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WO2018181600A1 - Epoxy resin composition for sealing, and electronic component device - Google Patents

Epoxy resin composition for sealing, and electronic component device Download PDF

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Publication number
WO2018181600A1
WO2018181600A1 PCT/JP2018/013017 JP2018013017W WO2018181600A1 WO 2018181600 A1 WO2018181600 A1 WO 2018181600A1 JP 2018013017 W JP2018013017 W JP 2018013017W WO 2018181600 A1 WO2018181600 A1 WO 2018181600A1
Authority
WO
WIPO (PCT)
Prior art keywords
epoxy resin
mass
resin composition
inorganic filler
sealing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2018/013017
Other languages
French (fr)
Japanese (ja)
Inventor
実佳 田中
慧地 堀
東哲 姜
格 山浦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to CN201880021591.7A priority Critical patent/CN110461939A/en
Priority to JP2019510060A priority patent/JP7060011B2/en
Priority to CN202211541808.1A priority patent/CN115785621A/en
Publication of WO2018181600A1 publication Critical patent/WO2018181600A1/en
Anticipated expiration legal-status Critical
Priority to JP2022065362A priority patent/JP7472931B2/en
Ceased legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape

Definitions

  • the present invention relates to an epoxy resin composition for sealing and an electronic component device.
  • JP 2010-24464 A JP 2008-297530 A Japanese Patent Laid-Open No. 2003-213089
  • the epoxy resin composition for sealing in which an inorganic filler having excellent heat dissipation such as alumina is highly filled has a problem that the hardness at the time of heating is lowered and the material is not necessarily excellent in continuous moldability. .
  • An object of one embodiment of the present invention is to provide an epoxy resin composition for sealing excellent in thermal hardness and thermal conductivity, and an electronic component device including an element sealed using the same.
  • ⁇ 1> (A) an epoxy resin, (B) a curing agent, (C) a curing accelerator, and (D) an inorganic filler, and the inorganic filler contains 75% by mass or more of alumina with respect to the total amount of the inorganic filler.
  • An epoxy resin composition for sealing containing 98% by mass.
  • the inorganic filler includes alumina and at least one inorganic filler selected from the group consisting of silicon nitride, boron nitride, magnesium oxide, zinc oxide, silicon carbide, and aluminum nitride.
  • the epoxy resin composition for sealing as described.
  • ⁇ 3> The epoxy resin composition for sealing according to ⁇ 1> or ⁇ 2>, wherein the curing agent is a phenol curing agent.
  • An electronic component device comprising an element and a cured product of the sealing epoxy resin composition according to any one of ⁇ 1> to ⁇ 3>, which seals the element.
  • an epoxy resin composition for sealing excellent in thermal hardness and thermal conductivity and an electronic component device including an element sealed using the same.
  • each component may contain a plurality of corresponding substances.
  • the content of each component means the total content of the plurality of substances present in the composition unless otherwise specified.
  • the sealing epoxy resin composition of the present disclosure includes (A) an epoxy resin, (B) a curing agent, (C) a curing accelerator, and (D) an inorganic filler, and the inorganic filler is the total amount of the inorganic filler. On the other hand, it contains 75% by mass to 98% by mass of alumina. Thereby, the epoxy resin composition for sealing which has high heat dissipation, suppressing the fall of the hardness at the time of heat
  • Epoxy resin composition The epoxy resin composition for sealing of the present disclosure (hereinafter also referred to as “epoxy resin composition”) includes (A) an epoxy resin. (A) The type of epoxy resin is not particularly limited as long as it has an epoxy group in the molecule.
  • the epoxy resin is selected from the group consisting of phenol compounds such as phenol, cresol, xylenol, resorcin, catechol, bisphenol A and bisphenol F, and naphthol compounds such as ⁇ -naphthol, ⁇ -naphthol and dihydroxynaphthalene.
  • phenol compounds such as phenol, cresol, xylenol, resorcin, catechol, bisphenol A and bisphenol F
  • naphthol compounds such as ⁇ -naphthol, ⁇ -naphthol and dihydroxynaphthalene.
  • a novolak epoxy resin obtained by epoxidizing a novolak resin obtained by condensation or cocondensation of at least one phenolic compound and an aliphatic aldehyde compound such as formaldehyde, acetaldehyde or propionaldehyde under an acidic catalyst.
  • a triphenylmethane type epoxy resin obtained by epoxidizing a triphenylmethane type phenol resin obtained by condensation or cocondensation in the above phenol compound and naphthol compound, formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde, salicylaldehyde, etc.
  • Copolymerization type epoxy resin obtained by epoxidizing a novolak resin obtained by cocondensation with an aldehyde compound under an acidic catalyst; diphenylmethane type epoxy resin that is diglycidyl ether such as bisphenol A, bisphenol AD, bisphenol F; alkyl Biphenyl type epoxy resin which is diglycidyl ether of substituted or unsubstituted biphenol; Stilbene type epoxy resin which is diglycidyl ether of stilbene phenol compound Sulfur atom-containing epoxy resins that are diglycidyl ethers such as bisphenol S; epoxy resins that are glycidyl ethers of alcohols such as butanediol, polyethylene glycol, and polypropylene glycol; and many other resins such as phthalic acid, isophthalic acid, tetrahydrophthalic acid, and dimer acid
  • a glycidyl ester type epoxy resin which is a glycidyl ester of a
  • the epoxy equivalent (molecular weight / number of epoxy groups) of the epoxy resin is not particularly limited. From the viewpoint of balance of various properties such as moldability, reflow resistance, and electrical reliability, it is preferably 100 g / eq to 1000 g / eq, and more preferably 150 g / eq to 500 g / eq.
  • the epoxy equivalent of the epoxy resin is a value measured by a method according to JIS K 7236: 2009.
  • the melting point or softening point of the epoxy resin is not particularly limited. From the viewpoint of moldability and reflow resistance, the temperature is preferably 40 ° C to 180 ° C, and from the viewpoint of handleability when preparing the epoxy resin composition, it is more preferably 50 ° C to 130 ° C.
  • the melting point or softening point of the epoxy resin is a value measured by a single cylinder rotational viscometer method described in JIS K 7234: 1986 and JIS K 7233: 1986.
  • the content of the epoxy resin (A) in the epoxy resin composition is preferably 2% by mass to 10% by mass, and 2.5% by mass to 7% by mass from the viewpoints of strength, fluidity, heat resistance, moldability and the like. It is more preferably 5% by mass, and further preferably 3% by mass to 6.5% by mass.
  • the epoxy resin composition of the present disclosure includes (B) a curing agent.
  • curing agent is not restrict
  • (B) curing agents include phenol curing agents, amine curing agents, acid anhydride curing agents, polymercaptan curing agents, polyaminoamide curing agents, isocyanate curing agents, and blocked isocyanate curing agents.
  • the curing agent is preferably a phenol curing agent.
  • phenol curing agent examples include resorcin, catechol, bisphenol A, bisphenol F, phenol compounds such as phenol, cresol, xylenol, phenylphenol, and aminophenol, and naphthol compounds such as ⁇ -naphthol, ⁇ -naphthol, and dihydroxynaphthalene.
  • a novolak-type phenol resin obtained by condensation or cocondensation of at least one phenolic compound selected from the group consisting of aldehyde compounds such as formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde, and salicylaldehyde with an acidic catalyst; Compounds such as phenol aralkyl resins and naphthol aralkyl resins synthesized from dimethoxyparaxylene, bis (methoxymethyl) biphenyl, etc.
  • aldehyde compounds such as formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde, and salicylaldehyde with an acidic catalyst
  • Compounds such as phenol aralkyl resins and naphthol aralkyl resins synthesized from dimethoxyparaxylene, bis (methoxymethyl) biphenyl, etc.
  • Ralalkyl-type phenol resin paraxylylene-modified phenol resin; metaxylylene-modified phenol resin; melamine-modified phenol resin; terpene-modified phenol resin; Examples thereof include cyclopentadiene type naphthol resin; cyclopentadiene modified phenol resin; polycyclic aromatic ring modified phenol resin; biphenyl type phenol resin.
  • a phenol aralkyl resin is preferable from the viewpoint of improving reflow resistance.
  • These phenol curing agents may be used alone or in combination of two or more.
  • the functional group equivalent of the curing agent (hydroxyl equivalent in the case of a phenol curing agent) is not particularly limited. From the viewpoint of balance of various properties such as moldability, reflow resistance, and electrical reliability, it is preferably 70 g / eq to 1000 g / eq, and more preferably 80 g / eq to 500 g / eq.
  • the hydroxyl equivalent of the phenol curing agent is a value measured by a method according to JIS K 0070: 1992.
  • the melting point or softening point of the curing agent is not particularly limited. From the viewpoint of moldability and reflow resistance, the temperature is preferably 40 ° C to 180 ° C, and from the viewpoint of handleability during production of the epoxy resin composition, it is more preferably 50 ° C to 130 ° C.
  • the melting point or softening point of the curing agent is a value measured by a single cylinder rotational viscometer method described in JIS K 7234: 1986 and JIS K 7233: 1986.
  • the number of functional groups in the epoxy resin is not particularly limited. From the viewpoint of reducing the amount of each unreacted component, it is preferably set in the range of 0.5 to 1.5, more preferably in the range of 0.6 to 1.3, and 0.7 More preferably, it is set in the range of -1.2.
  • the epoxy resin composition of the present disclosure includes (C) a curing accelerator.
  • the kind in particular of hardening accelerator is not restrict
  • a phosphorus type hardening accelerator is preferable from a viewpoint of the electrical reliability of an epoxy resin composition, and the fluidity
  • the curing accelerator examples include 1,8-diaza-bicyclo (5,4,0) undecene-7, 1,5-diaza-bicyclo (4,3,0) nonene, 5,6- Tertiary amines such as dibutylamino-1,8-diaza-bicyclo (5,4,0) undecene-7, benzyldimethylamine, triethanolamine, dimethylaminoethanol, tris (dimethylaminomethyl) phenol and their derivatives Imidazoles such as 2-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole and their derivatives, organic phosphines such as tributylphosphine, methyldiphenylphosphine, triphenylphosphine, diphenylphosphine, and phenylphosphine; These phosphines include maleic anhydride and ben Phosphorus compounds having intramolecular polarization formed by adding
  • the content of the (C) curing accelerator in the epoxy resin composition is not particularly limited as long as a curing acceleration effect is obtained.
  • the content of (C) curing accelerator in the epoxy resin composition is 0.1% by mass to 8.0% by mass with respect to the total amount of (A) epoxy resin and (B) curing agent.
  • the content is 0.5% by mass to 5.0% by mass, and more preferably 1.0% by mass to 3.0% by mass.
  • the curing time tends to be shortened.
  • the content is 0.0 mass% or less, the curing rate is not too high and a good molded product tends to be obtained.
  • the epoxy resin composition of the present disclosure includes (D) an inorganic filler.
  • the inorganic filler contains 75% by mass to 98% by mass of alumina with respect to the total amount of the inorganic filler.
  • alumina an epoxy resin composition excellent in thermal conductivity is obtained, and by containing 98 mass% or less of alumina, an epoxy resin composition in which a decrease in hardness during heating is suppressed is obtained.
