[go: up one dir, main page]

WO2022080852A1 - Dispositif d'affichage électrophorétique et son procédé de fabrication - Google Patents

Dispositif d'affichage électrophorétique et son procédé de fabrication Download PDF

Info

Publication number
WO2022080852A1
WO2022080852A1 PCT/KR2021/014104 KR2021014104W WO2022080852A1 WO 2022080852 A1 WO2022080852 A1 WO 2022080852A1 KR 2021014104 W KR2021014104 W KR 2021014104W WO 2022080852 A1 WO2022080852 A1 WO 2022080852A1
Authority
WO
WIPO (PCT)
Prior art keywords
electrode
display device
substrate
electrophoretic display
color filter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2021/014104
Other languages
English (en)
Korean (ko)
Inventor
이명원
김경호
이원종
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongwoo Fine Chem Co Ltd
Original Assignee
Dongwoo Fine Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongwoo Fine Chem Co Ltd filed Critical Dongwoo Fine Chem Co Ltd
Publication of WO2022080852A1 publication Critical patent/WO2022080852A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/165—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field
    • G02F1/166—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field characterised by the electro-optical or magneto-optical effect
    • G02F1/167—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field characterised by the electro-optical or magneto-optical effect by electrophoresis
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136222—Colour filters incorporated in the active matrix substrate

