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WO2019004110A1 - Electric wire for high-frequency coil, and electronic component - Google Patents

Electric wire for high-frequency coil, and electronic component Download PDF

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Publication number
WO2019004110A1
WO2019004110A1 PCT/JP2018/023960 JP2018023960W WO2019004110A1 WO 2019004110 A1 WO2019004110 A1 WO 2019004110A1 JP 2018023960 W JP2018023960 W JP 2018023960W WO 2019004110 A1 WO2019004110 A1 WO 2019004110A1
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WO
WIPO (PCT)
Prior art keywords
high frequency
wire
layer
frequency coil
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2018/023960
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French (fr)
Japanese (ja)
Inventor
北沢 弘
卓也 先田
宮澤 貴志
正平 宮原
岡田 洋一
正宏 柳原
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Totoku Electric Co Ltd
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Totoku Electric Co Ltd
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Publication date
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Priority to CN201880042572.2A priority Critical patent/CN110800068B/en
Publication of WO2019004110A1 publication Critical patent/WO2019004110A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/615Microstructure of the layers, e.g. mixed structure
    • C25D5/617Crystalline layers
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • C25D5/12Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48After-treatment of electroplated surfaces
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B7/00Insulated conductors or cables characterised by their form
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B7/00Insulated conductors or cables characterised by their form
    • H01B7/02Disposition of insulation

