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WO2017159611A1 - Fine copper particle dispersion liquid, electroconductive film formation method, and circuit board - Google Patents

Fine copper particle dispersion liquid, electroconductive film formation method, and circuit board Download PDF

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Publication number
WO2017159611A1
WO2017159611A1 PCT/JP2017/009960 JP2017009960W WO2017159611A1 WO 2017159611 A1 WO2017159611 A1 WO 2017159611A1 JP 2017009960 W JP2017009960 W JP 2017009960W WO 2017159611 A1 WO2017159611 A1 WO 2017159611A1
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WIPO (PCT)
Prior art keywords
copper fine
fine particles
particle dispersion
mass
resin
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Ceased
Application number
PCT/JP2017/009960
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French (fr)
Japanese (ja)
Inventor
川戸祐一
南原聡
工藤富雄
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Ishihara Chemical Co Ltd
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Ishihara Chemical Co Ltd
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Publication date
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Publication of WO2017159611A1 publication Critical patent/WO2017159611A1/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/52Electrically conductive inks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00Apparatus or processes specially adapted for manufacturing conductors or cables
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns

Definitions

  • This case relates to a copper fine particle dispersion, a conductive film forming method, and a circuit board.
  • the present invention has been made in view of the above problems, and an object thereof is to provide a copper fine particle dispersion, a method for forming a conductive film, and a circuit board that can achieve both good printing characteristics and low resistance.
  • the copper fine particle dispersion according to the present invention includes a first copper fine particle having a center particle diameter of 1 nm to 100 nm, a second copper fine particle having a center particle diameter of 0.3 ⁇ m to less than 2 ⁇ m, the first copper fine particle, and the first 2.
  • the resin may contain at least one of polyvinyl pyrrolidone, polyester resin, polyvinyl alcohol, terpene phenol resin, acrylic resin, urea-modified medium polarity polyamide, modified urea, and epoxy resin.
  • the ratio of the first copper fine particles to the total mass of the first copper fine particles and the second copper fine particles may be not less than 30 mass% and not more than 70 mass%.
  • the total concentration of the first copper fine particles and the second copper fine particles with respect to the copper fine particle dispersion may be 1 mass% or more and 85 mass% or less.
  • the method for forming a conductive film according to the present invention includes forming a film of the copper fine particle dispersion on the surface of the object, drying the film, and forming the conductive film by light firing that irradiates the dried film with light.
  • a film of the copper fine particle dispersion may be formed on the object surface using a gravure offset printing method.
  • the circuit board according to the present invention is characterized in that a circuit having a conductive film formed by the above conductive film forming method is provided on the substrate.
  • the conductive film forming method and the circuit board according to the present invention both good printing characteristics and low resistance can be achieved.
  • FIG. 1 is a diagram illustrating a gravure offset printing machine 100.
  • the gravure offset printing machine 100 includes a first stage 20 on which an intaglio (gravure plate) 10 is placed, a second stage 40 on which a substrate 30 that is a printing object is placed, A transport device 50 that reciprocates the first stage 20 and the second stage 40 in a predetermined linear direction, a doctor blade 60 that can be pressed against the intaglio 10, and a blanket 70 that can be pressed against the intaglio 10 and the substrate 30. And including.
  • a copper fine particle dispersion is applied to the intaglio 10.
  • the first stage 20 is transported to the doctor blade 60 side by the transport device 50, and the doctor blade 60 is pressed against the intaglio 10 to fill the concave portions of the intaglio 10 with the copper fine particle dispersion.
  • the first stage 20 is further transported to the blanket 70 side by the transport device 50, and the blanket 70 is pressed against the intaglio 10, whereby the copper fine particle dispersion filled in the recesses of the intaglio 10 is sucked into the blanket 70. That is, the printing pattern corresponding to the concave portion of the intaglio 10 is transferred to the blanket 70.
  • the second stage 40 is transported to the blanket 70 side by the transport device 50, and the blanket 70 is pressed against the substrate 30 to form a printed pattern film on the substrate 30.
  • the coating is dried.
  • the resin, solvent and dispersant in the copper fine particle dispersion are evaporated, leaving copper fine particles.
  • the copper fine particles are fired by irradiating the dried film with light. Thereby, a conductive film is formed.
  • the copper fine particle dispersion includes a first copper fine particle having a center particle diameter of 1 nm to 100 nm, a second copper fine particle having a center particle diameter of 0.3 ⁇ m to less than 2 ⁇ m, a first copper fine particle, and a second copper fine particle.
  • each line width can be printed at once (collective printing) in the gravure offset printing method. That is, good printing characteristics can be obtained.
  • a higher resin concentration is preferable. This is because the amount of the copper fine particle dispersion sucked by the blanket can be suppressed by controlling the rheological characteristics of the copper fine particle dispersion with the resin. Furthermore, it is because the copper fine particle dispersion liquid is less likely to remain on the blanket by using a resin that is difficult to wet the blanket. Therefore, the concentration with respect to the first copper fine particles and the second copper fine particles is set to 0.05 mass% or more.
  • the resin concentration is preferably not excessively high in order to reduce the evaporation amount during the light baking and to lower the resistivity of the conductive film. Therefore, the concentration with respect to the first copper fine particles and the second copper fine particles is set to less than 8 mass%.
  • the concentration with respect to the first copper fine particles and the second copper fine particles is set to less than 8 mass%.
  • the first copper fine particles preferably have a small particle size. Furthermore, it is preferable that the particle diameter of the first copper fine particles is small in order to make a conductor by photo-firing.
  • the center particle diameter of the first copper fine particles is set to 1 nm or more and less than 100 nm.
  • the center particle diameter of the second copper fine particles is preferably sufficiently larger than that of the first copper fine particles. Therefore, the center particle diameter of the second copper fine particles is set to 0.3 ⁇ m or more. If the center particle diameter of the second copper fine particles is too large, good dispersion stability cannot be obtained. Therefore, the center particle diameter of the second copper fine particles is set to less than 2 ⁇ m.
  • the first copper fine particles those having the same center particle diameter may be used alone, or those having two or more kinds of center particle diameters may be mixed and used.
  • the second copper fine particles those having the same center particle diameter may be used alone, or those having two or more kinds of center particle diameters may be mixed and used.
  • the total concentration of the first copper fine particles and the second copper fine particles is preferably 1 mass% or more and 85 mass% or less with respect to the copper fine particle dispersion. By setting the total concentration to 1 mass% or more, a sufficient amount of copper fine particles for forming the conductive film can be obtained. By setting the total concentration to 85 mass% or less, good dispersion stability and printing characteristics of the first copper fine particles and the second copper fine particles can be obtained.
  • the ratio of the first copper fine particles to the total mass of the first copper fine particles and the second copper fine particles is preferably 30 mass% or more and 70 mass% or less.
  • the ratio of the second copper fine particles to the total mass of the first copper fine particles and the second copper fine particles is preferably 30 mass% or more and 70 mass% or less. If the ratio of the first copper fine particles to the total mass of the first copper fine particles and the second copper fine particles is less than 30 mass%, the copper fine particle dispersion may not have sufficient viscosity, and may not be used as a gravure offset ink. Because there is.
  • the ratio of the first copper fine particles to the total mass of the first copper fine particles and the second copper fine particles is larger than 70 mass%, the amount of the copper fine particle dispersion sucked into the blanket varies greatly depending on the line width. It is because there is a possibility that it cannot be done. That is, good printing characteristics may not be obtained.
  • the resin is not particularly limited, and a thermoplastic resin, a thermosetting resin, a thermally decomposable resin, and the like can be used.
  • thermoplastic resin include vinyl-based polyvinyl chloride, polyvinylidene chloride, polyvinyl alcohol, vinyl chloride / vinyl acetate copolymer, polystyrene-based polystyrene, styrene / acrylonitrile copolymer, styrene / butadiene / acrylonitrile copolymer.
  • thermosetting resin examples include, but are not limited to, phenol resin, melamine resin, epoxy resin, unsaturated polyester, and silicone. Further, they may be cured by photoreaction with ultraviolet rays instead of heat.
  • degradable resin examples include polyperoxide, but are not limited thereto. These resins may be used alone or in combination of two or more.
  • the resin it is preferable to use polyvinyl pyrrolidone, polyester resin, epoxy resin, polyvinyl alcohol, terpene phenol resin, acrylic resin, urea-modified medium polar polyamide, modified urea, or the like. Since these resins are relatively high in polarity, they are easily compatible with copper fine particles and a polar dispersion medium, and are not easily compatible with a non-polar blanket. Because the resin is easily compatible with copper fine particles and polar dispersion media, the rheological properties of the copper fine particle dispersion can be changed, and by controlling the rheological properties, the amount of copper fine particle dispersion absorbed by the blanket can be suppressed. . Further, since the resin is not easily adapted to the blanket, the copper fine particle dispersion is less likely to remain on the blanket. For these reasons, these resins are considered to exhibit good printing characteristics.
  • Solvent is not particularly limited.
  • a polar dispersion medium can be used.
  • a protic dispersion medium or an aprotic dispersion medium can be used.
  • the protic dispersion medium is a linear or branched alkyl compound or alkenyl compound having one hydroxyl group and having 5 to 30 carbon atoms. This protic dispersion medium may have 1 to 10 ether bonds and may have 1 to 5 carbonyl groups.
  • By setting the carbon number to 5 or more elution (corrosion) of copper fine particles into the dispersion medium is suppressed, and good dispersion stability is obtained.
  • By setting the number of carbon atoms to 30 or less a decrease in the polarity of the dispersion medium is suppressed, and the dispersant is easily dissolved.
  • protic dispersion medium examples include 3-methoxy-3-methylbutanol, triethylene glycol monomethyl ether, triethylene glycol monobutyl ether, diethylene glycol monobutyl ether, diethylene glycol monomethyl ether, propylene glycol monobutyl ether, and dipropylene.
  • the protonic dispersion medium may be a linear or branched alkyl compound or alkenyl compound having 2 to 30 hydroxyl groups and 2 to 30 carbon atoms.
  • This protic dispersion medium may have 1 to 10 ether bonds and may have 1 to 5 carbonyl groups.