Definitions

  • the present invention relates to an electrophoretic display device and a method for manufacturing the same.
  • the electrophoretic display device has a function of storing an image without any additional energy due to high bistability of maintaining an original image without external electric field application.
  • a flat panel display using electrophoresis (a phenomenon in which charged colloidal particles move toward the anode or cathode in an electric field), which has excellent flexibility and portability, and has characteristics such as durability and lightness is a kind of
  • Such an electrophoretic display device has characteristics closest to the paper texture, and exhibits a light reflection efficiency similar to or higher than that of a newspaper with a light reflection efficiency of about 40%, and an excellent contrast ratio. Accordingly, it is a reflective display that drives electrophoretic suspension by coating electrodes on a thin and easily bendable base film such as paper or plastic, and is a next-generation electronic paper that will follow liquid crystal displays, plasma display panels, and organic electroluminescent devices. (Electronic Paper) It is a device that is expected to be in the spotlight.
  • Such a reflective display displays information or an image using an external light source, and may include a color filter for realizing color, and displays an image of a predetermined color as light passes through the color filter. .
  • Patent Publication No. 10-2011-0134161 discloses a polymer dispersed liquid crystal with improved reflectance compared to a reflective display using an RGB color filter composed of a conventional red, green, and blue color filter layer.
  • a reflective color display device including (PDLC; Polymer Dispersed Liquid Crystal).
  • the reflectance of the polymer dispersed liquid crystal (PDLC) of Patent Publication No. 10-2011-0134161 is about 60%, so it cannot exhibit a high contrast ratio, and the color filter is located directly below the upper substrate based on the user's viewing direction. There is a problem in that high color reproducibility due to the surface reflection of the color filter itself cannot be exhibited.
  • An object of the present invention is to provide an electrophoretic display device having improved contrast ratio.
  • An object of the present invention is to provide an electrophoretic display device having improved color reproducibility.
  • the present invention provides a first substrate and a second substrate facing the first substrate; first and second electrodes respectively formed on the first and second substrates; a plurality of cells defined by a plurality of barrier ribs disposed between the first substrate and the second substrate; and a dielectric fluid filling the inside of the plurality of cells and at least one electrophoretic particle dispersed in the dielectric fluid, wherein the first electrode or the second electrode is a collection electrode including an opening, adjacent to the partition wall. It is formed and relates to an electrophoretic display device comprising a color filter provided between the first substrate and the first electrode.
  • the area of the collection electrode may be 3% to 35% of the cell area.
  • the cell may be formed at a position corresponding to a sub-pilel of the color filter.
  • the present invention may include a thin film transistor for driving at least one of the first electrode and the second electrode, and the barrier rib may be formed at a position corresponding to the thin film transistor.
  • the color filter may include a boundary member provided between adjacent sub-pixels, and may include an overcoat layer formed on the color filter.
  • the boundary member may be formed integrally with the light blocking member or the overcoat layer.
  • the color filter may have a maximum transmittance of 70% or more.
  • the present invention may further include a reflective layer provided under the color filter.
  • the reflective layer may have a reflectance of 85% or more.
  • At least one of the first electrode and the second electrode may be transparent.
  • At least one of the first electrode and the second electrode is ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide), graphene (Grephene), and carbon nanotubes (Carbon) Nano Tube) may include one or more selected from the group consisting of.
  • At least one of the first substrate and the second substrate may be transparent.
  • the transmittance of the electrophoretic display device in the light transmission mode may be 45% or more.
  • the reflectance of the electrophoretic display device in the light projection mode may be 35% or more.
  • the present invention comprises the steps of forming a color filter on a first substrate; forming a first electrode including a thin film transistor and an opening on the color filter; forming a second electrode on a second substrate; forming a barrier rib on the second electrode; filling a space provided by the barrier rib with a dielectric fluid including electrophoretic particles; and bonding the second substrate to face the first substrate.
  • the step of forming the color filter on the first substrate may be a step of forming a reflective layer on the first substrate and forming a color filter on the reflective layer.
  • the contrast ratio of the electrophoretic display device compared to the conventional reflective display device may be further improved by improving the transmittance of the electrophoretic display device.
  • the color reproducibility of the electrophoretic display device may be further improved compared to the conventional reflective display device by improving the color reflectivity of the electrophoretic display device.
  • FIG. 1 is a plan view schematically showing an electrophoretic display device according to an embodiment of the present invention.
  • FIG. 2A is a plan view schematically illustrating the array substrate of FIG. 1 .
  • FIG. 2B is a plan view schematically illustrating the color filter of FIG. 1 .
  • FIG. 3 is a cross-sectional view of the electrophoretic display device taken along line I-I' of FIG. 1 .
  • FIG. 4 is a cross-sectional view of the light-shielding mode of the electrophoretic display device taken along the line I-I' of FIG. 1 .
  • FIG. 5 is a cross-sectional view of the electrophoretic display device in light projection mode taken along the line I-I' of FIG. 1 .
  • FIG. 6 is a flowchart illustrating a method of manufacturing an electrophoretic display device according to an embodiment of the present invention.