  • the inorganic filler preferably contains 75% by mass to 95% by mass of alumina, more preferably 75% by mass to 92% by mass, and more preferably 75% by mass to 90% by mass with respect to the total amount of the inorganic filler. More preferably, the content is 75% by mass to 85% by mass.
  • inorganic filler contains 75 mass% to 98 mass% of alumina, it contains 2 mass% to 25 mass% of inorganic filler other than alumina.
  • inorganic fillers other than alumina include fused silica, crystalline silica, silicon nitride, boron nitride, magnesium oxide, zinc oxide, silicon carbide, aluminum nitride, zircon, and silicic acid.
  • Powders such as calcium, calcium carbonate, potassium titanate, beryllia, zirconia, fosterite, steatite, spinel, mullite, titania, beads spheroidized from these, single crystal fiber such as potassium titanate, glass fiber, aramid fiber And carbon fiber.
  • Other inorganic fillers include aluminum hydroxide, zinc borate, magnesium hydroxide and the like from the viewpoint of flame retardancy. Other inorganic fillers may be used alone or in combination of two or more.
  • the inorganic filler is at least one selected from the group consisting of silicon nitride, boron nitride, magnesium oxide, zinc oxide, silicon carbide and aluminum nitride as an inorganic filler other than alumina from the viewpoint of thermal conductivity. It is preferable that an inorganic filler is included. Of these, silicon carbide is more preferable.
  • the inorganic filler preferably contains 5% by mass to 25% by mass of inorganic fillers other than alumina, more preferably 8% by mass to 25% by mass, and more preferably 10% by mass with respect to the total amount of the inorganic filler. More preferably, it is contained in an amount of from 25 to 25% by mass, and particularly preferably 15 to 25% by mass.
  • the (D) inorganic filler preferably contains 5% by mass to 25% by mass of silicon carbide, more preferably 8% by mass to 25% by mass, and more preferably 10% by mass to 25% by mass with respect to the total amount of the inorganic filler. More preferably, the content is more preferably 15% by mass to 25% by mass.
  • the content of the inorganic filler (D) in the epoxy resin composition is 83% by mass to 97% by mass with respect to the total amount of the epoxy resin composition from the viewpoints of hygroscopicity, reduction of linear expansion coefficient, strength improvement, and solder heat resistance. It is preferably 85% by mass to 94% by mass, more preferably 88% by mass to 93% by mass.
  • the content of alumina in the epoxy resin composition is preferably 60% by mass to 95% by mass with respect to the total amount of the epoxy resin composition from the viewpoints of hygroscopicity, reduction of linear expansion coefficient, strength improvement, and solder heat resistance. 65 mass% to 90 mass% is more preferable, and 75 mass% to 85 mass% is still more preferable.
  • the shape of the (D) inorganic filler is not particularly limited, and examples thereof include powder, sphere, and fiber. Among them, a spherical shape is preferable from the viewpoint of fluidity and mold wear during molding of the epoxy resin composition.
  • the epoxy resin composition of this indication may contain other ingredients other than the above-mentioned (A) epoxy resin, (B) hardening agent, (C) hardening accelerator, and (D) inorganic filler.
  • the other components are not particularly limited as long as the effects of the present invention are achieved, and include mold release agents; coupling agents; flame retardants such as brominated epoxy resins and phosphorus compounds; flame retardants such as antimony trioxide and antimony tetraoxide.
  • Various additives such as auxiliary agents; coloring agents; stress relaxation agents;
  • specific examples of a mold release agent, a coupling agent, a colorant, and a stress relaxation agent will be described as other components.
  • the epoxy resin composition may further contain a release agent from the viewpoint of obtaining good release properties from the mold during molding.
  • the release agent is not particularly limited, and conventionally known release agents can be used. Specifically, higher fatty acids such as carnauba wax, montanic acid, stearic acid, higher fatty acid metal salts, fatty acid ester waxes such as paraffin wax, montanic acid ester, polyolefin waxes such as polyethylene oxide and non-oxidized polyethylene, etc. Can be mentioned.
  • a mold release agent may be used individually by 1 type, or may be used in combination of 2 or more type.
  • the content of the release agent is preferably 10% by mass or less based on the total amount of (A) the epoxy resin and (B) the curing agent, and the effect From the viewpoint of exhibiting the above, it is preferably 0.5% by mass or more.
  • the epoxy resin composition may further contain a coupling agent.
  • the kind in particular of coupling agent is not restrict
  • Examples of the coupling agent include a silane coupling agent and a titanium coupling agent.
  • a coupling agent may be used individually by 1 type, or may be used in combination of 2 or more type.
  • silane coupling agents examples include vinyltrichlorosilane, vinyltriethoxysilane, vinyltris ( ⁇ -methoxyethoxy) silane, ⁇ -methacryloxypropyltrimethoxysilane, ⁇ - (3,4-epoxycyclohexyl) ethyltrimethoxysilane.
  • ⁇ -glycidoxypropyltrimethoxysilane vinyltriacetoxysilane, ⁇ -mercaptopropyltrimethoxysilane, ⁇ -aminopropyltriethoxysilane, ⁇ - [bis ( ⁇ -hydroxyethyl)] aminopropyltriethoxysilane, N - ⁇ - (aminoethyl) - ⁇ -aminopropyltrimethoxysilane, ⁇ - ( ⁇ -aminoethyl) aminopropyldimethoxymethylsilane, N- (trimethoxysilylpropyl) ethylenediamine, N- (dimethoxymethylsilyloxy) Propyl) ethylenediamine, methyltrimethoxysilane, methyltriethoxysilane, N- ⁇ - (N-vinylbenzylaminoethyl) - ⁇ -aminopropyltrimethoxysilane, ⁇ -chlor
  • titanium coupling agent examples include isopropyl triisostearoyl titanate, isopropyl tris (dioctyl pyrophosphate) titanate, isopropyl tri (N-aminoethyl-aminoethyl) titanate, tetraoctyl bis (ditridecyl phosphite) titanate, tetra ( 2,2-diallyloxymethyl-1-butyl) bis (ditridecylphosphite) titanate, bis (dioctylpyrophosphate) oxyacetate titanate, bis (dioctylpyrophosphate) ethylene titanate, isopropyltrioctanoyl titanate, isopropyldimethacryloiso Stearoyl titanate, isopropyltridodecylbenzenesulfonyl titanate, isopropylisostearoyl diacrylic Titanate,
  • an epoxy resin composition contains a coupling agent
  • the content rate of a coupling agent is 3 mass% or less with respect to the whole epoxy resin composition, from a viewpoint of exhibiting the effect, it is 0. It is preferable that it is 1 mass% or more.
  • the epoxy resin composition may further contain a colorant.
  • a colorant include known colorants such as carbon black, organic dyes, organic pigments, iron oxide, red lead, and bengara.
  • the content of the colorant can be appropriately selected according to the purpose and the like.
  • a coloring agent may be used individually by 1 type, or may be used in combination of 2 or more type.
  • conductive particles such as carbon black are used in combination as the colorant
  • the epoxy resin composition may further contain a stress relaxation agent such as silicone oil, silicone rubber particles, and synthetic rubber. By including the stress relaxation agent, warpage deformation of the package and generation of package cracks can be further reduced.
  • a stress relaxation agent the well-known stress relaxation agent (flexible agent) generally used is mentioned.
  • thermoplastic elastomers such as silicone, styrene, olefin, urethane, polyester, polyether, polyamide, polybutadiene, NR (natural rubber), NBR (acrylonitrile-butadiene rubber), acrylic Rubber particles such as rubber, urethane rubber and silicone powder, core-shell such as methyl methacrylate-styrene-butadiene copolymer (MBS), methyl methacrylate-silicone copolymer, methyl methacrylate-butyl acrylate copolymer Examples thereof include rubber particles having a structure.
  • a stress relaxation agent may be used individually by 1 type, or may be used in combination of 2 or more type.
  • the method for preparing the epoxy resin composition is not particularly limited.
  • a general technique there can be mentioned a method in which components of a predetermined blending amount are sufficiently mixed by a mixer or the like, and then melt-kneaded by a mixing roll, an extruder or the like, cooled and pulverized. More specifically, for example, a method in which predetermined amounts of the above-described components are stirred and mixed, kneaded with a kneader, roll, extruder, or the like that has been heated to 70 ° C. to 140 ° C., cooled, and pulverized. be able to.
  • An electronic component device of the present disclosure includes an element and a cured product of the above-described sealing epoxy resin composition that seals the element.
  • Electronic component devices include lead frames, pre-wired tape carriers, wiring boards, glass, silicon wafers, organic substrates and other supporting members, active elements such as semiconductor chips, transistors, diodes, and thyristors, capacitors, and resistors. And an element portion obtained by mounting a passive element such as a coil) with an epoxy resin composition. More specifically, the element is fixed on the lead frame, the terminal part of the element such as a bonding pad and the lead part are connected by wire bonding, bump, etc., and then sealed by transfer molding or the like using an epoxy resin composition.
  • DIP Device Inline Package
  • PLCC Physical Leaded Chip Carrier
  • QFP Quad Flat Package
  • SOP Small Outline Package T
  • SOJ Small Outline J-Lead Package
  • General resin-sealed IC Integrated Circuit
  • TQFP Thin Quad Flat Package
  • TCP Tepe Carrier Package having a structure in which elements connected to bumpers by bumps are sealed with an epoxy resin composition; elements connected to wiring formed on a support member by wire bonding, flip chip bonding, solder, etc.
  • COB Chip On Board
  • COB Chip On Board module having a structure sealed with an epoxy resin composition, hybrid IC, multi-chip module, etc .
  • an element is mounted on the surface of a support member in which terminals for connecting a wiring board are formed on the back surface, and bumps Or after connecting an element and the wiring formed in the support member by wire bonding, BGA (Ball Grid Array), CSP (Chip Size Package), MCP (Multi Chip) which has the structure which sealed the element with the epoxy resin composition Packag e).
  • an epoxy resin composition can be used suitably also in a printed wiring board.
  • Examples of a method for sealing an electronic component device using an epoxy resin composition include a low-pressure transfer molding method, an injection molding method, and a compression molding method. Among these, the low-pressure transfer molding method is common.
  • Alumina filler, Denka Co., Ltd., product name "DAB10FCAll” ⁇ DA-2 ⁇ ⁇ ⁇ Alumina filler, Admatechs Co., Ltd., product name “AE-2000SI” DB-1 ... Alumina filler / silica filler 9/1 (mass ratio), Denka Co., Ltd., product name "DAB-10FC” DC-1 ... average particle diameter (D50, particle diameter corresponding to 50% volume accumulation from the small diameter side) 14.0 ⁇ m and specific surface area 0.3 m 2 / g silicon carbide.
  • DC-2 average Silicon carbide with particle size (D50, particle size corresponding to 50% volume accumulation from the small diameter side) 18.6 ⁇ m and specific surface area 0.3 m 2 / g
  • Evaluation of the thermal conductivity of the epoxy resin composition was performed as follows.
  • the epoxy resin composition prepared as described above was subjected to a test piece for thermal conductivity evaluation using a vacuum hand press molding machine under conditions of a mold temperature of 175 ° C. to 180 ° C., a molding pressure of 7.0 MPa, and a curing time of 600 seconds ( 1.1 cm square and 1.1 mm thickness).
  • the molded specimen was measured for thermal diffusivity in the thickness direction.
  • the thermal diffusivity was measured by a laser flash method (apparatus: LFA447 nanoflash, manufactured by NETZSCH). Pulse light irradiation was performed under the conditions of a pulse width of 0.31 (ms) and an applied voltage of 247V.