  • protic dispersion medium examples include 2-methylpentane-2,4-diol, ethylene glycol, propylene glycol, 1,5-pentanediol, polyethylene glycol, triethylene glycol, glycerin, sorbitol and the like. However, it is not limited to these.
  • Examples of the aprotic polar dispersion medium having a relative dielectric constant of 30 or more include propylene carbonate, 1,3-dimethyl-2-imidazolidinone, hexamethylphosphoramide, N-methylpyrrolidone, N-ethylpyrrolidone, and nitrobenzene. , N, N-diethylformamide, N, N-dimethylacetamide, furfural, ⁇ -butyrolactone, ethylene sulfite, sulfolane, dimethyl sulfoxide, succinonitrile, ethylene carbonate and the like, but are not limited thereto. .
  • polar dispersion media may be used alone or in combination of two or more.
  • the dispersant is not particularly limited.
  • a compound having at least one acidic functional group and a molecular weight of 200 or more and 100,000 or less or a salt thereof can be used.
  • the acidic functional group of the dispersant is a functional group having acidity, that is, a proton donating property, such as a phosphoric acid group, a phosphonic acid group, a sulfonic acid group, a sulfuric acid group, and a carboxyl group.
  • the concentration of the dispersant is, for example, 0.5 mass% or more and 50 mass% or less with respect to the copper fine particle dispersion. A sufficient dispersion effect can be obtained by setting the concentration of the dispersant to 0.5 mass% or more. By setting the concentration of the dispersant to 50 mass% or less, good printing characteristics can be obtained when the copper fine particle dispersion is used in the printing method.
  • a leveling agent, a surface conditioner, an antifoaming agent, an anticorrosive, a light baking conditioner, and the like can be appropriately added within a range not impairing the dispersion stability.
  • the dispersant has compatibility with the dispersion medium. Furthermore, when the dispersion medium is a protic dispersion medium, it has a proton donating property, so that a hydrogen bond is formed between the dispersion medium molecules and interacts with the acidic functional group of the dispersant. When the dispersion medium is an aprotic polar dispersion medium, it has no proton donating property, but has a high relative dielectric constant of 30 or more, so that the acidic functional group of the dispersant can dissociate protons (H + ).
  • the surface of the copper fine particles is covered with the dispersant molecule, it is dispersed in the dispersion medium by the electrostatic interaction between the dispersant and the dispersion medium. Since the copper fine particles have a small particle size, aggregation is prevented if the electrostatic interaction between the dispersant and the dispersion medium is large, and if the particles do not aggregate, they do not settle and the dispersion stability of the copper fine particle dispersion becomes high. .
  • the protic dispersion medium has an ether bond or a carbonyl group
  • the polarity is increased, so that the compatibility with the dispersant is increased and the dispersion stability of the copper fine particle dispersion is increased.
  • the conductive film forming method according to the present embodiment will be described with reference to FIG. 1 again.
  • the intaglio 10 for example, an intaglio in which a photosensitive resin on a glass plate is formed by exposure, development and washing, an intaglio in which a glass plate, a metal plate, a metal roll or the like is formed by chemical etching and laser etching, or the like can be used.
  • a known and commonly used intaglio can be used as the intaglio 10.
  • the blanket 70 for example, a sheet having a layer structure such as a silicone rubber layer, a PET layer, or a sponge layer can be used.
  • These sheets are used, for example, in a state of being wound around a rigid cylinder called a blanket cylinder.
  • a blanket cylinder As the substrate 30, polyimide, glass, polycarbonate, PET, PEN, cycloolefin polymer, metal plate, or the like can be used.
  • a printed pattern film is formed on the substrate 30 in accordance with the description of FIG.
  • the film is dried.
  • the resin, solvent and dispersant in the copper fine particle dispersion are evaporated, leaving copper fine particles.
  • the drying time of the film is completed in about 30 minutes in an air atmosphere at 100 ° C., for example.
  • an air flow or a nitrogen flow may be applied to the film.
  • the copper fine particles are fired by irradiating the dried film with light.
  • firing by light irradiation photo-firing
  • reduction of the surface oxide film of the copper fine particles and sintering of the copper fine particles occur.
  • the copper fine particles are melted together in the sintering and welded to the substrate 30.
  • the light baking is performed, for example, in the atmosphere and at room temperature.
  • the light source used for light baking is, for example, a xenon lamp.
  • a laser device may be used as the light source.
  • Energy range of the light irradiated from the light source for example, 0.1 J / cm 2 or more and 100 J / cm 2 or less.
  • the irradiation time is, for example, 0.1 ms or more and 100 ms or less.
  • the number of times of irradiation may be one time or multiple times of multistage irradiation.
  • the photo-fired film has conductivity. Thereby, a conductive film having a printed pattern is formed.
  • the form of the formed conductive film is a continuous film.
  • the resistivity of the conductive film is, for example, 2 ⁇ ⁇ cm to 9 ⁇ ⁇ cm.
  • the circuit board has a circuit on the board.
  • the substrate may be made of a semiconductor such as a silicon wafer.
  • the substrate may be one coated with a hard coat layer or primer layer for improving heat resistance, preventing scratches and improving optical properties.
  • the circuit has a conductive film formed by this conductive film forming method.
  • the conductive film constitutes, for example, a conductive wire that electrically connects circuit elements.
  • the conductive film may constitute a circuit element or a part thereof, for example, a coil, a capacitor electrode, or the like.
  • Example 2 In the following, experiments were conducted on printing characteristics of the copper fine particle dispersions according to the above-described embodiments (Samples 1 to 16 and Comparative Samples 1 to 6). Specifically, batch printing 1 and 2 were performed for a plurality of different line widths using the gravure offset printing method. Then, the electrically conductive film was formed by drying and light baking. In batch printing 1, a line width of 10 ⁇ m between 10 ⁇ m and 50 ⁇ m was used. In batch printing 2, a line width of 7 ⁇ m and a line width of about 10 ⁇ m between 10 ⁇ m and 100 ⁇ m were used.
  • Table 1 and Table 2 show the particle size range of the first copper fine particles.
  • Tables 1 and 2 show the center particle diameters of the second copper fine particles.
  • Tables 1 and 2 show the ratios of the second copper fine particles of the first copper fine particles to the total mass of the first copper fine particles and the second copper fine particles.
  • Tables 1 and 2 show the types of resins contained in the copper fine particle dispersion and the resin concentration (mass%) relative to the total mass of the first copper fine particles and the second copper fine particles.
  • the results of batch printing 1 and 2 are shown in Tables 1 and 2.
  • Tables 1 and 2 show the results of resistance tests of the conductive films formed by drying and light baking.
  • PVP 2500 is a reagent polyvinyl pyrrolidone having a weight average molecular weight of about 2500.
  • VYLON220 is an amorphous polyester resin (100%) manufactured by Toyobo, and has a number average molecular weight of about 3000.
  • PVP K90 is a reagent polyvinylpyrrolidone having a weight average molecular weight of about 360000.
  • PVA is a reagent polyvinyl alcohol and has a molecular weight of about 2000.
  • PSK125 is a terpene phenol resin having a weight average molecular weight of about 650, which is YS Polystar K125 manufactured by Yasuhara Chemical.
  • XZ # 7157 is Toei Kasei Acrynal, which is an acrylic resin.
  • BYK-430 is a urea-modified medium polar polyamide manufactured by Big Chemie.
  • BYK-410 is a modified urea manufactured by Big Chemie.
  • YX8100BH30 is an epoxy resin having a weight average molecular weight of about 38000 manufactured by Mitsubishi Chemical.
  • the total concentration of the first copper fine particles and the second copper fine particles in the copper fine particle dispersion is about 80 mass%. In Samples 10 and 11, the total concentration of the first copper fine particles and the second copper fine particles in the copper fine particle dispersion is about 85 mass%.
  • the other composition of the copper fine particle dispersion is as follows. Solvent: 20% by mass of ⁇ -butyrolactone and 80% by mass of tripropylene glycol monomethyl ether in the balance of the total weight of the copper fine particles and the dispersant. Dispersant: 4 mass% with respect to the total concentration of DISPERBYK-111 manufactured by Big Chemie, the first copper fine particles and the second copper fine particles.
  • a blank in the batch printing 2 column of Tables 1 and 2 indicates that only batch printing 1 is performed and batch printing 2 is not performed.
  • the numerical range in the column of batch printing 1 and 2 indicates the range of the line width at which good printing was obtained.
  • Good printing means that the copper fine particle dispersion did not remain in the blanket 70.
  • 10-50 indicates that good printing was obtained for each line width of 10 ⁇ m to 50 ⁇ m.
  • X indicates that good printing could not be obtained at any line width. The wider the line width range, the better the printing characteristics.
  • “ ⁇ ” in the resistance column of Tables 1 and 2 means that resistance on the order of ⁇ ⁇ cm was obtained by photo-baking on a polyimide Kapton 150ENA substrate manufactured by Toray DuPont.
  • Comparative Sample 1 Although good resistivity was obtained, good printing characteristics were not obtained. This is presumably because the copper fine particle dispersion did not contain a resin.
  • Comparative Sample 2 although good resistivity was obtained, good printing characteristics were not obtained. This is presumably because the copper fine particle dispersion did not contain the second copper fine particles.
  • Comparative Sample 3 although good resistivity was obtained, good printing characteristics were not obtained. This is presumably because the first copper fine particles were not included in the copper fine particle dispersion.
  • Comparative Sample 4 although good printing characteristics were obtained, the resistivity was not measured because it was blown off during light firing. This is presumably because a large amount of resin decomposed and vaporized when heat was instantaneously applied during photo-baking.
  • Comparative Sample 5 the copper fine particles could not be dispersed in the copper fine particle dispersion. This is presumably because the amount of the second copper fine particles having a large particle size has increased.
  • Comparative Sample 6 although good printing characteristics were obtained, the resistance was not lowered by light baking, and a resistance of ⁇ ⁇ cm order was not obtained. This is thought to be due to the large amount of resin that could not be decomposed by light baking and remained.
  • good printing characteristics and good resistivity were obtained in any of the samples.
  • good printing characteristics were obtained by including the second copper fine particles having a center particle size of 0.3 ⁇ m or more and less than 2 ⁇ m and the resin in the copper fine particle dispersion.
  • a favorable resistivity was obtained by setting the resin concentration with respect to the first copper fine particles and the second copper fine particles to 0.05 mass% or more and less than 8 mass%.
  • a hard coat PET (polyethylene terephthalate) base material (MKZ-GPMP manufactured by Higashiyama Film Co., Ltd.) is used, and the mesh pattern is formed by gravure offset printing so that a line having a width of 7 ⁇ m and a thickness of about 1 ⁇ m has a space interval of 300 ⁇ m. Formed.
  • the 7 ⁇ m mesh resistance in Table 3 is a value obtained by pressing a copper plate against a printed and light-fired mesh pattern so that the distance is 1 cm 2 and measuring the resistance between them with a tester.