  • each symbol means the following.
  • first substrate 11 second substrate
  • the present invention relates to an electrophoretic display device and a method for manufacturing the same, and an object of the present invention is to improve light transmittance and color reproducibility by controlling electrophoretic particles by a collection electrode formed adjacent to a barrier rib.
  • the present invention provides a first substrate and a second substrate facing the first substrate; first and second electrodes respectively formed on the first and second substrates; a plurality of cells defined by a plurality of barrier ribs disposed between the first substrate and the second substrate; and a dielectric fluid filling the inside of the plurality of cells and at least one electrophoretic particle dispersed in the dielectric fluid, wherein the first electrode or the second electrode is a collection electrode including an opening, adjacent to the partition wall. It is formed and includes a color filter provided between the first substrate and the first electrode, and relates to an electrophoretic display device and a method of manufacturing the same.
  • spatially relative terms “below”, “beneath”, “lower”, “above”, “upper”, etc. It can be used to easily describe the correlation between an element or components and other elements or components.
  • the spatially relative terms should be understood as terms including different orientations of the device during use or operation in addition to the orientation shown in the drawings. For example, when an element shown in the figures is turned over, an element described as “beneath” or “beneath” another element may be placed “above” the other element. Accordingly, the exemplary term “below” may include both directions below and above.
  • the device may also be oriented in other orientations, and thus spatially relative terms may be interpreted according to orientation.
  • FIG. 1 is a plan view schematically showing an electrophoretic display device according to an embodiment of the present invention.
  • FIG. 2A is a plan view schematically illustrating the array substrate of FIG. 1
  • FIG. 2B is a plan view schematically illustrating the color filter of FIG. 1 .
  • 3 is a cross-sectional view of the electrophoretic display device taken along line I-I' of FIG. 1 .
  • 4 is a cross-sectional view of the light-shielding mode of the electrophoretic display device taken along the line I-I' of FIG. 1 .
  • FIG. 5 is a cross-sectional view of the electrophoretic display device in a light projection mode taken along the line I-I' of FIG. 1 .
  • the first substrate 10 and the second substrate 11 serve as a base for supporting various components of the electrophoretic display device, and the first substrate 10 and the second substrate 11 are arranged to face each other.
  • the first substrate 10 and the second substrate 11 are positioned above or below the display, and may be referred to as a substrate, a support member, a support substrate, a backplane, or the like.
  • the first substrate 10 and the second substrate 20 are each glass; Cyclic olefin polymer (COP), polyethylene terephthalate (PET), polyacrylate (PAR), polyetherimide (PEI), polyethylene naphthalate (PEN), polyphenylene sulfide (PPS), polyallylate (polyallylate), Polyimide (PI), cellulose acetate propionate (CAP), polyether sulfone (PES), cellulose triacetate (TAC), polycarbonate (PC), cyclic olefin copolymer (COC), polymethyl methacrylate (PMMA) ) and the like polymeric substances; and/or an inorganic insulating material such as silicon oxide, silicon nitride, silicon oxynitride, or metal oxide.
  • COP Cyclic olefin polymer
  • PET polyethylene terephthalate
  • PAR polyacrylate
  • PEI polyetherimide
  • PEN polyethylene naphthalate
  • PPS polyphenylene
  • first substrate 10 and the second substrate 11 may be made of a material that is both insulating and light-transmitting.
  • both the first substrate 10 and the second substrate 11 may be transparent substrates made of glass.
  • the color filter includes a plurality of pixels, and each pixel includes a display area including a plurality of sub-pixels for outputting light.
  • the first to third sub-pixels PX1 to PX3 display the R display area PX1 , the G display area PX2 , and the B display area that outputs red (R), green (G), and blue (B) lights, respectively. It may be defined as an area PX3 .
  • the transmittance of the color filter is not particularly limited, but in terms of improving transmittance of the display device, it is preferably 70% or more, and more preferably, it may be 80% or more.
  • the color filter may include a boundary member for preventing color mixing of each of the R display area PX1 , the G display area PX2 , and the B display area PX3 .
  • the boundary member may be a black matrix (BM) as a light blocking member, but is not limited thereto. In addition, it may be formed integrally with the overcoat layer OC formed on the color filter to replace the black matrix BM.
  • BM black matrix
  • the color filter may be provided in any area of the display device as long as it can serve to output red (R), green (G) and blue (B) light, but each sub-pixel PX1 to PX3 itself
  • it is preferably provided on the rear substrate, that is, the first substrate 10 with respect to the viewing direction of the user. Also, more preferably, it may be provided between the first substrate 10 and the first electrode 20 .
  • a reflective layer 60 may be provided under the color filter in order to improve the reflectance of light transmitted through the color filter among the incident light.
  • the reflective layer is not particularly limited as long as it serves to reflect light incident from the outside, and the reflectance may be preferably 85% or more, and more preferably, 90% or more.
  • the first electrode 20 is a conductive structure formed on the first substrate 10 , and may be referred to as a pixel electrode or the like.
  • the first electrode 20 is a collecting electrode including an opening, and serves to collect the electrophoretic particles 41 in a narrow area. The collecting electrode will be described in detail later.
  • the first electrode 20 may be formed of a transparent conductive material or a conductive metal material.