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  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
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  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Epoxy Resins (AREA)
  • Sealing Material Composition (AREA)

Abstract

An epoxy resin composition for sealing, which contains (A) an epoxy resin, (B) a curing agent, (C) a curing accelerator and (D) an inorganic filler, and which is configured such that the inorganic filler contains 75% by mass to 98% by mass of alumina relative to the total mass of the inorganic filler.

Description

封止用エポキシ樹脂組成物及び電子部品装置Epoxy resin composition for sealing and electronic component device

 本発明は、封止用エポキシ樹脂組成物及び電子部品装置に関する。 The present invention relates to an epoxy resin composition for sealing and an electronic component device.

 近年、スマートフォン等の電子機器の軽薄短小化及び高機能化が進んでいる。これに伴い、高速大容量の情報を取り扱う電子機器から発生する熱が増大しており、電子機器が誤作動を起こす恐れがある。そのため、電子機器内部から発生した熱を効率よく放熱すること、すなわち高い放熱性(高い熱伝導性)が求められている。放熱性の高い機器構造等が検討されるとともに、封止材自体の高放熱化も検討されている。その手法として、放熱性に優れたアルミナのような無機充填材の使用、無機充填材の高充填化等が検討されてきた(例えば、特許文献1~3)。 In recent years, electronic devices such as smartphones are becoming lighter, thinner, and more functional. Along with this, heat generated from electronic devices that handle high-speed and large-capacity information is increasing, and the electronic devices may malfunction. Therefore, it is required to efficiently dissipate heat generated from the inside of the electronic device, that is, high heat dissipation (high thermal conductivity). In addition to studying equipment structures with high heat dissipation, etc., higher heat dissipation of the sealing material itself is also being studied. As such a technique, the use of an inorganic filler such as alumina, which has excellent heat dissipation, and high filling of the inorganic filler have been studied (for example, Patent Documents 1 to 3).

特開2010-24464号公報JP 2010-24464 A 特開2008-297530号公報JP 2008-297530 A 特開2003-213089号公報Japanese Patent Laid-Open No. 2003-213089

 しかしながら、アルミナのような放熱性に優れた無機充填材を高充填化させた封止用エポキシ樹脂組成物は、熱時硬度が低下し、必ずしも連続成形性に優れた材料ではないという問題がある。 However, the epoxy resin composition for sealing in which an inorganic filler having excellent heat dissipation such as alumina is highly filled has a problem that the hardness at the time of heating is lowered and the material is not necessarily excellent in continuous moldability. .

 本発明の一形態は、熱時硬度及び熱伝導性に優れる封止用エポキシ樹脂組成物並びにこれを用いて封止された素子を備える電子部品装置を提供することを目的とする。 An object of one embodiment of the present invention is to provide an epoxy resin composition for sealing excellent in thermal hardness and thermal conductivity, and an electronic component device including an element sealed using the same.

 前述のように、電子機器から発生する熱を放熱するための手法として、放熱性に優れたアルミナの高充填化がこれまで行われてきたが、熱時硬度が低下し、連続成形性に問題がある。本発明者らは、鋭意検討の結果、アルミナの一部を別の無機充填材に置き換えることにより、エポキシ樹脂組成物の優れた熱伝導性と優れた熱時硬度とを両立させるに至った。
 例えば、上記課題を解決するための手段には、以下の実施態様が含まれる。
As mentioned above, as a method for dissipating the heat generated from electronic equipment, high filling of alumina with excellent heat dissipation has been carried out so far, but the hardness during heat decreases and there is a problem with continuous formability There is. As a result of intensive studies, the present inventors have achieved a balance between excellent thermal conductivity and excellent hot hardness of the epoxy resin composition by replacing a part of alumina with another inorganic filler.
For example, the following embodiments are included in the means for solving the above problems.

<1> (A)エポキシ樹脂、(B)硬化剤、(C)硬化促進剤及び(D)無機充填材を含み、前記無機充填材は、無機充填材全量に対し、アルミナを75質量%~98質量%含む封止用エポキシ樹脂組成物。
<2> 前記無機充填材は、アルミナと、窒化ケイ素、窒化ホウ素、酸化マグネシウム、酸化亜鉛、炭化ケイ素及び窒化アルミニウムからなる群より選択される少なくとも一つの無機充填材と、を含む<1>に記載の封止用エポキシ樹脂組成物。
<3> 前記硬化剤がフェノール硬化剤である<1>又は<2>に記載の封止用エポキシ樹脂組成物。
<1> (A) an epoxy resin, (B) a curing agent, (C) a curing accelerator, and (D) an inorganic filler, and the inorganic filler contains 75% by mass or more of alumina with respect to the total amount of the inorganic filler. An epoxy resin composition for sealing containing 98% by mass.
<2> The inorganic filler includes alumina and at least one inorganic filler selected from the group consisting of silicon nitride, boron nitride, magnesium oxide, zinc oxide, silicon carbide, and aluminum nitride. The epoxy resin composition for sealing as described.
<3> The epoxy resin composition for sealing according to <1> or <2>, wherein the curing agent is a phenol curing agent.

<4> 素子と、前記素子を封止する<1>~<3>のいずれか1つに記載の封止用エポキシ樹脂組成物の硬化物とを備える電子部品装置。 <4> An electronic component device comprising an element and a cured product of the sealing epoxy resin composition according to any one of <1> to <3>, which seals the element.

 本発明の一形態によれば、熱時硬度及び熱伝導性に優れる封止用エポキシ樹脂組成物並びにこれを用いて封止された素子を備える電子部品装置を提供することができる。 According to one embodiment of the present invention, it is possible to provide an epoxy resin composition for sealing excellent in thermal hardness and thermal conductivity, and an electronic component device including an element sealed using the same.

 以下、本発明を実施するための形態について詳細に説明する。但し、本発明は以下の実施形態に限定されるものではない。以下の実施形態において、その構成要素(要素ステップ等も含む)は、特に明示した場合を除き、必須ではない。数値及びその範囲についても同様であり、本発明を制限するものではない。 Hereinafter, embodiments for carrying out the present invention will be described in detail. However, the present invention is not limited to the following embodiments. In the following embodiments, the components (including element steps and the like) are not essential unless otherwise specified. The same applies to numerical values and ranges thereof, and the present invention is not limited thereto.

 本開示において「~」を用いて示された数値範囲には、「~」の前後に記載される数値がそれぞれ最小値及び最大値として含まれる。
 本開示中に段階的に記載されている数値範囲において、一つの数値範囲で記載された上限値又は下限値は、他の段階的な記載の数値範囲の上限値又は下限値に置き換えてもよい。また、本開示中に記載されている数値範囲において、その数値範囲の上限値又は下限値は、実施例に示されている値に置き換えてもよい。
 本開示において各成分は該当する物質を複数種含んでいてもよい。組成物中に各成分に該当する物質が複数種存在する場合、各成分の含有率は、特に断らない限り、組成物中に存在する当該複数種の物質の合計の含有率を意味する。
In the present disclosure, numerical ranges indicated using “to” include numerical values described before and after “to” as the minimum value and the maximum value, respectively.
In the numerical ranges described stepwise in the present disclosure, the upper limit value or the lower limit value described in one numerical range may be replaced with the upper limit value or the lower limit value of another numerical description. . Further, in the numerical ranges described in the present disclosure, the upper limit value or the lower limit value of the numerical range may be replaced with the values shown in the examples.
In the present disclosure, each component may contain a plurality of corresponding substances. When a plurality of substances corresponding to each component are present in the composition, the content of each component means the total content of the plurality of substances present in the composition unless otherwise specified.

〔封止用エポキシ樹脂組成物〕
 本開示の封止用エポキシ樹脂組成物は、(A)エポキシ樹脂、(B)硬化剤、(C)硬化促進剤及び(D)無機充填材を含み、前記無機充填材は、無機充填材全量に対し、アルミナを75質量%~98質量%含む。これにより、熱時硬度の低下を抑制しつつ高い放熱性を有する封止用エポキシ樹脂組成物が提供される。また、本開示の封止用エポキシ樹脂組成物は、例えば、電子部品装置を封止するために用いられる。
[Epoxy resin composition for sealing]
The sealing epoxy resin composition of the present disclosure includes (A) an epoxy resin, (B) a curing agent, (C) a curing accelerator, and (D) an inorganic filler, and the inorganic filler is the total amount of the inorganic filler. On the other hand, it contains 75% by mass to 98% by mass of alumina. Thereby, the epoxy resin composition for sealing which has high heat dissipation, suppressing the fall of the hardness at the time of heat | fever is provided. Moreover, the epoxy resin composition for sealing of this indication is used in order to seal an electronic component apparatus, for example.

[(A)エポキシ樹脂]
 本開示の封止用エポキシ樹脂組成物(以下、「エポキシ樹脂組成物」とも称する。)は、(A)エポキシ樹脂を含む。(A)エポキシ樹脂としては、分子中にエポキシ基を有するものであればその種類は特に制限されない。
[(A) Epoxy resin]
The epoxy resin composition for sealing of the present disclosure (hereinafter also referred to as “epoxy resin composition”) includes (A) an epoxy resin. (A) The type of epoxy resin is not particularly limited as long as it has an epoxy group in the molecule.