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Dispersion Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Conductive Materials (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)

Abstract

A fine copper particle dispersion liquid is characterized by having: first fine copper particles having a median particle diameter of 1-100 nm; second fine copper particles having a median particle diameter that is greater than or equal to 0.3 µm and less than 2 µm; a resin in a concentration greater than or equal to 0.05 mass% and less than 8 mass% in relation to the first fine copper particles and the second fine copper particles; a solvent; and a dispersing agent for dispersing the first fine copper particles and the second fine copper particles in the solvent.

Description

銅微粒子分散液、導電膜形成方法および回路基板Copper fine particle dispersion, conductive film forming method, and circuit board

 本件は、銅微粒子分散液、導電膜形成方法および回路基板に関する。 This case relates to a copper fine particle dispersion, a conductive film forming method, and a circuit board.

 銅微粒子を含むインクを用いた印刷によりパターンを形成し、光焼成によって導電膜を形成する技術が開示されている(例えば、特許文献1,2参照)。一方、導電性金属粒子を含むインクを用いたグラビアオフセット印刷手法が開示されている(例えば、特許文献3参照)。 Techniques have been disclosed in which a pattern is formed by printing using ink containing copper fine particles, and a conductive film is formed by light baking (see, for example, Patent Documents 1 and 2). On the other hand, a gravure offset printing method using ink containing conductive metal particles is disclosed (for example, see Patent Document 3).

特開2013-105605号公報JP 2013-105605 A 特開2013-104089号公報JP 2013-104089 A 特開2015-193722号公報JP2015-193722A

 銅微粒子を含むインクを用いてグラビアオフセット印刷しようとすると、異なる線幅のパターンを一度に印刷することが困難である。すなわち、良好な印刷特性が得られない場合がある。そこで、インクに樹脂を添加することが考えられるが、樹脂を添加しても良好な印刷特性が得られない場合がある。また、樹脂を添加することで、光焼成後に得られる導電膜の抵抗が大きくなる場合がある。 When it is attempted to perform gravure offset printing using ink containing copper fine particles, it is difficult to print patterns having different line widths at once. That is, good printing characteristics may not be obtained. Therefore, it is conceivable to add a resin to the ink, but even if the resin is added, good printing characteristics may not be obtained. Moreover, the resistance of the electrically conductive film obtained after photobaking may become large by adding resin.

 本件は上記課題に鑑みなされたものであり、良好な印刷特性と低抵抗とを両立することができる銅微粒子分散液、導電膜形成方法および回路基板を提供することを目的とする。 The present invention has been made in view of the above problems, and an object thereof is to provide a copper fine particle dispersion, a method for forming a conductive film, and a circuit board that can achieve both good printing characteristics and low resistance.

 本発明に係る銅微粒子分散液は、中心粒子径が1nm以上100nm以下の第1銅微粒子と、中心粒子径が0.3μm以上2μm未満の第2銅微粒子と、前記第1銅微粒子および前記第2銅微粒子に対する濃度が0.05mass%以上8mass%未満の樹脂と、溶剤と、前記第1銅微粒子および前記第2銅微粒子を前記溶剤中で分散させる分散剤と、を有することを特徴とする。 The copper fine particle dispersion according to the present invention includes a first copper fine particle having a center particle diameter of 1 nm to 100 nm, a second copper fine particle having a center particle diameter of 0.3 μm to less than 2 μm, the first copper fine particle, and the first 2. A resin having a concentration with respect to 2 copper fine particles of 0.05 mass% or more and less than 8 mass%, a solvent, and a dispersant for dispersing the first copper fine particles and the second copper fine particles in the solvent. .

 前記樹脂は、ポリビニルピロリドン、ポリエステル樹脂、ポリビニルアルコール、テルペンフェノール樹脂、アクリル樹脂、ウレア変性中極性ポリアマイド、変性ウレア、エポキシ樹脂の少なくともいずれかを含んでいてもよい。前記第1銅微粒子および前記第2銅微粒子の総質量に対する前記第1銅微粒子の割合は、30mass%以上70mass%以下としてもよい。前記銅微粒子分散液に対する、前記第1銅微粒子および前記第2銅微粒子の合計の濃度は、1mass%以上85mass%以下としてもよい。 The resin may contain at least one of polyvinyl pyrrolidone, polyester resin, polyvinyl alcohol, terpene phenol resin, acrylic resin, urea-modified medium polarity polyamide, modified urea, and epoxy resin. The ratio of the first copper fine particles to the total mass of the first copper fine particles and the second copper fine particles may be not less than 30 mass% and not more than 70 mass%. The total concentration of the first copper fine particles and the second copper fine particles with respect to the copper fine particle dispersion may be 1 mass% or more and 85 mass% or less.

 本発明に係る導電膜形成方法は、上記銅微粒子分散液の皮膜を物体表面に形成し、前記皮膜を乾燥させ、乾燥した前記皮膜に光を照射する光焼成によって導電膜を形成する、ことを特徴とする。グラビアオフセット印刷法を用いて前記銅微粒子分散液の皮膜を前記物体表面に形成してもよい。 The method for forming a conductive film according to the present invention includes forming a film of the copper fine particle dispersion on the surface of the object, drying the film, and forming the conductive film by light firing that irradiates the dried film with light. Features. A film of the copper fine particle dispersion may be formed on the object surface using a gravure offset printing method.

 本発明に係る回路基板は、上記導電膜形成方法によって形成された導電膜を有する回路を基板上に備えることを特徴とする。 The circuit board according to the present invention is characterized in that a circuit having a conductive film formed by the above conductive film forming method is provided on the substrate.

 本発明に係る銅微粒子分散液、導電膜形成方法および回路基板によれば、良好な印刷特性と低抵抗とを両立することができる。 According to the copper fine particle dispersion, the conductive film forming method and the circuit board according to the present invention, both good printing characteristics and low resistance can be achieved.

グラビアオフセット印刷機を例示する図である。It is a figure which illustrates a gravure offset printing machine.

 まず、実施形態に係る銅微粒子分散液が好適に対象とするグラビアオフセット印刷法を用いた導電膜形成手順について説明する。図1は、グラビアオフセット印刷機100を例示する図である。図1で例示するように、グラビアオフセット印刷機100は、凹版(グラビア版)10が載置された第1ステージ20と、被印刷物である基板30が載置された第2ステージ40と、第1ステージ20および第2ステージ40を所定の直線方向に往復動させる搬送装置50と、凹版10に圧接可能に設けられたドクターブレード60と、凹版10および基板30に圧接可能に設けられたブランケット70と、を含む。 First, the conductive film formation procedure using the gravure offset printing method which is suitable for the copper fine particle dispersion according to the embodiment will be described. FIG. 1 is a diagram illustrating a gravure offset printing machine 100. As illustrated in FIG. 1, the gravure offset printing machine 100 includes a first stage 20 on which an intaglio (gravure plate) 10 is placed, a second stage 40 on which a substrate 30 that is a printing object is placed, A transport device 50 that reciprocates the first stage 20 and the second stage 40 in a predetermined linear direction, a doctor blade 60 that can be pressed against the intaglio 10, and a blanket 70 that can be pressed against the intaglio 10 and the substrate 30. And including.

