics without causing so- can do.
  • the above numerical values can be changed when necessary, for example, the numerical values can be changed in consideration of the transmittance, the cell gap, and / or the uniformity of the cell gap required in the device to which the substrate is applied .
  • the plurality of spacers may be arranged such that the spacing normal distribution diagram represents a predetermined shape.
  • the spacing normal distribution diagram is a distribution diagram showing the pitch between the spacers as the X-axis and the ratio of the spacers having the corresponding pitches as the Y-axis among all the spacers.
  • the ratio of the spacers is assumed to be 1 .
  • the pitch in the description related to the above-described spacing normal distribution is the length of the side in a triangle, square, or hexagon, which is the above-mentioned closed shape.
  • the distribution diagram can be obtained by using a known random number coordinate program, for example, a CAD, MATLAB or STELLA random number coordinate program or the like.
  • the plurality of spacers may be arranged such that the half height area in the distribution diagram is in the range of 0.4 to 0.95.
  • the half height area may be 0.45 or more, 0.5 or more, 0.55 or more, 0.6 or more, 0.65 or more, 0.7 or more, or 0.85 or more.
  • the half height area may be 0.9 or less, 0.85 or less, 0.8 or less, 0.75 or less, 0.7 or less, 0.65 or less, 0.6 or less, 0.55 or less or 0.5 or less in another example.
  • the plurality of spacers may be arranged such that the ratio (FWHM / Pm) of the half height width (FWHM) to the average pitch (Pm) in the distribution diagram is 1 or less.
  • the ratio (FWHM / Pm) may be 0.05 or more, 0.1 or more, 0.11 or more, 0.12 or more, or 0.13 or more in another example.
  • the ratio FWHM / Pm is about 0.95 or less, about 0.9 or less, about 0.85 or less, about 0.8 or less, about 0.75 or less, about 0.7 or less, about 0.65 or less, about 0.6 or less, about 0.55 or less, About 0.5 or less, about 0.45 or less, or about 0.4 or less.
  • the average pitch Pm is defined by the spacers selected when at least 80%, at least 85%, at least 90% or at least 95% of the spacers are selected to form the triangular, square or hexagonal shape as described above. Is the average of the length of each side of a triangle, square, or hexagon. Also, in the above, the spacers are selected such that the triangles, squares or hexagons formed do not share vertices with each other.
  • the plurality of spacers may be arranged such that the half height width (FWHM) in the above distribution diagram is in the range of 0.5 mu m to 1,000 mu m.
  • the half height width FWHM may be at least about 1 ⁇ , at least 2 ⁇ , at least 3 ⁇ , at least 4 ⁇ , at least 5 ⁇ , at least 6 ⁇ , at least 7 ⁇ , at least 8 ⁇ , 15 mu m or more, 16 mu m or more, 17 mu m or more, 18 mu m or more, 19 mu m or more, 20 mu m or more, 21 mu m or more, 22 mu m or more, At least 23 mu m or at least 24 mu m, at least 27 mu m, at least 30 mu m, at least 35 mu m, at least 40 mu m, at least 45 mu m, or at least 50 mu m.
  • the half height width is about 900 ⁇ ⁇ , 800 ⁇ ⁇ , 700 ⁇ ⁇ , 600 ⁇ ⁇ , 500 ⁇ ⁇ , 400 ⁇ ⁇ , 300 ⁇ ⁇ , 200 ⁇ ⁇ , Or less, 90 ⁇ m or less, 80 ⁇ m or less, 70 ⁇ m or less, 60 ⁇ m or less, 50 ⁇ m or less, 40 ⁇ m or less, or 30 ⁇ m or less.
  • the plurality of spacers may be arranged such that the maximum height (Fmax) of the spacing normal distribution is at least 0.006 and less than 1.
  • the maximum height Fmax may be about 0.007 or more, about 0.008 or more, about 0.009 or more, or about 0.0095 or more, about 0.01 or more, or about 0.015 or more.
  • the maximum height Fmax is about 0.9 or less, about 0.8 or less, about 0.7 or less, about 0.6 or less, about 0.5 or less, about 0.4 or less, about 0.3 or less, about 0.2 or less, about 0.1 or less, About 0.08 or less, about 0.07 or less, about 0.06 or less, about 0.05 or less, about 0.04 or less, about 0.03 or less, or about 0.02 or less.