Definitions

  • the present invention relates to a wire for high frequency coil and an electronic component. More particularly, the present invention relates to a wire for a high frequency coil which can be used for electronic components such as various high frequency coils and can reduce AC resistance at high frequency, and an electronic component using the wire for the high frequency coil.
  • Patent Document 1 proposes an enameled insulated wire having a core wire made of a conductor plated with a ferromagnetic substance such as pure iron on a copper wire, and describes that the high frequency gain Q is improved by several tens of percent. This characteristic improvement is considered to be based on the reduction of alternating current resistance at high frequency, and by applying a ferromagnetic layer to the outer periphery of the conductor, the external magnetic field is shielded and the outside penetrates the inside without being able to be shielded. It is believed that the increase in AC resistance is suppressed by reducing the eddy current due to the magnetic field and suppressing the loss due to the proximity effect. Further, Patent Document 1 also describes that a nickel plating layer is preferable to a copper plating layer as a plating layer provided on a ferromagnetic layer in order to improve soldering characteristics.
  • Patent Document 2 in order to improve solderability, an iron-plated layer is provided on the outer periphery of a conductor, and a nickel-plated layer having a thickness of 0.03 to 0.1 ⁇ m to ensure solderability. And a method of coating and baking an enamel insulating resin layer made of a polyurethane insulating paint before the iron plating layer is oxidized has been proposed.
  • a polyurethane coating layer is generally applied as an enamel insulation layer.
  • the heat resistance of the insulating resin constituting the insulating covering layer is indicated by a heat resistance class such as type A, E, B, F, or H and the maximum allowable temperature, and the polyurethane forming the above-mentioned polyurethane covering layer is The temperature index corresponds to E class 120 ° C.
  • a high temperature resistant resin such as a modified polyurethane or polyester having a temperature index F of 155 ° C., or a polyesterimide having a temperature index H of 180 ° C.
  • the soldering temperature is as high as 420 ° C. in Class F class and 460 ° C. in Class H class.
  • soldering temperature rises As the soldering temperature rises, cross-section reduction due to solder corrosion of the lead (copper conductor etc.) is likely to occur, and the reliability of the connection strength becomes a problem, so the lead is soldered in a very short time Is desirable. That is, the higher the wetting stress and the shorter the zero crossing time, the more reliable the solder connection can be.
  • An object of the present invention is to provide a wire for a high frequency coil and an electronic component using the wire for a high frequency coil, in which reliability of solder bonding can be ensured and reduction of alternating current resistance at high frequency can be achieved.
  • the electric wire for high frequency coil comprises at least a core wire having a copper conductor and a ferromagnetic layer provided on the outer periphery of the copper conductor, and an insulating covering layer provided on the core wire.
  • the ferromagnetic layer has a gap in the radial direction, tin in the solder at the time of soldering can easily reach the copper conductor. As a result, due to metal-to-metal bonding between copper and tin in the solder, the wetting stress becomes high, and a strong solder joint can be obtained.
  • the ferromagnetic layer has an iron layer and a nickel layer provided on the outer periphery of the iron layer.
  • the number of the gaps is a number visible on the surface of the core and is formed by an axial imaginary line and a radial imaginary line having the same length as the diameter D of the core.
  • the number of squares visible in the square is preferably in the range of 2 or more and 30 or less. According to the present invention, since the number of gaps visible in the square is within the above range, the solder at the time of soldering can easily reach the copper conductor.
  • the gap preferably has a coil width within a range of 0.3 ⁇ m to 5 ⁇ m.
  • the copper conductor is preferably selected from tough pitch copper, oxygen free copper, copper-tin alloy, copper-silver alloy, copper-nickel alloy, copper clad aluminum, copper clad magnesium .
  • the copper conductor since the copper conductor has a low resistance and good conductivity of 60% IACS or more, the copper-based metal is in the outermost layer even when the diameter of the conductor is reduced. It is not easily oxidized and the reliability of the soldered joint can be enhanced.
  • the electronic component according to the present invention is characterized by being configured using the electric wire for a high frequency coil according to the present invention.
  • the electronic component include a winding component such as a high frequency coil, and a circuit board provided with a winding component such as a high frequency coil.
  • the electric wire for high frequency coil comprises at least a core wire having a copper conductor and a ferromagnetic layer provided on the outer periphery of the copper conductor, and an insulating covering layer provided on the core wire.
  • a wire for a high frequency coil characterized in that a wetting stress at the time of soldering is 3.4 mN or more and a zero cross time is 0.4 seconds or less. According to this invention, the wetting stress is high, and a strong solder joint can be obtained.
  • the diameter of the copper conductor is preferably in the range of 0.02 to 0.40 mm.
  • the wetting stress is 3.7 mN or more and the zero crossing time is 0.2 seconds or less.
  • the ferromagnetic layer has an iron layer and a nickel layer provided on the outer periphery of the iron layer, and the iron layer has a Vickers hardness of 200 HV.
  • the ferromagnetic layer has an iron layer and a nickel layer provided on the outer periphery of the iron layer, and the thickness of the iron layer is 0.2 ⁇ m or more and 3.0 ⁇ m. It is preferable that it is the following.
  • the electronic component according to the present invention is characterized in that the electric wire for high frequency coil according to the present invention is connected by soldering.
  • the electronic component include a winding component such as a high frequency coil, and a circuit board provided with a winding component such as a high frequency coil.
  • An electric wire 20 for a high frequency coil according to the present invention includes a core 10 having a copper conductor 1 and a ferromagnetic layer 4 provided on the outer periphery of the copper conductor 1, and the core 10 And at least the insulating covering layer 5 provided on the And as shown to FIG. 3 (A) (B), the ferromagnetic layer 4 has the characteristics in having the clearance gap G of radial direction X.
  • the ferromagnetic layer 4 preferably comprises an iron layer 2 and a nickel layer 3 provided on the outer periphery of the iron layer 2.
  • the solder at the time of soldering easily reaches the copper conductor 1.
  • the wetting stress becomes high, and a strong solder joint can be obtained.
  • the gap G is in a form in which the ferromagnetic layer 4 (for example, the nickel layer 3 and the iron layer 2) is pierced. If there is no gap G, tin in the solder will bond with nickel, but if the thickness of the nickel layer is very thin, nickel will diffuse into the solder instantaneously. As a result, since it will actually be bonded to iron, the wetting stress is low and it is difficult to obtain good bonding strength.
  • Core wire 10 includes copper conductor 1 and ferromagnetic layer 4 provided on the outer periphery of copper conductor 1.
  • the high frequency coil wire 20 is at least constituted by a core 10 and an insulating covering layer 5 provided on the core 10.
  • the copper conductor 1 contains copper or a copper alloy as a main constituent metal, and in the present application, tough pitch copper, oxygen free copper, copper-tin alloy, copper-silver alloy, copper-nickel alloy, copper clad aluminum, copper It is selected from clad magnesium and the like. Since these conductors have low resistance and good conductivity of 60% IACS or higher, even when the diameter of the conductor is reduced, a metal mainly composed of copper is in the outermost layer, so it is difficult to be oxidized, and solder is It is possible to improve the reliability of the post-joining.
  • copper-tin alloy copper-silver alloy, copper-nickel alloy, copper clad aluminum, copper clad magnesium, etc.
  • copper is used so that the above-mentioned conductivity (60% IACS or more) preferable as the high frequency coil wire 20 can be obtained.
  • an alloy its alloy composition is preferably adjusted, and in the case of a clad, it is preferable that the material of the core material and the ratio of the clad material to the core material be adjusted.
  • the diameter of the copper conductor 1 is not particularly limited, but it is preferably fine such that the reliability of connection strength in an environment where the soldering temperature is high is a problem, for example, in the range of about 0.02 to 0.40 mm .
  • the ferromagnetic layer 4 is provided on the copper conductor 1, and when the core wire 10 obtained is used as a high frequency coil wire 20 for a high frequency coil, it acts to reduce AC resistance and improve high frequency characteristics. .
  • the constituent material of the ferromagnetic layer 4 is not particularly limited. For example, iron, cobalt, nickel, permalloy (Ni78-Fe22), permalloy (Ni45-Fe55), supermalloy (Ni75-Cu5-Fe20), Co-Ni-Fe (Co20-Ni40-Fe40) etc. can be mentioned.
  • the method of forming the ferromagnetic layer 4 is not particularly limited, electroplating is preferred as a method of forming on the copper conductor 1, but any of the above-described compositions can be deposited by electroplating, and thus preferably used. it can.
  • the high frequency coil wire 20 according to the present invention is characterized in that a gap G described later is formed in the ferromagnetic layer 4.
  • the ferromagnetic layer 4 will be described by way of an example comprising an iron layer 2 and a nickel layer 3.
  • the ferromagnetic layer 4 composed of other than the iron layer 2 and the nickel layer 3 has the high frequency characteristics slightly different depending on its composition, but the same applies to the action, thickness, soldering and the like of the gap G.
  • the iron layer 2 is provided on the copper conductor 1 and constitutes the ferromagnetic layer 4 together with the nickel layer 3.
  • the thickness of the iron layer 2 is preferably in the range of 0.2 ⁇ m to 3.0 ⁇ m.
  • the AC resistance is reduced to improve the high frequency characteristics.
  • pure iron plating is preferably employed because it is ferromagnetic.
  • the iron layer 2 may contain other elements (for example, nickel, cobalt, phosphorus, boron, etc.) as long as the effect of reducing the AC resistance is not impaired.
  • the iron layer 2 can improve high frequency characteristics, and also has an effect of preventing solder corrosion at the time of soldering.
  • solder corrosion is prevented by the iron layer 2 formed on the copper conductor 1 means that it is difficult to form an intermetallic compound of tin and iron in the solder.
  • the difficulty in forming such intermetallic compounds inhibits the combination of copper and tin in the solder, which results in low wetting stress (ie, bonding strength) and poor connection reliability, and in a short time. It may not be possible to meet the demand for solderability.
  • the present invention is characterized in that the ferromagnetic layer 4 composed of the iron layer 2 and the nickel layer 3 has a gap G in the radial direction X.
  • a gap G By having such a gap G, tin in the solder at the time of soldering can easily reach the copper conductor 1. As a result, due to metal-to-metal bonding between copper and tin in the solder, the wetting stress becomes high, and a strong solder joint can be obtained.
  • the gap G has an integral form which is penetrated from the nickel layer 3 to the iron layer 2
  • the number of gaps G is a number visible on the surface of the core wire 10, and in a square (Y1 ⁇ X1) formed by an axial imaginary line Y1 having the same length as the diameter D of the core wire 10 and a radial imaginary line X1. It is a number that looks like
  • the number of gaps G is preferably in the range of 2 or more and 30 or less. Within this range, the solder during soldering can easily reach the copper conductor, and as a result, good wetting stress can be obtained by the metal-to-metal bonding between copper and tin in the solder, and a strong solder can be obtained. Bonding is obtained.
  • the width of the gap G is preferably in the range of 0.3 ⁇ m to 5 ⁇ m, and more preferably in the range of 0.5 ⁇ m to 2.0 ⁇ m.
  • the solder at the time of soldering can easily reach the copper conductor, and as a result, good wetting stress can be obtained by the metal-to-metal bonding between copper and tin in the solder, and a strong solder joint can be obtained.
  • variety of the clearance gap G exceeds 5 micrometers, it may become a pinhole easily.
  • the gap G can be formed by controlling the mechanical characteristics (tensile strength, elongation) of the copper conductor 1 and the size and angle of the pulley as shown in the later-described embodiment.
  • the gap G can be formed by adding an additive to the iron plating solution or controlling the plating conditions to increase the hardness of the iron layer 2 to 200 HV or more in Vickers hardness.
  • the additive examples include thiourea, saccharin, benzothiazole, JGB (Janas green B), bensalacetone, gelatin, polyethylene glycol, butynediol, coumarin and the like, and several tens of ppm of these may be added.
  • molecules or ions can be adsorbed on the precipitation site alone and precipitated.
  • an iron complex is formed by these additives, and the complex can be adsorbed to the precipitation site to be precipitated. Fine and hard crystal grains can be obtained by the effect of the additive, and the iron layer 2 having a Vickers hardness of about 250 HV can be formed.
  • the thickness of the iron layer 2 By setting the thickness of the iron layer 2 to 0.5 ⁇ m or more, preferably 1 ⁇ m or more, the electrodeposition stress is increased, and a gap G is present in the iron layer 2.
  • fine and hard crystal grains can be obtained, for example, by lowering the temperature of the plating solution from 30 ° C. to 20 ° C., or lowering the pH to 3 to 2, and iron with a Vickers hardness of about 300 HV.
  • Layer 2 can be formed. By setting the thickness of the iron layer 2 to 0.5 ⁇ m or more, preferably 1 ⁇ m or more, the electrodeposition stress is increased, and a gap G is present in the iron layer 2.
  • the iron layer 2 is preferably formed by electroplating, and can be formed by supplying power to the copper conductor 1 in an iron electrolytic solution.
  • the plating solution is not particularly limited as long as it is a plating solution having at least an inorganic salt of iron and a supporting electrolyte.
  • an iron sulfate plating solution or an iron chloride plating solution can be used.
  • the plating solution may contain various additives such as a surfactant and a brightening agent, as needed, as long as the effects of the present invention are not impaired.
  • the nickel layer 3 is provided on the iron layer 2 and constitutes the ferromagnetic layer 4 together with the iron layer 2.
  • the thickness of the nickel layer 3 is preferably in the range of 0.01 ⁇ m or more and 1.0 ⁇ m or less, and when the solderability is improved, the nickel layer 3 is used together with the iron layer 2 for a high frequency coil or the like. AC resistance can be reduced to improve high frequency characteristics. If the nickel layer 3 is too thick, the effect of iron, which is a ferromagnetic material, is reduced, and the suppression of high frequency loss due to the proximity effect can not be achieved.
  • the nickel layer 3 is too thin, in an environment where the soldering temperature is high, the nickel layer 3 and tin in the solder react instantaneously and diffuse, and in fact, for bonding the underlying iron layer 2 to the solder material Therefore, the wetting stress is low and it is difficult to obtain a good bonding strength.
  • the nickel layer 3 and the iron layer 2 constitute the ferromagnetic layer 4, and the ferromagnetic layer 4 has the gap G in the radial direction X as described above. In addition, since the gap G has already been described, the description thereof is omitted here.
  • the nickel layer 3 is preferably formed by electroplating, and can be formed by supplying power to the copper conductor 1 provided with the iron layer 2 in a nickel electrolytic solution.
  • the plating solution is not particularly limited as long as it is a plating solution having at least an inorganic salt of nickel and a supporting electrolyte.
  • a nickel sulfate plating solution or a nickel chloride plating solution can be used.
  • the plating solution may contain various additives such as a surfactant and a brightening agent, as needed, as long as the effects of the present invention are not impaired.
  • the insulating covering layer 5 is provided on the ferromagnetic layer 4 as shown in FIG.
  • the high frequency coil wire 20 is useful as various high frequency coils and wires for high frequency coils (a stranded wire, an insulated wire etc. in which the outer periphery of the gathered strands is integrated with the insulating coating) Available to
  • the insulating covering layer 5 is formed by applying and baking a solderable insulating enamel film, or a solderable insulating enamel film and a fusion enamel film on the outer periphery of the core wire 10 after the ferromagnetic layer 4 is formed. Be done.
  • the solderable insulating enamel coating can be formed, for example, by applying and baking a solderable enamel paint such as general purpose polyurethane, modified polyurethane, or polyester imide. Further, the fused enamel film formed on the outer periphery can be formed by coating and baking a fused enamel paint such as nylon or epoxy. These coatings can be manufactured using a conventional enameled wire manufacturing apparatus. In the case where the insulating coating layer 5 (polyamide imide, polyimide, polyester or the like) which can not be soldered is provided, the insulating coating layer 5 can be satisfactorily soldered by peeling it mechanically and / or chemically.
  • the high frequency coil electric wire 20 according to the present invention provided with the insulating covering layer 5 can be used as a component wire of a litz wire, a component wire of a three-layer insulated wire, or the like, except for the high frequency coil.
  • a core wire 10 before providing the insulating covering layer 5 or a surface of the core wire 10 provided with a protective film such as an imidazole complex film it is twisted to form a stranded wire or assembly. It is good also as an insulated wire etc. for high frequency which set it as the assembly line, and the perimeter of the strand or the assembly line was united by extrusion, tape winding, baking etc.
  • the electronic component according to the present invention is configured using the high frequency coil wire 20 according to the present invention described above.
  • Examples of the electronic component include a winding component such as a high frequency coil, and a circuit board provided with a winding component such as a high frequency coil.
  • Example 1 A 0.1 mm diameter annealed material (ACW, tensile strength: 240 MPa, elongation: 27%) obtained by annealing a 0.1 mm diameter hard copper wire (HCW) in an inert gas atmosphere at 360 ° C. as a copper conductor 1 After degreasing and acid activation treatment, an iron layer 2 with a thickness of 1 ⁇ m is formed by electroplating, and subsequently, a nickel layer 3 with a thickness of 0.03 ⁇ m is formed by electroplating, and a ferromagnetic layer 4 (iron layer A core wire 10 provided with 2 and a nickel layer 3) was obtained.
  • ACW tensile strength: 240 MPa, elongation: 278%
  • Iron plating uses iron sulfate plating solution (250 g / L of ferrous sulfate, 50 g / L of iron chloride, 30 g / L of ammonium chloride), and nickel plating uses nickel sulfate (250 g / L of nickel sulfate, 30 g of nickel chloride) / L and boric acid 15 g / L) were used.
  • the obtained core wire 10 was wound while being in contact with a 350 times diameter pulley at an angle of 120 °, and a gap G was provided in the radial direction X of the ferromagnetic layer 4. Thus, a core wire 10 provided with a gap G was obtained.
  • Example 2 The thickness of the iron layer 2 was 2 ⁇ m.
  • the core wire 10 was obtained in the same manner as in Example 1 except for the above.
  • Example 3 The thickness of the iron layer 2 was 3 ⁇ m.
  • the core wire 10 was obtained in the same manner as in Example 1 except for the above.
  • Example 4 As the copper conductor 1, an annealed material (ACAW, tensile strength: 330 MPa, elongation: 24%) of 0.1 mm in diameter obtained by annealing hard copper-silver alloy wire (HCAW) of 0.1 mm in diameter in an inert gas atmosphere at 650 ° C. Using. The core wire 10 was obtained in the same manner as in Example 1 except for the above.
  • Example 5 As the copper conductor 1, an annealed material (ACSW, tensile strength: 300 MPa, elongation: 25%) of 0.1 mm in diameter obtained by annealing hard copper-tin alloy wire (HCSW) of 0.1 mm in diameter in an inert gas atmosphere at 600 ° C. Using. The core wire 10 was obtained in the same manner as in Example 1 except for the above.
  • ACSW tensile strength: 300 MPa, elongation: 25%
  • HCSW hard copper-tin alloy wire
  • Example 6 A 300 times diameter pulley was used.
  • the core wire 10 was obtained in the same manner as in Example 1 except for the above.
  • Example 7 A 200 times diameter pulley was used.
  • the core wire 10 was obtained in the same manner as in Example 1 except for the above.
  • Example 8 A pulley 100 times the diameter was used.
  • the core wire 10 was obtained in the same manner as in Example 1 except for the above.
  • Example 9 Annealing was performed in an inert gas atmosphere at 300.degree.
  • the core wire 10 was obtained in the same manner as in Example 1 except for the above.
  • the annealed material (ACW) had a tensile strength of 280 MPa and an elongation of 15%.
  • Example 10 Annealing was performed at 280 ° C. in an inert gas atmosphere.
  • the core wire 10 was obtained in the same manner as in Example 1 except for the above.
  • the annealed material (ACW) had a tensile strength of 300 MPa and an elongation of 5%.
  • Example 11 It was wound while contacting the pulley at an angle of 90 °.
  • the core wire 10 was obtained in the same manner as in Example 1 except for the above.
  • Example 12 It was wound using a 100 times diameter pulley and contacting the pulley at a 90 ° angle.
  • the core wire 10 was obtained in the same manner as in Example 1 except for the above.
  • Example 13 An annealed material (ACW, tensile strength: 280 MPa, elongation: 18%) having a diameter of 0.05 mm obtained by annealing a hard copper wire (HCW) having a diameter of 0.05 mm in an inert gas atmosphere at 360 ° C. was used as a copper conductor 1.
  • the core wire 10 was obtained in the same manner as in Example 1 except for the above.
  • Example 14 An annealed material (ACW, tensile strength: 260 MPa, elongation: 22%) having a diameter of 0.08 mm obtained by annealing a hard copper wire (HCW) having a diameter of 0.08 mm in an inert gas atmosphere at 360 ° C. was used as a copper conductor 1.
  • the core wire 10 was obtained in the same manner as in Example 1 except for the above.
  • Example 15 An annealed material (ACW, tensile strength: 240 MPa, elongation: 28%) having a diameter of 0.12 mm obtained by annealing a hard copper wire (HCW) having a diameter of 0.12 mm in an inert gas atmosphere at 360 ° C. was used as a copper conductor 1.
  • the core wire 10 was obtained in the same manner as in Example 1 except for the above.
  • Comparative Example 1 It did not anneal in inert gas atmosphere.
  • the core wire 10 was obtained in the same manner as in Example 1 except for the above.
  • the non-annealed hard copper wire (HCW) had a tensile strength of 400 MPa and an elongation of 2%.
  • Comparative Example 2 The thickness of the iron layer 2 was 2 ⁇ m.
  • the core wire 10 was obtained in the same manner as in Comparative Example 1 except for the above.
  • Comparative Example 3 The thickness of the iron layer 2 was 3 ⁇ m.
  • the core wire 10 was obtained in the same manner as in Comparative Example 1 except for the above.
  • Comparative Example 4 Annealed in an inert gas atmosphere at 280 ° C. and used a 400 times diameter pulley. The others were the same as in Example 1 to obtain a high frequency coil wire.
  • the annealed material (ACW) had a tensile strength of 300 MPa and an elongation of 5%.
  • Comparative Example 5 Annealed in an inert gas atmosphere at 280 ° C. and wound while contacting a 400 times diameter pulley at a 90 ° angle.
  • the core wire 10 was obtained in the same manner as in Example 1 except for the above.
  • the annealed material (ACW) had a tensile strength of 300 MPa and an elongation of 5%.
  • Comparative Example 6 As the copper conductor 1, an annealed material (ACSW, tensile strength: 300 MPa, elongation: 25%) of 0.1 mm in diameter obtained by annealing hard copper-tin alloy wire (HCSW) of 0.1 mm in diameter in an inert gas atmosphere at 600 ° C. Using. Further, it was wound while contacting a pulley having a diameter of 400 times at an angle of 120 °. The core wire 10 was obtained in the same manner as in Example 1 except for the above.
  • ACSW tensile strength: 300 MPa, elongation: 25%
  • HCSW hard copper-tin alloy wire
  • Comparative Example 7 Annealed in an inert gas atmosphere at 300 ° C. and wound while contacting a 350 times diameter pulley at a 160 ° angle.
  • the core wire 10 was obtained in the same manner as in Example 1 except for the above.
  • the annealed material (ACW) had a tensile strength of 240 MPa and an elongation of 15%.
  • Table 1 shows the elements of the core wire 10 obtained in the example and the comparative example.
  • the wetting stress (mN) and the zero cross time (seconds) at the time of soldering were measured with a dynamic wettability tester (WET-6100, manufactured by Lesca Co., Ltd.).
  • the solder was tested at a temperature of 380 ° C. using Sn-3Ag-0.5Cu (manufactured by Senju Metal Industry Co., Ltd.). The results are shown in Table 2.
  • Example 13 The same measurement (wet stress, zero cross time, number of gaps) as in Example 1 was performed on core wires 10 of Examples 13 to 15 having different diameters of copper conductor 1.
  • Example 13 conductor diameter: 0.05 mm
  • wetting stress 1.8 mN
  • zero cross time 0.2 seconds
  • number of gaps G 25, width of gaps G: 1.5 mm
  • product of number and width 37.5.
  • Example 14 conductor diameter: 0.08 mm
  • wetting stress 2.9 mN
  • zero cross time 0.2 seconds
  • number of gaps G 19, width of gaps G: 1.0 mm, product of number and width : 19.
  • Example 15 In Example 15 (conductor diameter: 0.12 mm), wetting stress: 4.3 mN, zero cross time: 0.2 seconds, number of gaps G: 12, width of gaps G: 1.0 mm, product of number and width : 12. From these results, the wetting stress (mN) was divided by a unit surface area, and as a result, Example 1 (conductor diameter: 0.10 mm), Example 13 (conductor diameter: 0.05 mm), Example 14 (Conductor diameter: 0.08 mm) and Example 15 (conductor diameter: 0.12 mm) were all around 5.7 mN / mm 2 .
  • the high frequency characteristics were measured by an LCR meter (a precision LCR meter, 4284 A, 20 Hz to 1 MHz, manufactured by Agilent). The measurement was made with a sample length of 1.50 m, a dedicated bobbin: inner diameter ⁇ 67 mm, and a number of turns of 5 turns, and the terminal was soldered at both ends and connected to the texture for measurement. Using the following samples 1 to 3 (electric wire 20 for high frequency coil) provided with two types of urethane as the insulating coating layer 5, the frequency was changed from 1 kHz to 1 MHz and measurement was performed.
  • Sample 1 2 kinds urethane coated enameled copper wire (21 pieces / ⁇ 0.10 mm)
  • Sample 2 Two types of urethane coated enameled iron plated stranded wire (21 pieces / ⁇ 0.10 mm), gap G: none, iron plating solution (the same iron plating solution as in Example 1, no additive), nickel plating solution (Example The same nickel plating solution as 1), Fe layer thickness: 0.8 ⁇ m, Ni layer thickness: 0.05 ⁇ m
  • Sample 3 Two kinds of urethane coated enameled iron plated stranded wire (21 pieces / ⁇ 0.10 mm), gap G: Yes, iron plating solution (the same iron plating solution as in Example 1, additive: saccharin 2 m / L), nickel plating Solution (the same nickel plating solution as in Example 1), thickness of Fe layer: 0.8 ⁇ m, thickness of Ni layer: 0.05 ⁇ m
  • FIG. 3 (A) is a surface photograph of a seed urethane coated enameled magnetic plated strand of sample 3.
  • FIG. 3 (B) is a surface photograph of the two types of urethane coated enameled magnetic plated strands of sample 2.
  • FIG. 3 (C) is a surface photograph of the two types of urethane-coated enameled copper stranded wire of sample 1.
  • Table 3 is an impedance result
  • Table 4 is a result of resistance loss.
  • Tables 3 and 4 when the ferromagnetic layer 4 is provided, the same high frequency characteristics are shown regardless of the presence or absence of the gap G, and the presence of the gap G lowers the high frequency characteristics. It was not confirmed.