 グラビアオフセット印刷法においては、凹版10に銅微粒子分散液を塗布する。次に、搬送装置50によって第1ステージ20をドクターブレード60側に搬送し、ドクターブレード60を凹版10に圧接することによって、凹版10の凹部に銅微粒子分散液を充填する。搬送装置50によって第1ステージ20をさらにブランケット70側に搬送し、ブランケット70を凹版10に圧接することによって、凹版10の凹部に充填された銅微粒子分散液がブランケット70に吸われる。すなわち、凹版10の凹部に対応する印刷パターンがブランケット70に転写される。次に、搬送装置50によって第2ステージ40をブランケット70側に搬送し、ブランケット70を基板30に圧接することによって、基板30に印刷パターンの皮膜を形成する。次に、必要であれば、皮膜に対して乾燥処理を行う。皮膜の乾燥によって、銅微粒子分散液中の樹脂、溶剤および分散剤が蒸発し、銅微粒子が残る。次に、乾燥した皮膜に光を照射することによって、銅微粒子に対して焼成処理を行う。それにより、導電膜が形成される。 In the gravure offset printing method, a copper fine particle dispersion is applied to the intaglio 10. Next, the first stage 20 is transported to the doctor blade 60 side by the transport device 50, and the doctor blade 60 is pressed against the intaglio 10 to fill the concave portions of the intaglio 10 with the copper fine particle dispersion. The first stage 20 is further transported to the blanket 70 side by the transport device 50, and the blanket 70 is pressed against the intaglio 10, whereby the copper fine particle dispersion filled in the recesses of the intaglio 10 is sucked into the blanket 70. That is, the printing pattern corresponding to the concave portion of the intaglio 10 is transferred to the blanket 70. Next, the second stage 40 is transported to the blanket 70 side by the transport device 50, and the blanket 70 is pressed against the substrate 30 to form a printed pattern film on the substrate 30. Next, if necessary, the coating is dried. By drying the film, the resin, solvent and dispersant in the copper fine particle dispersion are evaporated, leaving copper fine particles. Next, the copper fine particles are fired by irradiating the dried film with light. Thereby, a conductive film is formed.

 上記のようなグラビアオフセット印刷法においては、例えば50μm以下の高精細なラインを印刷することができるという効果が得られる。しかしながら、ブランケット70に吸われる銅微粒子分散液の量が線幅に応じて異なるため、印刷パターンに異なる線幅が含まれている場合にはそれらの線幅のパターンを一度に印刷する(一括印刷する)ことが困難である。すなわち、良好な印刷特性が得られない。例えば、いずれかの線幅のパターンではブランケット70に銅微粒子分散液が残留し、基板30に転写できない場合がある。 In the gravure offset printing method as described above, an effect that a high-definition line of, for example, 50 μm or less can be printed is obtained. However, since the amount of the copper fine particle dispersion sucked into the blanket 70 differs depending on the line width, if the print pattern includes different line widths, the line width patterns are printed at once (batch printing). Is difficult). That is, good printing characteristics cannot be obtained. For example, in any line width pattern, the copper fine particle dispersion may remain on the blanket 70 and cannot be transferred to the substrate 30.

 そこで、銅微粒子分散液に樹脂を添加することで、異なる線幅のパターンを一度に印刷することが考えられる。樹脂により銅微粒子分散液のレオロジー特性をコントロールすることでブランケット70に吸われる銅微粒子分散液の量を抑えることができるからである。さらに、ブランケット70にぬれにくい樹脂を使用することで、銅微粒子分散液がブランケット70上に残留しにくくなるからである。しかしながら、樹脂を添加しても良好な印刷特性が得られない場合があることがわかった。また、樹脂を添加することで、銅微粒子分散液を光焼成することで得られる導電膜の抵抗が大きくなる場合があることがわかった。そこで、以下の実施形態では、良好な印刷特性と低抵抗とを両立することができる銅微粒子分散液、導電膜形成方法および回路基板について説明する。 Therefore, it is conceivable to print patterns with different line widths at once by adding a resin to the copper fine particle dispersion. This is because the amount of the copper fine particle dispersion sucked into the blanket 70 can be suppressed by controlling the rheological characteristics of the copper fine particle dispersion with the resin. Furthermore, the use of a resin that is difficult to wet for the blanket 70 makes it difficult for the copper fine particle dispersion to remain on the blanket 70. However, it has been found that even if a resin is added, good printing characteristics may not be obtained. Moreover, it has been found that by adding a resin, the resistance of the conductive film obtained by photo-baking the copper fine particle dispersion may be increased. Therefore, in the following embodiments, a copper fine particle dispersion, a conductive film forming method, and a circuit board that can achieve both good printing characteristics and low resistance will be described.

 (実施形態)
 一実施形態に係る銅微粒子分散液は、中心粒子径が1nm以上100nm以下の第1銅微粒子と、中心粒子径が0.3μm以上2μm未満の第2銅微粒子と、第1銅微粒子および第2銅微粒子に対する濃度が0.05mass%以上8mass%未満の樹脂と、溶剤と、前記第1銅微粒子および前記第2銅微粒子を前記溶剤中で分散させる分散剤と、を有する。
(Embodiment)
The copper fine particle dispersion according to one embodiment includes a first copper fine particle having a center particle diameter of 1 nm to 100 nm, a second copper fine particle having a center particle diameter of 0.3 μm to less than 2 μm, a first copper fine particle, and a second copper fine particle. A resin having a concentration with respect to the copper fine particles of 0.05 mass% or more and less than 8 mass%, a solvent, and a dispersant for dispersing the first copper fine particles and the second copper fine particles in the solvent.

 銅微粒子分散液に樹脂を添加することによって、グラビアオフセット印刷法において各線幅の印字を一度に行う(一括印刷する)ことができる。すなわち、良好な印刷特性が得られるようになる。良好な印刷特性を得るためには、樹脂濃度は高い方が好ましい。樹脂により銅微粒子分散液のレオロジー特性をコントロールすることでブランケットに吸われる銅微粒子分散液の量を抑えることができるからである。さらに、ブランケットにぬれにくい樹脂を使用することで、銅微粒子分散液がブランケット上に残留しにくくなるからである。そこで、第1銅微粒子および第2銅微粒子に対する濃度を0.05mass%以上とする。光焼成の際の蒸発量を抑えて導電膜の抵抗率を低くするためには、樹脂濃度は過度に高くないことが好ましい。そこで、第1銅微粒子および第2銅微粒子に対する濃度を8mass%未満とする。また、良好な印刷特性を得るためには、粒径の小さい銅微粒子および粒径の大きい銅微粒子を用いることが好ましい。銅微粒子分散液における銅微粒子の良好な分散安定性を得るためには、第1銅微粒子の粒径は小さいことが好ましい。さらに、光焼成により導体化を行うためには、第1銅微粒子の粒径は小さいことが好ましい。そこで、第1銅微粒子の中心粒子径を1nm以上100nm未満とする。第1銅微粒子に対して粒径の大きい第2銅微粒子を添加することで、ブランケットに吸われる銅微粒子分散液の量を抑えることができる。良好な印刷特性を得るためには、第2銅微粒子の中心粒子径は第1銅微粒子に比べて十分大きいことが好ましい。そこで、第2銅微粒子の中心粒子径を0.3μm以上とする。第2銅微粒子の中心粒子径が大き過ぎると良好な分散安定性が得られない。そこで、第2銅微粒子の中心粒子径を2μm未満とする。 By adding a resin to the copper fine particle dispersion, each line width can be printed at once (collective printing) in the gravure offset printing method. That is, good printing characteristics can be obtained. In order to obtain good printing characteristics, a higher resin concentration is preferable. This is because the amount of the copper fine particle dispersion sucked by the blanket can be suppressed by controlling the rheological characteristics of the copper fine particle dispersion with the resin. Furthermore, it is because the copper fine particle dispersion liquid is less likely to remain on the blanket by using a resin that is difficult to wet the blanket. Therefore, the concentration with respect to the first copper fine particles and the second copper fine particles is set to 0.05 mass% or more. The resin concentration is preferably not excessively high in order to reduce the evaporation amount during the light baking and to lower the resistivity of the conductive film. Therefore, the concentration with respect to the first copper fine particles and the second copper fine particles is set to less than 8 mass%. In order to obtain good printing characteristics, it is preferable to use copper fine particles having a small particle diameter and copper fine particles having a large particle diameter. In order to obtain good dispersion stability of the copper fine particles in the copper fine particle dispersion, the first copper fine particles preferably have a small particle size. Furthermore, it is preferable that the particle diameter of the first copper fine particles is small in order to make a conductor by photo-firing. Therefore, the center particle diameter of the first copper fine particles is set to 1 nm or more and less than 100 nm. By adding the second copper fine particles having a large particle diameter to the first copper fine particles, the amount of the copper fine particle dispersion sucked by the blanket can be suppressed. In order to obtain good printing characteristics, the center particle diameter of the second copper fine particles is preferably sufficiently larger than that of the first copper fine particles. Therefore, the center particle diameter of the second copper fine particles is set to 0.3 μm or more. If the center particle diameter of the second copper fine particles is too large, good dispersion stability cannot be obtained. Therefore, the center particle diameter of the second copper fine particles is set to less than 2 μm.