 (A)エポキシ樹脂として具体的には、フェノール、クレゾール、キシレノール、レゾルシン、カテコール、ビスフェノールA、ビスフェノールF等のフェノール化合物及びα-ナフトール、β-ナフトール、ジヒドロキシナフタレン等のナフトール化合物からなる群より選ばれる少なくとも1種のフェノール性化合物と、ホルムアルデヒド、アセトアルデヒド、プロピオンアルデヒド等の脂肪族アルデヒド化合物とを酸性触媒下で縮合又は共縮合させて得られるノボラック樹脂をエポキシ化したものであるノボラック型エポキシ樹脂(フェノールノボラック型エポキシ樹脂、オルソクレゾールノボラック型エポキシ樹脂等);上記フェノール性化合物と、ベンズアルデヒド、サリチルアルデヒド等の芳香族アルデヒド化合物とを酸性触媒下で縮合又は共縮合させて得られるトリフェニルメタン型フェノール樹脂をエポキシ化したものであるトリフェニルメタン型エポキシ樹脂;上記フェノール化合物及びナフトール化合物と、ホルムアルデヒド、アセトアルデヒド、プロピオンアルデヒド、ベンズアルデヒド、サリチルアルデヒド等のアルデヒド化合物とを酸性触媒下で共縮合させて得られるノボラック樹脂をエポキシ化したものである共重合型エポキシ樹脂;ビスフェノールA、ビスフェノールAD、ビスフェノールF等のジグリシジルエーテルであるジフェニルメタン型エポキシ樹脂;アルキル置換又は非置換のビフェノールのジグリシジルエーテルであるビフェニル型エポキシ樹脂;スチルベン系フェノール化合物のジグリシジルエーテルであるスチルベン型エポキシ樹脂;ビスフェノールS等のジグリシジルエーテルである硫黄原子含有エポキシ樹脂;ブタンジオール、ポリエチレングリコール、ポリプロピレングリコール等のアルコール類のグリシジルエーテルであるエポキシ樹脂;フタル酸、イソフタル酸、テトラヒドロフタル酸、ダイマー酸等の多価カルボン酸化合物のグリシジルエステルであるグリシジルエステル型エポキシ樹脂;アニリン、ジアミノジフェニルメタン、イソシアヌル酸等の窒素原子に結合した活性水素をグリシジル基で置換したものであるグリシジルアミン型エポキシ樹脂;ジシクロペンタジエンとフェノール化合物の共縮合樹脂をエポキシ化したものであるジシクロペンタジエン型エポキシ樹脂;分子内のオレフィン結合をエポキシ化したものであるビニルシクロヘキセンジエポキシド、3,4-エポキシシクロヘキシルメチル-3,4-エポキシシクロヘキサンカルボキシレート、2-(3,4-エポキシ)シクロヘキシル-5,5-スピロ(3,4-エポキシ)シクロヘキサン-m-ジオキサン等の脂環型エポキシ樹脂;パラキシリレン変性フェノール樹脂のグリシジルエーテルであるパラキシリレン変性エポキシ樹脂;メタキシリレン変性フェノール樹脂のグリシジルエーテルであるメタキシリレン変性エポキシ樹脂;テルペン変性フェノール樹脂のグリシジルエーテルであるテルペン変性エポキシ樹脂;ジシクロペンタジエン変性フェノール樹脂のグリシジルエーテルであるジシクロペンタジエン変性エポキシ樹脂;シクロペンタジエン変性フェノール樹脂のグリシジルエーテルであるシクロペンタジエン変性エポキシ樹脂;多環芳香環変性フェノール樹脂のグリシジルエーテルである多環芳香環変性エポキシ樹脂;ナフタレン環含有フェノール樹脂のグリシジルエーテルであるナフタレン型エポキシ樹脂;ハロゲン化フェノールノボラック型エポキシ樹脂;ハイドロキノン型エポキシ樹脂;トリメチロールプロパン型エポキシ樹脂;オレフィン結合を過酢酸等の過酸で酸化して得られる線状脂肪族エポキシ樹脂;フェノールアラルキル樹脂、ナフトールアラルキル樹脂等のアラルキル型フェノール樹脂をエポキシ化したものであるアラルキル型エポキシ樹脂;などが挙げられる。更にはシリコーン樹脂のエポキシ化物、アクリル樹脂のエポキシ化物等もエポキシ樹脂として挙げられる。これらのエポキシ樹脂は、1種を単独で用いても2種以上を組み合わせて用いてもよい。 (A) Specifically, the epoxy resin is selected from the group consisting of phenol compounds such as phenol, cresol, xylenol, resorcin, catechol, bisphenol A and bisphenol F, and naphthol compounds such as α-naphthol, β-naphthol and dihydroxynaphthalene. A novolak epoxy resin obtained by epoxidizing a novolak resin obtained by condensation or cocondensation of at least one phenolic compound and an aliphatic aldehyde compound such as formaldehyde, acetaldehyde or propionaldehyde under an acidic catalyst. Phenol novolac type epoxy resin, orthocresol novolak type epoxy resin, etc.); the above phenolic compounds and aromatic aldehyde compounds such as benzaldehyde and salicylaldehyde in an acidic catalyst A triphenylmethane type epoxy resin obtained by epoxidizing a triphenylmethane type phenol resin obtained by condensation or cocondensation in the above; phenol compound and naphthol compound, formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde, salicylaldehyde, etc. Copolymerization type epoxy resin obtained by epoxidizing a novolak resin obtained by cocondensation with an aldehyde compound under an acidic catalyst; diphenylmethane type epoxy resin that is diglycidyl ether such as bisphenol A, bisphenol AD, bisphenol F; alkyl Biphenyl type epoxy resin which is diglycidyl ether of substituted or unsubstituted biphenol; Stilbene type epoxy resin which is diglycidyl ether of stilbene phenol compound Sulfur atom-containing epoxy resins that are diglycidyl ethers such as bisphenol S; epoxy resins that are glycidyl ethers of alcohols such as butanediol, polyethylene glycol, and polypropylene glycol; and many other resins such as phthalic acid, isophthalic acid, tetrahydrophthalic acid, and dimer acid A glycidyl ester type epoxy resin which is a glycidyl ester of a polyvalent carboxylic acid compound; a glycidyl amine type epoxy resin in which an active hydrogen bonded to a nitrogen atom such as aniline, diaminodiphenylmethane, isocyanuric acid or the like is substituted with a glycidyl group; Dicyclopentadiene type epoxy resin that is epoxidized co-condensation resin of phenol compound; Vinylcyclohexene diepoxy that is epoxidized olefin bond in the molecule Fats such as side, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, 2- (3,4-epoxy) cyclohexyl-5,5-spiro (3,4-epoxy) cyclohexane-m-dioxane Cyclic epoxy resin; paraxylylene-modified epoxy resin that is glycidyl ether of paraxylylene-modified phenolic resin; metaxylylene-modified epoxy resin that is glycidyl ether of metaxylylene-modified phenolic resin; terpene-modified epoxy resin that is glycidyl ether of terpene-modified phenolic resin; dicyclopentadiene Dicyclopentadiene modified epoxy resin which is glycidyl ether of modified phenolic resin; Cyclopentadiene modified epoxy resin which is glycidyl ether of cyclopentadiene modified phenolic resin Poxy resin; Polycyclic aromatic ring modified epoxy resin that is glycidyl ether of polycyclic aromatic ring modified phenolic resin; Naphthalene type epoxy resin that is glycidyl ether of phenol resin containing naphthalene ring; Halogenated phenol novolac type epoxy resin; Hydroquinone type epoxy resin ; Trimethylolpropane type epoxy resin; linear aliphatic epoxy resin obtained by oxidizing olefinic bond with peracid such as peracetic acid; epoxidized aralkyl type phenolic resin such as phenol aralkyl resin and naphthol aralkyl resin Aralkyl type epoxy resin; and the like. Furthermore, an epoxidized product of a silicone resin, an epoxidized product of an acrylic resin, and the like are also exemplified as the epoxy resin. These epoxy resins may be used alone or in combination of two or more.

 (A)エポキシ樹脂のエポキシ当量(分子量/エポキシ基数)は、特に制限されない。成形性、耐リフロー性、電気的信頼性等の各種特性バランスの観点からは、100g/eq~1000g/eqであることが好ましく、150g/eq~500g/eqであることがより好ましい。 (A) The epoxy equivalent (molecular weight / number of epoxy groups) of the epoxy resin is not particularly limited. From the viewpoint of balance of various properties such as moldability, reflow resistance, and electrical reliability, it is preferably 100 g / eq to 1000 g / eq, and more preferably 150 g / eq to 500 g / eq.

 (A)エポキシ樹脂のエポキシ当量は、JIS K 7236:2009に準じた方法で測定される値とする。 (A) The epoxy equivalent of the epoxy resin is a value measured by a method according to JIS K 7236: 2009.

 (A)エポキシ樹脂の融点又は軟化点は、特に制限されない。成形性と耐リフロー性の観点からは40℃~180℃であることが好ましく、エポキシ樹脂組成物の調製の際の取扱い性の観点からは50℃~130℃であることがより好ましい。 (A) The melting point or softening point of the epoxy resin is not particularly limited. From the viewpoint of moldability and reflow resistance, the temperature is preferably 40 ° C to 180 ° C, and from the viewpoint of handleability when preparing the epoxy resin composition, it is more preferably 50 ° C to 130 ° C.

 (A)エポキシ樹脂の融点又は軟化点は、JIS K 7234:1986及びJIS K 7233:1986に記載の単一円筒回転粘度計法により測定される値とする。 (A) The melting point or softening point of the epoxy resin is a value measured by a single cylinder rotational viscometer method described in JIS K 7234: 1986 and JIS K 7233: 1986.

 エポキシ樹脂組成物中の(A)エポキシ樹脂の含有率は、強度、流動性、耐熱性、成形性等の観点から2質量%~10質量%であることが好ましく、2.5質量%~7.5質量%であることがより好ましく、3質量%~6.5質量%であることが更に好ましい。 The content of the epoxy resin (A) in the epoxy resin composition is preferably 2% by mass to 10% by mass, and 2.5% by mass to 7% by mass from the viewpoints of strength, fluidity, heat resistance, moldability and the like. It is more preferably 5% by mass, and further preferably 3% by mass to 6.5% by mass.

[(B)硬化剤]
 本開示のエポキシ樹脂組成物は、(B)硬化剤を含む。硬化剤の種類は特に制限されず、(A)エポキシ樹脂の種類、エポキシ樹脂組成物の所望の特性等に応じて選択できる。
[(B) Curing agent]
The epoxy resin composition of the present disclosure includes (B) a curing agent. The kind in particular of hardening | curing agent is not restrict | limited, It can select according to the kind of (A) kind of epoxy resin, the desired characteristic of an epoxy resin composition, etc.

 (B)硬化剤として具体的には、フェノール硬化剤、アミン硬化剤、酸無水物硬化剤、ポリメルカプタン硬化剤、ポリアミノアミド硬化剤、イソシアネート硬化剤、ブロックイソシアネート硬化剤等が挙げられる。耐熱性向上の観点からは、硬化剤は、フェノール硬化剤が好ましい。 Specific examples of (B) curing agents include phenol curing agents, amine curing agents, acid anhydride curing agents, polymercaptan curing agents, polyaminoamide curing agents, isocyanate curing agents, and blocked isocyanate curing agents. From the viewpoint of improving heat resistance, the curing agent is preferably a phenol curing agent.