  • the first electrode 20 is indium tin oxide (ITO), indium zinc oxide (IZO), carbon nanotubes (Carbon Nano Tube), graphene (Graphene), PEDOT: PSS ( Poly(3,4-ehylenedioxythiophene)poly(styrenesulfonate)) may be formed of a material such as chromium (Cr), molybdenum (Mo), silver (Ag), aluminum (Al), copper (Cu), magnesium-silver Metal such as alloy (MgAg), magnesium-calcium alloy (MgCa), aluminum-silver alloy (AlAg), or ytterbium-silver alloy (YbAg), nano Ag, or a plurality of other metal materials other than the above-mentioned metal materials can be formed.
  • the first electrode 20 may be patterned and formed on a partial region of the first substrate 10 .
  • the second electrode 21 is a conductive structure formed on the second substrate 11 , and may be referred to as a common electrode or the like.
  • the second electrode 21 is integrally formed on the second substrate 11 and serves to diffuse the electrophoretic particles 41 over a wide area.
  • the second electrode 21 may be formed of a transparent conductive material or a conductive metal material.
  • the second electrode 21 is indium tin oxide (ITO), indium zinc oxide (IZO), carbon nanotubes (Carbon Nano Tube), graphene (Graphene), PEDOT:PSS ( Poly(3,4-ehylenedioxythiophene)poly(styrenesulfonate)) may be formed of a material such as chromium (Cr), molybdenum (Mo), silver (Ag), aluminum (Al), copper (Cu), magnesium-silver Metal such as alloy (MgAg), magnesium-calcium alloy (MgCa), aluminum-silver alloy (AlAg), or ytterbium-silver alloy (YbAg), nano Ag, or a plurality of other metal materials other than the above-mentioned metal materials can be formed.
  • the second electrode 21 may be patterned and formed in a partial region on the second substrate 11 .
  • the second electrode 21 may be applied with a voltage, may be in a ground state, or may be in a floating state.
  • the floating state means a state in which the second electrode 21 is not electrically connected to other components because the second electrode 21 is not connected with a wiring or the like.
  • the gate wirings GL and GE may include a plurality of gate lines GL and a plurality of gate electrodes GE.
  • the data lines DL, SE, and DE may include a plurality of data lines DL, a plurality of source electrodes SE, and a plurality of drain electrodes DE.
  • Gate wirings (GL, GE) and data wirings (DL, SE, DE) are aluminum-based metals such as aluminum (Al) and aluminum alloys, silver-based metals such as silver (Ag) and silver alloys, copper (Cu) and copper It may be made of a copper-based metal such as an alloy, a molybdenum-based metal such as molybdenum (Mo) and a molybdenum alloy, chromium (Cr), titanium (Ti), tantalum (Ta), or the like.
  • the gate lines GL, GE and the data lines DL, SE, and DE may have a multilayer structure including two conductive layers (not shown) having different physical properties.
  • one conductive layer may be made of an aluminum-based metal, a silver-based metal, or a copper-based metal
  • the other conductive layer may be made of a molybdenum-based metal, chromium, titanium, tantalum, or the like.
  • Examples of such a combination include a chromium lower film and an aluminum upper film, and an aluminum lower film and a molybdenum upper film.
  • the present invention is not limited thereto, and the gate lines GL, GE and the data lines DL, SE, and DE may be formed of various metals and conductors.
  • Each gate line GL may extend along a boundary of a pixel in a first direction, for example, in a horizontal direction
  • each data line DL may extend along a boundary in a second direction, for example, a vertical direction of the pixel.
  • the plurality of gate lines GL and the plurality of data lines DL may be cross-arranged to define the sub-pixels PX1 to PX3 .
  • the subpixels PX1 to PX3 may be defined by a region surrounded by the gate line GL and the data line DL.
  • the sub-pixels PX1 to PX3 defined by the plurality of gate lines GL and the plurality of data lines DL may have a constant/uniform size. However, this is exemplary and the present invention is not limited thereto.
  • At least one gate electrode GE is connected to each of the sub-pixels PX1 to PX3 on each gate line GL.
  • the gate electrode GE may be branched from the gate line GL toward the semiconductor layer SL or may be formed by extending the gate line GL.
  • the present invention is not limited thereto, and the gate electrode GE may be defined in a region overlapping the semiconductor layer SL on the extension path of the gate line GL.
  • At least one source electrode SE is connected to each of the sub-pixels PX1 to PX3 on each data line DL.
  • the source electrode SE may be branched from the data line DL toward the semiconductor layer SL or may be formed by extending the data line DL.
  • the present invention is not limited thereto, and the source electrode SE may be defined in a region overlapping the semiconductor layer SL on the extension path of the data line DL.
  • the drain electrode DE may be disposed to be spaced apart from the source electrode SE with respect to the semiconductor layer SL, and may be disposed with the first electrode 20 and the first electrode 20 through a contact hole CNT formed to penetrate the passivation layer PS. may be electrically connected.
  • a gate insulating layer GI may be disposed between the gate lines GL and GE and the data lines DL, SE, and DE.
  • the gate insulating layer GI may be disposed on the gate lines GL and GE, and the data lines DL, SE, and DE may be disposed on the gate insulating layer GI.
  • the gate insulating layer GI may be formed of, for example, silicon nitride (SiN x ), silicon oxide (SiO 2 ), silicon oxynitride (SiON), or a stacked layer thereof.
  • the gate insulating layer GI serves to maintain insulation between the gate wirings GL and GE and conductive thin films such as the data line DL positioned thereon.
  • the semiconductor layer SL is disposed on the gate insulating layer GI, and may be made of, for example, hydrogenated amorphous silicon or polycrystalline silicon.
  • the semiconductor layer SL is disposed to at least partially overlap the gate electrode GE.
  • the semiconductor layer SL constitutes the thin film transistor TFT together with the gate electrode GE, the source electrode SE, and the drain electrode DE.
  • the thin film transistor is disposed at a predetermined position in each sub-pixel, but the present invention is not limited thereto, and the thin film transistor may be disposed in a zigzag shape along the sub-pixel column.
  • the thin film transistor TFT When a channel is formed in the semiconductor layer SL by receiving a gate-on signal to the gate electrode GE, the thin film transistor TFT is turned on and the drain electrode DE is the source electrode SE. A data signal may be received from the , and may be transmitted to the first electrode 20 .