 以下、銅微粒子分散液の他の態様について説明する。第1銅微粒子は、同一中心粒子径のものを単独で用いてもよく、2種類以上の中心粒子径を有するものを混合して用いてもよい。第2銅微粒子は、同一中心粒子径のものを単独で用いてもよく、2種類以上の中心粒子径を有するものを混合して用いてもよい。 Hereinafter, other aspects of the copper fine particle dispersion will be described. As the first copper fine particles, those having the same center particle diameter may be used alone, or those having two or more kinds of center particle diameters may be mixed and used. As the second copper fine particles, those having the same center particle diameter may be used alone, or those having two or more kinds of center particle diameters may be mixed and used.

 第1銅微粒子および第2銅微粒子の合計の濃度は、銅微粒子分散液に対して1mass%以上85mass%以下とすることが好ましい。合計の濃度を1mass%以上とすることで、導電膜を形成するための十分な銅微粒子量が得られる。合計の濃度を85mass%以下とすることで、第1銅微粒子および第2銅微粒子の良好な分散安定性及び印刷特性が得られる。 The total concentration of the first copper fine particles and the second copper fine particles is preferably 1 mass% or more and 85 mass% or less with respect to the copper fine particle dispersion. By setting the total concentration to 1 mass% or more, a sufficient amount of copper fine particles for forming the conductive film can be obtained. By setting the total concentration to 85 mass% or less, good dispersion stability and printing characteristics of the first copper fine particles and the second copper fine particles can be obtained.

 第1銅微粒子および第2銅微粒子の総質量に対する第1銅微粒子の割合は、30mass%以上70mass%以下であることが好ましい。言い換えると、第1銅微粒子および第2銅微粒子の総質量に対する第2銅微粒子の割合は、30mass%以上70mass%以下であることが好ましい。第1銅微粒子および第2銅微粒子の総質量に対する第1銅微粒子の割合が30mass%未満であると、銅微粒子分散液に十分な粘度が得られず、グラビアオフセット用インクとして使用に耐えないおそれがあるからである。また、第1銅微粒子および第2銅微粒子の総質量に対する第1銅微粒子の割合が70mass%より大きいと、線幅によりブランケットに吸われる銅微粒子分散液の量が大きく異なるため、一括印刷することができないおそれがあるためである。すなわち、良好な印刷特性が得られないおそれがあるためである。 The ratio of the first copper fine particles to the total mass of the first copper fine particles and the second copper fine particles is preferably 30 mass% or more and 70 mass% or less. In other words, the ratio of the second copper fine particles to the total mass of the first copper fine particles and the second copper fine particles is preferably 30 mass% or more and 70 mass% or less. If the ratio of the first copper fine particles to the total mass of the first copper fine particles and the second copper fine particles is less than 30 mass%, the copper fine particle dispersion may not have sufficient viscosity, and may not be used as a gravure offset ink. Because there is. In addition, if the ratio of the first copper fine particles to the total mass of the first copper fine particles and the second copper fine particles is larger than 70 mass%, the amount of the copper fine particle dispersion sucked into the blanket varies greatly depending on the line width. It is because there is a possibility that it cannot be done. That is, good printing characteristics may not be obtained.

 樹脂は、特に限定されるものではないが、熱可塑性樹脂、熱硬化性樹脂、熱分解性樹脂などを用いることができる。熱可塑性樹脂としては、例えば、ビニル系のポリ塩化ビニル、ポリ塩化ビニリデン、ポリビニルアルコール、塩化ビニル・酢酸ビニル共重合体、ポリスチレン系のポリスチレン、スチレン・アクリロニトリル共重合体、スチレン・ブタジエン・アクリロニトリル共重合体、ポリエチレン、エチレン・酢酸ビニル共重合体、ポリフェノール、ポリプロピレン系、ポリアセタール系、ポリエステル系、テルペン樹脂系、環化ゴム系、アルキッド樹脂系、アクリル系のポリメチルアクリレート、ポリメチルメタクリレート、変性アクリル、メタクリル・スチレン共重合体、酢酸セルロース系、ポリカーボネート系、ポリエチレンテレフタレート系、ポリアミド系のポリアミド、ポリイミド、ポリアミドイミド、ナイロン、ポリウレタン系、フッ素系樹脂などが挙げられるが、これらに限定されるものではない。熱硬化性樹脂としては、例えば、フェノール樹脂、メラミン樹脂、エポキシ樹脂、不飽和ポリエステル、シリコーンなどが挙げられるが、これらに限定されるものではない。また、これらは熱でなく紫外線による光反応により硬化しても構わない。分解性樹脂としては、例えば、ポリペルオキシドなどが挙げられるが、これに限定されるものではない。これらの樹脂は単独で用いても、2種類以上を組み合わせて用いてもよい。 The resin is not particularly limited, and a thermoplastic resin, a thermosetting resin, a thermally decomposable resin, and the like can be used. Examples of the thermoplastic resin include vinyl-based polyvinyl chloride, polyvinylidene chloride, polyvinyl alcohol, vinyl chloride / vinyl acetate copolymer, polystyrene-based polystyrene, styrene / acrylonitrile copolymer, styrene / butadiene / acrylonitrile copolymer. Polymer, polyethylene, ethylene / vinyl acetate copolymer, polyphenol, polypropylene, polyacetal, polyester, terpene resin, cyclized rubber, alkyd resin, acrylic polymethyl acrylate, polymethyl methacrylate, modified acrylic, Methacryl / styrene copolymer, cellulose acetate, polycarbonate, polyethylene terephthalate, polyamide polyamide, polyimide, polyamideimide, nylon, polyurethane, fluorine Such as butter, and the like, but not limited thereto. Examples of the thermosetting resin include, but are not limited to, phenol resin, melamine resin, epoxy resin, unsaturated polyester, and silicone. Further, they may be cured by photoreaction with ultraviolet rays instead of heat. Examples of the degradable resin include polyperoxide, but are not limited thereto. These resins may be used alone or in combination of two or more.

 樹脂として、ポリビニルピロリドン、ポリエステル樹脂、エポキシ樹脂、ポリビニルアルコール、テルペンフェノール樹脂、アクリル樹脂、ウレア変性中極性ポリアマイド、変性ウレアなどを用いることが好ましい。これらの樹脂は比較的極性が高いため、銅微粒子及び極性分散媒になじみやすく、非極性であるブランケットになじみにくい。樹脂が銅微粒子及び極性分散媒になじみやすいことで、銅微粒子分散液のレオロジー特性を変えることができ、レオロジー特性をコントロールすることで、ブランケットに吸われる銅微粒子分散液の量を抑えることができる。また、樹脂がブランケットになじみにくいことで、銅微粒子分散液がブランケット上に残留しにくくなる。以上の理由により、これらの樹脂が良好な印刷特性を発現するものと考えられる。 As the resin, it is preferable to use polyvinyl pyrrolidone, polyester resin, epoxy resin, polyvinyl alcohol, terpene phenol resin, acrylic resin, urea-modified medium polar polyamide, modified urea, or the like. Since these resins are relatively high in polarity, they are easily compatible with copper fine particles and a polar dispersion medium, and are not easily compatible with a non-polar blanket. Because the resin is easily compatible with copper fine particles and polar dispersion media, the rheological properties of the copper fine particle dispersion can be changed, and by controlling the rheological properties, the amount of copper fine particle dispersion absorbed by the blanket can be suppressed. . Further, since the resin is not easily adapted to the blanket, the copper fine particle dispersion is less likely to remain on the blanket. For these reasons, these resins are considered to exhibit good printing characteristics.

 溶剤(分散媒)は、特に限定されるものではない。溶剤として、例えば、極性分散媒を用いることができる。極性分散媒として、プロトン性分散媒または非プロトン性分散媒を用いることができる。プロトン性分散媒は、1個のヒドロキシル基を有する炭素数が5以上30以下の直鎖または分岐鎖状のアルキル化合物もしくはアルケニル化合物である。このプロトン性分散媒は、1個以上10個以下のエーテル結合を有してもよく、1個以上5個以下のカルボニル基を有してもよい。炭素数を5以上とすることで、銅微粒子の分散媒中への溶出(腐食)が抑制され、良好な分散安定性が得られる。炭素数を30以下とすることで、分散媒の極性低下が抑制され、分散剤が溶解しやすくなる。 Solvent (dispersion medium) is not particularly limited. As the solvent, for example, a polar dispersion medium can be used. As the polar dispersion medium, a protic dispersion medium or an aprotic dispersion medium can be used. The protic dispersion medium is a linear or branched alkyl compound or alkenyl compound having one hydroxyl group and having 5 to 30 carbon atoms. This protic dispersion medium may have 1 to 10 ether bonds and may have 1 to 5 carbonyl groups. By setting the carbon number to 5 or more, elution (corrosion) of copper fine particles into the dispersion medium is suppressed, and good dispersion stability is obtained. By setting the number of carbon atoms to 30 or less, a decrease in the polarity of the dispersion medium is suppressed, and the dispersant is easily dissolved.

 このようなプロトン性分散媒としては、例えば、3-メトキシ-3-メチルブタノール、トリエチレングリコールモノメチルエーテル、トリエチレングリコールモノブチルエーテル、ジエチレングリコールモノブチルエーテ ル、ジエチレングリコールモノメチルエーテル、プロピレングリコールモノブチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノブチルエーテル、トリプロピレングリコールモノメチルエーテル、トリプロピレングリコールモノブチルエーテル、エチレングリコールモノヘキシルエーテル、エチレングリコールモノ-tert-ブチルエーテル、2-オクタノール等が挙げられるが、これらに限定されるものではない。 Examples of such a protic dispersion medium include 3-methoxy-3-methylbutanol, triethylene glycol monomethyl ether, triethylene glycol monobutyl ether, diethylene glycol monobutyl ether, diethylene glycol monomethyl ether, propylene glycol monobutyl ether, and dipropylene. Glycol monomethyl ether, dipropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monobutyl ether, ethylene glycol monohexyl ether, ethylene glycol mono-tert-butyl ether, 2-octanol, etc. It is not a thing.