 フェノール硬化剤として具体的には、レゾルシン、カテコール、ビスフェノールA、ビスフェノールF、フェノール、クレゾール、キシレノール、フェニルフェノール、アミノフェノール等のフェノール化合物及びα-ナフトール、β-ナフトール、ジヒドロキシナフタレン等のナフトール化合物からなる群より選ばれる少なくとも一種のフェノール性化合物と、ホルムアルデヒド、アセトアルデヒド、プロピオンアルデヒド、ベンズアルデヒド、サリチルアルデヒド等のアルデヒド化合物とを酸性触媒下で縮合又は共縮合させて得られるノボラック型フェノール樹脂;上記フェノール性化合物と、ジメトキシパラキシレン、ビス(メトキシメチル)ビフェニル等とから合成されるフェノールアラルキル樹脂、ナフトールアラルキル樹脂等のアラルキル型フェノール樹脂;パラキシリレン変性フェノール樹脂;メタキシリレン変性フェノール樹脂;メラミン変性フェノール樹脂;テルペン変性フェノール樹脂;上記フェノール性化合物と、ジシクロペンタジエンとから共重合により合成されるジシクロペンタジエン型フェノール樹脂及びジシクロペンタジエン型ナフトール樹脂;シクロペンタジエン変性フェノール樹脂;多環芳香環変性フェノール樹脂;ビフェニル型フェノール樹脂などが挙げられる。例えば、耐リフロー性向上の観点から、フェノールアラルキル樹脂が好ましい。
 これらのフェノール硬化剤は、1種を単独で用いても2種以上を組み合わせて用いてもよい。
Specific examples of the phenol curing agent include resorcin, catechol, bisphenol A, bisphenol F, phenol compounds such as phenol, cresol, xylenol, phenylphenol, and aminophenol, and naphthol compounds such as α-naphthol, β-naphthol, and dihydroxynaphthalene. A novolak-type phenol resin obtained by condensation or cocondensation of at least one phenolic compound selected from the group consisting of aldehyde compounds such as formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde, and salicylaldehyde with an acidic catalyst; Compounds such as phenol aralkyl resins and naphthol aralkyl resins synthesized from dimethoxyparaxylene, bis (methoxymethyl) biphenyl, etc. Ralalkyl-type phenol resin; paraxylylene-modified phenol resin; metaxylylene-modified phenol resin; melamine-modified phenol resin; terpene-modified phenol resin; Examples thereof include cyclopentadiene type naphthol resin; cyclopentadiene modified phenol resin; polycyclic aromatic ring modified phenol resin; biphenyl type phenol resin. For example, a phenol aralkyl resin is preferable from the viewpoint of improving reflow resistance.
These phenol curing agents may be used alone or in combination of two or more.

 (B)硬化剤の官能基当量(フェノール硬化剤の場合は水酸基当量)は、特に制限されない。成形性、耐リフロー性、電気的信頼性等の各種特性バランスの観点からは、70g/eq~1000g/eqであることが好ましく、80g/eq~500g/eqであることがより好ましい。 (B) The functional group equivalent of the curing agent (hydroxyl equivalent in the case of a phenol curing agent) is not particularly limited. From the viewpoint of balance of various properties such as moldability, reflow resistance, and electrical reliability, it is preferably 70 g / eq to 1000 g / eq, and more preferably 80 g / eq to 500 g / eq.

 フェノール硬化剤の水酸基当量は、JIS K 0070:1992に準じた方法により測定される値とする。 The hydroxyl equivalent of the phenol curing agent is a value measured by a method according to JIS K 0070: 1992.

 (B)硬化剤の融点又は軟化点は、特に制限されない。成形性と耐リフロー性の観点からは、40℃~180℃であることが好ましく、エポキシ樹脂組成物の製造時における取扱い性の観点からは、50℃~130℃であることがより好ましい。 (B) The melting point or softening point of the curing agent is not particularly limited. From the viewpoint of moldability and reflow resistance, the temperature is preferably 40 ° C to 180 ° C, and from the viewpoint of handleability during production of the epoxy resin composition, it is more preferably 50 ° C to 130 ° C.

 (B)硬化剤の融点又は軟化点は、JIS K 7234:1986及びJIS K 7233:1986に記載の単一円筒回転粘度計法により測定される値とする。 (B) The melting point or softening point of the curing agent is a value measured by a single cylinder rotational viscometer method described in JIS K 7234: 1986 and JIS K 7233: 1986.

 (A)エポキシ樹脂と(B)硬化剤との当量比、すなわち(A)エポキシ樹脂中の官能基数に対する(B)硬化剤中の官能基数の比((B)硬化剤中の官能基数/(A)エポキシ樹脂中の官能基数)は、特に制限されない。それぞれの未反応分を少なく抑える観点からは、0.5~1.5の範囲に設定されることが好ましく、0.6~1.3の範囲に設定されることがより好ましく、0.7~1.2の範囲に設定されることが更に好ましい。 (A) Equivalent ratio of epoxy resin and (B) curing agent, ie, ratio of the number of functional groups in (B) curing agent to the number of functional groups in (A) epoxy resin ((B) number of functional groups in curing agent / ( A) The number of functional groups in the epoxy resin is not particularly limited. From the viewpoint of reducing the amount of each unreacted component, it is preferably set in the range of 0.5 to 1.5, more preferably in the range of 0.6 to 1.3, and 0.7 More preferably, it is set in the range of -1.2.

[(C)硬化促進剤]
 本開示のエポキシ樹脂組成物は、(C)硬化促進剤を含む。硬化促進剤の種類は特に制限されず、(A)エポキシ樹脂の種類、エポキシ樹脂組成物の所望の特性等に応じて選択できる。また、(C)硬化促進剤としては、エポキシ樹脂組成物の電気的信頼性及び成形時の流動性の観点から、リン系の硬化促進剤が好ましい。
[(C) Curing accelerator]
The epoxy resin composition of the present disclosure includes (C) a curing accelerator. The kind in particular of hardening accelerator is not restrict | limited, It can select according to the kind of (A) kind of epoxy resin, the desired characteristic of an epoxy resin composition, etc. Moreover, as (C) hardening accelerator, a phosphorus type hardening accelerator is preferable from a viewpoint of the electrical reliability of an epoxy resin composition, and the fluidity | liquidity at the time of shaping | molding.

 (C)硬化促進剤として具体的には、1,8-ジアザ-ビシクロ(5,4,0)ウンデセン-7、1,5-ジアザ-ビシクロ(4,3,0)ノネン、5,6-ジブチルアミノ-1,8-ジアザ-ビシクロ(5,4,0)ウンデセン-7、ベンジルジメチルアミン、トリエタノールアミン、ジメチルアミノエタノール、トリス(ジメチルアミノメチル)フェノール等の3級アミン類及びこれらの誘導体、2-メチルイミダゾール、2-フェニルイミダゾール、2-フェニル-4-メチルイミダゾール等のイミダゾール類及びこれらの誘導体、トリブチルホスフィン、メチルジフェニルホスフィン、トリフェニルホスフィン、ジフェニルホスフィン、フェニルホスフィン等の有機ホスフィン類及びこれらのホスフィン類に無水マレイン酸、ベンゾキノン、ジアゾフェニルメタン等のπ結合をもつ化合物を付加してなる分子内分極を有するリン化合物、テトラフェニルホスホニウムテトラフェニルボレート、トリフェニルホスフィンテトラフェニルボレート、2-エチル-4-メチルイミダゾールテトラフェニルボレート、N-メチルモテトラフェニルホスホニウムテトラフェニルボレート、トリフェニルホスフィンとベンゾキノンの付加物、トリパラトリルホスフィンとベンゾキノンの付加物、トリフェニルホスホニウムトリフェニルボランなどが挙げられる。これらの硬化促進剤は、1種を単独で用いても2種以上を組み合わせて用いてもよい。 (C) Specific examples of the curing accelerator include 1,8-diaza-bicyclo (5,4,0) undecene-7, 1,5-diaza-bicyclo (4,3,0) nonene, 5,6- Tertiary amines such as dibutylamino-1,8-diaza-bicyclo (5,4,0) undecene-7, benzyldimethylamine, triethanolamine, dimethylaminoethanol, tris (dimethylaminomethyl) phenol and their derivatives Imidazoles such as 2-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole and their derivatives, organic phosphines such as tributylphosphine, methyldiphenylphosphine, triphenylphosphine, diphenylphosphine, and phenylphosphine; These phosphines include maleic anhydride and ben Phosphorus compounds having intramolecular polarization formed by adding a compound having a π bond such as quinone and diazophenylmethane, tetraphenylphosphonium tetraphenylborate, triphenylphosphinetetraphenylborate, 2-ethyl-4-methylimidazoletetraphenylborate N-methylmotetraphenylphosphonium tetraphenylborate, an adduct of triphenylphosphine and benzoquinone, an adduct of triparatolylphosphine and benzoquinone, triphenylphosphonium triphenylborane, and the like. These curing accelerators may be used alone or in combination of two or more.

 エポキシ樹脂組成物中の(C)硬化促進剤の含有率は硬化促進効果が得られれば特に限定されない。エポキシ樹脂組成物中の(C)硬化促進剤の含有率は、(A)エポキシ樹脂と(B)硬化剤の合計量に対して、0.1質量%~8.0質量%であることが好ましく、0.5質量%~5.0質量%であることがより好ましく、1.0質量%~3.0質量%であることが更に好ましい。(C)硬化促進剤の含有率が(A)エポキシ樹脂と(B)硬化剤の合計量に対して、0.1質量%以上であると、硬化時間の短縮化が図れる傾向にあり、8.0質量%以下であると、硬化速度が速すぎず良好な成形品が得られる傾向にある。 The content of the (C) curing accelerator in the epoxy resin composition is not particularly limited as long as a curing acceleration effect is obtained. The content of (C) curing accelerator in the epoxy resin composition is 0.1% by mass to 8.0% by mass with respect to the total amount of (A) epoxy resin and (B) curing agent. Preferably, the content is 0.5% by mass to 5.0% by mass, and more preferably 1.0% by mass to 3.0% by mass. When the content of the (C) curing accelerator is 0.1% by mass or more with respect to the total amount of the (A) epoxy resin and the (B) curing agent, the curing time tends to be shortened. When the content is 0.0 mass% or less, the curing rate is not too high and a good molded product tends to be obtained.

[(D)無機充填材]
 本開示のエポキシ樹脂組成物は、(D)無機充填材を含む。(D)無機充填材を含むことにより、硬化物とした際に吸湿性低減及び強度向上を図ることができる。
[(D) Inorganic filler]
The epoxy resin composition of the present disclosure includes (D) an inorganic filler. (D) By including an inorganic filler, it is possible to reduce moisture absorption and improve strength when a cured product is obtained.

 更に、(D)無機充填材は、無機充填材全量に対し、アルミナを75質量%~98質量%含む。アルミナを75質量%以上含むことにより、熱伝導性に優れるエポキシ樹脂組成物が得られ、アルミナを98質量%以下含むことにより、熱時硬度の低下が抑制されたエポキシ樹脂組成物が得られる。また、吸湿性、線膨張係数の低減、強度向上及び半田耐熱性の観点からもアルミナを75質量%~98質量%含むことが好ましい。 Furthermore, (D) the inorganic filler contains 75% by mass to 98% by mass of alumina with respect to the total amount of the inorganic filler. By containing 75 mass% or more of alumina, an epoxy resin composition excellent in thermal conductivity is obtained, and by containing 98 mass% or less of alumina, an epoxy resin composition in which a decrease in hardness during heating is suppressed is obtained. Further, from the viewpoint of hygroscopicity, reduction of linear expansion coefficient, improvement of strength and solder heat resistance, it is preferable to contain 75% by mass to 98% by mass of alumina.