  • the spacers When a plurality of spacers are arranged to have a spacing normal distribution of the above-described type, when the optical device is implemented through the substrate, the spacers maintain a uniform cell gap between the substrates while causing a so- So that uniform optical characteristics can be ensured.
  • the normal arrangement state is a state in which a plurality of spacers are arranged on the base layer so as to form an equilateral triangle, a square, or a regular hexagon having the same length on all sides.
  • 5 is a state in which spacers are arranged to form the square as an example.
  • the length P of one side of the square in this state may be equal to the normal pitch mentioned above.
  • an original area having a radius having a length proportional to the length P of one side is designated on the basis of a point where one spacer exists, and the one spacer is randomly
  • the program is set to move to For example, FIG.
  • FIG. 5 schematically shows a manner in which a circle region having a radius of 0.5% of a length of 50% of the length P is set and the spacer moves to an arbitrary point in the region.
  • the above arrangement can be achieved by applying the above movement to spacers of at least 80%, 85%, 90%, 95% or 100% (all spacers).
  • the ratio of the radius P of the original area to the length P may be defined as irregular.
  • the irregularity degree is about 50%.
  • the irregularity in the design scheme is at least about 5%, at least about 10%, at least about 15%, at least about 20%, at least about 25%, at least about 30%, at least about 35% , About 45% or more, about 50% or more, about 55% or more, about 60% or more, or about 65% or more. In one example, the irregularity may be about 95% or less, about 90% or less, about 85% or less, or about 80% or less.
  • the steady state starts from a square.
  • the steady state may be another shape such as an equilateral triangle or a regular hexagon. In this case, the above arrangement can also be achieved.
  • the means for designing the arrangement of the spacers in the above-described manner is not particularly limited, and a known random number coordinate program, for example, CAD, MATLAB, STELLA or an Excel random number coordinate program can be used.
  • a mask having a pattern according to the design may be manufactured, and the spacer may be implemented by a lithography or imprinting method using the mask.
  • the dimension of the spacer as described above is not particularly limited and may be selected within a known range.
  • the spacers may have a bottom cross-sectional area in the range of about 0.25 ⁇ m 2 to 1 mm 2 , and a height in the range of about 0.5 ⁇ m to 1 mm.
  • the bottom cross-sectional area may be at least about 0.5 ⁇ 2, at least 0.75 ⁇ 2 , and at most 1 ⁇ 2 Or more, 5 ⁇ 2 Or more, 10 ⁇ 2 15 ⁇ 2 Or more or 20 ⁇ 2 Or less, 900000 ⁇ ⁇ 2 or less, 800000 ⁇ ⁇ 2 or less, 700000 ⁇ ⁇ 2 or less, 600000 ⁇ ⁇ 2 or less, 500000 ⁇ ⁇ 2
  • the spacer can be formed using a known material and method.
  • the spacer may be formed by including an ultraviolet curable resin.
  • the spacers may be formed by designing the regular irregularities in the manner described above, and curing the ultraviolet curable compounds according to the desired arrangement in an imprinting or lithographic manner using a mask designed according to the design, In this case, the ultraviolet curable resin which is a cured product of the ultraviolet curable compound can form the spacer.
  • the specific kind of the ultraviolet curable compound that can be used for forming the spacer is not particularly limited, and for example, an acrylate-based polymer or an epoxy-based polymer may be used, but the present invention is not limited thereto.
  • the substrate of the present application may include, in addition to the substrate layer and the spacer, other elements required for driving the optical device. These elements are variously known, and typically have an electrode layer.
  • the substrate may further include an electrode layer between the substrate layer and the spacer.
  • the electrode layer a known material can be applied.
  • the electrode layer may comprise a metal alloy, an electrically conductive compound, or a mixture of two or more thereof.
  • metal such as gold, CuI, indium tin oxide (ITO), indium zinc oxide (IZO), zinc tin oxide (ZTO), zinc oxide doped with aluminum or indium, magnesium indium oxide, nickel tungsten oxide, Metal oxides such as ZnO, SnO 2 or In 2 O 3 , metal serrides such as gallium nitride and zinc selenide, and metal sulfides such as zinc sulfide.
  • the transparent positive hole injecting electrode layer can also be formed using a metal thin film of Au, Ag or Cu and a laminate of a transparent material of high refractive index such as ZnS, TiO 2 or ITO.