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Abstract

【課題】はんだ接合の信頼性を確保し且つ、高周波での交流抵抗の低減が図れる高周波コイル用電線及びその高周波コイル用電線を用いた電子部品を提供する。 【解決手段】銅導体1と該銅導体1の外周に設けられた強磁性層4とを有する芯線10と、その芯線10上に設けられた絶縁被覆層4とで少なくとも構成され、その強磁性層4が径方向Xの隙間Gを有する、又は、はんだ付け時の濡れ応力が3.4mN以上でゼロクロスタイムが0.4秒以下である高周波コイル用電線20によって上記課題を解決した。An electric wire for a high frequency coil and an electronic component using the electric wire for a high frequency coil, capable of securing reliability of solder joint and reducing AC resistance at a high frequency. A core wire 10 having a copper conductor 1 and a ferromagnetic layer 4 provided on the outer periphery of the copper conductor 1, and an insulating covering layer 4 provided on the core wire 10 The above problem is solved by the high frequency coil electric wire 20 having a gap G in the radial direction X of the layer 4 or having a wetting stress of 3.4 mN or more at the time of soldering and a zero cross time of 0.4 seconds or less.

Description

高周波コイル用電線及び電子部品Electric wire and electronic component for high frequency coil

 本発明は、高周波コイル用電線及び電子部品に関する。さらに詳しくは、本発明は、各種の高周波コイル等の電子部品に用いられて高周波での交流抵抗を低減できる高周波コイル用電線及びその高周波コイル用電線を用いた電子部品に関する。 The present invention relates to a wire for high frequency coil and an electronic component. More particularly, the present invention relates to a wire for a high frequency coil which can be used for electronic components such as various high frequency coils and can reduce AC resistance at high frequency, and an electronic component using the wire for the high frequency coil.

 特許文献1には、銅線上に純鉄等の強磁性体めっきを施した導体を芯線としたエナメル絶縁電線が提案され、高周波利得Qを数10%向上させることが記載されている。この特性向上は、高周波での交流抵抗の低減に基づいていると考えられており、導体の外周に強磁性層を施すことによって、外部磁界を遮蔽するとともに、遮蔽しきれずに内部に侵入した外部磁界による渦電流を低減し、近接効果による損失を抑制することによって、交流抵抗の増大を抑制しているものと考えられている。また、特許文献1には、はんだ付け特性の向上のためには、強磁性層上に設けるめっき層として、銅めっき層よりもニッケルめっき層が好ましいことも記載されている。 Patent Document 1 proposes an enameled insulated wire having a core wire made of a conductor plated with a ferromagnetic substance such as pure iron on a copper wire, and describes that the high frequency gain Q is improved by several tens of percent. This characteristic improvement is considered to be based on the reduction of alternating current resistance at high frequency, and by applying a ferromagnetic layer to the outer periphery of the conductor, the external magnetic field is shielded and the outside penetrates the inside without being able to be shielded. It is believed that the increase in AC resistance is suppressed by reducing the eddy current due to the magnetic field and suppressing the loss due to the proximity effect. Further, Patent Document 1 also describes that a nickel plating layer is preferable to a copper plating layer as a plating layer provided on a ferromagnetic layer in order to improve soldering characteristics.

 また、特許文献2には、はんだ付け性を向上させることを目的として、導体の外周に鉄めっき層を設け、はんだ付け性を確保するために厚さ0.03~0.1μmのニッケルめっき層を設け、鉄めっき層が酸化する前にポリウレタン絶縁塗料からなるエナメル絶縁樹脂層を塗布焼付する方法が提案されている。 Further, in Patent Document 2, in order to improve solderability, an iron-plated layer is provided on the outer periphery of a conductor, and a nickel-plated layer having a thickness of 0.03 to 0.1 μm to ensure solderability. And a method of coating and baking an enamel insulating resin layer made of a polyurethane insulating paint before the iron plating layer is oxidized has been proposed.

実公昭42-1339号公報Japanese Utility Model Publication No. 42-1339 特開昭62-151594号公報Japanese Patent Application Laid-Open No. 62-151594

 コイル部品に用いられる絶縁被覆電線では、エナメル絶縁層としてポリウレタン被覆層が一般的に適用されている。しかし、コイル部品等の電子機器部品の動作環境はより高温側に移行しており、絶縁被覆電線を構成するエナメル絶縁層も耐熱性の要求が増してきた。絶縁被覆層を構成する絶縁性樹脂の耐熱性は、A種、E種、B種、F種、H種等の耐熱クラスと許容最高温度で表示され、上記ポリウレタン被覆層を形成するポリウレタンは、温度指数E種120℃に相当する。最近では、温度指数F種155℃の変性ポリウレタンやポリエステル、更には、温度指数H種180℃のポリエステルイミド等の高耐熱性樹脂を用いることについての要求があり、360℃以下で作業していたはんだ付け温度が、F種クラスでは420℃、H種クラスでは460℃と高くなっている。 In the insulation coated electric wire used for coil parts, a polyurethane coating layer is generally applied as an enamel insulation layer. However, the operating environment of electronic device parts such as coil parts has shifted to a higher temperature side, and the demand for heat resistance of the enamel insulating layer constituting the insulation coated wire has also increased. The heat resistance of the insulating resin constituting the insulating covering layer is indicated by a heat resistance class such as type A, E, B, F, or H and the maximum allowable temperature, and the polyurethane forming the above-mentioned polyurethane covering layer is The temperature index corresponds to E class 120 ° C. Recently, there has been a demand for using a high temperature resistant resin such as a modified polyurethane or polyester having a temperature index F of 155 ° C., or a polyesterimide having a temperature index H of 180 ° C. The soldering temperature is as high as 420 ° C. in Class F class and 460 ° C. in Class H class.

 はんだ付け温度が高くなるにしたがい、導線(銅導体等)のはんだ溶食による断面減少等が起こり易く、接続強度の信頼性が問題となるため、極めて短時間で導線がはんだ付け処理されることが望ましい。すなわち、濡れ応力が高く、且つゼロクロスタイムが短いほど、はんだ接続の信頼性が担保できる。 As the soldering temperature rises, cross-section reduction due to solder corrosion of the lead (copper conductor etc.) is likely to occur, and the reliability of the connection strength becomes a problem, so the lead is soldered in a very short time Is desirable. That is, the higher the wetting stress and the shorter the zero crossing time, the more reliable the solder connection can be.

 また、コイル部品の小型化、高周波化等に伴い、絶縁被覆電線は多数本撚り化、細線化が進んでいる。特に導線は、細線化するほどはんだ溶食等の問題が起こり易い。 Further, with the miniaturization of the coil parts and the increase in frequency, etc., a large number of insulation coated electric wires are twisted and thinned. In particular, as the wire becomes thinner, problems such as solder corrosion tend to occur.

 特許文献2に記載のエナメル電線のはんだ付けでは、はんだ付け温度が高い環境ではニッケルめっき層とはんだ中の錫とが瞬時に反応して拡散し、実際には下地の鉄めっき層とはんだ材料との接合になっている。しかしながら、鉄と錫の金属間化合物は形成され難いことから、濡れ応力(すなわち接合強度)が低く、接続信頼性に劣ってしまう。必要以上にニッケルを厚くすることは、強磁性体である鉄の効果が薄れ、近接効果による高周波損失の抑制には至らない。 In the soldering of the enameled wire described in Patent Document 2, in an environment where the soldering temperature is high, the nickel plating layer and tin in the solder react instantaneously and diffuse, and in fact, the iron plating layer of the base and the solder material It is a joint of However, since it is difficult to form an intermetallic compound of iron and tin, the wetting stress (i.e., the bonding strength) is low and the connection reliability is deteriorated. If the thickness of nickel is made thicker than necessary, the effect of iron, which is a ferromagnetic substance, is weakened, and the reduction of high frequency loss due to the proximity effect can not be achieved.