  • a passivation layer may be disposed on the data lines DL, SE, and DE and the exposed semiconductor layer SL.
  • a contact hole CNT exposing at least a portion of the drain electrode DE may be formed in the passivation layer PS. At least a portion of the drain electrode DE exposed through the contact hole CNT may contact the first electrode 20 . Through this, the drain electrode DE and the first electrode 20 may be electrically connected/connected. However, this is an example, and the passivation layer PS may be omitted.
  • the passivation layer PS is, for example, an inorganic material such as silicon nitride or silicon oxide, a-Si:C:O, a-Si:O:F formed by plasma enhanced chemical vapor deposition (PECVD). and the like.
  • PECVD plasma enhanced chemical vapor deposition
  • a planarization layer (not shown) may be disposed on the passivation layer PS.
  • the planarization layer has excellent planarization characteristics and may include a material having photosensitivity.
  • the planarization layer includes a contact hole CNT exposing at least a portion of the drain electrode DE.
  • the first electrode 20 may be disposed on the passivation layer PS or the planarization layer.
  • the first electrode 20 may be disposed for each sub-pixel.
  • the first electrode 20 may not overlap the thin film transistor.
  • the first electrode 20 may be implemented with a uniform/constant size as shown in FIG. 1 .
  • the first electrode 20 may be implemented with a constant/uniform size regardless of the size of the sub-pixels PX1 to PX3 . That is, when viewed from the user's viewing direction, the area of the first electrode 20 disposed in each sub-pixel may have a constant value.
  • this is exemplary and the present invention is not limited thereto.
  • the first electrode 20 may have different areas corresponding to the different areas of the sub-pixels PX1 to PX3 .
  • a portion of the first electrode 20 is also disposed inside the contact hole CNT.
  • a portion of the first electrode 20 disposed inside the contact hole CNT may be in contact with the drain electrode DE to be electrically connected thereto.
  • an electric field is formed together with the second electrode 21 to control the movement of the electrophoretic particles 41 inside the cell.
  • the cell 31 refers to one unit area divided by the adjacent partition walls 30 in the electrophoretic display device. Specifically, the cell 31 includes a dielectric fluid 40 , an electrophoretic particle 41 , a first electrode 20 for controlling the movement of the electrophoretic particle 41 , a second electrode 21 , and an opening can be provided.
  • the cell 31 is preferably formed in a region corresponding to the region in which the sub-pixels PX1 to PX3 are formed. That is, referring to FIG. 3 , the barrier rib 30 for dividing each cell 31 may be formed on the black matrix BM of the color filter. As described above, when the cell 31 is formed in an area corresponding to the sub-pixels PX1 to PX3 , a decrease in light transmittance due to the barrier rib 30 is prevented, and high color reproducibility can be expressed.
  • the barrier rib 30 refers to a structure formed in a columnar shape to maintain a cell gap or a cell gap.
  • the cell gap may mean a gap between the first electrode 20 and the second electrode 21 with reference to FIG. 3 , but is not limited thereto, and protection is provided on the first electrode and/or the second electrode. When a layer or the like is formed, it may mean a gap between the first electrode and/or the second electrode and the protective layer.
  • the partition wall 30 may be formed with a predetermined separation distance to distinguish the neighboring cells 31 .
  • partition wall 30 is shown in a rectangular shape in FIG. 3 , it is not particularly limited as long as it is capable of maintaining cell spacing and distinguishing each cell, and may have, for example, a trapezoidal shape.
  • the barrier rib 30 may be manufactured by a composition used in a conventional barrier rib composition, and in one or more embodiments, it is formed of a photosensitive composition including a transparent material, a black material, a gray material, and the like. it may be
  • the dielectric fluid 40 is to provide a space in which the electrophoretic particles 41 are dispersed, and may protect the electrophoretic particles 41 dispersed therein from external impact.
  • the dielectric fluid 40 may be a liquid solvent or a gaseous solvent, but is preferably a liquid solvent in terms of maintaining the position of the electrophoretic particles 41 even at a relatively low driving voltage and off.
  • the liquid solvent may include a binder, and includes halogenated solvents, saturated hydrocarbons, silicone oils, low molecular weight halogen-containing polymers, Epoxides, vinyl ethers, vinyl esters, aromatic hydrocarbons, toluene, naphthalene, paraffinic liquids and polychlorotrifluoroethylene At least one selected from the group consisting of polymers (poly chlorotrifluoroethylene polymers) may be included.
  • the electrophoretic particle 41 refers to a charged particle that has a light blocking function and performs a light control function through movement by a potential difference generated between the first electrode 20 and the second electrode 21 .
  • Electrophoretic particles 41 conventional or later developed electrophoretic particles may be used, may be composed of a core material, a polymer, and a charged material, depending on the charge of the electrophoretic particle 41, the positive charge of the electrophoretic particle 41 or Determines whether it is negatively charged or not.
  • the electrophoretic particles may include, for example, carbon particles.
  • the color of the electrophoretic particles 41 is not particularly limited as long as it is used to control light through a light blocking function, etc., and in one or a plurality of embodiments, it may be black, chromatic, white, or transparent particles having a high refractive index. there is. In FIGS. 3 to 5 , it is assumed that the electrophoretic particles 41 are black, but the present invention is not limited thereto as described above.
  • the diameter of the electrophoretic particles 41 is preferably 5 nm to 1 ⁇ m in terms of light control function, and more preferably, 50 nm to 500 nm. When the diameter of the electrophoretic particles 41 exceeds 1 ⁇ m, light control capabilities such as shielding and scattering may be deteriorated. In addition, when the diameter is less than 5 nm, it may not be easy to control the electrophoretic particles 41 due to aggregation of the electrophoretic particles 41 .