  • the electrode layer can be formed by any means such as vapor deposition, sputtering, chemical vapor deposition or electrochemical means. Patterning of the electrode layer is also possible in a known manner without any particular limitation, and may be patterned through a process using, for example, a known photolithography or a shadow mask.
  • the substrate of the present application may further include an alignment layer present on the substrate layer and the spacer.
  • the kind of the alignment layer formed on the base layer and the spacer is not particularly limited, and a well-known alignment film, for example, a well-known rubbing alignment film or a photo alignment film, can be applied.
  • the method of forming the alignment film on the base layer and the spacer and performing the alignment treatment thereon is also in accordance with a known method.
  • the present application is also directed to an optical device formed using such a substrate.
  • An exemplary optical device of the present application may include a second substrate opposing the substrate and the substrate and spaced apart from the substrate by a spacer of the substrate.
  • a light-modulating layer may be present in an interval between the two substrates.
  • the term optical modulation layer in the present application may include all known types of layers capable of changing at least one of the characteristics such as the polarization state, transmittance, color tone, and reflectance of the incident light according to purposes.
  • the light modulating layer may be a liquid crystal layer that is switched between a diffusion mode and a transmissive mode by on-off of a voltage, for example, a vertical electric field or a horizontal electric field, A liquid crystal layer switched between a transmissive mode and a cut-off mode, a liquid crystal layer switched between a transmissive mode and a color mode, or a liquid crystal layer switching between color modes of different colors.
  • optically modulating layers for example, liquid crystal layers, capable of performing the above actions are well known.
  • One exemplary optical modulation layer is a liquid crystal layer used in conventional liquid crystal displays.
  • the light modulating layer may include various types of so-called guest host liquid crystal layers, polymer dispersed liquid crystals, pixel-isolated liquid crystals, A particle device (Suspended Particle Deivice) or an electrochromic device.
  • the polymer dispersed liquid crystal layer is a superordinate concept including a pixel isolated liquid crystal (PILC), a polymer dispersed liquid crystal (PDLC), a polymer network liquid crystal (PNLC), a polymer stabilized liquid crystal .
  • the polymer dispersed liquid crystal layer (PDLC) may include, for example, a polymer network and a liquid crystal region containing a liquid crystal compound that is dispersed in a state of being phase-separated from the polymer network.
  • optical modulation layer is not particularly limited, and any known method may be employed without any limitations depending on the purpose.
  • the optical device may further include additional known functional layers such as a polarizing layer, a hard coating layer, and / or an antireflection layer, if necessary.
  • additional known functional layers such as a polarizing layer, a hard coating layer, and / or an antireflection layer, if necessary.
  • the present application is directed to a substrate on which spacers are disposed in a specific arrangement and to an optical device using such a substrate.
  • a plurality of spacers are irregularly arranged on a substrate in accordance with a predetermined rule so that the spacers maintain a uniform cell gap in the construction of the optical device, So that the characteristics can be secured.
  • Figs. 1 to 3 are views for explaining the pitch between the spacers. Fig.
  • 5 is a diagram for explaining a method of implementing the irregularity degree.
  • FIG. 6 is a view showing a spacer arrangement of Embodiment 1.
  • Fig. 8 shows the observation result of the moire phenomenon in the spacer arrangement of Example 1.
  • Fig. 9 shows the result of observation of the moire phenomenon in the spacer arrangement in the normal arrangement.
  • FIG. 10 is a view showing a spacer arrangement of Embodiment 2.
  • FIG. 10 is a view showing a spacer arrangement of Embodiment 2.
  • FIG. 11 is a distribution chart confirmed from the spacer arrangement of Example 2. Fig.
  • FIG. 13 is a view showing a spacer arrangement of the third embodiment.
  • Example 16 shows the results of evaluating the appearance of the device to which the substrate of Example 3 is applied.
  • 17 is a distribution chart confirmed from the spacer arrangement of the fourth embodiment.
  • Example 19 shows the results of evaluating the appearance of a device to which the substrate of Example 4 is applied.
  • Fig. 20 shows the result of observation of the moire phenomenon in the spacer arrangement of Comparative Example 1.
  • a spacer arrangement pattern with an irregularity of about 10% was designed using a random number generating program (CAD) in the following manner.
  • CAD random number generating program
  • 100 spacers are arranged on the substrate layer having a total area of about 10 mm at a constant interval (normal pitch) at 127 ⁇ ⁇ as shown in Fig. 5 (normal arrangement state).