 本発明の目的は、はんだ接合の信頼性を確保し且つ、高周波での交流抵抗の低減が図れる高周波コイル用電線及びその高周波コイル用電線を用いた電子部品を提供する。 An object of the present invention is to provide a wire for a high frequency coil and an electronic component using the wire for a high frequency coil, in which reliability of solder bonding can be ensured and reduction of alternating current resistance at high frequency can be achieved.

 (1)本発明に係る高周波コイル用電線は、銅導体と該銅導体の外周に設けられた強磁性層とを有する芯線と、該芯線上に設けられた絶縁被覆層とで少なくとも構成された高周波コイル用電線であって、前記強磁性層は、径方向の隙間を有することを特徴とする。この発明によれば、強磁性層が径方向の隙間を有するので、はんだ付け時のはんだ中の錫が銅導体に到達し易い。その結果、銅とはんだ中の錫とが金属間結合することによって、濡れ応力が高くなり、強固なはんだ接合が得られる。 (1) The electric wire for high frequency coil according to the present invention comprises at least a core wire having a copper conductor and a ferromagnetic layer provided on the outer periphery of the copper conductor, and an insulating covering layer provided on the core wire. A wire for a high frequency coil, wherein the ferromagnetic layer has a gap in the radial direction. According to the present invention, since the ferromagnetic layer has a gap in the radial direction, tin in the solder at the time of soldering can easily reach the copper conductor. As a result, due to metal-to-metal bonding between copper and tin in the solder, the wetting stress becomes high, and a strong solder joint can be obtained.

 本発明に係る高周波コイル用電線において、前記強磁性層が、鉄層と、該鉄層の外周に設けられたニッケル層とを有することが好ましい。 In the wire for a high frequency coil according to the present invention, it is preferable that the ferromagnetic layer has an iron layer and a nickel layer provided on the outer periphery of the iron layer.

 本発明に係る高周波コイル用電線において、前記隙間の数は、前記芯線の表面に見える数であって、前記芯線の直径Dと同じ長さの軸方向仮想線と径方向仮想線とで形成した正方形の中に見える数が、2以上、30以下の範囲内であることが好ましい。この発明によれば、正方形の中に見える隙間の数が上記範囲内であるので、はんだ付け時のはんだが銅導体に到達し易い。 In the high frequency coil electric wire according to the present invention, the number of the gaps is a number visible on the surface of the core and is formed by an axial imaginary line and a radial imaginary line having the same length as the diameter D of the core. The number of squares visible in the square is preferably in the range of 2 or more and 30 or less. According to the present invention, since the number of gaps visible in the square is within the above range, the solder at the time of soldering can easily reach the copper conductor.

 本発明に係る高周波コイル用電線において、前記隙間は、幅が0.3μm以上、5μm以下の範囲内でコイルあることが好ましい。 In the wire for a high frequency coil according to the present invention, the gap preferably has a coil width within a range of 0.3 μm to 5 μm.

 本発明に係る高周波コイル用電線において、前記銅導体が、タフピッチ銅、無酸素銅、銅-錫合金、銅-銀合金、銅-ニッケル合金、銅クラッドアルミニウム、銅クラッドマグネシウムから選ばれることが好ましい。この発明によれば、上記銅導体は導電率60%IACS以上の低抵抗な良導電性であるので、導体径を細くした場合であっても、銅を主体とする金属が最外層にあるので酸化され難く、はんだ付け接合の信頼性を高めることができる。 In the wire for a high frequency coil according to the present invention, the copper conductor is preferably selected from tough pitch copper, oxygen free copper, copper-tin alloy, copper-silver alloy, copper-nickel alloy, copper clad aluminum, copper clad magnesium . According to the present invention, since the copper conductor has a low resistance and good conductivity of 60% IACS or more, the copper-based metal is in the outermost layer even when the diameter of the conductor is reduced. It is not easily oxidized and the reliability of the soldered joint can be enhanced.

 (2)本発明に係る電子部品は、上記本発明に係る高周波コイル用電線を用いて構成されていることを特徴とする。電子部品としては、高周波コイル等の巻線部品、高周波コイル等の巻線部品を備えた回路基板等を挙げることができる。 (2) The electronic component according to the present invention is characterized by being configured using the electric wire for a high frequency coil according to the present invention. Examples of the electronic component include a winding component such as a high frequency coil, and a circuit board provided with a winding component such as a high frequency coil.

(3)本発明に係る高周波コイル用電線は、銅導体と該銅導体の外周に設けられた強磁性層とを有する芯線と、該芯線上に設けられた絶縁被覆層とで少なくとも構成された高周波コイル用電線であって、はんだ付け時の濡れ応力が3.4mN以上でゼロクロスタイムが0.4秒以下であることを特徴とする。この発明によれば、濡れ応力が高くなり、強固なはんだ接合が得られる。 (3) The electric wire for high frequency coil according to the present invention comprises at least a core wire having a copper conductor and a ferromagnetic layer provided on the outer periphery of the copper conductor, and an insulating covering layer provided on the core wire. A wire for a high frequency coil, characterized in that a wetting stress at the time of soldering is 3.4 mN or more and a zero cross time is 0.4 seconds or less. According to this invention, the wetting stress is high, and a strong solder joint can be obtained.

 本発明に係る高周波コイル用電線において、前記銅導体の直径が、0.02~0.40mmの範囲内であることが好ましい。 In the wire for a high frequency coil according to the present invention, the diameter of the copper conductor is preferably in the range of 0.02 to 0.40 mm.

 本発明に係る高周波コイル用電線において、前記濡れ応力が、3.7mN以上でゼロクロスタイムが0.2秒以下であることが好ましい。 In the wire for a high frequency coil according to the present invention, preferably, the wetting stress is 3.7 mN or more and the zero crossing time is 0.2 seconds or less.

 本発明に係る高周波コイル用電線において、前記強磁性層が、鉄層と、該鉄層の外周に設けられたニッケル層とを有し、前記鉄層のビッカース硬度が200HVであることが好ましい。 In the electric wire for a high frequency coil according to the present invention, preferably, the ferromagnetic layer has an iron layer and a nickel layer provided on the outer periphery of the iron layer, and the iron layer has a Vickers hardness of 200 HV.

 本発明に係る高周波コイル用電線において、前記強磁性層が、鉄層と、該鉄層の外周に設けられたニッケル層とを有し、前記鉄層の厚さが0.2μm以上3.0μm以下であることが好ましい。 In the wire for a high frequency coil according to the present invention, the ferromagnetic layer has an iron layer and a nickel layer provided on the outer periphery of the iron layer, and the thickness of the iron layer is 0.2 μm or more and 3.0 μm. It is preferable that it is the following.

(4)本発明に係る電子部品は、上記本発明に係る高周波コイル用電線がはんだ付けによって接続されていることを特徴とする。電子部品としては、高周波コイル等の巻線部品、高周波コイル等の巻線部品を備えた回路基板等を挙げることができる。 (4) The electronic component according to the present invention is characterized in that the electric wire for high frequency coil according to the present invention is connected by soldering. Examples of the electronic component include a winding component such as a high frequency coil, and a circuit board provided with a winding component such as a high frequency coil.

 本発明によれば、はんだ付け接合の信頼性を確保し且つ、高周波での交流抵抗の低減が図れる高周波コイル用電線を提供できる。 According to the present invention, it is possible to provide a wire for a high frequency coil capable of securing the reliability of the soldered joint and reducing the AC resistance at a high frequency.

本発明に係る高周波コイル用電線を構成する芯線の一例を示す断面図である。It is sectional drawing which shows an example of the core wire which comprises the electric wire for high frequency coils which concerns on this invention. 本発明に係る高周波コイル用電線の一例を示す断面図である。It is sectional drawing which shows an example of the electric wire for high frequency coils which concerns on this invention. 実施例で得られた芯線の強磁性層の表面の電子顕微鏡写真である。(A)は隙間を有する場合である。(B)は隙間が少ない場合である。(C)は隙間がほとんどない場合である。It is an electron micrograph of the surface of the ferromagnetic layer of the core wire obtained in the Example. (A) is a case where there is a gap. (B) is the case where the gap is small. (C) is a case where there is almost no gap.

 本発明に係る高周波コイル用電線及び電子部品の実施形態について、図面を参照しながら説明する。なお、本発明は、以下に説明する実施形態及び図面に記載した形態と同じ技術的思想の発明を含むものであり、本発明の技術的範囲は実施形態の記載や図面の記載のみに限定されるものでない。 Embodiments of a high frequency coil wire and an electronic component according to the present invention will be described with reference to the drawings. The present invention includes inventions of the same technical concept as the embodiments described below and the embodiments described in the drawings, and the technical scope of the present invention is limited only to the description of the embodiments and the drawings. It is not a thing.

 本発明に係る高周波コイル用電線20は、図1及び図2に示すように、銅導体1とその銅導体1の外周に設けられた強磁性層4とを有する芯線10と、その芯線10上に設けられた絶縁被覆層5とで少なくとも構成されている。そして、図3(A)(B)に示すように、強磁性層4が、径方向Xの隙間Gを有することに特徴がある。強磁性層4は、鉄層2と、鉄層2の外周に設けられたニッケル層3とからなることが好ましい。 An electric wire 20 for a high frequency coil according to the present invention, as shown in FIGS. 1 and 2, includes a core 10 having a copper conductor 1 and a ferromagnetic layer 4 provided on the outer periphery of the copper conductor 1, and the core 10 And at least the insulating covering layer 5 provided on the And as shown to FIG. 3 (A) (B), the ferromagnetic layer 4 has the characteristics in having the clearance gap G of radial direction X. As shown in FIG. The ferromagnetic layer 4 preferably comprises an iron layer 2 and a nickel layer 3 provided on the outer periphery of the iron layer 2.

 この高周波コイル用電線20では、芯線10を構成する強磁性層4が径方向Xの隙間Gを有するので、はんだ付け時のはんだが銅導体1に到達し易い。その結果、銅とはんだ中の錫とが金属間結合することによって、濡れ応力が高くなり、強固なはんだ接合が得られる。なお、隙間Gは、強磁性層4(例えばニッケル層3及び鉄層2)が貫抜かれている形態になっている。隙間Gがない場合は、はんだ中の錫がニッケルと結合することになるが、ニッケル層の厚さが極めて薄い場合にはハンダ中にニッケルが瞬時に拡散されてしまう。その結果、実際には鉄との接合となるため、濡れ応力が低く、良好な接合強度が得られ難い。 In the high frequency coil wire 20, since the ferromagnetic layer 4 constituting the core wire 10 has the gap G in the radial direction X, the solder at the time of soldering easily reaches the copper conductor 1. As a result, due to metal-to-metal bonding between copper and tin in the solder, the wetting stress becomes high, and a strong solder joint can be obtained. The gap G is in a form in which the ferromagnetic layer 4 (for example, the nickel layer 3 and the iron layer 2) is pierced. If there is no gap G, tin in the solder will bond with nickel, but if the thickness of the nickel layer is very thin, nickel will diffuse into the solder instantaneously. As a result, since it will actually be bonded to iron, the wetting stress is low and it is difficult to obtain good bonding strength.

 以下、高周波コイル用電線の構成要素を説明する。 The components of the high frequency coil wire will be described below.

 <芯線>
 芯線10は、銅導体1と、銅導体1の外周に設けられた強磁性層4とを有している。高周波コイル用電線20は、芯線10と、芯線10上に設けられた絶縁被覆層5とで少なくとも構成されている。
<Core wire>
Core wire 10 includes copper conductor 1 and ferromagnetic layer 4 provided on the outer periphery of copper conductor 1. The high frequency coil wire 20 is at least constituted by a core 10 and an insulating covering layer 5 provided on the core 10.