 プロトン性分散媒は、2個以上6個以下のヒドロキシル基を有する炭素数が2以上30以下の直鎖または分岐鎖状のアルキル化合物もしくはアルケニル化合物であってもよい。このプロトン性分散媒は、1個以上10個以下のエーテル結合を有してもよく、1個以上5個以下のカルボニル基を有してもよい。 The protonic dispersion medium may be a linear or branched alkyl compound or alkenyl compound having 2 to 30 hydroxyl groups and 2 to 30 carbon atoms. This protic dispersion medium may have 1 to 10 ether bonds and may have 1 to 5 carbonyl groups.

 このようなプロトン性分散媒としては、例えば、2-メチルペンタン-2,4-ジオール、エチレングリコール、プロピレングリコール、1,5-ペンタンジオール、ジエチレ ングリコール、トリエチレングリコール、グリセリン、ソルビトール等が挙げられるが、これらに限定されるものではない。 Examples of such a protic dispersion medium include 2-methylpentane-2,4-diol, ethylene glycol, propylene glycol, 1,5-pentanediol, polyethylene glycol, triethylene glycol, glycerin, sorbitol and the like. However, it is not limited to these.

 比誘電率が30以上の非プロトン性極性分散媒としては、例えば、プロピレンカーボネート、1,3-ジメチル-2-イミダゾリジノン、ヘキサメチルフォスフォラミド、N-メチルピロリドン、N-エチルピロリドン、ニトロベンゼン、N、N-ジエチルホルムアミド、N、N-ジメチルアセトアミド、フルフラール、γ-ブチロラクトン、エチレンスルファイト、スルホラン、ジメチルスルホキシド、スクシノニトリル、エチレンカーボネート等が挙げられるが、これらに限定されるものではない。 Examples of the aprotic polar dispersion medium having a relative dielectric constant of 30 or more include propylene carbonate, 1,3-dimethyl-2-imidazolidinone, hexamethylphosphoramide, N-methylpyrrolidone, N-ethylpyrrolidone, and nitrobenzene. , N, N-diethylformamide, N, N-dimethylacetamide, furfural, γ-butyrolactone, ethylene sulfite, sulfolane, dimethyl sulfoxide, succinonitrile, ethylene carbonate and the like, but are not limited thereto. .

 これらの極性分散媒は、1種類を単独で用いても、2種類以上を適宜混合して用いてもよい。 These polar dispersion media may be used alone or in combination of two or more.

 分散剤は、特に限定されるものではない。分散剤として、例えば、少なくとも1個以上の酸性官能基を有する分子量200以上100000以下の化合物またはその塩を用いることができる。分散剤の酸性官能基は、酸性、すなわち、プロトン供与性を有する官能基であり、例えば、リン酸基、ホスホン酸基、スルホン酸基、硫酸基、カルボキシル基などである。 The dispersant is not particularly limited. As the dispersant, for example, a compound having at least one acidic functional group and a molecular weight of 200 or more and 100,000 or less or a salt thereof can be used. The acidic functional group of the dispersant is a functional group having acidity, that is, a proton donating property, such as a phosphoric acid group, a phosphonic acid group, a sulfonic acid group, a sulfuric acid group, and a carboxyl group.

 これらの分散剤を使用する場合、1種類を単独で用いても、2種類以上を適宜混合して用いてもよい。分散剤の濃度は、例えば、銅微粒子分散液に対して0.5mass%以上50mass%以下である。分散剤の濃度を0.5mass%以上とすることで、十分な分散効果が得られる。分散剤の濃度を50mass%以下とすることで、銅微粒子分散液を印刷法に用いた場合に、良好な印刷特性が得られる。 When these dispersants are used, one kind may be used alone, or two or more kinds may be appropriately mixed and used. The concentration of the dispersant is, for example, 0.5 mass% or more and 50 mass% or less with respect to the copper fine particle dispersion. A sufficient dispersion effect can be obtained by setting the concentration of the dispersant to 0.5 mass% or more. By setting the concentration of the dispersant to 50 mass% or less, good printing characteristics can be obtained when the copper fine particle dispersion is used in the printing method.

 これらの銅微粒子分散液には、用途に応じてレベリング剤、表面調整剤、消泡剤、防食剤、光焼成調整剤などを、分散安定性を損なわない範囲で適宜加えることができる。 In these copper fine particle dispersions, a leveling agent, a surface conditioner, an antifoaming agent, an anticorrosive, a light baking conditioner, and the like can be appropriately added within a range not impairing the dispersion stability.

 上記のように配合された銅微粒子分散液において、分散剤が酸性官能基を有し、分散媒が極性分散媒であれば、分散剤は分散媒との相溶性を有する。さらに、分散媒がプロトン性分散媒である場合、プロトン供与性を有するので、分散媒分子間で水素結合を形成し、分散剤の酸性官能基と相互作用を及ぼす。分散媒が非プロトン性極性分散媒である場合、プロトン供与性を有しないが、比誘電率が30以上と高いため、分散剤の酸性官能基はプロトン(H)を解離できる。 In the copper fine particle dispersion liquid formulated as described above, if the dispersant has an acidic functional group and the dispersion medium is a polar dispersion medium, the dispersant has compatibility with the dispersion medium. Furthermore, when the dispersion medium is a protic dispersion medium, it has a proton donating property, so that a hydrogen bond is formed between the dispersion medium molecules and interacts with the acidic functional group of the dispersant. When the dispersion medium is an aprotic polar dispersion medium, it has no proton donating property, but has a high relative dielectric constant of 30 or more, so that the acidic functional group of the dispersant can dissociate protons (H + ).

 銅微粒子は、分散剤分子で表面が覆われるので、分散剤と分散媒の静電的相互作用によって分散媒中に分散される。銅微粒子は、粒子径が小さいので、分散剤と分散媒の静電的相互作用が大きければ凝集が防がれ、凝集しなければ、沈降せず、銅微粒子分散液の分散安定性が高くなる。 Since the surface of the copper fine particles is covered with the dispersant molecule, it is dispersed in the dispersion medium by the electrostatic interaction between the dispersant and the dispersion medium. Since the copper fine particles have a small particle size, aggregation is prevented if the electrostatic interaction between the dispersant and the dispersion medium is large, and if the particles do not aggregate, they do not settle and the dispersion stability of the copper fine particle dispersion becomes high. .

 プロトン性分散媒は、エーテル結合やカルボニル基を有する場合、極性が大きくなるので、分散剤との相溶性が高くなり、銅微粒子分散液の分散安定性が高くなる。 When the protic dispersion medium has an ether bond or a carbonyl group, the polarity is increased, so that the compatibility with the dispersant is increased and the dispersion stability of the copper fine particle dispersion is increased.

 続いて、再度図1を参照しつつ、本実施形態に係る導電膜形成方法について説明する。凹版10として、例えば、ガラス板上の感光性樹脂を露光、現像および洗浄により形成した凹版、ガラス板、金属板、金属ロール等をケミカルエッチングおよびレーザーエッチングにより形成した凹版などを用いることができる。その他、公知慣用の凹版を凹版10として用いることができる。ブランケット70として、例えば、シリコーンゴム層、PET層、スポンジ層等の層構造を有するシートを用いることができる。これらのシートは、例えば、ブランケット胴と称される剛性のある円筒に巻きつけた状態で使用される。基板30として、ポリイミド、ガラス、ポリカーボネート、PET、PEN、シクロオレフィンポリマー、金属板、などを用いることができる。 Subsequently, the conductive film forming method according to the present embodiment will be described with reference to FIG. 1 again. As the intaglio 10, for example, an intaglio in which a photosensitive resin on a glass plate is formed by exposure, development and washing, an intaglio in which a glass plate, a metal plate, a metal roll or the like is formed by chemical etching and laser etching, or the like can be used. In addition, a known and commonly used intaglio can be used as the intaglio 10. As the blanket 70, for example, a sheet having a layer structure such as a silicone rubber layer, a PET layer, or a sponge layer can be used. These sheets are used, for example, in a state of being wound around a rigid cylinder called a blanket cylinder. As the substrate 30, polyimide, glass, polycarbonate, PET, PEN, cycloolefin polymer, metal plate, or the like can be used.

 まず、上記図1の説明に従って、基板30に印刷パターンの皮膜を形成する。次に、皮膜に対して乾燥処理を行う。皮膜の乾燥によって、銅微粒子分散液中の樹脂、溶剤および分散剤が蒸発し、銅微粒子が残る。皮膜の乾燥時間は、例えば、100℃空気雰囲気下において30分程度で完了する。皮膜の乾燥時間を短縮するために、皮膜に空気流あるいは窒素流を当ててもよい。 First, a printed pattern film is formed on the substrate 30 in accordance with the description of FIG. Next, the film is dried. By drying the film, the resin, solvent and dispersant in the copper fine particle dispersion are evaporated, leaving copper fine particles. The drying time of the film is completed in about 30 minutes in an air atmosphere at 100 ° C., for example. In order to shorten the drying time of the film, an air flow or a nitrogen flow may be applied to the film.