 (D)無機充填材は、無機充填材全量に対し、アルミナを75質量%~95質量%含むことが好ましく、75質量%~92質量%含むことがより好ましく、75質量%~90質量%含むことが更に好ましく、75質量%~85質量%含むことが特に好ましい。 (D) The inorganic filler preferably contains 75% by mass to 95% by mass of alumina, more preferably 75% by mass to 92% by mass, and more preferably 75% by mass to 90% by mass with respect to the total amount of the inorganic filler. More preferably, the content is 75% by mass to 85% by mass.

 (D)無機充填材は、アルミナを75質量%~98質量%含むため、アルミナ以外の無機充填材を2質量%~25質量%含む。アルミナ以外の無機充填材(以下、「その他の無機充填材」とも称する。)としては、溶融シリカ、結晶シリカ、窒化ケイ素、窒化ホウ素、酸化マグネシウム、酸化亜鉛、炭化ケイ素及び窒化アルミニウム、ジルコン、珪酸カルシウム、炭酸カルシウム、チタン酸カリウム、ベリリア、ジルコニア、フォステライト、ステアタイト、スピネル、ムライト、チタニア等の粉体又はこれらを球形化したビーズ、チタン酸カリウム等の単結晶繊維、ガラス繊維、アラミド繊維、炭素繊維などが挙げられる。また、その他の無機充填材としては、難燃効果の観点から、水酸化アルミニウム、ホウ酸亜鉛、水酸化マグネシウム等が挙げられる。その他の無機充填材は1種を単独で用いても2種以上を組み合わせて用いてもよい。 (D) Since the inorganic filler contains 75 mass% to 98 mass% of alumina, it contains 2 mass% to 25 mass% of inorganic filler other than alumina. Examples of inorganic fillers other than alumina (hereinafter also referred to as “other inorganic fillers”) include fused silica, crystalline silica, silicon nitride, boron nitride, magnesium oxide, zinc oxide, silicon carbide, aluminum nitride, zircon, and silicic acid. Powders such as calcium, calcium carbonate, potassium titanate, beryllia, zirconia, fosterite, steatite, spinel, mullite, titania, beads spheroidized from these, single crystal fiber such as potassium titanate, glass fiber, aramid fiber And carbon fiber. Other inorganic fillers include aluminum hydroxide, zinc borate, magnesium hydroxide and the like from the viewpoint of flame retardancy. Other inorganic fillers may be used alone or in combination of two or more.

 (D)無機充填材は、熱伝導性の観点から、アルミナ以外の無機充填材として、窒化ケイ素、窒化ホウ素、酸化マグネシウム、酸化亜鉛、炭化ケイ素及び窒化アルミニウムからなる群より選択される少なくとも一つの無機充填材を含むことが好ましい。中でも炭化ケイ素がより好ましい。 (D) The inorganic filler is at least one selected from the group consisting of silicon nitride, boron nitride, magnesium oxide, zinc oxide, silicon carbide and aluminum nitride as an inorganic filler other than alumina from the viewpoint of thermal conductivity. It is preferable that an inorganic filler is included. Of these, silicon carbide is more preferable.

 (D)無機充填材は、無機充填材全量に対し、アルミナ以外の無機充填材を5質量%~25質量%含むことが好ましく、8質量%~25質量%含むことがより好ましく、10質量%~25質量%含むことが更に好ましく、15質量%~25質量%含むことが特に好ましい。
 例えば、(D)無機充填材は、無機充填材全量に対し、炭化ケイ素を5質量%~25質量%含むことが好ましく、8質量%~25質量%含むことがより好ましく、10質量%~25質量%含むことが更に好ましく、15質量%~25質量%含むことが特に好ましい。
(D) The inorganic filler preferably contains 5% by mass to 25% by mass of inorganic fillers other than alumina, more preferably 8% by mass to 25% by mass, and more preferably 10% by mass with respect to the total amount of the inorganic filler. More preferably, it is contained in an amount of from 25 to 25% by mass, and particularly preferably 15 to 25% by mass.
For example, the (D) inorganic filler preferably contains 5% by mass to 25% by mass of silicon carbide, more preferably 8% by mass to 25% by mass, and more preferably 10% by mass to 25% by mass with respect to the total amount of the inorganic filler. More preferably, the content is more preferably 15% by mass to 25% by mass.

 エポキシ樹脂組成物における(D)無機充填材の含有率は、吸湿性、線膨張係数の低減、強度向上及び半田耐熱性の観点から、エポキシ樹脂組成物全量に対し、83質量%~97質量%であることが好ましく、85質量%~94質量%であることがより好ましく、88質量%~93質量%であることが更に好ましい。 The content of the inorganic filler (D) in the epoxy resin composition is 83% by mass to 97% by mass with respect to the total amount of the epoxy resin composition from the viewpoints of hygroscopicity, reduction of linear expansion coefficient, strength improvement, and solder heat resistance. It is preferably 85% by mass to 94% by mass, more preferably 88% by mass to 93% by mass.

 エポキシ樹脂組成物におけるアルミナの含有率は、吸湿性、線膨張係数の低減、強度向上及び半田耐熱性の観点から、エポキシ樹脂組成物全量に対し、60質量%~95質量%であることが好ましく、65質量%~90質量%であることがより好ましく、75質量%~85質量%であることが更に好ましい。 The content of alumina in the epoxy resin composition is preferably 60% by mass to 95% by mass with respect to the total amount of the epoxy resin composition from the viewpoints of hygroscopicity, reduction of linear expansion coefficient, strength improvement, and solder heat resistance. 65 mass% to 90 mass% is more preferable, and 75 mass% to 85 mass% is still more preferable.

 なお、(D)無機充填材の形状は特に限定されず、例えば、粉状、球状、繊維状等が挙げられる。中でも、エポキシ樹脂組成物の成形時の流動性及び金型摩耗性の点からは、球形が好ましい。 In addition, the shape of the (D) inorganic filler is not particularly limited, and examples thereof include powder, sphere, and fiber. Among them, a spherical shape is preferable from the viewpoint of fluidity and mold wear during molding of the epoxy resin composition.

[その他の成分]
 本開示のエポキシ樹脂組成物は、前述の(A)エポキシ樹脂、(B)硬化剤、(C)硬化促進剤及び(D)無機充填材以外のその他の成分を含んでいてもよい。その他の成分としては、本発明の効果を奏する範囲において特に限定されず、離型剤;カップリング剤;臭素化エポキシ樹脂、リン化合物等の難燃剤;三酸化アンチモン、四酸化アンチモン等の難燃助剤;着色剤;応力緩和剤;酸化防止剤などの各種添加剤が挙げられる。
 以下、その他の成分として、離型剤、カップリング剤、着色剤及び応力緩和剤の具体例について説明する。
[Other ingredients]
The epoxy resin composition of this indication may contain other ingredients other than the above-mentioned (A) epoxy resin, (B) hardening agent, (C) hardening accelerator, and (D) inorganic filler. The other components are not particularly limited as long as the effects of the present invention are achieved, and include mold release agents; coupling agents; flame retardants such as brominated epoxy resins and phosphorus compounds; flame retardants such as antimony trioxide and antimony tetraoxide. Various additives such as auxiliary agents; coloring agents; stress relaxation agents;
Hereinafter, specific examples of a mold release agent, a coupling agent, a colorant, and a stress relaxation agent will be described as other components.

(離型剤)
 エポキシ樹脂組成物は、成形時における金型との良好な離型性を得る観点から、離型剤を更に含んでいてもよい。離型剤は特に制限されず、従来公知のものを用いることができる。具体的には、カルナバワックス、モンタン酸、ステアリン酸等の高級脂肪酸、高級脂肪酸金属塩、パラフィン系ワックス、モンタン酸エステル等の脂肪酸エステル系ワックス、酸化ポリエチレン、非酸化ポリエチレン等のポリオレフィン系ワックスなどが挙げられる。離型剤は、1種を単独で用いても2種以上を組み合わせて用いてもよい。
(Release agent)
The epoxy resin composition may further contain a release agent from the viewpoint of obtaining good release properties from the mold during molding. The release agent is not particularly limited, and conventionally known release agents can be used. Specifically, higher fatty acids such as carnauba wax, montanic acid, stearic acid, higher fatty acid metal salts, fatty acid ester waxes such as paraffin wax, montanic acid ester, polyolefin waxes such as polyethylene oxide and non-oxidized polyethylene, etc. Can be mentioned. A mold release agent may be used individually by 1 type, or may be used in combination of 2 or more type.

 エポキシ樹脂組成物が離型剤を含む場合、離型剤の含有率は、(A)エポキシ樹脂と(B)硬化剤の合計量に対して、10質量%以下であることが好ましく、その効果を発揮させる観点から、0.5質量%以上であることが好ましい。 When the epoxy resin composition contains a release agent, the content of the release agent is preferably 10% by mass or less based on the total amount of (A) the epoxy resin and (B) the curing agent, and the effect From the viewpoint of exhibiting the above, it is preferably 0.5% by mass or more.

(カップリング剤)
 エポキシ樹脂組成物は、カップリング剤を更に含んでいてもよい。カップリング剤の種類は、特に制限されず、公知のカップリング剤を使用することができる。カップリング剤としては、例えば、シランカップリング剤及びチタンカップリング剤が挙げられる。カップリング剤は、1種を単独で用いても2種以上を組み合わせて用いてもよい。
(Coupling agent)
The epoxy resin composition may further contain a coupling agent. The kind in particular of coupling agent is not restrict | limited, A well-known coupling agent can be used. Examples of the coupling agent include a silane coupling agent and a titanium coupling agent. A coupling agent may be used individually by 1 type, or may be used in combination of 2 or more type.