  • the cross-sectional area of the bottom portion of each individual spacer was about 27 ⁇ and the height was about 10 ⁇ .
  • the program is set so that individual spacers move randomly in a circle area having a radius (0.1 P) of 10% of the normal pitch with respect to each spacer, The spacers were moved to construct a spacer arrangement pattern.
  • FIG. 6 is an illustration of a spacer arrangement designed as described above.
  • FIG. 6 when four spacers were selected so as to constitute a quadrilateral which is a closed figure in the arrangement of the spacers, at least one of the lengths of the sides of the quadrangle was different when the length of each side was measured.
  • the minimum length of all the sides of the quadrangle of the closed figure was about 87 ⁇ , and the maximum length was about 113 ⁇ .
  • the average number of spacers in each square area is 100 And the standard deviation was about 0.
  • FIG. 7 is a normalized spacing diagram of the spacers of the above arrangement, in which the half height area is about 0.71, the half height width FWHM is about 14.19, the average pitch Pm is about 127 mu m , And the maximum height (Fmax) was about 0.095.
  • a base layer on which a crystalline ITO (Indium Tin Oxide) layer was formed as a electrode layer on a PC (polycarbonate) film was used as the base layer (100 in Fig. 10).
  • Spacers were formed on the base layer in accordance with the conventional method of forming a column spacer, and spacers were formed so that the arrangement was in accordance with the designed manner.
  • the thus prepared substrate was placed on a general commercial monitor, and the occurrence of moire phenomenon was evaluated by the method.
  • Fig. 8 shows the result of checking whether or not a moire phenomenon evaluated by the above-described method occurs
  • Fig. 9 shows a result of measurement with respect to a substrate on which spacers are formed according to the above-mentioned normal arrangement state. It can be seen from the results of FIGS. 8 and 9 that the occurrence of the moire phenomenon can be suppressed by controlling the arrangement state of the spacers.
  • the arrangement of the spacers was designed in the same manner as in Example 1, and the arrangement of the spacers was designed so that the degree of irregularity was 50%
  • the program is set to move randomly within a circular area with a radius (0.5 P) of 50% of the normal pitch to move the individual spacers.
  • the minimum length of all the sides of the quadrangle of the closed figure was about 36 ⁇ ⁇ , and the maximum length was about 164 ⁇ ⁇ .
  • Figure 10 is an illustration of a spacer arrangement as designed above. As shown in FIG. 10, when four spacers were selected so as to form a quadrangle of a closed shape in the arrangement of the spacers, at least one of the lengths of the sides of the quadrangle was different when the length of each side was measured. 10, when a square area having a length of 10 times (10P) of the normal pitch P is selected so that the areas do not overlap with each other, the average number of spacers in each square area is 100 And the standard deviation was about 0. In addition, when the surface of the substrate layer shown in Fig. 10 was divided into four rectangular areas having the same area, the average number of spacers in each rectangular area was 24.4, and the standard deviation was about 1.2. FIG.
  • FIG. 11 is a normalized spacing diagram of the spacers of the above arrangement, wherein the half height area in the distribution is about 0.68, the half height width FWHM is about 53.58, the average pitch Pm is about 127 mu m , And the maximum height (Fmax) was about 0.019.
  • FIG. 12 shows the result of evaluating whether or not a moire phenomenon occurred in the same manner as in Example 1 using the substrate formed in the above-described manner, and it can be confirmed that the occurrence of the moire phenomenon is suppressed as in Example 1.
  • FIG. 12 shows the result of evaluating whether or not a moire phenomenon occurred in the same manner as in Example 1 using the substrate formed in the above-described manner, and it can be confirmed that the occurrence of the moire phenomenon is suppressed as in Example 1.
  • the arrangement of the spacers was designed in the same manner as in Example 1, and the arrangement of the spacers was designed so that the irregularity was 70%
  • the program is set to move randomly within a circular area with a radius (0.7 P) of 70% of the normal pitch to move the individual spacers).
  • the minimum length of all the sides of the quadrilateral has a length of about 11 ⁇ m and a maximum length of about 189 ⁇ m.