 (銅導体)
 銅導体1は、銅又は銅合金を主な構成金属として含むものであり、本願では、タフピッチ銅、無酸素銅、銅-錫合金、銅-銀合金、銅-ニッケル合金、銅クラッドアルミニウム、銅クラッドマグネシウム等から選ばれる。これらの導体は、導電率60%IACS以上の低抵抗な良導電性であるので、導体径を細くした場合であっても、銅を主体とする金属が最外層にあるので酸化され難く、はんだ付け接合の信頼性を高めることができる。なお、銅-錫合金、銅-銀合金、銅-ニッケル合金、銅クラッドアルミニウム、銅クラッドマグネシウム等においては、高周波コイル用電線20として好ましい上記導電率(60%IACS以上)となるように、銅合金の場合はその合金組成が調整されていることが好ましく、クラッドの場合はコア材の材質やクラッド材とコア材との比が調整されていることが好ましい。
(Copper conductor)
The copper conductor 1 contains copper or a copper alloy as a main constituent metal, and in the present application, tough pitch copper, oxygen free copper, copper-tin alloy, copper-silver alloy, copper-nickel alloy, copper clad aluminum, copper It is selected from clad magnesium and the like. Since these conductors have low resistance and good conductivity of 60% IACS or higher, even when the diameter of the conductor is reduced, a metal mainly composed of copper is in the outermost layer, so it is difficult to be oxidized, and solder is It is possible to improve the reliability of the post-joining. In addition, in the case of copper-tin alloy, copper-silver alloy, copper-nickel alloy, copper clad aluminum, copper clad magnesium, etc., copper is used so that the above-mentioned conductivity (60% IACS or more) preferable as the high frequency coil wire 20 can be obtained. In the case of an alloy, its alloy composition is preferably adjusted, and in the case of a clad, it is preferable that the material of the core material and the ratio of the clad material to the core material be adjusted.

 銅導体1の直径は特に限定されないが、はんだ付け温度が高い環境での接続強度の信頼性が問題になる細さであることが好ましく、例えば0.02~0.40mm程度の範囲内である。 The diameter of the copper conductor 1 is not particularly limited, but it is preferably fine such that the reliability of connection strength in an environment where the soldering temperature is high is a problem, for example, in the range of about 0.02 to 0.40 mm .

 (強磁性層)
 強磁性層4は、銅導体1上に設けられており、得られた芯線10で高周波コイル用電線20として高周波コイルに用いた場合、交流抵抗を低減して高周波特性が向上するように作用する。強磁性層4の構成材料は特に限定されないが、例えば、鉄、コバルト、ニッケル、パーマロイ(Ni78-Fe22)、パーマロイ(Ni45-Fe55)、スーパーマロイ(Ni75-Cu5-Fe20)、Co-Ni-Fe(Co20-Ni40-Fe40)等を挙げることができる。強磁性層4の形成方法は特に限定されないが、銅導体1上に形成する方法としては電気めっき法が好ましいが、前記した各組成のものはいずれも電気めっきで成膜できるので好ましく用いることができる。本発明に係る高周波コイル用電線20では、この強磁性層4に後述する隙間Gが形成されていることに特徴がある。
(Ferromagnetic layer)
The ferromagnetic layer 4 is provided on the copper conductor 1, and when the core wire 10 obtained is used as a high frequency coil wire 20 for a high frequency coil, it acts to reduce AC resistance and improve high frequency characteristics. . The constituent material of the ferromagnetic layer 4 is not particularly limited. For example, iron, cobalt, nickel, permalloy (Ni78-Fe22), permalloy (Ni45-Fe55), supermalloy (Ni75-Cu5-Fe20), Co-Ni-Fe (Co20-Ni40-Fe40) etc. can be mentioned. Although the method of forming the ferromagnetic layer 4 is not particularly limited, electroplating is preferred as a method of forming on the copper conductor 1, but any of the above-described compositions can be deposited by electroplating, and thus preferably used. it can. The high frequency coil wire 20 according to the present invention is characterized in that a gap G described later is formed in the ferromagnetic layer 4.

 以下では、強磁性層4として鉄層2とニッケル層3とからなるものを例にして説明する。鉄層2とニッケル層3以外のもので構成された強磁性層4は、その組成によって高周波特性がやや異なるものの、隙間Gの作用、厚さ、はんだ付け等に関しては同様である。 Hereinafter, the ferromagnetic layer 4 will be described by way of an example comprising an iron layer 2 and a nickel layer 3. The ferromagnetic layer 4 composed of other than the iron layer 2 and the nickel layer 3 has the high frequency characteristics slightly different depending on its composition, but the same applies to the action, thickness, soldering and the like of the gap G.

 (鉄層)
 鉄層2は、銅導体1上に設けられており、ニッケル層3とともに強磁性層4を構成する。この鉄層2の厚さは、0.2μm以上3.0μm以下の範囲内で設けられていることが好ましく、高周波コイル等に使用される場合に交流抵抗を低減して高周波特性が向上する。特に純鉄めっきは強磁性であるので好ましく採用される。なお、交流抵抗を低減する等の効果を阻害しない範囲であれば、鉄層2に他の元素(例えばニッケル、コバルト、リン、ホウ素等)が含まれていてもよい。
(Iron layer)
The iron layer 2 is provided on the copper conductor 1 and constitutes the ferromagnetic layer 4 together with the nickel layer 3. The thickness of the iron layer 2 is preferably in the range of 0.2 μm to 3.0 μm. When the iron layer 2 is used for a high frequency coil or the like, the AC resistance is reduced to improve the high frequency characteristics. In particular, pure iron plating is preferably employed because it is ferromagnetic. The iron layer 2 may contain other elements (for example, nickel, cobalt, phosphorus, boron, etc.) as long as the effect of reducing the AC resistance is not impaired.

 鉄層2は、高周波特性の向上させることができるとともに、はんだ付けの際にはんだ溶食を防止する効果もある。しかし、銅導体1上に形成された鉄層2ではんだ溶食が防止されるということは、はんだ中の錫と鉄との金属間化合物が形成され難いことを意味するものである。そうした金属間化合物の形成のし難さは、銅とはんだ中の錫との化合を阻害するものであり、濡れ応力(すなわち接合強度)が低く、接続信頼性に劣ってしまい、短時間でのはんだ付け性の要請に対応できない場合がある。 The iron layer 2 can improve high frequency characteristics, and also has an effect of preventing solder corrosion at the time of soldering. However, the fact that solder corrosion is prevented by the iron layer 2 formed on the copper conductor 1 means that it is difficult to form an intermetallic compound of tin and iron in the solder. The difficulty in forming such intermetallic compounds inhibits the combination of copper and tin in the solder, which results in low wetting stress (ie, bonding strength) and poor connection reliability, and in a short time. It may not be possible to meet the demand for solderability.

 本発明では、鉄層2及びニッケル層3からなる強磁性層4が、径方向Xの隙間Gを有することに特徴がある。こうした隙間Gを有することにより、はんだ付け時のはんだ中の錫が銅導体1に到達し易い。その結果、銅とはんだ中の錫とが金属間結合することによって、濡れ応力が高くなり、強固なはんだ接合が得られる。隙間Gは、ニッケル層3から鉄層2に貫抜かれている一体的な形態になっている The present invention is characterized in that the ferromagnetic layer 4 composed of the iron layer 2 and the nickel layer 3 has a gap G in the radial direction X. By having such a gap G, tin in the solder at the time of soldering can easily reach the copper conductor 1. As a result, due to metal-to-metal bonding between copper and tin in the solder, the wetting stress becomes high, and a strong solder joint can be obtained. The gap G has an integral form which is penetrated from the nickel layer 3 to the iron layer 2

 隙間Gの数は、芯線10の表面に見える数であって、芯線10の直径Dと同じ長さの軸方向仮想線Y1と径方向仮想線X1とで形成した正方形(Y1×X1)の中に見える数である。その隙間Gの数は、2以上、30以下の範囲内であることが好ましい。こうした範囲内とすることにより、はんだ付け時のはんだが銅導体に到達し易く、その結果、銅とはんだ中の錫とが金属間結合することによって、良好な濡れ応力が得られ、強固なはんだ接合が得られる。隙間Gの数が2未満の場合、はんだ中の錫と鉄との接合が主になるため、濡れ応力が低く、良好な接合強度が得られ難いことがある。一方、隙間Gの数が30を超えると、はんだ中の錫と銅とが瞬時に接合し、はんだ溶食が進行して導体断面積が減少し易いため、接合強度が低下してしまうことがある。隙間Gの幅は0.3μm以上、5μm以下の範囲内が好ましく、0.5μm以上、2.0μm以下の範囲内がより好ましい。この隙間Gにより、はんだ付け時のはんだが銅導体に到達し易く、その結果、銅とはんだ中の錫とが金属間結合することによって、良好な濡れ応力が得られ、強固なはんだ接合が得られる。なお、隙間Gの幅が5μmを超えるとピンホールになり易いことがある。 The number of gaps G is a number visible on the surface of the core wire 10, and in a square (Y1 × X1) formed by an axial imaginary line Y1 having the same length as the diameter D of the core wire 10 and a radial imaginary line X1. It is a number that looks like The number of gaps G is preferably in the range of 2 or more and 30 or less. Within this range, the solder during soldering can easily reach the copper conductor, and as a result, good wetting stress can be obtained by the metal-to-metal bonding between copper and tin in the solder, and a strong solder can be obtained. Bonding is obtained. When the number of the gaps G is less than 2, the bonding between tin in the solder and iron is mainly performed, so the wetting stress may be low and it may be difficult to obtain a good bonding strength. On the other hand, if the number of gaps G exceeds 30, tin and copper in the solder will instantaneously bond, and solder corrosion proceeds and the cross-sectional area of the conductor tends to decrease, so the bonding strength may decrease. is there. The width of the gap G is preferably in the range of 0.3 μm to 5 μm, and more preferably in the range of 0.5 μm to 2.0 μm. By this gap G, the solder at the time of soldering can easily reach the copper conductor, and as a result, good wetting stress can be obtained by the metal-to-metal bonding between copper and tin in the solder, and a strong solder joint can be obtained. Be In addition, when the width | variety of the clearance gap G exceeds 5 micrometers, it may become a pinhole easily.

 隙間Gは、後述の実施例に示すように、銅導体1の機械的特性(引張強度、伸び)や滑車の大きさと角度を制御して形成することができる。また、鉄めっき液に添加剤を加えたり、めっき条件を制御したりして、鉄層2の硬さをビッカース硬度で200HV以上に増すことにより、隙間Gを形成することできる。 The gap G can be formed by controlling the mechanical characteristics (tensile strength, elongation) of the copper conductor 1 and the size and angle of the pulley as shown in the later-described embodiment. In addition, the gap G can be formed by adding an additive to the iron plating solution or controlling the plating conditions to increase the hardness of the iron layer 2 to 200 HV or more in Vickers hardness.

 添加剤としては、例えば、チオ尿素、サッカリン、ベンゾチアゾール、JGB(ヤーナスグリーンB)、ベンサルアセトン、ゼラチン、ポリエチレングリコール、ブチンジオール、クマリン等を挙げることができ、これらを数10ppm添加することにより、分子又はイオンが析出サイトに単独で吸着して析出できる。また、これらの添加剤で鉄錯体を形成させ、その錯体が析出サイトに吸着して析出できる。添加剤の効果により、微細で硬い結晶粒を得ることができ、ビッカース硬度250HV程度の鉄層2を形成することができる。こうした鉄層2の厚さを0.5μm以上、好ましくは1μm以上とすることにより、電着応力が増し、鉄層2に隙間Gが存在していた。 Examples of the additive include thiourea, saccharin, benzothiazole, JGB (Janas green B), bensalacetone, gelatin, polyethylene glycol, butynediol, coumarin and the like, and several tens of ppm of these may be added. As a result, molecules or ions can be adsorbed on the precipitation site alone and precipitated. In addition, an iron complex is formed by these additives, and the complex can be adsorbed to the precipitation site to be precipitated. Fine and hard crystal grains can be obtained by the effect of the additive, and the iron layer 2 having a Vickers hardness of about 250 HV can be formed. By setting the thickness of the iron layer 2 to 0.5 μm or more, preferably 1 μm or more, the electrodeposition stress is increased, and a gap G is present in the iron layer 2.