 シランカップリング剤としては、例えば、ビニルトリクロロシラン、ビニルトリエトキシシラン、ビニルトリス(β-メトキシエトキシ)シラン、γ-メタクリロキシプロピルトリメトキシシラン、β-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン、γ-グリシドキシプロピルトリメトキシシラン、ビニルトリアセトキシシラン、γ-メルカプトプロピルトリメトキシシラン、γ-アミノプロピルトリエトキシシラン、γ-[ビス(β-ヒドロキシエチル)]アミノプロピルトリエトキシシラン、N-β-(アミノエチル)-γ-アミノプロピルトリメトキシシラン、γ-(β-アミノエチル)アミノプロピルジメトキシメチルシラン、N-(トリメトキシシリルプロピル)エチレンジアミン、N-(ジメトキシメチルシリルイソプロピル)エチレンジアミン、メチルトリメトキシシラン、メチルトリエトキシシラン、N-β-(N-ビニルベンジルアミノエチル)-γ-アミノプロピルトリメトキシシラン、γ-クロロプロピルトリメトキシシラン、ヘキサメチルジシラン、γ-アニリノプロピルトリメトキシシラン、ビニルトリメトキシシラン及びγ-メルカプトプロピルメチルジメトキシシランが挙げられる。 Examples of silane coupling agents include vinyltrichlorosilane, vinyltriethoxysilane, vinyltris (β-methoxyethoxy) silane, γ-methacryloxypropyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane. , Γ-glycidoxypropyltrimethoxysilane, vinyltriacetoxysilane, γ-mercaptopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ- [bis (β-hydroxyethyl)] aminopropyltriethoxysilane, N -Β- (aminoethyl) -γ-aminopropyltrimethoxysilane, γ- (β-aminoethyl) aminopropyldimethoxymethylsilane, N- (trimethoxysilylpropyl) ethylenediamine, N- (dimethoxymethylsilyloxy) Propyl) ethylenediamine, methyltrimethoxysilane, methyltriethoxysilane, N-β- (N-vinylbenzylaminoethyl) -γ-aminopropyltrimethoxysilane, γ-chloropropyltrimethoxysilane, hexamethyldisilane, γ-ani Examples include linopropyltrimethoxysilane, vinyltrimethoxysilane and γ-mercaptopropylmethyldimethoxysilane.

 チタンカップリング剤としては、例えば、イソプロピルトリイソステアロイルチタネート、イソプロピルトリス(ジオクチルパイロホスフェート)チタネート、イソプロピルトリ(N-アミノエチル-アミノエチル)チタネート、テトラオクチルビス(ジトリデシルホスファイト)チタネート、テトラ(2,2-ジアリルオキシメチル-1-ブチル)ビス(ジトリデシルホスファイト)チタネート、ビス(ジオクチルパイロホスフェート)オキシアセテートチタネート、ビス(ジオクチルパイロホスフェート)エチレンチタネート、イソプロピルトリオクタノイルチタネート、イソプロピルジメタクリルイソステアロイルチタネート、イソプロピルトリドデシルベンゼンスルホニルチタネート、イソプロピルイソステアロイルジアクリルチタネート、イソプロピルトリ(ジオクチルホスフェート)チタネート、イソプロピルトリクミルフェニルチタネート及びテトライソプロピルビス(ジオクチルホスファイト)チタネートが挙げられる。 Examples of the titanium coupling agent include isopropyl triisostearoyl titanate, isopropyl tris (dioctyl pyrophosphate) titanate, isopropyl tri (N-aminoethyl-aminoethyl) titanate, tetraoctyl bis (ditridecyl phosphite) titanate, tetra ( 2,2-diallyloxymethyl-1-butyl) bis (ditridecylphosphite) titanate, bis (dioctylpyrophosphate) oxyacetate titanate, bis (dioctylpyrophosphate) ethylene titanate, isopropyltrioctanoyl titanate, isopropyldimethacryloiso Stearoyl titanate, isopropyltridodecylbenzenesulfonyl titanate, isopropylisostearoyl diacrylic Titanate, isopropyl tri (dioctyl phosphate) titanate, isopropyl tricumylphenyl titanate and tetraisopropyl bis (dioctyl phosphite) titanate and the like.

 エポキシ樹脂組成物がカップリング剤を含有する場合、カップリング剤の含有率は、エポキシ樹脂組成物の全体に対し、3質量%以下であることが好ましく、その効果を発揮させる観点から、0.1質量%以上であることが好ましい。 When an epoxy resin composition contains a coupling agent, it is preferable that the content rate of a coupling agent is 3 mass% or less with respect to the whole epoxy resin composition, from a viewpoint of exhibiting the effect, it is 0. It is preferable that it is 1 mass% or more.

(着色剤)
 エポキシ樹脂組成物は、着色剤を更に含んでもよい。着色剤としてはカーボンブラック、有機染料、有機顔料、酸化鉄、鉛丹、ベンガラ等の公知の着色剤を挙げることができる。着色剤の含有量は目的等に応じて適宜選択できる。着色剤は、1種を単独で用いても2種以上を組み合わせて用いてもよい。
(Coloring agent)
The epoxy resin composition may further contain a colorant. Examples of the colorant include known colorants such as carbon black, organic dyes, organic pigments, iron oxide, red lead, and bengara. The content of the colorant can be appropriately selected according to the purpose and the like. A coloring agent may be used individually by 1 type, or may be used in combination of 2 or more type.

 着色剤としてカーボンブラック等の導電性粒子を併用する場合、粒径10μm以上の粒子が導電性粒子全量に対して1質量%以下のものを用いることが好ましく、カーボンブラックの含有率としては、(A)エポキシ樹脂と(B)硬化剤の合計量に対して、3質量%以下であることが好ましい。 When conductive particles such as carbon black are used in combination as the colorant, it is preferable to use particles having a particle size of 10 μm or more of 1% by mass or less based on the total amount of conductive particles. It is preferable that it is 3 mass% or less with respect to the total amount of A) epoxy resin and (B) hardening | curing agent.

(応力緩和剤)
 エポキシ樹脂組成物は、シリコーンオイル、シリコーンゴム粒子、合成ゴム等の応力緩和剤を更に含んでもよい。応力緩和剤を含むことにより、パッケージの反り変形及びパッケージクラックの発生をより低減させることができる。応力緩和剤としては、一般に使用されている公知の応力緩和剤(可とう剤)が挙げられる。具体的には、シリコーン系、スチレン系、オレフィン系、ウレタン系、ポリエステル系、ポリエーテル系、ポリアミド系、ポリブタジエン系等の熱可塑性エラストマー、NR(天然ゴム)、NBR(アクリロニトリル-ブタジエンゴム)、アクリルゴム、ウレタンゴム、シリコーンパウダー等のゴム粒子、メタクリル酸メチル-スチレン-ブタジエン共重合体(MBS)、メタクリル酸メチル-シリコーン共重合体、メタクリル酸メチル-アクリル酸ブチル共重合体等のコア-シェル構造を有するゴム粒子などが挙げられる。応力緩和剤は、1種を単独で用いても2種以上を組み合わせて用いてもよい。
(Stress relaxation agent)
The epoxy resin composition may further contain a stress relaxation agent such as silicone oil, silicone rubber particles, and synthetic rubber. By including the stress relaxation agent, warpage deformation of the package and generation of package cracks can be further reduced. As a stress relaxation agent, the well-known stress relaxation agent (flexible agent) generally used is mentioned. Specifically, thermoplastic elastomers such as silicone, styrene, olefin, urethane, polyester, polyether, polyamide, polybutadiene, NR (natural rubber), NBR (acrylonitrile-butadiene rubber), acrylic Rubber particles such as rubber, urethane rubber and silicone powder, core-shell such as methyl methacrylate-styrene-butadiene copolymer (MBS), methyl methacrylate-silicone copolymer, methyl methacrylate-butyl acrylate copolymer Examples thereof include rubber particles having a structure. A stress relaxation agent may be used individually by 1 type, or may be used in combination of 2 or more type.

[エポキシ樹脂組成物の調製方法]
 エポキシ樹脂組成物の調製方法は、特に制限されない。一般的な手法としては、所定の配合量の成分をミキサー等によって十分混合した後、ミキシングロール、押出機等によって溶融混練し、冷却し、粉砕する方法を挙げることができる。より具体的には、例えば、上述した成分の所定量を撹拌及び混合し、予め70℃~140℃に加熱してあるニーダー、ロール、エクストルーダー等で混練し、冷却し、粉砕する方法を挙げることができる。
[Method for preparing epoxy resin composition]
The method for preparing the epoxy resin composition is not particularly limited. As a general technique, there can be mentioned a method in which components of a predetermined blending amount are sufficiently mixed by a mixer or the like, and then melt-kneaded by a mixing roll, an extruder or the like, cooled and pulverized. More specifically, for example, a method in which predetermined amounts of the above-described components are stirred and mixed, kneaded with a kneader, roll, extruder, or the like that has been heated to 70 ° C. to 140 ° C., cooled, and pulverized. be able to.

〔電子部品装置〕
 本開示の電子部品装置は、素子と、前記素子を封止する上述の封止用エポキシ樹脂組成物の硬化物とを備える。
 電子部品装置としては、リードフレーム、配線済みのテープキャリア、配線板、ガラス、シリコンウエハ、有機基板等の支持部材に、素子(半導体チップ、トランジスタ、ダイオード、サイリスタ等の能動素子、コンデンサ、抵抗体、コイル等の受動素子など)を搭載して得られた素子部をエポキシ樹脂組成物で封止したものが挙げられる。
 より具体的には、リードフレーム上に素子を固定し、ボンディングパッド等の素子の端子部とリード部とをワイヤボンディング、バンプ等で接続した後、エポキシ樹脂組成物を用いてトランスファー成形等によって封止した構造を有するDIP(Dual Inline Package)、PLCC(Plastic Leaded Chip Carrier)、QFP(Quad Flat Package)、SOP(Small Outline Package)、SOJ(Small Outline J-lead package)、TSOP(Thin Small Outline Package)、TQFP(Thin Quad Flat Package)等の一般的な樹脂封止型IC(Integrated Circuit);テープキャリアにバンプで接続した素子をエポキシ樹脂組成物で封止した構造を有するTCP(Tape Carrier Package);支持部材上に形成した配線に、ワイヤボンディング、フリップチップボンディング、はんだ等で接続した素子を、エポキシ樹脂組成物で封止した構造を有するCOB(Chip On Board)モジュール、ハイブリッドIC、マルチチップモジュール等;裏面に配線板接続用の端子を形成した支持部材の表面に素子を搭載し、バンプ又はワイヤボンディングにより素子と支持部材に形成された配線とを接続した後、エポキシ樹脂組成物で素子を封止した構造を有するBGA(Ball Grid Array)、CSP(Chip Size Package)、MCP(Multi Chip Package)などが挙げられる。また、プリント配線板においてもエポキシ樹脂組成物を好適に使用することができる。
[Electronic component equipment]
An electronic component device of the present disclosure includes an element and a cured product of the above-described sealing epoxy resin composition that seals the element.
Electronic component devices include lead frames, pre-wired tape carriers, wiring boards, glass, silicon wafers, organic substrates and other supporting members, active elements such as semiconductor chips, transistors, diodes, and thyristors, capacitors, and resistors. And an element portion obtained by mounting a passive element such as a coil) with an epoxy resin composition.
More specifically, the element is fixed on the lead frame, the terminal part of the element such as a bonding pad and the lead part are connected by wire bonding, bump, etc., and then sealed by transfer molding or the like using an epoxy resin composition. DIP (Dual Inline Package), PLCC (Plastic Leaded Chip Carrier), QFP (Quad Flat Package), SOP (Small Outline Package T), SOJ (Small Outline J-Lead Package) ), General resin-sealed IC (Integrated Circuit) such as TQFP (Thin Quad Flat Package); TCP (Tape Carrier Package) having a structure in which elements connected to bumpers by bumps are sealed with an epoxy resin composition; elements connected to wiring formed on a support member by wire bonding, flip chip bonding, solder, etc. COB (Chip On Board) module having a structure sealed with an epoxy resin composition, hybrid IC, multi-chip module, etc .; an element is mounted on the surface of a support member in which terminals for connecting a wiring board are formed on the back surface, and bumps Or after connecting an element and the wiring formed in the support member by wire bonding, BGA (Ball Grid Array), CSP (Chip Size Package), MCP (Multi Chip) which has the structure which sealed the element with the epoxy resin composition Packag e). Moreover, an epoxy resin composition can be used suitably also in a printed wiring board.