  • Fig. 13 is an illustration of a spacer arrangement designed as described above. As shown in FIG. 13, when four spacers were selected so as to constitute a quadrangle of a closed figure in the arrangement of the spacers, at least one of the lengths of the sides of the quadrangle was different when the length of each side was measured. In FIG. 13, when 12 square areas each having a length of 10 times (10 P) of the normal pitch P are selected so that the areas do not overlap each other, the average number of spacers in each square area is 99.5, and the standard deviation was about 0.9. In addition, when the surface of the substrate layer shown in Fig. 13 was divided into four rectangular areas having the same area, the average number of spacers in each rectangular area was 23.1, and the standard deviation was about 1.7.
  • Fig. 14 is a normalized spacing diagram of the spacers of the above arrangement, in which the half height area is about 0.64, the half height width FWHM is about 77.09, the average pitch Pm is about 127 mu m , And the maximum height (Fmax) was about 0.016.
  • FIG. 15 shows the result of evaluating whether or not a moire phenomenon occurred in the same manner as in Example 1 using the substrate formed in the above-described manner, and it can be confirmed that the occurrence of the moire phenomenon is suppressed as in Example 1.
  • FIG. 15 shows the result of evaluating whether or not a moire phenomenon occurred in the same manner as in Example 1 using the substrate formed in the above-described manner, and it can be confirmed that the occurrence of the moire phenomenon is suppressed as in Example 1.
  • Fig. 16 is a photograph of the third embodiment in which the occurrence of appearance defects is evaluated in the same manner as in the first embodiment.
  • the arrangement of the spacers was designed in the same manner as in Example 1, and the arrangement of the spacers was designed so that the irregularity was 70%
  • the program is set to move randomly within a circular area with a radius (0.7 P) of 70% of the normal pitch to move the individual spacers).
  • the minimum length of all the sides of the quadrilateral has a length of about 59 mu m and a maximum length of about 447 mu m.
  • the spacer arrangement designed as described above was substantially similar to that shown in Fig. That is, as shown in FIG. 13, in the case of Embodiment 4, four spacers are selected such that a quadrangle of a closed figure is formed in the arrangement of the spacers, and when the length of each side is measured, at least one of the lengths of the sides of the quadrangle Respectively. 13, when a square area having a length of 10 times (10 P) of the normal pitch P is selected so that the areas do not overlap with each other, twelve spacers are formed in the square area, The mean number of the samples was 99.5, and the standard deviation was about 0.9. In addition, when the surface of the substrate layer shown in Fig.
  • FIG. 17 is a normalized spacing diagram of the spacers of the above arrangement, in which the half height area is about 0.64, the half height width FWHM is about 181.42, the average pitch Pm is about 277 ⁇ ⁇ , And the maximum height (Fmax) was about 0.0061.
  • FIG. 18 shows the result of evaluating whether or not a moire phenomenon occurred in the same manner as in Example 1 using the substrate formed in the above-described manner, and it can be confirmed that the occurrence of the moire phenomenon is suppressed as in Example 1.
  • FIG. 18 shows the result of evaluating whether or not a moire phenomenon occurred in the same manner as in Example 1 using the substrate formed in the above-described manner, and it can be confirmed that the occurrence of the moire phenomenon is suppressed as in Example 1.
  • Fig. 19 is a photograph showing the appearance of poor appearance in the same manner as in Example 1 with respect to Example 4. Fig.
  • the arrangement of the spacers was designed in the same manner as in Example 1, and the arrangement of the spacers was designed so that the irregularity was 70%
  • the program is set to move randomly within a circular area with a radius (0.7 P) of 70% of the normal pitch to move the individual spacers).
  • the minimum length of all the sides of the quadrangle of the closed figure was about 89 ⁇ ⁇ , and the maximum length was about 616 ⁇ ⁇ .
  • the spacer arrangement designed as described above was substantially similar to that shown in Fig. That is, as shown in FIG. 13, in the case of Comparative Example 1, four spacers were selected so that a quadrangle of a closed figure was formed in the arrangement of spacers. When the length of each side was measured, at least one of the lengths of the sides of the quadrangle Respectively. The number of spacers in each square area was 99.5 when twelve square areas each having a length of 10 times (10P) of the normal pitch P were selected so that the areas did not overlap each other, and the average number of spacers was 99.5. Was about 0.9. In addition, when the surface of the substrate layer shown in Fig. 13 was divided into four rectangular areas having the same area, the average number of spacers in each rectangular area was 23.1, and the standard deviation was about 1.7.