 めっき条件としては、例えば、めっき液の温度を30℃から20℃に下げたり、pHを3から2に下げたりすることにより、微細で硬い結晶粒を得ることができ、ビッカース硬度300HV程度の鉄層2を形成することができる。こうした鉄層2の厚さを0.5μm以上、好ましくは1μm以上とすることにより、電着応力が増し、鉄層2に隙間Gが存在していた。 As the plating conditions, fine and hard crystal grains can be obtained, for example, by lowering the temperature of the plating solution from 30 ° C. to 20 ° C., or lowering the pH to 3 to 2, and iron with a Vickers hardness of about 300 HV. Layer 2 can be formed. By setting the thickness of the iron layer 2 to 0.5 μm or more, preferably 1 μm or more, the electrodeposition stress is increased, and a gap G is present in the iron layer 2.

 鉄層2は、電気めっきで成膜されることが好ましく、鉄電解液中で銅導体1に給電して形成することができる。めっき液としては、通常、鉄の無機塩と、支持電解質とを少なくとも有するめっき液であれば特に限定されないが、例えば硫酸鉄めっき液や塩化鉄めっき液等を適用することができる。めっき液には、本発明の効果を阻害しない範囲内で、必要に応じて、界面活性剤、光沢剤等の各種の添加剤を含有してもよい。 The iron layer 2 is preferably formed by electroplating, and can be formed by supplying power to the copper conductor 1 in an iron electrolytic solution. The plating solution is not particularly limited as long as it is a plating solution having at least an inorganic salt of iron and a supporting electrolyte. For example, an iron sulfate plating solution or an iron chloride plating solution can be used. The plating solution may contain various additives such as a surfactant and a brightening agent, as needed, as long as the effects of the present invention are not impaired.

 (ニッケル層)
 ニッケル層3は、鉄層2上に設けられており、鉄層2とともに強磁性層4を構成する。このニッケル層3の厚さは、0.01μm以上1.0μm以下の範囲内で設けられていることが好ましく、はんだ付け性を向上させるとともに、鉄層2とともに高周波コイル等に使用される場合に交流抵抗を低減して高周波特性を向上させることができる。ニッケル層3が厚すぎると、強磁性体である鉄の効果が薄れ、近接効果による高周波損失の抑制には至らない。一方、ニッケル層3が薄すぎると、はんだ付け温度が高い環境ではニッケル層3とはんだ中の錫とが瞬時に反応して拡散し、実際には下地の鉄層2とはんだ材料との接合になるため、濡れ応力が低く、良好な接合強度が得られ難い。
(Nickel layer)
The nickel layer 3 is provided on the iron layer 2 and constitutes the ferromagnetic layer 4 together with the iron layer 2. The thickness of the nickel layer 3 is preferably in the range of 0.01 μm or more and 1.0 μm or less, and when the solderability is improved, the nickel layer 3 is used together with the iron layer 2 for a high frequency coil or the like. AC resistance can be reduced to improve high frequency characteristics. If the nickel layer 3 is too thick, the effect of iron, which is a ferromagnetic material, is reduced, and the suppression of high frequency loss due to the proximity effect can not be achieved. On the other hand, if the nickel layer 3 is too thin, in an environment where the soldering temperature is high, the nickel layer 3 and tin in the solder react instantaneously and diffuse, and in fact, for bonding the underlying iron layer 2 to the solder material Therefore, the wetting stress is low and it is difficult to obtain a good bonding strength.

 ニッケル層3は鉄層2とともに強磁性層4を構成し、この強磁性層4は、上述したように径方向Xの隙間Gを有する。なお、隙間Gについては既に説明したのでここではその説明を省略する。 The nickel layer 3 and the iron layer 2 constitute the ferromagnetic layer 4, and the ferromagnetic layer 4 has the gap G in the radial direction X as described above. In addition, since the gap G has already been described, the description thereof is omitted here.

 ニッケル層3は、電気めっきで成膜されることが好ましく、ニッケル電解液中で鉄層2が設けられた銅導体1に給電して形成することができる。めっき液としては、通常、ニッケルの無機塩と、支持電解質とを少なくとも有するめっき液であれば特に限定されないが、例えば硫酸ニッケルめっき液や塩化ニッケルめっき液等を適用することができる。めっき液には、本発明の効果を阻害しない範囲内で、必要に応じて、界面活性剤、光沢剤等の各種の添加剤を含有してもよい。 The nickel layer 3 is preferably formed by electroplating, and can be formed by supplying power to the copper conductor 1 provided with the iron layer 2 in a nickel electrolytic solution. The plating solution is not particularly limited as long as it is a plating solution having at least an inorganic salt of nickel and a supporting electrolyte. For example, a nickel sulfate plating solution or a nickel chloride plating solution can be used. The plating solution may contain various additives such as a surfactant and a brightening agent, as needed, as long as the effects of the present invention are not impaired.

 <絶縁被覆層>
 絶縁被覆層5は、図2に示すように、強磁性層4上に設けられている。絶縁被覆層5を設けることにより、高周波コイル用電線20を、各種高周波コイル、高周コイル用の電線(撚り線、集合させた素線の外周を絶縁被覆により一体化した絶縁電線等)として有用に利用できる。絶縁被覆層5としては、強磁性層4を形成した後の芯線10の外周に、はんだ付け可能な絶縁エナメル被膜、又は、はんだ付け可能な絶縁エナメル被膜と融着エナメル被膜が塗布焼付して形成される。はんだ付け可能な絶縁エナメル被膜は、例えば汎用ポリウレタン、変性ポリウレタン、ポリエステルイミド等のはんだ付け可能なエナメル塗料を塗布焼付けして形成できる。また、更にその外周に形成する融着エナメル被膜は、例えばナイロンやエポキシ等の融着エナメル塗料を塗布焼付けして形成できる。これらの被膜は、通常のエナメル線の製造装置を用いて製造できる。なお、はんだ付けできない絶縁被覆層5(ポリアミドイミド、ポリイミド、ポリエステル等)を設けた場合には、絶縁被覆層5を機械的及び/又は化学的に剥離することで良好にはんだ付けできる。
<Insulating coating layer>
The insulating covering layer 5 is provided on the ferromagnetic layer 4 as shown in FIG. By providing the insulating covering layer 5, the high frequency coil wire 20 is useful as various high frequency coils and wires for high frequency coils (a stranded wire, an insulated wire etc. in which the outer periphery of the gathered strands is integrated with the insulating coating) Available to The insulating covering layer 5 is formed by applying and baking a solderable insulating enamel film, or a solderable insulating enamel film and a fusion enamel film on the outer periphery of the core wire 10 after the ferromagnetic layer 4 is formed. Be done. The solderable insulating enamel coating can be formed, for example, by applying and baking a solderable enamel paint such as general purpose polyurethane, modified polyurethane, or polyester imide. Further, the fused enamel film formed on the outer periphery can be formed by coating and baking a fused enamel paint such as nylon or epoxy. These coatings can be manufactured using a conventional enameled wire manufacturing apparatus. In the case where the insulating coating layer 5 (polyamide imide, polyimide, polyester or the like) which can not be soldered is provided, the insulating coating layer 5 can be satisfactorily soldered by peeling it mechanically and / or chemically.

 絶縁被覆層5が設けられた本発明に係る高周波コイル用電線20は、高周波コイル用以外であっても、リッツ線の構成線材や、三層絶縁電線の構成線材等に用いることもできる。また、これらの他に、絶縁被覆層5を設ける前の芯線10、或いはその芯線10の表面にイミダゾール錯体膜等の保護膜を備えたものを用い、それを撚り合わせて撚り線とし又は集合させた集合線とし、その撚り線又は集合線の外周を、押出し、テープ巻き、焼付け等で一体化した高周波用の絶縁電線等としてもよい。 The high frequency coil electric wire 20 according to the present invention provided with the insulating covering layer 5 can be used as a component wire of a litz wire, a component wire of a three-layer insulated wire, or the like, except for the high frequency coil. In addition to these, using a core wire 10 before providing the insulating covering layer 5 or a surface of the core wire 10 provided with a protective film such as an imidazole complex film, it is twisted to form a stranded wire or assembly. It is good also as an insulated wire etc. for high frequency which set it as the assembly line, and the perimeter of the strand or the assembly line was united by extrusion, tape winding, baking etc.

 <電子部品>
 本発明に係る電子部品は、上記した本発明に係る高周波コイル用電線20を用いて構成されている。電子部品としては、高周波コイル等の巻線部品、高周波コイル等の巻線部品を備えた回路基板等を挙げることができる。
<Electronic parts>
The electronic component according to the present invention is configured using the high frequency coil wire 20 according to the present invention described above. Examples of the electronic component include a winding component such as a high frequency coil, and a circuit board provided with a winding component such as a high frequency coil.

 以下に、実施例を挙げて本発明を更に具体的に説明する。なお、本発明は以下の実施例に限定されるものではない。 Hereinafter, the present invention will be more specifically described by way of examples. The present invention is not limited to the following examples.

 [実施例1]
 直径0.1mmの硬銅線(HCW)を360℃の不活性ガス雰囲気で焼鈍した直径0.1mmの焼鈍材(ACW、引張強度:240MPa、伸び:27%)を銅導体1として用い、表面脱脂、酸活性処理した後、電気めっき法で厚さ1μmの鉄層2を形成し、続いて、電気めっき法で厚さ0.03μmのニッケル層3を形成し、強磁性層4(鉄層2とニッケル層3)を備えた芯線10を得た。鉄めっきは、硫酸鉄めっき液(硫酸第一鉄250g/L、塩化鉄50g/L、塩化アンモニウム30g/L)を用い、ニッケルめっきは、硫酸ニッケルめっき液(硫酸ニッケル250g/L、塩化ニッケル30g/L、ホウ酸15g/L)を用いた。得られた芯線10を、直径の350倍の滑車に120°の角度で接触させながら巻き取り、強磁性層4の径方向Xに隙間Gを設けた。こうして隙間Gを備えた芯線10を得た。
Example 1
A 0.1 mm diameter annealed material (ACW, tensile strength: 240 MPa, elongation: 27%) obtained by annealing a 0.1 mm diameter hard copper wire (HCW) in an inert gas atmosphere at 360 ° C. as a copper conductor 1 After degreasing and acid activation treatment, an iron layer 2 with a thickness of 1 μm is formed by electroplating, and subsequently, a nickel layer 3 with a thickness of 0.03 μm is formed by electroplating, and a ferromagnetic layer 4 (iron layer A core wire 10 provided with 2 and a nickel layer 3) was obtained. Iron plating uses iron sulfate plating solution (250 g / L of ferrous sulfate, 50 g / L of iron chloride, 30 g / L of ammonium chloride), and nickel plating uses nickel sulfate (250 g / L of nickel sulfate, 30 g of nickel chloride) / L and boric acid 15 g / L) were used. The obtained core wire 10 was wound while being in contact with a 350 times diameter pulley at an angle of 120 °, and a gap G was provided in the radial direction X of the ferromagnetic layer 4. Thus, a core wire 10 provided with a gap G was obtained.

 [実施例2]
 鉄層2の厚さを2μmとした。その他は、実施例1と同様にして、芯線10を得た。
Example 2
The thickness of the iron layer 2 was 2 μm. The core wire 10 was obtained in the same manner as in Example 1 except for the above.

 [実施例3]
 鉄層2の厚さを3μmとした。その他は、実施例1と同様にして、芯線10を得た。
[Example 3]
The thickness of the iron layer 2 was 3 μm. The core wire 10 was obtained in the same manner as in Example 1 except for the above.