  • the content of the electrophoretic particles 41 in the unit cell 31 is not particularly limited, but in terms of the light control function, the total weight of the dielectric fluid 40 including the electrophoretic particles 41, 0.1 It is preferably from 10% by weight to 10% by weight. If the content of the electrophoretic particles 41 is less than 0.1% by weight, it may be difficult to smoothly perform the light blocking function, and if it exceeds 10% by weight, the light transmittance may be reduced.
  • the first electrode 20 formed in the cell 31 includes an opening and serves as a collection electrode.
  • the collection electrode serves to structurally aggregate the electrophoretic particles 41 to improve light transmittance and reflectance.
  • the collection electrode may be formed by selectively etching the first electrode 20 in which a partial region is opened.
  • the collection electrode is the first electrode 20 excluding the opening which occupies a certain area of the cell 31, and the collection electrode is in inverse proportion to the opening area.
  • the collection electrode is a region where the electrophoretic particles 41 are aggregated, and is preferably formed adjacent to the barrier rib 30 .
  • “formed adjacent to the partition wall” means that the collection electrode is formed adjacent to the partition wall along the inner circumference of the partition wall 30 of the unit cell 31 region, or in the long axis direction of the cell region. It includes embodiments in which electrophoretic particles can be aggregated at positions adjacent to the barrier ribs in a light-transmitting mode, which will be described later, such as being formed adjacent to the barrier rib along the rib.
  • the "adjacent" includes not only the case where they are formed in physical contact, but also the case where they are substantially adjacent to achieve the object of the present invention.
  • the collection electrode When the collection electrode is formed adjacent to the barrier rib 30 , light absorbed by the electrophoretic particles 41 in the light-transmitting mode may be minimized, and light transmittance and color reflectance may be improved.
  • the light projection mode and the light blocking mode which are driving modes of the electrophoretic display device, will be described in detail later.
  • the area of the collection electrode is preferably 3% to 35% of the area of the unit cell 31, and more preferably, 5% to 25%.
  • the area means an area occupied by a cell and an area occupied by an electrode in a user's viewing direction.
  • the area of the collection electrode is less than 3% of the area of the unit cell 31, it is difficult to form an electric field sufficient to control the electrophoretic particles 41, and the electrophoretic particles floating in the inner space of the cell 31 in the light projection mode ( 41) may occur, and when it exceeds 35%, the absorption rate of light by the electrophoretic particles 41 in the light transmission mode increases, and the light transmittance may decrease.
  • the electrophoretic particles 41 are black charged particles having a negative charge, but is not limited thereto.
  • a negative voltage and a positive voltage may be applied to the first electrode 20 and the second electrode 21 , respectively.
  • the reference voltage, 0V may be applied to the second electrode or may be in a ground state.
  • the electrophoretic particles 41 having a negative charge are generated It may move toward the second electrode 21 and be positioned so as to be in close contact with the second electrode 21 .
  • external light incident to the electrophoretic display device passes through the second substrate 11 and the second electrode 21 to reach the electrophoretic particles 41 , and the incident light is absorbed by the electrophoretic particles 41 . do.
  • the electrophoretic particles 41 are shown in one row, but depending on the content of the electrophoretic particles 41 , they may be arranged in two or more rows.
  • the heat formed by the electrophoretic particles 41 is arranged in two or more rows, light passing between the electrophoretic particles 41 or refracted can be absorbed by the adjacent electrophoretic particles 41, so that the light absorption rate is increased is improved
  • the mode is referred to as a light-shielding mode.
  • a positive voltage and a negative voltage may be applied to the first electrode 20 and the second electrode 21 , respectively, in order to operate the electrophoretic display device in the light-transmitting mode.
  • the reference voltage, 0V may be applied to the second electrode or may be in a ground state.
  • the electrophoretic particles 41 having a negative charge are generated It moves toward the first electrode 20 .
  • the electric field of the first electrode 20 spreads around the first electrode 20 , and becomes weaker as it moves away from the first electrode 20 . Accordingly, in the region where the first electrode 20 is formed, a relatively strong electric field is formed compared to the region in which the opening is formed, and the electrophoretic particles 41 are more strongly influenced by the electric field of the first electrode 20 . Accordingly, the electrophoretic particles 41 may be agglomerated adjacent to the barrier rib 30 by the strong magnetic field of the first electrode 20 .
  • the external light incident to the electrophoretic display device passes through the second substrate 11, the second electrode 21, the dielectric fluid 40, and the sub-pixels PX1 to PX3 in order to reach the reflective layer 60 and , is reflected by the reflective layer 60 and passes through the sub-pixels PX1 to PX3, the dielectric fluid 40, the second electrode 21, and the second substrate 11 in sequence to reach the user.
  • the user can recognize the color of the display device. Since the arrangement of the electrophoretic particles 41 according to the above-described voltage application transmits light, this mode is referred to as a light-transmitting mode.
  • the light transmittance of the electrophoretic display device is preferably 45% or more, more preferably, it may be 55% or more, and the color reflectance is preferably 35% or more, and more preferably, 45% or more. there is.
  • the contrast ratio and color reproducibility of the display device are improved, so that the user can recognize a clearer image.