 次に、乾燥した皮膜に光を照射することによって、銅微粒子に対して焼成処理を行う。光の照射による焼成(光焼成)において、銅微粒子の表面酸化皮膜の還元と、銅微粒子の焼結とが起きる。銅微粒子は、焼結において互いに溶融し、基板30に溶着する。光焼成は、例えば、大気下かつ室温で行われる。光焼成に用いられる光源は、例えば、キセノンランプである。光源にレーザー装置を用いてもよい。光源から照射される光のエネルギー範囲は、例えば、0.1J/cm以上、100J/cm以下である。照射時間は、例えば、0.1ms以上、100ms以下である。照射回数は、1回でも複数回の多段照射でもよい。光焼成された皮膜は、導電性を有するようになる。これにより、印刷パターンの導電膜が形成される。形成された導電膜の形態は、連続した皮膜である。導電膜の抵抗率は、例えば、2μΩ・cm~9μΩ・cmである。 Next, the copper fine particles are fired by irradiating the dried film with light. In firing by light irradiation (photo-firing), reduction of the surface oxide film of the copper fine particles and sintering of the copper fine particles occur. The copper fine particles are melted together in the sintering and welded to the substrate 30. The light baking is performed, for example, in the atmosphere and at room temperature. The light source used for light baking is, for example, a xenon lamp. A laser device may be used as the light source. Energy range of the light irradiated from the light source, for example, 0.1 J / cm 2 or more and 100 J / cm 2 or less. The irradiation time is, for example, 0.1 ms or more and 100 ms or less. The number of times of irradiation may be one time or multiple times of multistage irradiation. The photo-fired film has conductivity. Thereby, a conductive film having a printed pattern is formed. The form of the formed conductive film is a continuous film. The resistivity of the conductive film is, for example, 2 μΩ · cm to 9 μΩ · cm.

 続いて、この導電膜形成方法を用いて製造される回路基板について説明する。この回路基板は、回路を基板上に有する。基板は、ポリイミド、ガラス等の絶縁物を板状に成形したものであり、例えば、フレキシブル基板又はリジッド基板である。基板は、シリコンウエハ等、半導体から成るものであってもよい。基板は、耐熱性向上、傷防止、光学特性向上のためのハードコート層あるいはプライマー層を塗布したものであってもよい。回路は、この導電膜形成方法によって形成された導電膜を有する。導電膜は、例えば、回路素子間を電気的に接続する導線を構成する。導電膜は、回路素子又はその一部、例えば、コイル、キャパシターの電極等を構成してもよい。 Subsequently, a circuit board manufactured using this conductive film forming method will be described. The circuit board has a circuit on the board. A board | substrate shape | molds insulators, such as a polyimide and glass, in plate shape, for example, is a flexible substrate or a rigid board | substrate. The substrate may be made of a semiconductor such as a silicon wafer. The substrate may be one coated with a hard coat layer or primer layer for improving heat resistance, preventing scratches and improving optical properties. The circuit has a conductive film formed by this conductive film forming method. The conductive film constitutes, for example, a conductive wire that electrically connects circuit elements. The conductive film may constitute a circuit element or a part thereof, for example, a coil, a capacitor electrode, or the like.

(実施例)
 以下、上記実施形態に係る銅微粒子分散液の印刷特性について実験を行った(サンプル1~16および比較サンプル1~6)。具体的には、グラビアオフセット印刷法を用いて、異なる複数の線幅について一括印刷1,2を行った。その後、乾燥および光焼成によって導電膜を形成した。一括印刷1では、10μmから50μmの間で10μm間隔の線幅を用いた。一括印刷2では、7μmの線幅と、10μmから100μmの間で約10μm間隔の線幅とを用いた。
(Example)
In the following, experiments were conducted on printing characteristics of the copper fine particle dispersions according to the above-described embodiments (Samples 1 to 16 and Comparative Samples 1 to 6). Specifically, batch printing 1 and 2 were performed for a plurality of different line widths using the gravure offset printing method. Then, the electrically conductive film was formed by drying and light baking. In batch printing 1, a line width of 10 μm between 10 μm and 50 μm was used. In batch printing 2, a line width of 7 μm and a line width of about 10 μm between 10 μm and 100 μm were used.

 第1銅微粒子の粒径範囲を表1および表2に示す。また、第2銅微粒子の中心粒子径を表1および表2に示す。また、第1銅微粒子および第2銅微粒子の合計の質量に対する、第1銅微粒子の第2銅微粒子の各割合を表1および表2に示す。また、銅微粒子分散液に含まれる樹脂の種類、および第1銅微粒子および第2銅微粒子の合計の質量に対する樹脂の濃度(mass%)を表1および表2に示す。また、一括印刷1,2の結果を表1および表2に示す。また、乾燥および光焼成によって形成された導電膜の抵抗試験の結果を表1および表2に示す。 Table 1 and Table 2 show the particle size range of the first copper fine particles. Tables 1 and 2 show the center particle diameters of the second copper fine particles. Tables 1 and 2 show the ratios of the second copper fine particles of the first copper fine particles to the total mass of the first copper fine particles and the second copper fine particles. Tables 1 and 2 show the types of resins contained in the copper fine particle dispersion and the resin concentration (mass%) relative to the total mass of the first copper fine particles and the second copper fine particles. The results of batch printing 1 and 2 are shown in Tables 1 and 2. Tables 1 and 2 show the results of resistance tests of the conductive films formed by drying and light baking.

 なお、PVP2500は、重量平均分子量が約2500の試薬ポリビニルピロリドンである。VYLON220は、東洋紡製の非晶性ポリエステル樹脂(100%もの)であって、約3000の数平均分子量を有する。PVP K90は、重量平均分子量が約360000の試薬ポリビニルピロリドンである。PVAは、試薬ポリビニルアルコールであって、約2000の分子量を有する。PSK125は、ヤスハラケミカル製YSポリスターK125であって、重量平均分子量が約650のテルペンフェノール樹脂である。XZ#7157は、東栄化成製アクリナールであって、アクリル樹脂である。BYK-430は、ビックケミー製のウレア変性中極性ポリアマイドである。BYK-410は、ビックケミー製の変性ウレアである。YX8100BH30は、三菱化学製の重量平均分子量が約38000のエポキシ樹脂である。

Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000002
PVP 2500 is a reagent polyvinyl pyrrolidone having a weight average molecular weight of about 2500. VYLON220 is an amorphous polyester resin (100%) manufactured by Toyobo, and has a number average molecular weight of about 3000. PVP K90 is a reagent polyvinylpyrrolidone having a weight average molecular weight of about 360000. PVA is a reagent polyvinyl alcohol and has a molecular weight of about 2000. PSK125 is a terpene phenol resin having a weight average molecular weight of about 650, which is YS Polystar K125 manufactured by Yasuhara Chemical. XZ # 7157 is Toei Kasei Acrynal, which is an acrylic resin. BYK-430 is a urea-modified medium polar polyamide manufactured by Big Chemie. BYK-410 is a modified urea manufactured by Big Chemie. YX8100BH30 is an epoxy resin having a weight average molecular weight of about 38000 manufactured by Mitsubishi Chemical.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000002

 サンプル10,11以外において、銅微粒子分散液における第1銅微粒子および第2銅微粒子の合計の濃度は、約80mass%である。サンプル10,11においては、銅微粒子分散液における第1銅微粒子および第2銅微粒子の合計の濃度は、約85mass%である。銅微粒子分散液の他の組成は、以下のとおりである。
溶剤:銅微粒子及び分散剤の合計重量の残部のうち20mass%をγ-ブチロラクトン、80mass%をトリプロピレングリコールモノメチルエーテル。
分散剤:ビックケミー社製DISPERBYK-111、第1銅微粒子および第2銅微粒子の合計濃度に対して4mass%。
In samples other than Samples 10 and 11, the total concentration of the first copper fine particles and the second copper fine particles in the copper fine particle dispersion is about 80 mass%. In Samples 10 and 11, the total concentration of the first copper fine particles and the second copper fine particles in the copper fine particle dispersion is about 85 mass%. The other composition of the copper fine particle dispersion is as follows.
Solvent: 20% by mass of γ-butyrolactone and 80% by mass of tripropylene glycol monomethyl ether in the balance of the total weight of the copper fine particles and the dispersant.
Dispersant: 4 mass% with respect to the total concentration of DISPERBYK-111 manufactured by Big Chemie, the first copper fine particles and the second copper fine particles.

(分析)
 表1および表2の一括印刷2の欄で空欄になっているものは、一括印刷1のみを行い一括印刷2については行っていないことを示す。一括印刷1,2の欄の数値範囲は、良好な印字が得られた線幅の範囲を示す。良好な印字とは、ブランケット70に銅微粒子分散液が残留しなかったことを意味する。例えば、10-50は、10μmから50μmの各線幅について良好な印字が得られたことを示す。「×」は、いずれの線幅においても良好な印字が得られなかったことを示す。この線幅の範囲が広いほど、印刷特性が良好であることになる。表1および表2の抵抗の欄の○は、東レデュポン社製ポリイミドKapton150ENA基板上において光焼成でμΩ・cmオーダーの抵抗が得られたことを意味する。
(analysis)
A blank in the batch printing 2 column of Tables 1 and 2 indicates that only batch printing 1 is performed and batch printing 2 is not performed. The numerical range in the column of batch printing 1 and 2 indicates the range of the line width at which good printing was obtained. Good printing means that the copper fine particle dispersion did not remain in the blanket 70. For example, 10-50 indicates that good printing was obtained for each line width of 10 μm to 50 μm. “X” indicates that good printing could not be obtained at any line width. The wider the line width range, the better the printing characteristics. “◯” in the resistance column of Tables 1 and 2 means that resistance on the order of μΩ · cm was obtained by photo-baking on a polyimide Kapton 150ENA substrate manufactured by Toray DuPont.