 [実施例4]
 銅導体1として、直径0.1mmの硬銅銀合金線(HCAW)を650℃の不活性ガス雰囲気で焼鈍した直径0.1mmの焼鈍材(ACAW、引張強度:330MPa、伸び:24%)を用いた。その他は、実施例1と同様にして、芯線10を得た。
Example 4
As the copper conductor 1, an annealed material (ACAW, tensile strength: 330 MPa, elongation: 24%) of 0.1 mm in diameter obtained by annealing hard copper-silver alloy wire (HCAW) of 0.1 mm in diameter in an inert gas atmosphere at 650 ° C. Using. The core wire 10 was obtained in the same manner as in Example 1 except for the above.

 [実施例5]
 銅導体1として、直径0.1mmの硬銅錫合金線(HCSW)を600℃の不活性ガス雰囲気で焼鈍した直径0.1mmの焼鈍材(ACSW、引張強度:300MPa、伸び:25%)を用いた。その他は、実施例1と同様にして、芯線10を得た。
[Example 5]
As the copper conductor 1, an annealed material (ACSW, tensile strength: 300 MPa, elongation: 25%) of 0.1 mm in diameter obtained by annealing hard copper-tin alloy wire (HCSW) of 0.1 mm in diameter in an inert gas atmosphere at 600 ° C. Using. The core wire 10 was obtained in the same manner as in Example 1 except for the above.

 [実施例6]
 直径の300倍の滑車を用いた。その他は、実施例1と同様にして、芯線10を得た。
[Example 6]
A 300 times diameter pulley was used. The core wire 10 was obtained in the same manner as in Example 1 except for the above.

 [実施例7]
 直径の200倍の滑車を用いた。その他は、実施例1と同様にして、芯線10を得た。
[Example 7]
A 200 times diameter pulley was used. The core wire 10 was obtained in the same manner as in Example 1 except for the above.

 [実施例8]
 直径の100倍の滑車を用いた。その他は、実施例1と同様にして、芯線10を得た。
[Example 8]
A pulley 100 times the diameter was used. The core wire 10 was obtained in the same manner as in Example 1 except for the above.

 [実施例9]
 300℃の不活性ガス雰囲気で焼鈍した。その他は、実施例1と同様にして、芯線10を得た。焼鈍材(ACW)は、引張強度:280MPa、伸び:15%であった。
[Example 9]
Annealing was performed in an inert gas atmosphere at 300.degree. The core wire 10 was obtained in the same manner as in Example 1 except for the above. The annealed material (ACW) had a tensile strength of 280 MPa and an elongation of 15%.

 [実施例10]
 280℃の不活性ガス雰囲気で焼鈍した。その他は、実施例1と同様にして、芯線10を得た。焼鈍材(ACW)は、引張強度:300MPa、伸び:5%であった。
[Example 10]
Annealing was performed at 280 ° C. in an inert gas atmosphere. The core wire 10 was obtained in the same manner as in Example 1 except for the above. The annealed material (ACW) had a tensile strength of 300 MPa and an elongation of 5%.

 [実施例11]
 滑車に90°の角度で接触させながら巻き取った。その他は、実施例1と同様にして、芯線10を得た。
[Example 11]
It was wound while contacting the pulley at an angle of 90 °. The core wire 10 was obtained in the same manner as in Example 1 except for the above.

 [実施例12]
 直径の100倍の滑車を用い且つ滑車に90°の角度で接触させながら巻き取った。その他は、実施例1と同様にして、芯線10を得た。
[Example 12]
It was wound using a 100 times diameter pulley and contacting the pulley at a 90 ° angle. The core wire 10 was obtained in the same manner as in Example 1 except for the above.

 [実施例13]
 直径0.05mmの硬銅線(HCW)を360℃の不活性ガス雰囲気で焼鈍した直径0.05mmの焼鈍材(ACW、引張強度:280MPa、伸び:18%)を銅導体1とした。その他は、実施例1と同様にして、芯線10を得た。
[Example 13]
An annealed material (ACW, tensile strength: 280 MPa, elongation: 18%) having a diameter of 0.05 mm obtained by annealing a hard copper wire (HCW) having a diameter of 0.05 mm in an inert gas atmosphere at 360 ° C. was used as a copper conductor 1. The core wire 10 was obtained in the same manner as in Example 1 except for the above.

 [実施例14]
 直径0.08mmの硬銅線(HCW)を360℃の不活性ガス雰囲気で焼鈍した直径0.08mmの焼鈍材(ACW、引張強度:260MPa、伸び:22%)を銅導体1とした。その他は、実施例1と同様にして、芯線10を得た。
Example 14
An annealed material (ACW, tensile strength: 260 MPa, elongation: 22%) having a diameter of 0.08 mm obtained by annealing a hard copper wire (HCW) having a diameter of 0.08 mm in an inert gas atmosphere at 360 ° C. was used as a copper conductor 1. The core wire 10 was obtained in the same manner as in Example 1 except for the above.

 [実施例15]
 直径0.12mmの硬銅線(HCW)を360℃の不活性ガス雰囲気で焼鈍した直径0.12mmの焼鈍材(ACW、引張強度:240MPa、伸び:28%)を銅導体1とした。その他は、実施例1と同様にして、芯線10を得た。
[Example 15]
An annealed material (ACW, tensile strength: 240 MPa, elongation: 28%) having a diameter of 0.12 mm obtained by annealing a hard copper wire (HCW) having a diameter of 0.12 mm in an inert gas atmosphere at 360 ° C. was used as a copper conductor 1. The core wire 10 was obtained in the same manner as in Example 1 except for the above.

 [比較例1]
 不活性ガス雰囲気で焼鈍しなかった。その他は、実施例1と同様にして、芯線10を得た。焼鈍しなかった硬銅線(HCW)は、引張強度:400MPa、伸び:2%であった。
Comparative Example 1
It did not anneal in inert gas atmosphere. The core wire 10 was obtained in the same manner as in Example 1 except for the above. The non-annealed hard copper wire (HCW) had a tensile strength of 400 MPa and an elongation of 2%.

 [比較例2]
 鉄層2の厚さを2μmとした。その他は、比較例1と同様にして、芯線10を得た。
Comparative Example 2
The thickness of the iron layer 2 was 2 μm. The core wire 10 was obtained in the same manner as in Comparative Example 1 except for the above.

 [比較例3]
 鉄層2の厚さを3μmとした。その他は、比較例1と同様にして、芯線10を得た。
Comparative Example 3
The thickness of the iron layer 2 was 3 μm. The core wire 10 was obtained in the same manner as in Comparative Example 1 except for the above.

 [比較例4]
 280℃の不活性ガス雰囲気で焼鈍し、且つ直径の400倍の滑車を用いた。その他は、実施例1と同様にして、高周波コイル用電線を得た。焼鈍材(ACW)は、引張強度:300MPa、伸び:5%であった。
Comparative Example 4
Annealed in an inert gas atmosphere at 280 ° C. and used a 400 times diameter pulley. The others were the same as in Example 1 to obtain a high frequency coil wire. The annealed material (ACW) had a tensile strength of 300 MPa and an elongation of 5%.

 [比較例5]
 280℃の不活性ガス雰囲気で焼鈍し、且つ直径の400倍の滑車に90°の角度で接触させながら巻き取った。その他は、実施例1と同様にして、芯線10を得た。焼鈍材(ACW)は、引張強度:300MPa、伸び:5%であった。
Comparative Example 5
Annealed in an inert gas atmosphere at 280 ° C. and wound while contacting a 400 times diameter pulley at a 90 ° angle. The core wire 10 was obtained in the same manner as in Example 1 except for the above. The annealed material (ACW) had a tensile strength of 300 MPa and an elongation of 5%.

 [比較例6]
 銅導体1として、直径0.1mmの硬銅錫合金線(HCSW)を600℃の不活性ガス雰囲気で焼鈍した直径0.1mmの焼鈍材(ACSW、引張強度:300MPa、伸び:25%)を用いた。さらに、直径の400倍の滑車に120°の角度で接触させながら巻き取った。その他は、実施例1と同様にして、芯線10を得た。
Comparative Example 6
As the copper conductor 1, an annealed material (ACSW, tensile strength: 300 MPa, elongation: 25%) of 0.1 mm in diameter obtained by annealing hard copper-tin alloy wire (HCSW) of 0.1 mm in diameter in an inert gas atmosphere at 600 ° C. Using. Further, it was wound while contacting a pulley having a diameter of 400 times at an angle of 120 °. The core wire 10 was obtained in the same manner as in Example 1 except for the above.

 [比較例7]
 300℃の不活性ガス雰囲気で焼鈍し、且つ直径の350倍の滑車に160°の角度で接触させながら巻き取った。その他は、実施例1と同様にして、芯線10を得た。焼鈍材(ACW)は、引張強度:240MPa、伸び:15%であった。
Comparative Example 7
Annealed in an inert gas atmosphere at 300 ° C. and wound while contacting a 350 times diameter pulley at a 160 ° angle. The core wire 10 was obtained in the same manner as in Example 1 except for the above. The annealed material (ACW) had a tensile strength of 240 MPa and an elongation of 15%.

 [測定と結果]
 (隙間とはんだ付け特性)
 表1に実施例と比較例で得た芯線10の要素を示した。各芯線10の隙間Gは、顕微鏡(株式会社キーエンス製、VX600型、500倍)で測定した。測定は、軸方向仮想線Y1と径方向仮想線X1とで形成した正方形(0.1mm角)の中に見える隙間Gの数を測定するとともに、その隙間Gの平均幅を測定した。隙間Gの数の測定は、径方向仮想線X1(=芯線の直径)の1/4の長さ以上のものをカウントした。隙間Gが連続又は非連続で枝分かれしているものと認識できる場合は、関連する同一(1つ)の隙間Gと見なした。その結果を表2に示した。
[Measurement and result]
(Near gap and soldering characteristics)
Table 1 shows the elements of the core wire 10 obtained in the example and the comparative example. The gap G of each core wire 10 was measured with a microscope (VX600, manufactured by Keyence Corporation, 500 ×). In the measurement, the number of gaps G visible in a square (0.1 mm square) formed by the axial imaginary line Y1 and the radial imaginary line X1 was measured, and the average width of the gaps G was measured. In the measurement of the number of gaps G, one having a length of 1⁄4 or more of the radial imaginary line X1 (= diameter of core wire) was counted. When it can be recognized that the gap G is continuous or discontinuous and branched, it is regarded as the same (one) gap G related. The results are shown in Table 2.

 はんだ付け時の濡れ応力(mN)とゼロクロスタイム(秒)を、動的濡れ性試験機(株式会社レスカ製、WET-6100型)で測定した。はんだは、Sn-3Ag-0.5Cu(千住金属工業株式会社製)を用い、380℃の温度で試験した。その結果を表2に示した。 The wetting stress (mN) and the zero cross time (seconds) at the time of soldering were measured with a dynamic wettability tester (WET-6100, manufactured by Lesca Co., Ltd.). The solder was tested at a temperature of 380 ° C. using Sn-3Ag-0.5Cu (manufactured by Senju Metal Industry Co., Ltd.). The results are shown in Table 2.

Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001

Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002

 表1及び表2の結果より、濡れ応力が3.4mN以上でゼロクロスタイムが0.4秒以下の場合には、隙間Gの数が6以上で、隙間Gの数と幅の積が6以上の場合であった。特に好ましいものとして、濡れ応力が3.7mN以上でゼロクロスタイムが0.2秒以下の場合は、隙間Gの数が12以上で、隙間の数と幅の積が12以上の場合であった。こうした結果は、主に隙間Gの数と幅の積が12以上の場合に実現できていた。こうした隙間Gは、表1に示す製造条件で形成することができた。 According to the results in Tables 1 and 2, when the wetting stress is 3.4 mN or more and the zero crossing time is 0.4 seconds or less, the number of gaps G is 6 or more, and the product of the number of gaps G and the width is 6 or more Was the case. Particularly preferable is the case where the number of gaps G is 12 or more and the product of the number of gaps and the width is 12 or more when the wetting stress is 3.7 mN or more and the zero cross time is 0.2 seconds or less. These results were mainly realized when the product of the number of gaps G and the width was 12 or more. Such a gap G could be formed under the manufacturing conditions shown in Table 1.