  • FIG. 20 shows the result of evaluating whether or not a moire phenomenon occurred in the same manner as in Example 1 using the substrate formed in the above-described manner, and it can be confirmed that the occurrence of the moire phenomenon is suppressed as in Example 1.
  • FIG. 20 shows the result of evaluating whether or not a moire phenomenon occurred in the same manner as in Example 1 using the substrate formed in the above-described manner, and it can be confirmed that the occurrence of the moire phenomenon is suppressed as in Example 1.
  • FIG. 21 is a photograph showing the appearance of defective appearance in the same manner as in Example 1 with respect to Comparative Example 1, and it can be seen from FIG.
  • the arrangement of the spacers was designed in the same manner as in Example 1, and the arrangement of the spacers was designed so that the irregularity was 70%
  • the program is set to move randomly within a circular area with a radius (0.7 P) of 70% of the normal pitch to move the individual spacers).
  • the minimum length of all the sides of the quadrangle of the closed figure was about 119 ⁇ m, and the maximum length was about 786 ⁇ m.
  • the spacer arrangement designed as described above was substantially similar to that shown in Fig. In other words, as shown in FIG. 13, in the case of Comparative Example 2, four spacers were selected so that a quadrangle of a closed figure was formed in the arrangement of the spacers. When the length of each side was measured, at least one of the lengths of the sides of the quadrangle Respectively.
  • the number of spacers in each square area was 99.5 when twelve square areas each having a length of 10 times (10P) of the normal pitch P were selected so that the areas did not overlap each other, and the average number of spacers was 99.5.
  • the surface of the base layer shown in Fig. 27 was divided into four rectangular areas having the same area, the average number of the spacers in each rectangular area was 23.1, and the standard deviation was about 1.7.
  • Example 22 shows the result of evaluating whether or not a moire phenomenon occurred in the same manner as in Example 1 using the substrate formed in the above-described manner, and it can be confirmed that the occurrence of the moire phenomenon is suppressed as in Example 1.
  • FIG. 23 is a photograph showing the appearance of defective appearance in the same manner as in Example 1 with respect to Comparative Example 1, and it can be seen from FIG.
  • the arrangement of the spacers was designed in the same manner as in Example 1, and the arrangement of the spacers was designed so that the irregularity was 70%
  • the program is set to move randomly within a circular area with a radius (0.7 P) of 70% of the normal pitch to move the individual spacers).
  • the minimum length of all the sides of the quadrangle of the closed figure was about 134 ⁇ ⁇ , and the maximum length was about 872 ⁇ ⁇ .
  • the spacer arrangement designed as described above was substantially similar to that shown in Fig. That is, as shown in FIG. 13, in the case of Comparative Example 3, four spacers were selected so that a quadrangle of a closed figure was formed in the arrangement of the spacers, and when measuring the length of each side, at least one of the lengths of the sides of the quadrangle Respectively.
  • FIG. 31 when a square area having a length of 10 times (10P) of the normal pitch P is selected so that the areas do not overlap with each other, the average number of spacers in each square area is 99.5 And the standard deviation was about 0.9.
  • the surface of the base layer shown in Fig. 31 was divided into four rectangular areas having the same area, the average number of spacers in each rectangular area was 23.1, and the standard deviation was about 1.7.
  • FIG. 25 is a photograph showing the appearance of defective appearance in the same manner as in Example 1 with respect to Comparative Example 1, and it is confirmed from the drawing that defects in appearance are largely generated.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)

Abstract

La présente invention concerne un substrat comprenant des éléments d'espacement agencés sur ces derniers dans un état d'agencement particulier et un dispositif optique utilisant le substrat. Dans la présente invention, une pluralité d'éléments d'espacement sont agencés de manière irrégulière sur un substrat selon une règle prédéterminée. Par conséquent, les éléments d'espacement maintiennent un espace de cellule uniforme au moment de la configuration d'un dispositif optique, et la présente invention peut empêcher l'apparition d'un phénomène de Moiré et similaire et assurer généralement une caractéristique optique uniforme.