 表2に示すように、比較サンプル1においては、良好な抵抗率が得られたものの、良好な印刷特性は得られなかった。これは、銅微粒子分散液に樹脂を含ませなかったからであると考えられる。次に、比較サンプル2においても、良好な抵抗率が得られたものの、良好な印刷特性は得られなかった。これは、銅微粒子分散液に第2銅微粒子を含ませなかったからであると考えられる。次に、比較サンプル3においても、良好な抵抗率が得られたものの、良好な印刷特性は得られなかった。これは、銅微粒子分散液に第1銅微粒子を含ませなかったからであると考えられる。次に、比較サンプル4においては、良好な印刷特性が得られたものの、光焼成の際に吹き飛んでしまい、抵抗率を測定できなかった。これは、光焼成において瞬間的に熱がかかった際に多量の樹脂が分解気化したからであると考えられる。次に、比較サンプル5においては、銅微粒子分散液において銅微粒子を分散させることができなかった。これは、粒径の大きい第2銅微粒子の量が多くなったからであると考えられる。次に、比較サンプル6の銅微粒子分散液においては、良好な印刷特性が得られたものの、光焼成により抵抗が下がらず、μΩ・cmオーダーの抵抗が得られなかった。これは、樹脂量が多いため光焼成により分解しきれず残存したものと考えられる。 As shown in Table 2, in Comparative Sample 1, although good resistivity was obtained, good printing characteristics were not obtained. This is presumably because the copper fine particle dispersion did not contain a resin. Next, in Comparative Sample 2, although good resistivity was obtained, good printing characteristics were not obtained. This is presumably because the copper fine particle dispersion did not contain the second copper fine particles. Next, in Comparative Sample 3, although good resistivity was obtained, good printing characteristics were not obtained. This is presumably because the first copper fine particles were not included in the copper fine particle dispersion. Next, in Comparative Sample 4, although good printing characteristics were obtained, the resistivity was not measured because it was blown off during light firing. This is presumably because a large amount of resin decomposed and vaporized when heat was instantaneously applied during photo-baking. Next, in Comparative Sample 5, the copper fine particles could not be dispersed in the copper fine particle dispersion. This is presumably because the amount of the second copper fine particles having a large particle size has increased. Next, in the copper fine particle dispersion of Comparative Sample 6, although good printing characteristics were obtained, the resistance was not lowered by light baking, and a resistance of μΩ · cm order was not obtained. This is thought to be due to the large amount of resin that could not be decomposed by light baking and remained.

 これらに対し、いずれのサンプルにおいても、良好な印刷特性および良好な抵抗率が得られた。まず、中心粒子径が0.3μm以上2μm未満の第2銅微粒子と、樹脂とを銅微粒子分散液に含ませたことで、良好な印刷特性が得られたものと考えられる。さらに、第1銅微粒子および第2銅微粒子に対する樹脂濃度を0.05mass%以上8mass%未満としたことで、良好な抵抗率が得られたものと考えられる。 In contrast, good printing characteristics and good resistivity were obtained in any of the samples. First, it is considered that good printing characteristics were obtained by including the second copper fine particles having a center particle size of 0.3 μm or more and less than 2 μm and the resin in the copper fine particle dispersion. Furthermore, it is considered that a favorable resistivity was obtained by setting the resin concentration with respect to the first copper fine particles and the second copper fine particles to 0.05 mass% or more and less than 8 mass%.

 さらに、各サンプルにおいて、メッシュパターンにて抵抗を評価した。サンプル2,4,9~12については、特に良好な結果が得られた。表3にその結果示す。基材として、ハードコートPET(ポリエチレンテレフタレート)基材(東山フィルム社製MKZ-GPMP)を用い、メッシュパターンは、グラビアオフセット印刷により、7μm幅、厚さ約1μmのラインをスペース間隔300μmになるように形成した。表3の7μmメッシュ抵抗は、印刷し、光焼成したメッシュパターンに銅板を間1cmになるように押し当て、その間の抵抗をテスターにて測定して得た値である。表3に示すように、樹脂としてPVP2500及びPSK125を用いた場合は、他の樹脂を用いた場合と比較して、特に良好な結果が得られた。これらの樹脂は、他のサンプルの樹脂に比べ光焼成時に分解しやすいものと考えられる。

Figure JPOXMLDOC01-appb-T000003
Furthermore, resistance was evaluated with a mesh pattern in each sample. Particularly good results were obtained for samples 2, 4, 9-12. Table 3 shows the results. As the base material, a hard coat PET (polyethylene terephthalate) base material (MKZ-GPMP manufactured by Higashiyama Film Co., Ltd.) is used, and the mesh pattern is formed by gravure offset printing so that a line having a width of 7 μm and a thickness of about 1 μm has a space interval of 300 μm. Formed. The 7 μm mesh resistance in Table 3 is a value obtained by pressing a copper plate against a printed and light-fired mesh pattern so that the distance is 1 cm 2 and measuring the resistance between them with a tester. As shown in Table 3, when PVP2500 and PSK125 were used as the resin, particularly good results were obtained as compared with the case where other resins were used. These resins are considered to be easily decomposed at the time of light baking as compared with the resins of other samples.
Figure JPOXMLDOC01-appb-T000003

 以上、本発明の実施例について詳述したが、本発明は係る特定の実施例に限定されるものではなく、特許請求の範囲に記載された本発明の要旨の範囲内において、種々の変形・変更が可能である。 Although the embodiments of the present invention have been described in detail above, the present invention is not limited to such specific embodiments, and various modifications and changes can be made within the scope of the gist of the present invention described in the claims. It can be changed.

Claims (7)

 中心粒子径が1nm以上100nm以下の第1銅微粒子と、
 中心粒子径が0.3μm以上2μm未満の第2銅微粒子と、
 前記第1銅微粒子および前記第2銅微粒子に対する濃度が0.05mass%以上8mass%未満の樹脂と、
 溶剤と、
 前記第1銅微粒子および前記第2銅微粒子を前記溶剤中で分散させる分散剤と、を有することを特徴とする銅微粒子分散液。
A first copper fine particle having a center particle diameter of 1 nm or more and 100 nm or less;
Cupric fine particles having a center particle diameter of 0.3 μm or more and less than 2 μm;
A resin having a concentration with respect to the first copper fine particles and the second copper fine particles of 0.05 mass% or more and less than 8 mass%;
Solvent,
A copper fine particle dispersion comprising: a dispersant for dispersing the first copper fine particles and the second copper fine particles in the solvent.
 前記樹脂は、ポリビニルピロリドン、ポリエステル樹脂、ポリビニルアルコール、テルペンフェノール樹脂、アクリル樹脂、ウレア変性中極性ポリアマイド、変性ウレア、エポキシ樹脂の少なくともいずれかを含むことを特徴とする請求項1記載の銅微粒子分散液。 2. The copper fine particle dispersion according to claim 1, wherein the resin contains at least one of polyvinyl pyrrolidone, polyester resin, polyvinyl alcohol, terpene phenol resin, acrylic resin, urea-modified medium polarity polyamide, modified urea, and epoxy resin. liquid.  前記第1銅微粒子および前記第2銅微粒子の総質量に対する前記第1銅微粒子の割合は、30mass%以上70mass%以下であることを特徴とする請求項1または2に記載の銅微粒子分散液。 The copper fine particle dispersion according to claim 1 or 2, wherein a ratio of the first copper fine particles to a total mass of the first copper fine particles and the second copper fine particles is 30 mass% or more and 70 mass% or less.  前記銅微粒子分散液に対する、前記第1銅微粒子および前記第2銅微粒子の合計の濃度は、1mass%以上85mass%以下であることを特徴とする請求項1~3のいずれか一項に記載の銅微粒子分散液。 The total concentration of the first copper fine particles and the second copper fine particles with respect to the copper fine particle dispersion is 1 mass% or more and 85 mass% or less, according to any one of claims 1 to 3. Copper fine particle dispersion.  請求項1~4のいずれか一項に記載の銅微粒子分散液の皮膜を物体表面に形成し、
 前記皮膜を乾燥させ、
 乾燥した前記皮膜に光を照射する光焼成によって導電膜を形成する、ことを特徴とする導電膜形成方法。
A film of the copper fine particle dispersion according to any one of claims 1 to 4 is formed on an object surface,
Drying the coating,
A method of forming a conductive film, comprising forming a conductive film by light baking that irradiates the dried film with light.
 グラビアオフセット印刷法を用いて前記銅微粒子分散液の皮膜を前記物体表面に形成することを特徴とする請求項5記載の導電膜形成方法。 6. The method of forming a conductive film according to claim 5, wherein a film of the copper fine particle dispersion is formed on the surface of the object using a gravure offset printing method.  請求項5または6に記載の導電膜形成方法によって形成された導電膜を有する回路を基板上に備えることを特徴とする回路基板。 A circuit board comprising a circuit having a conductive film formed by the conductive film forming method according to claim 5 or 6 on a substrate.
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