 銅導体1の直径の異なる実施例13~15の芯線10について、実施例1と同様の測定(濡れ応力、ゼロクロスタイム、隙間の数)を行った。実施例13(導体径:0.05mm)では、濡れ応力:1.8mN、ゼロクロスタイム:0.2秒、隙間Gの数:25、隙間Gの幅:1.5mm、数と幅との積:37.5であった。実施例14(導体径:0.08mm)では、濡れ応力:2.9mN、ゼロクロスタイム:0.2秒、隙間Gの数:19、隙間Gの幅:1.0mm、数と幅との積:19であった。実施例15(導体径:0.12mm)では、濡れ応力:4.3mN、ゼロクロスタイム:0.2秒、隙間Gの数:12、隙間Gの幅:1.0mm、数と幅との積:12であった。これらの結果より、濡れ応力(mN)については、単位表面積あたりで割って比較した結果、実施例1(導体径:0.10mm)、実施例13(導体径:0.05mm)、実施例14(導体径:0.08mm)、実施例15(導体径:0.12mm)は、いずれも5.7mN/mm付近であった。 The same measurement (wet stress, zero cross time, number of gaps) as in Example 1 was performed on core wires 10 of Examples 13 to 15 having different diameters of copper conductor 1. In Example 13 (conductor diameter: 0.05 mm), wetting stress: 1.8 mN, zero cross time: 0.2 seconds, number of gaps G: 25, width of gaps G: 1.5 mm, product of number and width : 37.5. In Example 14 (conductor diameter: 0.08 mm), wetting stress: 2.9 mN, zero cross time: 0.2 seconds, number of gaps G: 19, width of gaps G: 1.0 mm, product of number and width : 19. In Example 15 (conductor diameter: 0.12 mm), wetting stress: 4.3 mN, zero cross time: 0.2 seconds, number of gaps G: 12, width of gaps G: 1.0 mm, product of number and width : 12. From these results, the wetting stress (mN) was divided by a unit surface area, and as a result, Example 1 (conductor diameter: 0.10 mm), Example 13 (conductor diameter: 0.05 mm), Example 14 (Conductor diameter: 0.08 mm) and Example 15 (conductor diameter: 0.12 mm) were all around 5.7 mN / mm 2 .

 (高周波特性)
 高周波特性をLCRメーター(プレシジョンLCRメーター、4284A、20Hz~1MHz、Agilent社製)で測定した。測定は、試料長:1.50m、専用ボビン:内径φ67mm、ターン数:5ターンとし、端末は両端半田付けしてテクスチャーと接続して測定した。2種ウレタンを絶縁被覆層5として設けた下記の試料1~3(高周波コイル用電線20)を用い、周波数を1kHz~1MHzまで変化させて測定した。
(High frequency characteristics)
The high frequency characteristics were measured by an LCR meter (a precision LCR meter, 4284 A, 20 Hz to 1 MHz, manufactured by Agilent). The measurement was made with a sample length of 1.50 m, a dedicated bobbin: inner diameter φ67 mm, and a number of turns of 5 turns, and the terminal was soldered at both ends and connected to the texture for measurement. Using the following samples 1 to 3 (electric wire 20 for high frequency coil) provided with two types of urethane as the insulating coating layer 5, the frequency was changed from 1 kHz to 1 MHz and measurement was performed.

試料1:2種ウレタン被覆エナメル銅撚り線(21本/φ0.10mm)
試料2:2種ウレタン被覆エナメル鉄めっき撚り線(21本/φ0.10mm)、隙間G:なし、鉄めっき液(実施例1と同じ鉄めっき液、添加剤なし)、ニッケルめっき液(実施例1と同じニッケルめっき液)、Fe層の厚さ:0.8μm、Ni層の厚さ:0.05μm
試料3:2種ウレタン被覆エナメル鉄めっき撚り線(21本/φ0.10mm)、隙間G:あり、鉄めっき液(実施例1と同じ鉄めっき液、添加剤:サッカリン2m/L)、ニッケルめっき液(実施例1と同じニッケルめっき液)、Fe層の厚さ:0.8μm、Ni層の厚さ:0.05μm
Sample 1: 2 kinds urethane coated enameled copper wire (21 pieces / φ 0.10 mm)
Sample 2: Two types of urethane coated enameled iron plated stranded wire (21 pieces / φ 0.10 mm), gap G: none, iron plating solution (the same iron plating solution as in Example 1, no additive), nickel plating solution (Example The same nickel plating solution as 1), Fe layer thickness: 0.8 μm, Ni layer thickness: 0.05 μm
Sample 3: Two kinds of urethane coated enameled iron plated stranded wire (21 pieces / φ 0.10 mm), gap G: Yes, iron plating solution (the same iron plating solution as in Example 1, additive: saccharin 2 m / L), nickel plating Solution (the same nickel plating solution as in Example 1), thickness of Fe layer: 0.8 μm, thickness of Ni layer: 0.05 μm

 図3(A)は試料3の種ウレタン被覆エナメル磁性めっき撚り線の表面写真である。図3(B)は試料2の2種ウレタン被覆エナメル磁性めっき撚り線の表面写真である。図3(C)は試料1の2種ウレタン被覆エナメル銅撚り線の表面写真である。 FIG. 3 (A) is a surface photograph of a seed urethane coated enameled magnetic plated strand of sample 3. FIG. FIG. 3 (B) is a surface photograph of the two types of urethane coated enameled magnetic plated strands of sample 2. FIG. 3 (C) is a surface photograph of the two types of urethane-coated enameled copper stranded wire of sample 1.

 表3は、インピーダンス結果であり、表4は抵抗損失の結果である。表3及び表4からわかるように、強磁性層4が設けられている場合には、隙間Gの有無にかかわらず、同じ高周波特性を示しており、隙間Gの存在が高周波特性を低下させることはないことが確認された。 Table 3 is an impedance result, and Table 4 is a result of resistance loss. As can be seen from Tables 3 and 4, when the ferromagnetic layer 4 is provided, the same high frequency characteristics are shown regardless of the presence or absence of the gap G, and the presence of the gap G lowers the high frequency characteristics. It was not confirmed.

Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003

Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000004

 1 銅導体
 2 鉄層
 3 ニッケル層
 4 強磁性層
 5 絶縁被覆層
 10 芯線
 20 高周波コイル用電線
 11 正方形
 12 円
 G 隙間
 W 隙間の幅
 X 径方向
 X1 径方向仮想線
 Y 軸方向
 Y1 軸方向仮想線
DESCRIPTION OF SYMBOLS 1 copper conductor 2 iron layer 3 nickel layer 4 ferromagnetic layer 5 insulation coating layer 10 core wire 20 electric wire for high frequency coil 11 square 12 circle G gap W gap width X radial direction X1 radial direction imaginary line Y axis direction Y1 axis direction imaginary line

Claims (12)

 銅導体と該銅導体の外周に設けられた強磁性層とを有する芯線と、該芯線上に設けられた絶縁被覆層とで少なくとも構成された高周波コイル用電線であって、前記強磁性層は、径方向の隙間を有する、ことを特徴とする高周波コイル用電線。 A wire for a high frequency coil comprising at least a core wire having a copper conductor and a ferromagnetic layer provided on the outer periphery of the copper conductor, and an insulating covering layer provided on the core wire, wherein the ferromagnetic layer is And a radial gap, characterized in that the wire for a high frequency coil.  前記強磁性層が、鉄層と、該鉄層の外周に設けられたニッケル層とを有する、請求項1に記載の高周波コイル用電線。 The electric wire for a high frequency coil according to claim 1, wherein the ferromagnetic layer has an iron layer and a nickel layer provided on an outer periphery of the iron layer.  前記隙間の数は、前記芯線の表面に見える数であって、前記芯線の直径Dと同じ長さの軸方向仮想線と径方向仮想線とで形成した正方形の中に見える数が、2以上、30以下の範囲内である、請求項1又は2に記載の高周波コイル用電線。 The number of the gaps is a number visible on the surface of the core, and the number of visible in a square formed by an axial imaginary line and a radial imaginary line having the same length as the diameter D of the core is two or more The electric wire for high frequency coils according to claim 1 or 2, which is within the range of 30 or less.  前記隙間は、幅が0.5μm以上、5μm以下の範囲内である、請求項1~3のいずれか1項に記載の高周波コイル用電線。 The electric wire for a high frequency coil according to any one of claims 1 to 3, wherein the gap has a width in a range of 0.5 μm to 5 μm.  前記銅導体が、タフピッチ銅、無酸素銅、銅-錫合金、銅-銀合金、銅-ニッケル合金、銅クラッドアルミニウム、銅クラッドマグネシウムから選ばれる、請求項1~4のいずれか1項に記載の高周波コイル用電線。 The copper conductor according to any one of claims 1 to 4, wherein the copper conductor is selected from tough pitch copper, oxygen free copper, copper-tin alloy, copper-silver alloy, copper-nickel alloy, copper clad aluminum, copper clad magnesium. High frequency coil wire.  請求項1~5のいずれか1項に記載の高周波コイル用電線を用いて構成されていることを特徴とする電子部品。 An electronic component comprising the high frequency coil wire according to any one of claims 1 to 5.  銅導体と該銅導体の外周に設けられた強磁性層とを有する芯線と、該芯線上に設けられた絶縁被覆層とで少なくとも構成された高周波コイル用電線であって、はんだ付け時の濡れ応力が3.4mN以上でゼロクロスタイムが0.4秒以下である、ことを特徴とする高周波コイル用電線。 A wire for a high frequency coil comprising at least a core wire having a copper conductor and a ferromagnetic layer provided on the outer periphery of the copper conductor, and an insulating covering layer provided on the core wire, which is wet when soldered A wire for a high frequency coil characterized by having a stress of 3.4 mN or more and a zero cross time of 0.4 seconds or less.  前記銅導体の直径が、0.02~0.40mmの範囲内である、請求項7に記載の高周波コイル用電線。 The electric wire for high frequency coil according to claim 7, wherein a diameter of the copper conductor is in a range of 0.02 to 0.40 mm.  前記濡れ応力が、3.7mN以上でゼロクロスタイムが0.2秒以下である、請求項7又は8に記載の高周波コイル用電線。 The electric wire for a high frequency coil according to claim 7 or 8, wherein the wetting stress is 3.7 mN or more and the zero crossing time is 0.2 seconds or less.  前記強磁性層が、鉄層と、該鉄層の外周に設けられたニッケル層とを有し、前記鉄層のビッカース硬度が200HVである、請求項7~9のいずれか1項に記載の高周波コイル用電線。 The said ferromagnetic layer has an iron layer and the nickel layer provided in the outer periphery of this iron layer, The Vickers hardness of the said iron layer is 200 HV, Any one of Claims 7-9 High frequency coil wire.  前記強磁性層が、鉄層と、該鉄層の外周に設けられたニッケル層とを有し、前記鉄層の厚さが0.2μm以上3.0μm以下である、請求項7~9のいずれか1項に記載の高周波コイル用電線。 10. The method according to claim 7, wherein the ferromagnetic layer comprises an iron layer and a nickel layer provided on an outer periphery of the iron layer, and the thickness of the iron layer is 0.2 μm or more and 3.0 μm or less. The electric wire for high frequency coils according to any one of the items.  請求項7~11のいずれか1項に記載の高周波コイル用電線がはんだ付けによって接続されている、ことを特徴とする電子部品。 An electronic component characterized in that the high frequency coil wire according to any one of claims 7 to 11 is connected by soldering.
PCT/JP2018/023960 2017-06-26 2018-06-25 Electric wire for high-frequency coil, and electronic component Ceased WO2019004110A1 (en)

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