  • the above-described driving of the electrophoretic particles 41 can be independently driven in units of each sub-pixel PX1 to PX3, so that a full-color electrophoretic display device can be realized.
  • the above-described example exemplifies the case where the first electrode 20 is a collection electrode, but in the same principle, the case where the second electrode is a collection electrode is also the same.
  • the present invention provides a method for manufacturing an electrophoretic display device.
  • FIG. 6 is a flowchart illustrating a method of manufacturing an electrophoretic display device according to an embodiment of the present invention.
  • a reflective layer is formed on a first substrate.
  • a color filter including red (R), green (G), and blue (B) sub-pixels is formed on the reflective layer.
  • An overcoat layer for removing a step difference between the pixel portion and the non-pixel portion of the color filter may be formed on the color filter.
  • a conductive material is applied on the overcoat layer, and a first electrode as a collection electrode to be provided in a cell region defined by a thin film transistor and a barrier rib to be described later is formed by selective etching.
  • a conductive material is applied on a second substrate, and a second electrode is formed by selective etching. Thereafter, a photosensitive composition is applied on the second electrode, and a barrier rib structure is formed by selective etching. A dielectric fluid containing electrophoretic particles is filled in a region defined by the barrier rib structure and the second electrode.
  • an electrophoretic display device is manufactured by bonding the main surfaces of the first substrate and the second substrate using an optically transparent adhesive film (OCA) or the like.
  • OCA optically transparent adhesive film
  • the first substrate, the second substrate, the first electrode, the second electrode, the electrophoretic particle, the barrier rib, the dielectric fluid, the thin film transistor, etc. used in the manufacturing method have substantially the same characteristics as those described in the ⁇ Electrophoretic Display Device> above. indicates
  • An ITO electrode (second electrode) is formed on a PET film (6 inches, thickness 5 mm; second substrate), polyimide, binder resin (crosslinkable oligomer such as urethane acrylate or polyester acrylate), other photoinitiators and After coating the composition containing the photopolymerizable compound, a barrier rib was formed through exposure, development, and cleaning processes using a mask, and a dielectric fluid containing black electrophoretic particles was filled in the space provided by the barrier rib.
  • a reflective layer, color filter, ITO electrode (first electrode) and TFT are formed on glass (6 inches, thickness 5 mm; first substrate), and the first electrode is etched so as to be 6% of the cell area, collecting adjacent to the barrier rib An electrode was formed.
  • the main surfaces of the first and second substrates were combined using OCA to prepare the electrophoretic display device of Example 1.
  • An electrophoretic display device of Example 2 was prepared in the same manner as in Example 1, except that the first electrode was etched to be 12% of the cell area to form a collection electrode.
  • An electrophoretic display device of Example 3 was prepared in the same manner as in Example 1, except that the first electrode was etched to form 23% of the cell area to form a collection electrode.
  • An electrophoretic display device of Example 4 was manufactured in the same manner as in Example 1, except that the collection electrode was formed by etching the first electrode to be 34% of the cell area.
  • An electrophoretic display device of Example 5 was prepared in the same manner as in Example 1, except that the collection electrode was formed by etching the first electrode so as to be 56% of the cell area.
  • An electrophoretic display device of Comparative Example 1 was prepared in the same manner as in Example 1, except that the location of the collection electrode was formed in the center of the cell.
  • An electrophoretic display device of Comparative Example 2 was prepared in the same manner as in Example 2, except that the location of the collection electrode was formed in the center of the cell.
  • An electrophoretic display device of Comparative Example 3 was prepared in the same manner as in Example 3, except that the location of the collection electrode was formed in the center of the cell.
  • An electrophoretic display device of Comparative Example 4 was prepared in the same manner as in Example 4, except that the location of the collection electrode was formed in the center of the cell.
  • An electrophoretic display device of Comparative Example 5 was prepared in the same manner as in Example 5, except that the location of the collection electrode was formed in the center of the cell.
  • the transmittance and reflectance of the display device were measured using an integrating sphere spectrophotometer manufactured by Minolta CM-3700d, and the measurement results are shown in Table 1 below.
  • the transmittance is increased from 71.1% to 72.9% and the reflectance is increased from 50.5% to 57.1%, respectively.
  • the transmittance is 64.7% to 65.6%, and the reflectance is 44.8% to 52.8%, respectively. It can be seen that the increase
  • the reflectance of the electrophoretic display device of the embodiment is further improved compared to the electrophoretic display device of the comparative example. This is because the light that has passed through the cell region of the electrophoretic display device is specularly and diffusely reflected by the lower reflective layer. It can be seen that this is due to the increase.
  • At least the area (ratio) of the collection electrode is 35 with respect to the unit cell area. It can be seen that % or less is a preferred embodiment.
  • the contrast ratio and color reproducibility of the electrophoretic display device are further improved by the formation of the collection electrode adjacent to the barrier rib, and the user can recognize a clearer image. can confirm.
  • the contrast ratio of the electrophoretic display device compared to the conventional reflective display device may be further improved by improving the transmittance of the electrophoretic display device.
  • the color reproducibility of the electrophoretic display device may be further improved compared to the conventional reflective display device by improving the color reflectivity of the electrophoretic display device.