 エポキシ樹脂組成物を用いて電子部品装置を封止する方法としては、低圧トランスファー成形法、インジェクション成形法、圧縮成形法等が挙げられる。これらの中では、低圧トランスファー成形法が一般的である。 Examples of a method for sealing an electronic component device using an epoxy resin composition include a low-pressure transfer molding method, an injection molding method, and a compression molding method. Among these, the low-pressure transfer molding method is common.

 以下、実施例により本発明を具体的に説明するが、本発明の範囲はこれらの実施例に限定されるものではない。 Hereinafter, the present invention will be specifically described with reference to examples, but the scope of the present invention is not limited to these examples.

[エポキシ樹脂組成物の調製]
 下記に示す成分を表1に示す配合割合(質量部)で予備混合(ドライブレンド)した後、二軸ニーダーで混練し、冷却粉砕して実施例と比較例のエポキシ樹脂組成物を調製した。
[Preparation of epoxy resin composition]
The components shown below were premixed (dry blended) at the blending ratio (parts by mass) shown in Table 1, then kneaded with a biaxial kneader, cooled and ground to prepare epoxy resin compositions of Examples and Comparative Examples.

(A)エポキシ樹脂
・A1・・・ビスフェノール型エポキシ樹脂、新日鉄住金化学株式会社、品名「YSLV-80XY」
・A2・・・ビフェニル型エポキシ樹脂、三菱ケミカル株式会社、品名「YX-4000」
(B)硬化剤
・B1・・・トリフェニルメタン型フェノール樹脂、エア・ウォーター株式会社、品名「HE910」
(C)硬化促進剤
・C1・・・リン系硬化促進剤(トリブチルホスフィンとベンゾキノンの付加物)
(D)無機充填材
・DA-1・・・アルミナフィラー、デンカ株式会社、品名「DAB10FCAll」
・DA-2・・・アルミナフィラー、株式会社アドマテックス、品名「AE-2000SI」
・DB-1・・・アルミナフィラー/シリカフィラー=9/1(質量比)、デンカ株式会社、品名「DAB-10FC」
・DC-1・・・平均粒径(D50、小径側からの体積累積50%に対応する粒径)14.0μm及び比表面積0.3m/gの炭化ケイ素
・DC-2・・・平均粒径(D50、小径側からの体積累積50%に対応する粒径)18.6μm及び比表面積0.3m/gの炭化ケイ素
(A) Epoxy resin, A1 ... Bisphenol type epoxy resin, Nippon Steel & Sumikin Chemical Co., Ltd., product name "YSLV-80XY"
A2: Biphenyl type epoxy resin, Mitsubishi Chemical Corporation, product name “YX-4000”
(B) Curing agent · B1 · · · Triphenylmethane type phenol resin, Air Water Co., Ltd., product name "HE910"
(C) Curing accelerator / C1 ... Phosphorus curing accelerator (addition of tributylphosphine and benzoquinone)
(D) Inorganic filler, DA-1 ... Alumina filler, Denka Co., Ltd., product name "DAB10FCAll"
・ DA-2 ・ ・ ・ Alumina filler, Admatechs Co., Ltd., product name “AE-2000SI”
DB-1 ... Alumina filler / silica filler = 9/1 (mass ratio), Denka Co., Ltd., product name "DAB-10FC"
DC-1 ... average particle diameter (D50, particle diameter corresponding to 50% volume accumulation from the small diameter side) 14.0 μm and specific surface area 0.3 m 2 / g silicon carbide. DC-2 ... average Silicon carbide with particle size (D50, particle size corresponding to 50% volume accumulation from the small diameter side) 18.6 μm and specific surface area 0.3 m 2 / g

Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001

(熱時硬度の評価)
 エポキシ樹脂組成物の熱時硬度の評価を以下のようにして行った。
 上記のように調製したエポキシ樹脂組成物を、トランスファー成形機により、金型温度175℃~180℃、成形圧力6.9MPa、硬化時間90秒の条件で熱時硬度測定用の試験片(直径50mm×厚さ3mmの円板)を成形した。成形後直ちにショアD型硬度計を用いて試験片の熱時硬度を測定した。
 結果を表2に示す。
(Evaluation of hot hardness)
Evaluation of the hot hardness of the epoxy resin composition was performed as follows.
The epoxy resin composition prepared as described above was tested with a transfer molding machine under the conditions of a mold temperature of 175 ° C. to 180 ° C., a molding pressure of 6.9 MPa, and a curing time of 90 seconds (diameter 50 mm X disk having a thickness of 3 mm). Immediately after molding, the hot hardness of the test piece was measured using a Shore D hardness tester.
The results are shown in Table 2.

Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002

 表2に示すように、実施例1~3では、無機充填材全量に対するアルミナの含有率が100質量%である比較例1~3よりも熱時硬度が高い結果となり、連続成形性に優れていた。 As shown in Table 2, in Examples 1 to 3, the hot hardness was higher than in Comparative Examples 1 to 3 in which the content of alumina with respect to the total amount of the inorganic filler was 100% by mass, and the continuous formability was excellent. It was.

(熱伝導率の評価)
 エポキシ樹脂組成物の熱伝導率の評価を以下のようにして行った。
 上記のように調製したエポキシ樹脂組成物を、真空ハンドプレス成形機により、金型温度175℃~180℃、成形圧力7.0MPa、硬化時間600秒の条件で熱伝導率評価用の試験片(1.1cm角、厚み1.1mm)を成形した。
 成形した試験片について、厚さ方向の熱拡散率を測定した。熱拡散率の測定はレーザーフラッシュ法(装置:LFA447 nanoflash、NETZSCH社製)にて行った。パルス光照射は、パルス幅0.31(ms)、印加電圧247Vの条件で行った。測定は雰囲気温度25℃±1℃で行った。また上記試験片の密度は電子比重計(SD-200L、アルファーミラージュ株式会社製)を用いて測定した。
 次いで、式(1)を用いて比熱、密度を熱拡散率に乗算することによって,熱伝導率の値を得た。
       λ=α×Cp×ρ・・・式(1)
(式(1)中、λは熱伝導率(W/(m・K))、αは熱拡散率(m/s)、Cpは比熱(J/(kg・K))、ρは密度(d:kg/m)をそれぞれ示す。)
 結果を表3に示す。
(Evaluation of thermal conductivity)
Evaluation of the thermal conductivity of the epoxy resin composition was performed as follows.
The epoxy resin composition prepared as described above was subjected to a test piece for thermal conductivity evaluation using a vacuum hand press molding machine under conditions of a mold temperature of 175 ° C. to 180 ° C., a molding pressure of 7.0 MPa, and a curing time of 600 seconds ( 1.1 cm square and 1.1 mm thickness).
The molded specimen was measured for thermal diffusivity in the thickness direction. The thermal diffusivity was measured by a laser flash method (apparatus: LFA447 nanoflash, manufactured by NETZSCH). Pulse light irradiation was performed under the conditions of a pulse width of 0.31 (ms) and an applied voltage of 247V. The measurement was performed at an ambient temperature of 25 ° C. ± 1 ° C. The density of the test piece was measured using an electronic hydrometer (SD-200L, manufactured by Alpha Mirage Co., Ltd.).
Subsequently, the value of thermal conductivity was obtained by multiplying the thermal diffusivity by specific heat and density using the formula (1).
λ = α × Cp × ρ Formula (1)
(In formula (1), λ is thermal conductivity (W / (m · K)), α is thermal diffusivity (m 2 / s), Cp is specific heat (J / (kg · K)), and ρ is density. (D: kg / m 3 )
The results are shown in Table 3.

Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003

 表3に示すように、実施例1~3では、無機充填材全量に対するアルミナの含有率が100質量%である比較例1~3よりも熱伝導率が高い結果となった。 As shown in Table 3, in Examples 1 to 3, the thermal conductivity was higher than that in Comparative Examples 1 to 3 in which the content of alumina with respect to the total amount of the inorganic filler was 100% by mass.

 2017年3月31日に出願された日本国特許出願2017-072892の開示はその全体が参照により本明細書に取り込まれる。
 本明細書に記載された全ての文献、特許出願、及び技術規格は、個々の文献、特許出願、及び技術規格が参照により取り込まれることが具体的且つ個々に記された場合と同程度に、本明細書中に参照により取り込まれる。
The disclosure of Japanese Patent Application No. 2017-072892 filed on March 31, 2017 is incorporated herein by reference in its entirety.
All documents, patent applications, and technical standards mentioned in this specification are to the same extent as if each individual document, patent application, and technical standard were specifically and individually stated to be incorporated by reference, Incorporated herein by reference.

Claims (4)

 (A)エポキシ樹脂、(B)硬化剤、(C)硬化促進剤及び(D)無機充填材を含み、前記無機充填材は、無機充填材全量に対し、アルミナを75質量%~98質量%含む封止用エポキシ樹脂組成物。 (A) an epoxy resin, (B) a curing agent, (C) a curing accelerator, and (D) an inorganic filler, wherein the inorganic filler is 75% by mass to 98% by mass of alumina with respect to the total amount of the inorganic filler. An epoxy resin composition for sealing.  前記無機充填材は、アルミナと、窒化ケイ素、窒化ホウ素、酸化マグネシウム、酸化亜鉛、炭化ケイ素及び窒化アルミニウムからなる群より選択される少なくとも一つの無機充填材と、を含む請求項1に記載の封止用エポキシ樹脂組成物。 2. The seal according to claim 1, wherein the inorganic filler includes alumina and at least one inorganic filler selected from the group consisting of silicon nitride, boron nitride, magnesium oxide, zinc oxide, silicon carbide, and aluminum nitride. Stopping epoxy resin composition.  前記硬化剤がフェノール硬化剤である請求項1又は請求項2に記載の封止用エポキシ樹脂組成物。 The epoxy resin composition for sealing according to claim 1 or 2, wherein the curing agent is a phenol curing agent.  素子と、前記素子を封止する請求項1~請求項3のいずれか1項に記載の封止用エポキシ樹脂組成物の硬化物とを備える電子部品装置。 An electronic component device comprising: an element; and a cured product of the sealing epoxy resin composition according to any one of claims 1 to 3, which seals the element.
PCT/JP2018/013017 2017-03-31 2018-03-28 Epoxy resin composition for sealing, and electronic component device Ceased WO2018181600A1 (en)

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