PCT/KR2018/008551 2017-07-27 2018-07-27 Substrat Ceased WO2019022565A1 (fr)

Priority Applications (4)

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EP18838533.0A EP3660583B1 (fr) 2017-07-27 2018-07-27 Substrat
JP2020503782A JP7119278B2 (ja) 2017-07-27 2018-07-27 基板
CN201880050289.4A CN111033372B (zh) 2017-07-27 2018-07-27 基板
US16/633,289 US11467452B2 (en) 2017-07-27 2018-07-27 Substrate

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KR20170095464 2017-07-27
KR10-2017-0095464 2017-07-27
KR10-2018-0087288 2018-07-26
KR1020180087288A KR102068304B1 (ko) 2017-07-27 2018-07-26 기판

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Cited By (5)

* Cited by examiner, † Cited by third party
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US20220187647A1 (en) * 2020-12-10 2022-06-16 Japan Display Inc. Liquid crystal device
JP2023509126A (ja) * 2020-02-18 2023-03-07 エルジー・ケム・リミテッド パターンフィルム、パターンフィルムの製造方法、およびこれを含む透過度可変デバイス
WO2023106825A1 (fr) * 2021-12-09 2023-06-15 주식회사 엘지화학 Substrat
WO2023106824A1 (fr) * 2021-12-09 2023-06-15 주식회사 엘지화학 Substrat
WO2023106826A1 (fr) * 2021-12-09 2023-06-15 주식회사 엘지화학 Substrat

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JP2012234142A (ja) * 2011-04-20 2012-11-29 Sony Corp 表示装置
KR20150142891A (ko) * 2014-06-12 2015-12-23 삼성디스플레이 주식회사 입체영상 표시장치
JP5923456B2 (ja) * 2013-03-29 2016-05-24 株式会社ジャパンディスプレイ 表示装置
KR20170095464A (ko) 2016-02-12 2017-08-23 호서대학교 산학협력단 태양열을 이용한 탈취 장치
KR20180087288A (ko) 2015-10-13 2018-08-01 주식회사 토이스미스 페어링 블록을 이용하여 외부 장치와 통신하는 무선통신 연결 장치

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EP0022311A1 (fr) 1979-06-15 1981-01-14 Stanley Electric Co., Ltd. Dispositif à cristaux liquides à plusieurs couches
JP2002221722A (ja) * 2001-01-29 2002-08-09 Minolta Co Ltd 反射型液晶表示装置
KR20120105357A (ko) * 2011-03-15 2012-09-25 소니 주식회사 표시 장치 및 광 배리어 소자
JP2012234142A (ja) * 2011-04-20 2012-11-29 Sony Corp 表示装置
JP5923456B2 (ja) * 2013-03-29 2016-05-24 株式会社ジャパンディスプレイ 表示装置
KR20150142891A (ko) * 2014-06-12 2015-12-23 삼성디스플레이 주식회사 입체영상 표시장치
KR20180087288A (ko) 2015-10-13 2018-08-01 주식회사 토이스미스 페어링 블록을 이용하여 외부 장치와 통신하는 무선통신 연결 장치
KR20170095464A (ko) 2016-02-12 2017-08-23 호서대학교 산학협력단 태양열을 이용한 탈취 장치

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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023509126A (ja) * 2020-02-18 2023-03-07 エルジー・ケム・リミテッド パターンフィルム、パターンフィルムの製造方法、およびこれを含む透過度可変デバイス
JP7443645B2 (ja) 2020-02-18 2024-03-06 エルジー・ケム・リミテッド パターンフィルム、パターンフィルムの製造方法、およびこれを含む透過度可変デバイス
US12449570B2 (en) 2020-02-18 2025-10-21 Lg Chem, Ltd. Pattern film, method for manufacturing pattern film, and transmittance variable device comprising same
US20220187647A1 (en) * 2020-12-10 2022-06-16 Japan Display Inc. Liquid crystal device
US11650463B2 (en) * 2020-12-10 2023-05-16 Japan Display Inc. Liquid crystal device comprising one or more first spacers disposed inside a sealant and a plurality of second spacers disposed in a display area
WO2023106825A1 (fr) * 2021-12-09 2023-06-15 주식회사 엘지화학 Substrat
WO2023106824A1 (fr) * 2021-12-09 2023-06-15 주식회사 엘지화학 Substrat
WO2023106826A1 (fr) * 2021-12-09 2023-06-15 주식회사 엘지화학 Substrat
US12405500B2 (en) 2021-12-09 2025-09-02 Lg Chem, Ltd. Substrate
US12461415B2 (en) 2021-12-09 2025-11-04 Lg Chem, Ltd. Substrate

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