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Molecular Biology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)

Abstract

La présente invention concerne un dispositif d'affichage électrophorétique et son procédé de fabrication, le dispositif d'affichage électrophorétique comprenant : un premier substrat et un second substrat faisant face au premier substrat; une première électrode et une seconde électrode respectivement formées sur le premier substrat et le second substrat; une pluralité de cellules disposées entre le premier substrat et le second substrat et définies par une pluralité de parois de séparation; un fluide diélectrique remplissant l'intérieur de la pluralité de cellules; et au moins un type de particule électrophorétique dispersée dans le fluide diélectrique, la première électrode ou la seconde électrode étant une électrode de collecte qui comprend une ouverture, est formée adjacente à la paroi de séparation, et comprend un filtre coloré disposé entre le premier substrat et la première électrode.
PCT/KR2021/014104 2020-10-14 2021-10-13 Dispositif d'affichage électrophorétique et son procédé de fabrication Ceased WO2022080852A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2020-0132903 2020-10-14
KR1020200132903A KR20220049364A (ko) 2020-10-14 2020-10-14 전기영동 디스플레이 장치 및 이의 제조방법

Publications (1)

Publication Number Publication Date
WO2022080852A1 true WO2022080852A1 (fr) 2022-04-21

Family

ID=81207355

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2021/014104 Ceased WO2022080852A1 (fr) 2020-10-14 2021-10-13 Dispositif d'affichage électrophorétique et son procédé de fabrication

Country Status (2)

Country Link
KR (1) KR20220049364A (fr)
WO (1) WO2022080852A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119805830A (zh) * 2024-12-17 2025-04-11 上海天马微电子有限公司 显示面板、显示装置及显示面板的制备方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120106317A (ko) * 2011-03-18 2012-09-26 (주)바이오제닉스 광결정 구조를 포함하는 디스플레이 장치
KR20140039570A (ko) * 2012-09-24 2014-04-02 한국전자통신연구원 컬러 전자종이 디스플레이 및 그 제조 방법
KR20140078271A (ko) * 2012-12-17 2014-06-25 엘지디스플레이 주식회사 컬러필터기판과 그 제조방법 및 이를 포함하는 액정표시장치
CN106687856B (zh) * 2014-09-10 2019-12-13 伊英克公司 彩色电泳显示器
US20200183247A1 (en) * 2002-09-03 2020-06-11 E Ink Corporation Method of forming an electrophoretic display having a color filter array

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20110134161A (ko) 2010-06-08 2011-12-14 삼성전자주식회사 반사형 컬러 디스플레이 장치

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20200183247A1 (en) * 2002-09-03 2020-06-11 E Ink Corporation Method of forming an electrophoretic display having a color filter array
KR20120106317A (ko) * 2011-03-18 2012-09-26 (주)바이오제닉스 광결정 구조를 포함하는 디스플레이 장치
KR20140039570A (ko) * 2012-09-24 2014-04-02 한국전자통신연구원 컬러 전자종이 디스플레이 및 그 제조 방법
KR20140078271A (ko) * 2012-12-17 2014-06-25 엘지디스플레이 주식회사 컬러필터기판과 그 제조방법 및 이를 포함하는 액정표시장치
CN106687856B (zh) * 2014-09-10 2019-12-13 伊英克公司 彩色电泳显示器

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119805830A (zh) * 2024-12-17 2025-04-11 上海天马微电子有限公司 显示面板、显示装置及显示面板的制备方法

Also Published As

Publication number Publication date
KR20220049364A (ko) 2022-04-21

Similar Documents

Publication Publication Date Title
WO2014104708A1 (fr) Transistor en couches minces, son procédé de fabrication et dispositif d'affichage comprenant le transistor en couches minces
WO2014092442A1 (fr) Dispositif de régulation de la lumière et procédé de fabrication de ce dispositif
WO2014092440A1 (fr) Transistor à couches minces, son procédé de fabrication, et écran comprenant celui-ci
KR102796403B1 (ko) 유기발광 표시장치
WO2011053033A2 (fr) Dispositif d'affichage commandé par champ électrique
WO2020204247A1 (fr) Dispositif d'affichage
WO2020246668A1 (fr) Dispositif d'affichage comprenant une fenêtre de protection
WO2021025234A1 (fr) Dispositif d'affichage
WO2020122376A1 (fr) Dispositif d'affichage
WO2020153593A1 (fr) Unité de détection tactile et dispositif d'affichage la comprenant
WO2022260372A1 (fr) Panneau d'affichage et dispositif électronique le comprenant
KR20080085683A (ko) 유기 ｅｌ 장치, 라인 헤드 및, 전자 기기
WO2021020854A1 (fr) Élément de commande de trajet optique et dispositif d'affichage le comprenant
WO2022260396A1 (fr) Appareil d'affichage et procédé d'inspection d'appareil d'affichage
WO2020159045A1 (fr) Dispositif d'affichage
WO2022080852A1 (fr) Dispositif d'affichage électrophorétique et son procédé de fabrication
CN115701247A (zh) 显示面板和包括该显示面板的显示装置
CN117858574A (zh) 显示装置和制造显示装置的方法
US11614664B2 (en) Electro-optical device, manufacturing method of electro-optical device, and electronic apparatus
KR20220049375A (ko) 전기영동 디스플레이 장치 및 이의 제조방법
WO2021020797A1 (fr) Élément de commande de trajet optique et dispositif d'affichage le comprenant
WO2023140560A1 (fr) Élément de commande de trajet de lumière et dispositif d'affichage le comprenant
WO2025173926A1 (fr) Dispositif d'affichage
WO2025150710A1 (fr) Dispositif d'affichage et son procédé de fabrication
WO2015037859A1 (fr) Panneau à écran tactile

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 21880499

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 21880499

Country of ref document: EP

Kind code of ref document: A1